Processes Of Preparing A Solid Polymer From A Heterocyclic Chalogen Monomer; Or Compsitions Therefore Patents (Class 522/168)
  • Patent number: 10400118
    Abstract: The disclosure relates to ink compositions for digital printing on an external surface of a plastic article. The ink compositions comprise an ink removal-promoting additive. In some aspects, the ink removal-promoting additive can facilitate the separation or loosening of the image from the external surface of the article when the image is exposed to a liquid-based solution at an elevated temperature. Also disclosed are recyclable plastic articles having an external surface with an image printed thereon using the disclosed ink composition and methods for removing cured ink from a plastic container. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
    Type: Grant
    Filed: September 4, 2015
    Date of Patent: September 3, 2019
    Assignee: Plastipak Packaging, Inc.
    Inventors: Ronald L. Uptergrove, Jennifer L. Renner
  • Patent number: 10370789
    Abstract: We disclose a system for preparing antimicrobial surfaces, coated with metal oxide nanoparticles by means of a novel sonochemical method. These antibacterial surfaces are widely used in medical and other applications. The deposition of metal oxides known to possess antimicrobial activity, namely ZnO, MgO and CuO, can significantly extend the applications of textile fabrics, medical devices and other items and prolong the period of their use. By means of the novel sonochemical method disclosed here, uniform deposition of metal oxide nanoparticles is achieved simply.
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: August 6, 2019
    Assignee: BAR ILAN UNIVERSITY
    Inventors: Aharon Gedanken, Yeshayahu Nitzan, Ilana Perelshtein, Nina Perkas, Guy Applerot
  • Patent number: 10295907
    Abstract: A resist underlayer film-forming composition for lithography capable of being dry-etched during pattern transfer from the upper layer or during substrate processing and capable of being removed with an alkaline aqueous solution after the substrate processing. A resist underlayer film-forming composition for lithography includes a polymer (A) including a unit structure of Formula (1) and a unit structure of Formula (2); a crosslinkable compound (B) having at least two groups selected from blocked isocyanate groups, methylol group, or C1-5 alkoxy methyl groups; and a solvent (C), characterized in that the polymer (A) is a polymer in which the unit structure of Formula (1) and the unit structure of Formula (2) are copolymerized in a mol % ratio of the unit structure of Formula (1):the unit structure of Formula (2)=25 to 60:75 to 40.
    Type: Grant
    Filed: May 11, 2015
    Date of Patent: May 21, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Ryo Karasawa, Yasunobu Someya, Takafumi Endo, Tokio Nishita, Rikimaru Sakamoto
  • Patent number: 10281620
    Abstract: A mirror assembly including a viewable primary cover with a free surface, the primary cover made of optically clear molecular cross-linked material and opposite the primary cover a secondary cover made of optically opaque cell cast polymer with ultraviolet absorbing pigments, between the covers a reflective portion applied to the secondary cover.
    Type: Grant
    Filed: January 8, 2018
    Date of Patent: May 7, 2019
    Assignee: OPTIC CLEAR SOLUTIONS, LLC
    Inventors: Robert P. Helstern, Samkol Truong, Ace Chris Flores
  • Patent number: 10265895
    Abstract: The decorative sheet for three-dimensional molding includes a thin metal film layer, a surface protection layer, and a base film, at least the thin metal film layer and the surface protection layer being disposed on the base film in this order, in which the surface protection layer consists of a cured material of an ionizing radiation curable resin composition containing a polycarbonate(meth)acrylate and/or an acrylic silicone (meth)acrylate. The decorative sheet for three-dimensional molding, which has excellent moldability, provides a decorative molded article with a metallic style in excellent design and with excellent abrasion resistance.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: April 23, 2019
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Mari Takano, Nobuo Saitou
  • Patent number: 9985246
    Abstract: A cover window for a display device, including a base film; and a coating layer on the base film, the coating layer including a first region and a second region having different hardnesses, the second region having a hardness less than that of the first region, and the base film including the coating layer being slidable from the second region in a direction toward the first region and in a direction from the first region toward the second region.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: May 29, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Yong Cheol Jeong, Seung Wook Nam, Sang Wol Lee, Ah Young Kim
  • Patent number: 9969894
    Abstract: An active-energy-ray-curable composition including: a cyan pigment; and a polymerizable compound, wherein a ratio of absorbance at a wavelength of 385 nm to absorbance at a wavelength of 620 nm is 0.65 or less.
