Derived From Aromatic Hydrocarbon Patents (Class 522/188)
  • Patent number: 8999221
    Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance.
    Type: Grant
    Filed: December 24, 2013
    Date of Patent: April 7, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Kyouhei Sakita, Hiroyuki Yonezawa
  • Patent number: 8933144
    Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: January 13, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Kunihiko Kodama, Shinji Tarutani
  • Patent number: 8822563
    Abstract: Disclosed is a curable resin composition comprising a polymer (A) that has a main chain comprising carbon atoms and a side chain having a polymerizing unsaturated linking group and has a cyclic structure in the main chain and/or the side chain, and a compound having a polymerizing unsaturated group. The curable resin composition has good optical characteristics, good heat resistance and good moldability.
    Type: Grant
    Filed: January 18, 2013
    Date of Patent: September 2, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Hiroaki Mochizuki, Naoyuki Morooka, Rie Okutsu, Tatsuhiko Obayashi
  • Patent number: 8815971
    Abstract: A procedure for improved temperature control in controlled radical polymerization processes is disclosed. The procedure is directed at controlling the concentration of the persistent radical in ATRP and NMP polymerizations procedures and the concentration of radicals in a RAFT polymerization process by feeding a reducing agent or radical precursor continuously or intermittently to the reaction medium through one of more ports.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: August 26, 2014
    Assignee: ATRP Solutions, Inc.
    Inventors: Wojciech Jakubowski, James Spanswick
  • Patent number: 8796352
    Abstract: Provided is a material suitable for an optical element, which can be applied by inkjet, has an ultraviolet curable characteristic, and yields a cured product excellent in transparency and hardness and having a refractive index of more than 1.5. Specifically, an optical element excellent in transparency and hardness and having a refractive index of more than 1.5 is obtained by preparing a resin composition including at least: (A) 5 to 45 mass % of a vinyl group-containing copolymer obtained by copolymerization of a divinyl aromatic compound; (B) 55 to 94 mass % of a liquid photocurable polyfunctional (meth)acrylate having two or more (meth)acryloyl groups; (C) 0.97 to 20 mass % of a photopolymerization initiator; and (D) 0.03 to 1 mass % of a surfactant, and applying the resin composition onto a support substrate by inkjet, followed by photocuring.
    Type: Grant
    Filed: June 9, 2011
    Date of Patent: August 5, 2014
    Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.
    Inventors: Koichi Fujishiro, Masanao Kawabe, Tohru Saito, Takahiro Yoshioka
  • Patent number: 8796350
    Abstract: An ultraviolet (UV) crosslinkable acrylic pressure sensitive adhesive comprises an acrylic copolymer and a cationic photoinitiator. The acrylic copolymer comprises pendant reactive functional groups. The pressure sensitive adhesive formed from the acrylic copolymer with the pendant reactive functional groups result in high green strength and/or high temperature holding strength of the adhesive.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: August 5, 2014
    Assignee: Henkel US IP LLC
    Inventors: Yuxia Liu, Peter Palasz, Charles W. Paul, Paul B. Foreman
  • Publication number: 20130270222
    Abstract: There is provided a planarizing film-forming composition for a hard disk. A planarizing film-forming composition for a hard disk comprising a hydrophobic coating material having a photopolymerizable group and an aromatic group, containing a polymer or a combination of a polymer and a compound selected from the group consisting of a polymer (A1), a polymer (A2), a polymer (A3), a compound (a1), a compound (a2), and a compound (a3).
    Type: Application
    Filed: December 21, 2011
    Publication date: October 17, 2013
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Taku Kato, Keisuke Shuto, Junpei Kobayashi, Masayoshi Suzuki
  • Patent number: 8552084
    Abstract: A process for preparing a pressure sensitive adhesive using a modified planetary roller extruder is described. The process in accordance with one aspect of the invention is a continuous process that includes introducing primary raw materials comprising a non-thermoplastic elastomer into a planetary roller extruder, introducing a heat-activatable crosslinker into the planetary roller extruder for mixing with the primary raw materials, and compounding the primary raw materials and the heat activatable crosslinker to form an adhesive composition while maintaining the temperature of the adhesive composition between about 25° C. and about 100° C. The non-thermoplastic elastomer is masticated during compounding and at least some of the heat-activatable crosslinker remains generally unactivated and is available for later activation.
