Two Or More Hetero Atoms In Hetero Ring At Least One Of Which Is Oxygen Patents (Class 522/169)
  • Patent number: 8980971
    Abstract: A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: March 17, 2015
    Assignee: DSM IP Assets B.V.
    Inventors: Masahiro Ueda, Katsuyuki Takase, Takahiko Kurosawa
  • Publication number: 20140349086
    Abstract: The present invention provides a photo-curable composition that requires a small demolding force. The present invention also provides a UV imprint method that requires a small demolding force. The photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C). A photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
    Type: Application
    Filed: October 24, 2012
    Publication date: November 27, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Toshiki Ito, Chieko Mihara, Kanae Kawahata, Motoki Okinaka
  • Patent number: 8841064
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a dissolution controlling agent including the compound represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, and a photosensitive resin film prepared by using the same.
    Type: Grant
    Filed: November 11, 2011
    Date of Patent: September 23, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Myoung-Hwan Cha, Jong-Hwa Lee, Mi-Ra Im, Min-Kook Chung, Ji-Young Jeong, Hyun-Yong Cho, Hwan-Sung Cheon
  • Patent number: 8815970
    Abstract: A method of preparing polyurethane prepolymer does not require using a toxic isocyanate monomer (manufactured by harmful phosgene) as a raw material. Epoxy resin and carbon dioxide are used as major raw materials to form cyclic carbonates to be reacted with a functional group oligomer, and then amino groups in a hydrophilic (ether group) or hydrophobic (siloxane group) diamine polymer are used for performing a ring-opening polymerization, and the microwave irradiation is used in the ring-opening polymerization to efficiently synthesize the amino-terminated PU prepolymer, and then an acrylic group at an end is added to manufacture an UV cross-linking PU (UV-PU) oligomer which can be coated onto a fabric surface, and the fabric is dried by UV radiation for a surface treatment to form a washing-resisted long lasting hydrophilic or hydrophobic PU fabric.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: August 26, 2014
    Assignee: Tamkang University (A University of Taiwan)
    Inventors: Jing-Zhong Hwang, Guei-Jia Chang, Jhong-Jheng Lin, Cheng-Wei Tsai, Shih-Chieh Wang, Po-Cheng Chen, Kan-Nan Chen, Kan-Nan Chen
  • Patent number: 8785515
    Abstract: Polycyclic aromatic compounds of formula (I) having at least two conjugated aromatic rings at least one of which has a substituent comprising a cyclic carbonate group can be used as sensitizers for cationic photoinitiators, especially iodonium compounds, and may also function as monomers in cationically initiated radiation curable compositions, especially coating compositions, such as printing inks and varnishes.
    Type: Grant
    Filed: May 9, 2008
    Date of Patent: July 22, 2014
    Assignee: Sun Chemical Corporation
    Inventors: Shaun Lawrence Herlihy, Robert Stephen Davidson
  • Patent number: 8697134
    Abstract: Described is a direct method for the fabrication of resorcinarene nanocapsules by photopolymerization of compounds of formula (I), such as resorcinarene tetraalkene tetrathiol (RTATT), in the absence of any template or preorganization. Further, by varying the polymerization media, a variety of other polymeric architectures like lattices, fibrous networks, and nanoparticles were obtained. The morphology and structure were characterized by transmission electron microscopy, energy dispersive spectroscopy, scanning electron microscopy, dynamic light scattering, infrared and nuclear magnetic resonance spectroscopy. These morphologically distinct resorcinarene polymeric architectures contain residual thiol and ene functional groups offering potential functionalization opportunities.