    Type: Grant
    Filed: February 12, 2016
    Date of Patent: May 15, 2018
    Assignee: Ricoh Company, Ltd.
    Inventors: Tomohiro Hirade, Tsuyoshi Asami
  • Patent number: 9957349
    Abstract: A resin composition for transparent substrates comprises an epoxy resin (A) and a curing agent (B), wherein the curing agent (B) comprises a cyclohexane tricarboxylic anhydride.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: May 1, 2018
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toyoji Oshima, Shu Yoshida, Takeru Horino, Rintaro Takahashi
  • Patent number: 9695272
    Abstract: A curable divinylarene dioxide resin composition including (a) at least one divinylarene dioxide, (b) at least one cationic photoinitiator, and (c) optionally, at least one pigment material; a process for making the curable divinylarene dioxide resin composition; and a cured divinylarene dioxide resin composition made therefrom. The cured product made from the above curable divinylarene dioxide resin composition offers improved properties and are useful for various applications including ink formulations.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: July 4, 2017
    Assignee: BLUE CUBE IP LLC
    Inventors: James Wells Carter, Maurice J. Marks, Ludovic Valette, Gyongyi Gulyas
  • Patent number: 9546306
    Abstract: The present invention provides a cationically curable resin composition for assembling hard disk devices which comprises a resin having a cationically polymerizable functional group (a component A) and a cationic polymerization initiator (a component B), the component B being at least one selected from the group consisting of X+(SbF6)?(B1), X+(B(C6F5)4)?(B2) and X+((Rf)nPF6-n)?(B3) (in the formulae, X+ is iodonium or sulfonium, Rf is a fluorinated alkyl having 1 to 6 carbon atoms, and n is an integer of 1 to 6). The invention also provides a hard disk device manufacturing method using the composition, and a hard disk device assembled with the composition.
    Type: Grant
    Filed: November 20, 2012
    Date of Patent: January 17, 2017
    Assignee: KYORITSU CHEMICAL & CO., LTD.
    Inventors: Shigeki Toyama, Yoshitomo Denpou
  • Patent number: 9334371
    Abstract: Disclosed is a composition comprising (A) at least one compound selected from the group consisting of an ether compound having two or more ether groups, a trivalent phosphorus compound, and a ketone compound, (B) a boron trihalide, and (C) an episulfide compound.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: May 10, 2016
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Akitake Nakamura, Takeshi Endo
  • Patent number: 9034939
    Abstract: The present invention relates to a primer ink comprising a polymerizable compound and a polymerization initiator, wherein the polymerizable compound comprises a monofunctional monomer having an aromatic hydrocarbon-based ring structure in a molecule and an aliphatic hydrocarbon-based monofunctional monomer, wherein a total mass of the monofunctional monomer having an aromatic hydrocarbon-based ring structure in a molecule and an aliphatic hydrocarbon-based monofunctional monomer is 80% by mass or more based on the total mass of all polymerizable compounds which the primer ink comprises, and wherein a surface tension of is 25 mN/m to 31 mN/m and a viscosity is 50 mPa·s or less.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: May 19, 2015
    Assignee: Hitachi Maxell, Ltd.
    Inventors: Katsuyuki Kito, Masaru Nakayama, Seigi Kawarai
  • Patent number: 9034941
    Abstract: The present invention relates to the use of polymeric photoinitiators based on polyalkyletherurethane backbones in the production of hydrophilic gels, in particular hydrogels. The invention relates to methods for manufacturing hydrophilic gels using said polymeric photoinitiators, and the hydrophilic gels thus obtained.
