Abstract: The present disclosure relates to a cleaning composition for removing an oxide including an acid selected from an organic acid, an inorganic acid, and a combination thereof; a salt selected from an organic salt, an inorganic salt, and a combination thereof; a surfactant; and water, and a method of cleaning using the cleaning composition.

Abstract: A liquid composition comprising (A) at least one polar organic solvent, selected from the group consisting of solvents exhibiting in the presence of from 0.06 to 4% by weight of dissolved tetramethylammonium hydroxide (B), the weight percentage being based on the complete weight of the respective test solution (AB), a constant removal rate at 50° C. for a 30 nm thick polymeric barrier anti-reflective layer containing deep UV absorbing chromophoric groups, (B) at least one quaternary ammonium hydroxide, and (C) at least one aromatic amine containing at least one primary amino group, a method for its preparation and a method for manufacturing electrical devices, employing the liquid composition as a resist stripping composition and its use for removing negative-tone and positive-tone photoresists and post etch residues in the manufacture of 3D Stacked Integrated Circuits and 3D Wafer Level Packagings by way of patterning Through Silicon Vias and/or by plating and bumping.

Abstract: A biodegradable concentrated neutral detergent composition comprises various chelate compounds, various corrosion inhibitors, an alkaline compound, at least one sequestrant, various surfactants and hydrotropes, and water. The detergent can be highly concentrated, has a good long term shelf life, and when diluted is very effective in cleaning metals such as surgical instruments and prevents corrosion resistance of the metal even in a hard water environment.

Abstract: The present invention provides a cleaning agent for a substrate and a cleaning method thereof, which can effectively remove fine particles (particles) present on a surface of substrate or impurities derived from various kinds of metals (metallic impurities), without causing roughness surface of a substrate, in particular, a semiconductor substrate, and without causing corrosion or oxidation of metal wirings, in particular, copper wirings, provided on a surface of substrate, and can further remove at the same time a carbon defect present on a surface of substrate, without removing a metal corrosion inhibitor—Cu film, in particular, a Cu-BTA film.

Abstract: The present invention relates to an acidic, aqueous composition which comprises a thiodiglycol alkoxylate for treating metallic surfaces. The invention furthermore relates to the use of one or more compound(s) of the general formula (I) as a corrosion inhibitor.

Abstract: A solution for semiconductor wafer dicing is disclosed. The solution suppresses the adherence of contamination residues or particles, and reduces or eliminates the corrosion of the exposed metallization areas, during the process of dicing a wafer by sawing. The solution comprises at least one organic acid and/or salt thereof; at least a surfactant and/or at least a base; and deionized water, the composition has a pH is equal or greater than 4. The solution can further comprise, a chelating agent, a defoaming agent, or a dispersing agent.

Abstract: A dishwashing detergent composition is provided for consumer use for in cleaning of alkaline sensitive metals such as aluminum or aluminum containing alloys. The compositions include alternatives to sodium tripolyphosphate and/or other phosphorus containing raw materials, while retaining cleaning performance and corrosion prevention. According to the invention, a phosphinosuccinic acid oligomer or mixture thereof is used as a corrosion inhibitor and can be included for aluminum protection in a number of different detergent compositions.

Abstract: A warewashing detergent composition is provided for use for in cleaning of alkaline sensitive metals such as aluminum or aluminum containing alloys. The compositions include alternatives to sodium tripolyphosphate and/or other phosphorus containing raw materials, while retaining cleaning performance and corrosion prevention. According to the invention, a phosphinosuccinate oligomer of mixture thereof is used as a corrosion inhibitor and can be included for aluminum protection in a number of different detergent compositions.

Abstract: A non-aqueous solvent composition and method for cleaning and removing oleaginous materials such as hydraulic fluids from reinforced-fiber composites characterized as a cleaning composition free of ozone depletion materials, having a low vapor pressure, a flash point above 140° F., and consists essentially of cyclohexenes, isoparaffinic hydrocarbons, dearomatized hydrocarbons and corrosion inhibitors.

Abstract: One embodiment of the present invention is a method of fabricating an integrated circuit. The method includes providing a substrate having a metal and dielectric damascene metallization layer and depositing substantially on the metal a cap. After deposition of the cap, the substrate is cleaned with a solution comprising an amine to provide a pH for the cleaning solution of 7 to about 13. Another embodiment of the presented invention is a method of cleaning substrates. Still another embodiment of the present invention is a formulation for a cleaning solution.