    Type: Grant
    Filed: June 21, 2011
    Date of Patent: April 15, 2014
    Assignee: Old Dominion University Research Foundation
    Inventors: Ramjee Balasubramanian, Zaharoula M. Kalaitzis, Srujana Prayakarao
  • Patent number: 8436066
    Abstract: Compositions that can be polymerized and/or crosslinked into coatings by cationic and/or radical irradiation contain at least one photoinitiator and at least one compound having at least one isocyanate function.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: May 7, 2013
    Assignee: Vencorex France
    Inventors: Jean-Marc Frances, Philippe Barbeau, Jean-Marie Bernard, Damien Bourgeois
  • Publication number: 20130010039
    Abstract: The present invention provides a photocurable ink composition for ink jet recording with excellent curability. The photocurable ink composition for ink jet recording includes polymerizable compounds, a photopolymerization initiator, and a colorant, wherein the polymerizable compounds include a vinyl ether group-containing (meth)acrylate represented by general formula (I): CH2?CR1—COOR2—O—CH?CH—R3??(I) (wherein R1 is a hydrogen atom or a methyl group, R2 is a divalent organic residue having 2 to 20 carbon atoms, and R3 is a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms) and phenoxyethyl (meth)acrylate.
    Type: Application
    Filed: July 9, 2012
    Publication date: January 10, 2013
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hiroaki Kida, Hiroshi Fukumoto, Toru Saito, Keitaro Nakano, Hiroki Nakane
  • Publication number: 20130004677
    Abstract: A method of preparing polyurethane prepolymer does not require using a toxic isocyanate monomer (manufactured by harmful phosgene) as a raw material. Epoxy resin and carbon dioxide are used as major raw materials to form cyclic carbonates to be reacted with a functional group oligomer, and then amino groups in a hydrophilic (ether group) or hydrophobic (siloxane group) diamine polymer are used for performing a ring-opening polymerization, and the microwave irradiation is used in the ring-opening polymerization to efficiently synthesize the amino-terminated PU prepolymer, and then an acrylic group at an end is added to manufacture an UV cross-linking PU (UV-PU) oligomer which can be coated onto a fabric surface, and the fabric is dried by UV radiation for a surface treatment to form a washing-resisted long lasting hydrophilic or hydrophobic PU fabric.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 3, 2013
    Inventors: Jing-Zhong HWANG, Guei-Jia CHANG, Jhong-Jheng LIN, Cheng-Wei TSAI, Shih-Chieh WANG, Po-Cheng CHEN, Kan-Nan CHEN, Jen-Taut YEH
  • Publication number: 20120288686
    Abstract: A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition.
    Type: Application
    Filed: July 11, 2012
    Publication date: November 15, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Frank Y. Xu, Weijun Liu, Cynthia B. Brooks, Dwayne L. LaBrake, David J. Lentz
  • Patent number: 8303860
    Abstract: A colored curable composition including: (A) a pigment dispersion containing (a-1) a pigment, (a-2) a compound having a pigment mother nucleus structure and an amino group in a molecule, and (a-3) a resin having an acid group and a polymerizable group; (B) an oxime ester initiator; and (C) a polymerizable compound.
    Type: Grant
    Filed: March 5, 2009
    Date of Patent: November 6, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Kazuto Shimada, Atsushi Sugasaki
  • Patent number: 8236872
    Abstract: A photocationically polymerizable adhesive composition and an optical member, the photocationically polymerizable adhesive composition including about 75 to about 99.8 parts by weight of a compound including one of aliphatic epoxy, alicyclic epoxy, oxetane, and vinyl ether compounds, about 0.1 to about 5 parts by weight of a titanate coupling agent, and about 0.1 to about 20 parts by weight of a photopolymerization initiator, wherein a sum of weights of the compound, the titanate coupling agent, and the photopolymerization initiator is 100 parts by weight.
    Type: Grant
    Filed: April 22, 2011
    Date of Patent: August 7, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Cheong Hun Song, Hiroshi Ogawa, Tatsuhiro Suwa
  • Patent number: 8192821
    Abstract: Disclosed is an ultraviolet-curable resin composition for multilayer optical discs, which contains (A) dioxane glycol di(meth)acrylate and/or tricyclodecane dimethylol di(meth)acrylate, and (B) a photopolymerization initiator.
