Specified Rate-affecting Material Contains Only Carbon, Hydrogen, Or Halogen And At Least One Atom Of Carbon Is Bonded To Hydrogen Or A Halogen Atom Patents (Class 522/23)
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Patent number: 10752787Abstract: Embodiments are directed to a method of making an antifouling and bactericidal coating with tailorable surface topology. The method includes depositing a layer of branched polyethyleneimine (BPEI) and diamino-functionalized poly(propylene oxide) (PPO) in a mixture of water and organic solvent on a substrate to form a layer of BPEI/PPO. The method includes depositing a layer of glyoxal in a water-containing solution on the layer of BPEI/PPO. The method further includes curing the layer of BPEI/PPO and layer of glyoxal to form a homogenous, glyoxal crosslinked BPEI/PPO coating, where the curing induces local precipitation and alteration of the glyoxal crosslinked BPEI/PPO coating to provide a textured surface.Type: GrantFiled: November 6, 2019Date of Patent: August 25, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Amos Cahan, Xin Ding, Mareva B. Fevre, James L. Hedrick, Zhen Chang Liang, Nathaniel H. Park, Theodore G. van Kessel, Rudy J. Wojtecki, Yi Yan Yang
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Publication number: 20120207939Abstract: The photocuring efficiency of a photoinitiator is increased by mixing it with an organic phosphite and an aldehyde. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment.Type: ApplicationFiled: February 14, 2011Publication date: August 16, 2012Inventor: Deepak Shukla
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Publication number: 20120208914Abstract: The photocuring efficiency of a photoinitiator is increased by mixing it with an organic phosphite and an aldehyde. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment.Type: ApplicationFiled: February 14, 2011Publication date: August 16, 2012Inventor: Deepak Shukla
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Publication number: 20120207945Abstract: A photocurable ink contains a colorant dissolved or dispersed within a solvent, a photoinitiator, an organic phosphite, an aldehyde, and a photocurable compound. The organic phosphite is present in a molar excess relative to the aldehyde moieties that are present. The photocurable ink can be used for imaging or other applications where a uniform or patterned image is desired. The photocurable ink can be cured partially before application, or totally cured after application.Type: ApplicationFiled: February 14, 2011Publication date: August 16, 2012Inventor: Deepak Shukla
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Publication number: 20110195249Abstract: A photocationically polymerizable adhesive composition and an optical member, the photocationically polymerizable adhesive composition including about 75 to about 99.8 parts by weight of a compound including one of aliphatic epoxy, alicyclic epoxy, oxetane, and vinyl ether compounds, about 0.1 to about 5 parts by weight of a titanate coupling agent, and about 0.1 to about 20 parts by weight of a photopolymerization initiator, wherein a sum of weights of the compound, the titanate coupling agent, and the photopolymerization initiator is 100 parts by weight.Type: ApplicationFiled: April 22, 2011Publication date: August 11, 2011Inventors: Cheong Hun SONG, Hiroshi Ogawa, Tatsuhiro Suwa
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Publication number: 20100198168Abstract: The invention relates to a coating formulation for preparing a hydrophilic coating, wherein the hydrophilic coating formulation comprises a supporting monomer and/or polymer comprising at least 2 reactive moieties capable of undergoing polymerization reactions, a polyelectrolyte, a Norrish Type I photoinitiator, and a Norrish Type II photoinitiator.Type: ApplicationFiled: February 27, 2008Publication date: August 5, 2010Applicant: DSM IP ASSETS B.V.Inventor: Marnix Rooijmans
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Patent number: 7615323Abstract: Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein ?1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from aType: GrantFiled: November 11, 2005Date of Patent: November 10, 2009Assignee: Kodak Graphic Communications, GmbHInventors: Bernd Strehmel, Harald Baumann, Udo Dwars, Detlef Pietsch, Axel Draber, Michael Mursal
