Oxygen Other Than As Part Of Carboxylic Acid Or Derivative Moiety Patents (Class 522/154)
  • Patent number: 6887946
    Abstract: It is an object of the present invention to provide a compound having a (meth)acryloyl group that is suitably used in various applications, a process for producing such compound simply and under mild conditions, and an useful photo-curable composition and aqueous photo-curable composition comprising such compound.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: May 3, 2005
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Akihiko Fukada, Keiji Yurugi, Toshio Awaji, Nobuaki Otsuki
  • Patent number: 6863701
    Abstract: Compositions that can be photopolymerized by a cationic initiator at an accelerated rate include at least one epoxy monomer, at least one cationic photoinitiator, and a photosensitizer/accelerator. The accelerator is a phenolic resole, or a compound having a structure according to the formula R1(CR2R3OH)n, wherein R1 is selected from phenyl, polycyclic aryl, and polycyclic heteroaryl, each optionally substituted with one or more electron donating group substituted phenyl; R2 and R3 are independently selected from hydrogen, alkyl, aryl, alkylaryl, substituted alkyl, substituted aryl and substituted alkylaryl; and n is an integer from 1 to 10.
    Type: Grant
    Filed: March 10, 2003
    Date of Patent: March 8, 2005
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Patent number: 6855747
    Abstract: There is disclosed a method of easily producing a long-lived ion sensitive film having excellent durability and used in an ion sensor. The method starts with preparing a monomer mixture consisting chiefly of monomer units including a functional group and a second group of bonded atoms. The functional group has a function of identifying a certain chemical substance. The second group can become an active species that induces a polymerization or bridging reaction by being irradiated with an electron beam or radiation. Then, the monomer mixture is irradiated with the electron beam or radiation in a low energy range. Thus, the monomer mixture is polymerized.
    Type: Grant
    Filed: December 23, 2002
    Date of Patent: February 15, 2005
    Assignees: JEOL Ltd., JEOL Engineering Co., Ltd.
    Inventors: Tadashi Kawai, Hirohisa Yoshida, Tokuo Mizuno, Atsuro Tonomura, Naoki Aota
  • Patent number: 6846564
    Abstract: The invention relates to cross-linked acrylic microparticles, a method for the production thereof by polymerization in a dispersion in a non aqueous medium and to the uses thereof in covering or moulding compositions involving a favourable compromise between hardness, flexibility and adhesion. The micropparticles are obtained from a composition comprising: 50-99% mols of a constitutent (A) consisting of Cardura E 10 (meth)acrylate and optionally alkyl (meth)acrylate in C2-C8; a compound (B) consisting of at least one monomer or oligomer having at least 2 ethylenic unsaturations; a compound (C) consisting of at least one monomer or oligomer having in addition to one ethylenic unsaturation at least one second function (F1) with the possibility of at least partial chemical modification of the initial functions f1 into final functions f2.
    Type: Grant
    Filed: March 24, 2000
    Date of Patent: January 25, 2005
    Assignee: Cray Valley, S.A.
    Inventors: Jean-Pierre Pascault, Ludovic Valette, Philippe Barbeau, Benoit Magny
  • Patent number: 6844375
    Abstract: The invention relates to: 4-methylene-1,3-dioxolanes of the general formula (I) wherein R1 denotes hydrogen, C5-C6-cycloalkyl or C1-C4-alkyl; m and n, which may be the same or different, denote 0 or 1, whereby m?n, o denotes 2, 3 or 4 depending on the valency of the group X; and X denotes a C—C single bond, straight-chain or branched C1-C18-alkylene, C5-C6-cycloalkylene, C8-C18-arylalkylene, —CH2(OCH2CH2)pOCH2—, —CH2(OCH(CH3)CH2)pOCH2—, wherein p is an integer from 0 to 100; a process for their production; and intermediate products used. Moreover, compositions capable of emission-free, photocationic cross-linking, which comprise 4-methylene-1,3-dioxolanes of the general formula (I) and their use for the production of solvent-resistant and transparent films.
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: January 18, 2005
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Helmut Hartl, Rainer B. Frings, Gerwald F. Grahe
  • Patent number: 6830726
    Abstract: This invention relates to a radiation-resistant acrylic adhesive composition with less reduction in the adhesion thereof upon irradiation with radiations, which composition comprises an acrylic polymer and a radiation-resistant agent, and a radiation-resistant adhesive product comprising the composition.
