Specified Rate-affecting Material Contains Onium Group Patents (Class 522/25)
  • Patent number: 6713523
    Abstract: The invention discloses a photopolymerizable composition comprising at least one, ethylenic unsaturated bond-containing compound, a hexaaryl-biimidazole compound, and an organoboron compound represented by a specific general formula; and discloses a photosensitive thermal recording material having a recording layer that contains the photopolymerizable composition. The photopolymerizable composition and the photosensitive thermal recording material of the invention are highly sensitive to UV rays and visible to IR rays falling within a wavelength range that includes wavelengths not longer than 450 nm, and are effective for decoloring a dye component that absorbs the rays falling within the wavelength range.
    Type: Grant
    Filed: November 2, 2001
    Date of Patent: March 30, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kozo Nagata, Shintaro Washizu
  • Patent number: 6706403
    Abstract: A process, system, and materials for lamination of anti-reflective glass to the screen of a CRT display, including a polymerizable adhesive and laminated articles are described. The photopolymerizable adhesive composition including, in certain embodiments, an epoxy resin and a photosensitive initiating system are disclosed.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: March 16, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Peter M. Olofson, Kent W. Morris, Michael C. Palazzotto
  • Patent number: 6706779
    Abstract: This invention relates to radiation curable compositions comprising an alkenyl ether functional polyisobutylene, a cationic photoinitiator, and a miscible reactive diluent selected from specified organic vinyl ether compounds, epoxy functional compounds, or compounds having the formula R8Xb, wherein R8 is a non-silicon containing organic group, X is an organic group containing at-least one acrylate functional group, and b has a value of 1-3. The radiation curable compositions exhibit a low cure energy, have a high moisture vapor barrier, high damping characteristics, and a high refractive index, and provide a barrier to corrosive vapors and have maintained or enhanced modulus, tensile strength, and toughness.
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: March 16, 2004
    Assignee: Dow Corning Corporation
    Inventors: Maneesh Bahadur, Susan Victoria Perz, Toshio Suzuki
  • Patent number: 6703433
    Abstract: This invention relates to radiation curable compositions comprising an alkenyl ether functional polyisobutylene, a cationic photoinitiator, and a miscible reactive diluent selected from specified organic vinyl ether compounds or compounds having the formula R8Xb, wherein R8 is a non-silicon containing organic group, X is an organic group containing at-least one acrylate functional group, and b has a value of 1-3. The radiation curable compositions exhibit a low cure energy, have a high moisture vapor barrier, high damping characteristics, and a high refractive index, and provide a barrier to corrosive vapors and have maintained or enhanced modulus, tensile strength, and toughness.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: March 9, 2004
    Assignee: Dow Corning Corporation
    Inventors: Maneesh Bahadur, Susan Victoria Perz, Toshio Suzuki
  • Publication number: 20040013977
    Abstract: A liquid radiation-curable composition that comprises
    Type: Application
    Filed: January 7, 2003
    Publication date: January 22, 2004
    Applicant: 3D Systems, Inc.
    Inventor: Bettina Steinmann
  • Patent number: 6677390
    Abstract: An iodonium salt compound which is colored little, can be easily synthesized in high yield, is highly sensitive to irradiation with actinic energy rays such as light, electronic beams, or X-rays, is highly soluble in monomers, and is lowly toxic; and a photocurable composition which can cure in a short time even when the counter anion is a hexafluorophosphonate, tetrafluoroborate, etc., regardless of whether it is clear or pigmented, and which gives a cured object having excellent properties. The photocurable composition is prepared by compounding an iodonium salt compound represented by the general formula (I) with a cationically polymerizable compound, a sensitizer, etc.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: January 13, 2004
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Eiji Takahashi, Akihiro Shirai, Hiroshi Takahashi, Shinichi Kimizuka
  • Patent number: 6673457
    Abstract: The invention discloses a novel radiation-curable silicone-based release coating composition capable of giving a cured release coating film on a substrate such as a plastic resin film exhibiting excellent adhesion to a variety of substrate materials and excellent releasability. The radiation-curable releasing silicone composition of the invention comprises (A) an aromatic compound having, in a molecule, at least two cationically polymerizable organopolysiloxanyl groups such as epoxy-substituted organopolysiloxanyl groups as the silicone ingredient and (B) a photopolymerization initiator which is an onium salt compound such as diaryliodonium salt compounds.
