Abstract: A method for manufacturing a device including a substrate and a second film disposed above the substrate includes: forming a first film above the substrate using a composition containing a polymerizable monomer and an oxidation inhibitor; and forming the second film by curing the first film in a state where at least one part of a mold having a convexo-concave pattern is in contact with the first film, or after at least one part of the mold is brought into contact with the first film. The oxidation inhibitor is at least one of a hindered amine compound and a hindered phenol compound having a molecular weight of 700 or more. The composition satisfies a relationship of (t0(T)?tx(T))/t0(T)×100?13.0. (t0(T) is a height of a convex part of cured film obtained by the specific method, and tx(T) is the corresponding height after heating at 260° C.

Abstract: The present invention provides a polymerizable composition that is suitably used as a temporary cement for implant use and a mobile tooth-fixing material. The present invention is a polymerizable composition that includes an acrylic block copolymer (a) having at least one polymer block A that mainly contains a (meth)acrylic acid ester unit and that functions as a hard segment and at least one polymer block B that mainly contains an acrylic acid ester unit and that functions as a soft segment, a polymerizable monomer (b), and a polymerization initiator (c).

Abstract: A photopolymerization method in which an ink composition including (A) a polymerizing compound having an ethylenic unsaturated group, (B) a photopolymerization initiator represented by Formula (1) described below, and (C) a hydrogen donor having a structure in which a nitrogen atom is directly bonded to an aromatic ring, in which the aromatic ring has an electron-withdrawing group or the nitrogen atom constitutes a hetero ring, is photopolymerized under acidic conditions, in Formula (1), each of R1 to R30 represents a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group.

Abstract: A dual-cure curable material kit comprising: (A) a radical-polymerizable monomer component; (B) a photopolymerization initiator component comprising (b1) an ?-diketone compound, (b2) an aliphatic tertiary amine compound having a tertiary amino group in which three saturated aliphatic groups are bonded to a nitrogen atom and one of the saturated aliphatic groups has an electron-withdrawing group as a substituent, and (b3) an s-triazine compound having a trihalomethyl group as a substituent, or a diaryliodonium salt compound; and a chemical polymerization initiator component (C) comprising (c1) an organic peroxide, and (c2) an N,N-di(hydroxyalkyl)-p-toluidine compound; which is packed separately at least in two packages so that the component (b2) and the component (b3) of the photopolymerization initiator component (B) are not packed together in a single package and the component (c1) and the component (c2) of the chemical polymerization initiator component (C) are not packed together in a single package.

Abstract: Curable adhesive compositions are provided that exhibit a high refractive index.

Abstract: A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and at least one stabilizer.

Abstract: The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.

Abstract: A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains 25 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 10,000 to 80,000 based on a total weight of the polysiloxane when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 400 and 100,000 measured by gel permeation chromatography. The amount of oligomers in the polysiloxane having a molecular weight less than 800 is from 0 wt % to 10 wt % based on a total weight of the photo-curing polysiloxane composition. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.

Abstract: Compounds of the formula I or (I?), wherein R1 and R?1 for example are hydrogen, C3-C8cycloalkyl or C1-C12alkyl, R2 and R2? for example are hydrogen; unsubstituted C1-C20alkyl or substituted C1-C20alkyl; and R8 and R9 for example are hydrogen, C1-C12alkyl which optionally is substituted, or phenyl which optionally is substituted; exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: Photoinitiators mixture comprising (i) at least one compound selected from the group consisting of alpha-hydroxy ketones, monoacylphosphine oxides, bisacylphosphine oxides, ketosulfones, benzil ketals, benzoin ether, phenylglyoxylates, borates and titanocenes; and (ii) at least one compound of the formula (I) or (I?) R1, R?1, R2 and R2? R?9 independently of each other for example are hydrogen or C1-C12alkyl R7, R8, R9, R?8 and R?9 independently of each other for example are hydrogen, C1-C12alkyl which optionally is substituted or phenyl which optionally is substituted, exhibit excellent photoinitiating properties.

Abstract: A liquid radiation curable composition for inkjet printing includes a photoinitiating system consisting of one or more diffusion hindered photoinitiators selected from the group consisting of non-polymeric di- or multifunctional initiators, oligomeric or polymeric initiators, and polymerizable initiators, and one or more polymerizable co-initiators, wherein at least one of the polymerizable co-initiators is a polymerizable aromatic tertiary amine. Inkjet inks, an inkjet printing process, and packaging materials may include the liquid radiation curable composition.

Abstract: Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.