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: December 14, 2004
    Assignee: Lintec Corporation
    Inventors: Rui Saito, Eiji Suzuki, Hideaki Okabe
  • Patent number: 6822015
    Abstract: The object of the invention is to provide a rubber composition or its crosslinked product used for a rubber stopper for a medicament or a rubber article for a medical treatment, suitable for radiation treatments to be carried out for the purpose of sterilizing. Accordingly, the present invention provides a rubber composition or its crosslinked product used for a rubber stopper for a medicament or a rubber article for a medical treatment, comprising an isobutylene copolymer, as a predominant component, with a density of at most 0.95, capable of being readily subjected to a radiation treatment.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: November 23, 2004
    Assignee: Daikyo Seiko, Ltd.
    Inventor: Tomoyasu Muraki
  • Patent number: 6821108
    Abstract: The invention is concerned with the problem that with known plastic casting moulds, especially those of polypropylene, the lenses produced with these moulds have a slippery surface. The invention solves this problem through the use of polymers which are notable for their very low oxygen permeability.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: November 23, 2004
    Assignee: Novartis AG
    Inventors: Peter Hagmann, Axel Heinrich, Willi Hoerner, Robert Allen Janssen, John Martin Lally, Robert Earl Szokolay, Bernhard Seiferling
  • Patent number: 6806026
    Abstract: A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula: where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.
    Type: Grant
    Filed: May 31, 2002
    Date of Patent: October 19, 2004
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Gregory Breyta, Phillip Brock, Richard A. DiPietro, Debra Fenzel-Alexander, Carl Larson, David R. Medeiros, Dirk Pfeiffer, Ratnam Sooriyakumaran, Hoa D. Truong, Gregory M. Wallraff
  • Patent number: 6800670
    Abstract: The present invention discloses methods for enhancing the wear-resistance of polymers, the resulting polymers, and in vivo implants made from such polymers. One aspect of this invention presents a method whereby a polymer is irradiated, preferably with gamma radiation, then thermally treated, such as by remelting of annealing. The resulting polymeric composition preferably has its most oxidized surface layer removed. Another aspect of the invention presents a general method for optimizing the wear resistance and desirable physical and/or chemical properties of a polymer by crosslinking and thermally treating it. The resulting polymeric compositions is wear-resistant and may be fabricated into an in vivo implant.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: October 5, 2004
    Assignees: Orthopaedic Hospital, University of Southern California
    Inventors: Fu-Wen Shen, Harry A. McKellop, Ronald Salovey
  • Patent number: 6787583
    Abstract: An intaglio printing ink comprising a first binder compound selected from the group of water-soluble or water-thinnable acrylate oligomers, and optionally, a second monomeric binder compound selected from the group comprising water-soluble or water-thinnable PEG diacrylate or polyethoxylated polyol triacrylate monomers to adjust the viscosity of the ink composition. To initiate polymerization of the binder compounds upon irradiation by electromagnetic radiation or electron beam radiation a photoinitiator is included. Further optional additives, such as pigments, fillers, photosensitizers, stabilizers emulsifiers and security pigments may be present. The ink shows excellent wipeability and allows precipitation from the wiping solution.
    Type: Grant
    Filed: January 10, 2003
    Date of Patent: September 7, 2004
    Assignee: SICPA Holding S.A.
    Inventors: Patrick Veya, Olivier Amrein, Alexia Christinat
  • Patent number: 6756420
    Abstract: This invention provides a high-solids coating composition which comprises (A) a compound which has at least one radically polymerizable unsaturated group per molecule, (B) a hydroxyl group-containing ester compound which is obtained by ester-forming addition reaction between 2,2-dimethylolalkanoic acid having 6 to 8 carbon atoms and alkanoic acid monoglycidylester, and which has an acid value of 20 mgKOH/g or less, (C) a curing agent which is reactive with the above-mentioned hydroxyl group-containing ester compound (B), and (D) a photopolymerization initiator, and also provides a process to form a coating film by spray coating of said coating composition, which process is characterized by irradiating flying paint particles which have been sprayed and/or paint which has been applied onto a substrate with active energy ray so as to make the coating composition partially react, and by subsequently heating the coating composition.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: June 29, 2004
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Tetsuo Ogawa, Hisashi Isaka
  • Patent number: 6750290
    Abstract: The present invention relates to a curing epoxy resin composition permitting water repellent and ink repellent surface treatment. The epoxy resin composition contains (A) an alkylsiloxane-containing epoxy resin, (B) a cationic polymerization catalyst, and (C) a polyfunctional epoxy compound having a molecular weight of 300 or more, and a static viscosity of 1,000 cps or more at 25° C.