    Type: Grant
    Filed: June 22, 2011
    Date of Patent: May 19, 2015
    Assignee: Coloplast A/S
    Inventors: Christian B. Nielsen, Niels Joergen Madsen, David George Anderson, Petr Sehnal
  • Patent number: 9012415
    Abstract: This invention refers to photo-crosslinked hydrogel materials based in gellan gum suitable for tissue engineering and regenerative medicine applications or as drug delivery systems. Formulations of gellan gum with different degrees of acylation serve as precursor material for insertion of a polymerizable moiety. The materials are capable of free radical polymerization with a photo-initiator at mild temperatures and exposure to ultraviolet light, enabling control of reticulation and withstanding the encapsulation of human and animal cells and/or drugs, and any combination thereof. The physicochemical and biological properties can be adjusted by combining different formulations of gellan gum and reaction conditions.
    Type: Grant
    Filed: March 26, 2011
    Date of Patent: April 21, 2015
    Assignee: Stemmatters, Biotecnologia e Medicina Regenerativa S.A.
    Inventors: Joana Catarina Da Silva Correia, Joaquim Miguel Antunes De Oliveira, João Manuel Teixeira De Oliveira, Rui Pedro Amandi Romero De Sousa, Rui Luis Gonçalves Dos Reis
  • Publication number: 20150099818
    Abstract: A two part composition comprising a Part A and a Part B, wherein Part A comprises an oligomer having both isocyanate and acrylate moieties, and an organic peroxide capable of generating free radicals upon decomposition; and Part B comprises a polyol, and a catalyst that can decompose the organic peroxide. In one form, the two part composition of a Part A and a Part B are in admixture. By combining Part A and Part B the isocyanate moieties react with the polyol to produce a combination of a urethane acrylate oligomer, organic peroxide and the catalyst. Then in either order, the combination is exposed to sufficient actinic radiation to polymerize at least a portion of the urethane acrylate oligomer; and the catalyst decomposes the organic peroxide thus generating free radicals, which free radicals polymerize at least a portion of the urethane acrylate oligomer.
    Type: Application
    Filed: October 8, 2013
    Publication date: April 9, 2015
    Applicant: DYMAX CORPORATION
    Inventors: Marufur Rahim, Maria Fe Aton Audia
  • Patent number: 8980968
    Abstract: A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,
    Type: Grant
    Filed: February 1, 2011
    Date of Patent: March 17, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hyo Takahashi, Ken Ikegame, Masako Shimomura
  • Patent number: 8980971
    Abstract: A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: March 17, 2015
    Assignee: DSM IP Assets B.V.
    Inventors: Masahiro Ueda, Katsuyuki Takase, Takahiko Kurosawa
  • Patent number: 8968862
    Abstract: A double-sided polarizer includes a polarizing film, a first adhesive layer formed on one surface of the polarizing film, a second adhesive layer formed on the other surface of the polarizing film, a first transparent film formed on the first adhesive layer, and a second transparent film formed on the second adhesive layer, wherein the first adhesive layer and the second adhesive layer are formed of an active energy line-curable adhesive and the first adhesive layer is 0.1 ?m to 3 ?m thick, and there is also provided an optical device including the double-sided polarizer.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: March 3, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Eun-Mi Seo, Hwa-Sub Shim, Jee-Hyon Min, Nam-Jeong Lee, Kyun-Il Rah, Jun-Wuk Park, Eun-Soo Huh, Yi-Rang Lim
  • Patent number: 8952078
    Abstract: This invention relates to a printing ink and in particular to an ink for ink-jet printing which is cured by irradiation. The ink comprises at least one radiation-curable monomer; at least one passive thermoplastic resin; at least one radical photoinitiator; and at least one colouring agent; wherein the ink has a viscosity of less than 100 mPas at 25° C., and wherein the at least one passive resin is present at 2 to 15 wt % based on the total weight of the ink and has a molecular weight of 1,500 to 70,000.
