Processes Of Chemically Modifying A Blend Of Two Or More Solid Polymers In The Presence Of A Chemical Reactant; Or Compositions Therefore Patents (Class 522/109)
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Patent number: 6156345Abstract: A crosslinkable macromer system that includes two or more polymer-pendent polymerizable groups and one or more polymer-pendent initiator groups. The polymerizable groups and the initiator group(s) can be pendent on the same or different polymeric backbones. The macromer system provides advantages over the use of polymerizable macromers and separate, low molecular weight initiators, including advantages with respect to such properties as nontoxicity, efficiency, and solubility.Type: GrantFiled: December 21, 1999Date of Patent: December 5, 2000Assignee: SurModics, Inc.Inventors: Stephen J. Chudzik, Aron B. Anderson
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Patent number: 6136882Abstract: This invention provides a UV curable powder coating composition comprising a particulate blend of a non-crystalline unsaturated polyester base resin, a crystalline unsaturated crosslinker resin co-polymerizable with the base resin, and a photoinitiator, that exhibits reduced or eliminated hazing in the cured coating formed therefrom upon being cured at low temperatures demanded by certain heat sensitive substrates. This is accomplished by incorporating in the powder composition a recrystallization or haze inhibitor which is comprised of a crystalline epoxy resin. When this powder blend is melted for curing, the crystalline crosslinker resin visually appears to separate and recrystallize out of the molten powder less completely than it does in the absence of the recrystallization or haze inhibitor. This prevents a visible haze from developing on the surface of the coating upon curing with UV radiation.Type: GrantFiled: July 8, 1999Date of Patent: October 24, 2000Assignee: Morton International Inc.Inventors: Andrew T. Daly, Jeno Muthiah, Richard P. Haley, Owen H. Decker, Eugene P. Reinheimer, Matthew B. Snyder
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Patent number: 6060532Abstract: A method for using a thermoplastic elastomeric composition which contains a multi-staged emulsion polymer binder is provided. An elastomeric composition which contains a multi-staged emulsion polymer binder and a photosensitive composition and a method for using the elastomeric composition in elastomeric coatings, caulks, or sealants is also provided.Type: GrantFiled: January 8, 1998Date of Patent: May 9, 2000Assignee: Rohm and Haas CompanyInventors: Lawrence Stephen Frankel, William Stellwagen, Jr., John Van Curen, Donald Alfred Winey
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Patent number: 6011080Abstract: This invention provides a UV curable powder coating composition comprising a particulate blend of a non-crystalline unsaturated polyester base resin, a crystalline unsaturated crosslinker resin co-polymerizable with the base resin, and a photoinitiator, that exhibits reduced or eliminated hazing in the cured coating formed therefrom upon being cured at low temperatures demanded by certain heat sensitive substrates. This is accomplished by incorporating in the powder composition a recrystallization inhibitor which is comprised of a crystalline epoxy resin. When this powder blend is melted for curing, all of the crystalline resin species tend to separate and recrystallize out of the molten powder slower and less completely than they do in the absence of the recrystallization inhibitor. This prevents a visible haze from quickly developing on the surface of the molten coating before the coating can be cured with UV radiation.Type: GrantFiled: August 19, 1998Date of Patent: January 4, 2000Assignee: Morton International, Inc.Inventors: Andrew T. Daly, Jeno Muthiah, Richard P. Haley, Owen H. Decker, Eugene P. Reinheimer, Matthew B. Snyder
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Patent number: 6007833Abstract: A crosslinkable macromer system that includes two or more polymer-pendent polymerizable groups and one or more polymer-pendent initiator groups. The polymerizable groups and the initiator group(s) can be pendent on the same or different polymeric backbones. The macromer system provides advantages over the use of polymerizable macromers and separate, low molecular weight initiators, including advantages with respect to such properties as nontoxicity, efficiency, and solubility.Type: GrantFiled: July 23, 1998Date of Patent: December 28, 1999Assignee: SurModics, Inc.Inventors: Stephen J. Chudzik, Aron B. Anderson
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Patent number: 5879858Abstract: A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a polymerizable monomer, a photocrosslinkable polyester and a photoinitiator. The photosensitive resins are present at a total weight ratio to the monomer of at least 1.5:1.Type: GrantFiled: December 19, 1996Date of Patent: March 9, 1999Assignee: Kodak Polychrome Graphics, LLCInventors: Thap DoMinh, John Kalamen
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Patent number: 5851731Abstract: A water processable photopolymeric composition for use in the manufacture of flexographic photopolymer printing plates is disclosed. Preferably, the flexomer blend includes a flexomer having an affinity for water combined with a hydrophilic crosslinking agent, a nonhydrophilic crosslinking agent, a swell enhancing filler, a hydrophilic plasticizer, a compatibilizer and a surfactant. The compatibilizer aids the blending of the hydrophilic components with the flexomer blend.Type: GrantFiled: September 9, 1996Date of Patent: December 22, 1998Assignee: M. A. Hanna CompanyInventors: Carl David McAfee, Piseth Lov, David Thomas Hughes, Michael Wayne Chase