    Type: Grant
    Filed: April 17, 2002
    Date of Patent: June 15, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Isao Imamura, Hiromichi Noguchi, Akihiko Shimomura
  • Patent number: 6734222
    Abstract: The invention relates to a mixture, containing A) a polymer, which consists to an extent of at least 40 wt % of C1-C18 alkyl (meth)acrylates (referred to herein as polyacrylates) and B) a homopolymer or copolymer of vinyl alkyl ether (referred to herein as polyvinyl alkyl ether), which consists, to an extent of at least 70 wt %, of structural units of the following formula, in which X stands for a single bond or a C1-C3 alkyl group and R for a C1-C6 alkyl group.
    Type: Grant
    Filed: January 28, 2002
    Date of Patent: May 11, 2004
    Assignee: BASF Aktiengesellschaft
    Inventors: Ralf Fink, Karl-Heinz Schumacher, Uwe Düsterwald, Christelle Staller
  • Patent number: 6723814
    Abstract: Membranes made from amphiphilic copolymers are disclosed. The amphiphilic copolymers can be ABA copolymers, where one of A and B is hydrophilic and the other is hydrophobic. The copolymers may be crosslinked to form more stable structures. Crosslinking can be accomplished using a variety of methods, including end to end polymerization of copolymers having terminal unsaturated groups. Molecules such as membrane proteins can be incorporated into the membrane to allow the transport there through of selected components.
    Type: Grant
    Filed: May 16, 2001
    Date of Patent: April 20, 2004
    Assignee: BioCure, Inc.
    Inventors: Wolfgang Meier, Corinne Nardin, Mathias Winterhalter
  • Patent number: 6706408
    Abstract: An inorganic substrate with two or more coating layers is provided. The first coating layer is attached to the inorganic substrate and includes the polymeric reaction product formed upon hydrolysis of a silane compound having at least two tri(C1-C3)alkoxysilyl groups. The second and subsequent coating layers include at least one hydrophilic polymer and at least one photoactivatable cross-linking agent. The inorganic substrate can be a medical device suitable for insertion into the body of a mammal. The coatings are tenacious and not easily removed from the inorganic substrate by abrasion.
    Type: Grant
    Filed: May 16, 2002
    Date of Patent: March 16, 2004
    Assignee: SurModics, Inc.
    Inventor: Bruce M. Jelle
  • Patent number: 6677390
    Abstract: An iodonium salt compound which is colored little, can be easily synthesized in high yield, is highly sensitive to irradiation with actinic energy rays such as light, electronic beams, or X-rays, is highly soluble in monomers, and is lowly toxic; and a photocurable composition which can cure in a short time even when the counter anion is a hexafluorophosphonate, tetrafluoroborate, etc., regardless of whether it is clear or pigmented, and which gives a cured object having excellent properties. The photocurable composition is prepared by compounding an iodonium salt compound represented by the general formula (I) with a cationically polymerizable compound, a sensitizer, etc.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: January 13, 2004
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Eiji Takahashi, Akihiro Shirai, Hiroshi Takahashi, Shinichi Kimizuka
  • Patent number: 6649669
    Abstract: A single solution bonding formulation for dental applications comprising a plurality of at least one self-polymerizable polyvinyl acidic monomer or at least two different polymerizable polyvinyl acidic monomers, a calcium phosphate filler, at least one photoinitiator, optionally an accelerator, optionally a solvent, and optionally a fluoride additive is provided. Additionally, a method for treating enamel, dentin, and/or pulp with the same single solution bonding formulation is provided. The single solution bonding formulation provides for the release of calcium, phosphate and/or fluoride ions which are sufficient in situ to form hydroxyapatite and/or fluorapatite.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: November 18, 2003
    Assignee: American Dental Association Health Foundation
    Inventor: Sabine Dickens
  • Patent number: 6627673
    Abstract: The present invention relates to shape deformable materials, which are capable of (1) being deformed, (2) storing an amount of shape deformation, and (3) recovering at least a portion of the shape deformation when exposed to a humid environment. The shape deformable materials can advantageously be in the form of films, fibers, filaments, strands, nonwovens, and pre-molded elements. The shape deformable materials of the present invention may be used to form products, which are both disposable and reusable. More specifically, the shape deformable materials of the present invention may be used to produce products such as disposable diapers, training pants, incontinence products, and feminine care products.