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Patent number: 7537452Abstract: The invention features a photopolymerizable composition that comprises a cationically polymerizable resin, and a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and one or more anthracene-based compounds as electron donors. Electron donor combinations used in the invention include multiple substituted anthracene compounds or a combination of at least one substituted anthracene compound with unsubstituted anthracene.Type: GrantFiled: August 16, 2007Date of Patent: May 26, 2009Assignees: Curators of the University of Missouri, 3M Innovative Properties Company 3M Center, 3M ESPE AGInventors: Joel D. Oxman, Karsten Dede, Craig A. Dykstra, Victoria A. Russell, Christoph Thalacker, Wolfgang Weinmann
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Patent number: 7256221Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.Type: GrantFiled: November 7, 2003Date of Patent: August 14, 2007Assignee: Corning IncorporatedInventors: Kelsee L. Coykendall, Paul G. Dewa, Robert Sabia, David C. Sauer, Paul J. Shustack, Kamal K. Soni
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Patent number: 6908875Abstract: An organometallic composition, suitable for use in curing polyisocyanate compositions, includes a complex of at least one metal selected from iron, cobalt and aluminum and at least one ?-dicarbonyl compound wherein when the metal is iron (II) or cobalt (II) the molar ratio of ?-dicarbonyl compound to metal is in the range from 2.1:1 to 10:1, and when the metal is aluminum (III), iron (III) or cobalt (III) the molar ratio of ?-dicarbonyl compound to metal is in the range from 3.1:1 to 10:1. A polyisocyanate composition containing the organometallic composition and a process for binding lignocellulosic material is also described.Type: GrantFiled: February 1, 2002Date of Patent: June 21, 2005Assignee: Acma LimitedInventors: Christopher J Skinner, Martin G Partridge
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Publication number: 20030092788Abstract: A photopolymerizable composition sensitive to near infrared radiation, comprises: (i) a photopolymerizable monomer or oligomer, or a mixture thereof, capable of forming a polymer having predetermined optical properties; (ii) a photoinitiator sensitive to near infrared radiation, the photoinitiator comprising a dye sensitizer and an initiator, wherein the dye sensitizer is a cyanine dye having a perchlorate anion and the initiator is an electron donor; and (iii) a filler having optical properties selected to contrast with the optical properties of the polymer. The composition of the invention is particularly useful for producing holographic polymer dispersed liquid crystal (H-PDLC) materials and reversible dye doped polymer (RDDP) materials having improved switching characteristics.Type: ApplicationFiled: July 11, 2002Publication date: May 15, 2003Inventors: Tigran Galstian, Amir Tork
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Patent number: 6503959Abstract: A photocurable composition comprising (A) an &agr;-cyanoacrylate and (B) a metallocene compound comprising a transition metal of Group VIII of the periodic table and aromatic electron system ligands selected from &pgr;-arenes, indenyl, &eegr;-cyclopentadienyl. The photocurable composition may further comprise (C) a cleavage-type photoinitiator. The photocurability of the photocurable composition can be greatly improved by incorporating a cleavage type photoinitiator into the composition. Even when the composition contains a radical-polymerizable compound such as an acrylic compound, it can be rapidly cured due to the cleavage type photoinitiator contained therein. In the case where the cleavage-type photoinitiator used is a peroxide, heating can also be used to cure the composition. In the case where the cleavage type photoinitiator used is an azo compound, the composition can be foamed by regulating the addition amount of the photoinitiator or the quantity of light with which the composition is irradiated.Type: GrantFiled: October 11, 1996Date of Patent: January 7, 2003Assignee: Three Bond Co., Ltd.Inventors: Yuko Nishiyama, Hiroyuki Mikuni
