Processes Of Preparing A Solid Polymer From Ethylenic Reactants Only; Or Compositions Therefore Patents (Class 522/184)
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Patent number: 8748502Abstract: Disclosed is a photocurable resin composition which comprises a photopolymerization initiator having two oxime ester groups in the molecule, a resin containing a carboxyl group, and a compound having two or more ethylenically unsaturated groups in the molecule. The composition can achieve high sensitivity, can provide a dried coating film having excellent touch dryness of fingers, can prevent the generation of an out gas during curing or the like, and can achieve all of excellent alignment accuracy, high productivity and high reliability in the formation of a solder resist for a printed wiring board or the like.Type: GrantFiled: July 14, 2010Date of Patent: June 10, 2014Assignee: Taiyo Holdings Co., Ltd.Inventors: Yoko Shibasaki, Masao Arima
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Patent number: 8748504Abstract: The present invention relates to the development and fabrication of thin-film polymer nanocomposites containing vertically aligned nanomaterials, such as single-walled carbon nanotubes (SWNTs). In certain embodiments, the present invention utilizes liquid crystal mesophases of hexagonally packed cylindrical micelles that orient with their long axes parallel to an applied magnetic field, thereby directing the alignment of the nanomaterials, such as SWNTs, sequestered in the micellar cores. In certain embodiments, the mesophase may be a stable, single-phase material containing monomers that can be polymerized after nanotube alignment to form the nanocomposite polymer.Type: GrantFiled: October 11, 2012Date of Patent: June 10, 2014Assignee: Yale UniversityInventors: Menachem Elimelech, Chinedum Osuji, Meagan Mauter
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Patent number: 8748505Abstract: To provide a curable resin composition for forming a seal part, which is capable of easily forming a continuous seal part and which is capable of maintaining the shape of the seal part during a period of from immediately after the formation of an uncured seal part until a liquid material is supplied to a region enclosed by the seal part and the seal part is cured, and a laminate which has minimal defects and whereby a resin layer interposed between first and second plates can be made thick. One having a viscosity of from 500 to 3,000 Pa·s at 25° C. is used as the curable resin composition for forming a seal part to form an uncured seal part 12 enclosing the periphery of a liquid material (curable resin composition 14 for forming a resin layer) interposed between a first plate (display device 50) and a second plate (transparent plate 10).Type: GrantFiled: July 24, 2013Date of Patent: June 10, 2014Assignee: Asahi Glass Company, LimitedInventors: Satoshi Niiyama, Hiroshige Ito, Naoko Aoki, Yoshinobu Kadowaki, Yukio Tsuge
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Patent number: 8748503Abstract: Macro-photoinitiators having defined polymer chain structure are provided. The macro-photoinitiators are terminated with residues of thiol and/or hydroxyl functional photoinitiators. The macro-photoinitiators may be prepared by controlled radical polymerization methods, such as atom transfer radical polymerization and single electron transfer polymerization methods. Also provided are curable (e.g., photocurable) compositions that include the macro-photoinitiators of the present invention.Type: GrantFiled: September 21, 2012Date of Patent: June 10, 2014Assignee: Henkel US IP LLCInventors: John G. Woods, Roderick Coffey, Anthony F. Jacobine
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Patent number: 8722755Abstract: The invention relates to a photosensitive resin composition, and an overcoat and/or spacer for a liquid crystal display component formed thereby has good heat-resistant transmittance, good chemical resistance and good elastic recovery rate. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and a liquid crystal display component.Type: GrantFiled: February 28, 2013Date of Patent: May 13, 2014Assignee: Chi Mei CorporationInventors: Yu-Jie Tsai, Ming-Ju Wu
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Patent number: 8686060Abstract: The present invention is directed to an adhesive composition comprising a crosslinkable acrylic copolymer, a multi-functionalized crosslinkable oligomer and a photoinitiator wherein the partially cured composition exhibits excellent wet out characteristics as reflected in a tan delta value of at least 0.4, preferably greater than 0.5, more preferable greater than 0.6 as measured at 20° C. resulting from a first curing stage, and the fully cured composition exhibits an improved stiffness and temperature resistance as reflected in a storage elastic modulus of at least 175,000 Pa at 20° C. and a shear adhesion failure temperature of at least 425° F. (218.3° C.) at 1 Kg/in2 (0.155 Kg/cm2), respectively, which result from a second sequential curing stage.Type: GrantFiled: July 11, 2012Date of Patent: April 1, 2014Assignee: Morgan Adhesives CompanyInventors: Timothy Michael Smith, Gary Allan McMaster