    Type: Grant
    Filed: July 4, 2007
    Date of Patent: February 10, 2015
    Assignee: Sericol Limited
    Inventor: Nigel Paul Gould
  • Publication number: 20150028524
    Abstract: In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.
    Type: Application
    Filed: December 13, 2013
    Publication date: January 29, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kei Kobayashi, Seiji Morita
  • Publication number: 20150005408
    Abstract: The present invention relates to (meth)acrylated compounds (A) prepared from (a) at least one cyclic ether polyol, (b) at least one linking compound (b1) and/or (b2), wherein the linking compound (b1) is selected from cyclic compounds (b11) containing at least one (I) group in the cycle where X=O or NH, from hydroxy acids (b12) and/or from alkylene oxides (b13) containing from 2 to 4 carbon atoms and the linking compound (b2) is selected from epihalohydrins or polyisocyanates, (c) a (meth)acrylating compound; and to their use in radiation curable compositions for the coatings, inks, overprint varnishes, adhesives and composites.
    Type: Application
    Filed: March 22, 2013
    Publication date: January 1, 2015
    Inventors: Luc Lindekens, JoAnn Arceneaux, Ruben Cleymans, Ichiro Nagakawa, Fumio Tanabiki, Hideo Hibiu
  • Patent number: 8921445
    Abstract: Curable adhesive compositions are provided that exhibit a high refractive index.
    Type: Grant
    Filed: April 12, 2010
    Date of Patent: December 30, 2014
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yassin Turshani, Omar Mohamed Buazza
  • Patent number: 8916624
    Abstract: Improvedly storage stable dental compositions useful for the preparation of dental prostheses and for dental restoration containing a uniquely pretreated dental filler material.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: December 23, 2014
    Assignee: Bluestar Silicones France SAS
    Inventors: Jean-Marc Frances, Sophie Schneider
  • Patent number: 8912247
    Abstract: Improved methods for preparing polyethylene glycol fumarate) are disclosed. Methods for chemically crosslinking or photocross-linking hydrophilic polyethylene glycol fumarate) with hydrophobic polymers such as poly(propylene fumarate) (PPF) and poly(caprolactone fumarate) (PCLF) to form various hydrogels (FIG. 1) with controllable hydrophilicity are also disclosed. The hydrogels are useful in the fabrication of injectable and in-situ hardening scaffolds for application in skeletal reconstruction. An injectable material including the hydrogels may be useful in controlled drug release.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: December 16, 2014
    Assignee: Mayo Foundation for Medical Education and Research
    Inventors: Shanfeng Wang, Lichun Lu, Michael J. Yaszemski
  • Publication number: 20140327719
    Abstract: A photopolymerizable inkjet ink including: at least one selected from the group consisting of (meth)acrylic acid esters negative for skin sensitization and (meth)acrylamides negative for skin sensitization; and at least one selected from the group consisting of vinyl ethers negative for skin sensitization, t-butyl methacrylate negative for skin sensitization, n-pentyl methacrylate negative for skin sensitization, and n-hexyl methacrylate negative for skin sensitization.
    Type: Application
    Filed: May 10, 2012
    Publication date: November 6, 2014
    Inventor: Takao Hiraoka
  • Patent number: 8841064
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a dissolution controlling agent including the compound represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, and a photosensitive resin film prepared by using the same.
    Type: Grant
    Filed: November 11, 2011
    Date of Patent: September 23, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Myoung-Hwan Cha, Jong-Hwa Lee, Mi-Ra Im, Min-Kook Chung, Ji-Young Jeong, Hyun-Yong Cho, Hwan-Sung Cheon
  • Patent number: 8835530
    Abstract: A glass printing ink and glass printing lacquer are prepared, which contain at least one photoinitiator, at least one resin and at least one additional substance. The resin is an epoxy resin based on bisphenol A, diluted in a UV-curing monomer, or a resin with functional groups containing free functional amino, hydroxy, epoxy, acid, acid anhydride and/or acrylate groups, or a combination of the epoxy resin with the resin with functional groups. The at least one additional substance is a wax. The use of the glass printing ink and glass printing lacquer in printing a glass substrate and processes for the printing of a glass substrate are also described.