    Type: Grant
    Filed: December 12, 2001
    Date of Patent: January 6, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masatoshi Takahashi, Masahiko Ogawa
  • Patent number: 6664025
    Abstract: A visible radiation sensitive composition is disclosed. The composition comprises at least one ethylenically unsaturated monomer capable of free radical initiated addition polymerization; optionally, at least one binder; and a photoinitiator system comprising a coinitiator and a cyanopyridone sensitizer. The coinitiator preferably comprises a metallocene and an onium compound.
    Type: Grant
    Filed: February 12, 2002
    Date of Patent: December 16, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Harald Baumann, Michael Flugel
  • Patent number: 6653399
    Abstract: A water absorbent material, comprising, as a main component, a water absorbent resin which has a structure in which a anhydropolyamino acid having an ethylenically unsaturated double bond is grafted with polysaccharides, wherein at least a portion of the anhydropolyamino acid is hydrolyzed and crosslinked, has high water absorbency and high biodegradability even if the anhydropolyamino acid has a low molecular weight.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: November 25, 2003
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Hisakazu Tanaka, Shigeki Ideguchi, Yoshiki Hasegawa
  • Patent number: 6649668
    Abstract: The invention concerns the field of polymerization and/or cross-linking reaction catalysis by cationic process of monomers, oligomers and/or polymers. In particular, novel polymerization and/or cross-linking initiator systems comprising at least one onium borate and at least one benzophenone are described to satisfy the ever greater exigencies of productivity and manufacture. The initiators are used in particular for preparing resins and/or composite materials based on an organic and/or silicon matrix or optionally a matrix of acrylic monomers, oligomers, or polymers.
    Type: Grant
    Filed: June 15, 2000
    Date of Patent: November 18, 2003
    Inventors: Marie-Anne David, Jean-Marc Frances
  • Patent number: 6645696
    Abstract: The use of selected buffering amines in a photoimageable composition prevents process bias which with conventional photoresists causes designed features to be distorted, especially in corners and high resolution features. It is believed that the amines react with the catalysts, e.g., photoacids, generated to create an inert salt. The presence of the amines also increases resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; (b) a photoactive compound; and (c) an amine that is selected from the group consisting of triisobutylamine, 1,8-bis(dimethylamino)naphthalene (also known as PROTON SPONGET™), 2,2′-diazabicyclo[2.2.2] octane and mixtures thereof.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: November 11, 2003
    Assignee: Euv LLC.
    Inventors: Kelby Liv Simison, Paul Dentinger
  • Patent number: 6635195
    Abstract: A process for polymerizing/curing a photopolymerizable monomer composition comprising at least one diepisulfide monomer which comprises the steps of: a) mixing to the monomer composition an effective amount of a cationic photopolymerization initiator, and b) irradiating the mixture of a) with an ultraviolet radiation to at least partially cationically photopolymerize the monomer composition.
    Type: Grant
    Filed: February 4, 2000
    Date of Patent: October 21, 2003
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Sirisoma Wanigatunga, Yassin Turshani
  • Patent number: 6630242
    Abstract: A radiation-curable fiber optic coating composition for an inner primary coating includes a coloring agent, preferably a dye or a dye precursor, compatible with the fiber of the fiber optic and capable of imparting a pre-selected color to the inner primary coating, or another coating. The coloring agent can be a reactive dye. Any of the dyes preferably is stabilized by a stabiliser in the colored coating layer, or, preferably, in a more exterior layer.
