Abstract: A substrate processing system for processing a substrate within a processing chamber is provided and includes a source terminal, a substrate support, and a tuning circuit. The substrate support holds the substrate and includes first and second electrodes, which receive power from a power source via the source terminal. The tuning circuit is connected to the first electrode or the second electrode. The tuning circuit is allocated for tuning signals provided to the first electrode. The tuning circuit includes at least one of a first impedance set or a second impedance set. The first impedance set is serially connected between the first electrode and the power source and receives a first signal from the power source via the source terminal. The second impedance set is connected between an output of the power source and a reference terminal and receives the first signal from the power source via the source terminal.

Abstract: Improved silica-based matting agents are disclosed. The matting agents are useful in waterborne coatings composition to provide exceptional properties to a wood based substrate. Films resulting from the silica-based matting agents on a wood substrate unexpectedly provide improved chemical resistance and/or film clarity to the surface of the wood substrate. Methods of making and using the matting agents are also disclosed.

Abstract: A fixed abrasive article having a body including abrasive particles contained within a bond material, the abrasive particles including shaped abrasive particles or elongated abrasive particles having an aspect ratio of length:width of at least 1.1:1, each of the shaped abrasive particles or elongated abrasive particles having a predetermined position or a predetermined three-axis orientation.

Abstract: An abrasive article including a substrate; and an abrasive layer overlying the substrate, where the abrasive layer includes a blend of abrasive particles including a first type of abrasive particle comprising a polycrystalline material and having a first average friability F1, and a second type of abrasive particle comprising a polycrystalline material and having a second average friability, F2, where the blend comprises an average friability difference, ?F=|F1?F2|, within a range of at least 0.5% to not greater than 80%.

Abstract: An abrasive article including a bonded abrasive body having a bond material including an inorganic material, abrasive particles contained within the bond material of the bonded abrasive body, porosity within a range of at least 55 vol % to not greater than 90 vol % for a total volume of the bonded abrasive body, and a Solid Phase Variation of not greater than 45%.

Abstract: Improved silica based matting agents are disclosed. The matting agents are useful in waterborne coatings composition to provide exceptional properties to a wood based substrate. Films resulting on the coated substrate unexpectedly provide improved chemical resistance, thermal stress resistance, weather resistance, and/or film clarity to the surface of a wood substrate. Methods of making and using the matting agents are also disclosed.

Abstract: A method of making an optical film for control of light includes positioning a first mixture on a substrate, wherein the first mixture includes a first plurality of magnetizable particles dispersed in a first resin, assembling the first plurality of magnetizable particles into a desired structure for the control of the light by rotating modulation of at least a first magnetic field relative to the first plurality of magnetizable particles, and vitrifying the first resin while the first plurality of magnetizable particles are in the desired structure.

Abstract: Embodiments described herein relate to integrated abrasive (IA) polishing pads, and methods of manufacturing IA polishing pads using, at least in part, surface functionalized abrasive particles in an additive manufacturing process, such as a 3D inkjet printing process. In one embodiment, a method of forming a polishing article includes dispensing a first plurality of droplets of a first precursor, curing the first plurality of droplets to form a first layer comprising a portion of a sub-polishing element, dispensing a second plurality of droplets of the first precursor and a second precursor onto the first layer, and curing the second plurality of droplets to form a second layer comprising portions of the sub-polishing element and portions of a plurality of polishing elements. Here, the second precursor includes functionalized abrasive particles having a polymerizable group chemically bonded to surfaces thereof.

Abstract: A formulation, system, and method for additive manufacturing of a polishing pad. The formulation includes monomer, dispersant, and nanoparticles. A method of preparing the formulation includes adding a dispersant that is a polyester derivative to monomer, adding metal-oxide nanoparticles to the monomer, and subjecting the monomer having the nanoparticles and dispersant to sonication to disperse the nanoparticles in the monomer.