    Type: Grant
    Filed: January 4, 2007
    Date of Patent: September 16, 2014
    Assignee: Marabu GmbH & Co., KG
    Inventors: Wolfgang Schaefer, Dimitrios Triantafillidis
  • Patent number: 8828500
    Abstract: A photocurable resin composition for sealing an organic EL device is provided, which can seal the organic EL device without exerting any bad influence on the device, thereby suppress the formation and growth of dark spots positively, and which can ensure a high transmittance of light, thereby maintain a stable light emitting characteristic over a long period of time. The composition comprises (A) an epoxy resin containing at least two glycidyl groups in each molecule thereof and having a molecular weight of 200 to 7000, (B) an epoxy resin containing at least one glycidyl group in each molecule thereof and having a molecular weight of 20000 to 100000, (C) a latent acid photo catalyst adapted to be activated and produce an acid upon being irradiated with energy beam, and (D) a silane coupling agent containing a glycidyl group in each molecule thereof, the composition exhibiting non-fluidity at 25° C., but exhibiting fluidity in a temperature range of 50° to 100° C.
    Type: Grant
    Filed: November 6, 2009
    Date of Patent: September 9, 2014
    Assignee: Three Bond Co., Ltd.
    Inventors: Yoshihide Arai, Hiromasa Kitazawa, Kenichi Horie
  • Patent number: 8809412
    Abstract: The present invention relates to the use of oligomeric siloxane components in radiation-curable formulations which in the cured state offer a particular degree of corrosion control for metallic substrates.
    Type: Grant
    Filed: June 4, 2008
    Date of Patent: August 19, 2014
    Assignee: Evonik Degussa GmbH
    Inventors: Emmanouil Spyrou, Rene Koschabek, Burkhard Standke
  • Patent number: 8785515
    Abstract: Polycyclic aromatic compounds of formula (I) having at least two conjugated aromatic rings at least one of which has a substituent comprising a cyclic carbonate group can be used as sensitizers for cationic photoinitiators, especially iodonium compounds, and may also function as monomers in cationically initiated radiation curable compositions, especially coating compositions, such as printing inks and varnishes.
    Type: Grant
    Filed: May 9, 2008
    Date of Patent: July 22, 2014
    Assignee: Sun Chemical Corporation
    Inventors: Shaun Lawrence Herlihy, Robert Stephen Davidson
  • Patent number: 8735462
    Abstract: Provided is a radical-polymerizable resin capable of giving a cured material which is satisfactorily flexible, can relax stress upon usage as an adhesive, and does not cause disadvantages such as separation at the adhesive interface or breakage of an adherend, which stress occurs between the adhesive and the adherend upon heating or cooling and is caused by difference in coefficient of thermal expansion between them. The radical-polymerizable resin is obtained through cationic polymerization of a compound represented by any of following Formulae (1a) and (1b) and a compound represented by any of following Formulae (2a), (2b), (2c), (2d), (2e), and (2f). The radical-polymerizable resin is liquid at 0 ° C. and has a weight-average molecular weight of 500 or more. Symbols in the formulae are as defined in the description.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: May 27, 2014
    Assignee: Daicel Corporation
    Inventors: Tomoaki Mahiko, Yoshinori Funaki, Kiyoharu Tsutsumi, Naoko Araki
  • Patent number: 8722758
    Abstract: The present invention relates to a novel water soluble polyimide resin, which contains a hydrophilic functional group such as —OH, —COOH to increase the solubility of the polyimide resin in alkali aqueous solution, and is suitable for using as an insulation film in electronic and photoelectric products. The present invention also relates to preparation and use of the above polyimide.
    Type: Grant
    Filed: January 12, 2011
    Date of Patent: May 13, 2014
    Assignee: Chang Chun Plastics Co., Ltd.
