Specified Rate-affecting Material Contains Nitrogen Or Oxygen Atom In Heterocyclic Ring Patents (Class 522/63)
  • Patent number: 11958920
    Abstract: Provided is an active energy ray curable composition cured by irradiation of active energy rays. The active energy ray curable composition contains an (A) radical polymerizable compound, a (B) photopolymerization initiator, and a (C) amine compound. The (B) photopolymerization initiator includes a (B1) sulfur compound and a (B2) acyl phosphine oxide compound. The (B1) sulfur compound is at least one of a sulfone compound and a thiobenzoyl compound.
    Type: Grant
    Filed: March 11, 2022
    Date of Patent: April 16, 2024
    Assignee: Asia Stencil Paper Co., Ltd.
    Inventors: Satoshi Kuniyasu, Kazuhiro Tanaka
  • Patent number: 11897977
    Abstract: The present disclosure provides a redox initiator system for initiating polymerization comprising an oxidizing agent, a photolabile reducing agent derived from a barbiturate, and a transition metal complex that participates in a redox cycle. On exposure to actinic radiation, such as UV, the photolabile compound photolyzes, releasing the reducing agent and initiating the redox-initiated polymerization.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: February 13, 2024
    Assignee: 3M Innovative Properties Company
    Inventors: William H. Moser, Erik M. Townsend, Zachary J. Thompson, Mary M. Caruso Dailey, Michael A. Kropp
  • Patent number: 11834542
    Abstract: Embodiments in accordance with the present invention encompass compositions containing a latent organo-ruthenium carbide catalyst, a photoactive acid generator or a thermally active acid generator and a photoactive compound along with one or more monomers which undergo ring open metathesis polymerization (ROMP) when said composition is exposed to a suitable radiation (or heat) to form a three-dimensional (3D) object. The three-dimensional objects made by this process exhibits improved mechanical properties, particularly, high distortion temperature, impact strength, elongation to break, among others. Accordingly, compositions of this invention are useful as 3D inkjet materials for forming high impact strength objects of various sizes with microscale features lower than 100 microns, among various other uses.
    Type: Grant
    Filed: September 18, 2020
    Date of Patent: December 5, 2023
    Assignee: PROMERUS, LLC
    Inventors: Larry F Rhodes, Oleksandr Burtovyy
  • Patent number: 11820903
    Abstract: The present disclosure provides a photo-curable elastic ink composition for three-dimensional printing and the preparation method. The ink composition includes approximately 10%-75% of a soft monomer, approximately 10%-75% of a hard monomer, approximately 5%-20% of a cross-linking agent, approximately 5%-20% of a non-reactive soft resin, approximately 0.5%-10% of a photo-initiator, approximately 0%-0.5% of a colorant, and approximately 0.05%-8% of an auxiliary agent. The soft monomer is capable of generating a homopolymer with a glass transition temperature lower than about 25° C. The hard monomer is capable of generating a homopolymer with a glass transition temperature of about 25° C. or higher. The non-reactive soft resin is a resin without containing any radiation curable group in the molecular structure and having a glass transition temperature less than 0° C.
    Type: Grant
    Filed: July 16, 2021
    Date of Patent: November 21, 2023
    Assignee: ZHUHAI SEINE TECHNOLOGY CO., LTD.
    Inventors: Qiancheng Yang, Jia Li, Likun Wang
  • Patent number: 11813843
    Abstract: Provided is an ink jet recording method including: discharging first ultraviolet curable ink of a radical polymerization reaction type which contains a radical photopolymerization initiator and a radical polymerization compound and in which transmittance at a wavelength of 395 nm is equal to or less than 1%, onto a recording medium; and curing the first ultraviolet curable ink which is landed on the recording medium by irradiating the ink with ultraviolet light, in which a light source which initially emits the ultraviolet light in the curing of the ink is an ultraviolet light emitting diode in which peak intensity of the irradiated ultraviolet light is equal to or more than 800 mW/cm2.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: November 14, 2023
    Assignee: Seiko Epson Corporation
    Inventors: Mikito Nakajima, Keitaro Nakano, Mitsuaki Yoshizawa
  • Patent number: 11535702
    Abstract: Embodiments in accordance with the present invention encompass compositions encompassing a latent organo-ruthenium compound, a photosensitizer and one or more monomers which undergo ring open metathesis polymerization (ROMP) when said composition is exposed to suitable actinic radiation to form a substantially transparent film or a three dimensional object. Surprisingly, the compositions are very stable at ambient conditions to temperatures up to 80° C. for several weeks and undergo mass polymerization only when subjected to actinic radiation under inert atmosphere such as for example a blanket of nitrogen. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as 3D printing materials, coatings, encapsulants, fillers, leveling agents, among others.