    Type: Grant
    Filed: December 27, 2011
    Date of Patent: October 8, 2013
    Assignee: Intertape Polymer Corp.
    Inventors: John Kinch Tynan, Jr., Richard Walter St. Coeur, David Michael Kovach, Thomas Lombardo
  • Patent number: 8404797
    Abstract: An end-modified soluble polyfunctional vinyl aromatic copolymer, which is improved in heat resistance, thermal stability, solvent solubility, and compatibility with acrylate compounds, and a curable resin composition using the same are disclosed. The end-modified soluble polyfunctional vinyl aromatic copolymer is obtained by allowing a divinyl aromatic compound (a), a monovinyl aromatic compound (b), and an aromatic ether compound (c) to react with each other, and has, at an end, an end group derived from the aromatic ether compound and having an acrylate bond. The copolymer has a number average molecular weight Mn of 500 to 100,000, an introduction amount (c1) of the end group derived from the aromatic ether compound satisfies (c1)?1.0 (group/molecule), a molar fraction a? of a structural unit derived from the divinyl aromatic compound and a molar fraction b? of a structural unit derived from the monovinyl aromatic compound in the copolymer satisfy 0.05?a?/(a?+b?)?0.95.
    Type: Grant
    Filed: March 3, 2009
    Date of Patent: March 26, 2013
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Masanao Kawabe, Hiroko Terao, Natsuko Okazaki
  • Publication number: 20120213969
    Abstract: A functionally graded shape memory polymer (SMP) that has a range of transition temperatures that are spatially distributed in a gradient fashion within one single article. The SMP is formed by post-curing a pre-cured glassy SMP in a linear temperature gradient that imposes different vitrification temperature limits at different positions along the gradient. Utilizing indentation-based surface shape memory coupled with optical measurements of photoelastic response, the capability of this material to respond over a wide range of thermal triggers is correlated with the graded glass transition behavior. This new class of SMP offers great potential for such applications as passive temperature sensing and precise control of shape evolution during a thermally triggered shape recovery.
    Type: Application
    Filed: February 21, 2012
    Publication date: August 23, 2012
    Applicant: SYRACUSE UNIVERSITY
    Inventors: Patrick Mather, Pine Yang, Xiaofan Luo, Andrew M. DiOrio
  • Patent number: 8163839
    Abstract: A pigment dispersant contains (a) 5 to 30 wt % of aromatic and/or heterocyclic vinyl monomer units, (b) 10 to 30 wt % of monomer units having acid groups, (c) 40 to 80 wt % of (meth)acrylate ester monomer units, and (d) 5 to 30 wt % of monomer units having poly(C2-6-alkylene glycol) chains or mono(C1-22-alkyl)ether chains of said glycol, said poly(C2-6-alkylene glycol) chains or mono (C1-22-alkyl)ether chains having a number average molecular weight of from 150 to 1,500. A sum of the monomer units (a) to (d) amounts to 100 wt %. The pigment dispersant has an acid value of from 30 to 300 mgKOH/g, a number average molecular weight of from 5,000 to 30,000, and a content of organic compounds, boiling points of which are not higher than 250° C., of not higher than 0.2 wt %. Also disclosed are its production process, its aqueous solution and its dispersion.
    Type: Grant
    Filed: June 4, 2008
    Date of Patent: April 24, 2012
    Assignee: Dainichiseika Color & Chemicals Mfg. Co., Ltd.
    Inventors: Hiroyuki Shimanaka, Yoshikazu Murakami, Satoshi Isobe, Takaaki Ota, Jyunki Takada, Satoshi Dosho
  • Patent number: 8153744
    Abstract: There is provided a novel hyperbranched polymer in which the refractive index is precisely controlled while retaining its hyperbranched structure, and a method for producing the hyperbranched polymer. Further, there is also provided an optically and thermally stable novel hyperbranched polymer in which the desired refractive index is precisely controlled, and a method for producing the hyperbranched polymer. The hyperbranched polymer has, as a branched structure, a repeating unit structure produced from two dithiocarbamate compounds each having a vinyl structure, at the polymerization initiation site having a vinyl structure. A specific example of the hyperbranched polymer can be produced by subjecting to a living radical polymerization N,N-diethyldithiocarbamylmethylstyrene in the presence of N,N-diethyldithiocarbamylethyl methacrylate.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: April 10, 2012
    Assignees: Nissan Chemical Industries, Ltd., Tokyo Institute of Technology
    Inventors: Hiroki Takemoto, Masaaki Ozawa, Koji Ishizu
  • Publication number: 20120035295
    Abstract: A method for removing vinyl monomers from a gas stream comprises steps of: irradiating a photoactive-inorganic medium by a light emitting unit to activate the photoactive-inorganic medium; and pumping a gas stream including vinyl monomers to contact with the activated photoactive-inorganic medium to make the vinyl monomers in the gas stream to polymerize on the photoactive-inorganic medium to jointly form a polymeric nano-composite.