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Patent number: 5849460Abstract: A photosensitive resin composition for use in manufacture of multi-layer circuit boards with connecting holes between layers is disclosed. The resin composition has excellent adhesion with a plating metal, resolution, photo-curing, thermosetting, thermal resistance, and is capable of being developed using an alkaline solution or an aqueous solution containing a non-halogen based organic solvent as the developing solution. The resin composition comprises a photosensitive epoxy resin, a thermosetting epoxy resin, a reactant of a carboxylic acid added to an acrylonitrile-butadiene rubber and an epoxy resin, a photo-polymerization initiator and a thermosetting agent. This reactant facilitates a high density pattern of connecting holes for circuit boards of the layered type.Type: GrantFiled: July 16, 1997Date of Patent: December 15, 1998Assignee: Hitachi, Ltd.Inventors: Yoshinori Kawai, Mineo Kawamoto, Junichi Katagiri, Masanori Nemoto, Akio Takahashi
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Patent number: 5821032Abstract: A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a polymerizable monomer, a photocrosslinkable polyester, a photocrosslinkable copolymer of styrene and maleic anhydride, and a photoinitiator. The photocrosslinkable resins are present at a total weight ratio to the polymerizable monomer of at least 1.5:1.Type: GrantFiled: December 19, 1996Date of Patent: October 13, 1998Assignee: Kodak Polychrome Graphics, LLCInventor: Thap DoMinh
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Patent number: 5776998Abstract: The invention herein is a non-aqueous solvent free process for producing UV curable adhesive and sealant compositions comprising a tackifying resin and a monohydroxylated epoxidized polydiene polymer which is comprised of at least two polymerizable ethnically unsaturated hydrocarbon monomers wherein at least one is a diene monomer which yields unsaturation suitable for epoxidation and wherein the polymer contains from 0.1 to 7.0 milliequivalents of epoxy per gram of polymer. The process involves mixing the components with an insoluble photoinitiator under conditions of high shear and/or cavitation. The invention also relates to a film of 5 mils to one inch thick which is formed from the composition made according to the process above.Type: GrantFiled: April 26, 1996Date of Patent: July 7, 1998Assignee: Shell Oil CompanyInventors: Jeffrey George Southwick, Kathleen Suzanne Kiibler, James Robert Erickson
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Patent number: 5741855Abstract: A composition comprises a blend of (a) a first crystalline fluoroplastic which is an ethylene-tetrafluoroethylene copolymer, in an amount between 30 and 70 weight %; (b) a second crystalline fluoroplastic which is a terpolymer of tetrafluoroethylene, hexafluoropropylene, and vinylidene fluoride, in an amount between 30 and 65 weight %; and (c) a fluorinated thermoplastic elastomer which is a block copolymer having at least one elastomeric segment comprising tetrafluoroethylene, vinylidene fluoride, and hexafluoropropylene repeat units in a mole ratio 45-90:5-50:0-35 and at least one nonelastomeric segment comprising tetrafluoroethylene and ethylene repeat units, in an amount between 5 and 25 weight %. The fluorinated thermoplastic elastomer acts as a compatibilizer for the two fluoroplastics. The composition exhibits improved flexibility, tensile strength, and/or elongation.Type: GrantFiled: June 10, 1996Date of Patent: April 21, 1998Assignee: Raychem CorporationInventors: Bruce Kaduk, Keith Dawes, Awtar Singh, Jing Tian
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Patent number: 5716551Abstract: A U.V. curable composition for application to a substrate surface to provide a static dissipative coating which comprises a conductive matrix constituent having a crown type ligand selected from the group consisting of podands, coronands and cryptands in a guest/host relationship with a conductive dopant moiety. Such ligands included those provided by functionalized podands and functionalized coronands. The formulation further includes a polymer matrix constituent formed of a base oligomer system and a crosslinking agent which is reactive with the base oligomer system to form a crosslinked resin matrix which incorporates the conductive matrix constituent. A low viscosity diluent functions as a solvating liquid for the crosslinking agent and the base oligomer system. The formulation further includes a photoinitiator of the free radical or cationic type to initiate polymerization of the composition upon the application of electromagnetic radiation in the ultraviolet range.Type: GrantFiled: February 9, 1996Date of Patent: February 10, 1998Assignee: Tech Spray, Inc.Inventors: Greg Roland Unruh, Jean Gentleman-Wynn
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Patent number: 5698331Abstract: The present specification discloses a hygroscopic polyester copolymer with a hydrophilic compound copolymerized, containing a cross-linking agent and controlled in moisture absorbing and releasing property, and a fiber using the polyester copolymer. The fiber can be used as a comfortable material for underwear, sports wear, interlinings, etc. as highly hygroscopic woven and knitted fabrics, etc. of high quality.Type: GrantFiled: January 25, 1996Date of Patent: December 16, 1997Assignee: Toray Industries, Inc.Inventors: Yoshitaka Matsumura, Yuko Harashina, Tetsunori Higuchi, Tai Sasamoto
