Abstract: A grafting reagent and related method of using the reagent to form a polymeric layer on a support surface, and particularly a porous support surface, in a manner that provides and/or preserves desired properties (such as porosity) of the surface. The reagent and method can be used to provide a thin, conformable, uniform, uncrosslinked coating having desired properties onto the surface of a preformed, and particularly a porous, polymeric substrate.

Abstract: Disclosed is an aqueous polyurethane dispersion obtained by dispersing in water a reaction product obtained by reacting a reaction mixture comprising at least one organic, aliphatic, cycloaliphatic or aromatic di, tri or poryisocyanate, at least one isocyanate reactive polycarbonate diol, triol or polyol, at least one compound comprising at least one isocyanate reactive group and at least one free radically polymerisable unsaturated group, and at least one compound comprising at least one isocyanate reactive group and at least one at least dispersing active group, and optionally at least one compound comprising at least two isocyanate reactive groups and having a molecular weight of less than 1000 g/mol.

Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.

Abstract: Provided are a photosensitive resin and a photosensitive resin composition comprising the photosensitive resin. The photosensitive resin has the structure of Formula 1, which is described in the specification. The photosensitive resin and the photosensitive resin composition have good sensitivity, improved resistance to heat and chemicals, and excellent storage stability. Further provided are a method for preparing the photosensitive resin and a cured product of the photosensitive resin composition.

Abstract: The present invention relates to a photosensitive resin composition for a color filter and a color filter fabricated using the same. The photosensitive resin composition includes (a) an acrylic-based resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator, (d) a pigment, and (e) a solvent. The acrylic-based resin is a copolymer including a repeating unit of an ethylenic unsaturated monomer including a carboxyl group and a repeating unit of an ethylenic unsaturated monomer including an alkoxy 4-oxo butanoic acid group. The photosensitive resin composition for a color filter can have residue removing characteristics, and is capable of forming fine pixels and providing a color filter having high resolution.

Abstract: A Radiation Curable Coating composition, which may be used as an inner primary coating, an outer primary coating, single coats, a matrix, or a buffer resin composition, comprising: A Radiation Curable Coating composition, which may be used as an inner primary coating, an outer primary coating, single coats, a matrix, or a buffer resin composition, comprising at least one radiation-curable oligomer wherein said at least one radiation curable oligomer is a fatty-acid modified epoxy acrylate; at least one ethylenenic unsaturated reactive diluent; wherein said oligomer(s) and diluent(s) are selected from the group that does not include moieties with Urethane chemistry. This composition, when tested, is found to have resistance to thermal degradation as measured by less than 10% weight loss after exposure of cured specimens in a natural convection furnace for 100 hours at 180° C.

Abstract: The objective of the present invention is to provide a photosensitive insulating resin composition which is highly sensitive to g-line and h-line and enables to form a surface-protecting film, an interlayer insulation film and a planarized film that are excellent in various properties including resolution, electrical insulation property and thermal shock resistance, a cured product and an electronic component having the cured product. The present photosensitive insulating resin composition comprises an alkali-soluble resin having a phenolic hydroxyl group, a radiation sensitive acid generator comprising an s-triazine derivative represented by the following general formula (1), and a crosslinking agent. [In the formula (1), R is hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms, X is a halogen atom and Y is oxygen atom or sulfur atom.

Abstract: Superabsorbent polymer particles having improved surface cross-linking and their use in absorbent articles. The superabsorbent polymer particles comprise a water-absorbing resin and the reaction product of a radiation activatable surface cross-linker. The reaction product of the radiation activatable surface cross-linker is present at the surface of the superabsorbent polymer particle. The radiation activatable surface cross-linker includes at least two radiation activatable groups R, which are covalently bound to each other or to at least one spacer group S.

