Specified Rate-affecting Material Contains Onium Group Patents (Class 522/25)
  • Patent number: 7538144
    Abstract: A novel photoreactive polymer is disclosed comprising a dendritic polymer core with at least one initiating functional group and at least one co-initiating functional group. The photoreactive polymers are useful in radiation curable compositions are varnishes, lacquers, printing inks and radiation curable ink-jet inks. The dendritic polymeric core is preferably a hyperbranched polymer.
    Type: Grant
    Filed: June 29, 2005
    Date of Patent: May 26, 2009
    Assignee: Agfa Graphics, N.V.
    Inventors: Luc Vanmaele, Johan Loccufoer, Yu Chen, Holger Frey
  • Patent number: 7524889
    Abstract: Dental compositions and methods of curing the composition utilizing a light emitting diode (LED) curing unit. According to one aspect, a composition comprising a multiacrylate compound, an initiator including camphorquinone and at least one amine, and a colorless anti-yellowing agent produces a scratch free surface having no oxygen inhibited layer when cured with the LED curing unit.
    Type: Grant
    Filed: July 6, 2006
    Date of Patent: April 28, 2009
    Assignee: Bisco, Inc.
    Inventors: Li Feng, Byoung I. Suh
  • Publication number: 20090092767
    Abstract: A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and at least one stabilizer.
    Type: Application
    Filed: December 16, 2008
    Publication date: April 9, 2009
    Inventors: Frances Anne Houle, Hiroshi Ito
  • Publication number: 20090088490
    Abstract: A simultaneous two-photon absorption three-dimensional recording material includes at least one kind of dye having at least one polymerizable group.
    Type: Application
    Filed: September 26, 2008
    Publication date: April 2, 2009
    Applicant: FUJIFILM CORPORATION
    Inventors: Masaharu AKIBA, Hiroo TAKIZAWA
  • Patent number: 7507773
    Abstract: A radiation curable composition comprising a novel photoreactive polymer is disclosed comprising a dendritic polymer core with at least one initiating functional group and at least one co-initiating functional group. Suitable radiation curable compositions are varnishes, lacquers, printing inks and radiation curable ink-jet inks. The dendritic polymeric core is preferably a hyperbranched polymer.
    Type: Grant
    Filed: June 29, 2005
    Date of Patent: March 24, 2009
    Assignee: AGFA Graphics N.V.
    Inventors: Johan Loccufier, Luc Vanmaele, Roland Claes, Jaymes Van Luppen, Yu Chen, Holger Frey
  • Publication number: 20090071602
    Abstract: The present invention relates to a polymerizable composition comprising a cycloaliphatic epoxide compound, a monovalent alcohol, a photopolymerization initiator, wherein the molar ratio of the epoxide groups of the cycloaliphatic epoxide to the hydroxyl groups of the monovalent alcohol is 0.9:1.0 to 4.0:1.0 and the hydroxyl functionality of all organic compounds of the polymerizable composition having OH group(s) is in the range of 1.0 to 1.25.
    Type: Application
    Filed: September 12, 2008
    Publication date: March 19, 2009
    Inventor: Hans-Joachim Weippert
  • Publication number: 20080311511
    Abstract: A photosensitive resin composition, a photosensitive resin laminate, and a method for forming a pattern capable of realizing high hardness while using an epoxy group-containing acrylic resin are provided. In a photosensitive resin composition including (A) an epoxy group-containing acrylic resin, (B) a photopolymerization initiator, and (C) a sensitizer, an onium salt having a specific structure is used as the component (B), and at least one kind selected from 1,5-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, and 2,6-dihydroxynaphthalene is used as the component (C).
