Hetero Nitrogen Ring Patents (Class 522/50)
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Patent number: 11639398Abstract: The present disclosure relates to a photosensitive composition comprising a photoinitiator and a bismaleimide component, photopolymers comprising the photosensitive composition and their use, especially in electronic devices. The bismaleimide component includes a bismaleimide compound or a bismaleimide oligomer.Type: GrantFiled: November 30, 2020Date of Patent: May 2, 2023Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Colin Hayes, Colin Calabrese, Michael K. Gallagher, Kevin Y. Wang, Robert K. Barr
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Patent number: 11220610Abstract: Methods of printing a three-dimensional object using co-reactive components are disclosed. Thermosetting compositions for three-dimensional printing are also disclosed.Type: GrantFiled: November 24, 2015Date of Patent: January 11, 2022Assignees: PPG Industries Ohio, Inc., The University of NottinghamInventors: David R. Fenn, Kurt G. Olson, Reza M. Rock, Richard J. M. Hague, Christopher John Tuck, Le Ma, Ricky Darren Wildman, Yinfeng He
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Patent number: 10120280Abstract: Provided are a photosensitive resin composition including (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator including a compound represented by Chemical Formula 1; (D) a black colorant; and (E) a solvent, a black pixel defining layer manufactured using the photosensitive resin composition, and a display device including the black pixel defining layer. In Chemical Formula 1, each substituent is the same as defined in the detailed description.Type: GrantFiled: April 27, 2017Date of Patent: November 6, 2018Assignee: SAMSUNG SDI CO., LTD.Inventors: Sang Soo Kim, Jinhee Kang, Heekyoung Kang, Chang-Hyun Kwon, Jiyun Kwon, Chanwoo Kim, Bumjin Lee, Junho Lee, Chungbeum Hong
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Patent number: 8957224Abstract: A specific type of carbazole photoinitiator is capable of providing radiation curable compositions that are curable by UV LEDs and do not exhibit an unstable yellowing behavior in an image upon storage like ITX.Type: GrantFiled: December 6, 2010Date of Patent: February 17, 2015Assignee: Agfa Graphics NVInventor: Johan Loccufier
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Patent number: 8901201Abstract: A durable ambient light curable waterproof liquid rubber coating with volatile organic compound (VOC) content of less than 450 grams per liter made from ethylene propylene diene terpolymer (EPDM) in a solvent, a photoinitiator, an additive, pigments, and fillers, and a co-agent and a method for making the formulation, wherein the formulation is devoid of thermally activated accelerators.Type: GrantFiled: February 12, 2014Date of Patent: December 2, 2014Assignee: Lion Copolymer Geismar, LLCInventors: Michael J. Molnar, Daniel S. Nelson, Arthur J. Fontenot, III, Harold William Young, Jr., Augusto Caesar Ibay, Zhiyong Zhu
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Publication number: 20140194546Abstract: An easily dismantlable adhesive composition containing: an acrylic block polymer having a poly(meth)acrylate chain (A) formed of a carboxyl precursor group-containing (meth)acrylate monomer (a) and a poly(meth)acrylate chain (B) that contains, as monomer components, a (meth)acrylate (b) having an alkyl group having 1 to 14 carbon atoms and a polar group-containing monomer (c); and either an acid catalyst or an acid generator, makes it possible to achieve favorable adhesiveness and dismantlability and suppress stick-slip at the time of dismantlement.Type: ApplicationFiled: June 1, 2012Publication date: July 10, 2014Applicants: OSAKA CITY UNIVERSITY, DIC CORPORATIONInventors: Akikazu Matsumoto, Eriko Sato, Akinori Morino, Koujirou Tanaka
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Patent number: 8507572Abstract: The present invention relates to functionalizing a surface of an organic material. For example, surfaces of materials having C—H bonds, such as polymers having C—H bonds, can be functionalized. In certain embodiments, a heterobifunctional molecule having a photoactive anchor, a spacer, and a terminal functional group is applied to the surface of an organic material that contains one or more C—H bonds. The heterobifunctional molecule can be bound to any surface having C—H bonds as the photoactive anchor can react with C—H bonds upon irradiation. The terminal functional group has a “click” functionality which can be utilized to functionalize the surface of the organic material with any desired functionalizing moiety having the orthogonal click functionality.Type: GrantFiled: June 8, 2010Date of Patent: August 13, 2013Assignee: The Trustees of Columbia University in the City of New YorkInventors: Jeffrey Lancaster, Nicholas J. Turro, Jeffrey T. Koberstein
