Abstract: A solvent composition for dissolving plastic comprises at least either isopropyl bromide or n-propyl bromide, and at least either nitromethane or nitroethane. The content of the above-mentioned at least either nitromethane or nitroethane is 5 through 50 wt % with respect to the entire amount of the solvent.

Abstract: This invention concerns paint stripping compositions which are particularly suitable for stripping paint off aircraft. The basic composition consists of a mixture of specific amounts of the following substances: aromatic hydrocarbons, dimethyl formamide; N-methylpyrrolidone; benzyl alcohol; alkanolamine; wax; wetting agent; and thickening agent. A modified composition may also contain dimethyl sulfoxide and a terpene solvent. The invention also includes the method of stripping paint from an aircraft by applying the new stripping composition onto the surface of the aircraft allowing the paint to soften and loosen under the action of the composition, or to penetrate under the paint coating, and then gently removing both the loosened paint and the stripping composition from the aircraft surface without damaging the surface.

Abstract: The present invention is a photoresist remover composition used in order to remove photoresist during the manufacturing process of semiconductor devices, such as large-scale integrated circuits and very large-scale integrated circuits. The present invention comprises 2˜20 weight % of water-soluble hydroxylamine, 5˜15 weight % of oxime compound containing 2 or 3 hydroxyl groups, and 30˜55 weight % of alkyl amide. The photoresist remover composition according to the present invention can easily and quickly remove a photoresist layer that is cured by the processes of hard-bake, dry-etching, and ashing and a side-wall photoresist polymer that is produced from the lower metal film by the reaction of the photoresist with etching and ashing gases during these processes. Especially, the photoresist remover composition has a good property of removing the side-wall photoresist polymer produced from the layers of aluminum, aluminum alloy, and titanium nitride.

Abstract: A method of making a printing plate in which the uncoated surface of a substrate is treated with a pre-treatment solution prior to the deposition of ink on the surface. The pre-treatment liquid comprises a polyvalent metal salt, and at least one of an organic swelling reagent and/or a coalescence reagent. The pre-treatment liquid is applied to form a thin, homogenous layer of approximately 4 ?m to the entire upper surface of the recording plate. The swelling reagent and/or the coalescence reagent and the polyvalent metal cations are physically well localized in the porous structure of the plate's surface. After partial drying of the pretreated anodized aluminum plate, CTP liquid is deposited onto the surface to form an image. The CTP liquid solids react with the pre-treatment liquid and are, therefore, chemically bound to the surface. This allows all data to be deposited in a single pass of the inkjet head without the problem of clustering.

Abstract: A solvent composition that comprises a C1-C4 lactate ester and an odor-reducing amount of a tertiary amine having a boiling point at one atmosphere of about 80° C. to about 160° C. is disclosed. The composition (a) is substantially free of odor due to the tertiary amine, (b) exhibits a reduced amount of odor due to the lactate ester as compared to the same composition without the tertiary amine, and (c) is a homogeneous liquid or gel at zero degrees Celsius. A method of reducing the odor of a lactate ester-based solvent is also disclosed.

Abstract: Paint residues may be removed from spraying equipment and the like by flushing with aqueous compositions containing alkoxylated aromatic alcohols wherein the aromatic ring moieties of such alcohols do not bear any alkyl substituent containing more than 4 carbon atoms. Preferably, the aqueous compositions also contain an alkanolamine or other base. The alkoxylated aromatic alcohols contain an average of at least about 2 oxyalkylene moieties (preferably, oxyethylene moieties) per molecule.

Abstract: The present invention comprises formulations for stripping wafer residues which originate from a halogen based plasma metal etching followed by oxygen plasma ashing. The formulations contain the following general components (percentages are by weight): an organic amine or mixture of amines 15-60 %, water 20-60 %, ammonium tetraborate or ammonium pentaborate 9-20 %, an optional polar organic solvent 0-15 %.

Abstract: A stripping composition comprising at least one of alcohols having an ether-bond in the molecule thereof as component (a), and an anticorrosive as component (b). Furfuryl alcohol or tetrahydrofurfuryl alcohol is preferable as component (a).

