Abstract: Bleach activator cogranulates of one or more ammonium nitrites and at least one further bleach activator obtained by spraying an aqueous solution of one or more ammonium nitrites onto the further bleach activator, granulating the resulting mixture and drying and sieving the moist granulate.

Abstract: The invention provides a process for producing a bleaching activator composition, which includes removing a solvent and/or water from a mixture of a bleaching activator and a surfactant dispersed in a non-aqueous solvent, a bleaching activator composition produced by the process and a bleaching activator granule obtained by further granulating the bleaching activator composition.

Abstract: A process for extracting a natural surfactant includes the steps of providing a quantity of water, adding in a quantity of seaweed to the water resulting in a process medium, adding an enzyme solution to the process medium, and extracting the natural surfactant from the seaweed. The natural surfactant or kelp extract is then used in the formulation of many cleaning solutions.

Abstract: Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain dialkylhydroxyamine stabilizers, dialkylhydroxylamine stabilizer salts, nitrone stabilizers or amine oxide stabilizers. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.

Abstract: An aqueous liquid laundry detergent composition comprising an alkoxylated carboxylic acid surfactant and urea at pH 6-8. The composition has improved performance on grass stain removal.

Abstract: A liquid corrosion inhibitor comprising a primary, secondary, tertiary or mixed amine complexing agent and a carboxylic acid complexing agent, and may further contain a pH adjusting agent and an antifreeze agent, which is capable of providing both short-term and long-term corrosion protection on ferrous and non-ferrous metal substrates and protection from flash rusting commonly associated with ferrous metal substrates, without adversely affecting high gloss in coatings.

Abstract: Process for preparing stable polymer concentrates, wherein acryloyldimethyltaurine and/or acryloyldimethyltaurate are free-radically polymerized with at least one further component in the presence of a polymerization medium, a higher-boiling solvent or solvent mixture is added to the resulting reaction product or reaction mixture, and the lower-boiling polymerization medium is removed, optionally under reduced pressure.

Abstract: Novel cleansing compositions and methods for making same are described. Preferred embodiments provide compositions comprising an acrylate copolymer, an alkoxylated methyl glucoside polyol, and a surfactant. Preferred alkoxylated methyl glucoside polyols among those useful herein may include ethoxylated and/or propoxylated methyl glucoside polyols.

Abstract: An amphoteric surfactant reduces adverse effects of free chlorine and ensures high color retention of dyed hair, dyed keratin fibers and dyed fabrics made of dyed keratin fibers. The surfactant is represented by the following general formula (1): [wherein R1 is an alkyl or alkenyl group having 10 to 18 carbon atoms].

Abstract: Disclosed is a composition for softening an absorbent tissue. The composition includes an effective amount of a softening active ingredient; a vehicle in which the softening active ingredient is dispersed; an electrolyte dissolved in the vehicle; and a bilayer disrupter. The electrolyte and the bilayer disrupter cooperate to cause the viscosity of the composition to be less than the viscosity of a dispersion of the softening active ingredient in the vehicle alone. Preferably, the softening active ingredient is a quaternary ammonium compound with the formula: (R1)4?m—N+—[(CH2)n—Y—R3]mX? the vehicle is water, the electrolyte is calcium chloride, and the bilayer disrupter is a nonionic surfactant.

Abstract: A process of making particulate foam regulating granulates by spraying an aqueous foam regulating emulsion containing 16% to 70% by weight of a foam regulating active ingredient based on paraffin wax or silicone oil, 2% by weight to 15% by weight of a nonionic and/or anionic emulsifier, and not more than 80% by weight of water onto a solid carrier material, wherein the carrier material comprises an alkali metal carbonate and a Brønsted acid.

Abstract: The present invention relates to methods and compositions for treating a surface of a substrate by foam technology that includes at least one treatment chemical. The invention more particularly relates to the removal of undesired matter from the surface of substrates with small features, where such undesired matter may comprise organic and inorganic compounds such as particles, films from photoresist material, and traces of any other impurities such as metals deposited during planarization or etching. A method according to the present invention for treating a surface of a substrate comprises generating a foam from a liquid composition, wherein the liquid composition comprises a gas; a surfactant; and at least one component selected from the group consisting of a fluoride, a hydroxylamine, an amine and periodic acid; contacting the foam with the surface of a substrate; and, removing the undesired matter from the surface of the substrate.

