Abstract: A constitution of cover glass, the compositions consist in terms of weight % on the oxide basis, of from 64 to 69 wt. % of SiO2; from 7 to 11.5 wt. % of Al2O3; from 1.5 to 2.5 wt. % of B2O3; from 4.5 to 7.5 wt. % of MgO; 0%<CaO?2.5%; 0%<ZnO?2%; 0%<ZrO2?0.2%; 0%<TiO2?1%; from 14.5 to 16.5 wt. % of Na2O; from 1 to 4 wt. % of K2O; and 0%<SnO2?0.4%. The constitution then can be melted to form cover glass. Thereafter, the cover glass is dipped in KNO3 solution so that sodium ions, which is smaller in volume, contained in certain depth from the surface layer of the cover glass can be substituted by potassium ions, which is larger in volume. In this manner, squeezing effect is generated on the surface layer so as to form cover glass having high strength and resistance in both abrasion and scratch.

Abstract: An alkali-free glass of the present invention comprises, as a glass composition expressed in terms of oxides by mass %, 45 to 70% of SiO2, 10 to 30% of Al2O3, 11 to 20% of B2O3, less than 0.1% of As2O3, less than 0.1% of Sb2O3, and less than 0.1% of an alkali metal oxide, and has a thermal expansion coefficient (30 to 380° C.) of 30 to 35×10?7/° C.

Abstract: The invention provides a silica-alumina-sodium oxide glass easy to melt and suitable for a low temperature ion exchange process. The glass is suitable for chemical tempering and consists of 55-60 wt % of SiO2, 0.1-2.5 wt % of B2O3, 11-16 wt % of Al2O3, 14-17 wt % of Na2O, 1-8 wt % of K2O, 0-8 wt % of ZrO2, 0-5 wt % of CaO, 0-5 wt % of MgO and 0-1 wt % of Sb2O3. By reasonably setting the composition, the difficulty in glass production decreases and the glass melting temperature is reduced obviously, which is favorable to reduce energy consumption and improve yield of products. Under the condition that tempering temperature is 380?-500? and tempering time is 4-12 h, the surface compressive stress can be 610-1100 Mpa, the depth of a stress layer can be 31-80 ?m, and the glass is reinforced and has high shock resistance. The glass of the invention has high wear resistance and can be used as a protective glass material of high-grade electronic display products such as mobile phones and PDAs.

Abstract: A glass substrate for p-Si TFT flat panel displays that is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. A method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.

Abstract: A flat panel display glass substrate according to the present invention includes a glass comprising, as expressed in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), and substantially no As2O3, and Sb2O3. The devitrification temperature of the glass is 1250° C. or less. The glass substrate has a heat shrinkage rate of 75 ppm or less. The heat shrinkage rate is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a temperature rising and falling rate of 10° C./min and at 550° C. for 2 hours by the heat shrinkage rate (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×106.

Abstract: The invention relates to a Nd-doped, aluminate-based or silicate-based, laser glass having a peak emission wavelength that is longer than 1059.7 nm, an emission cross section (?em) of ?1.5×10?20 cm2, and/or an emission bandwidth (??eff) of ?28 nm, while maintaining properties that render the glass suitable for commercial use, such as low glass transition temperature Tg and low nonlinear index, n2.

Abstract: A glass substrate contains specific contents of SiO2, Al2O3, B2O3, MgO, CaO, SrO, BaO, ZrO2, Na2O, K2O and Li2O. The glass substrate has a glass transition temperature of 580 to 720° C., an average coefficient of thermal expansion at 50 to 350° C. of 65×10?7 to 85×10?7/° C., a compaction (C) of 15 ppm or less, a glass surface devitrification temperature Tc of 900 to 1,300° C., a glass internal devitrification temperature Td of 900 to 1,300° C., a temperature T4 at which a viscosity reaches 104 dPa·s of 1,100 to 1,350° C., a relationship (T4?Tc) of ?50 to 350° C. and a relationship (T4?Td) of ?50 to 350° C.