Abstract: Compounds of the formula (I), wherein A1 is formula (II); A2 is formula (III); A3 is formula (IV); A4 is formula (V); w, x, y and z independently of each other are an integer from 0-4, provided that the sum of x+y+z is an integer from 2-4, corresponding to the valency of Q; M1, M2, M3 and M4 for example are a direct bond, CO or O; Y for example is a direct bond or S; Q is a (x+y)-valent linking group; R1 is for example hydrogen, C1-C20alkyl or phenyl or naphthyl; R2 and R?2 for example are is hydrogen or C1-C20alkyl; R3, R4, R?3, R?4, R?3 and R?4 for example are hydrogen, halogen, phenyl, or C1-C20alkyl; and R24 is for example a direct bond; exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: The present invention relates to a composition for preparing an excellent protecting film with high strength, wear resistance, and excellent barrier property by low temperature hardening, a protecting film prepared therefrom, a substrate comprising the same, and a component or device comprising the same. The composition comprises an organosiloxane polymer a), a photobase generator b), and an organic solvent c).

Abstract: To provide a photosensitive composition with which it is possible to form partition walls (black matrix) having excellent light shielding properties and liquid repellency. A photosensitive composition, which comprises a polymer (A) having a side chain containing a fluorine atom-containing group or a silicon atom-containing group and a side chain containing an ethylenic double bond in one molecule, a black colorant (B), a photopolymerization initiator (C) which is an O-acyloxime compound, and a photosensitive resin (D) containing an acidic group and an ethylenic double bond in one molecule, wherein the proportion of the black colorant (B) in the total solid content of the composition is from 15 to 60 mass %.

Abstract: A process comprises (a) providing a substantially inorganic photoreactive composition comprising (1) at least one cationically reactive species, (2) a multi-photon photoinitiator system, and 10 (3) a plurality of precondensed, inorganic nanoparticles; (b) exposing, using a multibeam interference technique involving at least three beams, at least a portion of the photoreactive composition to radiation of appropriate wavelength, spatial distribution, and intensity to produce a two-dimensional or three-dimensional periodic pattern of reacted and non-reacted portions of the photoreactive composition; (c) exposing at least a portion of the non-reacted portion of the photoreactive composition to radiation of appropriate wavelength and intensity to cause multi-photon absorption and photoreaction to form additional reacted portion; (d) removing the non-reacted portion or the reacted portion of the photoreactive composition to form interstitial void space; and (e) at least partially filling the interstitial void space

Abstract: Radiation curable compositions, such as UV curable ink compositions, contain a polymeric dispersant, a curable material, and a nanoscale pigment particle composition including an organic monoazo laked pigment including at least one functional moiety, and a sterically bulky stabilizer compound including at least one functional group, wherein the functional moiety of the pigment associates non-covalently with the functional group of the stabilizer; and the presence of the associated stabilizer limits the extent of particle growth and aggregation, to afford nanoscale-sized pigment particles.

Abstract: Photosensitive polybenzoxazine compositions include a photosensitive additive such as an o-diazoquinone and a polymer comprising a repeating unit represented by the following formula (I) wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R4 comprises a hydrophilic group, a hydrophilic group protected by an acid-cleavable group, a hydrophilic group protected by a base-cleavable group, a cross-linkable group, or combinations thereof, and i represents an integer of 1 or more. The photosensitive compositions may be formed by combining a precursor polymer with a photosensitive additive and a solvent, patterning the precursor polymer, and heating the precursor polymer at a thermal processing temperature in a range of from about 180° C. to about 300° C. to convert the precursor polymer into the final polymer.

Abstract: A method for producing a polyester is provided, the method comprising the step of reacting an acylated product of a compound having at least one phenolic hydroxyl group with an aromatic carboxylic acid under microwave irradiation. Polyester can be produced by the method in a relatively short period of time at high temperature with a suppressed thermal hysteresis.

Abstract: An optical film comprising a support and a layer containing a cured product of a composition which contains a fluorinated photopolymerization initiator and an ionizing radiation-curing compound.

Abstract: The present invention pertains to a composition comprising (a) a photolatent base; (b) a blocked isocyanate or blocked isothiocyanate and (c) a hydrogen donor compound; and its applications.

