Specified Rate-affecting Material Contains Onium Group Patents (Class 522/15)
  • Patent number: 11840618
    Abstract: Matrix-filled liquid radiation curable resin compositions for additive fabrication are described and claimed. Such resins include a cationically polymerizable component that is an aliphatic epoxide, a multifunctional (meth)acrylate component, a cationic photoinitiator, a free-radical photoinitiator, and a matrix of inorganic fillers, wherein the matrix further constitutes prescribed ratios of at least one microparticle constituent and at least one nanoparticle constituent. Also described and claimed is a process for using the matrix-filled liquid radiation curable resins for additive fabrication to create three dimensional parts, and the three-dimensional parts made from the liquid radiation curable resins for additive fabrication.
    Type: Grant
    Filed: March 8, 2022
    Date of Patent: December 12, 2023
    Assignee: STRATASYS, INC.
    Inventors: Mingbo He, Beth Rundlett
  • Patent number: 11787965
    Abstract: The present invention is directed to an ink composition for forming an organic semiconductor layer, wherein the ink composition comprises: —at least one p-type dopant comprising electron withdrawing groups; —at least one first auxiliary compound, wherein the first auxiliary compound is an aromatic nitrile compound, wherein the aromatic nitrile compound has about ?1 to about ?3 nitrile groups and a melting point of about <100° C., wherein the first auxiliary compound is different from the p-type dopant; and wherein the electron withdrawing groups are fluorine, chlorine, bromine and/or nitrile.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: October 17, 2023
    Assignee: Novaled GmbH
    Inventors: Kay Lederer, Steffen Runge, Jerome Ganier, Anke Limbach
  • Patent number: 11745302
    Abstract: Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents.
    Type: Grant
    Filed: March 22, 2021
    Date of Patent: September 5, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sivapackia Ganapathiappan, Boyi Fu, Ashwin Chockalingam, Daniel Redfield, Rajeev Bajaj, Mahendra C. Orilall, Hou T. Ng, Jason G. Fung, Mayu Yamamura
  • Patent number: 11401243
    Abstract: The present invention relates to quinoline derived small molecule inhibitors of nicotinamide N-methyltransferase (NNMT), the preparation thereof and uses thereof. Formula (I).
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: August 2, 2022
    Assignee: The Board of Regents of The University of Texas System
    Inventors: Stanley Watowich, Harshini Neelakantan, Hua-Yu Wang, Stanton Mchardy
  • Patent number: 10739677
    Abstract: This invention relates to a photosensitive color ink composition for a bezel, including (A) a cationic polymerizable alicyclic epoxy monomer, (B) a cationic polymerizable aliphatic epoxy monomer, (C) an oxetane monomer, (D) a photopolymerization initiator, and (E) a colorant, and to a bezel pattern formed using the same.
    Type: Grant
    Filed: December 11, 2015
    Date of Patent: August 11, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Sung-Eun Park, Yong-Sung Goo, Seung-A Back, Joon-Hyung Kim
  • Patent number: 10229827
    Abstract: Embodiments of the present disclosure generally describe methods of forming one or more device terminal redistribution layers using imprint lithography. The methods disclosed herein enable the formation of high aspect ratio interconnect structures at lower costs than conventional photolithography and etch processes. Further, the processes and methods described herein desirably remove, reduce, and/or substantially eliminate voids in the surrounding polymer layer formed during the polymer deposition process or subsequent thereto.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: March 12, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Han-Wen Chen, Steven Verhaverbeke, Roman Gouk, Guan Huei See, Yu Gu, Arvind Sundarrajan
  • Patent number: 9892817
    Abstract: A conductive composition containing carbon nanotubes, a carbon nanotube dispersant, and a dopant precursor, wherein the dispersant is a non-conjugated polymer compound having an aromatic ring as the repeating unit, and the dopant precursor is an acid-generating agent which generates cation by being subjected to light and/or heat. The aforementioned conductive composition is capable of stably dispersing carbon nanotubes and of efficiently doping same without damaging the conductive properties of the carbon nanotubes.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: February 13, 2018
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tatsuya Hatanaka, Masahiro Hida
  • Patent number: 9790402
    Abstract: Disclosed herein is an adhesive composition for polarizing plates having increased adhesion by preventing curing inhibition due to moisture. The present invention provides an adhesive composition for polarizing plates, comprising: (A) a radical polymerizable monomer; (B) a cationic polymerizable monomer; (C) an unsaturated dicarboxylic acid anhydride; and (D) an initiator.