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Patent number: 8669298Abstract: A lightfast green radiation curable ink including at least one curable monomer, at least one organic gellant, at least one photoinitiator and at least one colorant, where the colorant exhibits a reflectance on a substrate at a loading of from about 2 mg/inch2 to about 7 mg/inch2 that ranges from 50% to about 60% at a wavelength of 500 nm and that ranges from 0% to about 10% at a wavelength of about 600 nm which substantially matches Pantone green.Type: GrantFiled: December 18, 2012Date of Patent: March 11, 2014Assignee: Xerox CorporationInventors: Daryl W Vanbesien, Barkev Keoshkerian, Naveen Chopra, Michelle N Chretien, Jenny Eliyahu, Nathan M Bamsey
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Patent number: 8664289Abstract: The present invention provides a dye that is excellent in solubility and excellent in heat resistance and a novel compound that is preferable for the dye, and specifically provides a yellow dye having a wavelength of maximum absorption in the region of 400 to 450 nm, and also provides a coloring (alkali-developable) photosensitive composition using the above-mentioned dye, and an optical filter using the above-mentioned coloring (alkali-developable) photosensitive composition, specifically a color filter that does not decrease luminance and thus is preferable for image display devices such as liquid crystal display panels. Specifically, a compound represented by the following general formula (1) is used as the dye. The content of the above-mentioned general formula (1) is as described in the description.Type: GrantFiled: September 8, 2011Date of Patent: March 4, 2014Assignee: Adeka CorporationInventors: Yosuke Maeda, Masaaki Shimizu, Keisuke Matsuhira
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Patent number: 8664287Abstract: Photocuring methods are made more efficient by using an N-oxyazinium salt photoinitiator with an organic phosphine as a photoinitiator efficiency amplifier. This photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment. The method can be used to prepare various articles, fibers, or devices with photocured compositions.Type: GrantFiled: May 16, 2011Date of Patent: March 4, 2014Assignee: Eastman Kodah CompanyInventor: Deepak Shukla
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Patent number: 8653153Abstract: A violet radiation curable ink including at least one curable monomer, at least one organic gellant, at least one photoinitiator, and at least one colorant, wherein the ink exhibits a reflectance on a substrate at a loading of from about 2 mg/inch2 to about 7 mg/inch2 that ranges from 50% to about 60% at a wavelength of 500 nm and that ranges from 0% to about 10% at a wavelength of about 600 nm. Also, the violet ink substantially matches PANTONE® Violet.Type: GrantFiled: December 18, 2012Date of Patent: February 18, 2014Assignee: Xerox CorporationInventors: Daryl W Vanbesien, Barkev Keoshkerian, Naveen Chopra, Michelle N Chretien, Jenny Eliyahu, Nathan M Bamsey
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Patent number: 8642671Abstract: An interpenetrating polymer network includes CH2—CH2—On segments, and is formed by polymerizing a first monomer R1—OCH2—CH2—OnR2 with a second monomer R3—OCH2—CH2—OmR4 under an initiator. Each “R1”, “R2” and “R3” includes —C?C— group or —C?C— group. The “R4” includes an alkyl group or a hydrogen atom. The “m” and “n” are integer. Molecular weights of the first monomer and the second monomer are more than or equal to 100, and less than or equal to 800. The first monomer is less than or equal to 50% of the second monomer by weight. A method for making the interpenetrating polymer network is also provided.Type: GrantFiled: October 17, 2012Date of Patent: February 4, 2014Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.Inventors: Li Wang, Xiang-Ming He, Jian-Jun Li, Jian Gao, Chang-Yin Jiang
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Patent number: 8637586Abstract: A coating composition includes a UV curable film forming resin; a thixotropic and/or pseudoplastic anti-settling agent selected from at least one of an amine salt of a synthetic wax, a microcrystalline cellulose compound (MCC), a urea urethane, or a urethane enzymatically modified starch; a mar/scratch resistant additive selected from at least one of a mineral abrasive, glass particles, and ceramic particles; and water.Type: GrantFiled: December 21, 2012Date of Patent: January 28, 2014Assignee: Valspar Sourcing, Inc.Inventor: James Madison Bohannon