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Patent number: 6432610Abstract: Dye precursor molecules—normally rhodamine base—held in a transparent matrix are reactive with acids, bases, ions or radicals—and in the case of rhodamine are reactive with acids—to produce dye molecules—i.e., rhodamine—having markedly different spectroscopic properties. Light-sensitive molecules-normally a compound of ortho-nitro-aldehyde, in particular o-nitro-benzaldehyde or, preferably, 1-nitro-2-naphthaldehyde—in the same matrix undergo photochemical reaction when selectively exposed to light so as to form at least one of the acids, bases, ions or radicals with which the dye precursor molecules are reactive—preferably nitroso acid.Type: GrantFiled: September 7, 1999Date of Patent: August 13, 2002Assignee: Regents of the University of CaliforniaInventors: Peter M. Rentzepis, Alexander Dvornikov
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Patent number: 6057078Abstract: Compounds of the formula I ##STR1## in which n and o are a number from 0 to 50, m is a number from 1 to 50, u and v are 0 or 1, and at least one of the indices u and v is 1, R.sub.1, R.sub.2, R.sub.2a, R.sub.3 and R.sub.4 independently of one another are, for example, aromatic hydrocarbons, R.sub.5, if n and o are 0, is for example C.sub.1 -C.sub.12 alkyl and, if n and/or o are greater than 0, or if n and o are 0 and at the same time only one index u or v is 1, R.sub.5 may additionally, for example, be an aromatic hydrocarbon, at least one of the radicals R.sub.1, R.sub.2, R.sub.2a, R.sub.3, R.sub.4 and R.sub.5 being an aromatic hydrocarbon radical which is sterically hindered ortho to the boron atom, X is, for example, C.sub.1 -C.sub.20 alkylene, phenylene, biphenylene, etc., and Z is a radical which is able to form positive ions, are suitable as photoinitiators, both the compounds per se and their combination with dyes or other electron acceptors.Type: GrantFiled: July 23, 1998Date of Patent: May 2, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Allan Francis Cunningham, Martin Kunz, Hisatoshi Kura
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Patent number: 5900346Abstract: The present invention relates to novel compositions that contain an activator system that comprises a photoactivator, acid generator and chain extender. Methods and articles of manufacture that comprise such compositions are also provided. In a preferred aspect, the compositions are photoimageable.Type: GrantFiled: February 28, 1997Date of Patent: May 4, 1999Assignee: Shipley Company, L.L.C.Inventors: Roger F. Sinta, Juan C. Scaiano, Gary S. Calabrese
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Patent number: 5814678Abstract: The present invention provides for the regulation of the rate of a chemical reaction within the aqueous micelles within a microemulsion of water in supercritical carbon dioxide. Increase in pressure increases the concentration of an ionized reaction component (reactant, catalyst or reaction initiator) within the reverse micelles, thus increasing the rate of the reaction or allowing the reaction to initiate. Similarly, the reaction rate can be slowed by decreasing the pressure, thus decreasing the amount of water and ionized components in the reverse micelles. Decrease in the pressure below a critical level results in the reaction stopping when the concentration of a ionized reaction component falls to a sufficiently low level.Type: GrantFiled: January 31, 1997Date of Patent: September 29, 1998Assignee: University Technology Corp.Inventor: Theodore W. Randolph
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Patent number: 5721288Abstract: A photopolymerizable composition is described, comprising components (i) a compound having at least one addition-polymerizable ethylenically unsaturated bond, (ii) a compound represented by the following formula (I): ##STR1## and (iii) an activating agent which generates an active radical upon light irradiation in the co-presence of component (ii). The substituents in formula (I) are defined in the specification.Type: GrantFiled: February 9, 1996Date of Patent: February 24, 1998Assignee: Fuji Photo Film Co., Ltd.Inventors: Yoshimasa Aotani, Tadahiro Sorori
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Patent number: 5510539Abstract: Liquid highly active photoinitiators are obtained by dissolving a solid photoinitiator of the titanocene type in liquid photoinitiators of the acetal or ketal type. The liquid mixtures have a long dark storage stability.Type: GrantFiled: September 30, 1994Date of Patent: April 23, 1996Assignee: Ciba-Geigy CorporationInventors: Godwin Berner, Franciszek Sitek, Rinaldo Husler
