Machine Patents (Class 451/64)
  • Publication number: 20150135531
    Abstract: The invention relates to a method for the material-removing processing of an adjustable camshaft which has a shaft body, wherein at least a first component of the camshaft can move axially and/or in the circumferential direction with respect to the shaft body, wherein a gap which permits the movement is provided between the shaft body and the first component, and wherein in order to protect the first moveable component during the material-removing processing a protection apparatus which has at least one fluid duct is placed on the shaft body and fluid is applied to it. According to the invention, the protection apparatus is arranged laterally with respect to the first moveable component in such a way that at least some of the fluid is directed laterally onto the first component and into an intermediate space between the protection apparatus and the first component, and wherein the first component is exposed in the radial direction.
    Type: Application
    Filed: May 29, 2013
    Publication date: May 21, 2015
    Applicant: THYSSENKRUPP PRESTA TECCENTER AG
    Inventor: Thomas Binder
  • Patent number: 9017145
    Abstract: The present invention provides a polishing solution distribution apparatus capable of reducing distribution deviation of polishing solution even when leveling for installation is insufficient or inclination of an installation location varies and a polishing apparatus having the same. The polishing solution distribution apparatus includes a cone-shaped branch body in which a solution pan to store supplied polishing solution is formed and in which plural flow passages radially connected to a side face of the solution pan respectively and having a delivery port to supply polishing solution to a position lower than the connected position are formed, a support portion to support the branch body, and a universal joint mechanism to support the branch body via the support portion at a position being higher than the gravity center of the branch body.
    Type: Grant
    Filed: April 11, 2011
    Date of Patent: April 28, 2015
    Assignee: Sumco Corporation
    Inventors: Yoshiaki Kurosawa, Tomohiro Hashii, Yuichi Kakizono
  • Publication number: 20150107619
    Abstract: Among other things, one or more techniques or systems for particle removal from a semiconductor wafer are provided. Particles, contaminating a semiconductor wafer, have the potential to cause defects, such as scratches into a surface of the semiconductor wafer during chemical mechanical polishing or defocusing during a subsequent lithography stage, for the semiconductor wafer. Accordingly, a mechanic particle cleaner component, such as at least one of a sliver brush roller, a pencil brush, a tape polish, a sonic jet, or a liquid spray component, is configured to apply a mechanical force to an edge region of the semiconductor wafer to detach particles. A chemical particle cleaner component is configured to apply a chemical force to the edge region to detach particles. In this way, particles are removed from the semiconductor wafer before or after chemical mechanical polishing.
    Type: Application
    Filed: October 22, 2013
    Publication date: April 23, 2015
    Inventors: Jiann Lih Wu, He Hui Peng, Jeng-Jyi Hwang, Chi-Ming Yang
  • Publication number: 20150072594
    Abstract: Manufacturing methods are provided. A component may be polished to remove defects thereon. An identifier may be added to the polishing material employed to polish the component. A detector may detect the identifier. For example, the identifier may be a fluroescing material that may illuminate in the presence of a fluorescent light. A determining apparatus may determine a status of the component based on the presence or absence of the identifier. For example, the determining apparatus may determine that the component needs to be re-cleaned based on presence of the identifier. Related systems and computer program products are also provided.
    Type: Application
    Filed: September 9, 2013
    Publication date: March 12, 2015
    Applicant: Apple Inc.
    Inventors: Duco B. Pasmooij, Kee Han Sim, Christopher R. Fagan
  • Publication number: 20150044944
    Abstract: The present invention provides a surface processing system for a work piece in the mechanical technical field. The system comprises at least one group of polishing units. A manipulator and several polishers with different polishing precisions are provided on the polishing units. The polishers are arranged around the manipulator in turn. The work piece could be moved by the manipulator between the processing center and the polishing units. The machined work piece is loaded by the manipulator for one time when the manipulator is located at the processing center. When the manipulator is located at the polishing units, the manipulator keeps holding the work piece and transfers the work piece in a preset sequence to each polisher corresponding to the polishing unit where the manipulator is located. The surface of work pieces having different wall thicknesses and complex surfaces could be processed in a large batch with a high efficiency.
    Type: Application
    Filed: July 26, 2014
    Publication date: February 12, 2015
    Applicant: TAIZHOU FEDERAL ROBOT TECHNOLOGY CO., LTD
    Inventor: Qiyue Chen
  • Patent number: 8951813
    Abstract: A method of polishing a substrate having a film is provided. The method includes: performing polishing of the substrate in a polishing section; transporting the polished substrate to a wet-type film thickness measuring device prior to cleaning and drying of the substrate; measuring a thickness of the film by the wet-type film thickness measuring device; comparing the thickness with a predetermined target value; and if the thickness has not reached the predetermined target value, performing re-polishing of the substrate in the polishing section prior to cleaning and drying of the substrate.