    Type: Grant
    Filed: July 26, 2000
    Date of Patent: October 7, 2003
    Assignee: DSM N.V.
    Inventors: Jibing Lin, Eva I. Montgomery, Paul E. Snowwhite, Jr., James R. Petisce, Anton Kotesky
  • Patent number: 6610760
    Abstract: A radiation curable composition contains an epoxy-functional silicone polymer, an iodonium photocatalyst and a non-fluorescing polycyclic aromatic compound containing at least one hydroxy, alkoxy or glycidyl ether substituent bonded to an aromatic carbon atom of the compound.
    Type: Grant
    Filed: July 18, 2001
    Date of Patent: August 26, 2003
    Assignee: General Electric Company
    Inventors: Richard Paul Eckberg, Kesheng Feng, Douglas Neckers
  • Patent number: 6610759
    Abstract: An adhesive composition that includes a mixture of a cationically polymerizable component, an acidic component, and an initiator is provided. Preferably, the initiator comprises an iodonium salt, a visible light sensitizer, and an electron donor compound, wherein the initiator has a photoinduced potential greater than or equal to that of N,N-dimethylaniline in a standard solution of 2.9×10−5 moles/g diphenyl iodonium hexafluoroantimonate and 1.5×10−5 moles/g camphorquinone in 2-butanone. This adhesive composition is cationically polymerizable and is able to bond to hard tissue and cationic restorative materials upon curing.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: August 26, 2003
    Assignees: Curators of the University of Missouri, 3M Innovative Properties Company
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, James Code, Joel D. Oxman, Sharon M. Rozzi
  • Patent number: 6599960
    Abstract: The invention relates to preparations with improved curing behavior, which are characterized in that they contain 0.0005 to 50 wt. % of soluble and/or fine-particle organic and/or inorganic alkaline earth and/or alkali metal compounds. The preparations according to the invention may be used for bonding, sealing, casting and coating substrates, also in medical dental and technical dental preparations, and for making impressions of articles and, more particularly, for making dental impressions.
    Type: Grant
    Filed: July 13, 2000
    Date of Patent: July 29, 2003
    Assignee: Espe Dental AG
    Inventors: Gunther Eckhardt, Gunther Lechner, Erich Wanek, Ursula Somnitz
  • Patent number: 6599954
    Abstract: An object of the present invention is to completely cure a resin composition highly capable of screening energy radiation, such as a carbon fiber-reinforced composite material (CFRP), simply by exposing the resin composition to UV radiation in the presence of a specific photopolymerization initiator system (reaction catalyst system) comprising at least two components. To this end, the present invention provides a resin curing method wherein, when a resin composition is exposed to energy radiation typified by UV radiation, another kind of first energy than the energy from an energy radiation source is autogenously generated within the resin, and the same kind of second energy is successively generated by the autogenously generated energy, so that the resin composition is cured by means of the first and second energies, or both the first and second energies and the energy from the energy radiation source, whether or not the resin composition contains a substance capable of screening energy radiation.
    Type: Grant
    Filed: June 17, 1999
    Date of Patent: July 29, 2003
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Noriya Hayashi, Shunichi Hayashi
  • Publication number: 20030139484
    Abstract: A multiphoton-activatable, photoreactive composition comprises: (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; (b) a photochemically-effective amount of a multiphoton photosensitizer comprising at least one multiphoton up-converting inorganic phosphor; and (c) a photochemically-effective amount of a one-photon photoinitiator system that is capable of being photosensitized by the multiphoton photosensitizer.
    Type: Application
    Filed: December 28, 2001
    Publication date: July 24, 2003
    Applicant: 3M Innovative Properties Company
    Inventors: James G. Bentsen, Robert J. DeVoe, Michael C. Palazzotto
  • Patent number: 6593388
    Abstract: Enhancement of the rates of cationic polymerizations initiated by onium salts has been achieved through the use of oligomeric and polymeric electron-transfer photosensitizers derived from a polymerizable compound substituted with a polynuclear aromatic group, including epoxides, oxetanes, and ethylenically unsaturated compounds. The polymerizable compound is substituted with residues derived from anthracene, naphthalene, perylene, pyrene, fluorene, carbazole, indole, benzocarbazole, acridone, phenothiazine, and thianthrene, particularly carbazole.