Abstract: A method of conditioning the surface of a work piece, particularly of a strip or sheet, more particularly of a lithostrip or lithosheet, including an aluminum alloy is provided. The method for conditioning the surface of a work piece and a work piece including an aluminum alloy enabling an increasing manufacturing speed in electro-chemically graining and maintaining at the same time a high quality of the grained surface, includes a conditioning method which comprises at least the two steps, degreasing the surface of the work piece with a degreasing medium and subsequently cleaning the surface of the work piece by pickling.

Abstract: An aqueous detergent according to the invention contains substantially no polyalkylene glycol, but contains a salt of at least one of the following carboxylic acids A, B and C: A: an aliphatic monobasic carboxylic acid having a total carbon number of 9 or 10 and including a branched alkyl group; B: sebacic acid; and C: an aromatic monobasic carboxylic acid having a total carbon number of 11 to 13.

Abstract: A method of treatment for inhibiting sulfur-based corrosion or scaling or for removing scaling from a surface including inhibiting corrosion caused by sulfur-containing materials, reducing corrosion caused by sulfur-containing materials, inhibiting scaling caused by sulfur-containing and sulfur-containing materials in gas, liquid or solid phase or any combination of multiple phases of materials, reducing scaling caused by sulfur-containing and sulfur-containing materials, and removing scaling caused by sulfur-containing and sulfur-containing materials. The method involves contacting sulfur-containing materials with a composition containing a turpentine liquid. The method also involves contacting corrodible surfaces or surfaces prone to scaling with a composition containing a turpentine liquid.

Abstract: The compositions and methods for the removal of residues and contaminants from metal or dielectric surfaces comprises at least one alkyl diphosphonic acid, at least one second acidic substance at a mole ratio of about 1:1 to about 10:1 in water, and pH is adjusted to from about 6 to about 10 with a metal ion free base, and a surfactant. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates.

Abstract: One embodiment of the present invention is a method of fabricating an integrated circuit. The method includes providing a substrate having a metal and dielectric damascene metallization layer and depositing substantially on the metal a cap. After deposition of the cap, the substrate is cleaned with a solution comprising an amine to provide a pH for the cleaning solution of 7 to about 13. Another embodiment of the presented invention is a method of cleaning substrates. Still another embodiment of the present invention is a formulation for a cleaning solution.

Abstract: The present invention is a formulation for wet clean removal of post etch and ash residue from a semiconductor substrate having a CoWP feature, comprising; Deionized water; Organic acid; Amine and/or quaternary ammonium hydroxide; wherein the formulation is compatible with the CoWP feature and either (a) the molar ratio of amine and/or quaternary ammonium hydroxide to organic acid provides a pH in the range of 7-14; or (b) the formulation includes a corrosion inhibitor. A method of using the formulation is also described.

Abstract: A method of dissolving and/or inhibiting the deposition of scale on a surface of a system comprises the step of bringing the surface of the system into contact with a composition. The composition can comprise from about 3 to about 15 parts by weight of a chelating component. The chelating component is selected from the group of MGDA, NTA, HEDTA, GLDA, EDTA, DTPA, and mixtures thereof. The composition can further comprise from about 3 to about 15 parts by weight of an acidic component, which is different than the chelating component. The composition can further comprise at least about 60 parts by weight of water. Each of the parts by weight ranges above are based on 100 parts by weight of the composition. The composition may further comprise a surfactant component and/or a corrosion inhibitor.

Abstract: An acid inhibitor concentrate is provided which contains water, at least one polyamino-aldehyde resin such as a quaternized polyethylenepolyamine-glyoxal resin, and at least one compound selected from the group consisting of acetylenic alcohols, ethoxylated fatty amines, ethoxylated fatty amine salts, and aldehyde-releasing compounds (such as hexamethylenetetramine). Such concentrates form useful metal cleaning and pickling solutions when combined with aqueous acid, wherein such solutions, when contacted with a metal surface, are effective in removing scale, smut and other deposits from the metal surface but exhibit a reduced tendency for the aqueous acid to attack or etch the metal itself.

Abstract: The present invention relates to aqueous, sulfuric acid cleaners which employ the use of nitric acid as a corrosion inhibitor for cleaning metal and other surfaces, particularly stainless steel and for inhibiting corrosion. Method of use and manufacturing of the same are also disclosed.

Abstract: The present invention relates to sulfuric/nitric blended acid cleaners which employ the use of ethoxylated amines and/or ethoxylated alcohols as a corrosion and stain inhibitor in the vapor phase for cleaning metal and other surfaces, particularly stainless steel. Method of use and manufacturing of the same are also disclosed.