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Patent number: 5679485Abstract: A photosensitive composition comprising:(A) 35-80 weight parts of a phosphorus-containing hydrophilic copolymer made by copolymerization of a mixture of (a) 5-30 weight % of a phosphate ester group-containing unsaturated monomer, (b) 40-90 weight % of a conjugated diene monomer, and (c) 0-50 weight % of other monoolefinically unsaturated monomer;(B) 65-20 weight parts of a thermoplastic elastomer; the sum of (A) plus (B) being 100 weight parts;(C) 5-300 weight parts of a photopolymerizable ethylenically unsaturated monomer; and(D) 0.1-10 weight parts of a photopolymerization initiator.The photosensitive composition is useful for a photosensitive rubber plate and a flexographic printing plate.Type: GrantFiled: September 29, 1995Date of Patent: October 21, 1997Assignee: Nippon Zeon Co., Ltd.Inventors: Takao Suzuki, Fusayoshi Sakurai, Haruo Ueno, Ichiro Konishi, Tatsuo Usui
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Patent number: 5578417Abstract: A process is disclosed for producing a liquid jet recording head comprising applying an active energy-curing resin composition onto at least a part of a surface of a first member for forming a wall of the liquid path; exposing the applied active energy-ray-curing resin to an active energy ray selected from the group consisting of an ultraviolet-ray having an intensity of 1 mW/cm.sup.2 to 100 mW/cm.sup.2 and an electron beam having an intensity of 0.5M Rad to 20M Rad; and providing a second member on the exposed active energy-ray-curing resin composition.Type: GrantFiled: March 20, 1995Date of Patent: November 26, 1996Assignee: Canon Kabushiki KaishaInventors: Hiromichi Noguchi, Tadayoshi Inamoto, Megumi Saito
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Patent number: 5578418Abstract: A process is disclosed for producing a liquid jet recording head comprising applying an active energy-curing resin composition onto at least a part of a surface of a first member for forming a wall of the liquid path; exposing the applied active energy-ray-curing resin to an active energy ray selected from the group consisting of an ultraviolet-ray having an intensity of 1 mW/cm.sup.2 to 100 mW/cm.sup.2 and an electron beam having an intensity of 0.5M Rad to 20M Rad; and providing a second member on the exposed active energy-ray-curing resin composition.Type: GrantFiled: March 20, 1995Date of Patent: November 26, 1996Assignee: Canon Kabushiki KaishaInventors: Hiromichi Noguchi, Tadayoshi Inamoto, Megumi Saito
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Patent number: 5571659Abstract: A process is disclosed for producing a liquid jet recording head comprising applying an active energy-curing resin composition onto at least a part of a surface of a first member for forming a wall of the liquid path; exposing the applied active energy-ray-curing resin to an active energy ray selected from the group consisting of an ultraviolet-ray having an intensity of 1 mW/cm.sup.2 to 100 mW/cm.sup.2 and an electron beam having an intensity of 0.5M Rad to 20M Rad; and providing a second member on the exposed active energy-ray-curing resin composition.Type: GrantFiled: March 20, 1995Date of Patent: November 5, 1996Assignee: Canon Kabushiki KaishaInventors: Hiromichi Noguchi, Tadayoshi Inamoto, Megumi Saito
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Patent number: 5558975Abstract: A process is disclosed for producing a liquid jet recording head comprising applying an active energy-curing resin composition onto at least a part of a surface of a first member for forming a wall of the liquid path; exposing the applied active energy-ray-curing resin to an active energy ray selected from the group consisting of an ultraviolet-ray having an intensity of 1 mW/cm.sup.2 to 100 mW/cm.sup.2 and an electron beam having an intensity of 0.5M Rad to 20M Rad; and providing a second member on the exposed active energy-ray-curing resin composition.Type: GrantFiled: March 13, 1995Date of Patent: September 24, 1996Assignee: Canon Kabushiki KaishaInventors: Hiromichi Noguchi, Tadayoshi Inamoto, Megumi Saito
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Patent number: 5529886Abstract: The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.Type: GrantFiled: May 1, 1995Date of Patent: June 25, 1996Assignee: Hoechst AktiengesellschaftInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5516845Abstract: A thermoplastic basic polymers in pourable form are mixed with similarly pourable carrier polymers dispersable or soluble in the basic polymers with a cross-linking agent to produce cross-linked polymer moldings. These mutually compatible components are heated under further mixing to a reaction temperature above the melting range of the basic polymer and processed. The reaction of free radicals leads to bonds between polymer chains and/or the degradation of polymer chains.Porous carrier polymers which contain at least one organic peroxide and/or coagent incorporated in the fine pore structure as a fluid silane-free cross-linking agent are mixed in the basic polymer. Peroxide-containing carrier polymers are heated, coagent-containing carrier polymers are irradiated.The moldings are used for example for cable and sheath isolation, pipes for hot water lines and highly stressed injection moldings.Type: GrantFiled: December 6, 1994Date of Patent: May 14, 1996Assignee: Brugg Kabel AGInventors: Ulrich Heese, Renato Salvel