    Type: Grant
    Filed: February 2, 2022
    Date of Patent: December 27, 2022
    Assignee: PROMERUS, LLC
    Inventor: Oleksandr Burtovyy
  • Patent number: 11491776
    Abstract: A composition for model materials (4a) is used for shaping an optically shaped article by an inkjet optical shaping method, comprises a monofunctional monomer (A) and an oligomer (B) as a photocurable component, further, comprises no polyfunctional monomer (C) as a photocurable component, or comprises a polyfunctional monomer (C) as a photocurable component at 3.0 parts by weight based on 100 parts by weight of a whole composition for model materials, the oligomer (B) has a hydroxyl group or an amino group, and a total molar fraction of the hydroxyl group and the amino group in a total amount of the photocurable components is less than 5.0%. The composition for model materials (4a) can afford an optically shaped article that has flexibility, and does not crack even when it is bent.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: November 8, 2022
    Assignees: MAXELL, LTD., MIMAKI ENGINEERING CO., LTD.
    Inventors: Katsuyuki Kito, Taeko Izumo, Masakatsu Okawa, Kenta Hongo
  • Patent number: 11485719
    Abstract: The present invention relates to novel 3-ketocoumarins with improved water compatibility, which are useful as photoinitiators and to compositions comprising said photoinitiators. The invention also relates to compositions comprising said novel 3-ketocoumarins and to a process for photopolymerizing comprising them.
    Type: Grant
    Filed: December 6, 2018
    Date of Patent: November 1, 2022
    Assignee: IGM RESINS ITALIA S.R.L.
    Inventors: Marika Morone, Vincenzo Razzano, Stephen Postle, Gabriele Norcini
  • Patent number: 11479569
    Abstract: There are provided a compound represented by general formula (1), a photopolymerization initiator comprising this compound, a photocurable composition having this photopolymerization initiator and a photocurable compound as essential components, and a cured product formed by curing this photocurable composition, wherein in formula (1), R1 and R2 each independently represents an alkyl group or the like; R3 to R5 each independently represent a hydrogen atom, an alkyl group or the like; X1 represents a single bond or an alkylene group; and X2 represents a bonding group represented by general formulas (2) to (4), and wherein n represents an integer of 1 to 6, when n is an integer of 1, Y represents an alkyl group, an aryl group or the like.
    Type: Grant
    Filed: October 10, 2017
    Date of Patent: October 25, 2022
    Assignee: DIC CORPORATION
    Inventors: Masanori Miyamoto, Tomokazu Yamada, Yong Fang, Fangxi Xiu, Changjun Deng
  • Patent number: 11479621
    Abstract: The present disclosure relates to a UV-curable composition and adhesive film, adhesive tape and bonding member containing the same. Said UV-curable composition is a UV-curable composition catalyzable by photobase. Said UV-curable composition comprises (1) acrylic polymer and/or ethylene-vinyl acetate copolymer; (2) curable components, comprising polyfunctional mercaptan and polyfunctional epoxy resin; and a (3) photobase generator. The composition of the present disclosure can be coated into an adhesive tape or adhesive film; such adhesive tape or film possesses initial adhesion before UV curing is carried out and can have the strength of a semi-structural adhesive or a structural adhesive after UV curing is carried out.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: October 25, 2022
    Assignee: 3M Innovative Properties Company
    Inventors: Lijing Zhang, Weigang Lin
  • Patent number: 11130873
    Abstract: The present invention relates to novel compounds based on 3-ketocoumarins, which are useful as photoinitiators and sensitizer and to compositions thereof. More particularly, the novel compounds comprise a polyhydroxy polymeric core, which is chemically bonded to 3-ketocoumarin derivatives.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: September 28, 2021
    Assignee: IGW GROUP BV
    Inventors: Marika Morone, Gabriele Norcini, Vincenzo Razzano
  • Patent number: 9695325
    Abstract: An active energy ray curable composition includes a non-polymerizable resin; and polymerizable compounds comprising a mono-functional monomer having a single polymerizable unsaturated ethylene double bond, wherein the following relations are satisfied: ?Tg=|Tgp?Tgm}?19 degrees C., where Tgp represents a glass transition temperature of the non-polymerizable resin and Tgm represents a glass transition temperature of a homopolymer of the mono-functional monomer, TgH?10 degrees C., where TgH represents the higher of Tgp and Tgm, and TgL?40 degrees C., where TgL represents the lower of Tgp and Tgm.