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Publication number: 20130171415Abstract: Disclosed is a photosensitive resin composition comprising: (Component A) an oxime sulfonate compound represented by Formula (1); (Component B) a resin comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group or a phenolic hydroxy group; and (Component C) a solvent wherein in Formula (1) R1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, Ar1 denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2, provided that of two or more R2s present in the compound, at least one denotes an alkyl group, an aryl group, or a halogen atom.Type: ApplicationFiled: February 27, 2013Publication date: July 4, 2013Applicant: FUJIFILM CorporationInventor: FUJIFILM Corporation
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Publication number: 20130158152Abstract: An interpenetrating polymer network includes ?CH2—CH2—O?n segments, and is formed by polymerizing a first monomer R1—O?CH2—CH2—O?nR2 with a second monomer R3—O?CH2—CH2—O?mR4 under an initiator. Each “R1”, “R2” and “R3” includes —C?C— group or —C?C— group. The “R4” includes an alkyl group or a hydrogen atom. The “m” and “n” are integer. Molecular weights of the first monomer and the second monomer are more than or equal to 100, and less than or equal to 800. The first monomer is less than or equal to 50% of the second monomer by weight. A method for making the interpenetrating polymer network is also provided.Type: ApplicationFiled: October 17, 2012Publication date: June 20, 2013Inventors: LI WANG, XIANG-MING HE, JIAN-JUN LI, JIAN GAO, CHANG-YIN JIANG
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Patent number: 8378002Abstract: The present invention provides an aqueous ink composition including at least a sensitizing dye represented by the following Formula (i), an ethylenically unsaturated bond-containing water-soluble polymerizable compound, a polymerization initiator and water: wherein, in Formula (i), X represents O, S or NR; n represents an integer of 0 or 1; R represents a hydrogen atom, an alkyl group or an acyl group; each of R1, R2, R3, R4, R5, R6, R7 and R8 independently represents a hydrogen atom or a monovalent substituent, provided that any neighboring two of R1, R2, R3 and R4 may be bonded to each other to form a ring, and R5 and R7 or R8, or R6 and R7 or R8, may be bonded to each other to form an aliphatic ring but do not form an aromatic ring.Type: GrantFiled: July 8, 2009Date of Patent: February 19, 2013Assignee: FUJIFILM CorporationInventor: Hirokazu Kyota
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Patent number: 8378011Abstract: Lubricous coatings, methods for making and using lubricous coatings, and medical device that include lubricious coatings. An example lubricous coating may include a hydrophilic polymer, a flow modifier, an acrylic monomer, a photoinitiator, and a solvent. The coating can be used to coat a medical device along an inner surface, an outer surface, or an intermediate surface.Type: GrantFiled: December 27, 2007Date of Patent: February 19, 2013Assignee: Boston Scientific Scimed, Inc.Inventors: Lincoln Eramo, Jr., James Campbell, Paul Matlin
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Patent number: 8372577Abstract: It is disclosed a photosensitive resin composition comprising (a) a binder polymer based on a copolymer containing benzyl (meth)acrylate as a building block, (b) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule and (c) a photopolymerization initiator based on a hexarylbisimidazole compound, with a light-initiated color former being optionally contained as component (d). The composition has long-term keeping quality, exhibits particularly high resistance to plating and dry etching, as well as assuring improvement in resolution and adhesion; the composition may be used to form a photosensitive dry film.Type: GrantFiled: June 9, 2010Date of Patent: February 12, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yukihiko Tanaka, Shinkichi Asahi, Naoya Katsumata
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Publication number: 20130017246Abstract: The present invention provides switchable adhesives comprising a mixture, in proportions by weight, of 20% to 98% of an adhesive, 2% to 80% of curable molecules and 0.05% to 10% of photoinitiator in which the weight proportion of the adhesive is calculated on the basis of its dry weight and wherein the adhesive includes an internal cross-linker for cross-linking the adhesive during drying to provide a cohesive strength of between 5 and 100 N/12.7×12.7 mm measured according to FINAT test method No. 18. Preferably, the adhesive and curable molecules are mutually soluble when dry, or the curable molecules and adhesive may be uniformly dispersed in each other. Preferably the amount of adhesive in the mixture is in the range 40% to 98% by weight, more preferably 60% to 95% by weight, even more preferably 70% to 85% by weight. Preferably the proportion of curable molecules in the mixture ranges from 2% to 60% by weight, more preferably 5% to 40% by weight, even more preferably 15% to 30 by weight.Type: ApplicationFiled: March 31, 2011Publication date: January 17, 2013Applicant: LUMINA ADHESIVES ABInventor: Mats Tunius