    Type: Grant
    Filed: February 14, 2013
    Date of Patent: October 17, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hirosh Ogawa, Tatsuhiro Suwa
  • Patent number: 9682951
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component including a compound (B0-1) represented by general formula (b0) shown below in which Ra1 represents an aromatic ring; Ra01 represents an alkyl group of 5 or more carbon atoms optionally having a substituent; Ra02 and Ra03 each independently represents an alkyl group of 1 to 10 carbon atoms optionally having a substituent; n1 represents an integer of 1 to 5; n2 represents an integer of 0 to 2; n3 represents an integer of 0 to 4; and X? represents a counteranion.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: June 20, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takashi Nagamine, Kotaro Endo, Miki Shinomiya
  • Patent number: 9315699
    Abstract: Provided is an adhesive composition comprising: a thermosetting epoxy resin formed with an epoxy copolymer containing a hydroxyl group; and a UV curable epoxy resin having an epoxy equivalence of 100 g/eq to 500 g/eq.
    Type: Grant
    Filed: September 4, 2013
    Date of Patent: April 19, 2016
    Assignee: LG HAUSYS, LTD.
    Inventors: Sang Hwan Kim, Yong Hoon Lee, Dai Hyun Kim, Won Gu Choi, Jang Soon Kim
  • Publication number: 20150133576
    Abstract: Radiation curable composition for preparing a hybrid sol-gel layer on a surface of a substrate, wherein said composition comprises at least one radically radiation curable material; at least one non-reactive organofunctional silane; at least one reactive organofunctional silane; at least one cationic photoinitiator; and at least one radical photoinitiator. Method for preparing a hybrid sol-gel layer on a surface of a substrate using said composition and hybrid sol-gel layer so prepared. Substrate comprising at least one surface coated with said hybrid sol-gel layer.
    Type: Application
    Filed: May 16, 2013
    Publication date: May 14, 2015
    Inventors: Céline Croutxe-Barghorn, Abraham Chemtob, Lingli Ni, Nadia Moreau, Thierry Bouder
  • Publication number: 20150125702
    Abstract: Matrix-filled liquid radiation curable resin compositions for additive fabrication are described and claimed. Such resins include a cationically polymerizable component that is an aliphatic epoxide, a multifunctional (meth)acrylate component, a cationic photoinitiator, a free-radical photo initiator, and a matrix of inorganic fillers, wherein the matrix further constitutes prescribed ratios of at least one microparticle constituent and at least one nanoparticle constituent. Also described and claimed is a process for using the matrix-filled liquid radiation curable resins for additive fabrication to create three dimensional parts, and the three-dimensional parts made from the liquid radiation curable resins for additive fabrication.
    Type: Application
    Filed: November 5, 2014
    Publication date: May 7, 2015
    Inventors: Mingbo HE, Beth RUNDLETT, Kangtai REN, Caroline LIU, Tai Yeon LEE
  • Publication number: 20150111979
    Abstract: A monomeric formulation for fabrication of microlattice structures, the monomeric formulation including a plurality of monomers, a first photoinitiator configured to substantially activate above a wavelength of light, and a second photoinitiator configured not to substantially activate above the wavelength of light and to substantially activate below the wavelength of light.
    Type: Application
    Filed: April 17, 2014
    Publication date: April 23, 2015
    Applicant: HRL Laboratories, LLC
    Inventors: Sophia S. Yang, Alan J. Jacobsen, Jacob M. Hundley, Eric C. Clough
  • Patent number: 8975003
    Abstract: The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represented by (b2), and (c) a second onium salt containing a cation portion structure represented by (c1) and an anion portion structure represented by (c2).