    Type: Grant
    Filed: July 9, 2007
    Date of Patent: June 5, 2012
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Daisuke Kobayashi, Kiyohisa Tokuda, Masahiro Naito, Go Mizutani
  • Patent number: 8129447
    Abstract: The invention provides an ink composition including (i) a sensitizing dye having a polymerizable group as a substituent, (ii) a polymerization initiator and (iii) a polymerizable compound having an ethylenically unsaturated bond. The invention also provides an inkjet recording method and a polymerizable compound useful as a sensitizing dye. The sensitizing dye (i) is represented by Formula (I) or (II) below. In the formulae, X represents O, S, NRa, or NRb, n1 and n2 each represent 0 or 1, Ra, Rb, and R1 to R18 each represent a hydrogen atom or a monovalent substituent, and one polymerizable group is present in the molecule.
    Type: Grant
    Filed: September 9, 2008
    Date of Patent: March 6, 2012
    Assignee: Fujifilm Corporation
    Inventors: Tokihiko Matsumura, Tsutomu Umebayashi
  • Publication number: 20110311639
    Abstract: Described is a direct method for the fabrication of resorcinarene nanocapsules by photopolymerization of compounds of formula (I), such as resorcinarene tetraalkene tetrathiol (RTATT), in the absence of any template or preorganization. Further, by varying the polymerization media, a variety of other polymeric architectures like lattices, fibrous networks, and nanoparticles were obtained. The morphology and structure were characterized by transmission electron microscopy, energy dispersive spectroscopy, scanning electron microscopy, dynamic light scattering, infrared and nuclear magnetic resonance spectroscopy. These morphologically distinct resorcinarene polymeric architectures contain residual thiol and ene functional groups offering potential functionalization opportunities.
    Type: Application
    Filed: June 21, 2011
    Publication date: December 22, 2011
    Applicant: Old Dominion University Research Foundation
    Inventors: Ramjee Balasubramanian, Zaharoula M. Kalaitzis, Srujana Prayakarao
  • Patent number: 8030368
    Abstract: Photoinitiated reactions especially in photopolymer technology, as well as photoinitiated color forming reactions are achievable by applying a reactive substrate selected from a polymerisable and/or crosslinkable composition and a color changing substance to a support, activating a latent photoinitiator applied with the reactive substance and subsequently exposing the reactive substrate with the resulting photoinitiator therein to photoreaction conditions wherein actinic radiation causes the substrate to undergo polymerization and/or crosslinking or color change respectively, the substrate being locally modified in its constitution as a result of its exposure to actinic radiation at least one stage of the method, so that the resulting polymerised and/or crosslinked composition or color changed substance corresponds in its distribution on the support to the locations of the modification of the substrate.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: October 4, 2011
    Assignee: Lintfield Limited
    Inventor: Grant Bradley
  • Patent number: 7888401
    Abstract: An active energy ray-curable ink composition, which contains a compound having, in its molecule, an oxetane ring and at least one selected from a dioxolane ring, a dioxane ring, and a dioxepane ring; an ink composition, which contains a cationically-polymerizable compound having, in its molecule, both an oxetane ring and a bicycloorthoester ring; an inkjet ink, which contains the active energy ray-curable ink composition or the ink composition; and an image-forming method and a recorded material, using the inkjet ink; an oxetane compound of a specific structure.
    Type: Grant
    Filed: July 27, 2007
    Date of Patent: February 15, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Hisato Nagase, Takehiko Sato
  • Publication number: 20100285282
    Abstract: The invention describes a radiation-curable ink jet ink, which comprises at least 50% by weight of cyclic trimethyllolpropane formal acrylate (CTFA), and further comprises a free-radical photoinitiator, and which is substantially free of volatile compounds.