Abstract: The present disclosure provides a polishing pad, which may maintain polishing performances required for a polishing process, such as a removal rate and a polishing profile, minimize defects that may occur on a wafer during the polishing process, and polish layers of different materials so as to have the same level of flatness even when the layers are polished at the same time, and a method for producing the polishing pad. In addition, according to the present disclosure, it is possible to determine a polishing pad, which shows an optimal removal rate selectivity along with excellent performance in a CMP process, through the physical property values of the polishing pad without a direct polishing test.

Abstract: A production line of a CA abrasive, including: a belt mold, the belt mold being provided with a cavity; a transmission device, configured to drive the belt mold to run; a slurry coating mechanism, configured to coat a slurry on a surface and into the cavity of the belt mold; a slurry scraping mechanism, configured to scrap the slurry coated on the surface of the belt mold into the cavity; a drying mechanism, configured to dry the belt mold so that the slurry is dried and precipitated into abrasive grains; a separation mechanism, arranged below the drying mechanism and configured to shake down the abrasive grains in the cavity of the belt mold by vibrating; a sweeping mechanism, configured to sweep slurry fragments of the belt mold after separation; and a release agent coating mechanism, configured to spray a release agent to the swept belt mold.

Abstract: The present invention provides a method for producing an oxymethylene copolymer resin composition, comprising: adding to an oxymethylene copolymer (A), an Mn micromole of an amine-substituted triazine compound (B) per gram of the oxymethylene copolymer (A), an Mc micromole of a choline hydroxide (C) per gram of the oxymethylene copolymer (A), and 0.05 to 1.1 parts by weight of an antioxidant (D) with respect to 100 parts by weight of the oxymethylene copolymer (A), and melt kneading a mixture of the oxymethylene copolymer (A), amine-substituted triazine compound (B), the choline hydroxide (C), and the antioxidant (D), wherein Mn (?mol/g-POM) and Mc (?mol/g-POM) satisfy: 6.5<(Mn+Mc×8)<25, 0.5<Mn<7.0, and 0.0<Mc.

Abstract: CMP polishing pads or layers made from a polyurethane reaction product of a reaction mixture comprising (i) a liquid aromatic isocyanate component comprising one or more aromatic diisocyanates or a linear aromatic isocyanate-terminated urethane prepolymer, and (ii) a liquid polyol component comprising a) one or more polymeric polyols, b) from 12 to 40 wt. %, based on the total weight of the liquid polyol component, of a curative mixture of one or more small chain difunctional polyols having from 2 to 9 carbon atoms, a liquid aromatic diamine, wherein the mole ratio of the total moles of hydroxyl and amino moieties in the liquid polyol, small chain difunctional polyols and liquid aromatic diamine to mole of isocyanate in the aromatic diisocyanates or linear aromatic isocyanate-terminated urethane prepolymer ranges from 1.0:1.0 to 1.15:1.0.

Abstract: CMP polishing pads or layers made from a polyurethane reaction product of a reaction mixture comprising (i) a liquid aromatic isocyanate component comprising one or more aromatic diisocyanates or a linear aromatic isocyanate-terminated urethane prepolymer, and (ii) a liquid polyol component comprising a) one or more polymeric polyols, b) from 12 to 40 wt. %, based on the total weight of the liquid polyol component, of a curative mixture of one or more small chain difunctional polyols having from 2 to 9 carbon atoms, a liquid aromatic diamine, wherein the mole ratio of the total moles of hydroxyl and amino moieties in the liquid polyol, small chain difunctional polyols and liquid aromatic diamine to mole of isocyanate in the aromatic diisocyanates or linear aromatic isocyanate-terminated urethane prepolymer ranges from 1.0:1.0 to 1.15:1.0.

Abstract: Various embodiments disclosed relate to pore inducers and porous abrasive forms made using the same. In various embodiments, the present invention provides a method of forming a porous abrasive form including heating an abrasive composition including pore inducers to form the porous abrasive form. During the heating the pore inducers in the porous abrasive form reduce in volume to form induced pores in the porous abrasive form.