    Type: Grant
    Filed: July 9, 2013
    Date of Patent: February 10, 2015
    Assignee: Ebara Corporation
    Inventors: Takeshi Iizumi, Katsuhide Watanabe, Yoichi Kobayashi
  • Patent number: 8942842
    Abstract: A method of generating a library of reference spectra includes storing an optical model for a layer stack having at a plurality of layers, receiving user input identifying a set of one or more refractive index functions and a set of one or more extinction coefficient functions a first layer from the plurality of layers, wherein the set of one or more refractive index functions includes a plurality of different refractive index functions or the set of one or more extinction coefficient functions includes a plurality of different extinction coefficient functions, and for each combination of a refractive index function from the set of refractive index functions and an extinction coefficient function from the set of extinction coefficient functions, calculating a reference spectrum using the optical model based on the refractive index function, the extinction coefficient function and a first thickness of the first layer.
    Type: Grant
    Filed: April 28, 2011
    Date of Patent: January 27, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Jeffrey Drue David, Dominic J. Benvegnu, Xiaoyuan Hu
  • Publication number: 20150017883
    Abstract: One or more slider bars are attached to at least one component of a multi-component carrier device. The multi-component carrier device is attached to a lapping arm of a lapping machine and the one or more slider bars attached to the carrier device are lapped. The at least one component of the multi-component carrier device is attached to a grinding/cutting machine. At least one of a grinding operation or a cutting operation is performed on the one or more slider bars.
    Type: Application
    Filed: July 3, 2014
    Publication date: January 15, 2015
    Inventors: Marc Ronshaugen, Joel Hoehn, Gordon Jones, Yuhong Xiong
  • Publication number: 20150017878
    Abstract: A method of removing at least a portion of an interaction layer on an electrode region of a solar substrate is provided. The method includes a step of providing a solar substrate including an absorbing region and an electrode region. The absorbing region including an absorbing layer configured to convert light energy into electrical energy. The electrode region is substantially free of the absorbing layer, and the electrode region includes an interaction layer. The method also includes a step of brushing the electrode region to remove at least a portion of the interaction layer.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 15, 2015
    Applicant: Orthodyne Electronics Corporation
    Inventors: Christoph B. Luechinger, Erich C. Mueller, Orlando L. Valentin, Tao Xu
  • Publication number: 20140345482
    Abstract: A printing form is for use in relief printing, in particular flexographic printing. The printing form is configured as a single or multilayered cylindrical layer structure having at least a first layer having a vulcanizate based on at least one elastomer. The first layer is extruded.
    Type: Application
    Filed: March 19, 2014
    Publication date: November 27, 2014
    Applicant: ContiTech Elastomer-Beschichtungen GmbH
    Inventors: Stefan Fuellgraf, Armin Senne
  • Publication number: 20140335767
    Abstract: A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.
    Type: Application
    Filed: October 16, 2013
    Publication date: November 13, 2014
    Inventors: Tayyab Ishaq Suratwala, Michael Douglas Feit, William Augustus Steele
  • Patent number: 8882567
    Abstract: A polishing mechanism includes a support base, a pair of magnetic valves, a first polishing assembly and a second polishing assembly. The pair of magnetic valves are mounted in the support base. The first polishing assembly and the second polishing assembly are mounted on the support base and connected to the pair of magnetic valves respectively. The second polishing assembly is arranged perpendicular to the first polishing assembly. The first and the second polishing assemblies are respectively controlled by the pair of magnetic valves to polish one or more workpieces. The present disclosure further discloses a manipulator using the polishing mechanism.
    Type: Grant
    Filed: October 11, 2012
    Date of Patent: November 11, 2014
    Assignees: Fu Tai Hua Industry (Shenzhen) Co., Ltd., Hon Hai Precision Industry Co., Ltd.
    Inventor: You-Yuan Liu
  • Publication number: 20140298862
    Abstract: Provided are a pressure-sensitive adhesive tape, a polishing pad, a method of manufacturing the same, a polishing device and a method of manufacturing a glass substrate. The illustrative pressure-sensitive adhesive tape may be a pressure-sensitive adhesive tape for a polishing material. The pressure-sensitive adhesive tape may be effectively fixed to a surface plate without bubbles, and have excellent resistance to water and a polishing solution and shear strength applied in a polishing process. In addition, the pressure-sensitive adhesive tape may be easily removed from a carrier or surface plate for a polishing pad without residues after polishing.