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Patent number: 8617796Abstract: Disclosed is a photosensitive resin composition for a color filter that includes (A) an organic salt-type sulfonate-containing dye; (B) a pigment; (C) an acrylic-based binder resin; (D) a photopolymerizable monomer; (E) a photopolymerization initiator; and (F) a solvent.Type: GrantFiled: July 7, 2011Date of Patent: December 31, 2013Assignee: Cheil Industries Inc.Inventors: In-Jae Lee, Ji-Yun Kwon, Ju-Ho Jung, Dong-Won Song, Han-Chul Hwang, Jae-Hyun Kim, Gyu-Seok Han
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Patent number: 8604251Abstract: The invention pertains to novel oligofunctional photoinitiators of the formula (1) or (1A). R1 and R2 are methyl or together are —(CH2)5—; and n is 2 or 3, and the solvent in (1A) is water or an organic solvent; and their use in photopolymerizable compositions, in particular inks.Type: GrantFiled: March 19, 2010Date of Patent: December 10, 2013Assignee: BASF SEInventors: Ulrich Berens, Jean-Luc Birbaum, Katia Studer
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Patent number: 8552084Abstract: A process for preparing a pressure sensitive adhesive using a modified planetary roller extruder is described. The process in accordance with one aspect of the invention is a continuous process that includes introducing primary raw materials comprising a non-thermoplastic elastomer into a planetary roller extruder, introducing a heat-activatable crosslinker into the planetary roller extruder for mixing with the primary raw materials, and compounding the primary raw materials and the heat activatable crosslinker to form an adhesive composition while maintaining the temperature of the adhesive composition between about 25° C. and about 100° C. The non-thermoplastic elastomer is masticated during compounding and at least some of the heat-activatable crosslinker remains generally unactivated and is available for later activation.Type: GrantFiled: December 27, 2011Date of Patent: October 8, 2013Assignee: Intertape Polymer Corp.Inventors: John Kinch Tynan, Jr., Richard Walter St. Coeur, David Michael Kovach, Thomas Lombardo
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Patent number: 8536246Abstract: The present invention provides an inkjet ink composition including color material particles, a water soluble polymerizable compound, a water soluble silicate salt and water, which is excellent in ejection stability even in a case in which the ink composition is stopped from ejecting in the inkjet recording device and left alone for a certain period of time, and ejection of the ink composition is resumed thereafter, which has a good maintenance property, and in which abrasion resistance of images formed with the ink composition is excellent; an ink set including the inkjet ink composition; and an image forming method using the ink set.Type: GrantFiled: December 20, 2010Date of Patent: September 17, 2013Assignee: FUJIFILM CorporationInventors: Jun Matsumoto, Masao Ikoshi
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Patent number: 8530057Abstract: The present invention relates to methods for making oxidation resistant medical devices that comprise polymeric materials, for example, ultra-high molecular weight polyethylene (UHMWPE). The invention also provides methods of making antioxidant-doped medical implants, for example, doping of medical devices containing cross-linked UHMWPE with vitamin E by diffusion and materials used therein.Type: GrantFiled: May 12, 2009Date of Patent: September 10, 2013Assignees: The General Hospital Corporation, Cambridge Polymer Group, Inc.Inventors: Orhun K. Muratoglu, Stephen H. Spiegelberg
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Publication number: 20130209694Abstract: A block copolymer composition containing a diblock copolymer blend including a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer; and, a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer. Also provided are substrates treated with the block copolymer composition.Type: ApplicationFiled: February 10, 2012Publication date: August 15, 2013Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Shih-Wei Chang, Valeriy V. Ginzburg, Erin B. Vogel, Daniel J. Murray, Peter Trefonas, Phillip D. Hustad
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Patent number: 8507583Abstract: An actinic energy radiation curable ink-jet ink comprising an actinic energy radiation polymerizable compound, wherein the actinic energy radiation polymerizable compound comprises a vinyl ether compound, a total content of the vinyl ether compound is 30% or more by mass, the vinyl ether compound comprises a bis-vinyl ether compound and a multifunctional vinyl compound having three or more vinyl ether groups, 10 to 70% by mass of the ink is the bis-vinyl ether compound, and 5 to 70% by mass of the ink is the multifunctional vinyl compound having three or more vinyl ether groups.Type: GrantFiled: March 9, 2010Date of Patent: August 13, 2013Assignee: Konica Minolta IJ Technologies, Inc.Inventors: Atsushi Nakajima, Masaki Nakamura
