Numerically Specified Distinct Wavelength Patents (Class 522/913)
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Patent number: 8048613Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.Type: GrantFiled: October 13, 2008Date of Patent: November 1, 2011Assignee: Taiyo Ink Mfg. Co., Ltd.Inventors: Nobuhito Itoh, Yoko Shibasaki, Kenji Kato, Masao Arima
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Patent number: 7767727Abstract: An autoxidisable architectural coating composition suitable for application to surfaces found in and around buildings at ambient temperatures and in natural daylight wherein surface autoxidation of the composition is promoted by a combination of low concentrations of metal ions (especially manganese or vanadium) and 2,2-dimethoxy-1,2-diphenylethan-1-one as photoinitiator. The composition avoids the need to use more than trace amounts cobalt ions which are rumoured to be carcinogenic yet achieves adequately fast rates of autoxidation. Preferably the use of cobalt is avoided altogether. The use of the low concentrations of the other metal ions reduces discoloration of the compositions often to levels below what is achieved using conventional cobalt promoters. Also a modification in which surface autoxidation is promoted by a combination of 2,2-dimethoxy-1,2-diphenylethan-1-one and trace amounts of cobalt ions in the absence of other surface autoxidation promoting metal ions.Type: GrantFiled: June 11, 2006Date of Patent: August 3, 2010Assignee: Imperial Chemical Industries PLCInventor: Philip Louis Taylor
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Patent number: 7615323Abstract: Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein ?1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from aType: GrantFiled: November 11, 2005Date of Patent: November 10, 2009Assignee: Kodak Graphic Communications, GmbHInventors: Bernd Strehmel, Harald Baumann, Udo Dwars, Detlef Pietsch, Axel Draber, Michael Mursal
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Patent number: 7498065Abstract: A special method is provided for more uniformly and quickly curing products with a scratch-resistant UV curable coating or UV curable printing thereon, such as for CDs, DVDs, golf balls, golf tees, eye glass lenses, contact lenses, string instruments, decorative labels, peelable labels, peelable stamps, doors, countertops, etc. The method can also be operated with one or more special UV curing apparatus equipped with a controller, temperature sensors, and heat dissipators.Type: GrantFiled: March 23, 2005Date of Patent: March 3, 2009Assignee: Con-Trol-Cure, Inc.Inventor: Stephen B. Siegel
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Patent number: 7482107Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.Type: GrantFiled: March 23, 2006Date of Patent: January 27, 2009Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
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Patent number: 7361696Abstract: A 1,4-di-substituted diacetylene polymer that is soluble in organic solvent, is composed of a repeating unit represented by the general formula ?CR—C?C—CR?? (wherein, R and R? represent identical or different monovalent organic substituents), and has an average degree of polymerization of 4 to 200 and a ratio (Mw/Mn) of weight average molecular weight (Mw) to number average molecular weight corresponding to said average degree of polymerization (Mn) of 1.1 to 5.0, and a process for producing the 1,4-di-substituted diacetylene polymer by irradiating a solution of the soluble 1,4-di-substituted diacetylene polymer with laser light having a wavelength within the range of 250 to 1,200 nm, and preferably 550 to 900 nm, to cause a photodegradation reaction of said polymer, or heating a solution of the soluble 1,4-di-substituted diacetylene polymer to a temperature of 100 to 300° C.Type: GrantFiled: November 5, 2002Date of Patent: April 22, 2008Assignee: Japan Science and Technology CorporationInventors: Kenji Takeda, Makoto Gonokami
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Patent number: 6652694Abstract: A sheet-like photocurable resin compound can secure or control a sufficient application time outdoors where the compound is irradiated with natural light and can suppress volatilization of a styrene monomer. This sheet-like photocurable resin compound comprises a photocurable resin compound (i) containing as an essential component at least one unsaturated resin (A) selected from the group consisting of unsaturated polyester resin, vinyl ester resin, vinyl urethane resin, and acrylic resin, a photopolymerization initiator (B) which is not activated by irradiation with light with a wavelength of 420 nm or above, and a thickener (C) containing a thermnoplastic resin powder as an active component; and a see-through light absorbing film (ii) whose transmittance to light with a wavelength of 420 nm or below is 10% or less; said photocurable resin compound being covered with said see-through absorbing film.Type: GrantFiled: August 29, 2000Date of Patent: November 25, 2003Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Shinichi Nonaka, Takashi Tomiyama, Shigeru Motomiya