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Patent number: 8329771Abstract: The object of the present invention is to provide a photobase generator capable of efficiently generating amines (tertiary amines and amidine) high in catalytic activity by sensing light with a wavelength of from 350 to 500 nm (especially, from 400 to 500 nm). The present invention is a photobase generator characterized in being represented by general formula (1) or (2). Y+ is a quaternary ammonio group of general formula (3) to (5), and X? is a counter anion selected from among a borate anion, a phenolate anion, and a carboxylate anion.Type: GrantFiled: March 18, 2009Date of Patent: December 11, 2012Assignee: San-Apro LimitedInventors: Atsushi Shiraishi, Hideki Kimura
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Publication number: 20120245245Abstract: A photoperoxidation process including irradiating a donor molecule with light from a light source to form an activated donor molecule, contacting the activated donor molecule with an acceptor molecule to form an activated acceptor molecule, and contacting the activated acceptor molecule with a diene elastomer in a vessel to form a singlet oxygen functionalized elastomer molecule.Type: ApplicationFiled: March 25, 2011Publication date: September 27, 2012Applicant: Fina Technology, Inc.Inventors: Olga Khabashesku, Billy Ellis
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Patent number: 8236870Abstract: A curable solid ink composition including a curable component, a non-curable component including an ethoxylated octylphenol derivative, a photoinitiator, and a colorant. The curable solid ink composition has a viscosity in the range of less than 10 cPs at 90° C., a shrinkage value of less than 3%, and a superior curing rate compared to existing curable solid ink compositions. The ethoxylated octylphenol derivatives may be prepared by reacting an ethoxylated octylphenol, a linear alcohol, and diisocyanates or polyisocyanates.Type: GrantFiled: February 11, 2010Date of Patent: August 7, 2012Assignee: Xerox CorporationInventors: Marcel P. Breton, Michelle N. Chretien, Jeffrey H. Banning, Stephan V. Drappel, Ian R. Duffy, Christopher A. Wagner
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Patent number: 8088836Abstract: An oxime ester compound represented by the following general formula (I): (the symbols of which are defined in the specification) is used as the photopolymerization initiator in a photosensitive resin composition.Type: GrantFiled: February 16, 2010Date of Patent: January 3, 2012Assignee: Nippon Chemical Works Co., Ltd.Inventor: Yuji Taguchi
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Publication number: 20110267714Abstract: Provided is a photopolymerizable composition that is highly sensitive to light having wavelengths of 365 nm and 405 nm, and is capable of forming a curable film that can suppress deterioration in physical properties of the film due to heat-aging. The photopolymerizable composition include: (A) an oxime polymerization initiator which includes a condensed ring formed by containing two or more rings selected from an aromatic ring and a heterocyclic ring, and a cyclic structure which is connected to the condensed ring, the cyclic structure containing a carbonyl group and having an oxime group directly connected to the carbonyl group; and (B) a polymerizable compound.Type: ApplicationFiled: January 12, 2010Publication date: November 3, 2011Applicant: FUJIFILM CORPORATIONInventors: Masaomi Makino, Tomotaka Tsuchimura
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Patent number: 8048613Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.Type: GrantFiled: October 13, 2008Date of Patent: November 1, 2011Assignee: Taiyo Ink Mfg. Co., Ltd.Inventors: Nobuhito Itoh, Yoko Shibasaki, Kenji Kato, Masao Arima
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Patent number: 8034849Abstract: A pressure-sensitive adhesive composition capable of giving a pressure-sensitive adhesive sheet which simultaneously realizes satisfactory holding power, adhesion, and peel resistance in peeling from curved surfaces, while balancing these properties, and has satisfactory heat resistance. The composition comprises the following ingredients: (A) a maleimide crosslinking agent having two or more maleimide groups per molecule; (B) a monomer which, when caused to homopolymerize, gives a homopolymer having a glass transition temperature of ?40° C. or lower; (C) a carboxylated monomer copolymerizable with the monomer of the ingredient (B); and (D) a photopolymerization initiator, the maleimide crosslinking agent of the ingredient (A) being contained in an amount of 0.01-2 parts by weight per 100 parts by weight of the sum of the monomers of the ingredients (B) and (C).Type: GrantFiled: September 12, 2005Date of Patent: October 11, 2011Assignees: Sony Corporation, Sony Chemical & Information Device CorporationInventors: Masao Murakami, Hirofumi Hashimoto, Noboru Araki
