Abstract: A process for forming a descaling composition has the steps of macerating a bone meal with a dimethylamine solution, digesting the macerated bone meal with hydrochloric acid, neutralizing the digested bone meal with calcium oxide, treating the neutralized bone meal with sulfuric acid, and applying a refluxing treatment with dimethylamine and hydrazine hydrate. The process further includes removing the macerated bone meal solids from the dimethylamine solution and transferring the removed solids to an extraction tower prior to the step of digesting. The hydrochloric acid is circulated through the macerated bone meal. The treated bone meal and the sulfuric acid is filtered so as to produce a liquid phase and a solids phase. The liquid phase contains a phosphate amine. The dimethylamine and hydrazine hydrate are added to the liquid phase.

Abstract: Methods include combining an amount of water and an acid retarding agent (RA), where the amount of water is present in an amount up to about 5 times the mass of the RA, inclusive, and wherein the RA includes at least one salt compound. An amount of acid is dissolved in the combined amount of water and RA to form a composition, where the amount of acid is a molar ratio of acid:RA of between 4.0 and 0.2, inclusive, and wherein the amount of acid is up to about 36% by weight of total weight of the composition. The composition is injected into a wellbore penetrating a subterranean formation at a pressure, which may be less than the fracture initiation pressure of the subterranean formation in some cases, while in other cases equal to or greater than the fracture initiation pressure.

Abstract: An aqueous composition comprising a mineral acid, a fixing agent and water present in an amount sufficient to dissolve the mineral acid and the fixing agent. The fixing agent comprises at least one of an amine and/or an amide containing compound having a dipole moment of at least 3 when in the aqueous composition.

Abstract: Oilfield treatment compositions contain water, hydrochloric acid at a concentration between 15 wt % and 45.7 wt % and a first and second fixing agent. The first fixing agent comprises urea, a urea derivative or both. The second fixing agent may be a mixture or amines and alcohols. These compositions provide corrosion inhibition when exposed to steel. The compositions may also contain an inhibitor aid.

Abstract: A liquid composition comprising (A) at least one polar organic solvent, selected from the group consisting of solvents exhibiting in the presence of from 0.06 to 4% by weight of dissolved tetramethylammonium hydroxide (B), the weight percentage being based on the complete weight of the respective test solution (AB), a constant removal rate at 50° C. for a 30 nm thick polymeric barrier anti-reflective layer containing deep UV absorbing chromophoric groups, (B) at least one quaternary ammonium hydroxide, and (C) at least one aromatic amine containing at least one primary amino group, a method for its preparation and a method for manufacturing electrical devices, employing the liquid composition as a resist stripping composition and its use for removing negative-tone and positive-tone photoresists and post etch residues in the manufacture of 3D Stacked Integrated Circuits and 3D Wafer Level Packagings by way of patterning Through Silicon Vias and/or by plating and bumping.

Abstract: In one embodiment, a metal loss inhibitor concentrate is provided which contains water, (A) a component of dissolved organic compounds and polymers that contain at least two hydroxy moieties per molecule and an average of at least 0.4 hydroxy moieties per carbon atom; (B) a thiourea component; and (C) a dissolved component containing aryl and quaternary ammonium moieties; and, optionally: (D) a wetting agent, such as a component of an ethoxylate of an alcohol. Such solutions form useful inhibitor concentrates when combined with aqueous chelating cleaning solutions, wherein such solutions, when contacted with a metal surface, are effective in removing scale, smut and other deposits from the metal surface but exhibit a reduced tendency to attack or unduly etch the metal itself, or to inhibit the subsequent desired oxidation and dissolution of metallic copper deposits.

Abstract: The present invention is directed to a metal cleaner polisher and anti-tarnish solution which comprises the following ingredients per 32 fluid ounces: 5.00 to 10.00 percent mineral spirits by volume; 1.50 to 4.50 percent ethanol by volume; 0.50 to 1.50 percent ammonia by volume; 0.50 to 1.50 percent thiourea by volume; 0.25 to 1.00 percent sulfamic acid by volume; less than 0.20 percent disodium cocoampho-diproprionate by volume; and deionized water. Optionally, the following ingredients may be added individually, in any combination or all together: thickening/suspension agents; abrasive additives; and a modifying/stabilizing agent; and optionally varying amounts of fragrance and colorizing agents.