    Type: Grant
    Filed: September 14, 2015
    Date of Patent: July 4, 2017
    Assignee: Ricoh Company, Ltd.
    Inventors: Shizuka Kohzuki, Teruki Kusahara, Hiroki Nakane
  • Patent number: 9152041
    Abstract: Disclosed is a display panel including a lower substrate, upper substrate, and a patterned spacer that causes the lower substrate and upper substrate to be spaced apart from each other by a predetermined distance, wherein the patterned spacer is obtained from a photosensitive resin composition comprising: (a) a triazine-based photopolymerization initiator represented by the following formula 1; (b) an alkali-soluble photo polymerizable reactive resin binder; and (c) a polymerizable compound: (wherein each of R1-R5 has the same meaning as defined herein). A photosensitive resin composition for use in a patterned spacer is also disclosed, the composition comprising: (a) a triazine-based photopolymerization initiator represented by the following formula 1; (b) an alkali-soluble photopolymerizable reactive resin binder; (c) a polymerizable compound; and (d) a solvent.
    Type: Grant
    Filed: July 5, 2005
    Date of Patent: October 6, 2015
    Assignee: LG CHEM, LTD.
    Inventors: Sung Hyun Kim, Jin Suek Kim, Kyung Jun Kim, Seung Hee Lee, Il Eok Kwon, Jeong Ae Yoon
  • Patent number: 9145506
    Abstract: The present invention relates to a natural adhesive containing protein and free sugar. The natural adhesive contains allinage and aline. The natural adhesive further contains lectine.
    Type: Grant
    Filed: July 1, 2013
    Date of Patent: September 29, 2015
    Assignee: JR CO., LTD.
    Inventor: Jin Hwa Lee
  • Publication number: 20150148442
    Abstract: A photopolymerization method in which an ink composition including (A) a polymerizing compound having an ethylenic unsaturated group, (B) a photopolymerization initiator represented by Formula (1) described below, and (C) a hydrogen donor having a structure in which a nitrogen atom is directly bonded to an aromatic ring, in which the aromatic ring has an electron-withdrawing group or the nitrogen atom constitutes a hetero ring, is photopolymerized under acidic conditions, in Formula (1), each of R1 to R30 represents a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group.
    Type: Application
    Filed: February 2, 2015
    Publication date: May 28, 2015
    Applicant: FUJIFILM CORPORATION
    Inventor: Katsuyuki YOFU
  • Patent number: 9034981
    Abstract: Disclosed is an aqueous polyurethane dispersion obtained by dispersing in water a reaction product obtained by reacting a reaction mixture comprising at least one organic, aliphatic, cycloaliphatic or aromatic di, tri or poryisocyanate, at least one isocyanate reactive polycarbonate diol, triol or polyol, at least one compound comprising at least one isocyanate reactive group and at least one free radically polymerizable unsaturated group, and at least one compound comprising at least one isocyanate reactive group and at least one at least dispersing active group, and optionally at least one compound comprising at least two isocyanate reactive groups and having a molecular weight of less than 1000 g/mol.
    Type: Grant
    Filed: March 16, 2006
    Date of Patent: May 19, 2015
    Assignee: PERSTORP CHEMICALS AB
    Inventors: Göran Ziegler, David James, Kent Sörensen
  • Publication number: 20150118188
    Abstract: The present invention relates to methods of metathesizing olefins using catalysts previously considered to be practically inactive. The present invention further relates to novel photosensitive compositions, their use as photoresists, and methods related to patterning polymer layers on substrates. Further, modifications to the compositions and method provide for an unprecedented functionalization of the compositions, useful for example in the preparation of sensors, drug delivery systems, and tissue scaffolds. The novel compositions and associated methods also provide for the opportunity to prepare 3-dimensional objects which provide new access to critically dimensioned devices, including for example photonic devices.
