Nitrogen Containing Compound Patents (Class 522/57)
  • Patent number: 5162444
    Abstract: An AB type-block copolymer of the formula: ##STR1## wherein R.sup.1 is a hydrocarbon group having 1 to 10 carbon atoms; R.sup.2 is a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; R.sup.3 is a benzyl group, an alkyl group having 1 to 18 carbon atoms or ##STR2## wherein R.sup.4 is an alkyl group having 1 to 18 carbon atoms; M represents a fluorine-containing AB-type block copolymer having a fluorine-containing polymer chain and a polymer chain having affinity for a resin.
    Type: Grant
    Filed: November 21, 1990
    Date of Patent: November 10, 1992
    Assignee: Mitsubishi Petrochemical Company Limited
    Inventor: Shunichi Himori
  • Patent number: 5093385
    Abstract: The invention relates to an accelerated photoiniferter polymerization method which involves the addition of a polymerization accelerating amount of a at least one metal compound accelerator during the photoiniferter polymerization process.Preferably, the metal compound or compounds used are represented by the general formula M.sub.x L.sub.z whereinM is a cation having a valency of z of a metal which is selected from the group consisting of tin, zinc, cobalt, titanium, palladium, and lead;x is an integer of at least 1;L is an anion having a valency of x which is selected from the group consisting of C.sub.1-20 alkyl, -aryl, --OR, ##STR1## NO.sub.3.sup.--, SO.sub.4.sup..dbd., and PO.sub.4.sup.-3 ; R is selected from the group consisting C.sub.1-20 alkyl and aryl; andz is an integer of at least 1.Most preferably, the metal compound is selected from the group consisting of stannous 2-ethylhexanoate, zinc 2-ethylhexanoate and mixtures thereof.
    Type: Grant
    Filed: December 21, 1989
    Date of Patent: March 3, 1992
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Mahfuza B. Ali
  • Patent number: 5057619
    Abstract: The present invention provides novel siloxane iniferter compounds, block copolymers made therewith, and a method of making the block copolymers. The siloxane iniferter compounds can be represented by the formula ##STR1## wherein T and X are organic groups selected so that the T-X bond is capable of dissociating upon being subjected to an appropriate energy source to form a terminator free radical of the formula T and an initiator free radical.r.sub.1, R.sub.2, R.sub.5 and R.sub.6 are monovalent moieties selected from the group consisting of hydrogen, C.sub.1-4 alkyl, C.sub.1-4 alkoxy and aryl which can be the same or are different;R.sub.3 and R.sub.4 are monovalent moieties which can be the same or different selected from the group consisting of hydrogen, C.sub.1-4 alkyl, C.sub.
    Type: Grant
    Filed: February 26, 1991
    Date of Patent: October 15, 1991
    Assignee: Minnesota Mining and Manufacturing Co.
    Inventors: Ramesh C. Kumar, Milton H. Andrus, Jr., Mieczyslaw H. Mazurek
  • Patent number: 4826888
    Abstract: A photopolymerizable composition comprising a vinyl monomer, a mercaptocarboxylic acid/.alpha.-diketone photopolymerization initiator and a storage stabilizer. The composition may admit of a filler, and exhibits excellent mechanical strength, storage stability, color and resistance to coloring, and availability.
    Type: Grant
    Filed: April 2, 1986
    Date of Patent: May 2, 1989
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Isao Sasaki, Nobuhiro Mukai, Hitoshi Ige
  • Patent number: 4824765
    Abstract: Substituted dibenzalketones useful as water-soluble photoinitiators have the formula: ##STR1## wherein R.sup.1 and R.sup.2 are 4, alkyl or, taken together, an aliphatic ring, n=0 or an integer and R.sup.3 and R.sup.4 either are both water-solubilizing groups (a) --X(CH.sub.2).sub.m N.sup.+ R.sup.5.sub.3, (b) --X(CH.sub.2).sub.m COO.sup.- M or (c) --X(CH.sub.2).sub.m SO.sup.-.sub.3 M.sub.5 or one is such a group and the other is (d) a group --NR.sup.5.sub.2, X is --CH.sub.2 --, --O-- or --S--, R.sup.5 is an alkyl group, M is H.sup.+ or a metal cation and m=0. Such a photoinitiator compound is associated with a polymerizable compound in an aqueous photopolymerizable composition.
    Type: Grant
    Filed: October 10, 1986
    Date of Patent: April 25, 1989
    Inventors: John A. Sperry, Ross A. Balfour
  • Patent number: 4820607
    Abstract: A photosolubilizable composition containing (a) a first compound capable of producing an acid by irradiation with actinic rays and (b) a high molecular weight compound, whose solubility in a developing solution is increased by the action of an acid, and a photosolubilizable composition containing (c) a high molecular weight compound whose solubility in a developing solution is increased by irradiation with actinic radiation, are disclosed. These compositions exhibit high photosensitivity, broad development latitude, and high stability with time.
    Type: Grant
    Filed: August 14, 1986
    Date of Patent: April 11, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aoai
  • Patent number: 4782005
    Abstract: Radiation sensitive compositions comprising acrylic or methacrylic acid esters with decreased oxygen inhibition attained by use of minor amounts of N,N'-diorgano dicarboxamide additives. The acrylated ester compositions are suitable for ultraviolet curable coatings.
    Type: Grant
    Filed: February 18, 1988
    Date of Patent: November 1, 1988
    Assignee: Polychrome Corp.
    Inventors: Nils Eklund, William Rowe
  • Patent number: 4599155
    Abstract: There is disclosed a resin composition comprising(A) a spiro ortho ester compound and/or a spiro ortho carbonate compound;(B) an aluminum compound; and(C) a silanol compound or a silicon compound which is capable of generating a silanol group;the amounts of components (B) and (C) being within the range of 0.001 to 10% by weight and 0.1 to 20% by weiht, based on the amount of component (A), respectively.The resin composition of this invention is excellent in volumetric shrinkage performance at curing operation and is good in storability. Therefore, the cured product can be used for a wide variety of industrially valuable applications, such as an ink, a coating, an adhesive, a surface coating, an encapsulation and an electrical insulating material.
    Type: Grant
    Filed: September 21, 1984
    Date of Patent: July 8, 1986
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shuichi Suzuki, Moriyasu Wada, Shuzi Hayase
  • Patent number: 4585876
    Abstract: Novel xanthones and thioxanthones of the formula I ##STR1## in which A, X, Y, Z, E and E' are as defined in patent claim 1, are described. A is preferably --S-- and E and E' are preferably bonded in the ortho-position relative to one another. The compounds (I) are suitable, for example, as sensitizers for photocrosslinkable polymers or photocurable compositions, or for use in mixtures with polymers with H donor groups for image formation, in particular electrically conductive coatings and patterns, by means of electroless deposition of metals.
    Type: Grant
    Filed: November 14, 1983
    Date of Patent: April 29, 1986
    Assignee: Ciba-Geigy Corporation
    Inventors: Walter Fischer, Jurgen Finter, Hans Zweifel