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: March 10, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hyou Takahashi, Masako Shimomura, Ken Ikegame
  • Publication number: 20140343185
    Abstract: The present invention relates to a red photosensitive resin composition for a color filter and an application of the same. The red photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a cationic polymerized compound (C), a cationic photo-initiator (D) and an organic solvent (E). The pigment (A) includes a first pigment (A-1), and the first pigment (A-1) is a brominated-diketo-pyrrolo-pyrrole pigment. The aforementioned red photosensitive resin composition is advantageously applied for the color filter with better brightness, contrast, temporal stability of sensitivity and development to resistance.
    Type: Application
    Filed: May 6, 2014
    Publication date: November 20, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: Wei-Kai HO
  • Patent number: 8889335
    Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that serves as a base resin. R1 is a monovalent group that includes at least two groups of —CO—, —NH—, —S—, and —SO2—, the at least two groups being each identical or different. A is a divalent hydrocarbon group or a divalent fluorohydrocarbon group having 1 to 5 carbon atoms. R is a fluorine atom or a hydrogen atom. a is an integer from 1 to 4. In a case where a plurality of R are present, each of the plurality of R is either identical or different. M+ is a monovalent cation.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: November 18, 2014
    Assignee: JSR Corporation
    Inventor: Ken Maruyama
  • Patent number: 8785515
    Abstract: Polycyclic aromatic compounds of formula (I) having at least two conjugated aromatic rings at least one of which has a substituent comprising a cyclic carbonate group can be used as sensitizers for cationic photoinitiators, especially iodonium compounds, and may also function as monomers in cationically initiated radiation curable compositions, especially coating compositions, such as printing inks and varnishes.
    Type: Grant
    Filed: May 9, 2008
    Date of Patent: July 22, 2014
    Assignee: Sun Chemical Corporation
    Inventors: Shaun Lawrence Herlihy, Robert Stephen Davidson
  • Patent number: 8785514
    Abstract: Various embodiments of the present invention generally relate to a light-cure and dual-cure resin that have low color and is color stable over conventional light, self and dual-cured resins. Additionally, the light-cure resin has enhanced degree of cure over conventional light-cure resins. Finally, due to the low color and enhanced color stability of the dual-cure resins, their inherent property of having lower shrinkage stress as compared to light-cure resins can now be utilized in various dental applications and other resin applications.
    Type: Grant
    Filed: November 28, 2008
    Date of Patent: July 22, 2014
    Assignee: The Board of Regents of The University of Texas System
    Inventors: H. Ralph Rawls, Kyumin Whang, Nasser Barghi, Dong-Hoon Shin, Richard Plymale, Janice Plymale
  • Publication number: 20140035202
    Abstract: The invention relates to a liquid radiation curable resin capable of curing into a solid upon irradiation comprising: (A) from about 0 to about 12 wt % of a cycloaliphatic epoxide having a linking ester group; (B) from about 30 to about 65 wt % of one or more epoxy functional components other than A; (C) from about 10 to about 30 wt % of one or more oxetanes; (D) from, about 1 to about 10 wt % of one or more polyols; (E) from about 2 to about 20 wt % of one or more radically curable (meth)acrylate components; (F) from about 2 to about 12 wt % of one or more impact modifiers; (G) from about 0.1 to about 8 wt % of one or more free radical photoinitiators; and (H) from about 0.1 to about 8 wt % of one or more cationic photoinitiators; wherein the liquid radiation curable resin has a viscosity at 30° C. of from about 600 cps to about 1300 cps.
    Type: Application
    Filed: August 6, 2013
    Publication date: February 6, 2014
    Applicant: DSM IP ASSETS B.V.
    Inventors: John Southwell, Brett A. Register, Satyendra Kumar Sarmah, Paulus Antonius Maria Steeman, Beert Jacobus Keestra, Marcus Matheus Driessen
  • Patent number: 8569393
    Abstract: A radiation curable composition for UV LED curing includes at least one co-initiator selected from the group consisting of an aliphatic tertiary amine and a dialkyl aniline derivative; and at least one specific carbazole photoinitiator. The radiation curable composition can be advantageously used to prevent unstable yellowing behavior in an image upon storage.