    Type: Application
    Filed: June 10, 2008
    Publication date: December 18, 2008
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takahiro Senzaki, Koichi Misumi, Koji Saito
  • Patent number: 7456230
    Abstract: The present invention provides a cationically photocurable epoxy resin composition, which contains (a) an epoxy resin component comprising an alicyclic epoxy resin and an aromatic-ring containing epoxy resin, (b) a cationic photoinitiator component, and (c) a filler selected from oxides, hydroxides and carbonates containing a Group II element. This composition exhibits improved adhesive strength to a glass such as an alkali glass, particularly a sodium-containing glass, or a metal.
    Type: Grant
    Filed: May 7, 2003
    Date of Patent: November 25, 2008
    Assignee: Henkel Corporation
    Inventors: Yoke Ai Gan, Chunfu Chen, Kazuyo Terada
  • Patent number: 7455887
    Abstract: Disclosed is an actinic ray curable ink-jet ink composition containing a photopolymerizable compound, a sulfonium salt (compound A) as a photoinitiator, which does not release benzene on actinic ray exposure, and a compound (compound B) as a sensitizing agent selected from the group consisting of (i) a polycyclic aromatic compound having a hydroxyl group, a substituted or unsubstituted aralkyloxy group or a substituted or unsubstituted alkoxy group, (ii) a carbazole derivative, and (iii) a thioxanthone derivative.
    Type: Grant
    Filed: November 3, 2004
    Date of Patent: November 25, 2008
    Assignee: Konica Minolta Medical & Graphic Inc.
    Inventor: Toshiyuki Takabayashi
  • Publication number: 20080280144
    Abstract: A coating composition based upon at least partially hydrolyzed epoxy-functional alkoxy silanes and having particular utility in forming tintable, abrasion resistant coatings on lenses. Incorporation in the composition of a non-hydrolyzed epoxy-functional alkoxy silane provides a desired reduction in viscosity. Incorporation in the composition of a polyether surfactant provides a cured coating of the composition with increased tintability.
    Type: Application
    Filed: June 9, 2008
    Publication date: November 13, 2008
    Applicant: THE WALMAN OPTICAL COMPANY
    Inventor: Gerald D. Treadway
  • Publication number: 20080226915
    Abstract: Radiation curable coatings for use as a Primary Coating for optical fibers, optical fibers coated with said coatings and processes to coat the optical fiber are described and claimed. The radiation curable coating is a radiation curable Primary Coating composition comprising: an oligomer; a first diluent monomer; a second diluent monomer, a photoinitiator; an antioxidant; and an adhesion promoter; wherein said oligomer is the reaction product of: a hydroxyethyl acrylate; an aromatic isocyanate; an aliphatic isocyanate; a polyol; a catalyst; and an inhibitor, and wherein said oligomer has a number average molecular weight of from at least about 4000 g/mol to less than or equal to about 15,000 g/mol; wherein a cured film of said radiation curable primary coating composition has a peak tan delta Tg of from about ?25° C. to about ?45° C. and a modulus of from about 0.50 MPa to about 1.2 MPa.
    Type: Application
    Filed: December 13, 2007
    Publication date: September 18, 2008
    Inventors: Xiaosong WU, Steven R. Schmid, Edward J. Murphy, John M. Zimmerman, Anthony Joseph Tortorello
  • Patent number: 7417075
    Abstract: A cationically polymerizable composition containing a cationically polymerizable compound and a cationic polymerization initiator, wherein a total content of a cationic compound, a metal compound and a strong acid compound contained in the cationically polymerizable composition is in the range of 1 to 500 ppm by weight based on the total weight of the cationically polymerizable composition.
