Containing Halogen Patents (Class 522/52)
-
Patent number: 8361691Abstract: A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.Type: GrantFiled: August 28, 2007Date of Patent: January 29, 2013Assignee: JSR CorporationInventors: Nobuji Matsumura, Daisuke Shimizu, Toshiyuki Kai
-
Patent number: 6780896Abstract: Zinc-complex photoiniators and applications therefore are disclosed. The zinc-complex photoinitiators of the present invention include various pendent groups which serve to protect the compound from hydrolysis. In this manner, the stability of the photoinitiator is increased. The photoinitiators of the present invention can be used in many different processes and applications. For example, the photoinitiators are well suited for use in photocurable inks as used in ink jet printers or on a printing press.Type: GrantFiled: December 20, 2002Date of Patent: August 24, 2004Assignee: Kimberly-Clark Worldwide, Inc.Inventors: John Gavin MacDonald, Jason Lye
-
Patent number: 6569603Abstract: There are disclosed a light-sensitive composition which comprises (A) a polymer having a phenyl group substituted by a vinyl group at a side chain, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photo-polymerization initiator, or a light-sensitive composition which comprises (A′) a polymer, the above-mentioned (B) and (C), and (D) a monomer having at least two phenyl groups each of which is substituted by a vinyl group in the molecule of the monomer; and a method of forming a relief image which comprises coating the light-sensitive composition as mentioned above on a support, exposing the composition by exposure or scanning exposure and developing the same to form a relief image on the support.Type: GrantFiled: January 30, 2001Date of Patent: May 27, 2003Assignee: Mitsubishi Paper Mills LimitedInventor: Akira Furukawa
-
Patent number: 6451869Abstract: Cyclopentadienylplatinum (IV) compounds having C7-20 aromatic radical substitution on the cyclopentadienyl ring have been found to impart enhanced cure speed and shelf-life stability to irradiation-curable silicone mixtures.Type: GrantFiled: September 13, 2000Date of Patent: September 17, 2002Assignee: General Electric CompanyInventor: Matthew David Butts
-
Patent number: 5716756Abstract: Sulfonic acid esters are used as (a) compounds for forming a strong acid on irradiation in radiation-sensitive, positive or negative working mixtures also comprising (b) either a compound with at least one acid-decomposable C--O--C or C--O--Si bond (for positive working mixtures) or a compound with at least acid-cross-linkable groups (for negative working mixtures) and c) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solutions, wherein said sulfonic acid esters are formula?R.sup.1 --CR.sup.2 (CF.sub.3)--O--SO.sub.2 --!.sub.n R.sup.3(I)orR.sup.1 ?--CR.sup.2 (CF.sub.3)--O--SO.sub.2 --R.sup.3 !m (II)wherein R.sup.1, R.sup.2, R.sup.3, n and n are defined with the body of the disclosure. These mixtures are particularly suitable for exposure to deep UV radiation in the formation of recording materials suitable for the production of photoresists, electronic components, and printing plates.Type: GrantFiled: May 30, 1995Date of Patent: February 10, 1998Assignees: Hoechst Aktiengesellschaft, Herberts GmbHInventors: Georg Pawlowski, Walter Spiess, Horst Roeschert, Wolfgang Appel, Walter Herr
-
Patent number: 5529886Abstract: The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.Type: GrantFiled: May 1, 1995Date of Patent: June 25, 1996Assignee: Hoechst AktiengesellschaftInventors: Mathias Eichhorn, Gerhard Buhr
-
Patent number: 5489499Abstract: A photosensitive trihalomethyl-s-triazine compound and a photopolymerizable composition containing the photosensitive trihalomethyl-s-triazine compound. The photosensitive trihalomethyl-s-triazine compound is represented by formula (I): ##STR1## wherein X represents a chlorine atom or a bromine atom; Y represents an alkyl group, a CF.sub.3 group, a CF.sub.2 Cl group, an alkyl group substituted with a group or an atom other than hydrogen atoms, a C.sub.6 F.sub.5 group, or a group represented by --Z--CO--OR.sup.3 or --C.sub.6 H.sub.4 --R.sup.4, in which R.sup.3 represents a hydrogen atom or alkyl group, Z represents --C.sub.2 H.sub.4 --, --C.sub.3 H.sub.6 --, --CH.dbd.CH--, or o-phenylene group, and R.sup.Type: GrantFiled: October 25, 1994Date of Patent: February 6, 1996Assignee: Fuji Photo Film Co., Ltd.Inventor: Masatoshi Yumoto