Abstract: An acid inhibitor concentrate is provided which contains water, at least one polyamino-aldehyde resin such as a quaternized polyethylenepolyamine-glyoxal resin, and at least one compound selected from the group consisting of acetylenic alcohols, ethoxylated fatty amines, ethoxylated fatty amine salts, and aldehyde-releasing compounds (such as hexamethylenetetramine). Such concentrates form useful metal cleaning and pickling solutions when combined with aqueous acid, wherein such solutions, when contacted with a metal surface, are effective in removing scale, smut and other deposits from the metal surface but exhibit a reduced tendency for the aqueous acid to attack or etch the metal itself.

Abstract: The present invention herein provide a cleaning agent which comprises (A) an aqueous solution or an aqueous dispersion containing a linear poly(meth)acrylamide having an average molecular weight of not less than 5×106 as determined according to the intrinsic viscosity-determining technique in a concentration ranging from 0.0001 to 0.01% by mass; (B) a poly(hexamethylene-biguanide) hydrochloride represented by the following general formula (1); and (C) at least one compound selected from the group consisting of propylene glycol, dipropylene glycol, tripropylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, and ethers of ethylene glycol and propylene glycol with alcohols each having 1 to 3 carbon atoms, and esters thereof with fatty acids each having 1 to 3 carbon atoms, glycine and taurine: [—(CH2)m—NH—C(NH)—NH—C(NH)—NH—(CH2)n—]p.HCl??General Formula (1) wherein m and n each represent an integer ranging from 2 to 5 and p is an integer ranging from 5 to 16.

Abstract: A buffered acid composition created by the combination of liquid ammonia and an acid and a method for making the composition. The buffered acid composition is for use as a cleaning agent and for balancing the pH of a fluid.

Abstract: A method for chemical etching is disclosed for taking away oxidized film and removing cut as well as punched edge burs of harden-treated carbon steel (SK3, SK4 and SK5). Thereby, the fillet edge of the cut section is achieved. An oxidized film with a thickness of several micrometers is formed when a cut and punched steel is quenched and tempered at high temperature. Due to high strength and hardness of the steel, the oxidized film and edge burs are difficult to be removed by mechanical grinding. Therefore, a suitable electrolyte composes of only a little chemical reagent and oxidizer in deionized water is used to remove the oxidized film and punched bur simultaneously using chemical etching method.

Abstract: The inventive aqueous pickling agent on the basis of sulfuric acid or phosphoric acid and hydrogen fluoride for stainless steels, which pickling agent is free of wetting and emulsifying agents, contains (each as 100 wt-% substance) 1.5 to 16 wt-% sulfuric acid or 2.0 to 30 wt-% phosphoric acid as well as 0.5 to 14 wt-% hydrogen fluoride and 0.5 to 15.5 wt-% acid-soluble aromatic nitro compound. An iron(III) compound is not supplied to said pickling agent. Merely in the starting phase, an oxidizing agent can be supplied, which oxidizes iron(II) to form iron(III). As acid-soluble aromatic nitro compound m-nitrobenzene sulfonate and/or 3-nitrophthalate are particularly advantageous. The inventive pickling agent can be used as bath pickle and —when adding 2.5 to 5.5 wt-% magnesium and/or magnesium compound (calculated as Mg)—also as spraying pickle or brush pickle.

Abstract: An aqueous solution that has the capacity for removing tarnish and other soil from copper, silver, gold and other noble metals and alloys thereof comprises an acid, thiourea and a transition metal salt. The aqueous material can be used to treat the surfaces of such articles for the purpose of removing tarnish. Such tarnish is removed by the composition and the composition treats the metal surface to retard the re-appearance of tarnish contaminants.

Abstract: An aqueous solution that has the capacity for removing tarnish and other soil from copper, silver, gold and other noble metals and alloys thereof comprises an acid, thiourea and a transition metal salt. The aqueous material can be used to treat the surfaces of such articles for the purpose of removing tarnish. Such tarnish is removed by the composition and the composition treats the metal surface to retard the re-appearance of tarnish contaminants.