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Patent number: 5407783Abstract: Photoimageable compositions, photoimageable resist compositions, and photoimageable resist elements that afford enhanced, storage stable printout images are disclosed which include a substituted 1,2-dibromoethane and a leuco dye.Type: GrantFiled: March 9, 1994Date of Patent: April 18, 1995Assignee: E. I. Du Pont de Nemours and CompanyInventor: Thomas C. Caruso
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Patent number: 5089536Abstract: An energy polymerizable composition and process therefore, comprising a cationically polymerizable material and a catalytically effective amount of an ionic salt of an organometallic complex cation as polymerization initiator, said ionic salt of an organometallic complex cation being capable of adding an intermediate strength nucleophile or upon photolysis capable of liberating at least one coordination site, said metal in said organometallic complex cation being selected from elements of Periodic Groups IVB, VB, VIB, VIIB, and VIIIB are disclosed. Certain of the organometallic metallic polymerization initiators are novel cationic salts.Type: GrantFiled: November 22, 1982Date of Patent: February 18, 1992Assignee: Minnesota Mining and Manufacturing CompanyInventor: Michael C. Palazzotto
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Patent number: 5049481Abstract: A photopolymerizable composition comprising (i) a polymerizable compound having an addition polymerizable unsaturated bond, (ii) a compound represented by formula (Ia): ##STR1## a compound represented by formula (Ib): ##STR2## or a compound represented by formula (Ic): ##STR3## wherein A represents an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, an alkyl- or aryl-substituted nitrogen atom, or a dialkyl-substituted carbon atom; Y.sup.1 represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an acyl group, an alkoxycarbonyl group, or a substituted alkoxycarbonyl group; R.sup.1 and R.sup.2 each represents a hydrogen atom, an alkyl group having from 1 to 18 carbon atoms, or an alkyl group having from 1 to 18 carbon atoms which is substituted with R.sup.3 O--, ##STR4## or a halogen atom (i.e., F, Cl, Br, and I), wherein R.sup.Type: GrantFiled: December 26, 1989Date of Patent: September 17, 1991Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasuo Okamoto, Tadahiro Sorori
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Patent number: 4940647Abstract: The invention comprises a photopolymerizable mixture comprising as the essential constituents a polymeric binder, a compound capable of forming a polymer by free-radical initiated polymerization, a photoinitiator, a leuco dye and a leuco dye stabilizer having at least one epoxy group. The mixture has a better shelf life in the dark than known compositions and is preferably used in the preparation of dry photoresists.Type: GrantFiled: October 6, 1988Date of Patent: July 10, 1990Assignee: Hoechst AktiengesellschaftInventors: Hans-Dieter Frommeld, Hartmut Wiezer
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Patent number: 4923781Abstract: A photopolymerizable composition comprises a polyfunctional monomer, a photopolymerization initiator, an organic halogen compound and a 3,6-diaminofluoran derivative. The 3,6-diaminofluoran has the formula (I): ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 is hydrogen, an alkyl group, a cycloalkyl group, an aralkyl group, an aryl group or a heterocyclic group, R.sup.1 and R.sup.2 (also R.sup.3 and R.sup.4 may form a heterocyclic ring in conjunction with the adjoining nitrogen atom, provided that at least two of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are aryl groups, or at least one group of the group containing R.sup.1 and R.sup.2 and the group containing R.sup.3 and R.sup.4 forms in conjunction with the adjoining nitrogen atom a heterocyclic ring; each of R.sup.5, R.sup.6 and R.sup.Type: GrantFiled: October 23, 1989Date of Patent: May 8, 1990Assignee: Fuji Photo Film Co., Ltd.Inventors: Sadao Fujikura, Masayuki Iwasaki, Minoru Maeda, Ken Iwakura
