Derived From Aromatic Hydrocarbon Patents (Class 522/188)
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Patent number: 8999221Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance.Type: GrantFiled: December 24, 2013Date of Patent: April 7, 2015Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Kyouhei Sakita, Hiroyuki Yonezawa
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Patent number: 8933144Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.Type: GrantFiled: March 14, 2014Date of Patent: January 13, 2015Assignee: FUJIFILM CorporationInventors: Yuichiro Enomoto, Kunihiko Kodama, Shinji Tarutani
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Patent number: 8822563Abstract: Disclosed is a curable resin composition comprising a polymer (A) that has a main chain comprising carbon atoms and a side chain having a polymerizing unsaturated linking group and has a cyclic structure in the main chain and/or the side chain, and a compound having a polymerizing unsaturated group. The curable resin composition has good optical characteristics, good heat resistance and good moldability.Type: GrantFiled: January 18, 2013Date of Patent: September 2, 2014Assignee: FUJIFILM CorporationInventors: Hiroaki Mochizuki, Naoyuki Morooka, Rie Okutsu, Tatsuhiko Obayashi
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Patent number: 8815971Abstract: A procedure for improved temperature control in controlled radical polymerization processes is disclosed. The procedure is directed at controlling the concentration of the persistent radical in ATRP and NMP polymerizations procedures and the concentration of radicals in a RAFT polymerization process by feeding a reducing agent or radical precursor continuously or intermittently to the reaction medium through one of more ports.Type: GrantFiled: December 18, 2009Date of Patent: August 26, 2014Assignee: ATRP Solutions, Inc.Inventors: Wojciech Jakubowski, James Spanswick
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Patent number: 8796352Abstract: Provided is a material suitable for an optical element, which can be applied by inkjet, has an ultraviolet curable characteristic, and yields a cured product excellent in transparency and hardness and having a refractive index of more than 1.5. Specifically, an optical element excellent in transparency and hardness and having a refractive index of more than 1.5 is obtained by preparing a resin composition including at least: (A) 5 to 45 mass % of a vinyl group-containing copolymer obtained by copolymerization of a divinyl aromatic compound; (B) 55 to 94 mass % of a liquid photocurable polyfunctional (meth)acrylate having two or more (meth)acryloyl groups; (C) 0.97 to 20 mass % of a photopolymerization initiator; and (D) 0.03 to 1 mass % of a surfactant, and applying the resin composition onto a support substrate by inkjet, followed by photocuring.Type: GrantFiled: June 9, 2011Date of Patent: August 5, 2014Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.Inventors: Koichi Fujishiro, Masanao Kawabe, Tohru Saito, Takahiro Yoshioka
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Patent number: 8796350Abstract: An ultraviolet (UV) crosslinkable acrylic pressure sensitive adhesive comprises an acrylic copolymer and a cationic photoinitiator. The acrylic copolymer comprises pendant reactive functional groups. The pressure sensitive adhesive formed from the acrylic copolymer with the pendant reactive functional groups result in high green strength and/or high temperature holding strength of the adhesive.Type: GrantFiled: September 7, 2012Date of Patent: August 5, 2014Assignee: Henkel US IP LLCInventors: Yuxia Liu, Peter Palasz, Charles W. Paul, Paul B. Foreman
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Publication number: 20130270222Abstract: There is provided a planarizing film-forming composition for a hard disk. A planarizing film-forming composition for a hard disk comprising a hydrophobic coating material having a photopolymerizable group and an aromatic group, containing a polymer or a combination of a polymer and a compound selected from the group consisting of a polymer (A1), a polymer (A2), a polymer (A3), a compound (a1), a compound (a2), and a compound (a3).Type: ApplicationFiled: December 21, 2011Publication date: October 17, 2013Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Taku Kato, Keisuke Shuto, Junpei Kobayashi, Masayoshi Suzuki