Abstract: Disclosed is an oxime ester compound represented by the following general formula (I). (In the formula, R1, R2 and R3 independently represent R11, OR11, COR11, SR11, CONR12R13 or CN; R11, R12 and R13 Independently represent a hydrogen atom, an alkyl group having 1-20 carbon atoms, an aryl group having 6-30 carbon atoms, an arylalkyl group having 7-30 carbon atoms or a heterocyclic group having 2-20 carbon atoms; R4 and R5 independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom or a hydroxy group; and a and b independently represent a number of 0-3.

Abstract: The present invention relates to an ink composition, and more particularly, to an ink composition that comprises a) a binder polymer; b) a polymerizable compound that has an ethylenical unsaturation bond; c) a thermal initiator or photo-initiator; d) I) a solvent that has a boiling point of 180° C. or more, II) a solvent that has a hydroxyl group, and III) a solvent that has a boiling point of less than 180° C.; and e) a pigment, a color filter that is manufactured by using the same, and a display device that includes the same. When the ink composition according to the present invention is used in an inkjet method, it is possible to improve a contrast ratio according to excellent dispersion of fine pigment and improve an initial jetting property by using reduction of volatility.

Abstract: The disclosure provides a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. Use of an off-stoichiometric ratio of thiol:ene functional groups in favor of excess thiols results in enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.

Abstract: A fixture for orthopedic surgery comprises a photocurable resin containing a urethane type (meth)acrylic acid derivative oligomer obtainable by a polyisocyanate having at least three isocyanate group, and a (meth)acrylic acid derivative having an active hydrogen group; and a photopolymerization initiator which absorbs light of 400 to 700 nm. The photocurable resin is retained in a base material to form a support material. The inner side of the support material is covered with a buffer material and the outer side thereof is covered with a cover material to obtain a splint material as a fixture for orthopedic surgery. The buffer material side of the splint material is put on an affected part of the body and a bandage is wound over it, and then molding is carried out using irradiation with visible light to cure the photocurable resin. As the curing proceeds, a splint is obtained for fixing and supporting the affected part.

Abstract: A material which comprises a polyrotaxane and a polymer and is crosslinked by irradiation with light. In the material, which comprises a first polyrotaxane and a polymer, the first polyrotaxane comprises a first cyclic molecules, a first linear molecule with which the first cyclic molecules are clathrated in a splitted state, and first blocking groups disposed respectively at both ends of the first linear molecule so as to prevent the first cyclic molecules from being released from the first linear molecule. The first polyrotaxane combines with at least part of the polymer through the first cyclic molecules by photocrosslinking reaction.

Abstract: Disclosed herein is a composition, including a fluorine-based polymer or a perfluoropolyether (PFPE) derivative and a PFPE-miscible polymer, an anti-oxide film and electronic component including the same, and methods of forming an anti-oxide film and an electronic component. Use of the composition may achieve formation of an anti-oxide film through a solution process and electronic components using a metal having increased conductivity and decreased production costs.

Abstract: A photocurable composition is provided that includes a polymerizable compound, a photopolymerization initiator, a compound represented by Formula (I) below, and an amine compound, the photopolymerization initiator comprising an acylphosphine oxide compound and/or an ?-aminoacetophenone compound in Formula (I) above, X denotes O, S, or NR, n denotes 0 or 1, R denotes a hydrogen atom, an alkyl group, or an acyl group, R1, R2, R3, R4, R5, R6, R7, and R8 independently denote a hydrogen atom or a monovalent substituent, and two of R1, R2, R3, and R4 that are adjacent may be bonded to each other to form a ring.

Abstract: A composition that is photopolymerizable upon absorption of light and/or heat, the composition including a binder, a polymerizable compound, a sensitizer, and a photoinitiator, characterized in that the composition includes, with respect to its non-volatile compounds, at least about 0.01 wt.-% of a polythiol compound, and wherein the composition when coated on a support has a sensitivity of about 150 ?J/cm2 or higher, in combination with a high hardness.

Abstract: A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and at least one stabilizer.

