Oxygen Other Than As Part Of Carboxylic Acid Or Derivative Moiety Patents (Class 522/154)
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Patent number: 6045967Abstract: A novel photoresist copolymer, consisting of at least two aliphatic cyclo-olefins and an amine, which is useful for the photolithography using ArF as a light source. The photoresist prepared from the copolymer can be patterned with high resolution.Type: GrantFiled: January 7, 1998Date of Patent: April 4, 2000Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Chi Hyeong Roh, Joo On Park
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Patent number: 6017640Abstract: Opaquely pigmented or thick filmed powder coatings for heat sensitive substrates, such as wood, wood composites, for example, medium density fiber board, and plastics, that can be fully cured, especially near the substrate, through the incorporation of a dual cure system in the powder comprising a thermal initiator, such as a peroxide, along with a UV initiator. The UV initiator cures the surface, while the thermal initiator cures at the substrate. Surprisingly, virtually no pregelation occurs during the heated melt and flow out step prior to UV curing. Consequently, the hardened film finish formed on the surface exhibits exceptional smoothness which is comparable to that of traditional UV curable powders. The hardened film finish is also fully cured throughout and exhibits exceptional adhesion to the substrate which cannot be achieved with traditional UV curable powders that have been pigmented.Type: GrantFiled: April 23, 1999Date of Patent: January 25, 2000Assignee: Morton International, Inc.Inventors: Jeno Muthiah, Andrew T. Daly, Richard P. Haley, Joseph J. Kozlowski
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Patent number: 6011077Abstract: The invention relates to a novel process for the production of mouldings, in particular contact lenses, in which a crosslinkable polymer comprising units containing crosslinkable groups, units containing a bound photoinitiator and, if desired, units containing further modifiers is crosslinked in solution, and to mouldings, in particular contact lenses, obtainable by this process. The present invention likewise relates to novel crosslinkable polymers which can be employed in the process, in particular derivatives of a polyvinyl alcohol having a molecular weight of at least about 2000 which comprises from about 0.5 to about 80%, based on the number of hydroxyl groups in the polyvinyl alcohol, of units of the formula I ##STR1## in which the variables are as defined in the description, and units of the formula IV, as defined in the description, which contain a bound photoinitiator.Type: GrantFiled: September 12, 1997Date of Patent: January 4, 2000Assignee: Novartis AGInventor: Beat Muller
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Patent number: 5965629Abstract: A process for modifying the surfaces of a polymer, ceramic, ITO or glass by irradiating energized ion particles onto the surfaces of the polymer, ceramic, ITO or glass, while blowing a reactive gas directly over the surface of the polymer, ceramic, ITO or glass under a vacuum condition, to decrease the wetting angle of the surface. The process can be widely used in the fields of polymers because it provides effects of increasing the spreading of aqueous dyestuffs, increasing adhesive strength with other materials and inhibition of light scattering by decreasing the wetting angle of the material surface.Type: GrantFiled: April 11, 1997Date of Patent: October 12, 1999Assignee: Korea Institute of Science and TechnologyInventors: Hyung Jin Jung, Seok Keun Koh, Won Kook Choi, Kyong Sop Han, Sik Sang Gam
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Patent number: 5939148Abstract: The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light exposure, is mixed with a photopolymerization inititor system consisting of a coumarin type pigment of particular structure and a titanocene compound. This composition has an unexpectedly high sensitivity to visible laser.Type: GrantFiled: September 9, 1997Date of Patent: August 17, 1999Assignee: Kansai Paint Co., Ltd.Inventors: Genji Imai, Hideo Kogure
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Patent number: 5879852Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I),R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.Type: GrantFiled: April 30, 1997Date of Patent: March 9, 1999Assignee: AGFA-Gevaert AGInventors: Mathias Eichhorn, Gerhard Buhr