    Type: Application
    Filed: October 3, 2014
    Publication date: April 30, 2015
    Inventors: RAYMOND WEITEKAMP, ROBERT H. GRUBBS, HARRY A. ATWATER, JAMES FAKONAS
  • Patent number: 9004131
    Abstract: A method and a system for producing a change in a medium disposed in an artificial container. The method places in a vicinity of the medium at least one of a plasmonics agent and an energy modulation agent. The method applies an initiation energy through the artificial container to the medium. The initiation energy interacts with the plasmonics agent or the energy modulation agent to directly or indirectly produce the change in the medium. The system includes an initiation energy source configured to apply an initiation energy to the medium to activate the plasmonics agent or the energy modulation agent.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: April 14, 2015
    Assignees: Duke University, Immunolight, LLC
    Inventors: Frederic Avery Bourke, Jr., Tuan Vo-Dinh
  • Patent number: 8957224
    Abstract: A specific type of carbazole photoinitiator is capable of providing radiation curable compositions that are curable by UV LEDs and do not exhibit an unstable yellowing behavior in an image upon storage like ITX.
    Type: Grant
    Filed: December 6, 2010
    Date of Patent: February 17, 2015
    Assignee: Agfa Graphics NV
    Inventor: Johan Loccufier
  • Patent number: 8952367
    Abstract: Provided is an organic light emitting element having a high light emission efficiency and a low drive voltage. In the organic light emitting element including a positive electrode, a negative electrode and an organic compound layer disposed between the positive electrode and the negative electrode, the organic compound layer includes a thioxanthone compound represented by the following general formula [1].
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: February 10, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Jun Kamatani, Masanori Seki, Takeshi Sekiguchi, Yosuke Nishide, Akihito Saitoh
  • Patent number: 8940806
    Abstract: The invention relates to the use of triazenes of formula (I) wherein Q is a direct bond or a bivalent radical —(CR8R9)—, Z1 is —O—, —NR10—, —CH2—, —(CR11R12)— or —C(?O)— and R1 to R12 are optionally substituted hydrocarbon residues, as precursors for radicals useful in reactions triggered by free radicals, such as polymerization of unsaturated monomers and degradation of polyolefins. Most of the triazenes of formula (I) are novel and claimed, too, as well as the preparation of triazenes of formula (I) and polymerizable compositions comprising them.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: January 27, 2015
    Assignee: BASF SE
    Inventors: Peter Nesvadba, Lucienne Bugnon Folger, Jean-Luc Birbaum, Marc Faller, Antoine Carroy
  • Publication number: 20150025169
    Abstract: The invention pertains to an oligomer or polymer substituted by one or more bisacylphosphine oxide moieties, characterized in that said bisacylphosphine oxide moiety is linked via the phosphorous atom, optionally via a spacer group, to the oligomer or polymer backbone; as well as to specifically functionalized bisacylphosphine oxides, suitable to prepare said polymers or oligomers.
    Type: Application
    Filed: October 1, 2014
    Publication date: January 22, 2015
    Applicant: BASF SE
    Inventors: Hansjorg Grutzmacher, Timo Ott, Kurt Dietliker
  • Patent number: 8933143
    Abstract: Compositions and methods for adjustable lenses are provided. In some embodiments, the lenses contain a lens matrix material, a masking compound, and a prepolymer. The lens matrix material provides structure to the lens. The masking compound is capable of blocking polymerization or crosslinking of the prepolymer, until photoisomerization of the compound is triggered, and the compound is converted from a first isomer to a second isomer having a different absorption profile. The prepolymer is a composition that can undergo a polymerization or crosslinking reaction upon photoinitiation to alter one or more of the properties of the lenses.
    Type: Grant
    Filed: November 5, 2013
    Date of Patent: January 13, 2015
    Assignee: California Institute of Technology
    Inventors: Andrew J. Boydston, Robert H. Grubbs, Chris Daeffler, Nebojsa Momcilovic
  • Publication number: 20150010752
    Abstract: Adhesive compositions comprising a copolymer of isobutylene repeat units and alkene repeat units are described. At least a portion of the alkene repeat units are bonded to a pendent nitrogen atom of a quaternary ammonium salt comprising a free-radically polymerizable substituent. The adhesive optionally comprises other components such as tackifier, unfunctionalized polyisobutylene polymer, plasticizer, and combinations thereof.
    Type: Application
    Filed: January 30, 2013
    Publication date: January 8, 2015
    Inventors: Hae-Seung Lee, Joon Chatterjee, Babu N. Gaddam
  • Publication number: 20140370248
    Abstract: An energy curable inkjet ink includes a nitroxy inhibitor, a compound having an ethylenic unsaturated bond, a photoinitiator, a coloring agent, and a stray light resistance index of at least 7. A method of preparing an energy curable inkjet ink with stray light resistance includes providing a nitroxy inhibitor; providing a mixture of a compound having an ethylenic unsaturated bond, and a photoinitiator, and a coloring agent; combining the nitroxy inhibitor and the mixture to obtain the energy curable inkjet ink and thereby to increase a stray light resistance index of the energy curable inkjet ink to at least 7.