Abstract: An ion exchangeable glass having a high degree of resistance to damage caused by abrasion, scratching, indentation, and the like. The glass comprises alumina, B2O3, and alkali metal oxides, and contains boron cations having three-fold coordination. The glass, when ion exchanged, has a Vickers crack initiation threshold of at least 10 kilogram force (kgf).

Abstract: The present disclosure relates to glass articles for use as a touchscreen substrate or cover glass article for use in a portable electronic device, particularly an aluminoborosilicate glass being substantially free of alkalis, comprising at least 55 mol % SiO2, at least 5 mol % Al2O3 and at least one alkaline earth RO component. The alkali-free aluminoborosilicate exhibits an Al2O3+B2O3 to RO mol % ratio which exceeds 1 and an Al2O3 to RO mol % ratio which exceeds 0.65. The aluminoborosilicate glasses disclosed herein exhibits high damage resistance as evidenced by a Vickers median/radial crack initiation load which is greater than than 1000 gf, as well as a high scratch resistance of at least 900 gf, as measured by the lack of the presence of lateral cracks when a load is applied by a moving Knoop indenter.

Abstract: A glass substrate for a CdTe solar cell includes a base composition includes, in terms of mol % on a basis of following oxides: from 60 to 75% of SiO2; from 1 to 7.5% of Al2O3; from 0 to 1% of B2O3; from 8.5 to 12.5% of MgO; from 1 to 6.5% of CaO; from 0 to 3% of SrO; from 0 to 3% of BaO; from 0 to 3% of ZrO2; from 1 to 8% of Na2O; and from 2 to 12% of K2O, wherein MgO+CaO+SrO+BaO is from 10 to 24%, Na2O+K2O is from 5 to 15%, MgO/Al2O3 is 1.3 or more, (2Na2O+K2O+SrO+BaO)/(Al2O3+ZrO2) is 3.3 or less, Na2O/K2O is from 0.2 to 2.0, Al2O3??0.94MgO+11, and CaO?0.48MgO+6.5.

Abstract: Provided is an alkali-free glass, comprising, as a glass composition in terms of mass %, 55 to 80% of SiO2, 10 to 25% of A12O3, 2 to 5.5% of B2O3, 3 to 8% of MgO, 3 to 10% of CaO, 0.5 to 5% of SrO, and 0.5 to 7% of BaO, having a molar ratio MgO/CaO of 0.5 to 1.5, being substantially free of alkali metal oxides, and having a Young's modulus of more than 80 GPa.

Abstract: A method of bonding a first substrate to a second substrate includes providing a glass, applying the glass in a layer between the first and second substrates to form an assembly, and heating the assembly to a bonding temperature above a glass transition temperature of the devitrifying glass, selected to cause the glass to bond the first substrate to the second substrate. The devitrifying glass has constituents that include various amounts of group A in a molar concentration of 70-95%, group B in a molar concentration of 5-20%, group C in a molar concentration of 1-20%, group D in a molar concentration of 0-6%; and group E in a molar concentration of 0-10%. The group A, B, C, D and E groups are disclosed herein.

Abstract: An ion exchangeable glass having a high degree of resistance to damage caused by abrasion, scratching, indentation, and the like. The glass comprises alumina, B2O3, and alkali metal oxides, and contains boron cations having three-fold coordination. The glass, when ion exchanged, has a Vickers crack initiation threshold of at least 10 kilogram force (kgf).

Abstract: Alkali aluminosilicate glasses that are resistant to damage due to sharp impact and capable of fast ion exchange are provided. The glasses comprise at least 4 mol % P2O5 and, when ion exchanged, have a Vickers indentation crack initiation load of at least about 7 kgf.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess excellent compaction and stress relaxation properties.

Abstract: Transparent, essentially colorless ?-quartz glass-ceramic materials, the composition of which is free of As2O3 and of Sb2O3, where said composition contains a specific combination of three nucleating agents: TiO2, ZrO2 and SnO2; TiO2 being present in low quantity.