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Publication number: 20030180635Abstract: A visible radiation sensitive composition is disclosed. The composition comprises at least one ethylenically unsaturated monomer capable of free radical initiated addition polymerization; optionally, at least one binder; and a photoinitiator system comprising a coinitiator and a cyanopyridone sensitizer. The coinitiator preferably comprises a metallocene and an onium compound.Type: ApplicationFiled: February 12, 2002Publication date: September 25, 2003Inventors: Harald Baumann, Michael Flugel
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Patent number: 6239190Abstract: There is disclosed a method for effecting a reaction by irradiating a substance which absorbs the radiant energy until the reaction is complete and the absorbency of the material changes so as to reduce or cease absorption of further radiant energy.Type: GrantFiled: July 28, 1997Date of Patent: May 29, 2001Assignee: Tissuemed LimitedInventors: Francis Wilkinson, David John Mandley
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Patent number: 6127447Abstract: A radiation curable coating composition is provided and includes an effective amount of cationic photoinitiator, in combination with a charge transfer complex, the charge transfer complex comprising at least one electron withdrawing reactant component and at least one electron donating reactant component free radically reactive therewith, the electron withdrawing reactant component comprising an unsaturated nitrogen containing compound and the electron donating reactant component comprising an unsaturated compound having at least one vinyl ether group, the electron donating reactant component may be separate from or structurally incorporated within the electron withdrawing reactant component and an effective amount of a cationic photoinitiator. A photopolymerization process employing the composition is also provided.Type: GrantFiled: July 30, 1999Date of Patent: October 3, 2000Assignee: Fusion UV Systems, Inc.Inventors: Mark Mitry, Roger McCartney, Mohamed R. Amin
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Patent number: 6025409Abstract: The invention relates to a coating composition comprising (a) a radiation-curable binder composition comprising an unsaturated compound having at least one maleate, fumerate, itaconate, citraconate or mesaconate group; (b) an unsaturated vinylether compound and a compound which forms a strong exciplex with (a) or (b); that is otherwise free of a photoinitiating compound.Type: GrantFiled: August 28, 1998Date of Patent: February 15, 2000Assignee: DSM N.V.Inventor: Johan F. G. A. Jansen
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Patent number: 5994579Abstract: A process for lightening (or decreasing) the color of diphenylmethane diisocyanate by irradiation with light having a wavelength of from 250 nm to 2,500 nm is described. This invention also relates to the use of this brightened diphenylmethane diisocyanate as the isocyanate component in a process for the production of polyurethane plastics by the isocyanate polyaddition process.Type: GrantFiled: March 24, 1999Date of Patent: November 30, 1999Assignee: Bayer AktiengesellschaftInventors: Juan Morell Torrel, Salvador Vidal Rodriguez, Vicente Requena Alda
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Patent number: 5677362Abstract: An acrylate encapsulation formulation reacts at a high rate of speed, when exposed to radiation inclusive of wavelengths in the ultraviolet and the visible range, to initially produce a relatively thick skin and to ultimately cure to a relatively low-stress deposit having good physical definition and surface properties. The method entails exposure of the formulation, on an object, to radiation for initialing photopolymerization and thermal polymerization, and the apparatus includes closely juxtaposed actinic radiation and thermal energy sources.Type: GrantFiled: November 4, 1996Date of Patent: October 14, 1997Assignee: Dymax CorporationInventors: Andrew G. Bachmann, Stephen E. Cantor
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Patent number: 5672393Abstract: An acrylate encapsulation formulation reacts at a high rate of speed, when exposed to radiation inclusive of wave-lengths in the ultraviolet and the visible range, to initially produce a relatively thick skin and to ultimately cure to a relatively low-stress deposit having good physical definition and surface properties. The method entails exposure of the formulation, on an object, to radiation for initialing photopolymerization and thermal polymerization, and the apparatus includes closely juxtaposed actinic radiation and thermal energy sources.Type: GrantFiled: November 4, 1996Date of Patent: September 30, 1997Assignee: Dymax CorporationInventors: Andrew G. Bachmann, Stephen E. Cantor
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Patent number: 5472991Abstract: The invention relates to photopolymerizable dental compositions of ethylenically unsaturated monomers and/or polymers thereof which are curable in two curing steps. Besides being comprised of fillers, said compositions also contain a photoinitiator component I having a light absorption maximum of <450 nm and a molar extinction of the light absorption of <10 at wavelengths of 470 nm or higher, and a photoinitiator component II having a molar extinction of the light absorption of >20 at least at one wavelength of at least >450 nm.Type: GrantFiled: July 21, 1994Date of Patent: December 5, 1995Assignee: 501 Espe Stiftung & Co. Produktions-UndInventors: Werner Schmitt, Peter Jochum, Klaus Ellrich