    Type: Application
    Filed: December 13, 2012
    Publication date: December 18, 2014
    Applicant: SUN CHEMICAL CORPORATION
    Inventors: Stephen Anthony Hall, Kirsty Margaret McVean
  • Publication number: 20140349125
    Abstract: A curable composition comprises (a) at least one polyorganosiloxane, fluorinated polyorganosiloxane, or combination thereof comprising reactive silane functionality comprising at least two hydroxysilyl moieties; (b) at least one polyorganosiloxane, fluorinated polyorganosiloxane, or combination thereof comprising reactive silane functionality comprising at least two hydrosilyl moieties; and (c) at least one photoactivatable composition comprising at least one organoborate salt selected from tetraarylborate, triarylorganoborate, diaryldiorganoborate, and aryltriorganoborate salts (and combinations thereof) of at least one base selected from amidines, guanidines, phosphazenes, proazaphosphatranes, and combinations thereof; wherein at least one of the components (a) and (b) has an average reactive silane functionality of at least three.
    Type: Application
    Filed: December 21, 2012
    Publication date: November 27, 2014
    Inventors: Yu Yang, George G. I. Moore, Michael A. Semonick
  • Publication number: 20140329926
    Abstract: An object of the present invention is to provide a curable resin composition capable of being quickly cured at a low temperature by irradiation of an active energy ray such as light and having excellent storage stability, and a curing method. Furthermore, in the curable resin composition of the present invention, which uses a component (D) in combination, the active energy ray curability is more improved.
    Type: Application
    Filed: December 11, 2012
    Publication date: November 6, 2014
    Applicant: THREE BOND FINE CHEMICAL CO., LTD
    Inventor: Manabu Kirino
  • Publication number: 20140228468
    Abstract: A curing-type coating-agent composition according to the present invention contains: Component (A) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., an isocyanuricring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C-1) (e.g., a reaction compound between a colloidal silica and an alkoxysilane compound having a maleimide group) in amount of from 1 to 35 parts by mass, or Component (C-2) (e.g., a specific organosilicon compound) in an amount of from 5 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.
    Type: Application
    Filed: August 27, 2012
    Publication date: August 14, 2014
    Applicants: TOAGOSEI CO., LTD., KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Hiroaki Takashima, Kyoko Kumagai, Hidetaka Hayashi, Tetsuya Mitsuoka, Naoharu Ueda, Hisashi Muramatsu, Kazumasa Inata, Takeshi Fujita, Yasuyuki Sanai, Eiichi Okazaki, Satoshi Yoneda, Naomasa Furuta
  • Publication number: 20140216649
    Abstract: The present invention relates to thiol-ene curing compositions, which cure upon exposure to ultraviolet (UV) light and/or heat. The compositions include components having alkenyl (or “ene”) functionality and components having thiol functionality, which undergo thiol-ene curing. The compositions also include a cure system. More specifically, in some embodiments, the curable compositions include a vinyl polymer bearing alkenyl or thiol terminal functional group(s) and a cross-linking agent having the opposing functionality, i.e., thiol cross-linking agents with alkenyl-terminated vinyl polymers and vinyl cross-linking agents with thiol-terminated vinyl polymers. Also provided are methods of making and using the compositions, such as for sealants for in-place gasketing applications.
    Type: Application
    Filed: April 3, 2008
    Publication date: August 7, 2014
    Applicants: Henkel Corporation
    Inventors: John G. Woods, Richard O. Angus, JR., Joel D. Schall
  • Publication number: 20140210140
    Abstract: A nanoimprinting method employs a resist composition including polymerizable compounds and a polymerization initiating agent, each having absorption spectrum properties with absorption regions within a range from 250 nm to 500 nm. The polymerization initiating agent has an absorption region with a longer wavelength end wavelength longer than the longer wavelength end wavelength of the absorption region of the polymerizable compounds. Further, exposure of the resist composition is executed by light having spectral intensity properties that satisfy a predetermined relational formula. The present invention enables contamination of molds by adhered matter to be suppressed, and enables formation of resist patterns having sufficient etching resistance by nanoimprinting.
