Abstract: The present invention relates to the use of selective insecticidal compositions, characterized by an effective amount of an active compound combination comprising (a) (1) at least one haloalkylnicotinic acid derivative of the formula (I) in which AA and R1A are as defined in the description, or (2) at least one phthalic acid diamide of the formula (II) in which XB, R1B, R2B, R3B, L1B, L2B and L3B are as defined in the description, or (3) at least one anthranilamide of the formula (III) in which A1C, A2C, XC, R1C, R2C, R3C, R4C, R5C, R7C, R8C and R9C are as defined in the description, and (b) at least one crop plant compatibility-improving compound from the group of compounds given in the description, in particular cloquintocet-mexyl, isoxadifen-ethyl and mefenpyr-diethyl for controlling insects and/or arachnids, and a method for controlling insects and/or arachnids using the compositions.

Abstract: Solid mixtures comprising a) an active ingredient from the group of the sulfonylureas and b) a sulfate- or sulfonate-containing surfactant.

Abstract: This invention provides a weed growth inhibitor composition for a lawn grass or an upland farm, comprising an effective amount of 1-(2-chlorobenzyl)-3-(1-methyl-1-phenylethyl)urea (cumyluron) along with a carrier, and a method for inhibiting the growth of weeds, comprising application of the weed growth inhibitor composition to an upland farm or turf.

Abstract: Compositions containing one or more surfactants in combination with sulfuric acid and one or more of certain chalcogen-containing compounds in which the chalcogen compound/H.sub.2 SO.sub.4 molar ratio is below 2. These compositions contain the mono-adduct of sulfuric acid which is herbicidally active for controlling vegetation. Suitable chalcogen-containing compounds have the empirical formula ##STR1## wherein X is a chalcogen, each of R.sub.1 and R.sub.2 is independently selected from hydrogen, NR.sub.3 R.sub.4, and NR.sub.5, at least one of R.sub.1 and R.sub.2 is other than hydrogen, each of R.sub.3 and R.sub.4 is hydrogen or a monovalent organic radical, and R.sub.5 is a divalent organic radical. The surfactant-containing compositions are particularly useful for the treatment of materials containing lipophilic substances.