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Patent number: 5801033Abstract: This invention provides novel methods for the formation of biocompatible membranes around biological materials using photopolymerization of water soluble molecules. The membranes can be used as a covering to encapsulate biological materials or biomedical devices, as a "glue" to cause more than one biological substance to adhere together, or as carriers for biologically active species. Several methods for forming these membranes are provided. Each of these methods utilizes a polymerization system containing water-soluble macromers, species which are at once polymers and macromolecules capable of further polymerization. The macromers are polymerized using a photoinitiator (such as a dye), optionally a cocatalyst, optionally an accelerator, and radiation in the form of visible or long wavelength UV light. The reaction occurs either by suspension polymerization or by interfacial polymerization.Type: GrantFiled: June 7, 1995Date of Patent: September 1, 1998Assignee: The Board of Regents, The University of Texas SystemInventors: Jeffrey A. Hubbell, Chandrashekhar P. Pathak, Amarpreet S. Sawhney, Neil P. Desai, Syed F. A. Hossainy
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Patent number: 5789464Abstract: The invention relates to a novel process for the manufacture of mouldings, especially contact lenses, in which a soluble prepolymer comprising crosslinkable groups is crosslinked in solution, and also to mouldings, especially contact lenses, obtainable in accordance with that process. The present invention relates also to novel prepolymers that can be used in the process according to the invention, especially derivatives of a polyvinyl alcohol having a molecular weight of at least about 2000 that, based on the number of hydroxy groups of the polyvinyl alcohol, comprise from approximately 0.5 to approximately 80% of units of formula I ##STR1## wherein R is lower alkylene having up to 8 carbon atoms,R.sup.1 is hydrogen or lower alkyl andR.sup.Type: GrantFiled: December 22, 1995Date of Patent: August 4, 1998Assignee: CIBA Vision CorporationInventor: Beat Muller
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Patent number: 5780524Abstract: This invention provides an improved method and apparatus for non-contact quantum mechanical heating of thermoplastic fibers by resonant energy absorption of laser energy by the fiber. In one embodied form, the unique method for continuous heating of thermoplastic fibers comprises the steps of: a) preparing a thermoplastic synthetic fiber for heat treatment; b) illuminating the fiber with a beam of radiation from a carbon monoxide continuous wave laser beam of resonant frequency for the prescribed fiber being treated; c) traversing the fiber to be treated across the path of the laser beam in a direction perpendicular to the beam of radiation from the laser source; d) adjusting the rate of traversement of the fiber to maintain the temperature of the thermoplastic fiber within a temperature range of about five percent below the melting point of the thermoplastic fiber to continuously heat the fiber by resonant energy absorption of the laser beam.Type: GrantFiled: May 14, 1996Date of Patent: July 14, 1998Inventor: Don E. Olsen
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Patent number: 5759750Abstract: A radiation-sensitive mixture essentially consisting of(a) a water-insoluble binder or binder mixture and(b) a compound which forms a strong acid on exposure to radiation,component (a) being a phenolic resin in which some or all of the phenolic hydroxyl groups have been replaced with groups (IA) or (IB) ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each alkyl or R.sup.1 together with R.sup.2 forms a ring and X is CH.sub.2, O, S, SO.sub.2 or NR.sup.4, is suitable for the production of relief structures.Type: GrantFiled: April 18, 1997Date of Patent: June 2, 1998Assignee: BASF AktiengesellschaftInventors: Horst Binder, Reinhold Schwalm, Dirk Funhoff
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Patent number: 5731364Abstract: The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.Type: GrantFiled: January 24, 1996Date of Patent: March 24, 1998Assignee: Shipley Company, L.L.C.Inventors: Roger F. Sinta, James F. Cameron, Timothy G. Adams, Martha M. Rajaratnam, Michael F. Cronin
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Patent number: 5621019Abstract: The present invention presents a monomer including a vinyl group, which monomer is represented by a general formula (I) wherein R.sub.1 represents one of a hydrogen atom, a tert-butoxycarbonyl group, a tetrahydropyran-2-yl group, a tetrahydrofuran-2-yl group, a 4-methoxytehydropyranyl group, a 1-ethoxyethyl group, a 1-butoxyethyl group and a 1-propoxyethyl group, R.sub.2 represents a hydrocarbon residue including a bridged hydrocarbon group and having a carbon number ranging from 7 to 12 both inclusive, and R.sub.3 represents one of a hydrogen atom and a methyl group.Type: GrantFiled: January 31, 1995Date of Patent: April 15, 1997Assignee: NEC CorporationInventors: Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa
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Patent number: 5583163Abstract: The invention relates to a novel process for the manufacture of mouldings, especially contact lenses, in which a soluble prepolymer comprising crosslinkable groups is cross-linked in solution, and also to mouldings, especially contact lenses, obtainable in accordance with that process. The present invention relates also to novel prepolymers that can be used in the process according to the invention, especially derivatives of a polyvinyl alcohol having a molecular weight of at least about 2000 that, based on the number of hydroxy groups of the polyvinyl alcohol, comprise from approximately 0.5 to approximately 80% of units of formula I ##STR1## wherein R is lower alkylene having up to 8 carbon atoms,R.sup.1 is hydrogen or lower alkyl andR.sup.Type: GrantFiled: June 5, 1995Date of Patent: December 10, 1996Assignee: Ciba Geigy CorporationInventor: Beat Muller
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Patent number: 5545442Abstract: This invention pertains to cross-linked hydrophilic polymeric films, the process of making such films, and their use. The films of this invention are produced by solubilizing a water-soluble polymer with a photosensitive or light degradable catalyst, optionally drying said solution, and exposing the solution to an energy source, particularly light. These films are suitable for use as a carrier for biologically active agents, such as pharmaceuticals, both human and veterinary, insecticides, and fertilizers; as hydrophilic membranes for separation processes; as bandages for wound treatment; as body implants or as coatings for such implants; and as coatings on glass, metal, wood or ceramics.Type: GrantFiled: June 5, 1995Date of Patent: August 13, 1996Assignee: Ciba-Geigy CorporationInventors: Gary Van Savage, James M. Clevenger
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Patent number: 5532287Abstract: This invention pertains to cross-linked hydrophilic polymeric films, the process of making such films, and their use. The films of this invention are produced by solubilizing a water-soluble polymer with a photosensitive or light degradable catalyst, optionally drying said solution, and exposing the solution to an energy source, particularly light. These films are suitable for use as a carrier for biologically active agents, such as pharmaceuticals, both human and veterinary, insecticides, and fertilizers; as hydrophilic membranes for separation processes; as bandages for wound treatment; as body implants or as coatings for such implants; and as coatings on glass, metal, wood or ceramics.Type: GrantFiled: May 4, 1994Date of Patent: July 2, 1996Assignee: Ciba-Geigy CorporationInventors: Gary V. Savage, James M. Clevenger
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Patent number: 5529914Abstract: This invention provides novel methods for the formation of biocompatible membranes around biological materials using photopolymerization of water soluble molecules. The membranes can be used as a covering to encapsulate biological materials or biomedical devices, as a "glue" to cause more than one biological substance to adhere together, or as carriers for biologically active species. Several methods for forming these membranes are provided. Each of these methods utilizes a polymerization system containing water-soluble macromers, species which are at once polymers and macromolecules capable of further polymerization. The macromers are polymerized using a photoinitiator (such as a dye), optionally a cocatalyst, optionally an accelerator, and radiation in the form of visible or long wavelength UV light. The reaction occurs either by suspension polymerization or by interfacial polymerization.Type: GrantFiled: October 7, 1992Date of Patent: June 25, 1996Assignee: The Board of Regents the Univeristy of Texas SystemInventors: Jeffrey A. Hubbell, Chandrashekhar P. Pathak, Amarpreet S. Sawhney, Neil P. Desai, Syed F. A. Hossainy
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Patent number: 5516875Abstract: This invention concerns positive-working photodefinable polyimide precursors which make use of chemical amplification based on photoacid catalyzed cleavage of acid labile-poly(amic acetal esters).Type: GrantFiled: December 15, 1994Date of Patent: May 14, 1996Assignee: E. I. Du Pont de Nemours and CompanyInventor: Howard E. Simmons, III