    Type: Application
    Filed: June 23, 2014
    Publication date: October 9, 2014
    Inventors: Se Woo YANG, Suk Ky CHANG, Min Soo PARK
  • Publication number: 20140295740
    Abstract: A system according to one embodiment includes a substrate having one or more sacrificial row bars and one or more additional row bars, wherein the one or more sacrificial row bars comprise a wear resistant material and are adapted to be used in a lapping process to prepare a lapping plate, wherein the one or more additional row bars comprise a material that has less wear resistance than the wear resistant material and are adapted to be used for magnetic head slider production, and wherein the lapping plate is adapted to be used in a lapping process to polish the one or more additional row bars.
    Type: Application
    Filed: March 26, 2013
    Publication date: October 2, 2014
    Applicant: HGST Netherlands B.V.
    Inventors: Luis David G. Aguirre, Michael T. Babin, SR., Dorcas G. L. Flavier, Liwanag T. Garbo, Juan F. C. Nuno
  • Publication number: 20140287661
    Abstract: A pressure module and two polishing fixture modules are herein disclosed for fiber optic polisher, or polishing machine. Said pressure module further includes an adjustable spring between a top turntable and a bottom turntable, which are kinematically connected and driven by at least three pair of drive-pins and drive-bushes. Said pressure module is able to apply an adjustable pressure from bottom of the polishing fixture module. So the Fixture Module could not be floating in the pressure direction and maintain stationary when polishing machine is working. Two different quick-release mechanisms for a flexure polishing fixture module were invented for holding and releasing fiber ferrules or connectors during the polishing process controlled by sets of magnets. It's easy to work, and to protect the fixture flexure from the un-proper torque applied by different operators. The current invention is an improvement over our previous invention.
    Type: Application
    Filed: March 21, 2013
    Publication date: September 25, 2014
    Applicant: Princetel Inc.
    Inventors: Hong ZHANG, Boying B. ZHANG
  • Publication number: 20140235144
    Abstract: A chemical mechanical polishing machine includes a polishing head assembly including a polishing head body and a membrane disposed at a bottom of the polishing head body. The bottom surface of the membrane includes a hydrophobic area and a hydrophilic area.
    Type: Application
    Filed: October 3, 2013
    Publication date: August 21, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: IN-KWON KIM, Kyung-Hyun Kim, Ki-Jong Park, Ki-Ho Bae, Jong-Heun Lim
  • Publication number: 20140213155
    Abstract: An apparatus and method of polishing a substrate is described. The polishing includes: rotating a substrate; pressing a first polishing tool against an edge portion of the substrate to polish the edge portion; and pressing a second polishing tool against the edge portion of the substrate to polish the edge portion. The second polishing tool is located more inwardly than the first polishing tool with respect to a radial direction of the substrate. The first polishing tool has a polishing surface rougher than a polishing surface of the second polishing tool.
    Type: Application
    Filed: January 29, 2014
    Publication date: July 31, 2014
    Inventors: Tetsuji TOGAWA, Atsushi YOSHIDA, Toshifumi WATANABE
  • Publication number: 20140134925
    Abstract: A method for finish-machining a workpiece surface includes moving the workpiece surface relative to an active area of the finishing tool in a rotation direction about a workpiece axis, and superimposing on the relative movement of the workpiece surface and the active area an additional oscillatory movement with an oscillation frequency lower than 20 kHz in a direction perpendicular to the workpiece surface.
    Type: Application
    Filed: April 12, 2013
    Publication date: May 15, 2014
    Applicant: Supfina Grieshaber GmbH & Co. KG
    Inventor: Oliver Hildebrandt
  • Publication number: 20140106648
    Abstract: A glass-plate working apparatus includes a glass-plate supporting portion 20a of a feed conveyor 7, a glass-plate supporting portion 20b of a cutting section 2, a glass-plate supporting portion 20c of a bend-breaking section 4, a glass-plate supporting portion 20d of a grinding section 3, and a glass-plate supporting portion 20e of a discharge conveyor 8; a cutting head 9, a bend-breaking device 66, and a grinding head 10 for processing glass plates 5 which are respectively supported by the supporting portions 20b, 20c, and 20d; and a transporting device 89 for transporting the glass plate 5 on the supporting portion 20a onto the supporting portion 20b, the glass plate 5 on the supporting portion 20b onto the supporting portion 20c, the glass plate 5 on the supporting portion 20c onto the supporting portion 20d, and the glass plate 5 on the supporting portion 20d onto the supporting portion 20e, respectively.
    Type: Application
    Filed: December 17, 2013
    Publication date: April 17, 2014
    Applicant: BANDO KIKO CO., LTD.
    Inventor: Kazuaki BANDO
  • Publication number: 20140094096
    Abstract: An ultrasonic tooth making machine comprises: a tooth making machine, a work table, and a vibration device. The tooth making machine has a machine tool to perform machining operation. The work table is mounted on the tooth making machine to hold a rough blank tooth, and the work table and the machine tool are able to move with respect to each other. The vibration device is located between the work table and the rough blank tooth to put the rough blank tooth in an ultrasonic vibration environment. When the machine tool is controlled to move with respect to the work tale while the vibration device is powered on, the rough blank tooth, in the ultrasonic vibration environment, is capable of being machined into at least one artificial tooth at one time.