    Type: Grant
    Filed: December 6, 2010
    Date of Patent: October 29, 2013
    Assignee: AGFA-Gevaert N.V.
    Inventor: Johan Loccufier
  • Patent number: 8557889
    Abstract: The invention provides an ink composition including a sensitizer represented by the following Formula (I), a photopolymerization initiator, and a polymerizable compound having an ethylenic unsaturated bond. In the Formula (I), R1, R6 and R8 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, a linear or branched alkyl group which may be substituted, or an alkoxy group which may be substituted. R2, R4, R5 and R7 each independently represent a hydrogen atom, a halogen atom, or a cyano group. R3 represents a hydrogen atom, a linear or branched alkyl group which may be substituted, or a cycloalkyl group which may be substituted.
    Type: Grant
    Filed: November 25, 2009
    Date of Patent: October 15, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Tokihiko Matsumura
  • Patent number: 8383862
    Abstract: Provided are a salt compound, cationic polymerization initiator and cationically polymerizable composition, which have a superior acid-generating capacity and high sensitivity, and are free from coloration. The salt compound is represented by the following general Formula (1): (wherein, R01 to R05 each independently represents a group selected from a hydrogen atom, a fluorine atom and —YR group, one of the R01 to R05 being a —YR group and at least two of the R01 to R05 being fluorine atoms; Y represents an oxygen atom or a sulfur atom; R represents a C1-C4 alkyl group; Ctp+ represents a p-valent cation, the p being 1 or 2; and n represents a coefficient required for maintaining electrical neutrality).
    Type: Grant
    Filed: October 28, 2008
    Date of Patent: February 26, 2013
    Assignee: Adeka Corporation
    Inventors: Kentaro Kimura, Shohei Fujita, Tomoya Tamachi
  • Patent number: 8377623
    Abstract: The present invention provides a low viscosity photocurable composition including (i) a cationically curable component comprising a polyglycidyl epoxy compound (ii) a free radically active component (iii) a cationic photoinitiator (v) a free radical photoinitiator and optionally (iv) one or more optional components. The photocurable composition can be cured using rapid prototyping techniques to form clear, colorless three-dimensional articles having excellent mechanical properties.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: February 19, 2013
    Assignee: 3D Systems, Inc.
    Inventor: John Wai Fong
  • Patent number: 8367299
    Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.
    Type: Grant
    Filed: September 15, 2011
    Date of Patent: February 5, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike, Hiroaki Shimizu, Kensuke Matsuzawa, Hideo Hada
  • Patent number: 8338074
    Abstract: It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity.
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: December 25, 2012
    Assignees: CMET Inc., San-Apro Ltd.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Hideki Kimura, Masashi Date, Jiro Yamamoto
  • Patent number: 8334025
    Abstract: The present invention provides a low viscosity photocurable composition including (i) a cationically curable component (ii) a free radically active component (iii) an antimony-free cationic photoinitiator (v) a free radical photoinitiator, and (vi) a toughening agent. The photocurable composition can be cured using rapid prototyping techniques to form three-dimensional articles which can be used in various aerospace and investment casting applications.
    Type: Grant
    Filed: October 26, 2006
    Date of Patent: December 18, 2012
    Assignee: 3D Systems, Inc.
    Inventors: John Wai Fong, Richard N. Leyden, Laurence Messe, Ranjana C. Patel, Carole Chapelat
  • Patent number: 8293448
    Abstract: Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below: wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: October 23, 2012
    Assignees: CMET Inc., Ube Industries, Ltd.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Kenji Hirotsu, Tadashi Murakami
  • Patent number: 8288078
    Abstract: A photosensitive resin composition is provided that is highly safe, provides a coating film having superior uniformity, can improve the curing density of the cured resin pattern, and is capable of forming a micro resist pattern having a large film thickness and a high aspect ratio with high sensitivity and high resolving ability. According to a photosensitive resin composition including, in addition to an onium fluorinated alkyl fluorophosphate based cation polymerization initiator having a specific structure, a specified solvent or a specified sensitizing agent as essential components, a coating film having superior uniformity, can improve the curing density of the cured resin pattern, and also is capable of forming a micro resist pattern having a large film thickness and a high aspect ratio with high sensitivity and high resolving ability.