Abstract: A tempered glass of the present invention includes, as a glass composition, in terms of mass %, 45 to 75% of SiO2, 0 to 30% of Al2O3, and 0 to 30% of Li2O+Na2O+K2O and has a ?-OH value of 0.3 to 1/mm.

Abstract: A glass substrate for a display, which is formed of a glass having a light weight and having high refinability with decreasing environmental burdens, the glass comprising, by mass %, 50 to 70% of SiO2, 5 to 18% of B2O3, 10 to 25% of Al2O3, 0 to 10% of MgO, 0 to 20% of CaO, 0 to 20% of SrO, 0 to 10% of BaO, 5 to 20% of RO (in which R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba), and over 0.20% but not more than 2.0% of R?2O (in which R? is at least one member selected from the group consisting of Li, Na and K), and containing, by mass %, 0.05 to 1.5% of oxide of metal that changes in valence number in a molten glass, and substantially containing none of As2O3, Sb2O3 and PbO.

Abstract: It is an object of the present invention to provide a crystallized glass which has various properties required for employing the substrate for information recording medium of the next generation, and also has significantly low specific gravity; and a crystallized glass substrate for information recording medium. A crystallized glass containing, as a crystal phase, one or more selected from RAl2O4 and R2TiO4 (wherein R is one or more selected from Mg and Fe), the crystallized glass comprising the components of SiO2 of 50% to 70%, Al2O3 of 10% to 26%, TiO2 of 1 to 15%, MgO of 2.5% to 25%, FeO of 0% to 8%, and ZnO of 0% to less than 2%, expressed in terms of mass percentage on an oxide basis, wherein the value of (Al2O3+MgO)/SiO2 is 0.30 or more and 0.65 or less, and a specific gravity is less than 2.63.

Abstract: An ion exchangeable glass having a high degree of resistance to damage caused by abrasion, scratching, indentation, and the like. The glass comprises alumina, B2O3, and alkali metal oxides, and contains boron cations having three-fold coordination. The glass, when ion exchanged, has a Vickers crack initiation threshold of at least about 30 kilogram force.

Abstract: Disclosed are a glass substrate for an information recording medium, having excellent scratch resistance and a light weight and having high fracture toughness, the glass substrate having a fragility index value, measured in water, of 12 ?m?1/2 or less or having a fragility index value, measured in an atmosphere having a dew point of ?5° C. or lower, of 7 ?m?1/2 or less, or the glass substrate comprising, by mol %, 40 to 75% of SiO2, 2 to 45% of B2O3 and/or Al2O3 and 0 to 40% of R?2O in which R? is at least one member selected from the group consisting of Li, Na and K), wherein the total content of SiO2, B2O3, Al2O3 and R?2O is at least 90 mol %, and a magnetic information recording medium comprising a magnetic recording layer formed on the glass substrate.

Abstract: There is provided a glass for chemical strengthening having a black color tone and excelling in characteristics preferred for the purposes of housing or decoration of an electronic device, that is, bubble quality, strength, and light transmittance characteristics. A glass for chemical strengthening contains, in mole percentage based on following oxides, 55% to 80% of SiO2, 3% to 16% of Al2O3, 0% to 12% of B2O3, 5% to 16% of Na2O, 0% to 4% of K2O, 0% to 15% of MgO, 0% to 3% of CaO, 0% to 18% of ?RO (where R represents Mg, Ca, Sr, Ba or Zn), 0% to 1% of ZrO2, and 0.1% to 7% of a coloring component having at least one metal oxide selected from the group consisting of oxides of Co, Mn, Fe, Ni, Cu, Cr, V and Bi.