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Patent number: 5489623Abstract: A polymer has at least one photoactive site and more than one perfluorocyclobutane group. New monomers containing photoactive sites or photoactive precursors and at least one perfluorovinyl group are useful for making such polymers. Processes of making such polymers and the monomers from which they are made are disclosed. The polymers are useful in coatings, photoresists, and the like.Type: GrantFiled: April 25, 1995Date of Patent: February 6, 1996Assignee: The Dow Chemical CompanyInventors: David A. Babb, W. Frank Richey, Katherine S. Clement, Eric S. Moyer, Marius W. Sorenson
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Patent number: 5399655Abstract: This invention concerns positive-working photodefinable polyimide precursors which make use of chemical amplification based on photoacid catalyzed cleavage of acid labile-poly(amic acetal esters).Type: GrantFiled: October 29, 1993Date of Patent: March 21, 1995Assignee: E. I. du Pont de Nemours and CompanyInventor: Howard E. Simmons, III
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Patent number: 5374379Abstract: A method for making a PTC element grafts a crystalline polymer to conductive particles to form a PTC composition. The step of grafting including solution polymerization. The PTC composition is formed into a PTC element. The PTC element is cross-linked after forming. The PTC element according to this invention exhibits superior PTC behavior when the temperature of the PTC element reaches the crystal melting point of the crystalline polymer.Type: GrantFiled: September 15, 1992Date of Patent: December 20, 1994Assignee: Daito Communication Apparatus Co., Ltd.Inventors: Norio Tsubokawa, Naoki Yamazaki
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Patent number: 5332651Abstract: Photopolymerizable grafted polyvinyl alcohols including groups of formula ##STR1## wherein n represents zero or an integer from 1 to 6, m represents zero or 1 (with the proviso that m represents zero when n represents zero), Z together with the nitrogen and carbon atoms to which they are attached represent a heterocyclic ring optionally fused to one or more benzenoid or heterocyclic rings, X.sup.- represents an anion, R' represents an alkyl group, and p represents an integer from 1 to 4. Compositions containing such grafted polyvinyl alcohols, for example for screen printing stencils, have shown high sensitivity to light.Type: GrantFiled: February 3, 1993Date of Patent: July 26, 1994Assignee: Sericol LimitedInventors: Peter Dickinson, Julie E. Pratt, Fereidoun Abbasi
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Patent number: 5239031Abstract: A heterofunctional macromer represented by the formula: ##STR1## in which R.sub.1 is H or C.sub.1 -C.sub.4 alkyl; R.sub.2 is a (poly) lactone or (poly) ether chain; X.sub.1 is --COO--, --COOCH.sub.2 CH.sub.2 OCO--, --CONHCOO--, --COOCH.sub.2 CH.sub.2 NH--COO-- ##STR2## X.sub.2 is --O--, --COO-- or --OCO--NH--R.sub.3 --NHCOO--group; R.sub.3 is C.sub.1 -C.sub.6 alkylene, aromatic or alicyclic group; A is --CH.sub.2 --, --C(CH.sub.3).sub.2 -- or ##STR3## and reactive polymers derived from said macromer.Type: GrantFiled: December 29, 1992Date of Patent: August 24, 1993Assignee: Nippon Paint Co., Ltd.Inventors: Mitsuo Yamada, Kei Aoki
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Patent number: 5239032Abstract: A heterofunctional macromer represented by the formula: ##STR1## in which R.sub.1 is H or C.sub.1 -C.sub.4 alkyl; R.sub.2 is a (poly) lactone or (poly) ether chain; X.sub.1 is --COO--, --COOCH.sub.2 CH.sub.2 OCO--, --CONHCOO--, --COOCH.sub.2 CH.sub.2 NH--COO-- or ##STR2## X.sub.2 is --O--, --COO-- or --OCO--NH--R.sub.3 --NHCOO-- group; R.sub.3 is C.sub.1 -C.sub.6 alkylene, aromatic or alicyclic group; A is --CH.sub.2 --, --C(CH.sub.3).sub.2 -- or ##STR3## and reactive polymers derived from said macromer.Type: GrantFiled: December 29, 1992Date of Patent: August 24, 1993Assignee: Nippon Paint Co., Ltd.Inventors: Mitsuo Yamada, Kei Aoki
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Patent number: 5225316Abstract: Photosensitive compositions containing a photoinitiator which generates an acid upon exposure to light and a polymer containing pendant alkoxy alkyl ester groups. Also disclosed are imageable articles containing the photosensitive compositions of the present invention coated on a substrate as well as processes for forming an imaged article.Type: GrantFiled: January 6, 1992Date of Patent: July 6, 1993Assignee: Minnesota Mining and Manufacturing CompanyInventors: Dennis E. Vogel, John J. Stofko, Jr.