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Patent number: 5446073Abstract: Composition containing charge transfer complex from at least one unsaturated compound having an electron donor group and having an electron withdrawing group and being free of any photoinitiating compound is polymerized by being subjected to ultraviolet light.Type: GrantFiled: March 31, 1993Date of Patent: August 29, 1995Assignee: Fusion Systems CorporationInventors: Sonny Jonsson, Per-Erik G. Sundell, William R. Schaeffer
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Patent number: 5387622Abstract: Perfume compositions are formed by hydrolyzing an aqueous mixture of an alkoxide, a silane coupling agent, and a perfume substance using an acid catalyst, then condensing the resulting hydrolysate using a base catalyst, to form a conjugated polymer matrix encapsulating and/or clathrating the perfume substance.Type: GrantFiled: June 28, 1991Date of Patent: February 7, 1995Inventor: Tohru Yamamoto
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Patent number: 5330882Abstract: The present invention provides an improved process by which dissolved oxygen is effectively removed from a photosensitive resin layer of a photosensitive resin plate. The process comprises preliminarily exposing the photosensitive resin to light to quench oxygen dissolved in said photosensitive resin layer before conducting a main exposure. The photosensitive resin layer is prepared from a photosensitive resin composition which comprises:(a) a polymer binder,(b) a radically polymerizable monomer,(c) a sensitizing dye, and(d) a photopolymerization initiator which is excited by a light of a different wave length from a light exciting the sensitizing dye.The preliminary exposure is conducted with a light only exciting the sensitizing dye and the main exposure is conducted with a light exciting the photopolymerization initiator.Type: GrantFiled: June 4, 1991Date of Patent: July 19, 1994Assignee: Nippon Paint Co., Ltd.Inventors: Chitoshi Kawaguchi, Seiji Arimatsu, Katsuji Konishi, Kazunori Kanda
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Patent number: 5318999Abstract: The present invention provides a novel dental composition and a method of making shaped dental articles therefrom via photoiniferter polymerization. The dental composition comprises acrylic photoiniferter block polymer, a monomer charge comprising free radically polymerizable acrylic monomer, and a filler and optionally includes pigments, sensitizers, medicaments, stabilizers, accelerators, etc. The dental composition is alternately exposed to a source of radiant energy and shaped in a desired manner in order to form a partially cured dental article. The partially cured dental article is then cured by a final exposure to the radiant energy source, providing a final cured article. The resultant reinforced acrylic copolymer system provides a shaped dental article which can be a denture base, a denture liner or a restorative.Type: GrantFiled: October 8, 1991Date of Patent: June 7, 1994Assignee: Minnesota Mining and Manufacturing CompanyInventors: Sumita B. Mitra, Mahfuza B. Ali
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Patent number: 5288376Abstract: A perfluorooligoether iodide is prepared by exposing a perfluoropolyether carboxylic iodide to UV light.Type: GrantFiled: February 16, 1993Date of Patent: February 22, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masayuki Oyama, Noriyuki Koike, Toshio Takago
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Patent number: 5187045Abstract: Radiation-sensitive organo-halogen compounds having a photo-labile halomethyl-1,3,5-triazine moiety and at least one sensitizer moiety within one molecule. The compounds of this invention are good photoinitiators, and compositions containing them can be used in printing, duplicating, copying, and other imaging systems.Type: GrantFiled: June 4, 1991Date of Patent: February 16, 1993Assignee: Minnesota Mining and Manufacturing CompanyInventors: James A. Bonham, Mitchell A. Rossman
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Patent number: 5183833Abstract: A pressure sensitive adhesive is prepared by the polymerization of an appropriate acrylic ester formulation of the type that includes an ethylenically unsaturated monomer having a polar group, and at least part of such polymerization is accomplished by photopolymerization using a source of ultraviolet radiation that provides a substantial portion of its ultraviolet radiation in the wavelength band of from about 280 to about 350 nm and a light intensity at the surface of the formulation being polymerized of no more than about 4.0 milliwatts/cm.sup.2.Type: GrantFiled: August 17, 1990Date of Patent: February 2, 1993Assignee: Adco Products Inc.Inventors: Dennis K. Fisher, Brian J. Briddell