    Type: Application
    Filed: October 18, 2011
    Publication date: February 9, 2012
    Inventors: Wu-jang HUANG, Ling-Yin Chang, Yen-Chia Liu, Hsiu-Hsien Wu, Yi-Ching Li
  • Patent number: 8110612
    Abstract: A process for preparing a pressure sensitive adhesive using a modified planetary roller extruder is described. The process in accordance with one aspect of the invention includes introducing primary raw materials including a non-thermoplastic elastomer into a feeding section of the modified planetary roller extruder, conveying the raw materials from the feeding section to a compounding section of the modified planetary roller extruder, continuously mixing the primary raw materials in the compounding section to produce a homogeneous adhesive composition. The adhesive composition may be applied to a web-form material. The compounding section of the modified planetary roller extruder includes a main spindle surrounded by and intermeshed with a plurality of planetary spindles at least one of which is a double transversal mixing spindle having a plurality of back-cut helical flights.
    Type: Grant
    Filed: February 5, 2007
    Date of Patent: February 7, 2012
    Assignee: Intertape Polymer Corp.
    Inventors: John Kinch Tynan, Jr., Richard Walter St. Coeur, David Michael Kovach, Thomas Lombardo
  • Patent number: 8025833
    Abstract: A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.
    Type: Grant
    Filed: May 26, 2009
    Date of Patent: September 27, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Akinori Fujita, Tadashi Oomatsu, Akiyoshi Goto
  • Publication number: 20110082230
    Abstract: A procedure for improved temperature control in controlled radical polymerization processes is disclosed. The procedure is directed at controlling the concentration of the persistent radical in ATRP and NMP polymerizations procedures and the concentration of radicals in a RAFT polymerization process by feeding a reducing agent or radical precursor continuously or intermittently to the reaction medium through one of more ports.
    Type: Application
    Filed: December 18, 2009
    Publication date: April 7, 2011
    Inventors: Wojciech Jakubowski, James Spanswick
  • Publication number: 20110077319
    Abstract: A pigment dispersion including a pigment and a block polymer including a repeating unit including a hetero ring residue or an anthraquinone ring residue of a colorant is disclosed.
    Type: Application
    Filed: September 17, 2010
    Publication date: March 31, 2011
    Applicant: FUJIFILM CORPORATION
    Inventor: Koji YASUDA
  • Patent number: 7875659
    Abstract: This invention provides a water-soluble macromonomer having terminal unsaturation obtained by polymerization of monomers in the presence of inclusion complex of chain transfer agent in aqueous system. Hydrophobic chain transfer agent AMSD forms an inclusion complex with methylated cyclodextrin. The complexation enhances its solubility in water and enables the polymerization of water-soluble monomers in aqueous medium. After polymerization cyclodextrin is removed and the macromer with terminal unsaturation obtained can be used further for copolymerization with any vinyl monomer.
    Type: Grant
    Filed: March 28, 2007
    Date of Patent: January 25, 2011
    Assignee: Council of Scientific and Industrial Research
    Inventors: Mohan Gopalkrishna Kulkarni, Prerana Maruti Patil
  • Publication number: 20100286304
    Abstract: Disclosed herein is a polymeric composition comprising a polymeric composition comprising a first crosslinked network; and a second crosslinked network; wherein the first crosslinked network is crosslinked at a first stress and/or a first strain and the second crosslinked network is crosslinked at a second stress and/or a second strain; where the first stress and/or the first strain is different from the second stress and/or the second strain either in magnitude or direction. Disclosed herein is a method comprising subjecting a polymeric mass to a first stress and/or a first strain level; crosslinking the polymeric mass to form a first crosslinked network; subjecting the polymeric mass to a second stress and/or a second strain level; and crosslinking the polymeric mass to form a second crosslinked network; where the first stress and/or the first strain level is different from the second stress and/or the second strain level.