    Type: Grant
    Filed: July 24, 2001
    Date of Patent: September 30, 2003
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Vasily A. Topolkaraev, Dave A. Soerens
  • Patent number: 6617370
    Abstract: To provide a method for repairing a coated surface of a vehicle, using an ultraviolet curing resin having excellent quick-drying property, and giving a good finish in a shortened working time, a method for repairing the damage on a coated surface of a vehicle being a depression and/or a depletion of a coating film, which is characterized by comprising the following steps a) to c): a) filling a putty raw material comprising an ultraviolet polymerizing resin composition in an optionally pretreated damage portion and ultraviolet curing the putty raw material to fill the damaged portion with the putty; b) uniformly spray coating, on the coated surface including at least the putty-covered surface after the step a), a primer surfacer raw material comprising an ultraviolet polymerizing resin composition having a viscosity sufficient for spray coating and ultraviolet curing the obtained raw material coating film to form a primer surfacer layer; and c) applying a top coat on the primer surfacer layer obtained in b)
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: September 9, 2003
    Inventor: Makoto Ueno
  • Patent number: 6610762
    Abstract: An adhesive composition which is switchable under irradiation to change from a tacky to a less tacky state which includes a switchable polymer. The polymer comprises a backbone polymeric moiety bound to a plurality of curable moieties, each of which comprises a free-radically active group and has an amine functionality. Also, the switchable polymer, processes for producing such polymers and compositions, and switchable adhesive articles comprising the adhesive compositions, such as light-switchable pressure sensitive adhesive dressings, and methods of using such articles.
    Type: Grant
    Filed: May 9, 2000
    Date of Patent: August 26, 2003
    Assignee: Smith & Nephew Plc
    Inventor: Iain Webster
  • Publication number: 20030153640
    Abstract: The present invention relates to powdered thermosetting compositions including a binder which comprises a carboxyl group containing amorphous isophthalic acid containing polyester, a carboxyl group containing semi-crystalline polyester, at least 10 parts by weight, based on the total weight of the binder, of a specific glycidyl group containing acrylic copolymer and a curing agent having functional groups reactive with the polyesters' carboxyl groups. The powdered thermosetting compositions are useful for the preparation of powdered paints and varnishes which give low gloss coatings having an outstanding flow, a remarkable weatherability and excellent mechanical properties.
    Type: Application
    Filed: November 18, 2002
    Publication date: August 14, 2003
    Inventors: Luc Moens, Nele Knoops, Daniel Maetens
  • Patent number: 6586495
    Abstract: An alkylsiloxane-containing epoxy resin composition can suitably be used as water-repellent agent or a water-repellent coating to be advantageously applied to areas that are apt to be brought into contact with solutions and substances containing one or more than one components that can damage the film forming property and the adhesion of an ordinary water-repellent agent. The resin composition comprises at least an alkylsiloxane-containing epoxy resin having two or more than two alkylsiloxane groups and two or more than two cyclic aliphatic epoxy groups in a molecule and a cationic polymerization catalyst.
    Type: Grant
    Filed: September 19, 2000
    Date of Patent: July 1, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akihiko Shimomura, Hiromichi Noguchi, Isao Imamura, Tamaki Sato
  • Patent number: 6586494
    Abstract: A radiation-curable inkjet composition for forming 3-D models or images comprising a semi-crystalline or crystalline, low-shrinkage, radiation-curable oligomeric material, a photoinitiator, and a diluent, said inkjet composition having a viscosity of between about 10 to about 50 cps at at least one temperature between 50 to 140° C.
    Type: Grant
    Filed: August 8, 2001
    Date of Patent: July 1, 2003
    Assignee: Spectra Group Limited, Inc.
    Inventors: Alexandre Mejiritski, Oleg V. Grinevich, Dustin B. Martin, Douglas C. Neckers
  • Patent number: 6569603
    Abstract: There are disclosed a light-sensitive composition which comprises (A) a polymer having a phenyl group substituted by a vinyl group at a side chain, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photo-polymerization initiator, or a light-sensitive composition which comprises (A′) a polymer, the above-mentioned (B) and (C), and (D) a monomer having at least two phenyl groups each of which is substituted by a vinyl group in the molecule of the monomer; and a method of forming a relief image which comprises coating the light-sensitive composition as mentioned above on a support, exposing the composition by exposure or scanning exposure and developing the same to form a relief image on the support.
    Type: Grant
    Filed: January 30, 2001
    Date of Patent: May 27, 2003
    Assignee: Mitsubishi Paper Mills Limited
    Inventor: Akira Furukawa
  • Patent number: 6565968
    Abstract: PSAs and protective coatings are provided, and include solvent, emulsion, and hot melt PSAs formulated with at least one benzocyclobutenone (BCBO) monomer. UV-cured PSAs and coatings are provided, and include cured BCBO-containing polymers and cured mixtures of BCBO-containing and OH-containing polymers.