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Patent number: 8404797Abstract: An end-modified soluble polyfunctional vinyl aromatic copolymer, which is improved in heat resistance, thermal stability, solvent solubility, and compatibility with acrylate compounds, and a curable resin composition using the same are disclosed. The end-modified soluble polyfunctional vinyl aromatic copolymer is obtained by allowing a divinyl aromatic compound (a), a monovinyl aromatic compound (b), and an aromatic ether compound (c) to react with each other, and has, at an end, an end group derived from the aromatic ether compound and having an acrylate bond. The copolymer has a number average molecular weight Mn of 500 to 100,000, an introduction amount (c1) of the end group derived from the aromatic ether compound satisfies (c1)?1.0 (group/molecule), a molar fraction a? of a structural unit derived from the divinyl aromatic compound and a molar fraction b? of a structural unit derived from the monovinyl aromatic compound in the copolymer satisfy 0.05?a?/(a?+b?)?0.95.Type: GrantFiled: March 3, 2009Date of Patent: March 26, 2013Assignee: Nippon Steel Chemical Co., Ltd.Inventors: Masanao Kawabe, Hiroko Terao, Natsuko Okazaki
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Patent number: 8399541Abstract: Disclosed is an active energy ray-curable ink composition comprising a coloring agent, a binder resin, and a radically polymerizable varnish and/or a radically polymerizable monomer as main components. The coloring agent is a modified pigment wherein the surface of a pigment (A) is provided with a polymer (P) which is obtained by polymerizing a polymer (B), which is soluble in nonaqueous solvents, with at least one polymerizable unsaturated monomer (C), which is originally soluble in nonaqueous solvents but becomes insoluble or poorly soluble after polymerization. Also disclosed is a printed matter which has a coating film obtained by curing and drying the active energy ray-curable ink composition.Type: GrantFiled: March 18, 2009Date of Patent: March 19, 2013Assignee: DIC CorporationInventors: Yukie Suwa, Hiroshi Kinoshita, Tatsushi Okuda, Sei Yamamoto
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Patent number: 8389596Abstract: UV-cured pressure sensitive adhesive including one or more UV-curable acrylic oligomers, one or more tack control components, and, optionally, an elastomeric material is described herein. The adhesive includes an adhesive component ratio of the various adhesive components effective to provide desired first peel adhesions and subsequent peel adhesions.Type: GrantFiled: February 25, 2011Date of Patent: March 5, 2013Assignee: Kraft Foods Global Brands LLCInventors: Jeffrey James Boyce, Michael Clingerman, Colleen Marie Henry, David Chris Masterson, Vincent Daniel McGinniss
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Patent number: 8378002Abstract: The present invention provides an aqueous ink composition including at least a sensitizing dye represented by the following Formula (i), an ethylenically unsaturated bond-containing water-soluble polymerizable compound, a polymerization initiator and water: wherein, in Formula (i), X represents O, S or NR; n represents an integer of 0 or 1; R represents a hydrogen atom, an alkyl group or an acyl group; each of R1, R2, R3, R4, R5, R6, R7 and R8 independently represents a hydrogen atom or a monovalent substituent, provided that any neighboring two of R1, R2, R3 and R4 may be bonded to each other to form a ring, and R5 and R7 or R8, or R6 and R7 or R8, may be bonded to each other to form an aliphatic ring but do not form an aromatic ring.Type: GrantFiled: July 8, 2009Date of Patent: February 19, 2013Assignee: FUJIFILM CorporationInventor: Hirokazu Kyota
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Patent number: 8367744Abstract: Disclosed is a sealant composition for a liquid crystal display device, the sealant composition including a (meta) acrylate compound as expressed in Chemical Formula 1 belowType: GrantFiled: May 27, 2010Date of Patent: February 5, 2013Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Ki In Son, Joo Hyun Park, Gyu Won Cho
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Patent number: 8293809Abstract: An object of the present invention is to provide a novel cationic photopolymerization initiator that efficiently absorbs light and generates protons. As a means of achieving the object above, a preferred cationic photopolymerization initiator of the present invention includes an initiator comprising a bismuthonium salt represented by the following general formula (II): Wherein R11, R12, and R13 may be the same or different and are each an optionally substituted monocyclic aryl group or an optionally substituted monocyclic heteroaryl group, R14 is an optionally substituted fused polycyclic aromatic group or an optionally substituted fused polycyclic heterocyclic group, and X? is an anion associated with a cation.Type: GrantFiled: December 11, 2008Date of Patent: October 23, 2012Assignee: Kyoto UniversityInventors: Yoshihiro Matano, Hiroshi Imahori