Abstract: This invention concerns a composition useful as a paint remover, comprising: an organic carbonate, an alcohol, an activator, hydrogen peroxide, and water. The alcohol may be benzyl alcohol. The organic carbonate may be propylene carbonate, ethylene carbonate, or combination thereof. The activator may be an alkyl-substituted cycloalkane (naphthene), a soy oil, an alkyl soyate, or combination thereof.

Abstract: A composition useful as a paint remover which may include a carbonate, a dibasic ester and a mono-ester. The paint stripping composition may also contain an organic sulfur-containing compound such as dimethyl sulfoxide (DMSO), a glycol ether, a ketone, or combination thereof. The composition may be used in a process for removing paint by applying it to a painted surface. A degreasing composition is also disclosed which may comprise a carbonate and a alkyl-substituted cyclo-alkane such as naphthene. The compositions have several important attributes, including low toxicity and high efficacy in removing paint and coatings.

Abstract: A terpene-free cleaning composition containing: (a) an oil-soluble anionic surfactant; (b) a water-soluble anionic surfactant; (c) a primary solvent consisting of a C1-4 alkyl ester; (d) a short-chain cosurfactant; and (e) water.

Abstract: A silicone dissolving composition includes an organo-acid compound such as sulfonic acid or phosphinic acid, a solvent miscible with the organo-acid and able to swell a silicone, a thickener and a small amount of mineral acid. Silicone films dissolve to a liquefied mass capable of being wiped from a substrate in a matter of minutes. The removal of automotive, electrical, and construction sealants and gaskets is simplified with the use of such a silicone dissolving composition.

Abstract: The present invention relates to a resist stripper composition that is used to remove resists during semiconductor device manufacturing processes such as for large size integrated circuits, very large size integrated circuits, etc. The resist stripper composition comprises 3 to 10 wt % of an organic amine compound, 30 to 60 wt % of a solvent selected from a group consisting of DCMAc, DMF, DMI, NMP, etc., 30 to 60 wt % of water, 1 to 10 wt % of catechol, resorcin or a mixture thereof and 1 to 10 wt % of a C4-6 straight polyhydric alcohol.

Abstract: The present invention relates to an agent for the safe and environmentally friendly cleaning of components, for example from paint, lacquer, adhesive and rubber, in the absence of a negative effect on the components and the environment. The agent in accordance with the invention contains N-methyl 2-pyrrolidon with the addition of alkaline salt of unsaturated fatty acids and water.

Abstract: According to the present invention there is provided a hard surface cleaning composition for removing cooked-, baked-, or burnt-on food soil from cookware and table ware, having surface tension of less than 30 mN/m and comprising an organic solvent system and no more than: 0.09% by weight of the composition of ethers having molecular weight of less than 210 0.007% by weight of the composition of esters having molecular weight of less than 110 0.045% by weight of the composition of glycol ethers having molecular weight of less than 130 0.0025% by weight of the composition of ketones having molecular weight of less than 90.

Abstract: Particulate and metal ion contamination is removed from a surface, such as a semiconductor wafer containing copper damascene or dual damascene features, employing aqueous composition comprising a fluoride containing compound; a dicarboxylic acid and/or salt thereof; and a hydroxycarboxylic acid and/or salt thereof.

Abstract: A residue remover for removing polymeric material and etch residue includes 2-(2-aminoethylamino)-ethanol and optionally another two-carbon atom linkage alkanolamine compound, gallic acid or catechol, water, a polar organic solvent, and hydroxylamine. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, includes the steps of contacting the substrate with the above composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of 2-(2-aminoethylamino)-ethanol in the composition and process provides superior residue removal without attacking titanium or other metallurgy on the substrate. The composition preferably has a flash point greater than about 130° C.

Abstract: A remover composition comprising (a) 100 parts by weight of a composition obtained by adding a cyclic urea compound to water, water-soluble organic solvent, or a mixture of water and water-soluble organic solvent so that the concentration of the cyclic urea compound is from 1 to 90% by weight, wherein the cyclic urea compound is represented by the following general formula (I): wherein, R1 and R2each independently represent alkyl group which may be substituted, hydrogen atom, hydroxyl group, or carboxyl group, Z represents oxygen atom or sulfur atom, (b) 0.1 to 150 parts by weight of an organic amine, and (c) 0.001 to 100 parts by weight of a salt of an amine with an acid.