Abstract: The present invention provides an aqueous dispersion for chemical mechanical polishing suitable for polishing of copper, which has a high polishing speed and a low erosion rate with overpolishing. The aqueous dispersion for chemical mechanical polishing of the invention contains a compound having a heterocycle, a surfactant and an oxidizing agent, wherein the compound having a heterocycle and the surfactant are in a weight ratio of 1:10 to 1:0.03. The aqueous dispersion may also contain abrasive particle. The compound having a heterocycle is preferably quinaldic acid, benzotriazole or the like. The surfactant is preferably a sulfonic acid salt such as potassium dodecylbenzenesulfonate or ammonium dodecylbenzenesulfonate, and the oxidizing agent is preferably ammonium persulfate, hydrogen peroxide or the like. The abrasive particle used may be inorganic particle such as colloidal silica, an organic particle such as polymer particle, or an organic/inorganic composite particle comprising a combination thereof.

Abstract: An inhibitor especially useful for aqueous solutions being used at high temperatures to remove scale from boiler tubes and the like contains (1) amines including a substituent group with an abietyl nucleus, (2) organic compounds or polymers that contain at least 2—OH moieties per molecule and at least 0.4 —OH moieties per carbon atom, (3) organic molecules that contain a carbon-sulfur bond, and (4) surfactant.

Abstract: The invention relates to an aqueous preparation for the pickling and activation of aluminum-steel composites prior to electroless dip tinning. Specifically, the invention provides pickling/activation solutions for the pretreatment of aluminum-steel composites prior to dip tinning which comprise sulfuric acid, hexafluorosilicic acid, at least one wetting agent, at least one transition metal cation and nitrate and/or nitrite ions.

Abstract: The process for removing a soap-contaminated conversion layer remaining on a metal workpiece after cold-forming with an aqueous acidic cleaning composition containing water, a surfactant such as an alkyl amine ethoxylate and nitric acid, phosphoric acid and/or amidosulphonic acid includes immersing the contaminated metal workpiece in the aqueous acidic cleaning composition at a temperature above 60.degree. C. until it has a clean bright surface and a fatty acid formed by reaction of the soap in the conversion layer is dispersed in the cleaning composition and then subsequently separating the metal workpiece from the cleaning solution and, after the separating, cooling the recovered aqueous acidic cleaning composition to a temperature below 55.degree. C. until a fatty acid layer including the fatty acid is separated from the aqueous acidic cleaning composition.

Abstract: Alkaline earth and transition metal scaling such as calcium and magnesium scaling can be controlled or removed in pipes, vessels, heat exchanges, evaporators, and filters, and in the oil field applications such as, for example, for drilling, production, and recovery operations with the addition of an effective amount of 2-hydroxyethyl iminodiacetic acid (HEIDA) or a salt thereof.

Abstract: There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) quaternary ammonium salt or (D') a specific organic carboxylic acid ammonium salt and/or an organic carboxylic acid amine salt; as well as a process for producing a semiconductor device by forming a resist pattern on a substrate equipped on the surface with an insulating film layer or a metallic electroconductive layer, forming a via hole or electric wiring by dry etching, removing the resist pattern by ashing treatment with oxygen plasma; and effecting an cleaning treatment with the above cleaning liquid. The above cleaning liquid and production process can readily remove the deposit polymer formed in the case of dry etching without impairing metallic film and insulating film.

Abstract: A chemical cleaning composition for silver- or copper-containing surfaces consists of a water-soluble solid or powder comprising thiourea or a derivative thereof, and is formulated in unit application form, e.g. in tablet or sachet form. A preferred composition comprises up to 60% thiourea or a derivative thereof; up to 4% surfactant; not more than 40% acidifier; less than 20% disintegrant; up to 10% binder; 0-1% lubricant; and up to 40% diluent.

Abstract: A combination of stabilizers and bromochloromethane are used as a cleaning composition in which the bromochloromethane is stabilized against decomposition and the release of bromine into the atmosphere.

Abstract: A composition of matter is disclosed for cleaning an aluminum surface comprising:a hydroxy organic acid;an organic complexing agent;a phosphorous oxide acid;a nitrogen oxide acid;optionally a urea compound; andoptionally a compound having a fluoride ion.