    Type: Application
    Filed: September 30, 2012
    Publication date: April 3, 2014
    Inventor: Jung-Chun WU
  • Publication number: 20140087627
    Abstract: A method of detecting an abnormality in polishing of a substrate is provided. The method includes: rotating the substrate; pressing a polishing tool against an edge portion of the substrate to polish the edge portion; measuring a position of the polishing tool relative to a surface of the substrate; determining an amount of polishing of the substrate from the position of the polishing tool; calculating a polishing rate from the amount of polishing of the substrate; and judging that an abnormality in polishing of the edge portion of the substrate has occurred if the polishing rate is out of a predetermined range.
    Type: Application
    Filed: September 23, 2013
    Publication date: March 27, 2014
    Inventors: Tetsuji TOGAWA, Masaya SEKI, Hiroyuki TAKENAKA
  • Patent number: 8657651
    Abstract: An apparatus for grinding a continuously cast slab having a longitudinal axis and a rectangular cross-sectional shape with two opposite wide faces and two opposite narrow faces apparatus has a frame, two transversely spaced grinders carried on the frame, and a holder having two transversely spaced grippers engageable with the opposite faces of the slab in a vertical position with the wide faces of the slab vertical for grinding of the wide faces of the slab by the grinders and in a horizontal position offset by 90° to the vertical position with the wide faces of the slab horizontal for grinding of the narrow faces of the slab.
    Type: Grant
    Filed: February 22, 2012
    Date of Patent: February 25, 2014
    Assignee: SMS Logistiksysteme GmbH
    Inventor: Karl Robert Hofmann
  • Publication number: 20140024298
    Abstract: An abrasive cutting machine includes a housing and a cutting arm on which a cutting tool is accommodated on the end side. The cutting tool is driven via a belt by an engine of the abrasive cutting machine, and the housing encompasses a fan chamber for accommodating a fan wheel by which an air flow is provided. A belt chamber for accommodating the belt is embodied in the cutting arm, with improved durability of a belt, in particular the dust exposure of the belt for power transfer from the engine to the cutting tool. Provision is made between the fan chamber and the belt chamber for an air duct, through which at least a part of the air flow, which is created by the fan wheel, reaches from the fan chamber into the belt chamber, so as to apply a sealing air flow to the belt chamber.
    Type: Application
    Filed: May 16, 2013
    Publication date: January 23, 2014
    Applicant: MAKITA CORPORATION
    Inventor: Klaus SCHOLZ
  • Publication number: 20140011429
    Abstract: A polishing apparatus includes a platen to hold a polishing pad having a plurality of optical apertures, a carrier head to hold a substrate against the polishing pad, a motor to generate relative motion between the carrier head and the platen, and an optical monitoring system. The optical monitoring system includes at least one light source, a common detector, and an optical assembly configured to direct light from the at least one light source to each of a plurality of separated positions in the platen, to direct light from each position of the plurality of separated positions to the substrate as the substrate passes over said each position, to receive reflected light from the substrate as the substrate passes over said each position, and to direct the reflected light from each of the plurality of separated positions to the common detector.
    Type: Application
    Filed: September 13, 2013
    Publication date: January 9, 2014
    Applicant: Applied Materials, Inc.
    Inventors: Jeffrey Drue David, Boguslaw A. Swedek, Dominic J. Benvegnu, Sivakumar Dhandapani
  • Publication number: 20130331003
    Abstract: Implementations of the metal polishing processes of the present disclosure machine polish patterns onto metal using various abrasive disks. The abrasive disks can be machine controlled using programmed commands. In some implementations, the programmed commands are derived based on the desired pattern using computer-aided manufacturing (CAM) technology. The programmed commands automatically operate a machine to polish a pattern onto metal using the abrasive disks.
    Type: Application
    Filed: May 17, 2013
    Publication date: December 12, 2013
    Inventor: Nils Eric Simonsen
  • Publication number: 20130273818
    Abstract: A manipulator includes a controlling seat, a robot arm assembly and a polishing mechanism. The robot arm assembly is rotatably connected to the controlling seat; and the polishing mechanism is mounted on the robot arm assembly. The polishing mechanism includes a housing with a first mounting portion and a second mounting portion, a pair of magnetic valves mounted in the housing and electrically connected to the controlling seat, a first polishing assembly partially received in the first mounting portion, and a second polishing assembly partially received in the second mounting portion. The first polishing assembly and the second polishing assembly define an angle therebetween and are respectively connected to the pair of magnetic valves, such that the pair of magnetic valves controls the first and the second polishing assembly respectively to polish one or more workpiece. The present invention further discloses a polishing mechanism of the manipulator.