    Type: Application
    Filed: March 28, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Tadashi OMATSU, Kazuharu Nakamura, Satoshi Wakamatsu
  • Patent number: 8785515
    Abstract: Polycyclic aromatic compounds of formula (I) having at least two conjugated aromatic rings at least one of which has a substituent comprising a cyclic carbonate group can be used as sensitizers for cationic photoinitiators, especially iodonium compounds, and may also function as monomers in cationically initiated radiation curable compositions, especially coating compositions, such as printing inks and varnishes.
    Type: Grant
    Filed: May 9, 2008
    Date of Patent: July 22, 2014
    Assignee: Sun Chemical Corporation
    Inventors: Shaun Lawrence Herlihy, Robert Stephen Davidson
  • Publication number: 20140187662
    Abstract: A thermoplastic resin composition includes (A) a thermoplastic resin; (B) an inorganic filler; (C) a white pigment; (D) a photostabilizer; and (E) sodium phosphate salt, wherein the thermoplastic resin composition comprises about 0.1 to about 4.7% by weight of the inorganic filler (B) based on 100% by weight of a base resin composition including the thermoplastic resin (A), the inorganic filler (B), and the white pigment (C), wherein the thermoplastic resin composition can have excellent surface gloss, reflectance, anti-yellowing property and moldability.
    Type: Application
    Filed: October 3, 2013
    Publication date: July 3, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Sang Hwa Lee, Jong Cheol Lim, In Geol Baek, Yoo Jin Jung
  • Publication number: 20140179820
    Abstract: The invention provides meltable and UV-crosslinkable pressure-sensitive adhesives, such as acrylate hotmelts or hotmelt formulations, which can be processed by commonplace hotmelt processes and also on customary hotmelt coating lines, without any immediate alteration in the product properties in the event of (unwanted) deviation in the operational parameters. The compositions of the invention are UV-crosslinkable and meltable pressure-sensitive adhesives comprising (i) mixtures of UV-crosslinkable polyacrylate polymers selected from a) mixtures of UV-crosslinkable polymers with at least one photoinitiator bonded covalently to the backbone of the polymers, and b) mixtures of UV-crosslinkable polyacrylate polymers, monomers and at least one photoinitiator, and also (ii) at least one UV stabilizer, and also methods for producing them and the use thereof as bonding agents.
    Type: Application
    Filed: December 11, 2013
    Publication date: June 26, 2014
    Applicant: tesa SE
    Inventors: Alexander Prenzel, Stephan Zöllner, Michael Siebert
  • Patent number: 8753739
    Abstract: The present invention relates to a multi-layer product, the first layer being a UV-cured protective layer which contains SiO2 nanoparticles, and the second layer containing a thermoplastic substrate. In addition, the invention relates to the composition of the UV-curable first layer, a process for the production of the multi-layer products and products, such as e.g. glazing products, which contain the named multi-layer products.
    Type: Grant
    Filed: April 3, 2007
    Date of Patent: June 17, 2014
    Assignee: Bayer MaterialScience AG
    Inventors: Frank Buckel, Robert Maleika, Walter Koehler, Reiner Meyer
  • Publication number: 20140155511
    Abstract: Sulfur chelated ruthenium compounds represented by the following formula: wherein M indicates the ruthenium metal bound to a benzylidene carbon; R represents C1-C7 alkyl group or optionally substituted aryl; X1 and X2 each independently represent halogen; Y1 and Y2 each independently denote unsubstituted or alkyl-substituted phenyl; and Z independently represents hydrogen, electron withdrawing or electron donating substituent, with m being an integer from 1 to 4, and processes and compositions related thereto.
    Type: Application
    Filed: July 18, 2013
    Publication date: June 5, 2014
    Inventors: N. Gabriel LEMCOFF, Amos BEN-ASULY
  • Publication number: 20140099573
    Abstract: The present invention provides photosensitive compositions and methods of patterning a polymeric image on a substrate, said methods comprising; (a) depositing a layer of photosensitive composition of any one of claims 15 to 22 on the substrate; and (b) irradiating a portion of the layer of photosensitive composition with a light comprising a wavelength in a range of from about 220 to about 440 nm. The invention also relates to methods of metathesizing an unsaturated organic precursor comprising irradiating Fischer-type carbene ruthenium catalysts with at least one wavelength of light in the presence of at least one unsaturated organic precursor so as to metathesize at least one alkene or one alkyne bond.