Abstract: Compounds of the formula (I), (II), and wherein R1, R2, R?2 and R??2 for example are C1-C20alkyl; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6, R7, R8, R?6, R?7, R?8, R?6, R?7, R??6 and R??7 for example independently of one another have one of the meanings as given for R3, R4, and R5; and R9 for example is C1-C20alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.

Abstract: Polymers, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary polymer, among others, includes, a photodefinable polymer having a sacrificial polymer and a photoinitiator.

Abstract: A dental adhesive composition has an adhesive component and an activator component. The adhesive composition has a volatile organic solvent component, one or more polymerizable (meth)acrylate compounds optionally containing fillers, and a polymerization photoinitiator. The adhesive component may also be a substantially homogeneous mixture of one or more polymerizable (meth)acrylate compounds and an effective amount of a photoinitiator, without a solvent. The activator component includes an aromatic sulfinate salt and an activator component solvent. A method for adhering a restorative to a dental surface includes preparing the surface for restoration; applying a mixture of an adhesive component and an activator component to the prepared cavity, thereby forming a coated cavity surface; and, applying a direct or indirect dental restorative to the coated cavity surface.

Abstract: [Problems] To provide a radiation curable resin having an extremely low possibility of contaminating liquid crystals, and a liquid crystal sealing material using such a photopolymerization initiator. [Means for Solving Problems] A liquid crystal sealing material characterized by comprising (a) a radiation curable resin represented by the general formula (1) below, (b) a photopolymerization initiator and (c) a filler having an average particle diameter of not more than 3 ?m.

Abstract: Superabsorbent polymer particles with improved surface cross-linking for use in absorbent articles and a process for making the superabsorbent polymer particles. The superabsorbent polymer particles include a water-absorbing resin and the reaction product of a radiation activatable surface cross-linker. The reaction product of the radiation activatable surface cross-linker is present at surfaces of the superabsorbent polymer particles. The radiation activatable surface cross-linker includes at least two radiation activatable groups R, which are covalently bound to each other or to at least one spacer group S.

Abstract: An ink set for inkjet recording is provided that includes at least a colored liquid comprising at least a radically polymerizable compound, a photopolymerization initiator, and a colorant and an undercoat liquid comprising at least a radically polymerizable compound and a photopolymerization initiator, the undercoat liquid comprising a sensitizer represented by Formula (I) below. In Formula (I) above, X denotes O, S, or NR, n denotes 0 or 1, R denotes a hydrogen atom, an alkyl group, or an acyl group, and R1, R2, R3, R4, R5, R6, R7, and R8 independently denote a hydrogen atom or a monovalent substituent. There is also provided an inkjet recording method employing the ink set for inkjet recording, the method including a step of applying the undercoat liquid on top of a recording medium, a step of semi-curing the undercoat liquid, and a step of carrying out image formation by discharging the colored liquid on top of the semi-cured undercoat liquid.

Abstract: There is provided a technique for introducing grafted side chains having a narrow molecular weight distribution onto a molded organic polymer substrate, for example polyolefin substrate, while maintaining the form of the substrate. One aspect of the present invention relates to a method of manufacturing a grafted material, comprising the steps of (a) irradiating an organic polymer substrate with ionizing radiation, and then bringing a polymerizable monomer and a polymerization initiating group-introducing agent into contact with the substrate, thus introducing grafted side chains having polymerization initiating groups on ends thereof onto trunk polymer of the substrate, and (b) then bringing a polymerizable monomer into contact with the substrate, thus causing the grafted side chains to grow.

Abstract: A multi-photon reactive composition comprises an ethylenically unsaturated liquid polysilazane precursor, a multi-functional thiol additive, a multi-ethylenically-unsaturated additive different from the polysilazane, and a multi-photon photocuring composition. The invention can be used to provide ceramic-based microstructures as, for example, high temperature resistant materials, including devices such as microcombustors, micro-heat-exchangers, sensor and actuator systems, microfluidic devices, and micro-optics systems that can be used independently or integrated into other systems.