Abstract: Crystallizable glasses, glass-ceramics, IXable glass-ceramics, and IX glass-ceramics are disclosed. The glass-ceramics exhibit ?-spodumene ss as the predominant crystalline phase. These glasses and glass-ceramics, in mole %, include: 62-75 SiO2; 10.5-17 Al2O3; 5-13 Li2O; 0-4 ZnO; 0-8 MgO; 2-5 TiO2; 0-4 B2O3; 0-5 Na2O; 0-4 K2O; 0-2 ZrO2; 0-7 P2O5; 0-0.3 Fe2O3; 0-2 MnOx; and 0.05-0.2 SnO2. Additionally, these glasses and glass-ceramics exhibit the following criteria: a. a ratio: [ Li 2 ? O + Na 2 ? O + K 2 ? O + MgO + ZnO ] [ Al 2 ? O 3 + B 2 ? O 3 ] between 0.7 to 1.5; b. a ? ? ratio ? : ? [ TiO 2 + SnO 2 ] [ SiO 2 + B 2 ? O 3 ] greater than 0.04. Furthermore, the glass-ceramics exhibit an opacity ?about 85% over the wavelength range of 400-700 nm for an about 0.

Abstract: According to one embodiment, a glass article may include SiO2, Al2O3, Li2O and Na2O. The glass article may have a softening point less than or equal to about 810° C. The glass article may also have a high temperature CTE less than or equal to about 27×10?6/° C. The glass article may also be ion exchangeable such that the glass has a compressive stress greater than or equal to about 600 MPa and a depth of layer greater than or equal to about 25 ?m after ion exchange in a salt bath comprising KNO3 at a temperature in a range from about 390° C. to about 450° C. for less than or equal to approximately 15 hours.

Abstract: A fusion formable and ion exchangeable silicate glass having a seed concentration of less than about 1 seed/cm3.

Abstract: The present invention provides a lead-free glass for semiconductor encapsulation, which can encapsulate semiconductor devices at a low temperature, has an excellent acid durability and hardly precipitates crystals when forming a glass tube, and an encapsulator for semiconductor encapsulation made of the glass. The glass comprises, as a glass composition, from 45 to 58% of SiO2, from 0 to 6% of Al2O3, from 14.5 to 30% of B2O3, from 0 to 3% of MgO, from 0 to 3% of CaO, from 4.2 to 14.2% of ZnO, from 5 to 12% of Li2O, from 0 to 15% of Na2O, from 0 to 7% of K2O, from 15 to 30% of Li2O+Na2O+K2O, and from 0.1 to 8% of TiO2, in terms of % by mol, wherein a ratio of ZnO to Li2O is in the range from 0.84 to 2.

Abstract: Disclosed are a glass composition and a dielectric composition enabling low temperature sintering, and a high capacitance multilayer ceramic capacitor using the same. In the glass composition used for sintering, the glass composition may be formed of a formula, aR2O-bCaO-cZnO-dBaO-eB2O3-fAl2O3-gSiO2, and the formula may satisfy a+b+c+d+e+f+g=100, 0?a?7, 1?b?3, 1?c?15, 10?d?20, 3?e?10, 0?f?3, and 55?g?72. Through this, when manufacturing the high capacity multilayer ceramic capacitor, the dielectric substance may enable the lower temperature sintering, thereby enhancing a capacitance and a reliability of the high capacitance multilayer ceramic capacitor.

Abstract: Disclosed are alkali-free glasses having a liquidus viscosity of greater than or equal to about 90,000 poises, said glass comprising SiO2, Al2O3, B2O3, MgO, CaO, and SrO such that, in mole percent on an oxide basis: 64?SiO2?68.2; 11?Al2O3?13.5; 5?B2O3?9; 2?MgO?9; 3?CaO?9; and 1?SrO?5. The glasses can be used to make a display glass substrates, such as thin film transistor (TFT) display glass substrates for use in active matrix liquid crystal display devices (AMLCDs) and other flat panel display devices.