    Type: Application
    Filed: October 3, 2013
    Publication date: April 10, 2014
    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY
    Inventors: RAYMOND WEITEKAMP, ROBERT H. GRUBBS
  • Publication number: 20140076200
    Abstract: Disclosed herein is a method of manufacturing a hybrid packaging material, comprising the steps of: (a) forming a colloidal inorganic nanosol; (b) surface-treating the inorganic nanosol of step (a) with an organic metal alkoxide containing an organic function group by stirring the inorganic nanosol together with the organic metal alkoxide; (c) replacing a solvent of the inorganic nanosol with an organic solvent different in type from the solvent to prepare an organic solvent-type inorganic nanosol; (d) substituting the organic solvent of the inorganic nanosol of step (c) with a functional organic monomer or a silicon compound, followed by concentration to prepare a solvent-free organic-inorganic hybrid material; and (e) adding a nanoclay dispersed in a solvent to the solvent-free organic-inorganic hybrid material.
    Type: Application
    Filed: November 18, 2013
    Publication date: March 20, 2014
    Applicant: Korea Electrotechnology Research Institute
    Inventors: Dong-jun Kang, Hoy-yul Park, Myeong-sang Ahn
  • Patent number: 8673996
    Abstract: An adhesive (co)polymers comprising: a) an isobutylene copolymer having pendent anhydride groups, b) a polyamine photobase generator and c) optionally a tackifier is described.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: March 18, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Hae-Seung Lee, Joon Chatterjee, Gregg A. Caldwell, Babu N. Gaddam
  • Patent number: 8658086
    Abstract: A method and a system for producing a change in a medium. The method places in a vicinity of the medium at least one energy modulation agent. The method applies an initiation energy to the medium. The initiation energy interacts with the energy modulation agent to directly or indirectly produce the change in the medium. The system includes an initiation energy source configured to apply an initiation energy to the medium to activate the energy modulation agent.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: February 25, 2014
    Assignee: Immunolight, LLC.
    Inventor: Frederic A. Bourke, Jr.
  • Patent number: 8597784
    Abstract: The disclose provides pressure-sensitive adhesives and adhesive sealants prepared from modified, crosslinked isobutylene copolymers, and tape articles prepared therefrom.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: December 3, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Hae-Seung Lee, Guy D. Joly, Joon Chatterjee, Marie Aloshyna ep Lesuffleur, Jay M. Jennen, Jingjing Ma, Gregg A. Caldwell, Babu N. Gaddam, Larry R. Krepski
  • Publication number: 20130224495
    Abstract: A radiation curable coating for a floor comprising: at least one radiation curable oligomer, at least one photoinitiator and at least one reactive diluent monomer, said radiation curable oligomer being selected from the group consisting of Urethane (meth)acrylates, epoxy (meth)acrylates, polyester (meth)acrylates, acrylic (meth)acrylates, and hydrocarbon (meth)acrylates is described and claimed. The composition is capable of undergoing photopolymerization when coated on a floor and when irradiated by a light emitting diode (LED) light, having a wavelength from about 100 nm to about 900 nm, to provide a cured coating on the floor, with the cured coating having an external surface, and the cured coating having a Percent Reacted Acrylate Unsaturation (% RAU) at the external surface of about 60% or greater. Also described and claimed are the process to coat a floor with the LED curable coating for floor and a coated floor where the coating has been cured by application of LED light.
