Heterocyclic Ring In The Component Patents (Class 510/262)
  • Patent number: 9234125
    Abstract: A corrosion control system is disclosed including an anionic oxygen inhibitor, a cationic acid inhibitor or dispersant, and a noxious species inhibitor or scavenger for use in a fluid in contact with a metallic surface at low temperature, moderate temperature and especially at high temperature. A drilling fluid, a completion fluid, a production fluid and a geothermal fluid including an effective amount of the corrosion control system is also disclosed as well as methods for making and using same.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: January 12, 2016
    Inventors: Larry W. Gatlin, Khalid Ali Shah
  • Patent number: 7588647
    Abstract: The invention relates to aqueous detergent concentrates based on nonionic, anionic, amphoteric surfactants, with or without the use of customary auxiliaries and additives, said concentrates comprising as cleaning enhancers at least one sorbitan ester of the general formula (I) where R can be an optionally branched, optionally substituted and/or heteroatom-containing saturated or unsaturated acyl radical having 6 to 22 carbon atoms, R1 and R2 independently of one another can be hydrogen or R, Alk is at least one radical from the group consisting of ethylene-, isopropylene-, and butylene-, and a, b and c independently of one another can be values between 0 to 25, where the sum of a+b+c=0 to 25.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: September 15, 2009
    Assignee: Goldschmidt GmbH
    Inventors: Felix Muller, Jorg Peggau
  • Patent number: 6653267
    Abstract: The present invention provides an aqueous dispersion for chemical mechanical polishing suitable for polishing of copper, which has a high polishing speed and a low erosion rate with overpolishing. The aqueous dispersion for chemical mechanical polishing of the invention contains a compound having a heterocycle, a surfactant and an oxidizing agent, wherein the compound having a heterocycle and the surfactant are in a weight ratio of 1:10 to 1:0.03. The aqueous dispersion may also contain abrasive particle. The compound having a heterocycle is preferably quinaldic acid, benzotriazole or the like. The surfactant is preferably a sulfonic acid salt such as potassium dodecylbenzenesulfonate or ammonium dodecylbenzenesulfonate, and the oxidizing agent is preferably ammonium persulfate, hydrogen peroxide or the like. The abrasive particle used may be inorganic particle such as colloidal silica, an organic particle such as polymer particle, or an organic/inorganic composite particle comprising a combination thereof.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: November 25, 2003
    Assignees: Kabushiki Kaisha Toshiba, JSR Corporation
    Inventors: Hiroyuki Yano, Gaku Minamihaba, Masayuki Motonari, Masayuki Hattori, Nobuo Kawahashi
  • Patent number: 5858942
    Abstract: An engine cleaner composition and method for removing carbonaceous deposits from engine fuel-system components such as mechanical and electronic fuel injectors, intake valve seats, valves, combustion cylinders, spark plugs, and oxygen sensors may be used on both gasoline and diesel engines. Preferred compositions comprise a synergistic solution of a heterocyclic ring compound in an azeotrope of acetonitrile and water, together with selected surfactants and aromatics. Preferred compositions of the invention may be placed in an aerosol pressurized unit utilizing a compressed gas, such as nitrogen or nitrous oxide, or compressed liquid gas, such as a hydrocarbon or fluorohydrocarbon. Preferred engine cleaning compositions of the invention are substantially non-ozone depleting, are low in global warming, and have a low order of human toxicity. Preferred compositions have a moderate pH and are essentially compatible with metals and elastomers conventionally used in engine fuel-system components.
    Type: Grant
    Filed: October 24, 1996
    Date of Patent: January 12, 1999
    Inventors: Lawrence J. Adams, Paul D. Hughett
  • Patent number: 5545353
    Abstract: A non-corrosive photoresist composition containing:(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;(b) 70-20% by weight of selected amine compounds;(c) 0.1-10% by weight of (2-benzothiozolylthio)succinic acid.
    Type: Grant
    Filed: May 8, 1995
    Date of Patent: August 13, 1996
    Assignee: OCG Microelectronic Materials, Inc.
    Inventors: Kenji Honda, Taishih Maw