Abstract: The invention relates to plaster type interior textured coating remover composition in the form of an aqueous solution containing at least one alkoxy ether solvent, an alcohol containing from 1 to 6 carbon atoms, at least one nitrogen containing compound, and a compound having an HLB of from 7.3 to 15.0.

Abstract: The present invention includes methods and compositions for the removal of coatings such as paint from surfaces. The methods of the present invention are typically conducted between about 45° C. and about 75° C., and the compositions typically contain a carbonate, a dibasic ester, a pyrrolidine, a mono-ester. The formulations of the present invention typically exhibit a high efficacy in the removal of paint while having a low level of toxicity.

Abstract: A purge solution for removing water-based dehydrated paint residues from a paint delivery system includes 2-15 total weight percent of a purge concentrate diluted with solvent. The concentrate includes 20-99.5 total weight percent of a C4 alcohol or an alkoxylated C4 alcohol, and 0.5-30 total weight percent of an amine.

Abstract: This invention concerns a composition useful as a paint remover, comprising: an organic carbonate, an alcohol, an activator, hydrogen peroxide, and water. The alcohol may be benzyl alcohol. The organic carbonate may be propylene carbonate, ethylene carbonate, or combination thereof. The activator may be an alkyl-substituted cycloalkane (naphthene), a soy oil, an alkyl soyate, or combination thereof.

Abstract: The invention relates to a stripping composition which can be used in the construction field, especially for the stripping of external organic coatings, such as exterior waterproof coatings and thin films, and in the yachting field, for the stripping of antifouling coatings, characterized in that it comprises: at least one dibasic ester, at least one dipolar aprotic solvent, at least one inorganic filler, water, at least one cellulose thickener, at least one dispersing agent and activators.

Abstract: This invention concerns a composition useful as a paint remover, comprising: an organic carbonate, an alcohol, an activator, hydrogen peroxide, and water. The alcohol may be benzyl alcohol. The organic carbonate may be propylene carbonate, ethylene carbonate, or combination thereof. The activator may be an alkyl-substituted cycloalkane (naphthene), a soy oil, an alkyl soyate, or combination thereof.

Abstract: Disclosed are compositions and methods useful for the removal of polymeric material from substrates, such as electronic devices. The compositions and methods disclosed are particularly suitable for removing polymer residues from advanced integrated circuit devices with reduced corrosion of metal surfaces.

Abstract: A composition useful as a paint remover which may include a carbonate, a dibasic ester and a mono-ester. The paint stripping composition may also contain an organic sulfur-containing compound such as dimethyl sulfoxide (DMSO), a glycol ether, a ketone, or combination thereof. The composition may be used in a process for removing paint by applying it to a painted surface. A degreasing composition is also disclosed which may comprise a carbonate and a alkyl-substituted cyclo-alkane such as naphthene. The compositions have several important attributes, including low toxicity and high efficacy in removing paint and coatings.

Abstract: A non-corrosive photoresist stripping and cleaning composition, comprising: (a) about 5% to about 50% of a solvent; (b) about 10% to about 90% of an alkanolamine; (c) about 0.1 to 10% of a carboxylic acid; and (d) about 1.0% to 40% of water.

Abstract: The invention concerns a composition for stripping coatings for example of paints. Said composition comprises at least an aromatic ether containing an alkoxy group with at least two carbon atoms and at least an aprotic polar solvent.

Abstract: The invention relates to a stripping composition which can be used in the construction field, especially for the stripping of external organic coatings, such as exterior waterproof coatings and thin films, and in the yachting field, for the stripping of antifouling coatings, characterized in that it comprises:

Abstract: An electronic parts cleaning solution comprising a hydroxide, water, metal corrosion inhibitor, and at least one compound represented by the following general formula (I) or (II):

Abstract: A stripping composition and a method of using the stripping composition to remove cured resins such as elastomeric silicone adhesive deposits from ceramic and metal surfaces of electronic modules to provide reworkability options in assembly processes including diagnostic parts, parts replacement and recovery of substrates from test vehicles is provided. The stripping compositions comprise a base preferably an organic base such as a quaternary ammonium hydroxide, a surfactant and a high boiling environmentally and chemically safe solvent such as di- or tri-propylene glycol alkyl ether. In another stripping composition, the base is used in combination with a mixture of N-alkyl pyrrolidone components, preferably an N-alkyl pyrrolidone and a N-cycloalkyl pyrrolidone. The stripping compositions are used to contact an electronic module having a cured resin such as a silicone adhesive residue deposit on the module surface to dissolve, remove or strip the deposit.