    Type: Grant
    Filed: August 22, 2005
    Date of Patent: August 26, 2008
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Nobumasa Sasa
  • Patent number: 7378455
    Abstract: A curable method useful for encapsulating solid state devices includes (A) an epoxy resin; (B) an effective amount of a cure catalyst comprising (B1) a first latent cationic cure catalyst comprising a diaryl iodonium hexafluoroantimonate salt; (B2) a second latent cationic cure catalyst comprising (B2a) a diaryl iodonium cation, and (B2b) an anion selected from perchlorate, imidodisulfurylfluoride anion, unsubstituted and substituted (C1-C12)-hydrocarbylsulfonates, (C2-C12)-perfluoroalkanoates, tetrafluoroborate, unsubstituted and substituted tetra-(C1-C12)-hydrocarbylborates, hexafluorophosphate, hexafluoroarsenate, tris(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfuryl)imide anion, and combinations thereof; and (B3) a cure co-catalyst selected from free-radical generating aromatic compounds, peroxy compounds, copper (II) salts of aliphatic carboxylic acids, copper (II) salts of aromatic carboxylic acids, copper (II) acetylacetonate, and combinations
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: May 27, 2008
    Assignee: General Electric Company
    Inventors: Qiwei Lu, Michael O'Brien, Michael Vallance
  • Patent number: 7365106
    Abstract: A cationically curable composition for dental use containing a cationic polymerization initiator (I) and cationically polymerizable monomers (II), the cationically polymerizable monomers (II) containing an oxetane compound and an epoxy compound or an alkenyl ether compound at a ratio of amounts that satisfy the conditions expressed by the following formula, (a×A):(b×B)=91:9 to 45:55 wherein A is a mol number of the oxetane compound, “a” is an average number of the oxetane functional group contained in one molecule of the oxetane compound, B is a mol number of the epoxy compound or the alkenyl ether compound, and “b” is an average number of the epoxy functional group contained in one molecule of the epoxy compound or an average number of the alkenyl ether functional group contained in one molecule of the alkenyl ether compound.
    Type: Grant
    Filed: April 26, 2005
    Date of Patent: April 29, 2008
    Assignees: Tokuyama Corporation, Tokuyama Dental Corporation
    Inventors: Takeshi Suzuki, Hideki Kazama
  • Patent number: 7329692
    Abstract: Compositions are provided that that can be used as an initiator system for free radical polymerization reactions. More specifically, the initiator systems include an electron acceptor and an electron donor. The electron donors are arylsulfinate salts having a cation that contains at least one carbon atom and either a positively charged nitrogen atom or a positively charged phosphorus atom. Methods of polymerization are also provided that can be used to prepare polymeric material with the initiator systems. The initiator systems can be thermal initiator systems, photoinitiator systems, or combinations thereof.
    Type: Grant
    Filed: January 31, 2006
    Date of Patent: February 12, 2008
    Assignee: 3M Innovative Properties Company
    Inventors: Rajdeep S. Kalgutkar, Michael C. Palazzotto
  • Patent number: 7311945
    Abstract: A silicone composition which can be used in the production of varnishes that can be applied to supports to reduce the friction coefficient. The silicone composition includes at least one polyorganosilane A (POS) which can be cationically and radically cross-linked by functional cross-linking groups (GER) and a primer C chosen from onium borates. The composition also includes molecules (POS D) which are substituted by secondary functional groups (GFS) caned by silicon atoms and selected from those that include at least one alkoxy and/or epoxy and/or carboxy motif and optionally a charge (e.g. silica).
    Type: Grant
    Filed: September 21, 2004
    Date of Patent: December 25, 2007
    Assignee: Rhodia Chimie
    Inventors: Jean-Louis Bertry, Jean-Marc Frances, Fabrice Bohin, Christian Priou
  • Patent number: 7291657
    Abstract: An ultraviolet (UV) light curable formulation useful for repairing composite materials, comprising: an acrylic oligomer, an acrylic monomer, and a photoinitiator. This formulation may include fiberglass. The photoinitiator can be a combination of a bis-acylphosphine oxide and an alpha hydroxy ketone. The formulation can cure rapidly, such as in about 20 minutes. The cured formulation can have a Tg above 150° C.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: November 6, 2007
    Assignee: Texas Research International, Inc.