    Type: Application
    Filed: November 10, 2009
    Publication date: November 11, 2010
    Applicant: UNIVERSITY OF MASSACHUSETTS
    Inventors: Alan James Lesser, Naveen Kumar Singh, Mohit Mamodia
  • Publication number: 20100179242
    Abstract: In general, the present invention describes the initiation of photochemical reactions at a metal-solution interface irradiated by light. Surface plasmon energy is used to initiate reaction of species in solution, the reaction occurring at, on or near a surface which is in contact with the solution. The present invention describes an application of this effect e.g. for polymerization purposes.
    Type: Application
    Filed: July 28, 2007
    Publication date: July 15, 2010
    Inventors: Sergey Anatoliyovich Piletsky, Michael James Whitcombe, Volodymyr Chegel
  • Publication number: 20090283937
    Abstract: A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.
    Type: Application
    Filed: May 26, 2009
    Publication date: November 19, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Kunihiko KODAMA, Akinori FUJITA, Tadashi OOMATSU, Akiyoshi GOTO
  • Publication number: 20090221729
    Abstract: This invention provides a water-soluble macromonomer having terminal unsaturation obtained by polymerization of monomers in the presence of inclusion complex of chain transfer agent in aqueous system. Hydrophobic chain transfer agent AMSD forms an inclusion complex with methylated cyclodextrin. The complexation enhances its solubility in water and enables the polymerization of water-soluble monomers in aqueous medium. After polymerization cyclodextrin is removed and the macromer with terminal unsaturation obtained can be used further for copolymerization with any vinyl monomer.
    Type: Application
    Filed: March 28, 2007
    Publication date: September 3, 2009
    Applicant: COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCH
    Inventors: Mohan Gopalkrishna Kulkarni, Prerana Maruti Patil
  • Patent number: 7572840
    Abstract: The present invention relates to a method for manufacturing super-absorbent polymers, comprising providing a reaction mixture which comprises at least a first monomer and a second monomer and a radical-forming polymerization initiator, and subsequently causing the monomers to polymerize under the influence of an energy source, wherein radical formation occurs and the polymerization is started, wherein the first monomer is neutralized with an inorganic base before polymerization, in addition to the manufactured super-absorbent polymers. The invention further relates to a method for applying a coating of super-absorbent polymers to a carrier.
    Type: Grant
    Filed: October 5, 2004
    Date of Patent: August 11, 2009
    Assignee: Vepetex B.V.
    Inventors: Paul Kleijn, Herman Reezigt
  • Patent number: 7495061
    Abstract: A hydrophilic, aromatic-based monomer has an aromatic group substituted with at least one hydrophilic substituent and a reactive functional group. Polymers comprising such a hydrophilic, aromatic-based monomers avoid or reduce the risk of forming vacuoles of absorbed water. Furthermore, such polymers have high refractive index, and, thus, are advantageously used for making ophthalmic devices, such as intraocular lenses, contact lenses, corneal rings, corneal inlays, and keratoprostheses.
    Type: Grant
    Filed: May 27, 2005
    Date of Patent: February 24, 2009
    Assignee: Bausch + Lomb Incorporated
    Inventors: Joseph C. Salamone, Jay F. Kunzler, Richard M. Ozark
  • Publication number: 20090035528
    Abstract: A three-dimensional shaped structure is prepared from a multi-photon reactive composition including: (a) at least one reactive species; (b) a multi-photon photoinitiator system; and (c) a plurality of substantially inorganic particles, wherein the particles have an average particle size of less than about 10 microns in diameter.
    Type: Application
    Filed: July 11, 2008
    Publication date: February 5, 2009
    Inventors: Catherine A. Leatherdale, Craig R. Schardt, D. Scott Thompson, Wendy L. Thompson
  • Patent number: 7449497
    Abstract: Monomers (e.g. thinphenes) are caused to polymerise by mixing them with an oxidising agent (and generally a solvent comprising water) and irradiating the mixture with light (visible or UV). Polymer properties can be varied by doping or chemical modification. Uses include sensor elements for assays and electrical components such as electrodes.