Abstract: A solvent-free resin composition comprising (a) a polyimide silicone resin having repeating units represented by the following general formulas (1-1) and (1-2), wherein X is a tetravalent organic group, Y is a divalent organic group, and Z is a divalent organic group having an organosiloxane moiety, (b) a reactive diluent, and (c) a photo-polymerization initiator, characterized in that a film of said resin composition with a film thickness of 100 ?m prepared on a quartz glass substrate shows a light transmittance of 80% or higher at wavelengths of from 350 nm to 450 nm.

Abstract: The present invention relates to an aqueous dispersion comprises a pigment (B) at least partially enveloped by at least one radiation-curable polyurethane (A), at least one radiation-curable polyurethane (A) being obtainable by reaction of (a) at least one diisocyanate with (b) at least one compound having at least two isocyanate-reactive groups and (c) at least one compound of the general formula I where R1 and R2 are the same or different and are independently selected from hydrogen and C1-C10-alkyl, X1 is selected from oxygen and N—R3, A1 is selected from C1-C20-alkylene which is unsubstituted or singly or multiply substituted by C1-C4-alkyl, phenyl or O—C1-C4-alkyl, and in which one or more nonadjacent CH2 groups may be replaced by oxygen; X2 is selected from hydroxyl and NH—R3, R3 is in each occurrence the same or different and selected from hydrogen, C1-C10-alkyl and phenyl.

Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.

Abstract: The present invention relates to vinyl ether or acrylate terminated block resins, compositions incorporating same and methods for preparing same. In particular, the compositions of the present invention may contain a vinyl ether or acrylate terminated block resin, such as a polyurethane block copolymer, a reactive diluent having vinyl ether or 1-alkenyl ether and (meth)acrylate functionality and a curing initiator. The compositions may be exposed to an energy source, e.g., photoradiation, to impart tack-free surface cure.

Abstract: A polymerizable composition comprising: (A) a non-acrylic binder polymer having an ethylenically unsaturated bond on a side chain; (B) a neutrally charged compound capable of generating a radical under light or heat; and (C) a compound having an ethylenically unsaturated bond, and a polymerizable composition comprising: (A?) a polyurethane resin having an ethylenically unsaturated bond on a side chain, which is a reaction product of an isocyanate compound and a diol compound including a diol compound represented by the formula (G) defiend herein; (B) a neutrally charged compound capable of generating a radical under light or heat; (C) a compound having an ethylenically unsaturated bond; (D?) a 1,4-benzoquinone derivative; and (E?) a dye having a maximum absorption wavelength in a region of from 350 to 450 nm.

Abstract: Provided is an alkali-soluble maleimide-based copolymer which comprises, as essential constituents, 5 to 50% by mass of a maleimide monomer unit which is at least one unit selected from the group consisting of a N-cyclohexylmaleimide monomer unit, a N-benzylmaleimide monomer unit and a substituted N-benzylmaleimide monomer unit, 8 to 30% by mass of the (meth)acrylic acid monomer unit and 30 to 87% by mass of a (meth)acrylic acid ester monomer unit and which satisfies the condition represented by the formula: 0.4×X?Y?0.5×X+10 where X is the content, in % by mass, of the N-cyclohexylmaleimide monomer unit, the N-benzylmaleimide monomer unit and the substituted N-benzylmaleimide monomer unit and Y is the content, in % by mass, of the (meth)acrylic acid monomer unit. Also provided are a color filter and a liquid crystal display which are formed by using the ionizing radiation-curable resin composition.

Abstract: The present invention relates to a light curable material comprising a splayed layered material, at least one aqueous dispersible polymerizer, and at least one aqueous soluble N-oxyazinium compound, wherein the polymerizer polymerizes upon exposure to light. The present invention also includes a method for curing a material comprising providing layered material, splaying the layered material, combining the splayed layered material with a polymerizer and an aqueous soluble N-oxyazinium compound, and subjecting the combination to light for a period of time sufficient to effect the polymerization of the polymerizer.

Abstract: The present invention relates to a photosensitive resin composition, and more particularly, to a photosensitive resin composition for forming an over coating layer of a color filter. The photosensitive resin composition according to the present invention includes a UV absorber. The photosensitive resin composition according to the present invention adjusts line width and height of a pattern without difficulty, forms a linear pattern, provides good transmittance and is adequate to form the over coating layer of the color filter.