Abstract: A stain removing composition having a mixture of N-methyl pyrrolidinone and at least one solvent from the group consisting of 3-pentanol, dipropylene glycol monomethyl ether, propylene glycol n-propyl ether, and diethylene glycol monobutyl ether. Preferably, the stain removing composition comprises, in percent by weight about 70-90%, N-methyl pyrrolidinone and about 10-30%, in percent by weight, at least one of the solvents from the group described above.

Abstract: The invention is a preparation comprising an oil-in-water emulsion containing soap, the emulsion further comprising: (a) 4-12% by weight of at least one fatty acid with 12 to 18 carbon atoms, (b) 3-8% by weight of at least one trialkanolamine, (c) 1-8% by weight of at least one nonionic emulsifier, (d) 0-3% by weight of a fatty alcohol or fatty alcohol mixture, (e) 0.1-6% by weight of one or more emollients, (f) 1-10% by weight propellant with a vapor pressure of 76 to 420 kPa at 20° C., (g) 0-1% by weight of at least one cellulose derivative, and (h) 0.1-4% by weight of at lest one glycerol polyglycol ether isostearate, wherein the oil-in-water emulsion is free from fatty acid diethanolamides, and wherein the preparation is suitable for filling in an aerosol container. The invention also includes a pressurized gas container containing the preparation.

Abstract: Laundry articles comprise a water-insoluble substrate and a particulate soil absorber comprising a crosslinked polyamide including units having a nucleophilic group. The particulate soil absorber is adhered to the water-insoluble substrate and is effective for inhibiting transfer or redeposition of particulate soil to items in a wash solution. Methods for making such articles comprise adhering a particulate soil absorber comprising a crosslinked polyamide including units having a nucleophilic group to the water-insoluble substrate.

Abstract: A high concentration, aqueous liquid surfactant composition is disclosed, comprising at least one amphoteric or anionic surfactant and a liquid-stabilizing amount of at least one liquid-stabilizing agent. The liquid-stabilizing agent is a succinic acid derivative, glutaric acid derivative or a combination thereof. The composition is pourable and pumpable at ambient room temperature.

Abstract: A compound of formula: wherein each R group independently is C6-C10 arylene group, a straight or branched chain C2-C°alkylene group optionally containing an arylene group, or a C4-C20 straight chain alkylene group containing one or more —NH— groups in the alkylene chain, each X is —O—, —S—, or —NR5— where R5 is hydrogen or C1-C6 alkyl, each AO group is independently ethyleneoxy, 1,2-propyleneoxy, or 1,2-butyleneoxy, n, m and p is from 1 to 50 and the sum of n, m and p is from 4 to 50, and the R4 is independently —CH2-CH(OH)—R9, wherein each R9 independently represents a C4-C18 saturated or unsaturated, substituted or unsubstituted hydrocarbon group. The compound has surfactant and defoaming properties and is useful in latex paint, an ink, an adhesive, or a metal working compositions.

Abstract: A viscoelastic surfactant composition having improved rheological performance comprising one or more quaternized amidoamine surfactants, one or more tertiary amine amides, one or more polymeric acids and one or more electrolytes, viscosified aqueous fluids comprising the surfactant composition and methods of making and using the viscosified aqueous fluid for treating subterranean formations.

Abstract: Degreasing compositions that may be used, for example, to degrease substrates such as contaminated surfaces of automobile engines are disclosed. The degreasing compositions comprise a builder, an amphoteric surfactant, and an alkoxylated acetylenic diol having the structure of formula (I) or (II): where: R1 and R4 are, independently, alkyl radicals containing from 3 to 10 carbon atoms; R2 and R3 are, independently, selected from the group consisting of methyl and ethyl; and (x+y)=2 to 50; ?where: r and t are each, independently, 1 or 2; (n+m)=1 to 30; and (p+q)=1 to 30. Certain embodiments of the degreasing composition are non-caustic, low VOC and may be low phosphate or phosphate-free.