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Patent number: 8268272Abstract: A method for removing vinyl monomers from a gas stream comprises steps of: irradiating a photoactive-inorganic medium by a light emitting unit to activate the photoactive-inorganic medium; and pumping a gas stream including vinyl monomers to contact with the activated photoactive-inorganic medium to make the vinyl monomers in the gas stream to polymerize on the photoactive-inorganic medium to jointly form a polymeric nano-composite.Type: GrantFiled: October 18, 2011Date of Patent: September 18, 2012Assignee: National Pingtung University Of Science & TechnologyInventors: Wu-Jang Huang, Ling-Yin Chang, Yen-Chia Liu, Hsiu-Hsien Wu, Yi-Ching Li
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Patent number: 8262210Abstract: This disclosure is generally directed to curable gel inks, such as radiation-curable phase-change inks, and their use in forming images, such as through inkjet printing. More specifically, this disclosure is directed to radiation-curable gel inks, such as ultraviolet-light-curable phase-change inks, that comprise a curable gellant and a curable solid.Type: GrantFiled: September 29, 2009Date of Patent: September 11, 2012Assignee: Xerox CorporationInventors: Michelle N. Chretien, Nicole Elizabeth Weckman, Barkev Keoshkerian, Naveen Chopra
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Photocurable composition and process for producing molded product having fine pattern on its surface
Patent number: 8258201Abstract: To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. The photocurable composition comprising from 61 to 90 mass % of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass % of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that compound (A) is excluded), from 5 to 35 mass % of a compound (C) having one (meth)acryloyloxy group (provided that compound (B) is excluded), and from 1 to 12 mass % of a photopolymerization initiator (D) (provided (A)+(B)+(C)+(D)=100 mass %).Type: GrantFiled: September 23, 2010Date of Patent: September 4, 2012Assignee: Asahi Glass Company, LimitedInventor: Yasuhide Kawaguchi -
Patent number: 8163813Abstract: To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface. A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.Type: GrantFiled: August 17, 2009Date of Patent: April 24, 2012Assignee: Asahi Glass Company, LimitedInventors: Yasuhide Kawaguchi, Kentaro Tsunozaki
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Patent number: 8153744Abstract: There is provided a novel hyperbranched polymer in which the refractive index is precisely controlled while retaining its hyperbranched structure, and a method for producing the hyperbranched polymer. Further, there is also provided an optically and thermally stable novel hyperbranched polymer in which the desired refractive index is precisely controlled, and a method for producing the hyperbranched polymer. The hyperbranched polymer has, as a branched structure, a repeating unit structure produced from two dithiocarbamate compounds each having a vinyl structure, at the polymerization initiation site having a vinyl structure. A specific example of the hyperbranched polymer can be produced by subjecting to a living radical polymerization N,N-diethyldithiocarbamylmethylstyrene in the presence of N,N-diethyldithiocarbamylethyl methacrylate.Type: GrantFiled: September 4, 2007Date of Patent: April 10, 2012Assignees: Nissan Chemical Industries, Ltd., Tokyo Institute of TechnologyInventors: Hiroki Takemoto, Masaaki Ozawa, Koji Ishizu
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Patent number: 8129441Abstract: The present invention relates to radiation-curable coating compositions which are of low viscosity and comprise (meth)acrylates and divinyl adipate.Type: GrantFiled: November 8, 2007Date of Patent: March 6, 2012Assignee: BASF AktiengesellschaftInventors: Oscar Lafuente Cerda, Yvonne Heischkel, Michael Vetter, Reinhold Schwalm, Nick Gruber
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Publication number: 20120043640Abstract: There is disclosed a method for producing a highly cross-linked polypropylene material by plasma polymerisation of a carbon containing gas, not specifically propylene, exhibiting low relative permittivity, high thermal stability and enhanced mechanical properties, said method and material being suitable for application not limited to interlayer dielectric deposition in microchip fabrication.Type: ApplicationFiled: April 16, 2010Publication date: February 23, 2012Inventors: Sembukuttiarachilage Ravi Pradip Silva, José Virgilio Anguita Rodriguez Estefania