    Inventors: Kuen Yuan Hwang, An Pang Tu, Sheng Yen Wu, Gai Chi Chen, Ching Jui Huang, Jen Fu Wang
  • Publication number: 20140121293
    Abstract: Disclosed is a composition comprising (A) at least one compound selected from the group consisting of an ether compound having two or more ether groups, a trivalent phosphorus compound, and a ketone compound, (B) a boron trihalide, and (C) an episulfide compound.
    Type: Application
    Filed: July 18, 2012
    Publication date: May 1, 2014
    Applicant: ASAHI KASEI CHEMICALS CORPORATION
    Inventors: Akitake Nakamura, Takeshi Endo
  • Patent number: 8642675
    Abstract: An actinic ray curable composition comprising a photo-polymerizable compound and a photo-polymerization initiator, wherein the photo-polymerizable compound is a cationic polymerizable compound and a terminal polyether-modified silicone surfactant is further incorporated in the actinic ray curable composition.
    Type: Grant
    Filed: April 23, 2007
    Date of Patent: February 4, 2014
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Nobumasa Sasa
  • Publication number: 20130299805
    Abstract: The invention provides a photopolymerisable or photocrosslinkable reactive mesogen for forming a charge transporting or light emitting polymer network, the mesogen having an asymmetric structure (II): B1—S1-A1-M-(A-S—B)n (II) wherein: A and A1 are chromophores; S and S1 are spacers; B and B1 are endgroups which are susceptible to photopolymerisation or photocrosslinking; M is a non-chromophoric aliphatic, alicyclic or aromatic moiety; and n is an integer from 1 to 3; wherein, when the value of n is greater than 1, each of the groups A, S and B may be the same or different. Preferably, M is of the formula Y—Zm, wherein Y is an aliphatic, alicyclic, aromatic or heterocyclic moiety, Z is an aliphatic linking group and m is an integer from 2 to 4, and wherein each of the Z groups may be the same or different.
    Type: Application
    Filed: January 20, 2012
    Publication date: November 14, 2013
    Applicant: University of Hull
    Inventors: Mary O'Neill, Stuart Paul Kitney
  • Publication number: 20130296452
    Abstract: Monomers and polymers used in making spectacle lenses are disclosed. A thermal curing process is disclosed that includes a latent thermal cationic acid generator and optionally a cationic photoinitiator.
    Type: Application
    Filed: July 10, 2013
    Publication date: November 7, 2013
    Inventors: Jagdish JETHMALANI, Gomaa ABDEL-SADEK, Jeffrey CHOMYN, Erdem CETIN, Lawrence H. SVERDRUP, Shawn MCCARTY, Junhao GE
  • Publication number: 20130289156
    Abstract: An object of the present invention is to provide a method for producing polyamide acid particles which is used as a raw material for polyimide particles with a small average particle diameter having high heat resistance. Other objects of the present invention are to provide a method for producing polyimide particles using the method for producing polyamide acid particles, and polyimide particles produced by the method for producing polyimide particles. Yet another object of the present invention is to provide a bonding material for an electronic component, which has a low linear expansion coefficient and a low elastic modulus after being cured in the temperature range equal to or less than the glass transition temperature, so that a joined body with high reliability can be produced.
    Type: Application
    Filed: December 14, 2011
    Publication date: October 31, 2013
    Inventor: Satoshi Hayashi
  • Patent number: 8569398
    Abstract: A fully curable jettable composition having a viscosity less than 30 cps at a temperature within the range of 15° C.-180° C. comprising (i) at least one low viscosity reactive resin; (ii) at least one higher viscosity resin having a viscosity greater than twice that of the low viscosity resin and a functionality of greater than or equal to 2; (iii) at least one curable toughener, (iv) at least one initiator for the polymerization of the resins, and (v) at least one stabilizer for delaying the curing of the resins of the composition. The composition can be jetted from piezo electric printing heads under the control of a computer program to form a multi-layered article, for example, a three dimensional article, in which the adjacent droplets merge and are cured homogeneously together.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: October 29, 2013
    Assignee: 3D Systems, Inc.