    Type: Application
    Filed: September 15, 2008
    Publication date: November 11, 2010
    Inventors: Hartley David Selman, Graeme Edward Charles Beats, Nigel Anthony Caiger, Andrew David Speirs, Stephen Paul Wilson
  • Publication number: 20100144917
    Abstract: The invention is to provide an epoxy compound or an actinic energy radiation hardenable composition each having high safety and stability, and to provide an actinic energy radiation hardenable composition with excellent photo-hardenability under high humidity, which gives high solvent resistance, high water proof and a hardened layer with high strength. There is provided an actinic energy radiation hardenable composition containing an epoxy compound represented by the following formula (1).
    Type: Application
    Filed: July 12, 2006
    Publication date: June 10, 2010
    Applicant: KONICA MINOLTA MEDICAL & GRAPHIC, INC.
    Inventor: Nobumasa Sasa
  • Patent number: 7718111
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0groups per 100 grams of said composition.
    Type: Grant
    Filed: April 11, 2007
    Date of Patent: May 18, 2010
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: David L. Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Patent number: 7544721
    Abstract: A photosensitive adhesive composition of the polymerizable resin type, the hardening of which occurs by polymerization and/or reticulation, includes:—initiators for at least one chain polymerization reaction to guarantee the hardening of the composition and a sufficient quantity of at least one bifunctional monomer, including a photolabile center with at least one photolabile entity and at least two polymerizable units, connected by covalent skeletons to the photolabile center and located away from the cleavage sites of the photolabile center, such that the composition loses the integrity and adhesivity thereof under the influence of a reticulating radiation causing the cleavage of the photolabile sites. The composition is particularly of application in dentistry.
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: June 9, 2009
    Assignee: Produits Dentaires Pierre Rolland
    Inventors: Vincent Gaud, Yves Gnanou, Jean-Pierre Desvergne, Francis Dieras, Alexandrine Roubiere
  • Publication number: 20090142606
    Abstract: A process for the polymerization and/or crosslinking of an organic coating composition is provided. The process involves employing an organic coating composition which can crosslink and/or polymerize under irradiation with short-wave ultraviolet (UV C) radiation with a wavelength of between 200 and 280 nm.
    Type: Application
    Filed: September 13, 2006
    Publication date: June 4, 2009
    Applicant: Bluestar Silicones France
    Inventor: Christian Mirou
  • Publication number: 20090142507
    Abstract: An ink composition for inkjet recording is provided. The ink composition contains (a) a monomer containing a fluorinated alkylene group and two or more polymerizable groups, (b) a photo initiator, and (c) a polymerizable monomer.
    Type: Application
    Filed: November 20, 2008
    Publication date: June 4, 2009
    Applicant: FUJIFILM CORPORATION
    Inventors: Kazuhiro Yokoi, Taiji Katsumata
  • Patent number: 7541391
    Abstract: Disclosed is an optical device structure comprising a low shrinkage mixture wherein the shrinkage of the mixture is limited after the curing of the mixture during optical device formation. Disclosed also are methods for forming optical devices which comprise the low shrinkage mixture.
    Type: Grant
    Filed: September 2, 2005
    Date of Patent: June 2, 2009
    Assignee: General Electric Company
    Inventors: Thomas Bert Gorczyca, Renato Guida, Kung-Li Justin Deng, Hua Xia
  • Patent number: 7538145
    Abstract: The phase change, curable composition comprises curable monomer, photoinitiator that initiates polymerization of the curable monomer, and phase change agent that provides the composition with an increase in viscosity of at least four orders of magnitude, from a first temperature, the first temperature being from 50° C. to 130° C., to a second temperature, the second temperature being from 0° C. to 70° C., wherein the second temperature is at least 10° C. below the first temperature. A coating over an image may be applied by providing a composition comprising curable monomer at a first temperature; applying the composition over the image, the image being at a second temperature; and exposing the composition to radiation to initiate polymerization of the curable monomer. In this process, the composition has a viscosity at the second temperature that is at least four orders of magnitude greater than its viscosity at the first temperature.
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: May 26, 2009
    Assignee: Xerox Corporation
    Inventors: Jennifer L. Belelie, Peter G. Odell, Darly Vanbesien, Marcel P. Breton
  • Publication number: 20090053535
    Abstract: A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition.