    Type: Application
    Filed: November 8, 2012
    Publication date: October 17, 2013
    Applicants: HON HAI PRECISION INDUSTRY CO., LTD., FU TAI HUA INDUSTRY (SHENZHEN) CO., LTD.
    Inventors: HONG-LI GUAN, CHANG-XUE HE, MING LIANG
  • Publication number: 20130244551
    Abstract: A polishing mechanism includes a support base, a pair of magnetic valves, a first polishing assembly and a second polishing assembly. The pair of magnetic valves are mounted in the support base. The first polishing assembly and the second polishing assembly are mounted on the support base and connected to the pair of magnetic valves respectively. The second polishing assembly is arranged perpendicular to the first polishing assembly. The first and the second polishing assemblies are respectively controlled by the pair of magnetic valves to polish one or more workpieces. The present disclosure further discloses a manipulator using the polishing mechanism.
    Type: Application
    Filed: October 11, 2012
    Publication date: September 19, 2013
    Inventor: YOU-YUAN LIU
  • Publication number: 20130244542
    Abstract: Abrasive articles including a body having a first abrasive layer, a second abrasive layer and one or more reinforcing layers for use with cordless tools have a reduced thickness with respect to conventional counterparts. Techniques for producing and using such abrasive articles are described. In one embodiment, the first abrasive layer and the second abrasive layer comprise abrasive particles in a bond material. In an embodiment, a reinforcing layer is disposed between the first abrasive layer and the second abrasive layer. In a particular embodiment, the body comprises an average thickness of not greater than about 5 mm. In another particular embodiment, the abrasive particles can comprise silicon carbide.
    Type: Application
    Filed: March 1, 2013
    Publication date: September 19, 2013
    Inventors: Taeke Meerveld, Alessandro R. Milani, Marko W. Versteegen, Grzegorz Wojciechowski, Karolina Rozanska-Zaworska
  • Patent number: 8506360
    Abstract: A wine-glass polisher includes a base unit having a frustoconical cleaning chamber removably fastened thereto. A steam generator, an air heater and a vacuum pump are each in fluid communication with the cleaning chamber. A portion of the steam and hot air is directed to a channel formed in the chamber outer wall. An annular, U-shaped baffle surrounding the open top is in fluid communication with the channel for projecting the steam and hot air downwardly toward a wine glass below. A remaining portion of the heated air and steam is delivered directly to the upper surface of the base unit to clean and dry the interior surface of the glass. A controller first initiates a polishing cycle by activating the vacuum pump and steam generator. Upon expiration of the predetermined duration, the controller activates the blower to dry the exterior and interior surfaces of the glass.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: August 13, 2013
    Inventor: Jeffrey Larson
  • Patent number: 8500988
    Abstract: An ELID honing device includes a honing tool 10 positioned above a workpiece 1 having a hollow cylindrical inner surface, and vertically movable and rotationally drivable about a vertical rotation axis while being rockably suspended from an upper end, and a honing guide 20 positioned in proximity to an upper portion of the workpiece to guide the honing tool to the hollow cylindrical inner surface. The honing tool 10 has a fixed guide 12 having a predetermined radius R from the rotation axis to its outer peripheral surface, and honing stones 14a and 14b having outer peripheral surfaces movable in parallel from a diameter-increased position outside the radius R to a diameter-reduced position inside the radius R and capable of being electrolytically dressed. Further, the honing guide 20 has a hollow cylindrical ELID electrode 22 having an inner surface 22a for guiding an outer peripheral surface of the fixed guide of the honing tool and capable of being subjected to a negative voltage.
    Type: Grant
    Filed: September 8, 2006
    Date of Patent: August 6, 2013
    Assignee: Fuji Jukogyo Kabushiki Kaisha
    Inventors: Weimin Lin, Hitoshi Ohmori, Yasutaka Yamamoto, Jiro Maruyama
  • Publication number: 20130171916
    Abstract: A polishing head that can be disassembled and comprises a polishing cloth 1, sponge 2 and plastic base 3. The polishing cloth 1 is tightly pressed on the plastic base 3 by a sponge 2. The plastic base 3 is divided into one part with male threads and the other part with female threads. The two parts coordinate with each other to achieve dismantling or locking of the cloth and sponge to the base. When the polishing cloth is damaged, the plastic base can be unscrewed to change the damaged polishing cloth, while the base can be reused so as to reduce waste.