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Patent number: 8008364Abstract: The present invention provides a pigment dispersion liquid including a pigment, a compound having a cyclic urea structure and having an acid group or a basic group, a dispersant, and a solvent. The pigment may be a pigment having a urea structure or an imide structure. The pigment may also be a pigment having a barbituric skeleton.Type: GrantFiled: July 10, 2008Date of Patent: August 30, 2011Assignee: Fujifilm CorporationInventors: Kazuto Shimada, Yushi Kaneko, Tomotaka Tsuchimura
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Publication number: 20110196057Abstract: A curable solid ink composition including a curable component, a non-curable component including an ethoxylated octylphenol derivative, a photoinitiator, and a colorant. The curable solid ink composition has a viscosity in the range of less than 10 cPs at 90° C., a shrinkage value of less than 3%, and a superior curing rate compared to existing curable solid ink compositions. The ethoxylated octylphenol derivatives may be prepared by reacting an ethoxylated octylphenol, a linear alcohol, and diisocyanates or polyisocyanates.Type: ApplicationFiled: February 11, 2010Publication date: August 11, 2011Applicant: XEROX CORPORATIONInventors: Marcel P. BRETON, Michelle N. CHRÉTIEN, Jeffrey H. BANNING, Stephan V. DRAPPEL, Ian R. DUFFY, Christopher A. WAGNER
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Publication number: 20110121435Abstract: A photosensitive adhesive composition that comprises (A) a resin with a carboxyl and/or hydroxyl group, (B) a thermosetting resin, (C) a radiation-polymerizable compound and (D) a photoinitiator, wherein the 3% weight reduction temperature of the entire photoinitiator mixture in the composition is 200° C. or greater.Type: ApplicationFiled: January 9, 2009Publication date: May 26, 2011Inventors: Kazuyuki Mitsukura, Takashi Kawamori, Takashi Masuko, Shigeki Katogi
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Publication number: 20110065824Abstract: A curable composition for imprints excellent in adhesiveness to a substrate is disclosed. The composition comprises an oxime ester compound (A) and a polymerizable monomer (B), and the content of the polymerizable monomer (B) falls within a range of 80% by mass or more, relative to all ingredients of the composition except for a solvent.Type: ApplicationFiled: September 14, 2010Publication date: March 17, 2011Applicant: FUJIFILM CorporationInventors: Akinori FUJITA, Tomotaka Tsuchimura
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Patent number: 7812194Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.Type: GrantFiled: August 30, 2006Date of Patent: October 12, 2010Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Toshiaki Aoai
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Publication number: 20090292039Abstract: Disclosed is an oxime ester compound represented by the following general formula (I). (In the formula, R1, R2 and R3 independently represent R11, OR11, COR11, SR11, CONR12R13 or CN; R11, R12 and R13 Independently represent a hydrogen atom, an alkyl group having 1-20 carbon atoms, an aryl group having 6-30 carbon atoms, an arylalkyl group having 7-30 carbon atoms or a heterocyclic group having 2-20 carbon atoms; R4 and R5 independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom or a hydroxy group; and a and b independently represent a number of 0-3.Type: ApplicationFiled: December 21, 2007Publication date: November 26, 2009Applicant: ADEKA CORPORATIONInventors: Daisuke Sawamoto, Koichi Kimijima, Kiyoshi Murata, Yasunori Kozaki, Takeo Oishi
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Publication number: 20090171302Abstract: Lubricous coatings, methods for making an using lubricous coatings, and medical device that include lubricious coatings. An example lubricous coating may include includes a hydrophilic polymer, a flow modifier, an acrylic monomer, a photoinitiator, and a solvent. The coating can be used to coat a medical device along an inner surface, an outer surface, or an intermediate surface.Type: ApplicationFiled: December 27, 2007Publication date: July 2, 2009Applicant: BOSTON SCIENTIFIC SCIMED, INC.Inventors: LINCOLN ERAMO, Jr., JAMES CAMPBELL, PAUL MATLIN
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Patent number: 7482107Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.Type: GrantFiled: March 23, 2006Date of Patent: January 27, 2009Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