    Type: Grant
    Filed: March 24, 2003
    Date of Patent: November 11, 2008
    Assignee: Cranfield University
    Inventors: Sergey Anatoliyovich Piletsky, Olena Volodimirivna Piletska, Anthony Peter Francis Turner, Khalku Karim, Beining Chen
  • Patent number: 7112614
    Abstract: A method is provided for obtaining crosslinked polymers, particularly fluorinated polymers having pendent sulfonic acid groups, by crosslinking through pendent groups which include a sulfonyl chloride group (—SO2Cl). The sulfonyl chloride group may be removed by application of electromagnetic radiation, typically in the ultraviolet band, or a radical initiator, leaving behind a radical which readily binds covalently to other polymer strands or to crosslinking agents to form crosslinks. Typically, the polymer is made by providing a polymer comprising pendent groups which include a group according to the formula —SO2F and converting at least a portion of the —SO2F groups to —SO2Cl. After crosslinking, the remaining —SO2F groups may be converted to sulfonic acid groups, yielding a crosslinked polymer electrolyte. Such crosslinked polymer electrolytes may be used to make polymer electrolyte membranes (PEM's) that may be used in electrolytic cells such as fuel cells.
    Type: Grant
    Filed: December 8, 2003
    Date of Patent: September 26, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Naiyong Jing, Steven J. Hamrock
  • Patent number: 7074841
    Abstract: A method is provided for making a crosslinked polymer electrolyte, typically in the form of a membrane for use as a polymer electrolyte membrane in an electrolytic cell such as a fuel cell, by trimerization of nitrile groups contained on groups pendant from the polymer. The resulting polymer electrolyte membrane comprises a highly fluorinated polymer comprising: a perfluorinated backbone, first pendent groups which comprise sulfonic acid groups, and crosslinks comprising trivalent groups according to the formula: The first pendent groups are typically according to the formula: —R1—SO3H, where R1 is a branched or unbranched perfluoroalkyl or perfluoroether group comprising 1–15 carbon atoms and 0–4 oxygen atoms, most typically —O—CF2—CF2—CF2—CF2—SO3H or —O—CF2—CF(CF3)—O—CF2—CF2—SO3H.
    Type: Grant
    Filed: November 13, 2003
    Date of Patent: July 11, 2006
    Inventors: Michael A. Yandrasits, Steven J. Hamrock, Werner M. Grootaert, Miguel A. Guerra, Naiyong Jing
  • Patent number: 6908952
    Abstract: Photoiniferters for controlled radical polymerizations are described. The photoiniferters have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: June 21, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Kevin M. Lewandowski, Michael S. Wendland, Duane D. Fansler, Steven M. Heilmann, Babu N. Gaddam
  • Patent number: 6869983
    Abstract: An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.
    Type: Grant
    Filed: June 10, 2003
    Date of Patent: March 22, 2005
    Assignee: The University of Chicago
    Inventors: Gerard T. Caneba, Vijaya Raghavan Tirumala, Derrick C. Mancini, Hsien-Hau Wang
  • Patent number: 6780472
    Abstract: A monomer useful in the formulation of a radiation curable coatable composition comprises (a) polyfunctional isocyanurate having at least three terminal reactive groups reacted with (b) hydroxyalkyl acrylate and (c) tertiary amine alcohol in a molar ratio of a:b:c of about 1:1-2.5:0.5-2, wherein b+c is at least 3 and no greater than the total number of terminal reactive groups of (a). The monomer is included in a radiation curable coatable composition suitable for use as a floor finish and in a floor finishing system comprising the foregoing coatable composition with a primer. A method for the treatment of a substrate using the floor finish and the floor finishing system is also described.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: August 24, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Steven J. Hamrock, Fidelis C. Onwumere, Bradford B. Wright, Michael A. Yandrasits
  • Patent number: 6716564
    Abstract: A radiation sensitive resin composition containing an alkali-soluble resin, for example a novolak-quinonediazide positive-working radiation sensitive resin composition and a chemically amplified negative-working resin composition, wherein the alkali-soluble resin contains at least an alkali-soluble resin obtained by polycondensation of a compound represented by the following general formula (I) and a phenol if necessary, with an aldehyde. wherein R represents a hydroxyl group or an alkyl group with 1 to 4 carbon atoms, n is 0 or an integer of 1 to 3 and, when n is 2 or 3, each R group may be the same or different.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: April 6, 2004
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Satoshi Kobayashi, Hidekazu Shioda, Haruhiko Itoh
  • Patent number: 6656980
    Abstract: This invention relates to a process of polymerization of unsaturated fatty acids, esters of unsaturated fatty acids, unsaturated hydrocarbons or esters of unsaturated hydrocarbons, or unsaturated derivatives of these products by dielectric heating, as well as to the polymers obtained and uses of these polymers. The polymerization process is characterized by the fact that the reagent or reagent mixture is subjected to dielectric hearting to effect polymerization.