    Type: Grant
    Filed: April 4, 2001
    Date of Patent: July 15, 2003
    Assignee: Renssealer Polytechnic Institute
    Inventor: James V. Crivello
  • Patent number: 6592801
    Abstract: A process for polymerizing episulfide monomers comprising the steps of: (c) mixing to an episulfide monomer or a mixture of episulfide monomers an effective amount of at least one photopolymerization catalyst selected from the group consisting of (cyclopentadienyl) ruthenium and osmium complexes and an effective amount of at least a co-catalyst selected from phosphonium salts, phosphines and amines; and (d) irradiating the mixture of (a) with an ultra-violet radiation to polymerize the mixture.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: July 15, 2003
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Sirisoma Wanigatunga, Yassin Yusef Turshani, Peiqi Jiang
  • Publication number: 20030118939
    Abstract: The present invention provides an IR-sensitive composition, which includes: a polymeric binder; and a free radical polymerizable system consisting of: at least one component selected from unsaturated free radical polymerizable monomers, oligomers which are free radical polymerizable and polymers containing C═C bonds in the backbone and/or in the side chain groups; and an initiator system, which includes: (a) at least one compound capable of absorbing IR radiation; (b) at least one compound capable of producing radicals; and (c) at least one carboxylic co-initiator, provided that the total acid number of the polymeric binder is 70 mg KOH/g or less. The present invention further provides a printing plate precursor, a process for preparing the printing plate and a method of producing an image.
    Type: Application
    Filed: November 9, 2001
    Publication date: June 26, 2003
    Applicant: KODAK POLYCHROME GRAPHICS, L.L.C.
    Inventors: Heidi Munnelly, Paul West
  • Patent number: 6579914
    Abstract: A composition for coating an optical waveguide, more specifically, an optical fiber, and optical fibers coated therewith. The coating composition is a radiation curable composition including an aliphatic epoxide, a urethane acrylate oligomer, a reactive diluent, and cationic and free-radical photoinitiators. The cationic photoinitiator acts upon the aliphatic epoxide while the free-radial photoinitiator acts upon the urethane acrylate oligomer. The resulting cured coating forms an interpenetrated polymer network. The properties of coatings in accordance with the invention including the glass transition temperature thereof, can be tailored to achieve advantageous coatings suitable for use as primary coatings and secondary coatings for an optical fiber.
    Type: Grant
    Filed: July 14, 2000
    Date of Patent: June 17, 2003
    Assignee: Alcatel
    Inventors: Todd W. Gantt, Michael B Purvis, Igor V. Khudyakov, Bob J. Overton
  • Patent number: 6559197
    Abstract: The invention disclosed includes a coating composition for siliceous surfaces. The coating includes at least one component from the group consisting of poly(alkoxy)silane, poly(halo)silane, alkoxysilane, halosilane, and mixtures thereof and a catalyst compound which generates a proton to hydrolyze the component when exposed to radiation. Preferably, the catalyst is a photo-acid. The invention also includes a method of coating the optical fiber. The aforementioned coating is applied to an exterior surface of the fiber. A proton is generated to promote the hydrolysis of the component. The invention further includes a method of accelerating adhesion between the exterior surface of the article and the coating. The inventive coating is applied to the surface of the fiber and the coating is exposed to a radiation source.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: May 6, 2003
    Assignee: Corning Incorporated
    Inventors: Edward J. Fewkes, Gregory F. Jacobs, Michael J. Winningham
  • Publication number: 20030059705
    Abstract: The present invention provides a photopolymerizable composition comprising a polymerizable compound including an addition-polymerizable unsaturated bond, a photo-radical-generating agent, and an amine compound represented by the following general formula (I) and a recording material comprising a recording layer containing the photopolymerizable composition: 1