    Inventors: Ranjana C. Patel, Yong Zhao, Richard John Peace
  • Patent number: 8557891
    Abstract: The present invention relates to a photocurable resin composition including an epoxy resin, an oxetane compound and a photopolymerization initiator, in which the epoxy resin includes the following ingredients (A) and (B) in combination, and the oxetane compound includes the following ingredient (C): (A) an epoxy resin having at least two epoxy groups in one molecule thereof and being liquid at 60° C. or higher; (B) a solid epoxy resin having at least two epoxy groups in one molecule thereof and having a refractive index of 1.6 or more by itself; and (C) an oxetane compound represented by the following general formula (1) in which n is an integer of 1 to 6.
    Type: Grant
    Filed: July 11, 2011
    Date of Patent: October 15, 2013
    Assignee: Nitto Denko Corporation
    Inventors: Yukiko Higo, Hiroshi Noro
  • Publication number: 20130267627
    Abstract: The present invention relates to a primer ink comprising a polymerizable compound and a polymerization initiator, wherein the polymerizable compound comprises a monofunctional monomer having an aromatic hydrocarbon-based ring structure in a molecule and an aliphatic hydrocarbon-based monofunctional monomer, wherein a total mass of the monofunctional monomer having an aromatic hydrocarbon-based ring structure in a molecule and an aliphatic hydrocarbon-based monofunctional monomer is 80% by mass or more based on the total mass of all polymerizable compounds which the primer ink comprises, and wherein a surface tension of is 25 mN/m to 31 mN/m and a viscosity is 50 mPa·s or less.
    Type: Application
    Filed: December 16, 2011
    Publication date: October 10, 2013
    Applicant: HITACHI MAXELL, LTD.
    Inventors: Katsuyuki Kito, Masaru Nakayama, Seigi Kawarai
  • Patent number: 8530539
    Abstract: Disclosed is a photocurable resin composition for nanoimprint, containing a curable monomer component with or without a binder resin. The composition further contains 0.001 to 5 parts by weight of a compound having a reactive functional group and a hydrophobic functional group in the same molecular skeleton, per 100 parts by weight of the total amount of the curable monomer component and binder resin. Preferably, the reactive functional group is at least one functional group selected from the group consisting of hydroxyl groups, epoxy groups, vinyl ether groups, oxetanyl groups, alkoxysilane groups, and free-radically polymerizable vinyl groups, and the hydrophobic functional group is at least one functional group selected from the group consisting of fluorine-containing groups, alkylsilane groups, alicyclic hydrocarbon groups, and aliphatic hydrocarbon groups having 4 or more carbon atoms.
    Type: Grant
    Filed: January 8, 2009
    Date of Patent: September 10, 2013
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Hiroto Miyake, Shuso Iyoshi
  • Publication number: 20130118671
    Abstract: Adhesive composition according to the present invention includes an adhesive base agent consisting of a monomer and a polymerization initiator. Adhesion of the adhesive composition changes to take local maximum value, minimum value and a value greater than the local maximum value along with increase of irradiation amount of the electromagnetic wave or particle beam irradiated to the adhesive composition under a predetermined temperature environment. In a method for manufacturing a laminate according to the present invention allows for easy peeling of adherends and a layer of the adhesive composition when adhesion of the adhesive composition takes the minimum value.
    Type: Application
    Filed: April 28, 2011
    Publication date: May 16, 2013
    Applicant: NITTO DENKO CORPORATION
    Inventors: Kentarou Takeda, Miki Okamoto, Takuya Mori, Tatsuki Nagatsuka
  • Publication number: 20130114026
    Abstract: An adhesive composition which allows for preventing misalignment when mutually laminating adherends, mutually strongly bonding the adherends when correction of lamination is not required, as well as peeling the adherends without causing any damage thereto when correction of lamination is required. The adhesive composition includes an adhesive base agent consisting of a monomer and a polymerization initiator. Adhesive strength of the adhesive composition changes to take a local maximum value, a local minimum value and a value greater than the local maximum value along with increase of irradiation amount of the electromagnetic wave or particle beam irradiated to the adhesive composition under a predetermined temperature environment.