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Patent number: 4842968Abstract: There is disclosed herein a hologram recording medium comprising of substrate formed of transparent and non-light scattering material having a plurality of open pores for said substrate and photopolymerization composition impregnated in said open pores. The photopolymerization composition consists essentially of a photopolymerizable monomer or oligomer which adheres to the surface of said open pores, a photopolymerization initiator and activator for controlling the photopolymerization speed.Type: GrantFiled: December 16, 1985Date of Patent: June 27, 1989Assignee: Sony CorporationInventors: Chiaki Kojima, Hidetoshi Shimizu
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Patent number: 4761136Abstract: A dental impression material which comprises a pre-polymer formed by reacting a polyol or combination polyester polyol with a diisocyanate, and then with a hydroxyacrylate or hydroxymethacrylate; along with a metal catalyst, plasticizer, photosensitizer, reducing agent, filler and other additives. The essential characteristics of the polymer portion that makes the system work are that it is a long-chain aliphatic polyester-polyurethane molecule, which when endcapped with hydroxy arcylate moieties, is photo-polymerizable to yield a tear-resistant, highly flexible, medium-durometer elastomer, suitable for use as a dental impression material.Type: GrantFiled: August 6, 1987Date of Patent: August 2, 1988Assignee: Kerr Manufacturing CompanyInventors: Narayanan Madhavan, Carole L. Groh, Robert L. Probst
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Patent number: 4689288Abstract: Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.Type: GrantFiled: September 19, 1985Date of Patent: August 25, 1987Assignee: Commissariat a l'Energie AtomiqueInventors: Francois Buiguez, Louis Giral, Charles Rosilio, Francois Schue
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Patent number: 4666951Abstract: There is disclosed a photo-curable epoxy resin type composition comprising an epoxy resin, an aluminum compound, a silicon compound having a peroxysilyl group and a photosensitizer.The compositions of the present invention can suitably be used for wide varieties of electrical applications.Type: GrantFiled: March 19, 1984Date of Patent: May 19, 1987Assignee: Tokyo Shibaura Denki Kabushiki KaishaInventors: Yasunobu Onishi, Shuzi Havase, Shuichi Suzuki, Moriyasu Wada
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Patent number: 4599155Abstract: There is disclosed a resin composition comprising(A) a spiro ortho ester compound and/or a spiro ortho carbonate compound;(B) an aluminum compound; and(C) a silanol compound or a silicon compound which is capable of generating a silanol group;the amounts of components (B) and (C) being within the range of 0.001 to 10% by weight and 0.1 to 20% by weiht, based on the amount of component (A), respectively.The resin composition of this invention is excellent in volumetric shrinkage performance at curing operation and is good in storability. Therefore, the cured product can be used for a wide variety of industrially valuable applications, such as an ink, a coating, an adhesive, a surface coating, an encapsulation and an electrical insulating material.Type: GrantFiled: September 21, 1984Date of Patent: July 8, 1986Assignee: Kabushiki Kaisha ToshibaInventors: Shuichi Suzuki, Moriyasu Wada, Shuzi Hayase
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Patent number: 4576975Abstract: Michler's ketone analogs and salts thereof, which are photosensitizers in water-soluble photoinitiator systems used to induce polymerization in free-radically-curable, ethylenically-unsaturated materials, are disclosed. The Michler's ketone analogs have the formula: ##STR1## wherein each R is an alkyl group of 1 to 8 carbon atoms,R.sup.1 is an alkylene group having 1 to 8 carbon atoms,Z is R.sup.1 COOH or R.sup.1 H, andn is an integer having a value of 1 or 2.The photoinitiator systems are useful in imaging systems, and additionally contain a free radical initiator compound selected from iodonium salts, biimidazoles, trialkylphosphites, alkyl peroxides, benzyl halides, alkyl nitrates, and the benzophenones other than (a).Type: GrantFiled: December 18, 1984Date of Patent: March 18, 1986Assignee: Minnesota Mining and Manufacturing CompanyInventor: Laurence W. Reilly, Jr.