    Type: Grant
    Filed: July 31, 2001
    Date of Patent: December 2, 2003
    Assignee: Aldivia S.A.
    Inventor: Pierre Charlier De Chily
  • Patent number: 6624273
    Abstract: Non-tacky, base polymers are plasticized into pressure-sensitive adhesives and comprise: a) about 100 parts by weight of a base copolymer having a Tg greater than about 0° C., wherein the base copolymer is formed from and comprises: (1) about 50 to 70% by weight of a high Tg comonomer component, wherein the homopolymer formed from the high Tg comonomer component has a Tg of at least about 20° C.; (2) optionally, up to about 20% by weight based on the total weight of the base copolymer of an acidic comonomer; and (3) about 30 to 50% by weight of one or more low Tg (meth)acrylate comonomer, wherein the Tg homopolymer of the low Tg comonomer is less than about 20° C., and b) about 1 to about 100 parts based on the base copolymer of a nonreactive, non-volatile, non-acrylic-based plasticizing agent.
    Type: Grant
    Filed: August 13, 1999
    Date of Patent: September 23, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Albert I. Everaerts, Eric B. T. Moonen, Peter A. Stark
  • Patent number: 6576684
    Abstract: Disclosed are compositions from which radically initiated oligomers/polymers having a controlled molecular weight, low polydispersity and a vinyl or dienyl end group are prepared. Further subjects of the invention are a process for controlled radical polymerization, oligomers/polymers obtainable by said process and the use of specific addition fragmentation agents for the polymerization process. The addition fragmentation agents are new in part and these are also subject of the present invention. The addition fragmentation agents are of the formula (Ia), (Ib) or (Ic) where Y is a group which activates the double bond towards Michael addition.
    Type: Grant
    Filed: February 15, 2001
    Date of Patent: June 10, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Vincent Desobry, Peter Murer, Anne Schuwey
  • Patent number: 6518326
    Abstract: The invention relates to open chain alkoxyamine compounds useful as polymerization regulators. The open chain alkoxyamine compounds are useful for the polymerization of ethylenically unsaturated monomers. The compounds of the present invention provide polymeric resin products having low polydispersity. The polymerization process proceeds with enhanced monomer to polymer conversion efficiency. In particular, this invention relates to stable free radical-mediated polymerization processes which provide homopolymers, random copolymer, block copolymers, multiblock copolymers, graft copolymers and the like, at enhanced rates of polymerization and enhanced monomer to polymer conversions.
    Type: Grant
    Filed: January 29, 2001
    Date of Patent: February 11, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Peter Nesvadba, Andreas Kramer, Marie-Odile Zink, Dario Lazzari
  • Patent number: 6482868
    Abstract: Accelerators that can be useful for an energy polymerizable composition comprising a cationically curable material; energy polymerizable -compositions comprising at least one cationically curable material and an initiation system therefor, the initiation system comprising at least one organometallic complex salt and at least one accelerator; and a method for curing the compositions. The cured compositions can provide useful articles. The invention also provides compositions of matter comprising an organometallic complex salt and at least one compound selected from the Class 1 and Class 2 compounds disclosed herein.
    Type: Grant
    Filed: June 26, 2000
    Date of Patent: November 19, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Wayne Scott Mahoney, Peggy Sperl Willett
  • Patent number: 6468595
    Abstract: A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers.
    Type: Grant
    Filed: February 13, 2001
    Date of Patent: October 22, 2002
    Assignee: Sigma Technologies International, Inc.