-
Patent number: 5449588Abstract: A photosensitive resin composition containing 0.5 to 15 parts by weight of a compound generating an acid by light irradiation in 100 parts by weight of a polyamic acid amide having an alkoxysilane having a specified structure at its terminals are provided,which composition has superior resolution properties, a small shrinkage of volume, a superior adhesion onto a substrate, and can prepare a polyimide by baking.Type: GrantFiled: May 27, 1994Date of Patent: September 12, 1995Assignee: Chisso CorporationInventors: Hirotoshi Maeda, Eiji Watanabe, Kouichi Katou, Kouichi Kunimune
-
Patent number: 5298364Abstract: Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)-alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2.Type: GrantFiled: June 9, 1992Date of Patent: March 29, 1994Assignee: Hoechst AktiengesellschaftInventors: Georg Pawlowski, Horst Roeschert, Walter Spiess, Klaus-Juergen Przybilla
-
Patent number: 5286601Abstract: Radiation-sensitive organo-halogen compounds having a photo-labile halomethyl-1,3,5-triazine moiety and at least one amine-containing moiety within one molecule. The compounds serve the dual purpose of photoinitiation and polymerization acceleration, thereby eliminating the need for the use of two separate compounds. The compounds of this invention are good photoinitiators, and compositions containing them are useful in printing, duplicating, copying, and other imaging systems.Type: GrantFiled: May 20, 1992Date of Patent: February 15, 1994Assignee: Minnesota Mining and Manufacturing Co.Inventors: Mitchell A. Rossman, James A. Bonham
-
Patent number: 5262276Abstract: A light-sensitive composition which comprises at least one compound represented by the following general formula (I) as light-free radical generator:S-L-A (I)in formula (I), S represents a light absorbing moiety which absorbs light having a wave length of not less than 300 nm with an absorptivity coefficient of not less than 1000, A represents an active moiety which interacts with the light absorbing moiety S in an excited state to generate free radicals and L represents a group for coupling the moieties S and A; and a photopolymerizable composition which comprises at least one radical polymerizable compound having ethylenically unsaturated group, at least one compound represented by the foregoing general formula (I) as a light-free radical generator and optionally at least one linear organic high molecular weight polymer.Type: GrantFiled: May 10, 1989Date of Patent: November 16, 1993Assignee: Fuji Photo Film Co., Ltd.Inventor: Kouichi Kawamura
-
Patent number: 5258260Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzennelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H.sub.2.Type: GrantFiled: November 23, 1992Date of Patent: November 2, 1993Assignee: Olin CorporationInventors: Sydney G. Slater, Stanley A. Ficner
-
Patent number: 5258265Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H.sub.2.Type: GrantFiled: November 23, 1992Date of Patent: November 2, 1993Assignee: Olin CorporationInventors: Sydney G. Slater, Stanley A. Ficner
-
Patent number: 5178987Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or ##STR2##Type: GrantFiled: April 24, 1989Date of Patent: January 12, 1993Assignee: Olin CorporationInventors: Sydney G. Slater, Stanley A. Ficner
-