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Patent number: 5212047Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.Type: GrantFiled: February 18, 1992Date of Patent: May 18, 1993Assignee: E. I. Du Pont de Nemours and CompanyInventors: Walter R. Hertler, Dotsevi Y. Sogah, Gary N. Taylor
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Patent number: 5128386Abstract: UV-crosslinkable materials based on (meth)acrylate copolymers contain copolymerized monomers of the general formula I ##STR1## where R is a certain alkyl radical, an aryl radical or a radical R.sup.1 and R.sup.1 is a radical ##STR2## where R.sup.2 to R.sup.6 are each H, alkyl, a non-ortho OH group, OCH.sub.3, OC.sub.2 H.sub.3, SH, SCH.sub.3, Cl, F, CN, COOH, COO(C.sub.1 -C.sub.3 -alkyl), CF.sub.3, N(CH.sub.3).sub.2, N(C.sub.2 H.sub.5).sub.2, N(CH.sub.3)C.sub.6 H.sub.5, .sup.+ N(CH.sub.3).sub.3 X.sup.- or .sup.+N(CH.sub.3).sub.X X.sup.-, where X.sup.- is an acid anion, and one or more of the radicals R.sup.2 to R.sup.Type: GrantFiled: December 15, 1989Date of Patent: July 7, 1992Assignee: BASF AktiengesellschaftInventors: Gerd Rehmer, Andreas Boettchher, Gerhard Auchter
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Patent number: 5120633Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of a substance that is an acid generator upon exposure to actinic radiation.Type: GrantFiled: April 10, 1990Date of Patent: June 9, 1992Assignee: E. I. du Pont de Nemours and CompanyInventors: Richard D. Bauer, Gwendyline Y. Y. Chen, Walter R. Hertler, Robert C. Wheland
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Patent number: 5085972Abstract: Solubility inhibitors for phenolic resins are disclosed, which when used in phenolic resin/iodonium salt positive printing plate constructions result in significantly increased sensitivity. The solubility inhibitors contain an alkoxyalkyl ester moiety. Also disclosed are presensitized lithogaphic plates containing the solubility inhibitors and a process for developing a photoimage.Type: GrantFiled: November 26, 1990Date of Patent: February 4, 1992Assignee: Minnesota Mining and Manufacturing CompanyInventor: Dennis E. Vogel
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Patent number: 5077174Abstract: This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.Type: GrantFiled: April 10, 1990Date of Patent: December 31, 1991Assignee: E. I. Du Pont de Nemours and CompanyInventors: Richard D. Bauer, Gwendyline Y. Chen, Walter R. Hertler, Robert C. Wheland
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Patent number: 5071731Abstract: A photosensitive element adapted for the preparation of colored images is disclosed. The photosensitive element comprises: a photosolubilizable layer consisting essentially of an acid-labile polymer and a photosolubilizing agent; an elastomeric layer; and a support. It can be processed by aqueous solvents, preferably ordinary tap water.Type: GrantFiled: April 10, 1990Date of Patent: December 10, 1991Assignee: E. I. Du Pont de Nemours and CompanyInventors: Gwendyline Y. Y, T. Chen, Floyd A. Raymond, Jeffrey J. Patricia, Walter R. Hertler
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Patent number: 5047443Abstract: Hotmelt contact adhesives which are crosslinkable with UV light in the air are based on copolymers which contain tetrahydrofurfur-2-yl (meth)acrylate and/or N-2-tetrahydrofurfuryl (meth)-acrylamide and/or alkoxyalkyl (meth)acrylates and/or N-alkoxyalkyl (meth)acrylamides as copolymerized units and added benzophenone and/or benzophenone derivatives as photosensitizers.Type: GrantFiled: May 18, 1989Date of Patent: September 10, 1991Assignee: BASF AktiengesellschaftInventor: Gerd Rehmer
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Patent number: 4820607Abstract: A photosolubilizable composition containing (a) a first compound capable of producing an acid by irradiation with actinic rays and (b) a high molecular weight compound, whose solubility in a developing solution is increased by the action of an acid, and a photosolubilizable composition containing (c) a high molecular weight compound whose solubility in a developing solution is increased by irradiation with actinic radiation, are disclosed. These compositions exhibit high photosensitivity, broad development latitude, and high stability with time.Type: GrantFiled: August 14, 1986Date of Patent: April 11, 1989Assignee: Fuji Photo Film Co., Ltd.Inventor: Toshiaki Aoai
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Patent number: 4800152Abstract: Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light X-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.Type: GrantFiled: March 16, 1987Date of Patent: January 24, 1989Assignee: International Business Machines CorporationInventors: Robert D. Allen, Jean M. J. Frechet, Robert J. Twieg, Carlton G. Willson
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Patent number: 4691045Abstract: A hydroxyl group-containing (meth)acrylate oligomer represented by the general formula I: ##STR1## wherein two R.sup.1 's independently stand for hydrogen atom or methyl group, two Z's independently stand for a divalent organic group of 2 to 20 carbon atoms, and p stands for an integer of the value of 1 to 100, and urethane, carboxyl and hydroxyl modified prepolymer thereof.Type: GrantFiled: December 5, 1985Date of Patent: September 1, 1987Assignee: Nippon Shokubai Kagaku Co., Ltd.Inventors: Shuzo Fukuchi, Shigeru Yamaguchi
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Patent number: 4603101Abstract: t-Butylvinylaryl ethers are provided which can be used to make t-butyl substituted polyaryl ethers and photoresist compositions. The photoresist compositions can be made by combining the t-butylpolyaryl ethers with aromatic onium salts.Type: GrantFiled: September 27, 1985Date of Patent: July 29, 1986Assignee: General Electric CompanyInventor: James V. Crivello