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Patent number: 7449573Abstract: A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.Type: GrantFiled: February 14, 2005Date of Patent: November 11, 2008Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Kenji Wada, Kaoru Iwato
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Patent number: 7439302Abstract: A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubstituted naphthalene or naphthol moiety, including mixtures thereof. Examples of the polymer of this invention include: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. The organic moiety mentioned above may be a substituted or unsubstituted hydrocarbon selected from the group consisting of a linear or branched alkyl, halogenated linear or branched alkyl, aryl, halogenated aryl, cyclic alkyl, and halogenated cyclic alkyl, and any combination thereof.Type: GrantFiled: August 2, 2005Date of Patent: October 21, 2008Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Sean D. Burns, Mahmoud Khojasteh
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Patent number: 7435526Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.Type: GrantFiled: June 14, 2004Date of Patent: October 14, 2008Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Toshiaki Aoai
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Publication number: 20080226916Abstract: Radiation curable coatings for use as a Primary Coating for optical fibers, optical fibers coated with said coatings and methods for the preparation of coated optical fibers. The radiation curable coating comprises at least one (meth)acrylate functional oligomer and a photoinitiator, wherein the urethane-(meth)acrylate oligomer CA/CR comprises (meth)acrylate groups, at least one polyol backbone and urethane groups, wherein about 15% or more of the urethane groups are derived from one or both of 2,4- and 2,6-toluene diisocyanate, wherein at least 15% of the urethane groups are derived from a cyclic or branched aliphatic isocyanate, and wherein said (meth)acrylate functional oligomer has a number average molecular weight of from at least about 4000 g/mol to less than or equal to about 15,000 g/mol; and wherein a cured film of the radiation curable Primary Coating composition has a modulus of less than or equal to about 1.2 MPa.Type: ApplicationFiled: December 13, 2007Publication date: September 18, 2008Inventors: Paulus Antonius Maria STEEMAN, Xiansong Wu, Steven R. Schmid, Edward J. Murphy, John M. Zimmerman, Anthony Joseph Tortorello
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Patent number: 7416821Abstract: Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV b) a phenolic crosslinker; c) a thermal acid generator (TAG); and d) a solvent.Type: GrantFiled: March 9, 2005Date of Patent: August 26, 2008Assignee: Fujifilm Electronic Materials, U.S.A., Inc.Inventors: Binod B De, Sanjay Malik, J. Thomas Kocab, Thomas Sarubbi
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Patent number: 7364834Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.Type: GrantFiled: July 13, 2005Date of Patent: April 29, 2008Assignee: Rohm and Haas Electronic Materials LLCInventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
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Publication number: 20080076847Abstract: Composition with at least one polymerizable binder and a polymerization initiator, which contains at least one acylgermane according to general Formula (I), in which R0 is a substituted or unsubstituted C1-18-alkyl radical or an acyl group; R1 and R2 are H, an acyl group or have one of the meanings given for R3; R3 is a branched or linear C1-18-alkyl radical which can be unsubstituted or substituted one or more times by —O—, —NH—, —NR—, —S— or interrupted by other groups, trimethylsilyl, hal-(CH3)2Si—[OSi(CH3)2]r?, (CH3)3Si—[OSi(CH3)2]r—, —COOH, —COO—R10, —CO—NR11R12, —CO-vinyl, —CO-phenyl, phenyl-C1-4-alkyl, phenyl, naphthyl or biphenyl, C5-12 cycloalkyl, a 5 or 6-membered O, S or N-containing heterocyclic ring, halogen, OH, an aromatic C6-30 radical which can be substituted or unsubstituted and/or interrupted by O, S or —NR—, or a branched, cyclic or linear C1-20 alkyl, -alkenyl, -alkoxy or -alkenoxy radical; m is 1, 2 or 3; n is 0 or 1 and p is 0 or 1; and the use of acyl germanes of Formula (I) for exType: ApplicationFiled: April 2, 2007Publication date: March 27, 2008Applicant: IVOCLAR VIVADENT AGInventors: Norbert Moszner, Ulrich Salz, Urs Karl Fischer, Robert Liska, Heinrich Gruber, Beate Ganster
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Patent number: 7300747Abstract: The photobase generator of the invention is represented by the following formula 1: wherein Ar, R, A+ and X? are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by polymerization under ultraviolet irradiation.Type: GrantFiled: February 7, 2005Date of Patent: November 27, 2007Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Hitoshi Okazaki, Junya Hayakawa, Motoharu Takeuchi, Masahiro Jono, Kenji Ishii