Patent number: 5141841Abstract: A radiation-sensitive compound has the general formula ##STR1## wherein A represents the ring members required to complete a 5- or 6-membered heterocyclic ring which may optionally be fused to an optionally substituted aromatic nucleus,B represents H, acyl, aroyl, heterocyclyl carbonyl or ##STR2## R represents an optionally substituted alkyl group, E and G, which may be the same or different, each represents H or CH.sub.p X.sub.3-p,J and K, which may be the same or different, each represents an aryl or heterocyclic group, which may optionally include a substituent additional to E or G,X represents Cl or Br, and m,n and p, which may be the same or different, each represents an integer equal to 0, 1 or 2.The compound can be used to form radiation sensitive compositions for the production of radiation sensitive plates in lithographic printing plate manufacture.Type: GrantFiled: August 17, 1989Date of Patent: August 25, 1992Assignee: Vickers PLCInventor: John R. Wade
-
Patent number: 5089536Abstract: An energy polymerizable composition and process therefore, comprising a cationically polymerizable material and a catalytically effective amount of an ionic salt of an organometallic complex cation as polymerization initiator, said ionic salt of an organometallic complex cation being capable of adding an intermediate strength nucleophile or upon photolysis capable of liberating at least one coordination site, said metal in said organometallic complex cation being selected from elements of Periodic Groups IVB, VB, VIB, VIIB, and VIIIB are disclosed. Certain of the organometallic metallic polymerization initiators are novel cationic salts.Type: GrantFiled: November 22, 1982Date of Patent: February 18, 1992Assignee: Minnesota Mining and Manufacturing CompanyInventor: Michael C. Palazzotto
-
Patent number: 4837128Abstract: A light-sensitive composition is herein disclosed, which comprises at least one light-sensitive s-triazine compound represented by the following general formula (I) and at least one compound having at least one ethylenically unsaturated double bond and capable of causing addition polymerization: ##STR1## wherein R.sub.1 and R.sub.2 independently represent hdyrogen atom, a substituted or unsubstituted alkyl or aryl group, or a group represented by the general formula: R.sub.5 --CO-- or N(R.sub.6) (R.sub.7)--CO-- (wherein R.sub.5 stands for a substituted or unsubstituted alkyl or aryl group; and R.sub.6 and R.sub.7 independently represent hydrogen atom or a substituted or unsubstituted alkyl or aryl group), provided that R.sub.1 and R.sub.2 may form a heterocyclic ring consisting of non-metallic atoms together with the nitrogen atom to which they are bonded; R.sub.3 and R.sub.4 represent hydrogen, a halogen, an alkyl or an alkoxyl; X and Y independently represent chlorine or bromine; and m and n are 0, 1 or 2.Type: GrantFiled: July 29, 1987Date of Patent: June 6, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Kouichi Kawamma, Yukio Abe, Tatsuji Higashi, Yoshimasa Aotani
-
Patent number: 4772534Abstract: A light-sensitive composition containing a novel light-sensitive s-triazine compound represented by the formula (I) as a free radical-generating agent is disclosed. The s-triazine compound responds radiation in the range of the near ultraviolet to visible light, shows high sensitivity for photolysis and, therefore, the compositon has high light-sensitivity.Type: GrantFiled: September 5, 1986Date of Patent: September 20, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Kouichi Kawamura, Hirokazu Kondo, Yoshimasa Aotani
-
Patent number: 4585876Abstract: Novel xanthones and thioxanthones of the formula I ##STR1## in which A, X, Y, Z, E and E' are as defined in patent claim 1, are described. A is preferably --S-- and E and E' are preferably bonded in the ortho-position relative to one another. The compounds (I) are suitable, for example, as sensitizers for photocrosslinkable polymers or photocurable compositions, or for use in mixtures with polymers with H donor groups for image formation, in particular electrically conductive coatings and patterns, by means of electroless deposition of metals.Type: GrantFiled: November 14, 1983Date of Patent: April 29, 1986Assignee: Ciba-Geigy CorporationInventors: Walter Fischer, Jurgen Finter, Hans Zweifel