    Type: Application
    Filed: December 30, 2011
    Publication date: July 4, 2013
    Inventors: Shi Jian, Zhao Zhigang
  • Publication number: 20130165021
    Abstract: An electrically powered knife sharpener for ceramic (or other brittle, crystalline or amorphous media which could be used for blades) knives includes at least one pre-sharpening stage with a sharpening member(s) and includes a final stage with a sharpening member(s). There are one or more motor driven shafts on which the abrasive surfaced sharpening members, such as disks, are mounted. Guide structure is provided to guide the knife for aligning and positioning the knife facet precisely at a defined location on the abrasive surface of each rotating sharpening member. The pre-sharpening stage sharpening member(s) moves in a first direction. The final stage sharpening member(s) moves in a second direction which differs from the first direction.
    Type: Application
    Filed: December 19, 2012
    Publication date: June 27, 2013
    Applicant: EDGECRAFT CORPORATION
    Inventor: EDGECRAFT CORPORATION
  • Publication number: 20130157547
    Abstract: Disclosed is a blade grinder comprising a blade holder that is mounted so as to be rotatable about a horizontal shaft which is mounted so as to be rotatable about a vertical axis, thus allowing the blade to be optimally adjusted relative to a grinding disk. The grinding disk can preferably be vertically and horizontally moved using spindles. This creates a simple design allowing a lawnmower blade to be ground in a fully automatic manner.
    Type: Application
    Filed: August 3, 2011
    Publication date: June 20, 2013
    Applicant: JOHANNES FRANZEN GMBH & CO. KG
    Inventor: Johannes Franzen
  • Publication number: 20130122613
    Abstract: To provide improved planarization, techniques in accordance with this disclosure include a CMP station that utilizes localized planarization on a wafer. This localized planarization, which is often carried out in a localized planarization station downstream of a CMP station, applies localized planarization to less than the entire face of the wafer to correct localized non-planar features. Other systems and methods are also disclosed.
    Type: Application
    Filed: November 14, 2011
    Publication date: May 16, 2013
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Sheng-Chen Wang, Feng-Inn Wu
  • Publication number: 20130115862
    Abstract: Embodiments of the invention provide polishing systems for increasing production efficiency, maximizing substrate throughput, and reducing production costs. The polishing systems generally include one or more polishing stations for performing a CMP process and one or more cleaning stations at which post-polishing cleaning is performed. The number of cleaning stations and polishing heads present may be increased depending on the desired substrate throughput or processing time at each polishing station. The number of polishing stations or cleaning stations can also be reduced in order to reduce the footprint of the polishing system. The polishing pads at each polishing station can be adjusted in size to accommodate one or more polishing heads simultaneously depending on substrate throughput and system footprint. Additionally, the polishing pads may be replaced with a fixed abrasive pad, or adapted to polish 450 millimeter substrates.
    Type: Application
    Filed: November 9, 2011
    Publication date: May 9, 2013
    Applicant: APPLIED MATERIALS, INC.
    Inventors: JAGAN RANGARAJAN, Alpay Yilmaz
  • Publication number: 20130052919
    Abstract: A polishing fixture assembly for an optical element includes a first composite panel, a second composite panel, and a core member sandwiched between the first composite panel and the second composite panel and coupling the first composite panel to the second composite panel. At least one mirror mounting insert is coupled to each of the first and second composite panels.
    Type: Application
    Filed: August 25, 2011
    Publication date: February 28, 2013
    Applicants: Space Administrationo
    Inventors: John G. Hagopian, Jason G. Budinoff, Carl R. Strojny
  • Publication number: 20120309266
    Abstract: The present disclosure relates to apparatus for grinding rotary blades, in particular scythe-like blades or circular blades, in particular for machines for slicing food products. The apparatus includes at least one mount for a rotary blade to which the rotary blade can be attached and at least one grinding tool. The grinding tool and the rotary blade attached in the mount are movable relative to one another such that a blade edge extending at the periphery of the rotary blade can be ground by the grinding tool. The apparatus includes a measuring device for determining the extent of the blade edge and a control which is designed to use the determined blade edge extent for controlling the relative movement between the grinding tool and the rotary blade.
    Type: Application
    Filed: June 1, 2012
    Publication date: December 6, 2012
    Applicant: Weber Maschinenbau GmbH Breidenbach
    Inventors: Jens Schroeder, Sabine Spillner, Gerd Lischinski, Maik Herrmann, Thomas Lunow
  • Publication number: 20120302063
    Abstract: A non-polished glass wafer, a thinning system, and a method for using the non-polished glass wafer to thin a semiconductor wafer are described herein. In one embodiment, the glass wafer has a body (e.g., circular body) including a non-polished first surface and a non-polished second surface substantially parallel to each other. In addition, the circular body has a wafer quality index which is equal to a total thickness variation in micrometers plus one-tenth of a warp in micrometers that is less than 6.0.