Abstract: The objective of the present invention is to provide a photosensitive insulating resin composition which is highly sensitive to g-line and h-line and enables to form a surface-protecting film, an interlayer insulation film and a planarized film that are excellent in various properties including resolution, electrical insulation property and thermal shock resistance, a cured product and an electronic component having the cured product. The present photosensitive insulating resin composition comprises an alkali-soluble resin having a phenolic hydroxyl group, a radiation sensitive acid generator comprising an s-triazine derivative represented by the following general formula (1), and a crosslinking agent. [In the formula (1), R is hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms, X is a halogen atom and Y is oxygen atom or sulfur atom.

Abstract: The invention pertains to a photosensitive resin composition, comprising: (A) an alkaline soluble resin; (B) a multi-functional monomer; (C) a photoinitiator; (D) a colorant; and (E) a solvent, wherein said alkaline soluble resin comprises a copolymer obtained from the copolymerization of 5-95 wt % of the monomer of formula (1): and 5-95 wt % of an ethylenically unsaturated monomer containing at least one carboxy group. The inventive photosensitive resin composition possesses good heat resistance, development properties, and adhesion properties and can be used in liquid crystal displays as a photosensitive material for the manufacture of color filters.

Abstract: The photobase generator of the invention is represented by the following formula 1: wherein Ar, R, A+ and X? are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by polymerization under ultraviolet irradiation.

Abstract: A single- or multi-photon reactive composition comprises a liquid polysilazane precursor, a multifunctional acrylate additive, and a single- or multi-photon photocuring composition. The invention can be used to provide ceramic-based microstructures as, for example, high temperature resistant materials, including devices such as microcombustors, micro-heat-exchangers, sensor and actuator systems, microfluidic devices, and micro-optics systems that can be used independently or integrated into other systems.

Abstract: The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking an oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises: (a) adding to precursor monomers or oligomers or polymers or copolymers an effective amount of at least one complex of Co, Mo or W which under irradiation conditions photochemically reacts to release at least one anionically charged nucleophile or uncharged Lewis base; and (b) irradiating the mixture of (a) to release the at least one anionically charged nucleophile or uncharged Lewis base to initiate polymerisation and/or crosslinking of the monomer, oligomer, polymer or copolymer.

Abstract: Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed from the work piece by peeling.

Abstract: The invention relates to a liquid curable resin composition capable of forming a ribbon matrix material which can be completely removed from a coloring layer when separating the optical fiber ribbon. A liquid curable resin composition comprising: (1) 30–80 wt. % of a urethane (meth)acrylate produced by reacting (A) a polyol compound, (B) a polyisocyanate compound, and (C) a (meth)acrylate compound containing a hydroxyl group, (2) 0.01–10 wt % of 2-methly-1-[4-(methylthio)phenyl]-2-morpholino-propan-1-one, and (3) 10–70 wt. % of a polymerizable diluent comprising a polymerizable monofunctional vinyl monomer which is copolymerizable with the component (1), wherein a two-layer film, which is obtained by applying the composition to a cured film of a UV-curable resin comprising the compound shown by the above formula (1) and curing the composition, has a T-peel strength of about 1.8 g/cm or less.

Abstract: Photoinitiated reactions especially in photopolymer technology, as well as photoinitiated colour forming reactions are achievable by applying a reactive substrate selected from a polymerisable and/or crosslinkable composition and a colour changing substance to a support, activating a latent photoinitiator applied with the reactive substance and subsequently exposing the reactive substrate with the resulting photoinitiator therein to photoreaction conditions wherein actinic radiation causes the substrate to undergo polymerisation and/or crosslinking or colour change respectively, the substrate being locally modified in its constitution as a result of its exposure to actinic radiation at least one stage of the method, so that the resulting polymerised and/or crosslinked composition or colour changed substance corresponds in its distribution on the support to the locations of the modification of the substrate.