    Type: Application
    Filed: April 12, 2002
    Publication date: March 27, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Hirotaka Matsumoto, Shintaro Washizu
  • Patent number: 6515038
    Abstract: A polymer used in a chemically amplified resist is represented by the following formula: wherein R1, R3 and R5 are each independently selected from the group consisting of —H, and —CH3; R2 is selected from the group consisting of t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; R4 is selected from the group consisting of —H, —CH3, t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; x is an integer ranging from 1 to 4; and wherein l, m, and n are selected such that l/(l+m+n) ranges from 0.1 to 0.5, m/(l+m+n) ranges from 0.01 to 0.5, and (l+m)/(l+m+n) ranges from 0.1 to 0.7.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: February 4, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Sang-jun Choi
  • Publication number: 20030022956
    Abstract: A process for polymerizing episulfide monomers comprising the steps of:
    Type: Application
    Filed: April 30, 2001
    Publication date: January 30, 2003
    Inventors: Sirisoma Wanigatunga, Yassin Yusef Turshani, Peiqi Jiang
  • Publication number: 20030008230
    Abstract: Thiophene-containing photo acid generators having either of the following general formulas: 1
    Type: Application
    Filed: June 29, 2001
    Publication date: January 9, 2003
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Wenjie Li, Pushkara Rao Varanasi, Kuang-Jung Chen
  • Patent number: 6500877
    Abstract: The present invention discloses an ultraviolet light curable paint composition and method for applying and making such a composition to a substrate. Suitable substrates include glass, metals, and various plastics such as polycarbonates. The disclosed composition does not contain any significant amount of volatile organic solvents that do not become incorporated in the coating or are released to ambient after curing.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: December 31, 2002
    Assignee: Krohn Industries, Inc.
    Inventor: Roy C. Krohn
  • Patent number: 6498200
    Abstract: A cationically polymerizable resin composition which comprises (A) a compound containing at least one ring selected from the group consisting of an oxirane ring and an oxetane ring; (B) an onium salt; (C) an organic peroxide; and (D) an alkaline filler except for a hydroxide.
    Type: Grant
    Filed: January 11, 2000
    Date of Patent: December 24, 2002
    Assignee: Namics Corporation
    Inventors: Osamu Suzuki, Haruyuki Yoshii, Hisao Kondo, Kenichi Suzuki
  • Patent number: 6486225
    Abstract: A photocurable composition comprising (A) 100 parts by weight of a compound having an ethylenically unsaturated group, (B) from 0.001 to 5 parts by weight of a cationic dye having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm represented by formula (1: D+·A1−  (1) wherein D+ represents a cation having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm, and A1 31 represents an anion, and (C) from 0.
    Type: Grant
    Filed: November 17, 1999
    Date of Patent: November 26, 2002
    Assignee: Showa Denko Kabushiki Kaisha
    Inventors: Hirotoshi Kamata, Takeo Watanabe, Kazuhiko Ooga, Toshio Koshikawa
  • Publication number: 20020168494
    Abstract: The invention discloses a photopolymerizable composition comprising at least one, ethylenic unsaturated bond-containing compound, a hexaaryl-biimidazole compound, and an organoboron compound represented by a specific general formula; and discloses a photosensitive thermal recording material having a recording layer that contains the photopolymerizable composition. The photopolymerizable composition and the photosensitive thermal recording material of the invention are highly sensitive to UV rays and visible to IR rays falling within a wavelength range that includes wavelengths not longer than 450 nm, and are effective for decoloring a dye component that absorbs the rays falling within the wavelength range.
    Type: Application
    Filed: November 2, 2001
    Publication date: November 14, 2002
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Kozo Nagata, Shintaro Washizu
  • Publication number: 20020156142
    Abstract: A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers.