Abstract: A glass substrate for a CIGS solar cell containing specific amounts of SiO2, Al2O3, B2O3, MgO, CaO, SrO, BaO, ZrO2, TiO2, Na2O and K2O, respectively. The glass substrate satisfies the specific requirements regarding MgO+CaO+SrO+BaO, Na2O+K2O, MgO/Al2O3, (2Na2O+K2O+SrO+BaO)/(Al2O3+ZrO2), Na2O/K2O, the relation of Al2O3 and MgO, and the relation of CaO and MgO, respectively. The glass substrate has a glass transition temperature of 640° C. or higher, an average coefficient of thermal expansion within a range of 50 to 350° C. of 70×10?7 to 90×10?7/° C., the temperature (T4) of 1,230° C. or lower, the temperature (T2) of 1,650° C. or lower, and a density of 2.7 g/cm3 or less. The glass substrate satisfies the relationship of T4?TL??30° C.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess good dimensional stability as a function of temperature. The glasses comprise in mol percent on an oxide basis: 70-74.5 SiO2, 10.5-13.5 AL2O3, 0-2.5 B2O3, 3-7 MgO, 3-7 CaO, 0-4 SrO, 1.5-6 BaO, 0-0.3 SnO2, 0-03 CeO2, 0-0.5 As2O3, 0-0.5 Sb2O3, 0.01-0.08 Fe2O3 and F+Cl+BrRO/Al2O31.7 and 0.2MgO/RO0.45, RO being the sum of MgO, BaO, SrO and CaO.

Abstract: Provided is a glass composition suitable for a glass substrate for a flat panel display such as a liquid crystal display. This glass composition has high thermal stability, and is substantially free of BaO but has a low devitrification temperature. It is suitable for the production of a glass substrate by a downdraw process. This glass composition contains, in terms of mass %; 54 to 62% of SiO2; 4 to 11% of B2O3; 15 to 20% of Al2O3; 2 to 5% of MgO; 0 to 7% of CaO; 0 to 13.5% of SrO; 0 to 1% of K2O; 0 to 1% of SnO2; and 0 to 0.2% of Fe2O3, and is substantially free of BaO. In this glass composition, the total content of alkaline earth metal oxides (MgO+CaO+SrO) is 10 to 18.5 mass %. The devitrification temperature of the glass composition is 1200° C. or lower.

Abstract: A glass for a light guide fiber GA1 is used in a core of a fiber 10 of a light guide, and has a refractive index nd between 1.56 and 1.74. The glass for a light guide fiber GA1 has the following composition: (A) SiO2: 20 to 55 wt %, (B11) B2O3: 0 to 2.0 wt %, (B2) does not contain P2O5 and GeO2, (C1) (BaO+SrO+La2O3+Lu2O3+Ta2O5+Gd2O3+WO3): 39 to 46 wt %, (D1) ZnO: 4 to 16 wt %, (E) does not contain Al2O3, (F) does not contain ZrO2, (G) does not contain PbO and As2O3, (H1) (Na2O+K2O): 4 to 10 wt %, (I) Sb2O3: 0 to 0.050 wt %, and (J1) (Na2SO4+K2SO4): 0.32 to 0.78 wt %.

Abstract: A glass substrate for a Cu—In—Ga—Se solar cell. The glass substrate contains specific oxides with the specific amounts, respectively. The glass substrate has a glass transition temperature of from 650 to 750° C., an average coefficient of thermal expansion within a range of from 50 to 350° C. of from 75×10?7 to 95×10?7/° C., a relationship between a temperature (T4), at which a viscosity reaches 104 dPa·s, and a devitrification temperature (TL) of T4?TL??30° C., a density of 2.6 g/cm3 or less, and a brittleness index of less than 7,000 m?1/2.

Abstract: Provided is a high refractive index glass, comprising, as a glass composition in terms of mass %, 0.1 to 60% of SiO2+Al2O3+B2O3, having a mass ratio (BaO+La2O3+Nb2O5+TiO2+ZrO2)/(SiO2+Al2O3+B2O3) of 0.1 to 50, amass ratio (MgO+CaO+SrO+BaO)/(BaO+La2O3+Nb2O5+TiO2+ZrO2) of 0 to 10, and a mass ratio (TiO2+ZrO2)/(BaO+La2O3+Nb2O5) of 0.001 to 40, and having a refractive index nd of 1.55 to 2.3.

Abstract: Provided is a Li2O—Al2O3—SiO2-based crystallizable glass characterized by comprising, as a glass composition in terms of mass %, 55 to 75% of SiO2, 19 to 24% of Al2O3, 3 to 4% of Li2O, 1.5 to 2.8% of TiO2, 3.8 to 4.8% of TiO2+ZrO2, and 0.1 to 0.5% of SnO2, and satisfying a relationship of 4?Li2O+0.741MgO+0.367ZnO?4.5.