    Type: Application
    Filed: April 30, 2010
    Publication date: May 9, 2013
    Applicant: NITTO DENKO CORPORATION
    Inventors: Miki Okamoto, Takuya Mori, Kentarou Takeda, Tatsuki Nagatsuka
  • Patent number: 8436069
    Abstract: The present invention provides an ink composition containing: a radical polymerizable compound; a photopolymerization initiator, and a chain transfer agent; and the radical polymerizable compound includes a monofunctional monomer at a ratio of 85% by weight or more in the total weight of the radical polymerizable compound.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: May 7, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Kazuhiro Yokoi
  • Patent number: 8436066
    Abstract: Compositions that can be polymerized and/or crosslinked into coatings by cationic and/or radical irradiation contain at least one photoinitiator and at least one compound having at least one isocyanate function.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: May 7, 2013
    Assignee: Vencorex France
    Inventors: Jean-Marc Frances, Philippe Barbeau, Jean-Marie Bernard, Damien Bourgeois
  • Patent number: 8431656
    Abstract: Disclosed herein is a curable cyclic phosphazene compound having a low dielectric constant, a low dielectric loss index and high thermal stability, and a method of preparing the same. The curable cyclic phosphozene polymer prepared using the compound has a low dielectric constant and excellent thermal properties, compared to conventional phosphozene polymers.
    Type: Grant
    Filed: July 29, 2009
    Date of Patent: April 30, 2013
    Assignees: Samsung Electro-Mechanics Co. Ltd., SNU R&DB Foundation
    Inventors: Jae Choon Cho, Do Yeung Yoon, Ji Young Chang, Ho Lim, Hwa Young Lee
  • Publication number: 20130096225
    Abstract: An inkjet printing method includes the steps of a) providing a white inkjet ink and at least one colour inkjet ink to an inkjet printer; and b) jetting the white inkjet ink at a higher temperature than the colour inkjet ink onto an ink-receiver. The difference in jetting temperature between the white inkjet ink and the colour inkjet ink is at least 5° C. Inkjet ink sets and inkjet printers are also disclosed.
    Type: Application
    Filed: December 7, 2012
    Publication date: April 18, 2013
    Applicant: AGFA GRAPHICS NV
    Inventor: AGFA GRAPHICS NV
  • Patent number: 8420296
    Abstract: Disclosed is a photosensitive resin composition for a color filter protective layer including a cross-linkable alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, a reactive unsaturated compound, a photopolymerization initiator, and a solvent. In Chemical Formulae 1 to 3, R1 to R6 and A1 to A3 are the same as in the detailed description.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: April 16, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Jae-Hyun Kim, Se-Young Choi, Nam-Gwang Kim, Eui-June Jeong, Chang-Min Lee
  • Publication number: 20130089582
    Abstract: The present invention relates to the use of polymeric photoinitiators based on polyalkyletherurethane backbones in the production of hydrophilic gels, in particular hydrogels. The invention relates to methods for manufacturing hydrophilic gels using said polymeric photoinitiators, and the hydrophilic gels thus obtained.
    Type: Application
    Filed: June 22, 2011
    Publication date: April 11, 2013
    Applicant: Coloplast A/S
    Inventors: Christian B. Nielsen, Niels Joergen Madsen
  • Patent number: 8383695
    Abstract: The present invention relates to a phenoxy resin for an optical material obtained by subjecting at least one selected from specific difunctional epoxy resins and at least one selected from specific difunctional phenols to polyaddition reaction, wherein a film comprising the above phenoxy resin has a refractive index of 1.580 or less at 25° C. and a wavelength of 830 nm, a resin composition for an optical material containing the above phenoxy resin, a resin film for an optical material comprising the above resin composition and an optical waveguide produced by using the above resin composition and/or the above resin film.
    Type: Grant
    Filed: March 15, 2007
    Date of Patent: February 26, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Tatsuya Makino, Atsushi Takahashi, Toshihiko Takasaki, Tomoaki Shibata, Masami Ochiai