    Inventors: John W. Bulluck, Brad A. Rix
  • Patent number: 7291656
    Abstract: An ultraviolet (UV) light curable formulation useful for repairing composite materials, comprising: an acrylic oligomer, an acrylic monomer, and a photoinitiator. This formulation may include fiberglass. The photoinitiator can be a combination of a bis-acylphosphine oxide and an alpha hydroxy ketone. The formulation can cure rapidly, such as in about 20 minutes. The cured formulation can have a Tg above 150° C.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: November 6, 2007
    Assignee: Texas Research Institute, Inc.
    Inventors: John W. Bulluck, Brad A. Rix
  • Patent number: 7276542
    Abstract: An ultraviolet (UV) light curable formulation useful for repairing composite materials, comprising: an acrylic oligomer, an acrylic monomer, and a photoinitiator. This formulation may include fiberglass. The photoinitiator can be a combination of a bis-acylphosphine oxide and an alpha hydroxy ketone. The formulation can cure rapidly, such as in about 20 minutes. The cured formulation can have a Tg above 150° C.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: October 2, 2007
    Assignee: Texas Research International, Inc.
    Inventors: John W. Bulluck, Brad A. Rix
  • Patent number: 7265161
    Abstract: A multi-photon reactive composition including: (a) at least one reactive species; and (b) multi-photon photoinitiator system; and (c) a plurality of substantially inorganic particles, wherein the particles have an average particle size of less than about 10 microns in diameter.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: September 4, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Catherine A. Leatherdale, Craig R. Schardt, D. Scott Thompson, Wendy L. Thompson
  • Patent number: 7262228
    Abstract: The invention features a photopolymerizable composition that comprises a cationically polymerizable resin, and a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and one or more anthracene-based compounds as electron donors. Electron donor combinations used in the invention include multiple substituted anthracene compounds or a combination of at least one substituted anthracene compound with unsubstituted anthracene.
    Type: Grant
    Filed: November 21, 2003
    Date of Patent: August 28, 2007
    Assignees: Curators of the University of Missouri, 3M Innovative Properties Company, 3M ESPE AG
    Inventors: Joel D. Oxman, Karsten Dede, Craig A. Dykstra, Victoria A. Russell, Christoph Thalacker, Wolfgang Weinmann
  • Patent number: 7232852
    Abstract: A visible light cationically photopolymerizable composition is provided. This composition includes an expanding monomer and a dioxirane. More specifically, the expanding monomer used in this composition is one or more dioxiranyl tetraoxaspiro[5.5]undecanes. The composition of the present invention may be used as a matrix resin for dental restorative materials. Another embodiment of the present invention is various novel dioxiranyl tetraoxaspiro[5.5]undecanes.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: June 19, 2007
    Assignee: Curators of the University of Missouri
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, Andrew J. Holder, Shin-Shi Chen, Li Jeang
  • Patent number: 7232850
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl groups per 100 grams of said composition.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: June 19, 2007
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: David Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Patent number: 7193706
    Abstract: This invention provides a method for screening large numbers of individual cells or colonies of cells using scanning microscopy coupled with fluorescence lifetime measurement and analysis, using time-correlated single photon counting. This invention further provides an automated method for selecting cells that exhibit desired characteristics. The method uses the scanning microscope system to focus a laser beam onto a surface upon which cells are immobilized on the timescale of the procedure. The cells that are illuminated in this way are killed or their growth is inhibited. The focused laser beam is scanned across the surface and turned on and off during the scanning process such that only non-irradiated cells survive, resulting in a patterned cell growth This invention further provides a computer-controlled projection device, such as a micro-mirror array or a liquid crystal display system, which is sued to project an image onto the cells.