Abstract: An oxime ester compound of formula (I) useful as a photopolymerization initiator. A photopolymerization initiator having the oxime ester compound as an active ingredient is activated through efficient absorption of light of long wavelength, e.g., 405 nm or 365 nm, to exhibit high sensitivity. In formula (I), R1 and R2 are each R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 are each hydrogen, a C1-C20 alkyl group, C6-C30 aryl group, a C7-C30 arylalkyl group, or a C2-C20 heterocyclic group; R3 and R4 are each R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, halogen, or a hydroxyl group; a and b is each 0 to 4; X is oxygen, sulfur, selenium, CR31R32, CO, NR33, or PR34; and R31, R32, R33, and R34 each have the same meaning as R1.

Abstract: The invention relates to a method for preparing molecular imprint polymers (MIP) by radical polymerisation that uses at least one primer including at least two chemical functions capable of forming reactive radicals, thereby providing a locally high radical concentration for priming the polymerisation on or about the imprint entity or molecule. The invention also relates to molecular imprint polymers (MIP) that can be obtained by the method of the invention, and to the use thereof in the production of biomimetic biosensors, biomimetic biochips, chemical sensors, specific adsorption separation devices, as a coating, particularly for releasing active ingredients.

Abstract: A radiation curable composition comprising a curable compound, a photo-initiator and a co-initiator, characterized in that said co-initiator is a oligomer or polymer having a repeating unit, said repeating unit comprising at least two tertiary amines, and said polymer being prepared by the polycondensation of di- or oligofunctional Michael acceptors with mono- or oligofunctional aliphatic primary amines or with di- or oligofunctional aliphatic secondary amines or with a mixture thereof.

Abstract: A radiation curable composition comprising a curable compound, a photo-initiator and a co-initiator, wherein said co-initiator has a structure according to Formula I A-L-B??Formula I wherein A represents a structural moiety comprising an aromatic tertiary amine; B represents a structural moiety comprising at least one aliphatic tertiary amine; L represents a divalent linking group positioning the nitrogen atom of the aromatic amine of the structural moiety A and the nitrogen of at least one aliphatic amine of the structural moiety B in a 1-3 to 1-23 position; with the proviso that at least one aromatic and at least one aliphatic amine each have at least one alfa-hydrogen.

Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.

Abstract: The present invention provides a pigment dispersion liquid including a pigment, a compound having a cyclic urea structure and having an acid group or a basic group, a dispersant, and a solvent. The pigment may be a pigment having a urea structure or an imide structure. The pigment may also be a pigment having a barbituric skeleton.

Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.

Abstract: The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.

Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.

Abstract: An oxime ester compound of formula (I) useful as a photopolymerization initiator. A photopolymerization initiator having the oxime ester compound as an active ingredient is activated through efficient absorption of light of long wavelength, e.g., 405 nm or 365 nm, to exhibit high sensitivity. In formula (I), R1 and R2 are each R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 are each hydrogen, a C1-C20 alkyl group, C6-C30 aryl group, a C7-C30 arylalkyl group, or a C2-C20 heterocyclic group; R3 and R4 are each R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, halogen, or a hydroxyl group; a and b is each 0 to 4; X is oxygen, sulfur, selenium, CR31R32, CO, NR33, or PR34; and R31, R32, R33, and R34 each have the same meaning as R1.

Abstract: A compound that exhibits excellent color tone stability and physical properties as well as excellent photopolymerization activity over a wide region from near-ultraviolet to visible region, permitting relaxed operation under ambient light, so that wide application can be found in the dental field and photopolymerization industry; and a relevant photopolymerization initiator and hardenable composition. In particular, there is provided a novel camphorquinone derivative having an acylphosphine oxide group [—(C?O)—(P?O)<] in each molecule. Further, there is provided a photopolymerization initiator comprising the camphorquinone derivative having an acrylphosphine oxide group [—(C?O)—(P?O)<] in each molecule as an indispensable component, loaded with at least one member selected from among a polymerization accelerator, a photoacid generator, a photosensitizer and a (bis)acylphosphine oxide, and provided a hardenable composition comprising the initiator.

Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.

Abstract: Photoinitiator modified silicate and ethylenically unsaturated monomer are reacted in solvent to cause living polymerization of monomer and exfoliation of silicate layers and cause attachment of silicate layers to polymer chains, thereby providing dispersed homopolymer or block copolymer silicate nanocomposites.

Abstract: Photosensitive polybenzoxazine compositions include a photosensitive additive such as an o-diazoquinone and a polymer comprising a repeating unit represented by the following formula (I) wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R4 comprises a hydrophilic group, a hydrophilic group protected by an acid-cleavable group, a hydrophilic group protected by a base-cleavable group, a cross-linkable group, or combinations thereof, and i represents an integer of 1 or more. The photosensitive compositions may be formed by combining a precursor polymer with a photosensitive additive and a solvent, patterning the precursor polymer, and heating the precursor polymer at a thermal processing temperature in a range of from about 180° C. to about 300° C. to convert the precursor polymer into the final polymer.