    Type: Application
    Filed: August 22, 2008
    Publication date: February 26, 2009
    Applicant: Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Weijun Liu, Cynthia B. Brooks, Dwayne L. LaBrake, David J. Lentz
  • Patent number: 7485672
    Abstract: The present invention relates to a process comprising polymerizing via irradiation from a light source, a reaction mixture comprising at least one monomer and at least one photoinitiator wherein at least about 90% of incident light emitted by the light source is filtered to produce a soluble, high molecular weight polymer.
    Type: Grant
    Filed: October 19, 2004
    Date of Patent: February 3, 2009
    Assignee: Johnson & Johnson Vision Care, Inc.
    Inventors: Frank Molock, David C. Turner, Shivkumar Mahadevan, Joseph Hepting
  • Publication number: 20090009061
    Abstract: The object of the present invention is to provide a composition for conductive materials from which a conductive layer having a high carrier transport ability can be made, a conductive material formed of the composition and having a high carrier transport ability, a conductive layer formed using the conductive material as a main material, an electronic device provided with the conductive layer and having high reliability, and electronic equipment provided with the electronic device.
    Type: Application
    Filed: July 27, 2005
    Publication date: January 8, 2009
    Inventors: Yuji Shinohara, Koichi Terao, Takashi Shinohara
  • Patent number: 7417074
    Abstract: There is disclosed an ink jet recording apparatus comprising a color ink container having a capacity V1 accommodating therein a solvent polymerizable in the presence of an acid and a colorant, a reaction liquid container having a capacity V2 (V2<V1) accommodating therein a reaction liquid comprising a solvent, and a photo-acid generating agent capable of generating an acid when irradiated with light, an stirring container mixing the color ink and the reaction liquid at a mixing ratio of S1:S2 (the color ink:the reaction liquid) to prepare a recording ink, a color ink supply means feeding the color ink to the stirring container, a reaction liquid supply means feeding the reaction liquid to the stirring container, an ink jet recording head ejecting the recording ink to a recording medium, and a supply tube feeding the recording ink to the recording head.
    Type: Grant
    Filed: March 22, 2004
    Date of Patent: August 26, 2008
    Assignees: Toshiba Tec Kabushiki Kaisha, Kabushiki Kaisha Toshiba
    Inventors: Masashi Hiroki, Kazuhiko Ohtsu, Yoshito Endo, Toru Ushirogouchi, Ryozo Akiyama
  • Patent number: 7378457
    Abstract: The present invention provides radiation curable resin compositions having enhanced low temperature flexibility and to methods of using these compositions. The radiation curable resin compositions contain no or essentially no volatile organic components (VOCs), and find particular use as coating compositions. In particular, the radiation curable resin compositions of this invention comprise a vinyl dioxolane end-capped oligomer blended with a photoinitiator.
    Type: Grant
    Filed: March 9, 2005
    Date of Patent: May 27, 2008
    Assignee: Foster Miller, Inc.
    Inventors: Robert F. Kovar, Nese Orbey
  • Patent number: 7232852
    Abstract: A visible light cationically photopolymerizable composition is provided. This composition includes an expanding monomer and a dioxirane. More specifically, the expanding monomer used in this composition is one or more dioxiranyl tetraoxaspiro[5.5]undecanes. The composition of the present invention may be used as a matrix resin for dental restorative materials. Another embodiment of the present invention is various novel dioxiranyl tetraoxaspiro[5.5]undecanes.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: June 19, 2007
    Assignee: Curators of the University of Missouri
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, Andrew J. Holder, Shin-Shi Chen, Li Jeang
  • Patent number: 7232850
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl groups per 100 grams of said composition.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: June 19, 2007
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: David Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Patent number: 7217743
    Abstract: A curable ink for jet-ink recording comprising a white pigment and a polymerizable compound, wherein the polymerizable compound is a compound selected from the group consisting of: (a) oxetane compounds; (b) pyrrole or substituted pyrroles; (c) aniline or substituted anilines; and (d) thiophene or an substituted thiophenes, provided that when the polymerizable compound is the oxetane compound, the curable ink further comprises an epoxy compound or a vinyl ether compound.