Abstract: A method of conditioning the surface of a work piece, particularly of a strip or sheet, more particularly of a lithostrip or lithosheet, including an aluminum alloy is provided. The method for conditioning the surface of a work piece and a work piece including an aluminum alloy enabling an increasing manufacturing speed in electro-chemically graining and maintaining at the same time a high quality of the grained surface, includes a conditioning method which comprises at least the two steps, degreasing the surface of the work piece with a degreasing medium and subsequently cleaning the surface of the work piece by pickling.

Abstract: The use of complex fluoride ions of elements of groups 4, 13, or 14 of the periodic table of the chemical elements (preferably selected from complex fluoride ions of the elements B, Si, Ti, and Zr) in concentrations from 30 t 500 millimoles per liter in process solutions for pickling steel or for bleaching and/or passivating pickled surfaces of stainless steel; a process solution for pickling steel or bleaching and/or passivating pickled surfaces of stainless steel comprising: a) one or more strong acids, b) one or more oxidizing agents in the bleaching/passisvating process, c) complex fluoride ions of elements of groups 4, 13 or 14 of the periodic table of the chemical elements in concentrations from 50 to 500 mmoles per liter; replenisher or concentrate containing a combination of active substances thereof; a process for pickling steel or for brightening and/or passivating of pickled surfaces of stainless steel, wherein the surfaces are brought into contact with such a process solution.

Abstract: A stripping and cleaning composition for cleaning microelectronics substrates, the composition comprising: at least one organic stripping solvent, at least one nucleophilic amine, at least one non-nitrogen containing weak acid in an amount sufficient to neutralize from about 3% to about 75% by weight of the nucleophilic amine such that the stripping composition has an aqueous pH of from about 9.6 to about 10.9, said weak acid having a pK value in aqueous solution of 2.0 or greater and an equivalent weight of less than 140, at least one metal-removing compound selected from the group consisting of diethylene glycol and diethylene glycolamine, and water, and method for cleaning microelectronic substrates with these compositions.

Abstract: A biodegradable acid cleaning composition for cleaning stainless steel, and other surfaces is disclosed. The composition comprises urea sulfate in combination with gluconic acid which serves as a corrosion inhibitor. The composition retains the cleaning and corrosion prevention properties of similar phosphoric acid solutions but is safe for the environment and is less expensive to produce. Applicants have surprisingly found that the traditionally alkaline corrosion inhibitor, gluconic acid, can work effectively in an acidic cleaning composition.

Abstract: The present invention is directed to a metal cleaner polisher and anti-tarnish solution which comprises the following ingredients per 32 fluid ounces: 5.00 to 10.00 percent mineral spirits by volume; 1.50 to 4.50 percent ethanol by volume; 0.50 to 1.50 percent ammonia by volume; 0.50 to 1.50 percent thiourea by volume; 0.25 to 1.00 percent sulfamic acid by volume; less than 0.20 percent disodium cocoampho-diproprionate by volume; and deionized water. Optionally, the following ingredients may be added individually, in any combination or all together: thickening/suspension agents; abrasive additives; and a modifying/stabilizing agent; and optionally varying amounts of fragrance and colorizing agents.

Abstract: The compositions and methods for the removal of residues and contaminants from metal or dielectric surfaces comprises at least one alkyl diphosphonic acid, at least one second acidic substance at a mole ratio of about 1:1 to about 10:1 in water, and pH is adjusted to from about 6 to about 10 with a basic compound, and optionally a surfactant. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates. One of the embodiment is the method of using the compositions in dilution, wherein the solution may be diluted with DI water at dilution ratios, for example, of up to 1:10, up to 1:50, up to 1:100, up to 1:150, up to 1:250, and up to about 1:500 or any ratios therein.

Abstract: The compositions and methods herein relate to the method for the removal of residues and contaminants from metal or dielectric surfaces. Particularly, a composition and method of cleaning residues after chemical mechanical polishing of a copper or aluminum surface of the semiconductor substrates.

Abstract: A method and composition for removing bulk and ion-implanted photoresist and/or post-etch residue material from densely patterned microelectronic devices is described. The composition includes a co-solvent, a chelating agent, optionally an ion pairing reagent, and optionally a surfactant. The composition may further include dense fluid. The compositions effectively remove the photoresist and/or post-etch residue material from the microelectronic device without substantially over-etching the underlying silicon-containing layer(s) and metallic interconnect materials.

Abstract: The present invention relates to semi-aqueous formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, as well as contaminations. The formulation comprises: an alkanolamine, a water miscible organic co-solvent, a quarternary ammonium compound, a non-free acid functionality corrosion inhibitor, and remainder water. The pH is greater than 9.