    Type: Application
    Filed: May 17, 2012
    Publication date: November 29, 2012
    Inventors: Shawn Rachelle Markham, Windsor Pipes Thomas, III
  • Publication number: 20120289128
    Abstract: A chemical mechanical polishing (CMP) system includes a wafer polishing unit comprising a waste liquid sink for receiving a used slurry and a waste slurry drain piping for draining the used slurry; and a post-CMP cleaning unit coupled to the wafer polishing unit such that a used base chemical such as tetramethyl ammonium hydroxide (TMAH) produced from the post-CMP cleaning unit flows toward the wafer polishing unit to frequently wash at least the waste slurry drain piping in a real time fashion on a wafer by wafer basis.
    Type: Application
    Filed: May 11, 2011
    Publication date: November 15, 2012
    Inventors: Li-Chung Liu, Yi-Nan Chen, Hsien-Wen Liu
  • Publication number: 20120258650
    Abstract: An apparatus for grinding a continuously cast slab having a longitudinal axis and a rectangular cross-sectional shape with two opposite wide faces and two opposite narrow faces apparatus has a frame, two transversely spaced grinders carried on the frame, and a holder having two transversely spaced grippers engageable with the opposite faces of the slab in a vertical position with the wide faces of the slab vertical for grinding of the wide faces of the slab by the grinders and in a horizontal position offset by 90° to the vertical position with the wide faces of the slab horizontal for grinding of the narrow faces of the slab.
    Type: Application
    Filed: February 22, 2012
    Publication date: October 11, 2012
    Inventor: Karl Robert HOFMANN
  • Publication number: 20120238184
    Abstract: A method for providing an edge preparation on a cutting edge of a tool by means of an edge processing operation includes clamping the tool in a processing machine for providing the edge preparation, recording as a reference value the position of the cutting edge to be processed by means of a sensor arranged on the processing machine, carrying out an edge processing operation by means of a preparation tool, recording the position of the cutting edge again by means of the sensor arranged on the processing machine and storing the position as an actual value, monitoring the edge processing operation on the basis of a comparison between the reference value and the actual value, and comparing the actual value with a desired value for material removed on the cutting edge.
    Type: Application
    Filed: February 17, 2012
    Publication date: September 20, 2012
    Inventor: Jürgen Schwägerl
  • Publication number: 20120190275
    Abstract: A displaceable carriage (10) and a linear guide for guiding the carriage, which includes a first guide path slideway (13, 31) and a second guide path slideway (32). To form the first slideway (13, 31), the carriage (10) includes at least one pocket (13), which slides along the first guide path part (31) and can hold lubricant under pressure to create a relieving force on the carriage (10). The second guide path part (32) includes an island-shaped surface to create a frictional force on the carriage (10). A pressure medium held in the at least one pocket (13, 14, 15) creates the relieving force, whereby the first slideway (13, 31) relieves the load on the second slideway (11a, 12a, 12b, 32).
    Type: Application
    Filed: January 18, 2012
    Publication date: July 26, 2012
    Inventors: Adrian AESCHLIMANN, Andreas SENN, Reto ZWAHLEN
  • Publication number: 20120171932
    Abstract: A method and apparatus for removing residue from an edge of an item are disclosed. The method and apparatus are well-suited to assist in reconditioning used shelving units or deck units for store displays. In various embodiments, ticket holders are removed from the ticket edges of the units. Each unit is then placed on a conveyor and aligned with a guide edge. Optionally, magnets may hold each unit in place on the conveyor. The conveyor moves the units along at least one residue removing machine, and ideally, two residue removing or buffing machines in succession. The residue removing machines ideally include a rotating buffing wheel which strips residue such as glue from the ticket edge of the units. A vacuum can be used to collect debris produced from this process. Sensors may be positioned to sense the front edge of each unit and slide each residue removing machine into operating position at the right time once the front edge of each unit is in residue removing position.
    Type: Application
    Filed: December 30, 2010
    Publication date: July 5, 2012
    Inventors: Terry Miller, Robert Wingo, Terry Hufhand
  • Publication number: 20120164925
    Abstract: A system for magnetorheological finishing of a substrate. An integrated fluid management module (IFMM) provides dynamic control of the rheological fluid properties of the MR fluid on a conventional MR finishing apparatus, and dispensing of the fluid to the wheel. A magnetically shielded chamber charged with MR fluid is in contact with the carrier wheel. A transverse line removes the spent MR fluid from the wheel as the ribbon leaves the work zone. Replenishment fluid is added to the chamber via a dripper, and preferably an electric mixer agitates MR fluid in the chamber. A grooved magnetically-shielded insert at the exit of the chamber forms a polishing ribbon on the carrier wheel as the wheel is turned. A sensor sensitive to concentration of magnetic particles provides a signal for control of MR fluid properties, particularly, water content in the MR fluid. Means is provided for cooling fluid within the chamber.