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Publication number: 20120035295Abstract: A method for removing vinyl monomers from a gas stream comprises steps of: irradiating a photoactive-inorganic medium by a light emitting unit to activate the photoactive-inorganic medium; and pumping a gas stream including vinyl monomers to contact with the activated photoactive-inorganic medium to make the vinyl monomers in the gas stream to polymerize on the photoactive-inorganic medium to jointly form a polymeric nano-composite.Type: ApplicationFiled: October 18, 2011Publication date: February 9, 2012Inventors: Wu-jang HUANG, Ling-Yin Chang, Yen-Chia Liu, Hsiu-Hsien Wu, Yi-Ching Li
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Patent number: 8110612Abstract: A process for preparing a pressure sensitive adhesive using a modified planetary roller extruder is described. The process in accordance with one aspect of the invention includes introducing primary raw materials including a non-thermoplastic elastomer into a feeding section of the modified planetary roller extruder, conveying the raw materials from the feeding section to a compounding section of the modified planetary roller extruder, continuously mixing the primary raw materials in the compounding section to produce a homogeneous adhesive composition. The adhesive composition may be applied to a web-form material. The compounding section of the modified planetary roller extruder includes a main spindle surrounded by and intermeshed with a plurality of planetary spindles at least one of which is a double transversal mixing spindle having a plurality of back-cut helical flights.Type: GrantFiled: February 5, 2007Date of Patent: February 7, 2012Assignee: Intertape Polymer Corp.Inventors: John Kinch Tynan, Jr., Richard Walter St. Coeur, David Michael Kovach, Thomas Lombardo
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Patent number: 8076387Abstract: The present invention provides an irradiated crosslinked polyethylene containing reduced free radicals, preferably containing substantially no residual free radical. Disclosed is a process of making irradiated crosslinked polyethylene by irradiating the polyethylene in contact with a sensitizing environment at an elevated temperature that is below the melting point, in order to reduce the concentration of residual free radicals to an undetectable level. A process of making irradiated crosslinked polyethylene composition having reduced free radical content, preferably containing substantially no residual free radicals, by mechanically deforming the polyethylene at a temperature that is below the melting point of the polyethylene, optionally in a sensitizing environment, is also disclosed herein.Type: GrantFiled: June 25, 2010Date of Patent: December 13, 2011Assignees: The General Hospital Corporation, Cambridge Polymer Group, Inc.Inventors: Orhun K. Muratoglu, Stephen H. Spiegelberg, Gareth H. McKinley
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Patent number: 8076393Abstract: An ink composition includes (A) at least one polymerizable compound selected from the group consisting of a monofunctional radically polymerizable monomer having an aliphatic cyclic structure, an N-vinyllactam, and an aromatic monofunctional radically polymerizable monomer, (B) a radical polymerization initiator, (C) a pigment, and (D) a graft copolymer having a repeating unit represented by the formula below in a graft chain: wherein R denotes a hydrogen atom or a methyl group, X denotes a single bond, —O—, —CO—, —COO—, —CONR1—, —OCO—, or a phenylene group, R1 denotes a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group, L denotes a single bond or a divalent linking group, Z denotes —NR2R3, R2 and R3 independently denote a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group, and R2 and R3 may be bonded to each other to form a ring.Type: GrantFiled: August 26, 2008Date of Patent: December 13, 2011Assignee: FUJIFILM CorporationInventors: Kaoru Tojo, Norihide Shimohara
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Patent number: 8053497Abstract: The invention concerns the polymers obtained by the use of sulfur compounds in a process for controlled radical polymerization in water of acrylic acid and/or acrylic acid with hydrosoluble monomers. It concerns also their uses as dispersant agents or agents to aid grinding and/or co-grinding of mineral matters in aqueous suspensions, and as dispersant agents incorporated directly in aqueous formulations containing mineral matters. Finally, the invention concerns the formulations of mineral matters obtained in this manner.Type: GrantFiled: October 21, 2010Date of Patent: November 8, 2011Assignee: Coatex S.A.S.Inventors: Jean-Marc Suau, Christian Jacquemet