Abstract: A biodegradable concentrated neutral detergent composition comprises various chelate compounds, various corrosion inhibitors, an alkaline compound, at least one sequestrant, various surfactants and hydrotropes, and water. The detergent can be highly concentrated, has a good long term shelf life, and when diluted is very effective in cleaning metals such as surgical instruments and prevents corrosion resistance of the metal even in a hard water environment.

Abstract: A biodegradable acid cleaning composition for cleaning stainless steel, and other surfaces is disclosed. The composition comprises urea sulfate in combination with gluconic acid which serves as a corrosion inhibitor. The composition retains the cleaning and corrosion prevention properties of similar phosphoric acid solutions but is safe for the environment and is less expensive to produce. Applicants have surprisingly found that the traditionally alkaline corrosion inhibitor, gluconic acid, can work effectively in an acidic cleaning composition.

Abstract: This disclosure relates to phosphate coatings that inhibit corrosion of metals, specifically coatings comprising acidic phosphate and alkaline metal oxide/hydroxide components. In one particular embodiment, phosphate-based coating formulations that reduce or eliminate corrosion of steel and other metals are disclosed. In other embodiments, methods for coating steel surfaces with acidic phosphate and alkaline metal oxide/hydroxide components to reduce or eliminate corrosion of the metal surfaces are disclosed.

Abstract: The present invention relates to compositions including a water soluble magnesium salt, water soluble calcium salt, and silicate or carbonate, which have a beneficial effect on corrosion during cleaning. The present compositions can reduce corrosion of glass or aluminum. The present invention also relates to methods employing these compositions.

Abstract: A non-corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water; and (b) a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid. Preferably, the at least one carboxylic acid has a pKa value ranging from 3 to 6. Also, a method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue; and (b) contacting the substrate with a cleaning composition comprising water; and a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid.

Abstract: An alkaline concentrated detergent composition for use in cleaning hard surfaces, medical instruments and other metal components (parts, tools, utensils, vessels, equipment) having superior cleaning efficacy at much lower alkali content than traditional alkaline cleaners and enhanced scale control properties even when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water and even in exceptionally hard water. The inventive composition maintains its superior cleaning efficacy and scale control properties during use.

Abstract: A corrosion inhibitor composition comprising one or more organic solvents, one or more corrosion inhibitor intermediates and about 0.1 to about 20 weight percent of one or more iodide salts dissolved in said composition and methods of using the corrosion inhibitor composition in acid fracturing and matrix acid stimulation of subterranean formations.

Abstract: The invention relates to an aqueous alkaline cleaning composition for cleaning metal surfaces, containing at least one non-ionic surfactant having demulsifying action and based on ethoxylated alkyl alcohols having one or two alkyl groups, each comprising an average of 7.5 to 16.5 carbon atoms, and an average of 5.5 to 18.5 EO groups per alkyl group, and comprising an end group closure or two end group closures, of which at least one end group closure is an isopropyl, isobutyl, tertiary butyl and/or benzyl group, wherein the surfactant is not propoxylated.

Abstract: A cleaning composition based on an aqueous or non-petroleum solvent, and useful for cleaning exterior surfaces such as aircraft exterior surfaces and other metal, glass, rubber and polymer surfaces possesses solvent-like properties with respect to greasy soils; inhibits corrosion and degradation of rubber; is biodegradable; forms a stable emulsion with water; remains optically clear and stable at multiple dilutions with water; and conforms to MIL-PRF 87937D. The composition includes at least one fatty acid methyl ester, at least one ethoxylated alcohol having an HLB ranging from about 10 to about 14, at least one alkyl polyglycoside having an HLB ranging from about 10 to about 14, at least one hydrotrope, an alkali metal silicate, at least one corrosion inhibitor in an amount effective to prevent corrosion on metals, and water.

Abstract: An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface.

Abstract: An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface.

Abstract: An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface.

Abstract: The present invention is a cleaning composition for use with firearms and industrial items in which all of the components of the composition are biodegradable. The selected components of the composition also have a combined flashpoint of over 200° F. The low volatility of the composition enhances the safety factor by its reduced flammability in conjunction with the low odor and other benefits obtained by the biodegradability of the composition. The composition essentially comprises a hydrocarbon solvent and a lubricant which effectively removes the fouling present within the interior arm of a firearm bore and at the same time lubricates and protects the firearm bore to help prevent the formation of rust.