    Type: Grant
    Filed: August 2, 2001
    Date of Patent: March 20, 2007
    Assignee: Arizona Board of Regents, Acting on Behalf of Arizona State University
    Inventors: Neal W. T. Woodbury, Benjamin P. Bowen, Allan Scruggs
  • Patent number: 7192991
    Abstract: A cationically curable composition comprises (a) at least one cationically curable species; (b) at least one cationic photoinitiator; and (c) at least one encapsulated, polymer-bound base.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: March 20, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Michael A. Kropp, Wayne S. Mahoney, Bridget K. Warmka
  • Patent number: 7183333
    Abstract: Photoinitiated reactions especially in photopolymer technology, as well as photoinitiated colour forming reactions are achievable by applying a reactive substrate selected from a polymerisable and/or crosslinkable composition and a colour changing substance to a support, activating a latent photoinitiator applied with the reactive substance and subsequently exposing the reactive substrate with the resulting photoinitiator therein to photoreaction conditions wherein actinic radiation causes the substrate to undergo polymerisation and/or crosslinking or colour change respectively, the substrate being locally modified in its constitution as a result of its exposure to actinic radiation at least one stage of the method, so that the resulting polymerised and/or crosslinked composition or colour changed substance corresponds in its distribution on the support to the locations of the modification of the substrate.
    Type: Grant
    Filed: August 3, 2001
    Date of Patent: February 27, 2007
    Assignee: Lintfield Limited
    Inventor: Grant Bradley
  • Patent number: 7160669
    Abstract: The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
    Type: Grant
    Filed: October 10, 2003
    Date of Patent: January 9, 2007
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Airi Yamada, Yasunori Uetani, Akira Kamabuchi
  • Patent number: 7144927
    Abstract: A visible light photopolymerizable composition comprising a) an aryliodonium salt and b) an acylphosphine oxide compound. These compositions can be used together with an epoxy resin as a dental composition.
    Type: Grant
    Filed: November 16, 2000
    Date of Patent: December 5, 2006
    Assignee: S & C Polymer Silicon-und Composite-Spezialitaten GmbH
    Inventors: Juergen Engelbrecht, Gunther Groeger, Wolfram Ziegler
  • Patent number: 7144544
    Abstract: An ultraviolet (UV) light curable formulation useful for repairing composite materials, comprising: an acrylic oligomer, an acrylic monomer, and a photoinitiator. This formulation may include fiberglass. The photoinitiator can be a combination of a bis-acylphosphine oxide and an alpha hydroxy ketone. The formulation can cure rapidly, such as in about 20 minutes. The cured formulation can have a Tg above 150° C.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: December 5, 2006
    Assignee: Texas Research International, Inc.
    Inventors: John W. Bulluck, Brad A. Rix
  • Patent number: 7122294
    Abstract: Photoacid generators (PAGs) comprising photoactive moieties and perfluorinated, multifunctional anionic moieties (or incipient anionic moieties) are disclosed which provide photoacids with high acid strength, low volatility and low diffusivity. The present invention further relates to photoacid generators as they are used in photoinitiated or acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: October 17, 2006
    Assignee: 3M Innovative Properties Company
    Inventor: William M. Lamanna
  • Patent number: 7122247
    Abstract: A radiation-curable fiber optic coating composition for an inner primary coating includes a coloring agent, preferably a dye or a dye precursor, compatible with the fiber of the fiber optic and capable of imparting a pre-selected color to the inner primary coating, or another coating. The coloring agent can be a reactive dye. Any of the dyes preferably is stabilized by a stabiliser in the colored coating layer, or, preferably, in a more exterior layer.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: October 17, 2006
    Assignee: DSM IP Assets B.V.
    Inventors: Lin Jibing, Montgomery I. Eva, Snowwhite E. Paul, Jr., Petisce R. James, Kotesky Anton
  • Patent number: 7112616
    Abstract: A two-photon absorbing polymerizable composition contains at least a two-photon absorbing compound, a polymerization initiator and a polymerizable compound, the composition being photopolymerizable upon non-resonant two-photon absorption, wherein the two-photon absorbing compound is a methine dye containing a compound represented by the formula (1): wherein R1 to R5 each represents a hydrogen atom or a substituent and some of R1 to R4 may combine with each other to form a ring; n and m each independently represents an integer of 0 to 4, provided that n and m are not 0 at the same time; X1 and X2 each represents an aryl group, a heterocyclic group or a group represented by formula (2); R6 represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group, and Z1 represents an atomic group for forming a 5- or 6-membered ring.