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Patent number: 8552084Abstract: A process for preparing a pressure sensitive adhesive using a modified planetary roller extruder is described. The process in accordance with one aspect of the invention is a continuous process that includes introducing primary raw materials comprising a non-thermoplastic elastomer into a planetary roller extruder, introducing a heat-activatable crosslinker into the planetary roller extruder for mixing with the primary raw materials, and compounding the primary raw materials and the heat activatable crosslinker to form an adhesive composition while maintaining the temperature of the adhesive composition between about 25° C. and about 100° C. The non-thermoplastic elastomer is masticated during compounding and at least some of the heat-activatable crosslinker remains generally unactivated and is available for later activation.Type: GrantFiled: December 27, 2011Date of Patent: October 8, 2013Assignee: Intertape Polymer Corp.Inventors: John Kinch Tynan, Jr., Richard Walter St. Coeur, David Michael Kovach, Thomas Lombardo
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Patent number: 8404797Abstract: An end-modified soluble polyfunctional vinyl aromatic copolymer, which is improved in heat resistance, thermal stability, solvent solubility, and compatibility with acrylate compounds, and a curable resin composition using the same are disclosed. The end-modified soluble polyfunctional vinyl aromatic copolymer is obtained by allowing a divinyl aromatic compound (a), a monovinyl aromatic compound (b), and an aromatic ether compound (c) to react with each other, and has, at an end, an end group derived from the aromatic ether compound and having an acrylate bond. The copolymer has a number average molecular weight Mn of 500 to 100,000, an introduction amount (c1) of the end group derived from the aromatic ether compound satisfies (c1)?1.0 (group/molecule), a molar fraction a? of a structural unit derived from the divinyl aromatic compound and a molar fraction b? of a structural unit derived from the monovinyl aromatic compound in the copolymer satisfy 0.05?a?/(a?+b?)?0.95.Type: GrantFiled: March 3, 2009Date of Patent: March 26, 2013Assignee: Nippon Steel Chemical Co., Ltd.Inventors: Masanao Kawabe, Hiroko Terao, Natsuko Okazaki
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Publication number: 20120213969Abstract: A functionally graded shape memory polymer (SMP) that has a range of transition temperatures that are spatially distributed in a gradient fashion within one single article. The SMP is formed by post-curing a pre-cured glassy SMP in a linear temperature gradient that imposes different vitrification temperature limits at different positions along the gradient. Utilizing indentation-based surface shape memory coupled with optical measurements of photoelastic response, the capability of this material to respond over a wide range of thermal triggers is correlated with the graded glass transition behavior. This new class of SMP offers great potential for such applications as passive temperature sensing and precise control of shape evolution during a thermally triggered shape recovery.Type: ApplicationFiled: February 21, 2012Publication date: August 23, 2012Applicant: SYRACUSE UNIVERSITYInventors: Patrick Mather, Pine Yang, Xiaofan Luo, Andrew M. DiOrio
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Patent number: 8163839Abstract: A pigment dispersant contains (a) 5 to 30 wt % of aromatic and/or heterocyclic vinyl monomer units, (b) 10 to 30 wt % of monomer units having acid groups, (c) 40 to 80 wt % of (meth)acrylate ester monomer units, and (d) 5 to 30 wt % of monomer units having poly(C2-6-alkylene glycol) chains or mono(C1-22-alkyl)ether chains of said glycol, said poly(C2-6-alkylene glycol) chains or mono (C1-22-alkyl)ether chains having a number average molecular weight of from 150 to 1,500. A sum of the monomer units (a) to (d) amounts to 100 wt %. The pigment dispersant has an acid value of from 30 to 300 mgKOH/g, a number average molecular weight of from 5,000 to 30,000, and a content of organic compounds, boiling points of which are not higher than 250° C., of not higher than 0.2 wt %. Also disclosed are its production process, its aqueous solution and its dispersion.Type: GrantFiled: June 4, 2008Date of Patent: April 24, 2012Assignee: Dainichiseika Color & Chemicals Mfg. Co., Ltd.Inventors: Hiroyuki Shimanaka, Yoshikazu Murakami, Satoshi Isobe, Takaaki Ota, Jyunki Takada, Satoshi Dosho
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Patent number: 8153744Abstract: There is provided a novel hyperbranched polymer in which the refractive index is precisely controlled while retaining its hyperbranched structure, and a method for producing the hyperbranched polymer. Further, there is also provided an optically and thermally stable novel hyperbranched polymer in which the desired refractive index is precisely controlled, and a method for producing the hyperbranched polymer. The hyperbranched polymer has, as a branched structure, a repeating unit structure produced from two dithiocarbamate compounds each having a vinyl structure, at the polymerization initiation site having a vinyl structure. A specific example of the hyperbranched polymer can be produced by subjecting to a living radical polymerization N,N-diethyldithiocarbamylmethylstyrene in the presence of N,N-diethyldithiocarbamylethyl methacrylate.Type: GrantFiled: September 4, 2007Date of Patent: April 10, 2012Assignees: Nissan Chemical Industries, Ltd., Tokyo Institute of TechnologyInventors: Hiroki Takemoto, Masaaki Ozawa, Koji Ishizu