Abstract: Glass compositions that may be used to produce chemically strengthened glass sheets by ion exchange. The glass compositions are chosen to promote simultaneously high compressive stress and deep depth of layer or, alternatively, to reduce the time needed to ion exchange the glass to produce a predetermined compressive stress and depth of layer.

Abstract: An alkali-free glass for flat panel display consists of, by weight, 54-68% SiO2, 10.8-17.1% Al2O3, 7.6-12.5% B2O3, 0.2-1.8% MgO, 4.2-8% CaO, 0.6-7.1% SrO, 0.1-5% BaO, 0.2-1% ZnO, 0.01-1.54% ZrO2 and 0.1-1.3% SnO+SnO2. The boroaluminosilicate glass of the present invention does not contain As and Sb which contribute to serious environmental pollution. The quality of the glass is improved by the specific process which reduces the content of the gas inclusions in the glass.

Abstract: Titanium oxide containing borosilicate glasses, which have been produced without the use of arsenic and antimony compounds, are provided. An environmentally friendly refining method for providing titanium oxide containing borosilicate glass is also provided. The method includes using oxygen containing selenium compounds as refining agents to provide glasses with good transmittance values in the infrared range and show no disturbing discolorations. The glasses of the present disclosure are particularly suitable for the production of IR light conductors, cover glasses for photo sensors, and UV filters.

Abstract: Disclosed are a glass composition and a dielectric composition enabling low temperature sintering, and a high capacitance multilayer ceramic capacitor using the same. In the glass composition used for sintering, the glass composition may be formed of a formula, aR2O-bCaO-cZnO-dBaO-eB2O3-fAl2O3-gSiO2, and the formula may satisfy a+b+c+d+e+f+g=100, 0?a?7, 1?b?3, 1?c?15, 10?d?20, 3?e?10, 0?f?3, and 55?g?72. Through this, when manufacturing the high capacity multilayer ceramic capacitor, the dielectric substance may enable the lower temperature sintering, thereby enhancing a capacitance and a reliability of the high capacitance multilayer ceramic capacitor.

Abstract: A device including a glass substrate made of a soda lime silica glass composition of: SiO2 (50˜75 wt %); Na2O (1˜8 wt %); K2O (1˜12 wt %); CaO (1˜12 wt %); ZrO2 (0˜8 wt %); SrO (0˜15 wt %); BaO (0˜12 wt %); MgO (0˜10 wt %); Al2O3 (0˜12 wt %); B2O3 (0˜3 wt %), wherein the total amount of Na2O and K2O is in the range of 5˜15 wt %, the total amount of CaO, MgO, SrO and BaO is in the range of 10˜25 wt %.

Abstract: A glass composition for protecting a semiconductor junction contains at least SiO2, Al2O3, MO, and nickel oxide, and substantially contains none of Pb, P, As, Sb, Li, Na and K (M in MO indicates one of alkali earth metals).

Abstract: An alkali-free glass characterized by having a glass composition being substantially free of an alkali metal oxide, As2O3 and Sb2O3 and including, in terms of mol %, 55 to 75% of SiO2, 7 to 15% of Al2O3, 7 to 12% of B2O3, 0 to 3% of MgO, 7 to 12% of CaO, 0 to 5% of SrO, 0 to 2% of BaO, 0 to 5% of ZnO and 0.01 to 1% of SnO2 and has a liquidus viscosity of 105.2 dPa·s or higher and a temperature corresponding to a viscosity of 102.5 dPa·s of 1,550° C. or lower.

Abstract: Aluminoborosilicate glasses which may be useful in photovoltaic, photochromic, electrochromic, or Organic Light Emitting Diode (OLED) lighting applications are described.