Abstract: The present invention provides a process for efficient recovery of dyestuffs from dye-based optical disks, and to provide a solvent used for recovery. Disclosed herein is a process for recovering dyestuffs from dye-based optical disks by treating the dyestuff-containing layer with a solvent containing a singlet oxygen quencher. Disclosed also herein is a solvent for dyestuff recovery which contains a singlet oxygen quencher.

Abstract: No-rinse floor cleaning compositions which provide improved burnish response to finished floors are sold in concentrated form or in diluted, ready to use form. The concentrated compositions when diluted with water comprise from about 100 ppm to about 750 ppm of an amine oxide surfactant, from about 0 ppm to about 650 ppm of a nonionic surfactant, and from about 1 ppm to about 40 ppm of a silicone antifoam agent. These floor cleaning compositions are substantially free of harsh chemicals and are particularly suitable for use on highly polished floors in commercial environments where daily burnishing is most often utilized.

Abstract: Non-aqueous cleaning compositions capable of removing cured polyimides and other polymers from a metal circuitry containing substrate such as a semiconductor device for rework and other purposes without any significant adverse affect on the circuitry are provided consisting essentially of alkanolamines, preferably monoethanolamine or monoethanolamine-diethanolamine mixtures and optionally with a solvent such as NMP in an amount less than about 50% by weight. A method is also provided for removing polyimide coatings and other polymers from semiconductor devices using the cleaning compositions of the invention.

Abstract: The present invention is directed to an aerosol composition comprising (A) a paint stripper composition comprising (i) from about 20 to about 50% by weight of an aromatic alcohol, such as benzyl alcohol, (ii) from about 5 to about 50% by weight of an accelerator, (iii) from about 0.5 to about 5.0% by weight of water, based upon 100% weight of total paint stripper composition; and (B) a propellant. A method of preparing the aerosol composition is also provided.

Abstract: A method of stripping cured paint from reject painted production parts, aluminum and galvanized safe, comprising: a) adding a stripping composition to a strip tank, said stripping composition consisting an alkanolamine, a fatty acid and a surfactant; b) immersing said reject painted part in said strip tank containing said stripping composition; and c) heating said stripping composition to 300 degrees F. for approximately 1-hour, wherein cured paint is removed from said reject painted part with no attack on the base metal substrate.

Abstract: A non-corrosive photoresist stripping and cleaning composition, comprising: (a) about 5% to about 50% of a solvent; (b) about 10% to about 90% of an alkanolamine; (c) about 0.1 to 10 % of a carboxylic acid; and (d) about 1.0% to 40% of water.

Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Abstract: This composition for stripping paints, lacquers or primers is characterized in that it consists of or comprises: (A) 5 to 90 parts by weight of water; (B) 2 to 47.5 parts by weight of benzyl alcohol; (C) 2 to 47.5 parts by weight of dimethyl sulphoxide or N-methylpyrrolidone, (A)+(B)+(C) representing 100 parts by weight.

Abstract: A viscous firearm gel cleaner that includes an organic cleaning agent such as terpene, terpene derivatives, terpenoids, terpenoid derivatives, turpentine and/or turpentine derivatives. The organic solvent includes substantially no petroleum distillates. The cleaner includes non-ionic and ionic surfactants to enhance the usability and effectiveness of the cleaner. The cleaner can also include an amine cleaning agent, a scent agent, a rust and/or corrosion inhibitor, a thickener, and/or a biocide. The cleaner removes grease, oil, carbon, plastic wad fouling and metal residues that can foul firearms. The cleaner is a water soluble, non-flammable, biodegradable cleaner. The cleaner is especially useful for cleaning outdoor sporting equipment such as firearms.

