Specified Rate-affecting Material Is A Carboxylic Acid Or Derivative Patents (Class 522/20)
  • Patent number: 4970136
    Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the matal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.
    Type: Grant
    Filed: June 5, 1989
    Date of Patent: November 13, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Martin Riediker, Eginhard Steiner, Harry Beyeler, Manfred Rembold, Franciszek Sitek
  • Patent number: 4842968
    Abstract: There is disclosed herein a hologram recording medium comprising of substrate formed of transparent and non-light scattering material having a plurality of open pores for said substrate and photopolymerization composition impregnated in said open pores. The photopolymerization composition consists essentially of a photopolymerizable monomer or oligomer which adheres to the surface of said open pores, a photopolymerization initiator and activator for controlling the photopolymerization speed.
    Type: Grant
    Filed: December 16, 1985
    Date of Patent: June 27, 1989
    Assignee: Sony Corporation
    Inventors: Chiaki Kojima, Hidetoshi Shimizu
  • Patent number: 4721734
    Abstract: Compounds of the formula ##STR1## wherein R.sub.1 is hydrogen, chlorine, phenyl, dialkylamino of 2-4 carbon atoms or alkyl or alkoxy each of up to 18 carbon atoms; R.sub.2 is hydrogen, chlorine, bromine or alkyl or alkoxy each of up to 4 carbon atoms; R.sub.3 and R.sub.4, which can be the same or different, each is hydrogen or alkyl of up to 6 carbon atoms; R.sub.5 is hydrogen or alkyl or alkanoyl each of up to 4 carbon atoms; and R.sub.6 is hydrogen or methyl, with the proviso that not all of R.sub.1 to R.sub.6 simultaneously are hydrogen, are effective photosensitizers, especially for photopolymerization of unsaturated compounds and for hardening of printing dyes.
    Type: Grant
    Filed: August 31, 1984
    Date of Patent: January 26, 1988
    Assignee: Merck Patent Gesellschaft mit beschrankter Haftung
    Inventors: Juergen Gehlhaus, Manfred Kieser
  • Patent number: 4707431
    Abstract: This invention relates to an optical information recording medium comprising a substrate provided at least with an underlayer and a recording layer thereon, said underlayer being prepared by curing a light-curable composition containing a reducing agent, a photo-polymerization initiator and acrylate monomer and/or methacrylate monomer and/or their corresponding oligomer.
    Type: Grant
    Filed: October 25, 1985
    Date of Patent: November 17, 1987
    Assignee: Ricoh Co., Ltd.
    Inventor: Masaakira Umehara
  • Patent number: 4599155
    Abstract: There is disclosed a resin composition comprising(A) a spiro ortho ester compound and/or a spiro ortho carbonate compound;(B) an aluminum compound; and(C) a silanol compound or a silicon compound which is capable of generating a silanol group;the amounts of components (B) and (C) being within the range of 0.001 to 10% by weight and 0.1 to 20% by weiht, based on the amount of component (A), respectively.The resin composition of this invention is excellent in volumetric shrinkage performance at curing operation and is good in storability. Therefore, the cured product can be used for a wide variety of industrially valuable applications, such as an ink, a coating, an adhesive, a surface coating, an encapsulation and an electrical insulating material.
    Type: Grant
    Filed: September 21, 1984
    Date of Patent: July 8, 1986
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shuichi Suzuki, Moriyasu Wada, Shuzi Hayase
  • Patent number: 4564646
    Abstract: A light- and thermosetting resin composition comprising (a) an unsaturated epoxy ester having a resin acid value of 5 or less, or a reaction product having a resin acid value of 5 or less obtained by reacting an unsaturated epoxy ester having a resin acid value of more than 5 with a monoepoxide, (b) one or more .alpha.,.beta.-unsaturated ethylenic monomers, and (c) one or more photosensitizers and peroxides can produce insulated electrical machinery and appliances improved in reliance and performance in a short treating time.
    Type: Grant
    Filed: February 16, 1984
    Date of Patent: January 14, 1986
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Hisashi Nishigaki, Yuji Aimono