    Type: Grant
    Filed: March 19, 2004
    Date of Patent: September 26, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroo Takizawa, Masaharu Akiba, Takeharu Tani
  • Patent number: 7101918
    Abstract: The present invention relates to a hybrid type onium salt having an iodonium salt and a sulfonium salt in the molecule, Useful, for example, as a cationic type photopolymerization initiator and an acid generator for a chemically amplified resist and provides a hybrid type onium salt shown by the general formula [1]: and R4 is an alkyl group, an alkenyl group, an aryl group or an aralkyl group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted or a group shown by the general formula [2]: and a polymerization initiator or an acid generator, comprising said onium salt.
    Type: Grant
    Filed: November 1, 2002
    Date of Patent: September 5, 2006
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Masami Ishihara, Tsuneaki Maesawa, Yoji Urano
  • Patent number: 7091255
    Abstract: A method of multiphoton photosensitizing a photoreactive composition comprises irradiating the composition with light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light. The composition comprises: (a) at least one reactive species that is capable of undergoing such reaction; and (b) at least one multi-component, multiphoton photoinitiator system.
    Type: Grant
    Filed: October 13, 2004
    Date of Patent: August 15, 2006
    Assignee: 3M Innovative Properties Company
    Inventor: Robert J. DeVoe
  • Patent number: 7078444
    Abstract: Photoacid generator salts comprising photoactive cationic moieties and segmented, highly fluorinated-hydrocarbon anionic moieties are disclosed which provide high photoacid strength and can be tailored for solubility and polarity. The present invention further relates to photoacid generators as they are used in photoinitiated acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.
    Type: Grant
    Filed: January 5, 2005
    Date of Patent: July 18, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: William M. Lamanna, Gregory D. Clark, Richard M. Flynn, Zai-Ming Qiu
  • Patent number: 7064152
    Abstract: Compositions are provided that include an electron donor and a sensitizing compound. More specifically, the electron donor is an arylsulfinate salt. Methods of polymerization are also provided that can be used to prepare polymeric material from a photopolymerizable composition that includes ethylenically unsaturated monomers and a photoinitiator system. The photoinitiator system includes an electron donor and a sensitizing compound.
    Type: Grant
    Filed: May 17, 2004
    Date of Patent: June 20, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Rajdeep S. Kalgutkar, Michael C. Palazzotto
  • Patent number: 7064155
    Abstract: A radiation-curable composition which includes a cyanoacrylate component or a cyanoacrylate-containing formulation; a metallocene component; a photoinitiator; and a luminescent and/or fluorescent dye.
    Type: Grant
    Filed: January 31, 2003
    Date of Patent: June 20, 2006
    Assignee: Henkel Corporation
    Inventor: Stan Wojciak
  • Patent number: 7026367
    Abstract: Compositions are provided that include a photoinitiator system for free radical polymerization reactions. More specifically, the photoinitiator includes an arylsulfinate ion and a triarylsulfonium ion. Polymerization methods are also provided those include the photoinitiator in a photopolymerizable composition. Additionally, triarylsulfonium arylsulfinate salts are disclosed.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: April 11, 2006
    Assignee: 3M Innovative Properties Company
    Inventor: Rajdeep S. Kalgutkar
  • Patent number: 6991888
    Abstract: The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators. The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5, where, R1 and R2 R5, R6, R7, R8, and R9 are defined herein; m=1–5; X? is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3, where R30, R31, R32, R33, and R34 are defined herein.