Abstract: A viscous firearm gel cleaner that includes an organic cleaning agent such as terpene, terpene derivatives, terpenoids, terpenoid derivatives, turpentine and/or turpentine derivatives. The organic solvent includes substantially no petroleum distillates. The cleaner includes non-ionic and ionic surfactants to enhance the usability and effectiveness of the cleaner. The cleaner can also include an amine cleaning agent, a scent agent, a rust and/or corrosion inhibitor, a thickener, and/or a biocide. The cleaner removes grease, oil, carbon, plastic wad fouling and metal residues that can foul firearms. The cleaner is a water soluble, non-flammable, biodegradable cleaner. The cleaner is especially useful for cleaning outdoor sporting equipment such as firearms.

Abstract: The present invention is directed to a composition comprising (a) an aromatic alcohol, such as benzyl alcohol; (b) an oxo-(C.sub.6 -C.sub.13 alkyl) acetate; and (c) dimethyl sulfoxide. A method for removing paint or a coating from a substrate by applying a paint stripper composition comprising an oxo-(C.sub.6 -C.sub.13 alkyl) acetate to the substrate is also provided. Another embodiment of the invention is a method for cleaning a substrate by applying the composition of the present invention to the substrate.

Abstract: Non-corrosive cleaning compositions that are useful for removing photoresist and/or plasma etch residues from a substrate. The cleaning composition comprises: (i) a hydroxy-(lower alkyl)-hydrazine, (ii) water, and (iii) at least one compound selected from the group consisting of a carboxylic acid, a water-miscible organic solvent and mixtures thereof.

Abstract: A composition including an aprotic polar solvent such as DMSO, a non-protic water-soluble ether, a water-soluble thickener selected from acrylic acid polymers and an aliphatic amine having 6-20 carbon atoms.

Abstract: Disclosed is a cleaning agent for cleaning paint piping without disassembling it in reduced number of steps and a process for cleaning the paint piping using the same. A cleaning agent based on N-methyl-2-pyrrolidone and containing an amine type solvent such as dimethylacetamide, ethanolamine, isopropanolamine and triethanolamine and a nonionic surfactant is circulated through the paint piping.

Abstract: This invention provides graffiti removers for removing permanent ink stains from painted surfaces. This graffiti removers include an active solvent for dissolving the stains, which are organic in nature, an optional secondary solvent for concentrated attack on the stain without being adversely affected by dilution with water, an emollient for maintaining a uniform dispersion of particulates in the remover and on the graffiti-stained painted surfaces, and an amorphous, particulate, mildly abrasive filler for imbiding the solvents, the filler being selected to permit the slow release of the active solvent.

Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Abstract: An alkaline, aqueous cleaning solution which is capable of removing at least a substantial portion of uncured adhesive residues, e.g., epoxy-based adhesives, from a substrate, preferably a metal stencil substrate, contains water, an alkalinity-providing agent and a synergistic combination of surfactants, specifically an N-alkylpyrrolidone surfactant, which is preferably N-octyl-2-pyrrolidone, and an aminocarboxylic acid surfactant, which is preferably N-coco-beta-aminopropionic acid. At an active-concentration ratio of the N-alkyl-2-pyrrolidone surfactant to the aminocarboxylic acid surfactant of from about 1:1 to about 3.5:1 and a total active concentration of at least 0.30% by weight of the aqueous cleaning solution, the N-alkyl-2-pyrrolidone and aminocarboxylic acid surfactants synergistically improve the ability of the solution to remove uncured adhesive residues from the substrate, even at relatively low wash temperatures, e.g., from about 70.degree. F. to less than about 135.degree. F.

Abstract: Inexpensive paint stripper compositions containing neither chlorinated nor alkaline solvents and well adapted for removing paints such as glycerophtalic, alkyd-urethane or arylic urethane paints on a variety of substrates, e.g. wood and metal substrates comprise (a) 1 to 99% by volume of an aprotic polar solvent chosen from the group comprising: dimethyl sulfoxide, dimethyl formamide, N-methylpyrrolidone, N-methylmorpholine, .gamma.-butyrolactone, acetonitrile and mixtures thereof; and (b) 99 to 1% by volume of an ether selected from the family of ethers having a flash point higher than 0.degree. C., a molar volume less than 160 and a molecule that includes one or several methoxy groups.

Abstract: An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.