Abstract: A technical object of the present invention is to satisfy various properties required in glass for liquid crystal displays and the like, in particular, fusibility, devitrification resistance, and like properties, and then to design a glass composition in which components harmful to the environment are reduced or substantially not contained, thereby obtaining a glass substrate that takes the environment into consideration. An alkali-free glass of the present invention contains the following glass composition in percent by weight based on oxide: 50 to 70% of SiO2, 10 to 20% of Al2O3, 8 to 12% of B2O3, 0 to 3% of MgO, 4 to 15% of CaO, 0 to 10% of SrO, 0 to 1% of BaO, and 0 to 5% of ZnO, and substantially free of alkali metal oxide and As2O3.

Abstract: A glass for a display substrate composed of 50 to 70% SiO2, 10 to 25% Al2O3, 8.4 to 20% B2O3, 0 to 10% MgO, 6 to 15% CaO, 0 to 10% BaO, 0 to 10% SrO, 0 to 10% ZnO, 0 to 5% TiO2, 0 to 5% P2O5, 0.01 to 0.2% alkali metal, and from 0.01% to less than 0.4% ZrO2, as expressed in % by mass. The glass can have a ?-OH value of 0.20/mm or more and an area of 0.1 m2 or more. The glass is produced by mixing raw materials to provide the SiO2, Al2O3, B2O3, MgO, CaO, BaO, SrO, ZnO, TiO2, P2O5 and alkali metal contents, electrically melting the raw materials in a melting furnace constructed of a high zirconia refractory; and refining, homogenizing and forming the glass melt.

Abstract: Provided is a glass composition for protecting a semiconductor junction which contains at least SiO2, Al2O3, ZnO, CaO and 3 mol % to 10 mol % of B2O3, and substantially contains none of Pb, P, As, Sb, Li, Na and K. It is preferable that a content of SiO2 falls within a range of 32 mol % to 48 mol %, a content of Al2O3 falls within a range of 9 mol % to 13 mol %, a content of ZnO falls within a range of 18 mol % to 28 mol %, a content of CaO falls within a range of 15 mol % to 23 mol %, and a content of B2O3 falls within a range of 3 mol % to 10 mol %.

Abstract: A glass composition which is reduced in the amount of residual bubbles and is produced using smaller amounts of an environmentally unfriendly component such as arsenic oxide and antimony oxide. This glass composition comprises, in terms of mass %; 40-70% SiO2; 5-20% B2O3; 10-25% Al2O3; 0-10% MgO; 0-20% CaO; 0-20% SrO; 0-10% BaO; 0.001-0.5% Li2O; 0.01-0.5% Na2O; 0.002-0.5% K2O; and 0-1.0%, excluding 0%, Cl.

Abstract: A flat panel display glass substrate includes a glass comprising, in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO). The contents in mol % of SiO2, Al2O3, and B2O3 satisfy a relationship (SiO2+Al2O3)/(B2O3)=7.5-17. The strain point of the glass is 665° C. or more. The devitrification temperature of the glass is 1250° C. or less. The substrate has a heat shrinkage rate of 75 ppm or less. The rate of heat shrinkage is calculated from the amount of shrinkage of the substrate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by the rate of heat shrinkage (ppm)={the amount of shrinkage of the substrate after the heat treatment/the length of the substrate before the heat treatment}×106.

Abstract: The invention relates to an alumino-silicate glass which has a thermal expansion coefficient in the range of 8 to 10×10?6/K in a temperature range of 20 to 300° C., a transformation temperature Tg in a range of 580° C. to 640° C., and a processing temperature VA in a range of 1065° C. to 1140° C. and which can therefore be used as an alternative for soda lime glasses. An object of the invention is also the use of the inventive glasses in applications where a high temperature stability of the glasses is advantageous, in particular as substrate glass, superstrate glass and/or cover glass in the field of semiconductor technology, preferably for Cd—Te or for CIS or CIGS photovoltaic applications and for other applications in solar technology.

Abstract: Transparent, essentially colorless ?-quartz glass-ceramic materials, the composition of which is free of As2O3 and of Sb2O3, where said composition contains a specific combination of three nucleating agents: TiO2, ZrO2 and SnO2; TiO2 being present in low quantity.