Abstract: A poly(para-phenylenevinylene) (PPV) compound for forming a buffer layer of a thin film transistor represented by where R is a C1-C20 silyl group substituted with cyclohexyl or phenyl, m is an integer from 2 to 4, and n is an integer from 1 to 3,000; a composition for forming a buffer layer of a thin film transistor that is used to form the compound represented by formula 1 and includes a halo precursor polymer, a photobase generator, and a solvent; a thin film transistor including a buffer layer which is manufactured using the PPV compound; and a flat panel display including the thin film transistor. A patterned buffer layer can be formed under an organic semiconductor layer of an organic TFT by photolithography patterning using the silicon-containing PPV precursor. Accordingly, the alignment of the organic semiconductor layer of the organic TFT can be improved, and thereby, the characteristics of the organic TFT can be improved.

Abstract: Radiation curable coatings and methods of utilizing the coatings are provided. In a general embodiment, the present disclosure provides a coating composition containing about 15% to about 80% by weight of one or more radiation curable compounds such as polycarbonate acrylate oligomers, polyurethane acrylate oligomer, polyester acrylate oligomers, silicone-based acrylate oligomers, or a combination thereof, and about 10% to about 80% by weight of one or more acrylate monomers.

Abstract: The present application provides a latent ink-jet ink formulation suitable as solder mask. The composition generally comprises: (a) at least one compound capable of self cross-linking (USM); (b) at least one phenolic resin; (c) at least one solvent; (d) at least one mineral filler; (e) at least one polyol; and (f) at least one photoinitiator.

Abstract: Photoinitiator modified silicate and ethylenically unsaturated monomer are reacted in solvent to cause living polymerization of monomer and exfoliation of silicate layers and cause attachment of silicate layers to polymer chains, thereby providing dispersed homopolymer or block copolymer silicate nanocomposites.

Abstract: Polymerizable compositions and methods are provided that include an ethylenically unsaturated compound and an arylsulfinate salt. The polymerizable compositions are useful as hardenable dental compositions.

Abstract: A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubstituted naphthalene or naphthol moiety, including mixtures thereof. Examples of the polymer of this invention include: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. The organic moiety mentioned above may be a substituted or unsubstituted hydrocarbon selected from the group consisting of a linear or branched alkyl, halogenated linear or branched alkyl, aryl, halogenated aryl, cyclic alkyl, and halogenated cyclic alkyl, and any combination thereof.

Abstract: Radiation curable coatings for use as a Primary Coating for optical fibers, optical fibers coated with said coatings and methods for the preparation of coated optical fibers. The radiation curable coating comprises at least one (meth)acrylate functional oligomer and a photoinitiator, wherein the urethane-(meth)acrylate oligomer CA/CR comprises (meth)acrylate groups, at least one polyol backbone and urethane groups, wherein about 15% or more of the urethane groups are derived from one or both of 2,4- and 2,6-toluene diisocyanate, wherein at least 15% of the urethane groups are derived from a cyclic or branched aliphatic isocyanate, and wherein said (meth)acrylate functional oligomer has a number average molecular weight of from at least about 4000 g/mol to less than or equal to about 15,000 g/mol; and wherein a cured film of the radiation curable Primary Coating composition has a modulus of less than or equal to about 1.2 MPa.

Abstract: The present disclosure relates to a method of surface treating particulate materials with electromagnetic radiation, in particular a method of cross-linking superabsorbent polymer particles using UV irradiation. The method is carried out with a so-called roll reactor, which comprises a rotating roll and an irradiation source. Radical former molecules can be applied on the surface of superabsorbent polymer particles. The particulate material is fed onto the surface of the roll and is irradiated while moved with the rotating roll. The irradiation source is provided such that the radiation emitted by the irradiation source is able to reach at least part of the particulate material that has been fed onto the surface of the roll. The irradiation source for use in the method of the present disclosure is able to emit UV radiation of a wavelength between 201 nm and 400 nm. The present disclosure also relates to absorbent articles comprising surface treated superabsorbent particles made by said method.

Abstract: Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV b) a phenolic crosslinker; c) a thermal acid generator (TAG); and d) a solvent.

Abstract: Disclosed is a microwave preparation method for producing polymeric nanoparticles in which a mixture is made that contains a monomer, an optional functionalize co-monomer, a polymerization initiator that is activated by microwave irradiation, a cross-linker that preferentially creates intra-particle cross-links during polymerization, and a water-based solvent which is then irradiated with microwave radiation to facilitate polymerization of the nanoparticles into sub-50 nm size range nanoparticles.

Abstract: The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking an oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises: (a) adding to precursor monomers or oligomers or polymers or copolymers an effective amount of at least one complex of Co, Mo or W which under irradiation conditions photochemically reacts to release at least one anionically charged nucleophile or uncharged Lewis base; and (b) irradiating the mixture of (a) to release the at least one anionically charged nucleophile or uncharged Lewis base to initiate polymerisation and/or crosslinking of the monomer, oligomer, polymer or copolymer.