    Type: Grant
    Filed: April 12, 2000
    Date of Patent: May 20, 2003
    Assignee: Avery Dennison Corporation
    Inventors: Kai Li, Yukihiko Sasaki, Prakash Mallya, Pradeep Iyer
  • Patent number: 6541537
    Abstract: A compound and a method of forming a photopolymerizable acrylated glycidyl acrylic terpolymer resin compound is disclosed. The polymeric resin may be formed in a two-step process. A photopolymerizable acrylic hybrid polymer is suitable for forming films having glass transition temperatures from about −55 degrees C. to about 110 degrees C. A non-aromatic photopolymerizable acrylate polymer may be formed by combining, in a first step, a reactive source of epoxide ion groups. In a second step, the glycidyl acrylic terpolymer formed in the first step is reacted with a catalyst and a source of unsaturated acid or anhydride to form an acrylate polymer. A ring opening reaction is employed such that an acid or an anhydride containing a conjugated double bond forms an acrylated acrylic, an acrylated fluorinated acrylic, an acrylated silonted acrylic, or an acrylated halogenated grafted acrylic. The cure process is initiated with specific UV or visible light promotors and/or with a UV or visible light source.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: April 1, 2003
    Assignee: Renaissance Technology LLC
    Inventor: Daniel W. Catena
  • Publication number: 20030054284
    Abstract: According to the present invention, there are provided an insulating film for an organic EL element, which has sufficiently low water permeability and a good sectional form and whose reactivity with a basic material and an electrode made from a metal having a low work function is suppressed, an insulating film for an organic EL element, which enables the formation of a through hole or U-shaped cavity therein and has excellent flattening performance, high transparency and high resistance to a resist stripper, and a radiation sensitive resin composition for forming the insulating film.
    Type: Application
    Filed: March 27, 2002
    Publication date: March 20, 2003
    Inventors: Masayoshi Suzuki, Hirofumi Sasaki, Isao Nishimura, Fumiko Yonezawa, Masayuki Endo, Kazuaki Niwa
  • Patent number: 6531521
    Abstract: A practically excellent method for preserving a photosensitive composition Containing a photopolymerization initiator and a photopolymerizable monomer and/or oligomer, which comprises placing and preserving the photosensitive composition in a light shielding vessel, wherein the product of the void ratio (%) in the vessel and the oxygen partial pressure (hPa) in the void part is 1500 (%·hPa) or more is provided; and the method imparts remarkably improved preservation stability.
    Type: Grant
    Filed: April 17, 2001
    Date of Patent: March 11, 2003
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Baba, Toshiya Inoue, Shigeo Hozumi
  • Patent number: 6517910
    Abstract: In one aspect the invention provides an energy efficient polymerization method comprising irradiating a polymerizable composition and a photoinitiator with a source of essentially monochromatic radiation where the photoinitiator and the wavelength of the radiation source are selected such that the extinction coefficient of the photoinitiator at the peak wavelength of the source is greater than about 1000 M−1 cm−1 and such that the photoinitiator absorbs at least two percent of the actinic radiation incident on the coating. In another aspect the invention provides energy efficient methods of polymerizing polymerizable compositions and crosslinking crosslinkable compositions by irradiating the respective compositions with a low power source of essentially monochromatic radiation. The low power energy sources have an input power of less than about 10 W/cm.
    Type: Grant
    Filed: February 6, 2001
    Date of Patent: February 11, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Robin E. Wright, George F. Vesley
  • Patent number: 6512054
    Abstract: Methods for preparing free radical or visible light curable (VLC) acid-containing polymers in an aqueous solution are provided. In one embodiment, the method comprises reacting polymers having reactive carboxylic acid groups with a methacrylated oxazoline or oxazine, collectively referred to hereafter as “methacrylated unsaturated cyclic imino ethers,” in an aqueous solution at a temperature of from about 50° C. to about 75° C. In another embodiment, the method comprises an additional step of preparing the carboxylic acid-containing polymer in an aqueous solution and then reacting the carboxylic acid-containing polymer with the methacrylated cyclic imino ether in the aqueous solution. The present invention also relates to free radical or VLC acid-containing polymers, and dental restoratives that comprise such polymers. Methods of attaching an oxazoline or oxazine to a carboxylate group on a polymer in an aqueous solution are also provided.
    Type: Grant
    Filed: January 17, 2001
    Date of Patent: January 28, 2003
    Assignee: The Ohio State University Research Foundation
    Inventors: Bill M. Culbertson, Scott R. Schricker
  • Patent number: 6465537
    Abstract: A photocurable composition is provided which can be produced and cured by both free-radical and cationic polymerization modes, which provides a sufficient length of open time to be bonded to an adherend, and which exhibts a good adhesive property. A photocurable composition containing a compound (A) having at least one free-radically polymerizable unsaturated bond in a molecule, a compound (B) having at least one epoxy group in a molecule, a free-radical polymerization catalyst (C), a cationic polymerization catalyst (D) and a compound (E) represented by the following formula (1).