    Type: Application
    Filed: February 13, 2001
    Publication date: October 24, 2002
    Inventors: Michael G. Mikhael, Angelo Yializis
  • Patent number: 6468595
    Abstract: A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers.
    Type: Grant
    Filed: February 13, 2001
    Date of Patent: October 22, 2002
    Assignee: Sigma Technologies International, Inc.
    Inventors: Michael G. Mikhael, Angelo Yializis
  • Patent number: 6465537
    Abstract: A photocurable composition is provided which can be produced and cured by both free-radical and cationic polymerization modes, which provides a sufficient length of open time to be bonded to an adherend, and which exhibts a good adhesive property. A photocurable composition containing a compound (A) having at least one free-radically polymerizable unsaturated bond in a molecule, a compound (B) having at least one epoxy group in a molecule, a free-radical polymerization catalyst (C), a cationic polymerization catalyst (D) and a compound (E) represented by the following formula (1).
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: October 15, 2002
    Assignee: Sekisui Chemical Co., Ltd.
    Inventor: Hiroji Fukui
  • Patent number: 6465541
    Abstract: Polymerizable composition that include: (a) a cationically active functional group; (b) an initiation system capable of initiating cationic polymerization of the cationically active functional group; and (c) a filler composition that includes various radiopacifying fillers in an amount sufficient to render the polymerizable composition radiopaque. Components (a), (b), and (c) are selected such that the polymerizable composition polymerizes to form a polymerized composition having a Barcol hardness, measured using a GYZJ-935 meter, of at least 10 within 30 minutes following initiation of the cationically active functional group are a reaction temperature of 25° C.
    Type: Grant
    Filed: July 3, 2001
    Date of Patent: October 15, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Kathyrn R. Bretscher, Richard P. Rusin, Sumita B. Mitra, Janis R. Gust, Cheryl A. Hayne, Dwight W. Jacobs, David A. Kaisaki
  • Patent number: 6466730
    Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical having the formula: R1—CFH—CF2— or R1—CF═CF2—, wherein R1 is an unsubstituted or substituted aliphatic radical, an unsubstituted or substituted cyclic aliphatic radical, an unsubstituted or substituted aromatic radical, an unsubstituted or substituted araliphatic radical, or an unsubstituted or substituted heterocyclic radical, and X is an unsubstituted or substituted aliphatic radical, an un-substituted or substituted cyclic aliphatic radical, an unsubstituted or substituted aromatic radical, an unsubstituted or substituted araliphatic radical, or an unsubstituted or substituted heterocyclic radical. Curable compositions containing the vinyl ether compounds and methods in which substrate coating layers of the vinyl ether compositions are cured, particularly on optical devices, are also disclosed, as well as polymers polymerized from the vinyl ether compounds.
    Type: Grant
    Filed: July 31, 2001
    Date of Patent: October 15, 2002
    Assignee: Honeywell International Inc.
    Inventors: Haridasan K. Nair, David Nalewajek, David E. Bradley
  • Patent number: 6458865
    Abstract: Photopolymerizable compositions are provided which are the reaction products of a vinyl ether, a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and an electron donor compound. These monomeric/oligomeric compositions may also include epoxides, polyols, spiroorthocarbonates. One embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, a spiroorthocarbonate, and a photoinitiator system. Another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, and a photoinitiator system. Still another embodiment of the present invention is a polymerizable composition comprised of a vinyl ether, an epoxide, a polyol, a spiroorthocarbonate, and a photoinitiator system. Still further, another embodiment of the present invention is certain novel spiroorthocarbonate compounds. Each of these novel spiroorthocarbonate compounds include at least one epoxy group as a substituent.
    Type: Grant
    Filed: January 15, 1999
    Date of Patent: October 1, 2002
    Assignees: Curators of the University of Missouri, 3M Innovative Properties Company
    Inventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, Joel D. Oxman
  • Patent number: 6455112
    Abstract: A highly reliable ink jet recording head excellent in mechanical strength, weatherability, ink resistance, and adhesion to the substrate is provided. For its production, a cationically polymerized curing product of an epoxy resin having a structural unit expressed by the following formula (I) or (II), is used as a resin material which coats an ink flow path pattern formed from a dissoluble resin on the substrate.