    Type: Grant
    Filed: May 16, 2003
    Date of Patent: January 31, 2006
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Takanori Kudo, Sangho Lee, Ralph R. Dammel, M. Dalil Rahman
  • Patent number: 6936384
    Abstract: The present invention provides an initiator system including an infrared-absorbing compound that exhibits an electronic transition band in the near-infrared region, an initiator, and a metallocene compound. Upon exposure to infrared radiation, the initiator system is capable of producing radicals sufficient to initiate a photopolymerization reaction. Suitable infrared-absorbing compounds include indocyanine dyes, for example. Trihalomethyl triazine compounds and onium compounds are suitable initiators. Suitable metallocene compounds include ferrocenes and titanocenes. The present invention also provides an infrared-sensitive composition including an ethylenically unsaturated polymerizable component, an infrared-absorbing compound that exhibits an electronic transition band in the near-infrared region, an initiator, and a metallocene compound. The infrared-sensitive composition provides improved photospeed and sensitivity in some embodiments.
    Type: Grant
    Filed: August 1, 2002
    Date of Patent: August 30, 2005
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Heidi M. Munnelly, Jianbing Huang
  • Patent number: 6930134
    Abstract: A photocationic polymerization initiator comprising (A) a photo acid-generating compound and (B) a fused polycyclic aromatic compound, wherein said fused polycyclic aromatic compound has a molecular structure in which a fused aromatic ring is further condensed with a non-aromatic ring, and at least one of the atoms constituting said non-aromatic ring directly bonded to a common atom in the fused aromatic ring and the non-aromatic ring, is a saturated carbon atom, said saturated carbon atom having at least one hydrogen atom. Upon blending the photopolymerizable monomer with the photocationic polymerization initiator, there is obtained a photocationically polymerizable composition having a high sensitivity for the visible light rays, which is useful for dental applications, exhibiting a sufficiently high curing rate and offering sufficient depth of curing upon the irradiation with light for only a short period of time.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: August 16, 2005
    Assignees: Tokuyama Corporation, Tokuyama Dental Corporation
    Inventors: Takeshi Suzuki, Hideki Kazama
  • Patent number: 6924323
    Abstract: A compound shown by the general formula [1] (wherein R1, R2 and R3 are each independently an aromatic hydrocarbon residual group, Yn? is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R1, R2 and R3 each is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: August 2, 2005
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Masami Ishihara, Motoshige Sumino, Kazuhito Fukasawa, Naoki Katano, Shigeaki Imazeki
  • Patent number: 6919385
    Abstract: An energy-ray curing resin composition comprising a photopolymerizable resin component which can be cured by irradiation with an energy ray, a photopolymerization initiator component which makes it possible to cure the above photopolymerizable resin component by irradiation with an energy ray and a curing agent component used for curing at least one of the above photopolymerizable resin components by a method other than irradiation with an energy ray. To provide a high curability energy-ray curing resin composition which has a very high curing capacity as compared with those of conventional energy-ray curing resins and which is simple and has a high design freedom.
    Type: Grant
    Filed: February 4, 2003
    Date of Patent: July 19, 2005
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventor: Noriya Hayashi
  • Patent number: 6905735
    Abstract: The present invention discloses an ultraviolet light curable paint composition and method for applying and making such a composition to a substrate. Suitable substrates include glass, metals, and various plastics such as polycarbonates. The disclosed composition does not contain any significant amount of volatile organic solvents that do not become incorporated in the coating or are released to ambient after curing.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: June 14, 2005
    Assignee: Allied PhotoChemical, Inc.
    Inventor: Roy C. Krohn
  • Patent number: 6902816
    Abstract: The invention relates to silicone compositions that are used in the production of varnishes that can be applied to supports in order to reduce the friction coefficient. The inventive composition comprises at least one polyorganosiloxane A (POS) which can be cationically and radically cross-linked by functional cross-linking groups (GFR) and a primer C chosen from onium borates, characterized in that the inventive composition also comprises molecules (POS D) which are substituted by secondary functional groups (GFS) carried by silicon atoms and selected from those that include at least one alkoxy and/or epoxy and/or carboxy motif and optionally a charge (e.g. silica). The invention can be used with anti-friction varnishes for RTV silicone coatings for material used in air bags, thermal transfer ribbons or packing films.