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: October 15, 2002
    Assignee: Sekisui Chemical Co., Ltd.
    Inventor: Hiroji Fukui
  • Patent number: 6437014
    Abstract: The present invention relates to a method for making a heat-resistant elastic article and a heat-resistant elastic article. The invention especially relates to a method of making elastic fibers and polymeric elastic fibers wherein the elastic fibers are capable of withstanding dyeing and heat-setting processes that typically are conducted at elevated temperatures (such as 110-230° C. and especially at greater than or equal to 130° C. for minutes). The inventive method comprises radiation crosslinking an article (or plurality of articles) under an inert or oxygen limited atmosphere (for example, in N2, argon, helium, carbon dioxide, xenon and/or a vacuum) wherein the article (or articles) comprises at least one amine stabilizer and preferably another optional stabilizer additive. More preferably, the radiation crosslinking is performed at a low temperature (−50 to 40° C.).
    Type: Grant
    Filed: July 28, 2000
    Date of Patent: August 20, 2002
    Assignee: The Dow Chemical Company
    Inventors: Thoi H. Ho, Selim Bensason, Rajen M. Patel, Kimberly S. Houchens, Rona L. Reid, Pak-Wing S. Chum, Leonie K. Walsh
  • Patent number: 6423760
    Abstract: The present invention provides a fully vulcanized powdery rubber having a particle size of from 20 to 2000 nm, its preparation and use. The vulcanized powdery rubber is obtained by irradiating a rubber latex having a particle size of from 20 to 2000 nm with a high-energy irradiation. The vulcanized powdery rubber is very easily to be dispersed into various plastics, and thus can be mixed with various plastics to prepare toughened plastics and fully valcanized thermoplastic elastomers.
    Type: Grant
    Filed: October 30, 2000
    Date of Patent: July 23, 2002
    Assignees: China Petro-Chemical Corporation, Beijing Research Institute of Chemical Industry, Sinopec
    Inventors: Jinliang Qiao, Genshuan Wei, Xiaohong Zhang, Shijun Zhang, Jianming Gao, Wei Zhang, Yiqun Liu, Jiuqiang Li, Fengru Zhang, Renli Zhai, Jingbo Shao, Kunkai Yan, Hua Yin
  • Patent number: 6410748
    Abstract: A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3  (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: June 25, 2002
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Takeshi Okino, Shuji Hayase, Yoshihiko Nakano, Makoto Nakase
  • Patent number: 6407145
    Abstract: The invention relates to a novel process for the manufacture of mouldings, especially contact lenses, in which a soluble prepolymer comprising crosslinkable groups is crosslinked in solution, and also to mouldings, especially contact lenses, obtainable in accordance with that process. The present invention relates also to novel prepolymers that can be used in the process according to the invention, especially derivatives of a polyvinyl alcohol having a molecular weight of at least about 2000 that, based on the number of hydroxy groups of the polyvinyl alcohol, comprise from approximately 0.
    Type: Grant
    Filed: September 17, 1998
    Date of Patent: June 18, 2002
    Assignee: Novartis AG
    Inventor: Beat Müller
  • Patent number: 6399671
    Abstract: This invention relates to rubber polymers based on polymerizable monomers and having an elevated gel content together with an elevated degree of swelling, to the production of the stated rubber polymers and to the use thereof for the production of moldings of all kinds.
    Type: Grant
    Filed: July 22, 1999
    Date of Patent: June 4, 2002
    Assignee: Bayer Aktiengesellschaft
    Inventors: Martin Hoch, Hermann Meisenheimer, Lothar Sesterhenn
  • Patent number: 6384102
    Abstract: Radiation-curable powder compositions, usable as paint or varnish, which comprise a mixture of at least one semi-crystalline polyester containing end methacryloyl groups and of at least one acrylic copolymer containing ethylenically unsaturated groups, these polyesters comprising the reaction products of a glycidyl methacrylate and of a semi-crystalline polyester containing end carboxyl groups.
    Type: Grant
    Filed: April 21, 2000
    Date of Patent: May 7, 2002
    Assignee: UCB S.A.