Abstract: An electrode sheet drying apparatus includes a plurality of hot air blowers each having a nozzle. The nozzle has a first hot air guide having a first guide surface, a second hot air guide having a second guide surface. The nozzle is configured to blow band hot air toward an obliquely upstream side. An angle formed between the first guide surface and an undried active material layer is set to an angle at which the band hot air travels toward an upstream side along the undried active material layer over a distance longer than or equal to 15 times as large as a gap from a first upstream-side edge to the undried active material layer even without a spread prevention part.

Abstract: A crosslinkable elastomer composition including a crosslinkable elastomer and a surface-oxidized non-oxide ceramic. Also disclosed is a fluoroelastomer molded article having a weight reduction percentage of 2.5% by mass or less and an amount of particles generated of 0.05% by mass or less after O2 plasma irradiation, a weight reduction percentage of 1.8% by mass or less, an amount of particles generated of 0.05% by mass or less after NF3 plasma irradiation, and a compression set of 50% or less after aging at 300° C. for 70 hours.

Abstract: The present invention relates to sintered polycrystalline flat-shaped geometrically structured ceramic abrasive elements designed for the use in resin bonded wheels, particularly in cut-off wheels. The present invention also relates to a method of making such sintered polycrystalline flat-shaped geometrically structured ceramic abrasive elements and the use thereof.

Abstract: An abrasive article can include a body including a plurality of portions including a first abrasive portion and a second abrasive portion. The first abrasive portion can include a vitreous bond material and abrasive particles contained within the bond material. The second abrasive particles can include an organic bond material and abrasive particles contained within the bond material. The body can have a burst speed of at least 65 m/s. In an embodiment, the abrasive article can include an interior portion coupled to the first and second abrasive portions. In another embodiment, the interior portion can optionally include abrasive particles or a filler material.

Abstract: A method of aligning abrasive particles on a substrate. The method comprises providing a substrate. The method also comprises providing abrasive particles. The method also comprises generating a modulated electrostatic field. The modulated electrostatic field is configured to have a first effective direction at a first time and a second effective direction at a second time. The electrostatic field is configured to cause the abrasive particles to align rotationally in both a z-direction and a y-direction.

Abstract: A slurry containing abrasive grains and a liquid medium, in which the abrasive grains include first particles and second particles in contact with the first particles, a particle size of the second particles is smaller than a particle size of the first particles, the first particles contain cerium oxide, the second particles contain a cerium compound, and in a case where a content of the abrasive grains is 0.1% by mass, a BET specific surface area of a solid phase obtained when the slurry is subjected to centrifugal separation for 60 minutes at a centrifugal acceleration of 1.1×104 G is 40 m2/g or more.

Abstract: This method for manufacturing a cutting blade includes: a mixing step of adding a liquid dispersion medium to a mixed powder containing a resin powder of a thermocompression-bondable resin, abrasive grains and fibrous fillers; a compression step of cold pressing, in a forming die, the mixed powder to which the dispersion medium has been added to form an original plate of a blade main body; and a sintering step of hot pressing and sintering the original plate.

Abstract: The invention relates to an impregnation resin mixture and to the use thereof. In one embodiment, an impregnation resin mixture includes a) at least one epoxide resin component selected from the group consisting of polyepoxides based on bisphenol A and/or F, and advancement resin produced therefrom, based on epoxidized halogenated bisphenols and/or epoxidized novolaks and/or polyepoxide esters based on phthalic acid, hexahydrophthalic acid, or based on terephthalic acid, epoxidized polyaddition products from dicyclopentadiene and phenol or cycloaliphatic compounds, b) as reactive diluents, 2 to 30 wt. % lactones with respect to the sum of the epoxy resin components, c) BCI3 and/or BCI3 complexes and/or a compound selected from the group of imidazoles and d) optionally additional additives, wherein the impregnation resin mixture does not contain any carboxylic acid anhydrides.

Abstract: The coating composition of the present application has excellent antistatic properties and thus can be used as an antistatic hard coating film. The coating composition of the present application may comprise a salt based on a polyoxometalate anion and a radically polymerizable cation, and a radically polymerizable binder to form an antistatic hard coating film having excellent antistatic property, abrasion resistance and moist-heat resistance. Such a film can be used for an optical laminate and a display device, and the like.