Abstract: Wipes are described, premoistened with an anti-static amphoteric cleaning composition. In tests for residual surface charge wipes of the invention showed remarkable charge dissipation properties. Also described are packaged products containing such wipes, use of such wipes in cleaning a surface and the manufacture of such wipes and packaged products.

Abstract: A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide layer and then removing the chemical oxide layer, thereby removing foreign bodies from a surface of the semiconductor substrate. Accordingly, the foreign bodies can be substantially removed from the surface of the substrate without corroding a metal.

Abstract: The present invention relates to the use of polymers comprising a block copolymer containing at least one group A and at least one group B in which each group A is a polymeric block built up from an ethylenically unsaturated polymerisable monomer and each group B is a polymeric block built up from an alkylene oxide, alkylene glycol or cyclic ether monomer or a mixture thereof for promoting soil release during laundering of a textile fabric and processes for their preparation. Laundry cleaning compositions comprising such polymers, a method of promoting soil release during laundering of a textile fabric and the use of such polymers in the manufacture of a laundry cleaning composition for effecting soil release from a laundry item form other aspects of the invention.

Abstract: The use is claimed of transition metal complexes of the formula (I) [M(L)Yn]Xm??(I) where M is a metal atom from the group of Mn and Fe, L is a ligand of the general formula (II) or (III) where R1, R2, R3 and R4 are the same or different and are each H, C1–C8-alkyl or C6–C12-alkaryl; X and Y are each an uncharged or anionic ligand from the group of CH3CN, chloride, bromide, nitrate, perchlorate, sulfate, citrate, hexafluorophosphate, trifluoromethanesulfonate, tetrafluoroborate, tetraphenylborate or an anion of organic acids having C1–C22 carbon atoms, n and m are each a number from 0 to 4 as bleach catalysts in laundry detergents and cleaning compositions.

Abstract: A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable for removing a variety of resists from substrates at different stages in the process of manufacturing integrated circuits.

Abstract: Recently, use is made of copper wiring as the wiring material for semiconductor devices, and of low dielectric constant films as the insulating film between the lines of wiring. In this connection, a photoresist stripper is in need which can inhibit corrosion or damage on the copper wiring or the Low-k film, and which has excellent property of removing ashed photoresist residues. The invention provides a photoresist stripper (hereinafter, referred to as the stripper of the invention) characterized in containing a tertiary amine compound, an alkaline compound, a fluoro compound, and an anionic surfactant; and a process for preparation of semiconductor devices using the stripper of the invention.

Abstract: A liquid preparation for a contact lens is provided, including at least one disinfectant selected from the group consisting of germicidal biguanides and germicidal quaternary ammonium salts (Component A), glycolic acid and/or asparatic acid (Component B), and 2-amino-2-methyl-1,3-propanediol or a salt thereof (Component C). Component B and Component C are provided in a sufficient amount to fulfill a predetermined molar ratio.

Abstract: The invention relates to a water soluble container which containing concentrate composition useful for hard surface disinfecting and cleaning comprising: (a) at least one cationic surfactant having germicidal properties; (b) at least one non-ionic surfactant; (c) at least one organic solvent having a solubility in water of at least 4% wt.; (d) optionally, at least one alkanolamine; (e) optionally, at least one polyethylene glycol; and (f) optionally, up to about 10% wt. of one or more conventional additives selected from coloring agents, fragrances and fragrance solubilizers, viscosity modifying agents, other surfactants, other antimicrobial/germicidal agents, pH adjusting agents and pH buffers including organic and inorganic salts, optical brighteners, opacifying agents, hydrotropes, antifoaming agents, enzymes, anti-spotting agents, anti-oxidants, preservatives, and anti-corrosion agents; wherein said concentrate composition contains no more than 20% wt. water, and desirably contains less.

Abstract: An aqueous coating removal composition containing: a) an alkoxylated aromatic alcohol, b) an amine; and c) an inorganic base is provided. The coating removal compositions are useful in cleaning coatings such as paint from substrate surfaces and may be formulated to be essentially free (or, preferably, entirely free) of organic solvents classified as volatile organic compounds or HAPS.