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Patent number: 8053493Abstract: Disclosed is an ink, which has a viscosity and a volumetric shrinkage, controlled to 20˜80 cP and 10˜30%, respectively, by controlling an amount of each of: (a) a first monomer having a viscosity of 7˜1,600 cP and having one or two polymerizable functional groups; and (b) a second monomer having a viscosity of 30˜20,000 cP and having at least three polymerizable functional groups, in the presence of 0˜20 wt % of a solvent, and which can form a convex portion due to its surface tension controlled to 20˜40 mN/m, so as to compensate for its volumetric shrinkage, wherein the viscosity and the surface tension are measured at 25° C. A substrate, which is patterned or information-recorded with the ink, and a display device having the substrate are also disclosed.Type: GrantFiled: March 15, 2006Date of Patent: November 8, 2011Assignee: LG Chem, Ltd.Inventors: Joon Hyung Kim, Hyun Sik Kim
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Publication number: 20110240541Abstract: A monolith for liquid chromatography is disclosed that involves a reaction product of; a (1) crosslinker having at least three adjacent groups, selected from ethylene oxide, polyethylene oxide, and mixtures thereof, and two or more pendent vinyl groups, and (2) monomer having the formula, CH2?CR—Y—Z, where R is H or CH3, where Z is a functional group selected to impart a desired interaction property to the monolith, and where Y is nothing, or any group that will not materially affect or compete with the function of the functional group (Z) in the monolith, or the reactivity of vinyl groups in the crosslinker or monomer.Type: ApplicationFiled: April 6, 2010Publication date: October 6, 2011Inventors: Binghe Gu, Milton L. Lee
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Publication number: 20110236650Abstract: The present invention provides an active radiation curable ink composition for inkjet recording, the active radiation curable ink composition including: (A) a polymer containing a repeating unit having a radically polymerizable group and having a bicyclo ring structure or a tricyclo ring structure at a site forming a part of a main chain thereof, (B) a photopolymerization initiator, and (C) a radically polymerizable compound having a structure different from that of the (A) radical polymer.Type: ApplicationFiled: March 28, 2011Publication date: September 29, 2011Applicant: FUJIFILM CORPORATIONInventor: Kazuhiro YOKOI
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Patent number: 8017193Abstract: A monomeric formulation for creating self-propagating polymer optical waveguides and a system and a method of using the same. The monomeric formulation includes a plurality of unsaturated molecules, a molecule having a structure of R—X—H (e.g., X?O, S, N), and a photoinitiator. The monomeric formulation can further include a free radical inhibitor. The system includes a light source, a reservoir having a monomeric formulation and a patterning apparatus configured to guide a light beam from the light source into the monomeric formulation to form at least one self-propagating polymer waveguide.Type: GrantFiled: August 6, 2008Date of Patent: September 13, 2011Assignee: HRL Laboratories, LLCInventors: Chaoyin Zhou, Alan J. Jacobsen
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Patent number: 8007878Abstract: An antireflection film comprising a support and a low refractive index layer prepared by coating a coating composition containing the following components: (A) a fluorine-containing polymer, a principal chain of which is made of only carbon atoms and which contains at least one fluorine-containing vinyl monomer polymerization unit and at least one hydroxyl group-containing vinyl monomer polymerization unit, wherein a content of the hydroxyl group-containing vinyl monomer polymerization unit exceeds 20% by mole, provided that the polymer does not have a polysiloxane structure in the principal chain; (B) a crosslinking agent capable of reacting with a hydroxyl group; and (C) a compound containing two or more (meth)acryloyl groups in one molecule thereof.Type: GrantFiled: August 3, 2006Date of Patent: August 30, 2011Assignee: Fujifilm CorporationInventors: Hiroyuki Yoneyama, Masaki Noro, Yasuhiro Okamoto
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Patent number: 8003121Abstract: System of implant components containing active agents, wherein each component is intended to function as an additive for an implant material produced with a powdery or finely granulated starting material and/or active agents and additives. Each component is powdery or finely granulated and includes at least one powdery or finely granulated active agent or additive having a higher dosage than the desired concentration for the application. The components themselves are made of a powdery or finely granulated starting material for the implant material, as well as of the active agent or additive. The active agents can be chemotherapeutical agents, such as antibiotics, whereas the additives can be x-ray contrast materials and/or or additives that alter the physical properties of the starting material, such as its elasticity or viscosity.Type: GrantFiled: August 1, 2000Date of Patent: August 23, 2011Assignee: aap Biomaterials GmbH & Co. KGInventors: Elvira Dingeldein, Helmut Wahlig, Jörg Bauer, Edgar Wüst, Christoph Sattig