Abstract: It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R1 and R2 independently represent hydrogen atom, halogen atom, C1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(?O)R4 group, S(O)nR4 group, P(?O)(R4)2 group or M(R4)3 group; R3 represents C1-20 hydrocarbon group or a heterocyclic group: R4 represents C1-20 hydrocarbonoxy group, C1-20 hydrocarbon group, C1-20 hydrocarbonthio group or mono- or di-C1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2, and an acid or a compound capable of generating an acid in response to an external stimulus.

Abstract: Photoiniferters for controlled radical polymerizations are described. The photoiniferters have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.

Abstract: The present invention provides a dental material that includes a hardenable resin system and a first initiator system capable of hardening the hardenable resin.

Abstract: A compound shown by the general formula [1] (wherein R1, R2 and R3 are each independently an aromatic hydrocarbon residual group, Yn? is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R1, R2 and R3 each is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.

Abstract: The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking a oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises: (a) adding to precursor monomers or oligomers or polymers or copolymers an effective amount of at least one complex of Co, Mo or W which under irradiation conditions photochemically reacts to release at least one anionically charged nucleophile or uncharged Lewis base; and (b) irridiating the mixture of (a) to release the at least one anionically charged nucleophile or uncharged Lewis base to initiate polymerisation and/or crosslinking of the monomer, oligomer, polymer or copolymer.

Abstract: Photoiniferters for controlled radical polymerizations are described. The photoiniferters have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.

Abstract: The invention relates to macromolecular hydrophilic photocrosslinkers having polymeric backbones of substituted ethylene groups carrying photoactive groups. The photocrosslinkers are capable of producing, when being exposed to light of determined wavelengths above 305 nm, radicals which are retained on the macromolecular photocrosslinkers and reacting so as to accomplish a crosslinked network structure. The invention further relates to the preparation of photocrosslinkers, their use in different aqueous systems and their utility in production of medical devices including ophthalmic lenses.

Abstract: Radically photopolymerizable compositions comprising (a) at least one ethylenically unsaturated photopolymerizable compound; (b) as photoinitiator, at least one compound of formulae (I, II, III, IV, V and/or VI), wherein m is 0 or 1; n is 0, 1, 2 or 3; x is 1 or 2; R1 is inter alia phenyl, naphthyl, anthracyl or phenanthryl, a heteroaryl radical, C2-C12alkenyl, C4-C8cycloalkenyl, or C6-C12bicycloalkenyl; R′1 is inter alia C2-C12alkylene, or phenylene; R2 has one of the meanings of R1 or inter alia is phenyl; y is 1 or 2; R3 if x is 1 inter alia is C1-C18alkylsulfonyl, or phenyl-C1-C3alkylsulfonyl, R3 if x is 2, is for example C2-C12alkylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, or C1-C8alkyl; R6, R7, R8 inter alia are hydrogen, R26Y—, or phenyl; R9 inter alia is C5-C8cycloalkyl, or phenyl; A is for example —S—, —O—, or —NR10—; Q is C1-C8-alkylene optionally interrupted by —O—; X is —O— or —NR9—; R10 inter alia

Abstract: Photoiniferters for controlled radical polymerizations are described. The photoiniferters have an aziactone or ring-opened azlactone moiety to provide telechelic (co)polymers.

Abstract: The present invention relates to a composition for forming a conjugated polymer pattern and a pattern formation process. More specifically, the present invention relates to a composition for forming a pattern of conjugated polymer, comprising a precursor polymer of a certain structure and a photobase generator, and a process of forming a pattern using the same. In accordance with the present invention, not only can a pattern of the conjugated polymer be formed with ease, but the pattern produced thereby can be used advantageously in organo-electric devices, for example, a memory device, a sensor, a solar cell, a storage battery, organic EL, and so forth. Also, when being used in an organic EL device, it shows not only a higher EL efficiency but a lower threshold voltage.

Abstract: The invention describes the use of oxime alkyl sulfonate compounds of formula 1 R0 is either an R1—X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy; R2 is hydrogen or C1-C4alkyl; and R3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.

Abstract: A photodefineable mixture comprising oligomeric divinyltetramethyldisiloxane bisbenzocyclobutene as its major resin component dissolved in mesitylene and at least 2,6-bis(4-azidobenzylidene)-4-ethylcyclohexanone as a photosensitive agent in an amount sufficient to convert the mixture to an organic-insoluble solid upon exposing the mixture to photon radiation is disclosed. These polymer compositions are useful as thin film dielectrics in electronic applications such as multichip modules, integrated circuits and printed circuit boards.