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Patent number: 7276544Abstract: A process for producing intraocular lenses (IOLs) capable of absorbing blue light and ultraviolet light using photo curing. Intraocular lenses so produced block blue light and ultraviolet light from reaching the retina of an eye implanted with the IOL. By blocking blue light and ultraviolet light from reaching the retina, the IOL thereby prevents potential damage to the retina.Type: GrantFiled: September 8, 2003Date of Patent: October 2, 2007Assignee: Bausch & Lomb IncorporatedInventors: Yu-Chin Lai, Dominic V. Ruscio, George F. Green
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Patent number: 7244548Abstract: A photopolymerizing composition and a photopolymerizing recording medium manufactured using the composition, wherein the photopolymerizing composition contains: 1.0-99.0% by weight of at least one kind of polymerizable compound; 0.05-0.5% by weight of at least one kind of photosensitizer selected from among photochromic compounds that change color by incoherent UV light irradiation; 0.2-6.0% by weight of a coinitiator that is activated by visible light in the presence of a photoinduced form of the photochromic compound transformed by incoherent UV light to photopolymerize the polymerizable compound; 0-97.5% by weight of a polymer binding agent; 0-6.0% by weight of a plasticizer; and 0-3.0% by weight of a non-polymerizing solvent. The photopolymerizing recording medium has a high angular diffraction selectivity and thus can be effectively used to manufacture a 3D holographic optical memory with ultra high information storage capacity.Type: GrantFiled: November 22, 2004Date of Patent: July 17, 2007Assignees: Samsung Electronics Co., Ltd., Photochemistry Center of Russian Academy of SciencesInventors: Valery Aleksandrovich Barachevsky, Svetlana Ivanovna Peredereeva, Dmitry Valerevich Nesterenko, Aleksandr Vladimirovich Lyubimov, Viktor Kamilievich Salahutdinov, Mikhail Mikhailovich Krayushkin, Nataliya Timofeovna Sokolyuk, Andrei Leanovich Mikaelyan
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Patent number: 7214431Abstract: The invention relates to a liquid curable resin composition capable of forming a ribbon matrix material which can be completely removed from a coloring layer when separating the optical fiber ribbon. A liquid curable resin composition comprising: (1) 30–80 wt. % of a urethane (meth)acrylate produced by reacting (A) a polyol compound, (B) a polyisocyanate compound, and (C) a (meth)acrylate compound containing a hydroxyl group, (2) 0.01–10 wt % of 2-methly-1-[4-(methylthio)phenyl]-2-morpholino-propan-1-one, and (3) 10–70 wt. % of a polymerizable diluent comprising a polymerizable monofunctional vinyl monomer which is copolymerizable with the component (1), wherein a two-layer film, which is obtained by applying the composition to a cured film of a UV-curable resin comprising the compound shown by the above formula (1) and curing the composition, has a T-peel strength of about 1.8 g/cm or less.Type: GrantFiled: April 3, 2001Date of Patent: May 8, 2007Assignee: DSM IP Assets B.V.Inventors: Zen Komiya, Takashi Ukachi
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Patent number: 7148265Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.Type: GrantFiled: March 18, 2003Date of Patent: December 12, 2006Assignee: Rohm and Haas Electronic Materials LLCInventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
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Patent number: 7030169Abstract: Compositions are provided that that can be used as an initiator system for free radical polymerization reactions. More specifically, the initiator systems include an electron acceptor and an electron donor. The electron donors are arylsulfinate salts having a cation that contains at least one carbon atom and either a positively charged nitrogen atom or a positively charged phosphorus atom. Methods of polymerization are also provided that can be used to prepare polymeric material with the initiator systems. The initiator systems can be thermal initiator systems, photoinitiator systems, or combinations thereof.Type: GrantFiled: September 26, 2003Date of Patent: April 18, 2006Assignee: 3M Innovative Properties CompanyInventors: Rajdeep S. Kalgutkar, Michael C. Palazzotto
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Patent number: 7008752Abstract: A photosensitive resin composition which, when exposed to light through a photomask and then developed, can form a pattern comprising a polyimide film having a thickness of 20 ?m or larger with high resolution; and a use of the composition, in particular, a method of forming a pattern comprising the polyimide film. The photosensitive resin composition comprises (a) a poly(amic acid), (b) a specific 1,4-dihydropyridine derivative, and (c) a specific imide acrylate compound.Type: GrantFiled: March 17, 2005Date of Patent: March 7, 2006Assignee: Nitto Denko CorporationInventors: Hirofumi Fujii, Yasuhito Funada, Satoshi Tanigawa