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Publication number: 20120035295Abstract: A method for removing vinyl monomers from a gas stream comprises steps of: irradiating a photoactive-inorganic medium by a light emitting unit to activate the photoactive-inorganic medium; and pumping a gas stream including vinyl monomers to contact with the activated photoactive-inorganic medium to make the vinyl monomers in the gas stream to polymerize on the photoactive-inorganic medium to jointly form a polymeric nano-composite.Type: ApplicationFiled: October 18, 2011Publication date: February 9, 2012Inventors: Wu-jang HUANG, Ling-Yin Chang, Yen-Chia Liu, Hsiu-Hsien Wu, Yi-Ching Li
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Patent number: 8110612Abstract: A process for preparing a pressure sensitive adhesive using a modified planetary roller extruder is described. The process in accordance with one aspect of the invention includes introducing primary raw materials including a non-thermoplastic elastomer into a feeding section of the modified planetary roller extruder, conveying the raw materials from the feeding section to a compounding section of the modified planetary roller extruder, continuously mixing the primary raw materials in the compounding section to produce a homogeneous adhesive composition. The adhesive composition may be applied to a web-form material. The compounding section of the modified planetary roller extruder includes a main spindle surrounded by and intermeshed with a plurality of planetary spindles at least one of which is a double transversal mixing spindle having a plurality of back-cut helical flights.Type: GrantFiled: February 5, 2007Date of Patent: February 7, 2012Assignee: Intertape Polymer Corp.Inventors: John Kinch Tynan, Jr., Richard Walter St. Coeur, David Michael Kovach, Thomas Lombardo
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Patent number: 8025833Abstract: A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.Type: GrantFiled: May 26, 2009Date of Patent: September 27, 2011Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Akinori Fujita, Tadashi Oomatsu, Akiyoshi Goto
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Publication number: 20110082230Abstract: A procedure for improved temperature control in controlled radical polymerization processes is disclosed. The procedure is directed at controlling the concentration of the persistent radical in ATRP and NMP polymerizations procedures and the concentration of radicals in a RAFT polymerization process by feeding a reducing agent or radical precursor continuously or intermittently to the reaction medium through one of more ports.Type: ApplicationFiled: December 18, 2009Publication date: April 7, 2011Inventors: Wojciech Jakubowski, James Spanswick
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Publication number: 20110077319Abstract: A pigment dispersion including a pigment and a block polymer including a repeating unit including a hetero ring residue or an anthraquinone ring residue of a colorant is disclosed.Type: ApplicationFiled: September 17, 2010Publication date: March 31, 2011Applicant: FUJIFILM CORPORATIONInventor: Koji YASUDA
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Patent number: 7875659Abstract: This invention provides a water-soluble macromonomer having terminal unsaturation obtained by polymerization of monomers in the presence of inclusion complex of chain transfer agent in aqueous system. Hydrophobic chain transfer agent AMSD forms an inclusion complex with methylated cyclodextrin. The complexation enhances its solubility in water and enables the polymerization of water-soluble monomers in aqueous medium. After polymerization cyclodextrin is removed and the macromer with terminal unsaturation obtained can be used further for copolymerization with any vinyl monomer.Type: GrantFiled: March 28, 2007Date of Patent: January 25, 2011Assignee: Council of Scientific and Industrial ResearchInventors: Mohan Gopalkrishna Kulkarni, Prerana Maruti Patil