    Inventors: Luc Moens, Jean-Marie Loutz, Daniel Maetens, Patrick Loosen, Marc Van Kerckhove
  • Publication number: 20020016431
    Abstract: Disclosed is a negative photoresist which is suitable for use in photolithography using light of 220 nm or shorter like the light from the ArF excimer laser as exposure light, avoids pattern deformation originated from swelling and has a high adhesion strength to the substrate (a micro pattern is hard to be separated from the substrate) in addition to a dry etching resistance and high resolution.
    Type: Application
    Filed: July 18, 2001
    Publication date: February 7, 2002
    Applicant: NEC Corporation
    Inventors: Shigeyuki Iwasa, Katsumi Maeda, Etsuo Hasegawa
  • Patent number: 6316518
    Abstract: The invention includes a method of increasing polymerization within a condensation polymer. A substantially dry condensation polymer material is provided. The material is exposed to radiation having a frequency less than microwave frequency for a time of at least about 0.5 hour to increase an amount of polymerization within the material. The invention also includes a method of treating a polyamide material. A polymeric polyamide material is provided and exposed to first radiation having a first power intensity. The material is then exposed to second radiation having a second power intensity. The first power intensity is higher than the second power intensity. Additionally, the invention includes an apparatus. The apparatus includes an inlet port through which a feed material enters the apparatus, and an outlet port through which the feed material passes out of the apparatus.
    Type: Grant
    Filed: February 3, 2000
    Date of Patent: November 13, 2001
    Assignee: Advanced Polymer Technology, Inc.
    Inventors: L. Myles Phipps, Eric J. Swenson
  • Patent number: 6309795
    Abstract: The invention provides a resist composition which comprises a polymer (a) having structural units with an acid-labile group, and a radiation-sensitive compound (b) which forms an acid upon exposure to activated radiation, wherein the polymer (a) is a polymer obtained by polymerizing 10 to 100 wt. % of a (meth)acrylic ester (i) having, as an alcohol residue, an allyl group with at least two substituent groups and 0 to 90 wt. % of a monomer (ii) copolymerizable with the (meth)acrylic ester, and has excellent sensitivity, resolution and heat resistance, and a pattern forming process making use of the resist composition.
    Type: Grant
    Filed: June 9, 1998
    Date of Patent: October 30, 2001
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Nobunori Abe, Nobukazu Takahashi
  • Publication number: 20010007010
    Abstract: The invention relates to a radiation curable powder paint binder composition comprising a radiation curable compound being a mono or multi valent carboxylic ester of a &bgr;, &ggr;, &dgr;, or &egr;-hydroxyalkylamide group containing compound, in which the carboxylic ester is derived from an &agr;, &bgr;-ethylenically unsaturated carboxylic acid.
    Type: Application
    Filed: January 5, 2001
    Publication date: July 5, 2001
    Inventors: Rudolfus A.T.M. Van Benthem, Saskia Udding-Louwrier, Johan F.G.A. Jansen, Aylvin J.A.A. Dias
  • Patent number: 6255033
    Abstract: A positive acting, heat-sensitive composition is presented, either coated on a lithographic base, or on a printing circuit board base, and comprises a water insoluble heat-sensitive resin, a novel adhesion promoter and a radiation absorbing agent—a dye or a pigment. An excellent film forming polymer that comprises acetal units directly pendant from the polymer polyvinyl alcohol backbone may be the only binder resin, when other resins being optional. The solubility of the coated material in the areas exposed to near-IR laser radiation in mild alkaline developers becomes considerably higher, allowing to obtain high resolved patterns of the etch-resistant material on printing circuit boards or lithographic printing plates. The composition can be applied on the substrate from a liquid or laminated as a dry film.
    Type: Grant
    Filed: July 30, 1999
    Date of Patent: July 3, 2001
    Assignee: Creo, Ltd.
    Inventors: Moshe Levanon, Emmanuel Lurie, Sergei Malikov, Oleg Naigertsik, Larisa Postel
  • Patent number: 6228900
    Abstract: The present invention discloses methods for enhancing the wear-resistance of polymers, the resulting polymers, and in vivo implants made from such polymers. One aspect of this invention presents a method whereby a polymer is irradiated, preferably with gamma radiation, then thermally treated, such as by remelting of annealing. The resulting polymeric composition preferably has its most oxidized surface layer removed. Another aspect of the invention presents a general method for optimizing the wear resistance and desirable physical and/or chemical properties of a polymer by crosslinking and thermally treating it. The resulting polymeric compositions is wear-resistant and may be fabricated into an in vivo implant.
    Type: Grant
    Filed: January 6, 1999
    Date of Patent: May 8, 2001
    Assignee: The Orthopaedic Hospital and University of Southern California
    Inventors: Fu-Wen Shen, Harry A. McKellop, Ronald Salovey
  • Patent number: 6210859
    Abstract: This invention relates to a copolymer for the manufacture of chemical amplified photoresist and a chemical amplified positive photoresist composition comprising a copolymer for the manufacture of chemical amplified photoresist as a base resin, as represented by the following formula 1, an acid generator and additive, Wherein, R1, R2, R3 and R4 are independently a hydrogen atom or a lower alkyl group; R5, R6, R7 and R8 are a hydrogen atom, an alkyl group of C1-8, an alkoxy group, an alkoxycarbonyl group or a halogen atom; h and i are independently an integer of 0-8; k, l, m and n represent an integer of element units provided that 0.3<k/(k+l+m+n)<0.9, 0≦l/(k+l+m+n)<0.6, 0≦m/(k+l+m+n)<0.6, and 0.01<n/(k+l+m+n)<0.
    Type: Grant
    Filed: October 15, 1999
    Date of Patent: April 3, 2001
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Hyun Pyo Jeon, Seong Ju Kim, Joo Hyeon Park, Jong Bum Lee
  • Patent number: 6180687
    Abstract: In vivo polymerizable intraocular lens compositions which comprise substituted fluoroalkyl or perfluoroalkyl monomers having anionic, cationic, and/or nonionic surface active functionality in the unsaturated fluorophobic ends. The compositions are preferably cured by UV photoinitiation and are useful in repairing torn or detached retinal tissue or forming intraocular lenses in situ.
    Type: Grant
    Filed: May 17, 1999
    Date of Patent: January 30, 2001
    Assignees: Alcon Laboratories, Inc., University of Southern Mississippi
    Inventors: Mark E. Hammer, Steven T. Charles, John C. Lang, Robert Y. Lochhead, Lon J. Mathias
  • Patent number: 6160031
    Abstract: A process for decomposing a polymer which is capable of undergoing thermal depolymerization to its monomer or monomers, such as for example poly(methylmethacrylate), and for the recovery of at least one of the monomers, includes the steps of subjecting the polymer in solid, gel, partially molten or molten form to microwave heating for a time and at a temperature sufficient to decompose the polymer to produce the monomer or monomers in gaseous, liquid or solid form, without substantial decomposition of the monomer or monomers, and recovering at least one of the monomer or monomers. The monomer or monomers may then be reused for plymerisation.
    Type: Grant
    Filed: May 19, 1999
    Date of Patent: December 12, 2000
    Assignee: AECI Limited
    Inventors: Ian Douglas Poree, Karol Paula Cameron, Janine Alison Bloem, Fritz Dieter Schlosser, Alison McGowan
  • Patent number: 6143233
    Abstract: A polymer which can be crosslinked by high-energy radiation and contains from 0.1 to 50% by weight, based on the polymer, of 2,3-dihydrofuran groups or derivatives thereof, each calculated as 2,3-dihydrofuran.
    Type: Grant
    Filed: September 22, 1998
    Date of Patent: November 7, 2000
    Assignee: BASF Aktiengesellschaft
    Inventors: Wolfgang Reich, Reinhold Schwalm, Erich Beck, Lukas Haussling, Oskar Nuyken, Roman-Benedikt Raether
  • Patent number: 6106998
    Abstract: A negative resist material suitable for lithography employing for exposure a beam having a wavelength of 220 nm or less. The negative resist material contains a polymer having a weight average molecular weight of 1,000-500,000 and represented by the following formula (1): ##STR1## wherein R.sup.1, R.sup.3, and R.sup.5 are hydrogen atoms or methyl groups; R.sup.2 is a specified divalent hydrocarbon group; R.sup.4 is a hydrocarbon group having an epoxy group; R.sup.6 is a hydrogen atom or a C.sub.1-12 hydrocarbon group; and each of x, y, and z represents an arbitrary number satisfying certain relations; a photoacid generator generating an acid through exposure; and optionally a polyhydric alcohol or a polyfunctional epoxy group. The present invention also discloses a pattern formation method, and a method of manufacturing semiconductor devices using the pattern formation method.
    Type: Grant
    Filed: June 9, 1998
    Date of Patent: August 22, 2000
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa
  • Patent number: 6071618
    Abstract: A polymeric film includes at least one irradiated water soluble layer. A process for making a water soluble film includes the steps of extruding a water soluble film; and irradiating the water soluble film. Using electron beam irradiation, a water soluble film's solubility rate can be increased.
    Type: Grant
    Filed: October 11, 1996
    Date of Patent: June 6, 2000
    Assignee: Cryovac, Inc.
    Inventors: Philip H. Cook, Jr., Tina V. Lorenzo Moore