    Type: Grant
    Filed: July 21, 2003
    Date of Patent: May 15, 2007
    Assignee: Konica Corporation
    Inventor: Ai Kondo
  • Patent number: 7169829
    Abstract: The present invention provides (meth)acrylate compounds bearing a specific maleimide group and resin compositions containing said compounds that can be cured by irradiation of light in a practical dose even when a photoinitiator is not used or used in a smaller amount than that of the prior art, and cured articles of the resin compositions.
    Type: Grant
    Filed: December 26, 2002
    Date of Patent: January 30, 2007
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Toru Ozaki, Hiroo Koyanagi, Minoru Yokoshima
  • Patent number: 7098258
    Abstract: The heat-curable resin composition of the present invention comprises an epoxy-containing resin and a curing agent, wherein the curing agent is cyclohexanetricarboxylic acid and/or an anhydride thereof. The heat-curable resin composition exhibits an excellent curability without using an curing accelerator and provides a colorless transparent cured product which is little discolored under high-temperature conditions and irradiation conditions of high-energy light. The heat-curable resin composition is suitable for producing coating compositions, adhesives, shaped articles, protective films for color filters and sealing materials for photosemiconductors such as blue LED and white LED.
    Type: Grant
    Filed: June 30, 2004
    Date of Patent: August 29, 2006
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Ryuji Ideno, Takeshi Koyama, Masami Okuo
  • Patent number: 6916855
    Abstract: The invention relates to a radiation curable composition comprising radiation curable components wherein at least one component of the radiation curable composition contains a functional group which, when attached to an acrylate group has a calculated Boltzmann average dipole moment of higher than 3.5 Debye. The invention further relates to radiation curable optical fiber coating compositions having a high dielectric constant.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: July 12, 2005
    Assignee: DSM IP Assets B.V.
    Inventors: Johan F. G. A. Jansen, Aylvin J. A. A. Dias, Marko Dorschu, Betty B Coussens
  • Patent number: 6894084
    Abstract: The present invention provides radiation curable resin compositions that contain no or essentially no volatile organic components (VOCs), and to methods of using these compositions. The radiation curable resin compositions find particular use as coating compositions. In particular, the radiation curable resin compositions of this invention comprise a vinyl dioxolane end-capped oligomer blended with a photoinitiator.
    Type: Grant
    Filed: February 12, 2001
    Date of Patent: May 17, 2005
    Assignee: Foster-Miller, Inc.
    Inventors: Robert F. Kovar, Nese Orbey, Stanley Wentworth
  • Patent number: 6844375
    Abstract: The invention relates to: 4-methylene-1,3-dioxolanes of the general formula (I) wherein R1 denotes hydrogen, C5-C6-cycloalkyl or C1-C4-alkyl; m and n, which may be the same or different, denote 0 or 1, whereby m?n, o denotes 2, 3 or 4 depending on the valency of the group X; and X denotes a C—C single bond, straight-chain or branched C1-C18-alkylene, C5-C6-cycloalkylene, C8-C18-arylalkylene, —CH2(OCH2CH2)pOCH2—, —CH2(OCH(CH3)CH2)pOCH2—, wherein p is an integer from 0 to 100; a process for their production; and intermediate products used. Moreover, compositions capable of emission-free, photocationic cross-linking, which comprise 4-methylene-1,3-dioxolanes of the general formula (I) and their use for the production of solvent-resistant and transparent films.