Abstract: The present invention relates to stable polymer systems comprising anionic and modified polyamine polymers. When such polymer systems are employed in cleaning compositions, such cleaning compositions exhibit unexpectedly improved anti-soil re-deposition and situs whitening capabilities.

Abstract: Described are monomeric fluorosurfactants having two perfluoro-lower-alkyl sulfonamido segments which are more efficient and effective in lowering the surface tension of organic solvents and water compared to other C4-based fluorosurfactants.

Abstract: The invention relates to the field of cleaning and disinfection of hard surfaces. The cleaning and disinfection of the surfaces is achieved by means of a deaning textile and an aqueous preparation, comprising disinfection agents and additives selected from a group comprising a quatemary ammonium compound of formula (II), polydialkyldiallylammonium salts and derivatives thereof and the copolymers of dialkyldiallylammonium salts with acrylamide, and/or acrylic acid, and/or vinyl acetate, and derivatives thereof. The invention further relates to an aqueous concentrate, an aqueous preparation produced therefrom and a method for the reduction of active ingredient losses in disinfection solutions when using said concentrate.

Abstract: A method for chemical etching is disclosed for taking away oxidized film and removing cut as well as punched edge burs of harden-treated carbon steel (SK3, SK4 and SK5). Thereby, the fillet edge of the cut section is achieved. An oxidized film with a thickness of several micrometers is formed when a cut and punched steel is quenched and tempered at high temperature. Due to high strength and hardness of the steel, the oxidized film and edge burs are difficult to be removed by mechanical grinding. Therefore, a suitable electrolyte composes of only a little chemical reagent and oxidizer in deionized water is used to remove the oxidized film and punched bur simultaneously using chemical etching method.

Abstract: A multi-purpose contact lens care solution having high activity against fungi and certain bacteria comprising, in liquid aqueous medium, an alkylamine having the following formula, where R1 is a C13-17 alkyl, and R2 and R3 are each independently H or —CH3, and a non-ionic surfactant. The solution may optionally also include additional antimicrobial components, a buffer component, a viscosity inducing component, a surfactant, taurine, propylene glycol and/or a tonicity component. This solution additionally prevents losses in ocular tissue membrane integrity during contact lens wear.

Abstract: A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Abstract: The present invention is directed to resist and etching residue removing compositions containing at least one nucleophilic amine compound possessing reduction and oxidation potentials, a two-carbon atom linkage alkanolamine compound, and optionally water and/or one or more corrosion inhibitors. The compositions may be substantially free of hydroxylamine, polar organic solvents, water, corrosion inhibitors, or a combination thereof. The compositions are useful in processes for removing resists and etching residue from metal or metal alloy substrates or substrate layers used in micro-circuitry fabrication.

Abstract: The present invention provides a laundry bleaching composition comprising: a) a macrocycilc tetra amido N-donor metal-ligand complex (preferably, 5,6-benzo-3,8,11,13-tetraoxo-2,2,9,9,12,12-hexamethyl-1,4,7,10-tetraaza-cyclo-tridecane), and b) an alkyl benzene sulphonate surfactant, said composition being substantially devoid of any added peroxygen bleach or a peroxy-based or peroxy-generating bleach system.

Abstract: Liquid bleaching composition components are claimed which comprise 1) amphiphilic copolymers which include structural units which are derived from a) acryloyldimethyltauric acid in free, partially neutralized or completely neutralized form with mono- or divalent inorganic or organic cations and b) at least one hydrophobic comonomer based on ethylenically unsaturated polyalkylene alkoxylates and optionally c) further at least monovinylically unsaturated comonomers different from a) and b), and 2) at least one bleach activator, bleach catalyst or oxygen transfer agent.

Abstract: A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide layer and then removing the chemical oxide layer, thereby removing foreign bodies from a surface of the semiconductor substrate. Accordingly, the foreign bodies can be substantially removed from the surface of the substrate without corroding a metal.