    Type: Application
    Filed: December 16, 2010
    Publication date: August 29, 2013
    Inventors: Keqi Gan, Timothy Bishop, Tai-Yeon Lee, Huimin Cao, Mark Diaz
  • Patent number: 8507572
    Abstract: The present invention relates to functionalizing a surface of an organic material. For example, surfaces of materials having C—H bonds, such as polymers having C—H bonds, can be functionalized. In certain embodiments, a heterobifunctional molecule having a photoactive anchor, a spacer, and a terminal functional group is applied to the surface of an organic material that contains one or more C—H bonds. The heterobifunctional molecule can be bound to any surface having C—H bonds as the photoactive anchor can react with C—H bonds upon irradiation. The terminal functional group has a “click” functionality which can be utilized to functionalize the surface of the organic material with any desired functionalizing moiety having the orthogonal click functionality.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: August 13, 2013
    Assignee: The Trustees of Columbia University in the City of New York
    Inventors: Jeffrey Lancaster, Nicholas J. Turro, Jeffrey T. Koberstein
  • Publication number: 20130188270
    Abstract: Compounds of the formula (I), wherein R1, R2, R3, R4, R5, R6, R7 and R8 for example independently of each other are hydro-gen, C1-C20alkyl, (II), COR16 or NO2, provided that at least one pair of R1 and R2, R2 and R3, R3 and R4, R5 and R6, R6 and R7, or R7 and R8 is (III); R9, R10, R11 and R12 for example independently of each other are hydrogen, C1-C20alkyl which optionally substituted; or R9, R10, R11, and R12 independently of each other are unsubstituted or substituted phenyl; X is CO or a direct bond; R13 is for example C1-C20alkyl which optionally is substituted, C2-C12alkenyl, C4-C8cycloalkenyl, C2-C12alkinyl, C3-C10-cycloalkyl, phenyl or naphthyl both of which are optionally substituted; R14 is for example hydrogen, C3-C8cycloalkyl, C2-C5alkenyl, C1-C20alkoxy, C1-C20alkyl, phenyl or naphthyl; R15 is for example C6-C20aryl or C5-C20heteroaryl; R16 is for example C6-C20aryl which is unsubstituted or substituted by one or more C1-C20alkoxy or C1-C20alkyl; are in particular suitable as photoinitiators for c
    Type: Application
    Filed: October 4, 2011
    Publication date: July 25, 2013
    Applicant: BASF SE
    Inventors: Yuichi Nishimae, Hisatoshi Kura, Kazuhiko Kunimoto, Ryuhei Yamagami, Keita Tanaka
  • Patent number: 8492071
    Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: July 23, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Taguchi
  • Publication number: 20130123381
    Abstract: The invention includes a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. The system of the invention has enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.
    Type: Application
    Filed: January 7, 2013
    Publication date: May 16, 2013
    Applicant: The Regents of the University of Colorado, a body Corporate
    Inventor: The Regents of the University of Colorado, a body Corporate
  • Patent number: 8394869
    Abstract: Disclosed are photopolymerizable compositions suitable for uses such as dental composite resins, and that comprise (A) a radical-polymerizable monomer, (B) a photopolymerization initiator that comprises (B1) an ?-diketone compound, (B2) a photoacid generating agent, (B3) an aromatic amine compound, and (C) an organic filler containing a phthalate ester fluorescent agent.
    Type: Grant
    Filed: May 20, 2009
    Date of Patent: March 12, 2013
    Assignee: Tokuyama Dental Corporation
    Inventors: Hironobu Akizumi, Junichiro Yamagawa
  • Patent number: 8376013
    Abstract: A method and a system for producing a change in a medium disposed in an artificial container. The method places in a vicinity of the medium at least one of a plasmonics agent and an energy modulation agent. The method applies an initiation energy through the artificial container to the medium. The initiation energy interacts with the plasmonics agent or the energy modulation agent to directly or indirectly produce the change in the medium. The system includes an initiation energy source configured to apply an initiation energy to the medium to activate the plasmonics agent or the energy modulation agent.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: February 19, 2013
    Assignees: Duke University, Immunolight, LLC
    Inventors: Frederic Avery Bourke, Jr., Tuan Vo-Dinh
  • Patent number: 8367190
    Abstract: The present invention relates to a composition for preparing an excellent protecting film with high strength, wear resistance, and excellent barrier property by low temperature hardening, a protecting film prepared therefrom, a substrate comprising the same, and a component or device comprising the same. The composition comprises an organosiloxane polymer a), a photobase generator b), and an organic solvent c).
    Type: Grant
    Filed: September 18, 2007
    Date of Patent: February 5, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Jeong-Man Son, Minjin Ko, Myungsun Moon, Byung-Ro Kim, Jaeho Cheong
  • Patent number: 8361691
    Abstract: A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.
    Type: Grant
    Filed: August 28, 2007
    Date of Patent: January 29, 2013
    Assignee: JSR Corporation
    Inventors: Nobuji Matsumura, Daisuke Shimizu, Toshiyuki Kai
  • Patent number: 8361605
    Abstract: A photosensitive resin composition which is effective in avoiding troubles in the step of plating with various metals in printed wiring board production, such as under-film metal deposition and film peeling, and which forms a wiring-protecting film excellent in adhesion, flexibility, insulation reliability, and heat resistance. The photosensitive resin composition comprises (A) a carboxylated polymer, (B) a compound having at least two photopolymerizable unsaturated double bonds, (C) a photopolymerization initiator, and (D) a nitrogen compound represented by a specific feature.
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: January 29, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Katsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara