Oxygen Other Than As Part Of Carboxylic Acid Or Derivative Moiety Patents (Class 522/154)
  • Patent number: 6045967
    Abstract: A novel photoresist copolymer, consisting of at least two aliphatic cyclo-olefins and an amine, which is useful for the photolithography using ArF as a light source. The photoresist prepared from the copolymer can be patterned with high resolution.
    Type: Grant
    Filed: January 7, 1998
    Date of Patent: April 4, 2000
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Chi Hyeong Roh, Joo On Park
  • Patent number: 6017640
    Abstract: Opaquely pigmented or thick filmed powder coatings for heat sensitive substrates, such as wood, wood composites, for example, medium density fiber board, and plastics, that can be fully cured, especially near the substrate, through the incorporation of a dual cure system in the powder comprising a thermal initiator, such as a peroxide, along with a UV initiator. The UV initiator cures the surface, while the thermal initiator cures at the substrate. Surprisingly, virtually no pregelation occurs during the heated melt and flow out step prior to UV curing. Consequently, the hardened film finish formed on the surface exhibits exceptional smoothness which is comparable to that of traditional UV curable powders. The hardened film finish is also fully cured throughout and exhibits exceptional adhesion to the substrate which cannot be achieved with traditional UV curable powders that have been pigmented.
    Type: Grant
    Filed: April 23, 1999
    Date of Patent: January 25, 2000
    Assignee: Morton International, Inc.
    Inventors: Jeno Muthiah, Andrew T. Daly, Richard P. Haley, Joseph J. Kozlowski
  • Patent number: 6011077
    Abstract: The invention relates to a novel process for the production of mouldings, in particular contact lenses, in which a crosslinkable polymer comprising units containing crosslinkable groups, units containing a bound photoinitiator and, if desired, units containing further modifiers is crosslinked in solution, and to mouldings, in particular contact lenses, obtainable by this process. The present invention likewise relates to novel crosslinkable polymers which can be employed in the process, in particular derivatives of a polyvinyl alcohol having a molecular weight of at least about 2000 which comprises from about 0.5 to about 80%, based on the number of hydroxyl groups in the polyvinyl alcohol, of units of the formula I ##STR1## in which the variables are as defined in the description, and units of the formula IV, as defined in the description, which contain a bound photoinitiator.
    Type: Grant
    Filed: September 12, 1997
    Date of Patent: January 4, 2000
    Assignee: Novartis AG
    Inventor: Beat Muller
  • Patent number: 5965629
    Abstract: A process for modifying the surfaces of a polymer, ceramic, ITO or glass by irradiating energized ion particles onto the surfaces of the polymer, ceramic, ITO or glass, while blowing a reactive gas directly over the surface of the polymer, ceramic, ITO or glass under a vacuum condition, to decrease the wetting angle of the surface. The process can be widely used in the fields of polymers because it provides effects of increasing the spreading of aqueous dyestuffs, increasing adhesive strength with other materials and inhibition of light scattering by decreasing the wetting angle of the material surface.
    Type: Grant
    Filed: April 11, 1997
    Date of Patent: October 12, 1999
    Assignee: Korea Institute of Science and Technology
    Inventors: Hyung Jin Jung, Seok Keun Koh, Won Kook Choi, Kyong Sop Han, Sik Sang Gam
  • Patent number: 5939148
    Abstract: The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light exposure, is mixed with a photopolymerization inititor system consisting of a coumarin type pigment of particular structure and a titanocene compound. This composition has an unexpectedly high sensitivity to visible laser.
    Type: Grant
    Filed: September 9, 1997
    Date of Patent: August 17, 1999
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Genji Imai, Hideo Kogure
  • Patent number: 5879852
    Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I),R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.
    Type: Grant
    Filed: April 30, 1997
    Date of Patent: March 9, 1999
    Assignee: AGFA-Gevaert AG
    Inventors: Mathias Eichhorn, Gerhard Buhr
  • Patent number: 5801033
    Abstract: This invention provides novel methods for the formation of biocompatible membranes around biological materials using photopolymerization of water soluble molecules. The membranes can be used as a covering to encapsulate biological materials or biomedical devices, as a "glue" to cause more than one biological substance to adhere together, or as carriers for biologically active species. Several methods for forming these membranes are provided. Each of these methods utilizes a polymerization system containing water-soluble macromers, species which are at once polymers and macromolecules capable of further polymerization. The macromers are polymerized using a photoinitiator (such as a dye), optionally a cocatalyst, optionally an accelerator, and radiation in the form of visible or long wavelength UV light. The reaction occurs either by suspension polymerization or by interfacial polymerization.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: September 1, 1998
    Assignee: The Board of Regents, The University of Texas System
    Inventors: Jeffrey A. Hubbell, Chandrashekhar P. Pathak, Amarpreet S. Sawhney, Neil P. Desai, Syed F. A. Hossainy
  • Patent number: 5789464
    Abstract: The invention relates to a novel process for the manufacture of mouldings, especially contact lenses, in which a soluble prepolymer comprising crosslinkable groups is crosslinked in solution, and also to mouldings, especially contact lenses, obtainable in accordance with that process. The present invention relates also to novel prepolymers that can be used in the process according to the invention, especially derivatives of a polyvinyl alcohol having a molecular weight of at least about 2000 that, based on the number of hydroxy groups of the polyvinyl alcohol, comprise from approximately 0.5 to approximately 80% of units of formula I ##STR1## wherein R is lower alkylene having up to 8 carbon atoms,R.sup.1 is hydrogen or lower alkyl andR.sup.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: August 4, 1998
    Assignee: CIBA Vision Corporation
    Inventor: Beat Muller
  • Patent number: 5780524
    Abstract: This invention provides an improved method and apparatus for non-contact quantum mechanical heating of thermoplastic fibers by resonant energy absorption of laser energy by the fiber. In one embodied form, the unique method for continuous heating of thermoplastic fibers comprises the steps of: a) preparing a thermoplastic synthetic fiber for heat treatment; b) illuminating the fiber with a beam of radiation from a carbon monoxide continuous wave laser beam of resonant frequency for the prescribed fiber being treated; c) traversing the fiber to be treated across the path of the laser beam in a direction perpendicular to the beam of radiation from the laser source; d) adjusting the rate of traversement of the fiber to maintain the temperature of the thermoplastic fiber within a temperature range of about five percent below the melting point of the thermoplastic fiber to continuously heat the fiber by resonant energy absorption of the laser beam.
    Type: Grant
    Filed: May 14, 1996
    Date of Patent: July 14, 1998
    Inventor: Don E. Olsen
  • Patent number: 5759750
    Abstract: A radiation-sensitive mixture essentially consisting of(a) a water-insoluble binder or binder mixture and(b) a compound which forms a strong acid on exposure to radiation,component (a) being a phenolic resin in which some or all of the phenolic hydroxyl groups have been replaced with groups (IA) or (IB) ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each alkyl or R.sup.1 together with R.sup.2 forms a ring and X is CH.sub.2, O, S, SO.sub.2 or NR.sup.4, is suitable for the production of relief structures.
    Type: Grant
    Filed: April 18, 1997
    Date of Patent: June 2, 1998
    Assignee: BASF Aktiengesellschaft
    Inventors: Horst Binder, Reinhold Schwalm, Dirk Funhoff
  • Patent number: 5731364
    Abstract: The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.
    Type: Grant
    Filed: January 24, 1996
    Date of Patent: March 24, 1998
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, James F. Cameron, Timothy G. Adams, Martha M. Rajaratnam, Michael F. Cronin
  • Patent number: 5621019
    Abstract: The present invention presents a monomer including a vinyl group, which monomer is represented by a general formula (I) wherein R.sub.1 represents one of a hydrogen atom, a tert-butoxycarbonyl group, a tetrahydropyran-2-yl group, a tetrahydrofuran-2-yl group, a 4-methoxytehydropyranyl group, a 1-ethoxyethyl group, a 1-butoxyethyl group and a 1-propoxyethyl group, R.sub.2 represents a hydrocarbon residue including a bridged hydrocarbon group and having a carbon number ranging from 7 to 12 both inclusive, and R.sub.3 represents one of a hydrogen atom and a methyl group.
    Type: Grant
    Filed: January 31, 1995
    Date of Patent: April 15, 1997
    Assignee: NEC Corporation
    Inventors: Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa
  • Patent number: 5583163
    Abstract: The invention relates to a novel process for the manufacture of mouldings, especially contact lenses, in which a soluble prepolymer comprising crosslinkable groups is cross-linked in solution, and also to mouldings, especially contact lenses, obtainable in accordance with that process. The present invention relates also to novel prepolymers that can be used in the process according to the invention, especially derivatives of a polyvinyl alcohol having a molecular weight of at least about 2000 that, based on the number of hydroxy groups of the polyvinyl alcohol, comprise from approximately 0.5 to approximately 80% of units of formula I ##STR1## wherein R is lower alkylene having up to 8 carbon atoms,R.sup.1 is hydrogen or lower alkyl andR.sup.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: December 10, 1996
    Assignee: Ciba Geigy Corporation
    Inventor: Beat Muller
  • Patent number: 5545442
    Abstract: This invention pertains to cross-linked hydrophilic polymeric films, the process of making such films, and their use. The films of this invention are produced by solubilizing a water-soluble polymer with a photosensitive or light degradable catalyst, optionally drying said solution, and exposing the solution to an energy source, particularly light. These films are suitable for use as a carrier for biologically active agents, such as pharmaceuticals, both human and veterinary, insecticides, and fertilizers; as hydrophilic membranes for separation processes; as bandages for wound treatment; as body implants or as coatings for such implants; and as coatings on glass, metal, wood or ceramics.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: August 13, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Gary Van Savage, James M. Clevenger
  • Patent number: 5532287
    Abstract: This invention pertains to cross-linked hydrophilic polymeric films, the process of making such films, and their use. The films of this invention are produced by solubilizing a water-soluble polymer with a photosensitive or light degradable catalyst, optionally drying said solution, and exposing the solution to an energy source, particularly light. These films are suitable for use as a carrier for biologically active agents, such as pharmaceuticals, both human and veterinary, insecticides, and fertilizers; as hydrophilic membranes for separation processes; as bandages for wound treatment; as body implants or as coatings for such implants; and as coatings on glass, metal, wood or ceramics.
    Type: Grant
    Filed: May 4, 1994
    Date of Patent: July 2, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Gary V. Savage, James M. Clevenger
  • Patent number: 5529914
    Abstract: This invention provides novel methods for the formation of biocompatible membranes around biological materials using photopolymerization of water soluble molecules. The membranes can be used as a covering to encapsulate biological materials or biomedical devices, as a "glue" to cause more than one biological substance to adhere together, or as carriers for biologically active species. Several methods for forming these membranes are provided. Each of these methods utilizes a polymerization system containing water-soluble macromers, species which are at once polymers and macromolecules capable of further polymerization. The macromers are polymerized using a photoinitiator (such as a dye), optionally a cocatalyst, optionally an accelerator, and radiation in the form of visible or long wavelength UV light. The reaction occurs either by suspension polymerization or by interfacial polymerization.
    Type: Grant
    Filed: October 7, 1992
    Date of Patent: June 25, 1996
    Assignee: The Board of Regents the Univeristy of Texas System
    Inventors: Jeffrey A. Hubbell, Chandrashekhar P. Pathak, Amarpreet S. Sawhney, Neil P. Desai, Syed F. A. Hossainy
  • Patent number: 5516875
    Abstract: This invention concerns positive-working photodefinable polyimide precursors which make use of chemical amplification based on photoacid catalyzed cleavage of acid labile-poly(amic acetal esters).
    Type: Grant
    Filed: December 15, 1994
    Date of Patent: May 14, 1996
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Howard E. Simmons, III
  • Patent number: 5489623
    Abstract: A polymer has at least one photoactive site and more than one perfluorocyclobutane group. New monomers containing photoactive sites or photoactive precursors and at least one perfluorovinyl group are useful for making such polymers. Processes of making such polymers and the monomers from which they are made are disclosed. The polymers are useful in coatings, photoresists, and the like.
    Type: Grant
    Filed: April 25, 1995
    Date of Patent: February 6, 1996
    Assignee: The Dow Chemical Company
    Inventors: David A. Babb, W. Frank Richey, Katherine S. Clement, Eric S. Moyer, Marius W. Sorenson
  • Patent number: 5399655
    Abstract: This invention concerns positive-working photodefinable polyimide precursors which make use of chemical amplification based on photoacid catalyzed cleavage of acid labile-poly(amic acetal esters).
    Type: Grant
    Filed: October 29, 1993
    Date of Patent: March 21, 1995
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Howard E. Simmons, III
  • Patent number: 5374379
    Abstract: A method for making a PTC element grafts a crystalline polymer to conductive particles to form a PTC composition. The step of grafting including solution polymerization. The PTC composition is formed into a PTC element. The PTC element is cross-linked after forming. The PTC element according to this invention exhibits superior PTC behavior when the temperature of the PTC element reaches the crystal melting point of the crystalline polymer.
    Type: Grant
    Filed: September 15, 1992
    Date of Patent: December 20, 1994
    Assignee: Daito Communication Apparatus Co., Ltd.
    Inventors: Norio Tsubokawa, Naoki Yamazaki
  • Patent number: 5332651
    Abstract: Photopolymerizable grafted polyvinyl alcohols including groups of formula ##STR1## wherein n represents zero or an integer from 1 to 6, m represents zero or 1 (with the proviso that m represents zero when n represents zero), Z together with the nitrogen and carbon atoms to which they are attached represent a heterocyclic ring optionally fused to one or more benzenoid or heterocyclic rings, X.sup.- represents an anion, R' represents an alkyl group, and p represents an integer from 1 to 4. Compositions containing such grafted polyvinyl alcohols, for example for screen printing stencils, have shown high sensitivity to light.
    Type: Grant
    Filed: February 3, 1993
    Date of Patent: July 26, 1994
    Assignee: Sericol Limited
    Inventors: Peter Dickinson, Julie E. Pratt, Fereidoun Abbasi
  • Patent number: 5239031
    Abstract: A heterofunctional macromer represented by the formula: ##STR1## in which R.sub.1 is H or C.sub.1 -C.sub.4 alkyl; R.sub.2 is a (poly) lactone or (poly) ether chain; X.sub.1 is --COO--, --COOCH.sub.2 CH.sub.2 OCO--, --CONHCOO--, --COOCH.sub.2 CH.sub.2 NH--COO-- ##STR2## X.sub.2 is --O--, --COO-- or --OCO--NH--R.sub.3 --NHCOO--group; R.sub.3 is C.sub.1 -C.sub.6 alkylene, aromatic or alicyclic group; A is --CH.sub.2 --, --C(CH.sub.3).sub.2 -- or ##STR3## and reactive polymers derived from said macromer.
    Type: Grant
    Filed: December 29, 1992
    Date of Patent: August 24, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Mitsuo Yamada, Kei Aoki
  • Patent number: 5239032
    Abstract: A heterofunctional macromer represented by the formula: ##STR1## in which R.sub.1 is H or C.sub.1 -C.sub.4 alkyl; R.sub.2 is a (poly) lactone or (poly) ether chain; X.sub.1 is --COO--, --COOCH.sub.2 CH.sub.2 OCO--, --CONHCOO--, --COOCH.sub.2 CH.sub.2 NH--COO-- or ##STR2## X.sub.2 is --O--, --COO-- or --OCO--NH--R.sub.3 --NHCOO-- group; R.sub.3 is C.sub.1 -C.sub.6 alkylene, aromatic or alicyclic group; A is --CH.sub.2 --, --C(CH.sub.3).sub.2 -- or ##STR3## and reactive polymers derived from said macromer.
    Type: Grant
    Filed: December 29, 1992
    Date of Patent: August 24, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Mitsuo Yamada, Kei Aoki
  • Patent number: 5225316
    Abstract: Photosensitive compositions containing a photoinitiator which generates an acid upon exposure to light and a polymer containing pendant alkoxy alkyl ester groups. Also disclosed are imageable articles containing the photosensitive compositions of the present invention coated on a substrate as well as processes for forming an imaged article.
    Type: Grant
    Filed: January 6, 1992
    Date of Patent: July 6, 1993
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Dennis E. Vogel, John J. Stofko, Jr.
  • Patent number: 5212047
    Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.
    Type: Grant
    Filed: February 18, 1992
    Date of Patent: May 18, 1993
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Walter R. Hertler, Dotsevi Y. Sogah, Gary N. Taylor
  • Patent number: 5128386
    Abstract: UV-crosslinkable materials based on (meth)acrylate copolymers contain copolymerized monomers of the general formula I ##STR1## where R is a certain alkyl radical, an aryl radical or a radical R.sup.1 and R.sup.1 is a radical ##STR2## where R.sup.2 to R.sup.6 are each H, alkyl, a non-ortho OH group, OCH.sub.3, OC.sub.2 H.sub.3, SH, SCH.sub.3, Cl, F, CN, COOH, COO(C.sub.1 -C.sub.3 -alkyl), CF.sub.3, N(CH.sub.3).sub.2, N(C.sub.2 H.sub.5).sub.2, N(CH.sub.3)C.sub.6 H.sub.5, .sup.+ N(CH.sub.3).sub.3 X.sup.- or .sup.+N(CH.sub.3).sub.X X.sup.-, where X.sup.- is an acid anion, and one or more of the radicals R.sup.2 to R.sup.