Abstract: A cBN sintered compact has cubic boron nitride particles and a ceramic binder phase, and in the sintered compact, WSi2 having an average particle diameter of 10 nm to 200 nm is dispersed such that a content thereof is 1 vol % to 20 vol %. A cutting tool has the cBN sintered compact as a tool body.

Abstract: An abrasive article can include a body including a bond material and abrasive particles contained within the bond material. The bond material can include an organic material including a resin, particularly a phenolic resin. A methylene bridge can be present at para or ortho sites of aromatic phenolic rings. The bond material can include an average ortho to para substituent ratio for the methylene bridge within a range including at least 1.5:1 and not greater than 9:1, particularly, within a range including at least 3 and not greater than 6.9.

Abstract: A curing agent for water glass molding comprises: ester; amorphous silica; and water. The amorphous silica is formed by means of a pyrolysis method and/or by means of a precipitation method. Also disclosed is a use of the curing agent for water glass molding in preparation of a casting mold and a mold core. Respective components of the curing agent comprising ester, amorphous silica and water are mixed at a high speed to form a suspension. Next, the suspension is applied to prepare a water glass self-hardening sand. The curing agent does not cause powder contamination, and can be measured and added conveniently. Also disclosed are a manufacturing method of the curing agent for water glass molding and a water glass self-hardening sand.

Abstract: The present disclosure is directed to a process for the preparation of resin-inorganic fibers composite and the obtained resin-inorganic fibers composite for coating. The process comprises the step of providing inorganic fibers bearing one or more monomer functional groups reactive with a monomer component; and reacting resin-forming monomer components with the inorganic fibers bearing one or more monomer functional groups reactive with a monomer component, to obtain the resin-inorganic fibers composite, wherein the resin is selected from the group consisting of alkyd resin, polyester resin and a combination thereof. The present disclosure is also directed to a coating composition containing the composite and a coating formed from the coating composition.

Abstract: An abrasive article may include an organic bond material, abrasive particles contained within the organic bond material and a plasticizer contained within the organic bond material. The plasticizer may include at least one of an aromatic phenyl group, a heteroaromatic furyl group, or a saturated aliphatic hydrocarbon. The plasticizer may further include a polar group.

Abstract: A method and apparatus for conducting heat away from a semiconductor die are disclosed. A board assembly is disclosed that includes a first circuit board having an opening extending through the first circuit board. A Chemical Vapor Deposition Diamond (CVDD) window extends within the opening. A layer of thermally conductive paste extends over the CVDD window. A semiconductor die extends over the layer of thermally conductive paste such that a hot-spot on the semiconductor die overlies the CVDD window.

Abstract: Disclosed are an additive raw material composition and an additive for superhard material product, a composite binding agent, a superhard material product, a self-sharpening diamond grinding wheel and a method for manufacturing the same. The raw material composition consisting of components in following mass percentage: Bi2O3 25%˜40%, B2O3 25%˜40%, ZnO 5%˜25%, SiO2 2%˜10%, Al2O3 2%˜10%, Na2CO3 1%˜5%, Li2CO3 1%˜5%, MgCO3 0%˜5%, and CaF2 1%˜5%. The composite binding agent is prepared from the additive and a metal composite binding agent. The self-sharpening diamond grinding wheel prepared from the composite binding agent has high self-sharpness, high strength, and fine texture, is uniformly consumed during the grinding process, does not need to be trimmed during the process of being used, and maintains good grinding force all the time, fundamentally solving the problems of long trimming time and high trimming cost of the diamond grinding wheel (FIG. 1).

Abstract: A personal care composition is disclosed comprising abrasive particles. The personal care composition may take a variety of forms such as a leave-on composition or an emulsion and/or may comprise one or more actives or agents.

Abstract: The present disclosure relates generally to coated abrasive articles that include a grinding aid aggregates in a make coat, a size coat, a supersize coat, or combinations thereof, as well as methods of making coated abrasive articles.