    Inventors: Michael G. Mikhael, Angelo Yializis
  • Patent number: 6458864
    Abstract: Compounds with chain transfer groups of the formula I, II, III and IV wherein a is 1 or 2; Ar and Ar1 inter alia are phenyl; Ar2 inter alia is phenylene, these groups being unsubstituted or substituted; X is a direct bond, —O—, —S— or —N(R6)—; Y inter alia is hydrogen or C1-C12alkyl; M1 is —NR3R4 or —OH, or M1 is Ar when R1 and R2 are alkoxy, or aryloxy; R1 and R2 independently of one another e.g. are C1-C8alkyl; R3 and R4 for example are C1-C12alkyl, or together are C3-C7alkylene; R5 inter alia is C1-C6alkylene or a direct bond; R6 is for example hydrogen; and Z is a divalent radical, provided that at least one of the radicals Ar, Ar1, Ar2, R1, R2, R3, R4, R5 or Y is substituted by SH groups; are suitable for the thermal preparation of macrophotoinitiators which are polymerized photochemically to give block-copolymers.
    Type: Grant
    Filed: November 27, 2000
    Date of Patent: October 1, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Toshikage Asakura, Masaki Ohwa, Hitoshi Yamato, Asako Ito
  • Patent number: 6403674
    Abstract: One embodiment of the present invention is a method for synthesizing superabsorbent polyacrylate polymers comprising the steps of providing an acrylate monomer, a multifunctional monomer, and free radical initiator in the absence of a solvent; mixing the acrylate monomer, multifunctional monomer, and free radical initiator to create a solvent free solution; and subjecting the solvent free solution to radiation to create a cross-linked polymer. The product created by this method is also a part of the present invention.
    Type: Grant
    Filed: November 17, 2000
    Date of Patent: June 11, 2002
    Assignee: Eveready Battery Company, Inc.
    Inventor: Mark A. Schubert
  • Patent number: 6380277
    Abstract: The present invention relates to iodonium salts containing urethane groups of reduced crystallization tendency, to a process for their preparation, and to their use for the radiation curing of cationically curing compositions.
    Type: Grant
    Filed: September 19, 2000
    Date of Patent: April 30, 2002
    Assignee: Goldschmidt AG
    Inventors: Sascha Oestreich, Andreas Weier, Stefanie Volkmer
  • Patent number: 6342542
    Abstract: A radiation sensitive resin composition containing an alkali-soluble resin, for example a novolak-quinonediazide positive-working radiation sensitive resin composition and a chemically amplified negative-working resin composition, wherein the alkali-soluble resin contains at least an alkali-soluble resin obtained by polycondensation of a compound represented by the following general formula (I) and a phenol if necessary, with an aldehyde. wherein R represents a hydroxyl group or an alkyl group with 1 to 4 carbon atoms, n is 0 or an integer of 1 to 3 and, when n is 2 or 3, each R group may be the same or different.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: January 29, 2002
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Satoshi Kobayashi, Hidekazu Shioda, Haruhiko Itoh
  • Patent number: 6316519
    Abstract: Synthesis of linear acrylic polymers and copolymers having controlled molecular weight by the photoinitiated free radical polymerization of vinyl monomers in the presence of chain transfer agents to produce polymers useful in coating compositions and the like, including printing inks.
    Type: Grant
    Filed: August 19, 1999
    Date of Patent: November 13, 2001
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Charles Thomas Berge, Vincent Desobry
  • Patent number: 6127447
    Abstract: A radiation curable coating composition is provided and includes an effective amount of cationic photoinitiator, in combination with a charge transfer complex, the charge transfer complex comprising at least one electron withdrawing reactant component and at least one electron donating reactant component free radically reactive therewith, the electron withdrawing reactant component comprising an unsaturated nitrogen containing compound and the electron donating reactant component comprising an unsaturated compound having at least one vinyl ether group, the electron donating reactant component may be separate from or structurally incorporated within the electron withdrawing reactant component and an effective amount of a cationic photoinitiator. A photopolymerization process employing the composition is also provided.
    Type: Grant
    Filed: July 30, 1999
    Date of Patent: October 3, 2000
    Assignee: Fusion UV Systems, Inc.
    Inventors: Mark Mitry, Roger McCartney, Mohamed R. Amin
  • Patent number: 6124371
    Abstract: The invention relates to a composition comprising polymerizable material and an anionic photocatalyst. The photocatalyst is a photolabile compound able to liberate a strong base having a pK.sub.a .gtoreq.12. The catalyst can be illustrated by the structural formula Z-A wherein Z is a photolabile group and A is a strong base, for example, a nitrogen containing compound such as, a secondary amine, a guanidine or amidine and Z is covalently bound to A.
    Type: Grant
    Filed: August 21, 1998
    Date of Patent: September 26, 2000
    Assignee: DSM N.V.
    Inventors: Dirk A. W. Stanssens, Johan F. G. A. Jansen
  • Patent number: 6107364
    Abstract: Described are a polymerizable composition comprising methyl styrene monomer, polymers comprising monomeric units derived from methyl styrene monomers, and optical products comprising these polymers.
    Type: Grant
    Filed: May 9, 1997
    Date of Patent: August 22, 2000
    Assignee: 3M Innovative Properties Company
    Inventors: Bettie C. Fong, David B. Olson
  • Patent number: 6025409
    Abstract: The invention relates to a coating composition comprising (a) a radiation-curable binder composition comprising an unsaturated compound having at least one maleate, fumerate, itaconate, citraconate or mesaconate group; (b) an unsaturated vinylether compound and a compound which forms a strong exciplex with (a) or (b); that is otherwise free of a photoinitiating compound.
    Type: Grant
    Filed: August 28, 1998
    Date of Patent: February 15, 2000
    Assignee: DSM N.V.
    Inventor: Johan F. G. A. Jansen
  • Patent number: 6015841
    Abstract: This invention relates to an initiator system for the polymerization of isoolefins having 4 to 16 carbon atoms, optionally with monomers polymerizable with isoolefins, the system consisting of or one or more aromatic or heteroaromatic, polycyclic hydrocarbons and an aged, organic solution of vanadium tetrachloride, wherein the concentration of the vanadium tetrachloride is 0.01 mmol to 500 mmol per liter of solvent and the molar ratio of aged vanadium tetrachloride to polycyclic hydrocarbons is in the range from 100:1 to 1:100.It is possible by means of the initiator system according to the invention to produce polyisoolefins, in particular butyl rubbers, at relatively high temperatures with only a low gel content and of a sufficiently high molecular weight.
    Type: Grant
    Filed: June 30, 1997
    Date of Patent: January 18, 2000
    Assignee: Bayer AG
    Inventors: Gerhard Langstein, Martin Bohnenpoll, Uwe Denninger, Werner Obrecht, Peter Plesch
  • Patent number: 6008265
    Abstract: An ionic compound comprising at least one group A.sup.+ X.sup.-, comprising:a cationic group A.sup.+ selected from the group consisting of biaryliodonium, arylsulfonium, arylacylsulfonium, diazonium and organometallic cations comprising a transition metal complexed with at least one unsaturated cyclic compound comprising 4-12 carbon atoms, said cationic group being part of a polymer chain; whereinX.sup.- is an imide anion, [FSO.sub.2 NSO.sub.2 R'.sub.F ].sup.- or [R.sub.F CH.sub.2 OSO.sub.2 NSO.sub.2 R'.sub.F ].sup.- or [(R.sub.F).sub.2 CHOSO.sub.2 NSO.sub.2 R'.sub.F ].sup.-, or a methylide anion [FSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.-, or a [R.sub.F CH.sub.2 OSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.- or [(R.sub.F).sub.2 CHOSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.31 .
    Type: Grant
    Filed: October 3, 1997
    Date of Patent: December 28, 1999
    Assignees: Hydro-Quebec, Centre National de la Recherche Scientifique
    Inventors: Alain Vallee, Michel Armand, Xavier Ollivrin, Christophe Michot
  • Patent number: 6008268
    Abstract: A method of generating reactive species which includes exposing a photoreactor composition to radiation, in which the photoreactor composition comprises a wavelength-specific sensitizer associated with one or more reactive species-generating photoinitiators. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.
    Type: Grant
    Filed: January 22, 1998
    Date of Patent: December 28, 1999
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Ronald Sinclair Nohr, John Gavin MacDonald