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Patent number: 5496295Abstract: Multilayered barrier structures comprising a gas barrier layer of a non-chlorine containing organic polymer which is substantially impermeable to oxygen gas and a moisture barrier layer of a mesophase propylene-based material are provided. These structures are environmentally compatible and radiation resistant, and exhibit one or more additional properties, including gas barrier properties, moisture barrier properties, toughness, heat sealability, softness, and quietness during wrinkling. Also provided are methods of preparing and using such multilayered barrier structures, and articles, such as films, pouches, and tubings, formed from these structures.Type: GrantFiled: December 6, 1993Date of Patent: March 5, 1996Assignee: Minnesota Mining and Manufacturing CompanyInventors: Debra L. Wilfong, Richard J. Rolando
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Patent number: 5426008Abstract: A photocurable gel suitable for articles such as printing plates, photoresists and the like is disclosed. The photocurable eel comprises (a) a polymer composition having isotactic polymethyl methacrylate moiety; and syndiotactic polymethyl methacrylate moiety; (b) a photopolymerizable ethylenically unsaturated compound; and (c) a photopolymerization initiator. The gel is solid at ambient temperature and is capable of undergoing reversible gel/sol transition by heating or cooling. Methods of preparing articles, as well as methods of fixing articles, which use the gel are also disclosed. Such methods include sealing or affixing component parts on an electronic circuit board.Type: GrantFiled: November 15, 1993Date of Patent: June 20, 1995Assignee: W. R. Grace & Co.-Conn.Inventors: Yoshichi Hagiwara, Yuichi Mori, Hiroshi Samukawa, Kazuhide Saigo
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Patent number: 5424172Abstract: A photosensitive resin composition includes (A) a hydrophobic polymer having a glass transition temperature not greater than 5.degree. C., (B) a hydrophilic polymer, (C) an ethylenically unsaturated compound, (D) a solvent capable of dissolving the component (B) more than the component (A) and (E) a photopolymerization initiator, with the content of component (B) being less than that of component (A). The resin composition can be used to prepare a printing plate having a base, a photosensitive resin layer and a covering layer arranged one over another. The photosensitive resin layer contains a dispersed phase which includes particles having a phase which includes a hydrophobic polymer, surrounded by a phase which includes a hydrophilic polymer. The photosensitive resin layer can be prepared by removing the solvent (D) to a content of 0.001-2% by weight.Type: GrantFiled: July 20, 1992Date of Patent: June 13, 1995Assignee: Toyo Boseki Kabushiki KaishaInventors: Masaru Nanpei, Akira Tomita, Keizo Kawahara, Toshihiko Kajima
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Patent number: 5414027Abstract: Disclosed is a normally solid, high molecular weight, non-linear, substantially gel-free, propylene polymer material characterized by high melt strength due to strain hardening which is believed to be caused by free-end long chain branches of the molecular chains forming the polymer.Also disclosed is a process for making the polymer by high energy radiation of a normally solid, high molecular weight, linear, propylene polymer in a reduced active oxygen environment, maintaining the irradiated material in such environment for a specific period of time, and then deactivating free radicals in the material.Further disclosed is the use of the strain hardening polymer in extensional flow operations such as, for example, extrusion coating, film production, foaming and thermoforming.Type: GrantFiled: July 15, 1993Date of Patent: May 9, 1995Assignee: Himont IncorporatedInventors: Anthony J. DeNicola, Jr., Jeanine A. Smith, Massimo Felloni
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Patent number: 5372913Abstract: A photosensitive resin composition includes (A) a hydrophobic polymer having a glass transition temperature not greater than 5.degree. C., (B) a hydrophilic polymer, (C) an ethylenically unsaturated compound, (D) a solvent capable of dissolving the component (B) more than the component (A) and (E) a photopolymerization initiator, with the content of component (B) being less than that of component (A). The resin composition can be used to prepare a printing plate having a base, a photosensitive resin layer and a covering layer arranged one over another. The photosensitive resin layer contains a dispersed phase which includes particles having a phase which includes a hydrophobic polymer, surrounded by a phase which includes a hydrophilic polymer. The photosensitive resin layer can be prepared by removing the solvent (D) to a content of 0.001-2% by weight.Type: GrantFiled: August 19, 1992Date of Patent: December 13, 1994Assignee: Toyo Boseki Kabushiki KaishaInventors: Masaru Nanpei, Akira Tomita, Keizo Kawahara, Toshihiko Kajima
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Patent number: 5362603Abstract: The present invention relates to a photopolymerizable composition containing a photopolymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator, a pigment and optionally another resin, wherein said photopolymerizable compound contained therein comprises not less than 60%.Type: GrantFiled: February 24, 1993Date of Patent: November 8, 1994Assignee: Nippon Kayaku Kabushiki KaishaInventors: Yoshinori Katoh, Naoko Ichinose, Teruhito Sotogoshi
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Patent number: 5356949Abstract: An adhesive tape comprising an energy beam transmittable base sheet having a surface tension of not more than 40 dyne/cm and an adhesive layer formed on one surface of the base sheet, the adhesive layer comprising a (meth)acrylate polymer, an epoxy resin, a photopolymerizable low molecular weight compound, a heat activatable latent curing agent for the epoxy resin and a photopolymerization initiator for the photopolymerizable low molecular weight compound. The adhesive in the adhesive layer is curable with an energy beam and the so cured adhesive develops tackiness again when heated. When the tape is used in processing a semiconductor wafer, it serves as a dicing tape for holding the wafer in position during the dicing step. Each piece of the diced and cured adhesive layer, that is attached to each chip and capable of being tackified by heating, provides an adhesive required for securely mounting the chip on the lead frame in the die-bonding step.Type: GrantFiled: February 21, 1992Date of Patent: October 18, 1994Assignee: Lintec CorporationInventors: Mikio Komiyama, Yasunao Miyazawa, Kazuyoshi Ebe, Takanori Saito
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Patent number: 5338769Abstract: A photo-curable resin composition containing a polycarbonate having a number average molecular weight of between 200 and 10,000 and containing at least two (meth)acrylate groups in the molecule, or a diglycidyl phthalate (meth)acrylate, an organic polymer fine powder having an average particle diameter of between 1 .mu.m and 50 .mu.m and a photo-radical polymerization initiator; and a coating liquid to be applied to a resin pattern. This resin composition is useful for preparing a clasp pattern exhibiting a theoretical form for retention, durability, etc., i.e., a cast clasp basic pattern, for producing, by a lost wax method, a cast clasp which is a metal component for holding a partial denture, retaining it and supporting it.Type: GrantFiled: February 11, 1992Date of Patent: August 16, 1994Assignee: Mitsui Petrochemical Industries, Ltd.Inventor: Ryoichi Miyamoto
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Patent number: 5304456Abstract: A negative photoresist composition containing an alkali-soluble resin which is obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR1## wherein R.sup.1 to R.sup.9 are independently a hydrogen atom, an alkyl group, an alkenyl group, an alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R.sup.1 to R.sup.9 is a hydroxyl group and, at the ortho- or para-position to the hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator, and a negative photoresist composition comprising an alkali-soluble resin, a cross linking agent and a photo-acid generator having a trifluoromethanesulfonic acid ester group, which can increase resolution and contrast of a photoresist pattern.Type: GrantFiled: January 29, 1992Date of Patent: April 19, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yuji Ueda, Hiromi Ueki, Naoki Takeyama, Takehiro Kusumoto
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Patent number: 5292618Abstract: A photocurable gel suitable for articles such as printing plates, photoresists and the like is disclosed. The photocurable gel comprises (a) a polymer composition having isotactic polymethyl methacrylate moiety; and syndiotactic polymethyl methacrylate moiety; (b) a photopolymerizable ethylenically unsaturated compound; and (c) a photopolymerization initiator. The gel is solid at ambient temperature and is capable of undergoing reversible gel/sol transition by heating or cooling. Methods of preparing articles, as well as methods of fixing articles, which use the gel are also disclosed. Such methods include sealing or affixing component parts on an electronic circuit board.Type: GrantFiled: April 18, 1991Date of Patent: March 8, 1994Assignee: W. R. Grace & Co.-Conn.Inventors: Yoshichi Hagiwara, Yuichi Mori, Hiroshi Samukuaa, Kazuhide Saigo
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Patent number: 5258419Abstract: Polymer blends of non-crystalline mesomorphous polypropylene and a polymer compatible with such polypropylene and the method of making such polymer blends are provided. Such compatible polymer blends exhibit substantial maintenance of structural integrity after exposure to gamma irradiation and provide heat sealing properties, puncture resistance, and tear strength. Films, fibers, and other articles made from such blends may be used in various applications, including medical articles such as medical packaging films, ostomy pouches, and transdermal delivery patches, which may require sterilized storage prior to usage.Type: GrantFiled: June 26, 1992Date of Patent: November 2, 1993Assignee: Minnesota Mining and Manufacturing CompanyInventors: Richard J. Rolando, Dennis L. Krueger
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Patent number: 5240973Abstract: Surface characteristics of a molded article formed by a composition comprising at least two kinds of engineering plastics and a functionalized polyolefin resin or a composition comprising the said composition and an inorganic filler or a rubbery substance incorporated therein can be improved without deteriorating such characteristics as rigidity, impact resistance, heat resistance, dimensional stability and moldability, by radiating an ultraviolet light not longer than 300 nm in wavelength to the molded article, the said functionalized polyolefin resin containing at least one member selected from the group consisting of carboxylic acid group-, carboxylic ester group- or acid anhydride group-containing monomers, epoxy group-containing monomers, hydroxyl group-containing monomers, amino group-containing monomers, alkenyl cyclic iminoether derivatives and polyfunctional monomers.Type: GrantFiled: November 22, 1991Date of Patent: August 31, 1993Assignees: Japan as represented by Director General of Agency of Industrial Science and Technology, Nippon Petrochemicals Company, LimitedInventors: Kohichiroh Katoh, Motomi Nogiwa, Yoshiharu Iwasaki
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Patent number: 5215863Abstract: Disclosed herein is a resin composition or a solder resist resin composition comprising an epoxy resin (A) and/or an epoxy acrylate (B) obtained by reacting one chemical equivalent of epoxy groups in an epoxy resin with 0.1 to 1.0 chemical equivalent of acrylic acid, a styrene-maleic anhydride copolymer (C), an unsaturated group-containing compound (D) other than (B), and a photopolymerization initiator (E).Type: GrantFiled: October 11, 1991Date of Patent: June 1, 1993Assignee: Nippon Kayaku Kabushiki KaishaInventors: Kazuyoshi Nawata, Tetsuo Ohkubo, Minoru Yokoshima
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Patent number: 5166224Abstract: Non-crystalline elastomeric acetal polymers are disclosed which have ethylenic unsaturation in the polymer backbone. The polymers are synthesized by the ring-opening polymerization of 1,3-dioxolane, 1,3-dioxepane, and the cyclic formal of an ethylenically unsaturated diol having at least 4 adjacent carbon atoms in its main chain. The preferred cyclic formal is 4,7-dihydro-1,3-dioxepin. Because of the ethylenic unsaturation, the elastomeric acetal polymers can be vulcanized or cured with multifunctional vinyl monomers to produce elastomers with improved properties, such as better elasticity, decreased thermoplasticity and decreased solubility. The elastomeric acetals in any of their embodiments are particularly useful for blending with crystalline acetal polymers to improve the impact resistance of the crystalline acetal polymers.Type: GrantFiled: January 2, 1991Date of Patent: November 24, 1992Assignee: Hoechst Celanese Corp.Inventors: George L. Collins, William M. Pleban, Milton J. Hayes, Jr.
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Patent number: 5149776Abstract: A photopolymerizing cross-linking hardenable resin composition is disclosed which is comprised of a binder resin, cross-linking monomer and photopolymerization initiator. The composition of each of the above mentioned components is such that dry film resist incorporating the resin composition of the present invention and used in processes for selective etching and plating of printed circuit boards can be developed in weak aqueous alkaline solution after selective exposure to light. In this way, the efficient and economical manufacture of high definition printed circuit boards is made possible. Additionally, dry film resist incorporating the photopolymerizing cross-linking hardenable resin composition of the present invention lends to easy handling and storage characteristics.Type: GrantFiled: November 16, 1990Date of Patent: September 22, 1992Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Kenji Kushi, Ken-ichi Inukai, Takayuki Iseki, Seiya Koyanagi, Yasuyuki Fujimoto
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Patent number: 5147757Abstract: A novel optically transparent polymer alloy comprisesA) at least one elastomer which contains ethylene and propylene as copolymerized units andB) at least one elastomer which contains ethylene and (meth)acrylic acid as copolymerized units,and is used as a molding material or for the production of molding materials, moldings, films, coatings, adhesives and photosensitive recording elements.Type: GrantFiled: September 17, 1991Date of Patent: September 15, 1992Assignee: BASF AktiengesellschaftInventors: Karl-Rudolf Kurtz, Horst Koch, Thomas Telser
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Patent number: 5140073Abstract: Polymer blends of non-crystalline mesomorphous polypropylene and a polymer compatible with such polypropylene and the method of making such polymer blends are provided. Such compatible polymer blends exhibit substantial maintenance of structural integrity after exposure to gamma irradiation and provide heat sealing properties, puncture resistance, and tear strength. Films, fibers, and other articles made from such blends may be used in various applications, including medical articles such as medical packaging films, ostomy pouches, and transdermal delivery patches, which may require sterilized storage prior to usage.Type: GrantFiled: June 26, 1989Date of Patent: August 18, 1992Assignee: Minnesota Mining and Manufacturing CompanyInventors: Richard J. Rolando, Dennis L. Krueger
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Patent number: 5077402Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.Type: GrantFiled: March 28, 1990Date of Patent: December 31, 1991Assignee: Ciba-Geigy CorporationInventors: Vincent Desobry, Kurt Dietliker, Rinaldo Husler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
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Patent number: 5068263Abstract: An improved active energy ray-curing resin composition comprising (i) a graft copolymerized polymer with a trunk chain containing dicyclopentenyl derivative group which has a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less: (ii) a linear polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 350,000 or less and having a glass transition temperature of 60.degree. C. or more: (iii) a monomer having an ethylenically unsaturated bond: and (iv) a photopolymerization initiator capable of generating free radicals with irradiation of an active energy ray. The resin composition can be desirably cured with an active energy ray such as ultraviolet ray or electron beam and it is capable of being laminated in a desired pattern on a copper-coated laminate for use as a printed board or on a plate of metal, glass, ceramics or plastic.Type: GrantFiled: September 15, 1988Date of Patent: November 26, 1991Assignee: Canon Kabushiki KaishaInventor: Hiromichi Noguchi
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Patent number: 5068262Abstract: An improved active energy ray-curing resin composition comprising (i) a graft copolymerized polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less: (ii) a linear polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 350,000 or less and having a glass transition temperature of 60.degree. C. or more: (iii) an esterified polyurethane obtained from oligoesterdiol or from oligoesterdiol and dihydric isocyanate which has a molecular chain terminal end being esterificated with acrylic acid: and (iv) a photopolymerization initiator.The resin composition can be desirably cured with an active energy ray such as ultraviolet ray or electron beam and it is capable of being laminated in a desired pattern on a copper-coated laminate for use as a printed board or on a plate of metal, glass, ceramics or plastic.Type: GrantFiled: September 15, 1988Date of Patent: November 26, 1991Assignee: Canon Kabushiki KaishaInventor: Hiromichi Noguchi
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Patent number: 5068258Abstract: An improved active energy ray-curing resin composition comprising (i) a graft copolymerized polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less: (ii) a linear polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 350,000 or less and having a glass transition temperature of 60.degree. C. or more: (iii) a half-esterificated epoxy resin: and (iv) a polymerization initiator capable of generating a Lewis acid by irradiation of an active energy ray. The resin composition can be desirably cured with an active energy ray such as ultraviolet ray or electron beam and it is capable of being laminated in a desired pattern on a copper-coated laminate for use as a printed board or on a plate of metal, glass, ceramics or plastic.Type: GrantFiled: September 15, 1988Date of Patent: November 26, 1991Assignee: Canon Kabushiki KaishaInventor: Hiromichi Noguchi
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Patent number: 5068257Abstract: An improved active energy ray-curing resin composition comprising (i) a graft copolymerized polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less: (ii) a linear polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 350,000 or less and having a glass transition temperature of 60.degree. C. or more: (iii) a half-esterificated epoxy resin: (iv) a monomer having an ethylenically unsaturated bond: and (v) a polymerization initiator capable of generating a Lewis acid by irradiation of an active energy ray.The resin composition can be desirably cured with an active energy ray such as ultraviolet ray or electron beam and it is capable of being laminated in a desired pattern on a copper-coated laminate for use as a printed board or on a plate of metal, glass, ceramics or plastic.Type: GrantFiled: September 15, 1988Date of Patent: November 26, 1991Assignee: Canon Kabushiki KaishaInventor: Hiromichi Noguchi
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Patent number: 5068259Abstract: An improved active energy ray-curing resin composition comprising (i) a graft copolymerized polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less: (ii) a linear polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 350,000 or less and having a glass transition temperature of 60.degree. C. or more: (iii) an epoxy resin containing at least one compound having one or more epoxy groups in one molecule, (iv) a monomer having an ethylenically unsaturated bond and (v) a polymerization initiator capable of generating a Lewis acid by irradiation of an active energy ray. The resin composition can be desirably cured with an active energy ray such as ultraviolet ray or electron beam and it is capable of being laminated in a desired pattern on a copper-coated laminate for use as a printed board or on a plate of metal, glass, ceramics or plastic.Type: GrantFiled: September 15, 1988Date of Patent: November 26, 1991Assignee: Canon Kabushiki KaishaInventor: Hiromichi Noguchi
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Patent number: 5057345Abstract: A polymer blend comprises (A) a fluorinated ethylene-propylene copolymer and (B) a fluoroelastomer. The fluoroelastomer comprises a block copolymer comprising at least one elastomeric segment comprising tetrafluoroethylene, vinylidene fluoride, and hexafluropropylene repeat units in a mole ratio 45-90:5-50:0-35 and at least one nonelastomeric segment comprising tetrafluoroethylene and ethylene repeat units. The weight per cent of copolymer (A) relative to the combined weights of copolymer (A) and fluroelastomer (B) is between about 70% and about 97% or between about 3% and about 30%.Type: GrantFiled: August 17, 1989Date of Patent: October 15, 1991Assignee: Raychem CorporationInventor: Leonard Barrett