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Patent number: 6849669Abstract: The invention relates to macromolecular hydrophilic photocrosslinkers having polymeric backbones of substituted ethylene groups carrying photoactive groups. The photocrosslinkers are capable of producing, when being exposed to light of determined wavelengths above 305 nm, radicals which are retained on the macromolecular photocrosslinkers and reacting so as to accomplish a crosslinked network structure. The invention further relates to the preparation of photocrosslinkers, their use in different aqueous systems and their utility in production of medical devices including ophthalmic lenses.Type: GrantFiled: March 16, 2000Date of Patent: February 1, 2005Assignee: Pharmacia Groningen BVInventors: Kenneth A. Hodd, Keith Alfred Dillingham, Jacqueline deGroot, Hendrik Haitjema
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Patent number: 6803394Abstract: A composition for actinic radiation curable nail coatings and artificial nail tips comprising a BISGMA based urethane resin, an additional polymer, a photoinitiator, and having a viscosity of greater than approximately 80,000 cps. Composition may additionally comprise other additives known in the art and also methods of application of the composition alone and with related compositions.Type: GrantFiled: May 21, 2002Date of Patent: October 12, 2004Assignee: Gel Products, Inc.Inventors: Pamela H. Lilley, Sarah Peterson
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Patent number: 6780896Abstract: Zinc-complex photoiniators and applications therefore are disclosed. The zinc-complex photoinitiators of the present invention include various pendent groups which serve to protect the compound from hydrolysis. In this manner, the stability of the photoinitiator is increased. The photoinitiators of the present invention can be used in many different processes and applications. For example, the photoinitiators are well suited for use in photocurable inks as used in ink jet printers or on a printing press.Type: GrantFiled: December 20, 2002Date of Patent: August 24, 2004Assignee: Kimberly-Clark Worldwide, Inc.Inventors: John Gavin MacDonald, Jason Lye
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Publication number: 20040091816Abstract: A photosensitive composition exhibiting enhanced sensitivity is disclosed, comprising an ethylenically unsaturated monomer, a photopolymerization initiator composition and a polymer binder, wherein the photopolymerization initiator composition contains a polyhalogen compound. There is also disclosed a photosensitive lithographic printing plate comprising the foregoing photosensitive composition on a support having a hydrophilic surface.Type: ApplicationFiled: October 17, 2003Publication date: May 13, 2004Applicant: Konica Minolta Holdings, Inc.Inventors: Toshiyuki Matsumura, Kazuhiko Hirabayash
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Patent number: 6713524Abstract: The invention relates to novel reactive polymers of formula wherein the variables are as defined in the claims. The polymers of the invention are useful for the modification of material surfaces and are particularly suitable for providing biomedical articles such as contact lenses with a hydrophilic coating.Type: GrantFiled: March 9, 2001Date of Patent: March 30, 2004Assignee: Novartis AGInventors: Jörg Leukel, Peter Chabrecek, Dieter Lohmann
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Patent number: 6709804Abstract: A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprises coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition forms a resin layer having excellent heat resistance.Type: GrantFiled: February 19, 2003Date of Patent: March 23, 2004Assignees: Riken, Sumitomo Bakelite Company, Ltd.Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
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Publication number: 20030215635Abstract: In the disclosed method for the reshaping (adornment, repair, covering, prosthetic extension, etc.Type: ApplicationFiled: May 20, 2002Publication date: November 20, 2003Inventor: Allen D. Johnston
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Patent number: 6599958Abstract: Light cured nail coatings that are applied to natural nails and/or artificial nail-tips for cosmetic purposes. An optional bond-enhancing compound can be used to strengthen the bond between the light curable coatings and the natural nail. Also, finishing compounds may be used to clean the surface of the uv curable coatings resulting in a high-gloss shine. The methods of applying uv-radiation curable nail coatings, bond-enhancing compounds, and finishing compounds to artificial nail-tips and natural nail are also discussed.Type: GrantFiled: July 24, 2001Date of Patent: July 29, 2003Assignee: Gel Products, Inc.Inventor: Pamela H. Lilley