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: January 18, 2005
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Helmut Hartl, Rainer B. Frings, Gerwald F. Grahe
  • Patent number: 6777458
    Abstract: A process for producing scratch-resistant coatings, encompassing the following steps: applying at least one UV-curable coating composition to at least one surface of an article to be coated, said coating composition comprising at least one polymer and/or oligomer P1 containing on average at least one ethylenically unsaturated double bond per molecule, and curing the coating composition by exposure to UV radiation, which comprises conducting the curing of the coating composition under an oxygen-containing protective gas which has an oxygen partial pressure in the range from 0.2 to 18 kPa.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: August 17, 2004
    Assignee: BASF Aktiengesellschaft
    Inventors: Thomas Jaworek, Reinhold Schwalm, Rainer Königer, Reiner Kranwetvogel
  • Patent number: 6689463
    Abstract: The present invention relates to a composition for coating optical fibers that includes a UV curable coating composition. The composition includes at least one component having at least one heterocyclic moiety capable of undergoing ring opening polymerization. The composition may also include at least one acrylate functional end group. The acrylate functional group may be on the same component as the heterocyclic moiety or on a second component. The cured composition has a Young's Modulus of at least about 100 MPa.
    Type: Grant
    Filed: December 18, 2001
    Date of Patent: February 10, 2004
    Assignee: Corning Incorporated
    Inventors: Kevin Y Chou, Michelle D Fabian, Jun Hou, Gregory F Jacobs, David N Schissel, Huan-Hung Sheng
  • Patent number: 6653486
    Abstract: Photopolymerizable compositions are provided which are the reaction products of a vinyl ether, a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and an electron donor compound. These monomeric/oligomeric compositions may also include epoxides, polyols, spiroorthocarbonates. One embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, a spiroorthocarbonate, and a photoinitiator system. Another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, and a photoinitiator system. Still another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, a spiroorthocarbonate, and a photoinitiator system. Still further, another embodiment of the present invention is certain novel spiroorthocarbonate compounds. Each of these novel spiroorthocarbonate compounds include at least one epoxy group as a substituent.
    Type: Grant
    Filed: September 4, 2002
    Date of Patent: November 25, 2003
    Assignee: Curators of the University of Missouri
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick
  • Patent number: 6649668
    Abstract: The invention concerns the field of polymerization and/or cross-linking reaction catalysis by cationic process of monomers, oligomers and/or polymers. In particular, novel polymerization and/or cross-linking initiator systems comprising at least one onium borate and at least one benzophenone are described to satisfy the ever greater exigencies of productivity and manufacture. The initiators are used in particular for preparing resins and/or composite materials based on an organic and/or silicon matrix or optionally a matrix of acrylic monomers, oligomers, or polymers.
    Type: Grant
    Filed: June 15, 2000
    Date of Patent: November 18, 2003
    Inventors: Marie-Anne David, Jean-Marc Frances
  • Patent number: 6610759
    Abstract: An adhesive composition that includes a mixture of a cationically polymerizable component, an acidic component, and an initiator is provided. Preferably, the initiator comprises an iodonium salt, a visible light sensitizer, and an electron donor compound, wherein the initiator has a photoinduced potential greater than or equal to that of N,N-dimethylaniline in a standard solution of 2.9×10−5 moles/g diphenyl iodonium hexafluoroantimonate and 1.5×10−5 moles/g camphorquinone in 2-butanone. This adhesive composition is cationically polymerizable and is able to bond to hard tissue and cationic restorative materials upon curing.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: August 26, 2003
    Assignees: Curators of the University of Missouri, 3M Innovative Properties Company
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, James Code, Joel D. Oxman, Sharon M. Rozzi
  • Patent number: 6592801
    Abstract: A process for polymerizing episulfide monomers comprising the steps of: (c) mixing to an episulfide monomer or a mixture of episulfide monomers an effective amount of at least one photopolymerization catalyst selected from the group consisting of (cyclopentadienyl) ruthenium and osmium complexes and an effective amount of at least a co-catalyst selected from phosphonium salts, phosphines and amines; and (d) irradiating the mixture of (a) with an ultra-violet radiation to polymerize the mixture.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: July 15, 2003
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Sirisoma Wanigatunga, Yassin Yusef Turshani, Peiqi Jiang
  • Patent number: 6590011
    Abstract: An epoxy-amine composition includes an epoxy resin, an amine curative and a latent catalyst. The latent catalyst does not cause the instant acceleration of the reaction between epoxides and amines. In the presence of radiation, the latent catalyst generates an active catalyst that accelerates/initiates the cure process of the epoxy-amine composition.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: July 8, 2003
    Assignee: Polymeright, Inc.