    Type: Grant
    Filed: May 15, 2000
    Date of Patent: September 24, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventors: Norio Ohkuma, Masashi Miyagawa, Hiroaki Toshima
  • Publication number: 20020132872
    Abstract: Photocurable resin composition for photofabrication of three-dimensional objects comprising
    Type: Application
    Filed: October 18, 2001
    Publication date: September 19, 2002
    Inventors: Tetsuya Yamamura, Yukitoshi Kato, Takayoshi Tanabe, Takashi Ukachi
  • Patent number: 6444725
    Abstract: An aesthetic dental sealant comprising a hardenable resin, a hardener, and a colorant, the composition has an initial color prior to exposure to actinic radiation and a final color that is different from the initial color subsequent to the composition being exposed to actinic radiation.
    Type: Grant
    Filed: January 21, 2000
    Date of Patent: September 3, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Matthew C. Trom, Joel D. Oxman
  • Patent number: 6433035
    Abstract: Selectively colorable compositions and a method for forming selectively colored polymeric bodies using such compositions are disclosed. In accordance with the invention, a selectively colorable polymerizable composition comprising a leucobase color former is irradiated with light of a particular wavelength and specific intensity for a specified duration. Exposure to actinic radiation cures the composition and activates the color former. Exposure to higher dosages of actinic radiation can bleach the composition. The irradiation dosage can be varied to selectively color the polymeric body whereby the resultant color of any particular area depends on the exposure dose received at that location. By varying the dose, a polymeric body can be prepared having distinctly colored elements at specific locations.
    Type: Grant
    Filed: August 14, 2000
    Date of Patent: August 13, 2002
    Assignee: Spectra Group Limited, Inc.
    Inventors: Oleg V. Grinevich, Douglas C. Neckers
  • Patent number: 6423378
    Abstract: The invention concerns the use of cross-linkable silicone compositions for fast, economical and simple impregnation and/or varnishing of flat joints (e.g. cylinder head gaskets). More precisely it concerns the use of silicone compositions cross-linkable under UV radiation, by cationic process and in the presence of specific phoinitiators selected among onium borates or organometallic complexes, of which the borate counter-anions contain at least a boron bound to at least a substituted phenyl (Me, F). The silicone liquid precursor is a polydimethylsiloxane (PDMS) substituted by cross-linking functional groups, by cationic process (Gfp) under UV of the epoxy of vinyloxy type. These Gfp are present at the rate of 0.15 to 2.0 pr kg of PDMS. The invention also relates to the method for impregnating/varnishing flat joints (e.g. cylinder head gaskets) using the specific PDMS composition+photoinitiator of borate type as well as the treated joints and the composition themselves.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: July 23, 2002
    Assignee: Rhodia Chimie
    Inventors: Marie-Christine Cotting, Gérard Joubert, Olivier Loubet
  • Patent number: 6420450
    Abstract: Cationically hardening masses are described, which can be stored and handled as single-component masses and comprise at least one difunctional cationically polymerizable compound; a photo-initiator for the cationic hardening based upon diaryliodonium salts; at least one compound containing an hydroxyl group; a compound releasing radicals when heated and having a half-life of one hour at a temperature of less than 100° C.; a photo-initiator forming radicals or of a photo-sensitizing agent for diaryliodonium salts; and from 0 to 60 parts by mass of modifier. The compounds are used for bonding, casting, sealing and coating of substrates.