    Type: Grant
    Filed: January 11, 2008
    Date of Patent: October 16, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takahiro Senzaki, Koichi Misumi, Atsushi Yamanouchi, Koji Saito
  • Publication number: 20120251841
    Abstract: Liquid radiation curable resins for additive fabrication comprising an R-substituted aromatic thioetber triaryl sulfonmm tetrakis(pentafluorophenyl)borate cationic photoinitiator is disclosed. A process for using the liquid radiation curable resins for additive fabrication and three-dimensional articles made from the liquid radiation curable resins for additive fabrication are also disclosed.
    Type: Application
    Filed: December 16, 2010
    Publication date: October 4, 2012
    Applicant: DSM IP ASSETS, B.V.
    Inventors: John Edmund Southwell, Jigeng Xu, Kangtai Ren, Ken Dake, Sam East
  • Patent number: 8206890
    Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.
    Type: Grant
    Filed: July 8, 2009
    Date of Patent: June 26, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike, Hiroaki Shimizu, Kensuke Matsuzawa, Hideo Hada
  • Patent number: 8207238
    Abstract: The invention features a hardenable dental composition, e.g., polymerizable dental restoratives, adhesives, etc., that contain a color-stable amine electron donor in an initiation system for initiating polymerization of the composition.
    Type: Grant
    Filed: October 29, 2008
    Date of Patent: June 26, 2012
    Assignee: 3M Innovative Properties Company
    Inventors: Brian N. Holmes, Gregory A. Kobussen
  • Patent number: 8158326
    Abstract: A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
    Type: Grant
    Filed: August 13, 2008
    Date of Patent: April 17, 2012
    Assignee: Fujifilm Corporation
    Inventors: Kunihiko Kodama, Kenji Wada, Kaoru Iwato
  • Patent number: 8148443
    Abstract: The present invention relates to oxonium salts having [(Ro)3O]+ cations and sulfonium salts having [(Ro)3S]+ cations, where Ro denotes straight-chain or branched alkyl groups having 1-8 C atoms or phenyl which is unsubstituted or substituted by Ro, ORo, N(Ro)2, CN or halogen, and anions selected from the group of [PFx(CyF2y+1?xHz)6?x]? anions, where 2?x?5, 1?y?8 and 0?z?2y+1, or anions selected from the group of [BFn(CN)4?n]? anions, where n=0, 1, 2 or 3, or anions selected from the group of [(Rf1SO2)2N]? anions or anions selected from the group of [BFWRf24?w]? anions, to processes for the preparation thereof, and to the use thereof, in particular for the preparation of ionic liquids.
    Type: Grant
    Filed: October 20, 2010
    Date of Patent: April 3, 2012
    Assignee: Merck Patent Gesellschaft Mit Beschrankter Haftung
    Inventors: Nikolai (Mykola) Ignatyev, German Bissky, Helge Willner
  • Patent number: 8088548
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: January 3, 2012
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Francis M. Houlihan, Shinji Miyazaki, Mark O. Neisser, Alberto D. Dioses, Joseph E. Oberlander
  • Publication number: 20110311807
    Abstract: The claimed invention relates to a flexible substrate having reduced shrinkage and curling, wherein said substrate is coated with a coating having a dual cure system, wherein said coating comprises a free radical curable component and a cationically curable component.
    Type: Application
    Filed: June 22, 2009
    Publication date: December 22, 2011
    Applicant: Akzo Nobel Coatings International B.V.