    Inventors: Leonid Rappoport, Alex Vainer, Aleksander Yam
  • Patent number: 6489375
    Abstract: An Offset Lithographic Printing Process employing low VOC lithographic printing ink formulations containing monomeric diluents, curable by cationic polymerization in the presence of fountain solution and resin rheology modifiers compatible with cationic catalysts.
    Type: Grant
    Filed: September 20, 2001
    Date of Patent: December 3, 2002
    Assignee: Sun Chemical Corporation
    Inventors: Edward Stone, Gordon Kotora, Mikhail Laksin, Subhankar Chatterjee, Bhalendra J. Patel
  • Patent number: 6482868
    Abstract: Accelerators that can be useful for an energy polymerizable composition comprising a cationically curable material; energy polymerizable -compositions comprising at least one cationically curable material and an initiation system therefor, the initiation system comprising at least one organometallic complex salt and at least one accelerator; and a method for curing the compositions. The cured compositions can provide useful articles. The invention also provides compositions of matter comprising an organometallic complex salt and at least one compound selected from the Class 1 and Class 2 compounds disclosed herein.
    Type: Grant
    Filed: June 26, 2000
    Date of Patent: November 19, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Wayne Scott Mahoney, Peggy Sperl Willett
  • Patent number: 6458865
    Abstract: Photopolymerizable compositions are provided which are the reaction products of a vinyl ether, a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and an electron donor compound. These monomeric/oligomeric compositions may also include epoxides, polyols, spiroorthocarbonates. One embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, a spiroorthocarbonate, and a photoinitiator system. Another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, and a photoinitiator system. Still another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, a spiroorthocarbonate, and a photoinitiator system. Still further, another embodiment of the present invention is certain novel spiroorthocarbonate compounds. Each of these novel spiroorthocarbonate compounds include at least one epoxy group as a substituent.
    Type: Grant
    Filed: January 15, 1999
    Date of Patent: October 1, 2002
    Assignees: Curators of the University of Missouri, 3M Innovative Properties Company
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, Joel D. Oxman
  • Patent number: 6235808
    Abstract: Disclosed are compounds of the formulas which are useful as monomers in photopolymerizable compositions. Also disclosed are methods of polymerizing these monomers, and polymers produced thereby.
    Type: Grant
    Filed: April 11, 2000
    Date of Patent: May 22, 2001
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James V. Crivello
  • Patent number: 6191181
    Abstract: The present invention relates to urethane acrylates, which may be cured with high-energy radiation, in which the urethane acrylates are the reaction product of a) a polyisocyanate component containing 20 to 100 mole %, based on the moles of the polyisocyanate component a), of iminooxadiazine dione group-containing polyisocyanate trimers corresponding to formula A  wherein R1, R2and R3 are the same or different and represent linear or branched, C4-C20 (cyclo)alkyl groups and X is the same or different and represents isocyanate groups or isocyanate group-containing radicals that also contain iminooxadiazine dione, isocyanurate, uretdione, urethane, allophanate, biuret or oxadiazine trione groups, wherein R1, R2 and R3 are attached to a nitrogen atom, with b) an alcohol component containing at least one monobasic, hydroxy-functional, linear or branched C1-C12 alkyl ester of (meth)acrylic acid.
    Type: Grant
    Filed: November 4, 1999
    Date of Patent: February 20, 2001
    Assignee: Bayer Aktiengesellschaft
    Inventors: Jan Weikard, Wolfgang Fischer, Frank Richter, Christian Zwiener