    Type: Application
    Filed: December 23, 2010
    Publication date: June 28, 2012
    Applicant: QED Technologies International, Inc.
    Inventors: William Kordonski, Sergei Gorodkin, Arpad Sekeres
  • Publication number: 20120122378
    Abstract: The invention relates to a grinding head for a grinding machine. The grinding head comprises a tool holder, which in use is moved in a plane, in particular rotated or translated back and forth, by the grinding machine. The grinding head furthermore comprises at least two tools which are connectable to the tool holder by a releasable sticking connection. One of the tools or the tool holder is provided with at least one protrusion and the other one is provided with an associated cavity to lock which extend transverse to said plane of movement of the tool with respect to the tool holder in a direction parallel to said plane when the tool is connected to the tool holder.
    Type: Application
    Filed: January 11, 2012
    Publication date: May 17, 2012
    Inventors: Barry Johannes VAN EIJDEN, Adrianus Gerardes VAN HOUTEN
  • Publication number: 20120122374
    Abstract: A grinding device for the surface treatment of rolls, for example of rolls for machines producing, finishing and/or processing webs, such as paper, cardboard or tissue machines, includes stationary components and mobile components which can be separated from each other. The stationary components include guide rails, which extend substantially in parallel to a roll axis of the roll to be treated and which are connected to a substructure. Thus, the stationary components, such as the guide rails, can remain at the place of use of the rolls, while the components that are mobile or can be transported can be easily separated from the stationary components and can be transported to other locations.
    Type: Application
    Filed: November 15, 2011
    Publication date: May 17, 2012
    Inventors: Jochen Honold, Ulrich Priber, Steffen Ihlenfeldt
  • Publication number: 20120094582
    Abstract: The invention provides a blade sharpening device designed for sharpening a blade for a uniform sharpening of the edge thereof. Generally, the blade sharpening device includes a base, a guide, a carriage, and a blade holder. The blade holder secures the blade while being sharpened. The blade holder is connected to the guide which is movable relative to the base. The base includes a material that receives an impression of a blade to define a blade contour and a grinding medium which provides an abrasive surface. The carriage interacts with the guide to define a sharpening path substantially aligning with the blade contour. The carriage and the guide direct the movement of the abrasive surface along the contour of the blade for a uniform sharpening of the edge thereof.
    Type: Application
    Filed: October 17, 2011
    Publication date: April 19, 2012
    Inventor: Michael Lytinas
  • Publication number: 20110318703
    Abstract: A denture grinding machine includes: a denture-holding table for holding dentures; a grinding tool for grinding the dentures held on the denture-holding table; a main body for holding the grinding tool; a moving mechanism for causing relative movement between the denture-holding table and the main body; and a driving mechanism for relatively driving the main body and the denture-holding table. The moving mechanism moves relatively the denture-holding table and the main body in three-dimensional coordinate directions based on grinding portion data, and the grinding tool performs grinding of the denture occlusal surface from a direction perpendicular to the occlusal surface.
    Type: Application
    Filed: June 24, 2011
    Publication date: December 29, 2011
    Inventors: Takeshi MORIYAMA, Yusei Kadobayashi
  • Publication number: 20110300783
    Abstract: The invention relates to a machine and process for grinding dies, in which the work axis (CO) of the plate (2.1) in which the die (1) to be machined is anchored is controlled at all the points of its angular movement, allowing the interpolation of the movements of this work axis (CO) with those of an axis of rotation (BO) and with those of respective axes (X and Z), such that the machines has four axes of interpolation, which allows machining dies (1) with their inner or outer diameter rounded or non-rounded and with their transition between these diameters and the side faces constant or variable by means of a single grinding process.
    Type: Application
    Filed: August 16, 2011
    Publication date: December 8, 2011
    Applicant: DANOBAT, S. COOP.
    Inventor: Andoni ARAMBURU LASA
  • Publication number: 20110287696
    Abstract: An apparatus for machining a spectacle lens by abrasion of material in the area of a joining surface to be formed is provided. The apparatus comprises a tool provided with a cutting end face whose axis of rotation is movable in a forward direction relative to a holding device and covers a reference plane. The holding device comprises a support surface, a contact surface aligned perpendicularly thereto and a stop edge. The support surface and the contact surface extend perpendicularly to the reference plane and the stop edge extends perpendicularly to the support surface and in parallel to the reference plane and has a distance from the reference plane which is variable. The support surface is interrupted such that the projecting end face of the tool can be moved along the interruption. When provided at its machining position the lens rests on the support surface, contacts the contact surface and abuts with its edge against the stop edge.
    Type: Application
    Filed: January 19, 2011
    Publication date: November 24, 2011
    Inventors: Robert Anton Baumgartner, Erwin Rinnerthaler