Abstract: A method of washing a soiled textile comprising cotton, the method comprising contacting the textile with a wash liquor, the wash liquor containing a soil-release effective amount of one or more soil release polymers obtained by polymerizing one or more polyisocyanates with one or more polymeric polyols having an average molar mass of above 1000 D and a 20° C. water solubility of above 300 g of polymer per liter, one or more polyols having an average molar mass of below 12,000 D and a 20° C. water solubility of below 100 g per liter, and optionally one or more further polyols.

Abstract: The present invention relates to a composition having a pH of less than about 7, for treating a hard surface comprising: at least one low residue surfactant and/or an alkyl ethoxylate surfactant; and a polymeric biguanide.

Abstract: The following dye-transfer-inhibiting dye fixatives are used in laundry detergents which comprise nonionic surfactants: Reaction products of a) amines with epichlorohydrin or b) cyanamide with amines and aldehydes.

Abstract: This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an acidic chemistry for the post-CMP cleaning of wafers containing metal, particularly copper, interconnects. Residual slurry particles, particularly copper or other metal particles, are removed from the wafer surface without significantly etching the metal, leaving deposits on the surface, or imparting significant organic (such as carbon) contamination to the wafer while also protecting the metal from oxidation and corrosion. Additionally, at least one strong chelating agent is present to complex metal ions in solution, facilitating the removal of metal from the dielectric and preventing re-deposition onto the wafer. Using acidic chemistry, it is possible to match the pH of the cleaning solution used after CMP to that of the last slurry used on the wafer surface.

Abstract: A light duty, liquid cleaning composition comprising: at least two different surfactants, lauryol ethylene diamine triacetate, a zinc inorganic salt, and water.

Abstract: The present invention is directed to a composition having from about 0.005% to about 5% by weight, preferably, from about 0.01% to about 1% by weight of an antioxidant. The composition is selected from the group consisting of a laundry detergent composition, a fabric softening composition, a dish care composition, a personal cleansing composition, a shampoo composition, a rinsing composition and a conditioner composition.

Abstract: The present invention relates to a composition having a pH of less than about 7, for treating a hard surface comprising: at least one low residue surfactant and/or an alkyl ethoxylate surfactant; and a polymeric biguanide.

Abstract: The cleaning composition of the present invention is characterized by containing N-hydroxyformamide. The cleaning composition is capable of easily removing patterned photoresist masks or resist residues remaining on substrates after the etching process or removing resist residues remaining after the etching process and the subsequent ashing process within a short period of time without causing the corrosion of wiring materials and insulating films, thereby ensuring the fine processing to provide high-precision wiring circuits.

Abstract: A cleaning solution for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device is provided, the cleaning solution including one type or two or more types of aprotic polar solvent. There is also provided a cleaning method for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device, wherein cleaning is carried out by immersion or jet flow using the cleaning solution.

Abstract: The present invention relates to a facility parts cleaning solution for the processing of (meth)acrylic acid and/or (meth)acrylic esters and a cleaning method using the cleaning solution. An aqueous cleaning composition comprising 5 to 50 wt % of at least one alkali metal hydroxide selected from the group consisting of sodium hydroxide and potassium hydroxide, 0.01 to 1 wt % of a water-soluble amino acid, 0.001 to 0.05 wt % of N,N?-methylene bisacrylamide, and 0.001 to 0.05 wt % of azobisisobutyronitrile is used to clean facility parts for manufacturing (meth)acrylic acid and/or (meth)acrylic esters in order to easily remove polymers and deposits.

Abstract: The present in relates to fabric enhancement compositions which provide reduced fabric abrasion damage.

Abstract: Cleaning solutions for removing photoresist resins remaining on the underlying layer patterns formed by photolithography process using the photoresist patterns as etching mask. The cleaning solution for removing photoresist comprises H2O as solvent, amine compounds, hydrazine hydrate, transition metal-removing material and alkali metal-removing material. Photoresist coated on the top portion of underlying layers can be rapidly and effectively removed by the disclosed cleaning solution. In addition, the cleaning solution is environment-friendly because H2O is used as the solvent, and has little effect on metal layers when underlying layers are formed of metals.