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Publication number: 20100286304Abstract: Disclosed herein is a polymeric composition comprising a polymeric composition comprising a first crosslinked network; and a second crosslinked network; wherein the first crosslinked network is crosslinked at a first stress and/or a first strain and the second crosslinked network is crosslinked at a second stress and/or a second strain; where the first stress and/or the first strain is different from the second stress and/or the second strain either in magnitude or direction. Disclosed herein is a method comprising subjecting a polymeric mass to a first stress and/or a first strain level; crosslinking the polymeric mass to form a first crosslinked network; subjecting the polymeric mass to a second stress and/or a second strain level; and crosslinking the polymeric mass to form a second crosslinked network; where the first stress and/or the first strain level is different from the second stress and/or the second strain level.Type: ApplicationFiled: November 10, 2009Publication date: November 11, 2010Applicant: UNIVERSITY OF MASSACHUSETTSInventors: Alan James Lesser, Naveen Kumar Singh, Mohit Mamodia
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Publication number: 20100179242Abstract: In general, the present invention describes the initiation of photochemical reactions at a metal-solution interface irradiated by light. Surface plasmon energy is used to initiate reaction of species in solution, the reaction occurring at, on or near a surface which is in contact with the solution. The present invention describes an application of this effect e.g. for polymerization purposes.Type: ApplicationFiled: July 28, 2007Publication date: July 15, 2010Inventors: Sergey Anatoliyovich Piletsky, Michael James Whitcombe, Volodymyr Chegel
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Publication number: 20090283937Abstract: A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.Type: ApplicationFiled: May 26, 2009Publication date: November 19, 2009Applicant: FUJIFILM CorporationInventors: Kunihiko KODAMA, Akinori FUJITA, Tadashi OOMATSU, Akiyoshi GOTO
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Publication number: 20090221729Abstract: This invention provides a water-soluble macromonomer having terminal unsaturation obtained by polymerization of monomers in the presence of inclusion complex of chain transfer agent in aqueous system. Hydrophobic chain transfer agent AMSD forms an inclusion complex with methylated cyclodextrin. The complexation enhances its solubility in water and enables the polymerization of water-soluble monomers in aqueous medium. After polymerization cyclodextrin is removed and the macromer with terminal unsaturation obtained can be used further for copolymerization with any vinyl monomer.Type: ApplicationFiled: March 28, 2007Publication date: September 3, 2009Applicant: COUNCIL OF SCIENTIFIC AND INDUSTRIAL RESEARCHInventors: Mohan Gopalkrishna Kulkarni, Prerana Maruti Patil
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Patent number: 7572840Abstract: The present invention relates to a method for manufacturing super-absorbent polymers, comprising providing a reaction mixture which comprises at least a first monomer and a second monomer and a radical-forming polymerization initiator, and subsequently causing the monomers to polymerize under the influence of an energy source, wherein radical formation occurs and the polymerization is started, wherein the first monomer is neutralized with an inorganic base before polymerization, in addition to the manufactured super-absorbent polymers. The invention further relates to a method for applying a coating of super-absorbent polymers to a carrier.Type: GrantFiled: October 5, 2004Date of Patent: August 11, 2009Assignee: Vepetex B.V.Inventors: Paul Kleijn, Herman Reezigt
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Patent number: 7495061Abstract: A hydrophilic, aromatic-based monomer has an aromatic group substituted with at least one hydrophilic substituent and a reactive functional group. Polymers comprising such a hydrophilic, aromatic-based monomers avoid or reduce the risk of forming vacuoles of absorbed water. Furthermore, such polymers have high refractive index, and, thus, are advantageously used for making ophthalmic devices, such as intraocular lenses, contact lenses, corneal rings, corneal inlays, and keratoprostheses.Type: GrantFiled: May 27, 2005Date of Patent: February 24, 2009Assignee: Bausch + Lomb IncorporatedInventors: Joseph C. Salamone, Jay F. Kunzler, Richard M. Ozark
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Publication number: 20090035528Abstract: A three-dimensional shaped structure is prepared from a multi-photon reactive composition including: (a) at least one reactive species; (b) a multi-photon photoinitiator system; and (c) a plurality of substantially inorganic particles, wherein the particles have an average particle size of less than about 10 microns in diameter.Type: ApplicationFiled: July 11, 2008Publication date: February 5, 2009Inventors: Catherine A. Leatherdale, Craig R. Schardt, D. Scott Thompson, Wendy L. Thompson