    Type: Grant
    Filed: April 5, 2000
    Date of Patent: June 7, 2005
    Assignee: Rhodia Chimie
    Inventors: Jean-Louis Bertry, Jean-Marc Frances, Fabrice Bohin, Christian Priou
  • Patent number: 6900250
    Abstract: A polymerizable composition comprising a polymerization initiator (A) represented by the formula (1) and a radical-polymerizable compound (B): (wherein R5, R6, R7, R8 and R9 are each independently a hydrogen atom, an alkyl, alkoxyl, hydroxyl or acyloxy group, a halogen atom, or —NR10R11, but at least one of them is —NR10R11; wherein R1, R2, R3, R4, R10 and R11 are each independently a hydrogen atom, or an alkyl or aryl group; and Z? is an arbitrary anion).
    Type: Grant
    Filed: March 12, 2002
    Date of Patent: May 31, 2005
    Assignee: Toyo Ink Mfg. Co., Ltd.
    Inventors: Takahiko Uesugi, Masashi Arishima, Tadao Yagi
  • Patent number: 6864040
    Abstract: The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazolium dyes, cyanine dyes, polyaniline dyes, polypyrrole dyes, polythiophene dyes and phthalocyanine pigments (b) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds (c) at least one polycarboxylic acid represented by the following formula I wherein Y is selected from the group consisting of O, S and NR7, each of R4, R5 and R6 is independently selected from the group consisting of hydrogen, C1-C4 alkyl, aryl which is optionally substituted, —COOH and NR8CH2COOH, R7 is selected from the group consisting of hydrogen, C1-C6 alkyl, —CH2CH2OH, and C1-C5 alkyl substituted with -COOH, R8 is selected from the group consisting of —CH2COOH, —CH2OH and —(CH2)2N(CH2COOH)2 and r is 0, 1, 2 or 3 with the proviso that at least one of R4, R5, R
    Type: Grant
    Filed: April 11, 2001
    Date of Patent: March 8, 2005
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Ursula Müller, Tobias Wittig, Hans-Joachim Timpe
  • Patent number: 6861455
    Abstract: A composition for a bulkhead of a thin display panel which is a mixed composition comprising a powder of glass or ceramic for molding a bulkhead of a thin display panel or a part thereof and a binder being an organic additive, wherein the above organic additive contains 15 to 50% by weight of a resin composition which generates heat energy by irradiation with an energy ray and which can be cured by energy coming from an energy ray source or the resulting heat energy. To provide a composition for a bulkhead which is used for molding a bulkhead constituting a discharge display cell of a thin display panel or mending a broken part thereof and which is improved in curability.
    Type: Grant
    Filed: January 31, 2001
    Date of Patent: March 1, 2005
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventor: Noriya Hayashi
  • Patent number: 6852766
    Abstract: A method of multiphoton photosensitizing a photoreactive composition comprises irradiating the composition with light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light. The composition comprises: (a) at least one reactive species that is capable of undergoing such reaction; and (b) at least one multi-component, multiphoton photoinitiator system.
    Type: Grant
    Filed: June 14, 2001
    Date of Patent: February 8, 2005
    Assignee: 3M Innovative Properties Company
    Inventor: Robert J. DeVoe
  • Patent number: 6852767
    Abstract: A photo-curing ink composition comprises a photocation-polymerizable substance, a photocation polymerization initiator, and a surfactant having a functional group. The surfactant is selected and the amount thereof is adjusted so that the acid value per 100 g of the ink composition is not more than 150 mg KOH. The surfactant is selected and the amount thereof is adjusted so that the amine value per 100 g of the ink composition is not more than 23 mg KOH. The ink composition is excellent in dispersion performance, storage stability, and curing performance.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: February 8, 2005
    Assignee: Brother Kogyo Kabushiki Kaisha
    Inventor: Minobu Maeda