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Patent number: 7999013Abstract: Hydrophobic coating compositions are provided as are processes to coat articles with the compositions. Extremely hydrophobic coatings are provided by the compositions. Durable, weatherable and scratch-resistant coatings are provided by compositions comprising a trifluoromethyl-containing component and a hardenable material. Weatherable coatings are also provided by compositions comprising a mobile non-volatile fluorinated component and a hardenable material. Processes are also provided for forming hydrophobic coatings on articles.Type: GrantFiled: June 16, 2010Date of Patent: August 16, 2011Assignee: Cytonix, LLCInventor: James F. Brown
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Publication number: 20110196056Abstract: The invention relates to light-curable dental materials comprising at least one polymerizable compound, a photopolymerization initiator and a polymerization inhibitor.Type: ApplicationFiled: November 8, 2010Publication date: August 11, 2011Inventor: Gordon Blackwell
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Patent number: 7981944Abstract: The invention concerns a photocurable adhesive composition comprising, based on total weight of photopolymerizable monomers and/or oligomers of the composition: 5 to 60 wt % of at least one mono or polyacrylate monomer or oligomer thereof (A); 5 to 50 wt % of at least one thio(meth)acrylate monomer or oligomer thereof (B); and 20 to 50 wt % of at least one aromatic dimethacrylate monomer or oligomer thereof (C); with the proviso that the composition does not contain a brominated monofunctional acrylate.Type: GrantFiled: April 15, 2004Date of Patent: July 19, 2011Assignee: Essilor International Compagnie Generale d'OptiqueInventors: Steven Weber, Peiqi Jiang, Yassin Turshani, Aref Jallouli
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Publication number: 20110152397Abstract: A radiation curable solid ink composition comprising at least one curable wax that is curable by free radical polymerization; at least one monomer, oligomer, or prepolymer; at least one non-curable wax; at least one free-radical photoinitiator or photoinitiating moiety; and a colorant; wherein the components form a curable ink composition that is a solid at a first temperature of from about 20 to about 25° C.; and wherein the components form a liquid composition at a second temperature of greater than about 40° C.Type: ApplicationFiled: December 18, 2009Publication date: June 23, 2011Applicant: Xerox CorporationInventors: Marcel P. Breton, Michelle N. Chrétien, Peter G. Odell, Christopher Wagner
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Patent number: 7935740Abstract: The present subject matter relates to processes for irradiating visbroken propylene polymer compositions or extrudates of propylene polymer compositions containing a propylene polymer having a low polydispersity index and a non-phenolic stabilizer.Type: GrantFiled: December 30, 2008Date of Patent: May 3, 2011Assignee: Basell Poliolefine Italia s.r.l.Inventors: Vu A. Dang, Dinshong Dong, Theodore Dziemianowicz
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Patent number: 7851572Abstract: The invention concerns the polymers obtained by the use of sulphur compounds in a process for controlled radical polymerization in water of acrylic acid and/or acrylic acid with hydrosoluble monomers. It concerns also their uses as dispersant agents or agents to aid grinding and/or co-grinding of mineral matters in aqueous suspensions, and as dispersant agents incorporated directly in aqueous formulations containing mineral matters. Finally, the invention concerns the formulations of mineral matters obtained in this manner.Type: GrantFiled: March 23, 2005Date of Patent: December 14, 2010Assignee: Coatex S.A.S.Inventors: Jean-Marc Suau, Christian Jacquemet
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Patent number: 7829605Abstract: An energy ray-curable resin composition comprising (A) a (meth)acrylate having a molecular weight of from 500 to 5,000, of which the main chain backbone is at least one member selected from the group consisting of a polybutadiene, a polyisoprene and hydrogenated products thereof and which has at least one (meth)acryloyl group at an end of the main chain backbone or in a side chain, (B) a monofunctional (meth)acrylate having a C2-8 unsaturated hydrocarbon group via an ester bond, (C) a hydroxyl group-containing (meth)acrylate, (D) a polyfunctional (meth)acrylate, (E) a photopolymerization initiator, and (F) an antioxidant which exhibits equally high adhesive strength to various objects to be bonded, has good heat and moisture resistance, excellent rigidity, low cure shrinkage and little adhesion strain is provided.Type: GrantFiled: May 30, 2006Date of Patent: November 9, 2010Assignee: Denki Kagaku Kogyo Kabushiki KaishaInventors: Jun Watanabe, Kimihiko Yoda, Kazuhiro Oshima