    Type: Grant
    Filed: December 15, 1989
    Date of Patent: July 7, 1992
    Assignee: BASF Aktiengesellschaft
    Inventors: Gerd Rehmer, Andreas Boettchher, Gerhard Auchter
  • Patent number: 5120633
    Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of a substance that is an acid generator upon exposure to actinic radiation.
    Type: Grant
    Filed: April 10, 1990
    Date of Patent: June 9, 1992
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Gwendyline Y. Y. Chen, Walter R. Hertler, Robert C. Wheland
  • Patent number: 5085972
    Abstract: Solubility inhibitors for phenolic resins are disclosed, which when used in phenolic resin/iodonium salt positive printing plate constructions result in significantly increased sensitivity. The solubility inhibitors contain an alkoxyalkyl ester moiety. Also disclosed are presensitized lithogaphic plates containing the solubility inhibitors and a process for developing a photoimage.
    Type: Grant
    Filed: November 26, 1990
    Date of Patent: February 4, 1992
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Dennis E. Vogel
  • Patent number: 5077174
    Abstract: This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.
    Type: Grant
    Filed: April 10, 1990
    Date of Patent: December 31, 1991
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Gwendyline Y. Chen, Walter R. Hertler, Robert C. Wheland
  • Patent number: 5071731
    Abstract: A photosensitive element adapted for the preparation of colored images is disclosed. The photosensitive element comprises: a photosolubilizable layer consisting essentially of an acid-labile polymer and a photosolubilizing agent; an elastomeric layer; and a support. It can be processed by aqueous solvents, preferably ordinary tap water.
    Type: Grant
    Filed: April 10, 1990
    Date of Patent: December 10, 1991
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Gwendyline Y. Y, T. Chen, Floyd A. Raymond, Jeffrey J. Patricia, Walter R. Hertler
  • Patent number: 5047443
    Abstract: Hotmelt contact adhesives which are crosslinkable with UV light in the air are based on copolymers which contain tetrahydrofurfur-2-yl (meth)acrylate and/or N-2-tetrahydrofurfuryl (meth)-acrylamide and/or alkoxyalkyl (meth)acrylates and/or N-alkoxyalkyl (meth)acrylamides as copolymerized units and added benzophenone and/or benzophenone derivatives as photosensitizers.
    Type: Grant
    Filed: May 18, 1989
    Date of Patent: September 10, 1991
    Assignee: BASF Aktiengesellschaft
    Inventor: Gerd Rehmer
  • Patent number: 4820607
    Abstract: A photosolubilizable composition containing (a) a first compound capable of producing an acid by irradiation with actinic rays and (b) a high molecular weight compound, whose solubility in a developing solution is increased by the action of an acid, and a photosolubilizable composition containing (c) a high molecular weight compound whose solubility in a developing solution is increased by irradiation with actinic radiation, are disclosed. These compositions exhibit high photosensitivity, broad development latitude, and high stability with time.
    Type: Grant
    Filed: August 14, 1986
    Date of Patent: April 11, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aoai
  • Patent number: 4800152
    Abstract: Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light X-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.
    Type: Grant
    Filed: March 16, 1987
    Date of Patent: January 24, 1989
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, Jean M. J. Frechet, Robert J. Twieg, Carlton G. Willson
  • Patent number: 4691045
    Abstract: A hydroxyl group-containing (meth)acrylate oligomer represented by the general formula I: ##STR1## wherein two R.sup.1 's independently stand for hydrogen atom or methyl group, two Z's independently stand for a divalent organic group of 2 to 20 carbon atoms, and p stands for an integer of the value of 1 to 100, and urethane, carboxyl and hydroxyl modified prepolymer thereof.
    Type: Grant
    Filed: December 5, 1985
    Date of Patent: September 1, 1987
    Assignee: Nippon Shokubai Kagaku Co., Ltd.
    Inventors: Shuzo Fukuchi, Shigeru Yamaguchi
  • Patent number: 4603101
    Abstract: t-Butylvinylaryl ethers are provided which can be used to make t-butyl substituted polyaryl ethers and photoresist compositions. The photoresist compositions can be made by combining the t-butylpolyaryl ethers with aromatic onium salts.
    Type: Grant
    Filed: September 27, 1985
    Date of Patent: July 29, 1986
    Assignee: General Electric Company
    Inventor: James V. Crivello