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Patent number: 7449497Abstract: Monomers (e.g. thinphenes) are caused to polymerise by mixing them with an oxidising agent (and generally a solvent comprising water) and irradiating the mixture with light (visible or UV). Polymer properties can be varied by doping or chemical modification. Uses include sensor elements for assays and electrical components such as electrodes.Type: GrantFiled: March 24, 2003Date of Patent: November 11, 2008Assignee: Cranfield UniversityInventors: Sergey Anatoliyovich Piletsky, Olena Volodimirivna Piletska, Anthony Peter Francis Turner, Khalku Karim, Beining Chen
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Patent number: 7112614Abstract: A method is provided for obtaining crosslinked polymers, particularly fluorinated polymers having pendent sulfonic acid groups, by crosslinking through pendent groups which include a sulfonyl chloride group (—SO2Cl). The sulfonyl chloride group may be removed by application of electromagnetic radiation, typically in the ultraviolet band, or a radical initiator, leaving behind a radical which readily binds covalently to other polymer strands or to crosslinking agents to form crosslinks. Typically, the polymer is made by providing a polymer comprising pendent groups which include a group according to the formula —SO2F and converting at least a portion of the —SO2F groups to —SO2Cl. After crosslinking, the remaining —SO2F groups may be converted to sulfonic acid groups, yielding a crosslinked polymer electrolyte. Such crosslinked polymer electrolytes may be used to make polymer electrolyte membranes (PEM's) that may be used in electrolytic cells such as fuel cells.Type: GrantFiled: December 8, 2003Date of Patent: September 26, 2006Assignee: 3M Innovative Properties CompanyInventors: Naiyong Jing, Steven J. Hamrock
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Patent number: 7074841Abstract: A method is provided for making a crosslinked polymer electrolyte, typically in the form of a membrane for use as a polymer electrolyte membrane in an electrolytic cell such as a fuel cell, by trimerization of nitrile groups contained on groups pendant from the polymer. The resulting polymer electrolyte membrane comprises a highly fluorinated polymer comprising: a perfluorinated backbone, first pendent groups which comprise sulfonic acid groups, and crosslinks comprising trivalent groups according to the formula: The first pendent groups are typically according to the formula: —R1—SO3H, where R1 is a branched or unbranched perfluoroalkyl or perfluoroether group comprising 1–15 carbon atoms and 0–4 oxygen atoms, most typically —O—CF2—CF2—CF2—CF2—SO3H or —O—CF2—CF(CF3)—O—CF2—CF2—SO3H.Type: GrantFiled: November 13, 2003Date of Patent: July 11, 2006Inventors: Michael A. Yandrasits, Steven J. Hamrock, Werner M. Grootaert, Miguel A. Guerra, Naiyong Jing
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Patent number: 6908952Abstract: Photoiniferters for controlled radical polymerizations are described. The photoiniferters have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.Type: GrantFiled: March 21, 2003Date of Patent: June 21, 2005Assignee: 3M Innovative Properties CompanyInventors: Kevin M. Lewandowski, Michael S. Wendland, Duane D. Fansler, Steven M. Heilmann, Babu N. Gaddam
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Patent number: 6869983Abstract: An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.Type: GrantFiled: June 10, 2003Date of Patent: March 22, 2005Assignee: The University of ChicagoInventors: Gerard T. Caneba, Vijaya Raghavan Tirumala, Derrick C. Mancini, Hsien-Hau Wang
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Patent number: 6780472Abstract: A monomer useful in the formulation of a radiation curable coatable composition comprises (a) polyfunctional isocyanurate having at least three terminal reactive groups reacted with (b) hydroxyalkyl acrylate and (c) tertiary amine alcohol in a molar ratio of a:b:c of about 1:1-2.5:0.5-2, wherein b+c is at least 3 and no greater than the total number of terminal reactive groups of (a). The monomer is included in a radiation curable coatable composition suitable for use as a floor finish and in a floor finishing system comprising the foregoing coatable composition with a primer. A method for the treatment of a substrate using the floor finish and the floor finishing system is also described.Type: GrantFiled: December 19, 2001Date of Patent: August 24, 2004Assignee: 3M Innovative Properties CompanyInventors: Steven J. Hamrock, Fidelis C. Onwumere, Bradford B. Wright, Michael A. Yandrasits
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Patent number: 6716564Abstract: A radiation sensitive resin composition containing an alkali-soluble resin, for example a novolak-quinonediazide positive-working radiation sensitive resin composition and a chemically amplified negative-working resin composition, wherein the alkali-soluble resin contains at least an alkali-soluble resin obtained by polycondensation of a compound represented by the following general formula (I) and a phenol if necessary, with an aldehyde. wherein R represents a hydroxyl group or an alkyl group with 1 to 4 carbon atoms, n is 0 or an integer of 1 to 3 and, when n is 2 or 3, each R group may be the same or different.Type: GrantFiled: December 6, 2001Date of Patent: April 6, 2004Assignee: Clariant Finance (BVI) LimitedInventors: Satoshi Kobayashi, Hidekazu Shioda, Haruhiko Itoh
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Patent number: 6656980Abstract: This invention relates to a process of polymerization of unsaturated fatty acids, esters of unsaturated fatty acids, unsaturated hydrocarbons or esters of unsaturated hydrocarbons, or unsaturated derivatives of these products by dielectric heating, as well as to the polymers obtained and uses of these polymers. The polymerization process is characterized by the fact that the reagent or reagent mixture is subjected to dielectric hearting to effect polymerization.Type: GrantFiled: July 31, 2001Date of Patent: December 2, 2003Assignee: Aldivia S.A.Inventor: Pierre Charlier De Chily
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Patent number: 6624273Abstract: Non-tacky, base polymers are plasticized into pressure-sensitive adhesives and comprise: a) about 100 parts by weight of a base copolymer having a Tg greater than about 0° C., wherein the base copolymer is formed from and comprises: (1) about 50 to 70% by weight of a high Tg comonomer component, wherein the homopolymer formed from the high Tg comonomer component has a Tg of at least about 20° C.; (2) optionally, up to about 20% by weight based on the total weight of the base copolymer of an acidic comonomer; and (3) about 30 to 50% by weight of one or more low Tg (meth)acrylate comonomer, wherein the Tg homopolymer of the low Tg comonomer is less than about 20° C., and b) about 1 to about 100 parts based on the base copolymer of a nonreactive, non-volatile, non-acrylic-based plasticizing agent.Type: GrantFiled: August 13, 1999Date of Patent: September 23, 2003Assignee: 3M Innovative Properties CompanyInventors: Albert I. Everaerts, Eric B. T. Moonen, Peter A. Stark
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Patent number: 6576684Abstract: Disclosed are compositions from which radically initiated oligomers/polymers having a controlled molecular weight, low polydispersity and a vinyl or dienyl end group are prepared. Further subjects of the invention are a process for controlled radical polymerization, oligomers/polymers obtainable by said process and the use of specific addition fragmentation agents for the polymerization process. The addition fragmentation agents are new in part and these are also subject of the present invention. The addition fragmentation agents are of the formula (Ia), (Ib) or (Ic) where Y is a group which activates the double bond towards Michael addition.Type: GrantFiled: February 15, 2001Date of Patent: June 10, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Vincent Desobry, Peter Murer, Anne Schuwey
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Patent number: 6518326Abstract: The invention relates to open chain alkoxyamine compounds useful as polymerization regulators. The open chain alkoxyamine compounds are useful for the polymerization of ethylenically unsaturated monomers. The compounds of the present invention provide polymeric resin products having low polydispersity. The polymerization process proceeds with enhanced monomer to polymer conversion efficiency. In particular, this invention relates to stable free radical-mediated polymerization processes which provide homopolymers, random copolymer, block copolymers, multiblock copolymers, graft copolymers and the like, at enhanced rates of polymerization and enhanced monomer to polymer conversions.Type: GrantFiled: January 29, 2001Date of Patent: February 11, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Peter Nesvadba, Andreas Kramer, Marie-Odile Zink, Dario Lazzari
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Patent number: 6482868Abstract: Accelerators that can be useful for an energy polymerizable composition comprising a cationically curable material; energy polymerizable -compositions comprising at least one cationically curable material and an initiation system therefor, the initiation system comprising at least one organometallic complex salt and at least one accelerator; and a method for curing the compositions. The cured compositions can provide useful articles. The invention also provides compositions of matter comprising an organometallic complex salt and at least one compound selected from the Class 1 and Class 2 compounds disclosed herein.Type: GrantFiled: June 26, 2000Date of Patent: November 19, 2002Assignee: 3M Innovative Properties CompanyInventors: Wayne Scott Mahoney, Peggy Sperl Willett
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Patent number: 6468595Abstract: A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers.Type: GrantFiled: February 13, 2001Date of Patent: October 22, 2002Assignee: Sigma Technologies International, Inc.Inventors: Michael G. Mikhael, Angelo Yializis
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Patent number: 6458864Abstract: Compounds with chain transfer groups of the formula I, II, III and IV wherein a is 1 or 2; Ar and Ar1 inter alia are phenyl; Ar2 inter alia is phenylene, these groups being unsubstituted or substituted; X is a direct bond, —O—, —S— or —N(R6)—; Y inter alia is hydrogen or C1-C12alkyl; M1 is —NR3R4 or —OH, or M1 is Ar when R1 and R2 are alkoxy, or aryloxy; R1 and R2 independently of one another e.g. are C1-C8alkyl; R3 and R4 for example are C1-C12alkyl, or together are C3-C7alkylene; R5 inter alia is C1-C6alkylene or a direct bond; R6 is for example hydrogen; and Z is a divalent radical, provided that at least one of the radicals Ar, Ar1, Ar2, R1, R2, R3, R4, R5 or Y is substituted by SH groups; are suitable for the thermal preparation of macrophotoinitiators which are polymerized photochemically to give block-copolymers.Type: GrantFiled: November 27, 2000Date of Patent: October 1, 2002Assignee: Ciba Specialty Chemicals CorporationInventors: Toshikage Asakura, Masaki Ohwa, Hitoshi Yamato, Asako Ito
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Patent number: 6403674Abstract: One embodiment of the present invention is a method for synthesizing superabsorbent polyacrylate polymers comprising the steps of providing an acrylate monomer, a multifunctional monomer, and free radical initiator in the absence of a solvent; mixing the acrylate monomer, multifunctional monomer, and free radical initiator to create a solvent free solution; and subjecting the solvent free solution to radiation to create a cross-linked polymer. The product created by this method is also a part of the present invention.Type: GrantFiled: November 17, 2000Date of Patent: June 11, 2002Assignee: Eveready Battery Company, Inc.Inventor: Mark A. Schubert
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Patent number: 6380277Abstract: The present invention relates to iodonium salts containing urethane groups of reduced crystallization tendency, to a process for their preparation, and to their use for the radiation curing of cationically curing compositions.Type: GrantFiled: September 19, 2000Date of Patent: April 30, 2002Assignee: Goldschmidt AGInventors: Sascha Oestreich, Andreas Weier, Stefanie Volkmer
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Patent number: 6342542Abstract: A radiation sensitive resin composition containing an alkali-soluble resin, for example a novolak-quinonediazide positive-working radiation sensitive resin composition and a chemically amplified negative-working resin composition, wherein the alkali-soluble resin contains at least an alkali-soluble resin obtained by polycondensation of a compound represented by the following general formula (I) and a phenol if necessary, with an aldehyde. wherein R represents a hydroxyl group or an alkyl group with 1 to 4 carbon atoms, n is 0 or an integer of 1 to 3 and, when n is 2 or 3, each R group may be the same or different.Type: GrantFiled: October 12, 2000Date of Patent: January 29, 2002Assignee: Clariant Finance (BVI) LimitedInventors: Satoshi Kobayashi, Hidekazu Shioda, Haruhiko Itoh
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Patent number: 6316519Abstract: Synthesis of linear acrylic polymers and copolymers having controlled molecular weight by the photoinitiated free radical polymerization of vinyl monomers in the presence of chain transfer agents to produce polymers useful in coating compositions and the like, including printing inks.Type: GrantFiled: August 19, 1999Date of Patent: November 13, 2001Assignee: E. I. du Pont de Nemours and CompanyInventors: Charles Thomas Berge, Vincent Desobry
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Patent number: 6127447Abstract: A radiation curable coating composition is provided and includes an effective amount of cationic photoinitiator, in combination with a charge transfer complex, the charge transfer complex comprising at least one electron withdrawing reactant component and at least one electron donating reactant component free radically reactive therewith, the electron withdrawing reactant component comprising an unsaturated nitrogen containing compound and the electron donating reactant component comprising an unsaturated compound having at least one vinyl ether group, the electron donating reactant component may be separate from or structurally incorporated within the electron withdrawing reactant component and an effective amount of a cationic photoinitiator. A photopolymerization process employing the composition is also provided.Type: GrantFiled: July 30, 1999Date of Patent: October 3, 2000Assignee: Fusion UV Systems, Inc.Inventors: Mark Mitry, Roger McCartney, Mohamed R. Amin
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Patent number: 6124371Abstract: The invention relates to a composition comprising polymerizable material and an anionic photocatalyst. The photocatalyst is a photolabile compound able to liberate a strong base having a pK.sub.a .gtoreq.12. The catalyst can be illustrated by the structural formula Z-A wherein Z is a photolabile group and A is a strong base, for example, a nitrogen containing compound such as, a secondary amine, a guanidine or amidine and Z is covalently bound to A.Type: GrantFiled: August 21, 1998Date of Patent: September 26, 2000Assignee: DSM N.V.Inventors: Dirk A. W. Stanssens, Johan F. G. A. Jansen
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Patent number: 6107364Abstract: Described are a polymerizable composition comprising methyl styrene monomer, polymers comprising monomeric units derived from methyl styrene monomers, and optical products comprising these polymers.Type: GrantFiled: May 9, 1997Date of Patent: August 22, 2000Assignee: 3M Innovative Properties CompanyInventors: Bettie C. Fong, David B. Olson
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Patent number: 6025409Abstract: The invention relates to a coating composition comprising (a) a radiation-curable binder composition comprising an unsaturated compound having at least one maleate, fumerate, itaconate, citraconate or mesaconate group; (b) an unsaturated vinylether compound and a compound which forms a strong exciplex with (a) or (b); that is otherwise free of a photoinitiating compound.Type: GrantFiled: August 28, 1998Date of Patent: February 15, 2000Assignee: DSM N.V.Inventor: Johan F. G. A. Jansen
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Patent number: 6015841Abstract: This invention relates to an initiator system for the polymerization of isoolefins having 4 to 16 carbon atoms, optionally with monomers polymerizable with isoolefins, the system consisting of or one or more aromatic or heteroaromatic, polycyclic hydrocarbons and an aged, organic solution of vanadium tetrachloride, wherein the concentration of the vanadium tetrachloride is 0.01 mmol to 500 mmol per liter of solvent and the molar ratio of aged vanadium tetrachloride to polycyclic hydrocarbons is in the range from 100:1 to 1:100.It is possible by means of the initiator system according to the invention to produce polyisoolefins, in particular butyl rubbers, at relatively high temperatures with only a low gel content and of a sufficiently high molecular weight.Type: GrantFiled: June 30, 1997Date of Patent: January 18, 2000Assignee: Bayer AGInventors: Gerhard Langstein, Martin Bohnenpoll, Uwe Denninger, Werner Obrecht, Peter Plesch
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Patent number: 6008265Abstract: An ionic compound comprising at least one group A.sup.+ X.sup.-, comprising:a cationic group A.sup.+ selected from the group consisting of biaryliodonium, arylsulfonium, arylacylsulfonium, diazonium and organometallic cations comprising a transition metal complexed with at least one unsaturated cyclic compound comprising 4-12 carbon atoms, said cationic group being part of a polymer chain; whereinX.sup.- is an imide anion, [FSO.sub.2 NSO.sub.2 R'.sub.F ].sup.- or [R.sub.F CH.sub.2 OSO.sub.2 NSO.sub.2 R'.sub.F ].sup.- or [(R.sub.F).sub.2 CHOSO.sub.2 NSO.sub.2 R'.sub.F ].sup.-, or a methylide anion [FSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.-, or a [R.sub.F CH.sub.2 OSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.- or [(R.sub.F).sub.2 CHOSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.31 .Type: GrantFiled: October 3, 1997Date of Patent: December 28, 1999Assignees: Hydro-Quebec, Centre National de la Recherche ScientifiqueInventors: Alain Vallee, Michel Armand, Xavier Ollivrin, Christophe Michot
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Patent number: 6008268Abstract: A method of generating reactive species which includes exposing a photoreactor composition to radiation, in which the photoreactor composition comprises a wavelength-specific sensitizer associated with one or more reactive species-generating photoinitiators. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.Type: GrantFiled: January 22, 1998Date of Patent: December 28, 1999Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald Sinclair Nohr, John Gavin MacDonald