    Inventors: Pei Wen Jin, Kimberley Rae Benca, Ian Christopher Quarmby, Thomas Kurpiewski
  • Patent number: 8033663
    Abstract: A curable coating composition includes: a) at least one monomer chosen from polyol poly(meth)acrylate monomers having from 3 to 6 (meth)acrylate functions, b) at least one monomer chosen from polyol polyglycidyl ethers having at least three epoxy functions, c) at least one difunctional monomer, d) at least one free-radical photo-initiator, and e) at least one cationic photo-initiator, wherein the molar ratio of acrylate equivalents to epoxy equivalents in the composition ranges from 3:1 to 4:1, and wherein the composition is free of silica and of monomers bearing a silane function. A method for coating a substrate, such as an ophthalmic lens, with this composition, and the coating substrate thus obtained are also disclosed.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: October 11, 2011
    Assignee: Essilor International (Compagnie Generale d'Optique)
    Inventor: Robert Valeri
  • Patent number: 7964248
    Abstract: The present invention is directed to a photoinitiator composition comprising two different cationic photoinitiators and a photocurable composition comprising said photoinitiator composition. Moreover, the present invention relates to the use of the photoinitiator composition and the photocurable composition. Furthermore, the present invention relates to a process for producing a three dimensional article.
    Type: Grant
    Filed: April 9, 2008
    Date of Patent: June 21, 2011
    Assignee: Huntsman Advanced Materials Americas LLC
    Inventors: John Wai Fong, Carole Chapelat, Loic Messe, Ranjana Patel, Laurence Messe
  • Patent number: 7844153
    Abstract: An active energy ray (e.g. UV rays)-curable organopolysiloxane resin composition comprises (A) 100 parts by weight of an organopolysiloxane resin containing epoxy groups and aromatic hydrocarbon groups, (B) 0.05 to 20 parts by weight of a photo acid generator, (C) 0.01 to 20 parts by weight of a photosensitizer or photo-radical generator, and (D) 0 to 5,000 parts by weight of an organic solvent. An optical transmission component made of the above-mentioned composition cured by irradiation with active energy rays (for example, UV rays). A method for manufacturing an optical transmission component by irradiating the above-mentioned composition with active energy rays (for example, UV rays).
    Type: Grant
    Filed: May 30, 2005
    Date of Patent: November 30, 2010
    Assignee: Dow Corning Corporation
    Inventors: Toshinori Watanabe, Takuya Ogawa
  • Patent number: 7838570
    Abstract: An ink used preferably in jet ink devices includes an ink vehicle, the ink vehicle being made up either (a) a first component curable by a first polymerization route and an associated photointiator, and a second component curable by a second polymerization route and as associated photoinitiator, wherein the second polymerization route is different from the first polymerization route, or (b) a component curable by a single polymerization route with a first and a second photoinitiator system in which the first system responds to longer wavelengths. An image may be formed by such inks by jetting onto a transfer member surface, curing the first component or partially curing the single component while upon the transfer member surface, transferring the ink to an image receiving surface, and completing curing. The first component is preferably curable via cationic polymerization and the second component is preferably curable via free radical polymerization.
    Type: Grant
    Filed: January 14, 2005
    Date of Patent: November 23, 2010
    Assignee: Xerox Corporation
    Inventors: Peter G. Odell, Eniko Toma
  • Patent number: 7776940
    Abstract: Hardenable and hardened dental compositions, and articles including such hardenable and hardened compositions, are provided. In some embodiments, the hardenable dental compositions include an acid-generating component and an acid-reactive component including one or more acid-reactive groups. Upon irradiating, and optionally heating, the hardened compositions are useful, for example, for reducing the bond strength of orthodontic appliances adhered to tooth structures with the hardened compositions.
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: August 17, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Rajdeep S. Kalgutkar, Joan V. Brennan, Babu N. Gaddam
  • Patent number: 7718111
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0groups per 100 grams of said composition.
    Type: Grant
    Filed: April 11, 2007
    Date of Patent: May 18, 2010
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: David L. Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Patent number: 7709547
    Abstract: The present invention provides an ink composition, and inkjet recording method, a printed material, a production method of a planographic printing plate, and a planographic printing plate. The ink composition of the present invention contains a cationically polymerizable compound, a compound that generates an acid when irradiated with a radiation ray, and an onium salt compound that generates an organic acid compound having a basic nitrogen atom when irradiated with a radiation ray.
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: May 4, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kazuhiro Yokoi, Ippei Nakamura, Kenji Wada
  • Patent number: 7709553
    Abstract: The invention provides a cation polymerizable resin composition excellent in curing properties and corrosion resistance with less resin coloration and less cure shrinkage, which is a material suitable as a surface protective material for optical disk. Specifically, the cation polymerizable resin composition comprises an epoxy compound (A) as an essential ingredient represented by formula 1 wherein R1 and R2 each represent a saturated or unsaturated carbon atom, and R3 represents a hydrogen atom or a saturated or unsaturated carbon atom, a cation polymerizable compound (B) other than the epoxy compound represented by formula 1, a photo cation polymerization initiator (C) and a photo radical polymerization initiator (D).
    Type: Grant
    Filed: April 16, 2004
    Date of Patent: May 4, 2010
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yuichi Ito, Satoru Suda, Yasushi Mizuta, Katsunori Nishiura, Toshikazu Gomi
  • Patent number: 7595351
    Abstract: Actinic radiation curable compositions comprising at least one actinic radiation curable, cationically polymerizable compound and at least one cationic photoinitiator, may be stabilized by the use of a stabilizer which is a complex of a Lewis acid (other than a fluorine-containing boron compound) and a Lewis base.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: September 29, 2009
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: Barrie James Hayes, Laurence Josette Messe
  • Patent number: 7592376
    Abstract: Novel radiation-curable or photopolymerizable compositions and methods of use thereof as cured coatings are disclosed. The invention pertains to radiation-curable compositions which contain, in addition to typical components of radiation-curable epoxide and oxetane compositions, a free radical photoinitiator.
    Type: Grant
    Filed: August 23, 2005
    Date of Patent: September 22, 2009
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James V. Crivello
  • Publication number: 20090209674
    Abstract: Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below; (wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond) in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
    Type: Application
    Filed: June 15, 2007
    Publication date: August 20, 2009
    Applicants: CMET INC., UBE INDUSTRIES, LTD.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Kenji Hirotsu, Tadashi Murakami
  • Patent number: 7541389
    Abstract: Compositions are provided that include an electron donor and a sensitizing compound. More specifically, the electron donor is an arylsulfinate salt. Methods of polymerization are also provided that can be used to prepare polymeric material from a photopolymerizable composition that includes ethylenically unsaturated monomers and a photoinitiator system. The photoinitiator system includes an electron donor and a sensitizing compound.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: June 2, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: Rajdeep S. Kalgutkar, Michael C. Palazzotto
  • Patent number: 7541131
    Abstract: The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R1 represents an alkyl group or an aryl group, R2 to R9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, Xn? represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: June 2, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Yasutomo Kawanishi
  • Patent number: 7537452
    Abstract: The invention features a photopolymerizable composition that comprises a cationically polymerizable resin, and a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and one or more anthracene-based compounds as electron donors. Electron donor combinations used in the invention include multiple substituted anthracene compounds or a combination of at least one substituted anthracene compound with unsubstituted anthracene.
    Type: Grant
    Filed: August 16, 2007
    Date of Patent: May 26, 2009
    Assignees: Curators of the University of Missouri, 3M Innovative Properties Company 3M Center, 3M ESPE AG
    Inventors: Joel D. Oxman, Karsten Dede, Craig A. Dykstra, Victoria A. Russell, Christoph Thalacker, Wolfgang Weinmann
  • Patent number: 7524614
    Abstract: A radiation-sensitive composition includes a radically polymerizable component and an iodonium borate initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation. The iodonium borate composition includes a particular diaryliodonium borate compound having organic substituents to provide a sum of at least 6 carbon atoms on the iodonium cation phenyl rings. This composition can be applied to a suitable substrate to provide a negative-working imageable element with improved digital speed and good shelf life and that can be imaged to provide lithographic printing plates. The imaged elements can be developed either on-press or off-press using alkaline developers.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: April 28, 2009
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Scott A. Beckley