Abstract: The present invention relates to an abrasive disk that is excellent in workability and stability and has a low degree of fatigue applied to workers and tools, and a process for producing the same. The abrasive disc is excellent in stability by virtue of a high adhesive strength of each layer, has high flexibility, elasticity, and adhesiveness, and is lightweight per unit area. Thus, it has a low degree of fatigue applied to workers and expensive tools. In addition, according to the above production process, the abrasive disk can be continuously mass-produced.

Abstract: The present disclosure provides methods of making a vitreous bond abrasive article and a metal bond abrasive article. The methods include sequential steps. Step a) includes a subprocess including sequentially: i) depositing a layer of loose powder particles in a confined region; and ii) selectively applying heat via conduction or irradiation, to heat treat an area of the layer of loose powder particles. The loose powder particles include abrasive particles and organic compound particles, as well as vitreous bond precursor particles or metal particles. The layer of loose powder particles has substantially uniform thickness. Step b) includes independently carrying out step a) a number of times to generate an abrasive article preform comprising the bonded powder particles and remaining loose powder particles. Step c) includes separating remaining loose powder particles from the abrasive article preform.

Abstract: A fused grain having the following chemical composition in percent by weight in relation to the oxides: ZrO2: 16% to 30%, provided that HfO2<2%, Al2O3: percentage needed to bring the total to 100%, Cr2O3: ?0.2%, TiO2: ?0.5%, Cr2O3+TiO2: <7%, other elements: <3%, provided that SiO2+CaO+MgO<1.5%.

Abstract: Cement, concrete, stucco, and plaster that are have black ceramic polymer derived pigments, and in embodiments have a uniform blackness throughout the structure. In embodiments the black pigment is a ceramic SiOC, that has a size of about 0.8 ?m.

Abstract: A connecting arrangement is provided between joining partners which are braced separably against each other in the chassis region of a vehicle, wherein the joining partners are braced against each other via their contact surfaces by at least one releasable fastening element. Hard particles are applied to the contact surface at least of one of the joining partners before the production of the connecting arrangement and therefore before the bracing mounting of the joining partners and of the fastening element. The hard particles at least partially project into the respectively other contact surface as a result of the bracing mounting. The hard particles are applied so as to be at least approximately abrasion-proof, for example by a blasting process.

Abstract: Methods of layerwise fabrication of a three-dimensional object, and objected obtained thereby are provided. The methods are effected by dispensing at least a first modeling formulation and a second modeling formulation to form a core region using both said first and said second modeling formulations, an inner envelope region at least partially surrounding said core region using said first modeling formulation but not said second modeling formulation, and an outer envelope region at least partially surrounding said inner envelope region using said second modeling formulations but not said first modeling formulation; and exposing said layer to curing energy, thereby fabricating the object, The first and second modeling formulations are selected such they differ from one another, when hardened, by at least one of Heat Deflection Temperature (HDT), Izod Impact resistance, Tg and elastic modulus.

Abstract: A flame retardant with which fire retardancy is improved and the fire retardancy is able to be secured stably for a long time is provided. An internal layer 11 containing a polymer and a flame retardant factor layer 12 that is formed outside of the internal layer 11 and that contains a polymer to which at least one of a sulfonate group and a sulfonate base is bonded are included. Thereby, compared to a case that the flame retardant factor layer 12 is not included, moisture is hardly absorbed, and respective particles of the flame retardant are inhibited from being adhered to each other. Accordingly, blocking is inhibited.

Abstract: The present disclosure provides for and includes improved devices and methods for the production of Purified Hydrogen Peroxide Gas (PHPG) that is substantially non-hydrated and substantially free of ozone.

Abstract: A laterally-stretched netting comprising a patterned abrasive layer on a first major surface thereof, and methods of making.

Abstract: A method of fabricating a cemented carbide article by additive manufacturing, and a granular material are disclosed. A precursor material is provided that comprises granules, the granules comprising carbide grains and a binder comprising any of cobalt, nickel and iron. Each granule has a density of at least 99.5% of the theoretical density and the granules of the precursor material have a mean compressive strength of at least 40 megapascals (MPa). An additive manufacturing process is used to manufacture the article by building up successive layers of material derived from the precursor material.