    Type: Grant
    Filed: June 14, 2000
    Date of Patent: July 16, 2002
    Assignee: Delo Industrieklebstoffe GmbH & Co. KG
    Inventors: Dietmar Dengler, Michael Stumbeck
  • Publication number: 20020091172
    Abstract: The invention provides a decomposable resin composition which is stable at the using time and quickly decomposed when being discarded. According to the present invention, there is provided a resin composition comprising an agent generating an acid or a base by light or heat together with a hydrolyzable and biodegradable resin. The decomposable resin composition can promote decomposition of the polymer by generating an acid or a base in the resin by carrying out light irradiation and/or heat treatment at a desired time and can control the decomposition speed of the polymer by controlling the generation amount of an acid or a base.
    Type: Application
    Filed: November 16, 2001
    Publication date: July 11, 2002
    Inventor: Hiroshi Maehara
  • Patent number: 6410190
    Abstract: The invention relates to a process for the preparation of organic methanide electrolytes in useable quality for use in electrochemical cells and batteries.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: June 25, 2002
    Assignee: Merck Patent Gesellschaft mit beschraenkter Haftung
    Inventors: Nikolai Ignatiev, Peter Sartori, Peter Barthen
  • Patent number: 6368769
    Abstract: Novel aromatic sulfonium compounds of general formula (I), photoacid generators comprising the same, and photopolymerizable compositions containing the same, capable of providing stereolithographic resin compositions which do not suffer from the hindrance to curing by oxygen, can easily give shaped articles having desired sizes by virtue of the high accuracy thereof in curing, and can attain a satisfactory curing depth owing to the high sensitivity thereof for radiant energy; and a stereolithographic process.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: April 9, 2002
    Assignee: Asahi Denki Kogyo Kabushiki Kaisha
    Inventors: Kazuo Ohkawa, Hiroyuki Tachikawa, Satoyuki Chikaoka
  • Patent number: 6365643
    Abstract: The invention relates to modified cationic photoinitiators which exhibit a reduced tendency to crystallize, to a process for reducing the crystallization tendency of cationic photoinitiators, and to the use of the photoinitiators of the invention for the radiation curing of cationically curing compositions. The inventive cationic photoinitiators have the formula (IV): [R1—I—R2]+X− where R1 is a radical R2 is a radical in which Ar is a monovalent aromatic hydrocarbon radical and D being a radical and the remaining variables are defined herein.
    Type: Grant
    Filed: January 13, 2000
    Date of Patent: April 2, 2002
    Assignee: Th. Goldschmidt AG
    Inventors: Sascha Oestreich, Wolfgang Müller
  • Patent number: 6358354
    Abstract: The invention provides an adhesive formulation for tacking and holding a nozzle plate in alignment on a semiconductor chip for an ink jet pen of an ink jet printer. The adhesive formulation includes a multifunctional epoxy material, a difunctional epoxy material, a fumed silica viscosity control agent, an imidazole-based thermal initiator and a mixed aryl sulfonium salt photoinitiator. Use of the adhesive formulation enables a nozzle plate to be assembled to a semiconductor chip with while substantially maintaining critical alignment between the nozzle plate and semiconductor chip.
    Type: Grant
    Filed: July 5, 2000
    Date of Patent: March 19, 2002
    Assignee: Lexmark International, Inc.
    Inventor: Girish Shivaji Patil
  • Publication number: 20020032249
    Abstract: A radiation curable composition contains an epoxy-functional silicone polymer, an iodonium photocatalyst and a non-fluorescing polycyclic aromatic compound containing at least one hydroxy, alkoxy or glycidyl ether substituent bonded to an aromatic carbon atom of the compound.
    Type: Application
    Filed: July 18, 2001
    Publication date: March 14, 2002
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Richard PAUL Eckberg, Kesheng Feng, Douglas Neckers
  • Patent number: RE37962
    Abstract: A photopolymerizable composition is disclosed, which comprises an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a sensitizing dye represented by the following formula (I): wherein the all symbols are defined in the disclosure, and a titanocene compound.
    Type: Grant
    Filed: July 21, 2000
    Date of Patent: January 7, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Syunichi Kondo, Kazuo Fujita