Abstract: The invention relates to a method for cleaning metal parts, according to which the metal parts are treated with a compound of the formula (1) wherein A represents (CH2)a or phenylene and R1, R2, R3 and R4 are identical or independently of one another represent C1 to C6-n-alkyl and/or isoalkyl and a represents a whole number from 0 to 4.

Abstract: A process for reducing the corrosive action of hypochlorite on metal surfaces in hypochlorite-containing aqueous liquid cleaning agents by the use of a combination of alkali hydroxide, alkali silicate, and alkyl(alkoxy)n sulfate, where n=0.5 to 10.

Abstract: A buffered acid composition created by the combination of liquid ammonia and an acid and a method for making the composition. The buffered acid composition is for use as a cleaning agent and for balancing the pH of a fluid.

Abstract: A degreasing method for descaling or removing laser scales from iron-containing metal part surface by treating the iron-containing metal part surfaces that is optionally tainted with laser scales with an aqueous solution containing at least one type of highly water-soluble and complexed with Fe ions carboxylic acid, at least one type of salt of at least one type of carboxylic acid exhibiting the same action and at least one type of fatty amine ethoxylate, wherein the solution is buffered, the Fe ions are carried into the solution and at least partially complexed, increasing the pH value of the solution for descaling with respect to at least one type of carboxylic acid. The entire concentration of carboxylic acids and the salts thereof is increased for descaling by 2 to 20% by weight.

Abstract: A method of treating the surfaces of medical instruments which are contaminated with prions includes contacting the surface with a composition containing a source of peroxide ions, such as hydrogen peroxide, at a molar concentration of at least 1.5M peroxide (equivalent to approximately 5% hydrogen peroxide) and preferably, about 2M peroxide (approximately 7% hydrogen peroxide). The composition is optionally in the form of a gel. The composition is retained in contact with the surfaces for about 1-2 hours until all or substantially all prion contamination is removed.

Abstract: A cleaning composition with a corrosion inhibitor system and an active halogen-based bleaching system and aqueous solution is described for inhibiting corrosion of metal surfaces to which the composition is applied, especially when the cleaning composition is not rinsed from the treated metal surface prior to drying of the composition on the metal surface. The corrosion inhibitor is at least an alkyl phosphonate compound, wherein the alkyl group has 6 or more carbon atoms, and salts thereof. The bleaching system includes one or more sources of hypohalous acid or hypohalite ion, such as a stabilized hypochlorite solution, in particular a mixture of N-chlorosulfamate salts.

Abstract: A cleaning solution for semiconductor substrates comprising a nonionic surface active agent of the formula (1) and/or the formula (2), a chelating agent and a chelating accelerator: CH3—(CH2)l—O—(CmH2mO)n—X ??(1) wherein l, m and n independently represent a positive number, and X represents a hydrogen atom or a hydrocarbon group; CH3—(CH2)a—O—(CbH2bO)d—(CxH2xO)y—X ??(2) wherein a, b, d, x and y independently represent a positive number, b and x are different, and X represents a hydrogen atom or a hydrocarbon group.

Abstract: An improved combination air sanitizer, soft surface sanitizer, soft surface deodorizer and hard surface disinfectant is disclosed. The preferred active ingredient for the air sanitization and soft surface odor treatment functions is triethylene glycol (TEG). The preferred active ingredient for soft surface sanitization and hard surface disinfection functions is a mixture of various alkyl dimethyl benzyl ammonium saccharinates. The formulation may be provided in an aerosol spray form and is useful for sanitizing and removing bacteria and malodorant molecules from the air as well as disinfecting hard surfaces. A unique combination of corrosion inhibitors is disclosed for convention steel or tin-plated steel cans. A single produce can be used as an air sanitizer/air freshener, a soft surface sanitizer, a soft-surface odor remover/reducer and, a hard surface disinfectant.

Abstract: The invention relates to water blown integral skin polyurethane foams made with a particular isocyanate quasi-prepolymer and resin side ingredients to yield a foam having good overall mechanical properties. The isocyanate quasi-prepolymer component of the present invention comprises from 0.5 weight percent to 30.0 weight percent or less uretonimine-carbodiimide-modified diphenylmethane diisocyanate, from 50 weight percent to 80 weight percent 4,4'-diphenylmethane diisocyanate and reacted with from 15 weight percent to 40 weight percent of a polyether polyol containing predominately secondary hydroxyl groups and having an average molecular weight from about 2,000 to 10,000, an average functionality from 1.5 to about 3.2, and a hydroxyl number from about 20 to 60, and optionally with a low molecular weight diol in an amount of from 1.0 weight percent to 10 weight percent, the weight percentages based on the weight of the quasi-prepolymer reactants.