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Patent number: 5028484Abstract: A pressure-sensitive adhesive is provided. The adhesive comprises (a) about 50 to 95 weight percent of an ultraviolet radiation polymerized polymer of (i) one or more monomers which are predominantly alkyl acrylate, the alkyl groups of which have an average of 4 to 12 carbon atoms and (ii) about 0 to 15 weight percent of one or more strongly polar copolymerizable monomers or about 0 to 30 weight percent of one or more moderately polar copolymerizable monomers; and (b) about 5 to 50 weight percent of one or more tackifying resins. The tackifying resins are aromatic polymeric resins which have a number average molecular weight of about 300 to 2500, a polydispersity index of less than about 5, a glass transition temperature of about 40.degree. to 120.degree. C., and a solubility parameter of about 7 to 9.5 (cal/cc).sup.-1/2. The adhesive has a monomer conversion factor off at least 98%, and has good storage stability, i.e., losing no more than 70% of its adhesion when aged for a period of two weeks at 70.degree.Type: GrantFiled: March 6, 1990Date of Patent: July 2, 1991Assignee: Minnesota Mining and Manufacturing CompanyInventors: Michael K. Martin, John D. Moon, Francis M. Stark
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Patent number: 5011867Abstract: Electron-beam cure by itself or in combination with multifunctional additives is used to improve the high-temperature shear properties of emulsion polymerized pressure-sensitive adhesives.Type: GrantFiled: December 28, 1988Date of Patent: April 30, 1991Assignee: Avery International CorporationInventors: Prakash Mallya, Sebastian S. Plamthottam, Yehuda Ozari
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Patent number: 4988606Abstract: A negative-working radiation-sensitive mixture comprising a binder and a polymer containing 1,2,3-thiadiazole groups is disclosed. The binder is a polyfunctional compound having functional groups that react with ketene. The polymer is a compound obtained by polymerization of a compound of the general formula I ##STR1## in which R is a polymerizable group. If the polymer is a copolymer containing comonomers having functional groups capable of reacting with ketene, the binder can be omitted. The negative-working radiation-sensitive mixture is particularly suitable for UV, electron beam and X-ray lithography.Type: GrantFiled: October 12, 1989Date of Patent: January 29, 1991Assignee: Hoechst AktiengesellschaftInventors: Werner Prass, Rudolf Zertani, Juergen Lingnau, Norbert Hanold
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Patent number: 4960624Abstract: A fluoroelastomer composition is disclosed, which comprises a mixture of 100 parts by weight of a tetrafluoroethyline-propylene copolymer, not smaller than 1 part by weight and smaller than 100 parts by weight of a vinylidene fluoride-fluoroolefin copolymer having a fluoroolefin content of 1 to 20 mol %, and a cross-linking agent, said mixture being cross-linked by irradiation with electron beams. The fluoroelastomer composition has a high mechanical strength and improved low temperature characteristics. When the content of the vinylidene fluoride-fluoroolefin copolymer is not smaller than 10 parts by weight and smaller than 100 parts by weight per 100 parts by weight of the tetrafluoroethylene-propylene copolymer the fluoroelastomer composition is suitable as a material for producing heat shrinkable tubes.Type: GrantFiled: April 29, 1988Date of Patent: October 2, 1990Assignee: Sumitomo Electric Industries, Ltd.Inventor: Keiji Ueno
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Patent number: 4957852Abstract: In hot embossing plates which are crosslinkable by photopolymerization and comprise(a) a heat-stable, dimensionally stable base and(b) a relief-forming layer which is crosslinkable by photopolymerization and soluble or dispersible in water and contains(b.sub.1) one or more partially or virtually completely hydrolyzed polyvinyl alkanecarboxylates as binders,(b.sub.2) one or more alkenecarbonylamino-N-methylene ethers of polyhydric alcohols as photopolymerizable monomers and(b.sub.3) photopolymerization initiators,the relief-forming layer (b) contains, as further binders (b.sub.1),(b.sub.11) alkenecarboxylates and/or alkenecarbonylamino-N-methylene ethers of partially or virtually completely hydrolyzed polyvinyl alkanecarboxylates and/or(b.sub.12) alkenecarboxylates and/or alkenecarbonylamino-N-methylene ethers of partially or virtually completely hydrolyzed graft copolymers of vinyl alkanecarboxylates and alkylene oxides,and is more than 0.8 mm thick.Type: GrantFiled: June 10, 1988Date of Patent: September 18, 1990Assignee: BASF AktiengesellschaftInventor: Bernd Bronstert
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Patent number: 4946752Abstract: A photosensitive resin composition for a flexographic printing plate which comprises:(A) a polymer having a chlorine content of 10 to 50% by weight and a glass transition temperature of not higher than 5.degree. C. provided that the polymer is other than that of a conjugated diene hydrocarbon and a copolymer thereof;(B) a hydrophilic polymer;(C) an ethylenic unsaturated compound; and(D) a photopolymerization initiator.Type: GrantFiled: December 15, 1988Date of Patent: August 7, 1990Assignee: Toyo Boseki Kabushiki KaishaInventors: Akira Tomita, Toshihiko Kajima, Keizo Kawahara, Hiroshi Satomi