Abstract: A sulfur dioxide absorbent that is an ionic liquid including a solvent; and a salt of a diamine compound that is substituted with a hydroxyl group and has a chemical formula 1 to 3 below dissolved in the solvent: where, in Chemical Formula 1 and 2, R1-R4 are the same or different and each is independently selected from the group consisting of H, a C1-C6 alkyl, and a C1-C6 alkoxy; and where, in Chemical Formula 1 to 3, X is selected from the group consisting of Cl, Br, I, MeSO3, CF3SO3, HCO2, CF3CO2 and CH3CO2; and n is an integer of 1-10. The sulfur dioxide absorbent is constituted to selectively absorb sulfur dioxide and sulfurous acid (H2SO3) formed by combination of sulfur dioxide with water, not CO2.

Abstract: A curable composition includes a hydrogen-bonded prepolymer, a plasticizer, and, optionally, a crosslinking agent. The plasticizer includes a reactive plasticizer having structure (I), (II), or (III), wherein X is —OR1, —N(R1)2, —R4—OR1, or —R4—N(R1)2, wherein R1 is independently at each occurrence hydrogen or C1-6 alkyl, and R4 is C1-12 alkylene; y is zero or 1; z is zero or 1; R2 is C1-12 alkyl; and R3 is C1-12 alkyl when z is 1, or R3 is C1-12 alkyl or H when z is zero.

Abstract: There is provided a method for obtaining a purified aqueous solution of silicic acid containing less metal impurities such as Cu and Ni using water glass as a raw material with less number of purification steps than that in conventional methods without using any unnecessary additives. The method for producing a purified aqueous solution of silicic acid, the method comprising the steps of: (a) passing an aqueous solution of alkaline silicate having a silica concentration of 0.5% by mass or more and 10% by mass or less through a column filled with a polyamine-, iminodiacetic acid-, or aminophosphoric acid-type chelating resin, and (b) passing the aqueous solution passed in the step (a) through a column filled with a hydrogen-type cation exchange resin.

Abstract: An anisotropic conductive film having a multilayer structure having conductive particles arranged in a single layer has a first connection layer and a second connection layer formed on a surface of the first connection layer. The first connection layer is a photopolymerized resin layer, and the second connection layer is a thermally or photo-cationically, anionically, or radically polymerizable resin layer. On the surface of the first connection layer on a side of the second connection layer, the conductive particles for anisotropic conductive connection are arranged in a single layer, and the first connection layer contains an insulating filler.

Abstract: Polishing media in the form of bristles made from a porous polymer-based material, apparatus and systems including the media, and methods of forming and using the media, apparatus, and systems are disclosed. A method of manufacturing bristles for use in polishing a workpiece which includes a non-planar surface includes the steps of combining a liquid polymer material and a foaming agent to form a foamed polymeric material, and separating the foamed polymeric material into a plurality of bristles. The foaming agent is configured to impart a porosity to the polymeric material, where the porosity is characterized by a density in the range of 0.3 to 1.2 g/cm3.

Abstract: A process for chemical mechanical polishing a substrate containing tungsten is disclosed to reduce corrosion rate and inhibit dishing of the tungsten and erosion of underlying dielectrics. The process includes providing a substrate; providing a polishing composition, containing, as initial components: water; an oxidizing agent; nonionic polyacrylamide; a dicarboxylic acid, a source of iron ions; a colloidal silica abrasive having a negative zeta potential; and, optionally, a pH adjusting agent; providing a chemical mechanical polishing pad, having a polishing surface; creating dynamic contact at an interface between the polishing pad and the substrate; and dispensing the polishing composition onto the polishing surface at or near the interface between the polishing pad and the substrate; wherein some of the tungsten is polished away from the substrate, corrosion rate is reduced, dishing of the tungsten is inhibited as well as erosion of dielectrics underlying the tungsten.

Abstract: Polishing slurries for polishing semiconductor substrates are disclosed. The polishing slurry may include first and second sets of colloidal silica particles with the second set having a silica content greater than the first set.