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Patent number: 5137800Abstract: A polymerizable composition and a method are disclosed. The composition includes a photopolymerizable monomer and a photoinitiator system for the monomer. The system, in one embodiment, is one wherein a ray of activating radiation which enters a body of the composition through a surface thereof activates the photoinitiator system and causes polymerization at each of a succession of points, the first such point being immediately adjacent the surface and subsequent points being successively farther from the surface in the direction of travel of the ray of activating radiation, the distance from the surface to the point of the succession farthest therefrom varying as a function of at least one of(a) the intensity of the activating radiation and(b) the time during which the activating radiation enters the body through the surface.Type: GrantFiled: June 14, 1990Date of Patent: August 11, 1992Assignee: StereoGraphics Limited PartnershipInventors: Douglas C. Neckers, Oscar Valdes-Aguilera, Krishan S. Raghuveer, Darrell G. Watson
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Patent number: 5124235Abstract: A photopolymerization initiator comprises a borate salt represented by the general formula (I):M.sup.n.sym. (B.sup..crclbar. R.sup.1 R.sup.2 R.sup.3 R.sup.4).sub.nwherein R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are respectively any one of halogen atoms, alkyl radicals, alkenyl radicals, alkynyl radicals, alicyclic radicals, aryl radicals, aryloxyl radicals, alkoxyl radicals, aralkyl radicals, and heterocyclic radicals, and may be the same with or different from each other; R.sup.1 and R.sup.2, or R.sup.2 and R.sup.3 may be linked to form a ring; M is an atom of a metal selected from Groups IB, IIB, IIIA, and IVA of the periodic table; and n is an integer of 1 or 2.A photosensitive composition comprises at least a polymerization compound and a photopolymerization initiator represented by the above general formula (I).Type: GrantFiled: September 9, 1991Date of Patent: June 23, 1992Assignee: Canon Kabushiki KaishaInventors: Tetsuro Fukui, Kyo Miura, Yoshio Takasu
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Patent number: 5049481Abstract: A photopolymerizable composition comprising (i) a polymerizable compound having an addition polymerizable unsaturated bond, (ii) a compound represented by formula (Ia): ##STR1## a compound represented by formula (Ib): ##STR2## or a compound represented by formula (Ic): ##STR3## wherein A represents an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, an alkyl- or aryl-substituted nitrogen atom, or a dialkyl-substituted carbon atom; Y.sup.1 represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an acyl group, an alkoxycarbonyl group, or a substituted alkoxycarbonyl group; R.sup.1 and R.sup.2 each represents a hydrogen atom, an alkyl group having from 1 to 18 carbon atoms, or an alkyl group having from 1 to 18 carbon atoms which is substituted with R.sup.3 O--, ##STR4## or a halogen atom (i.e., F, Cl, Br, and I), wherein R.sup.Type: GrantFiled: December 26, 1989Date of Patent: September 17, 1991Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasuo Okamoto, Tadahiro Sorori
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Patent number: 4923780Abstract: This invention relates to a process for preparing a reverse image using a pigmented peel-apart element containing a photoinhibitor. More particularly this invention relates to a process for preparing a negative or reverse surprint proof using peel-apart photosensitive elements comprising a strippable cover sheet; a photoadherent layer containing a colorant and a photoinhibitor compound; a tacky, essentially nonphotosensitive contiguous layer; and a support.Type: GrantFiled: December 12, 1988Date of Patent: May 8, 1990Assignee: E. I. Du Pont de Nemours and CompanyInventor: Harvey W. Taylor, Jr.
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Patent number: 4776992Abstract: Coated, reinforced composites are prepared by a process in which(i) a liquid composition comprising a photocurable residue and a residue having at least one epoxide group or phenolic hydroxyl group is applied to the surface of a mould,(ii) the composition is exposed to actinic radiation until it solidifies,(iii) reinforcement and a thermosettable composition are applied to the solidified layer, this composition containing an epoxide resin or a phenolic resin,(iv) the assembly is heated to form a cured moulding, and(v) the moulding is removed from the mould.Type: GrantFiled: July 25, 1986Date of Patent: October 11, 1988Assignee: Ciba-Geigy CorporationInventors: Edward Irving, Terence J. Smith
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Patent number: 4716097Abstract: Photopolymerizable composition comprising monomer, photoinitiator and triarylmethane or xanthene dye exhibit increased photospeed with an exposure to light above 400 nm with an intensity of at least 1500 lumen/sq. meter for one hour or more, with a preferred exposure of 15,000 lumen/sq. meter for 10 seconds or longer. A photospeed layer protected from exposure to oxygen has been shown to continue to maintain increased photospeed.Type: GrantFiled: February 3, 1986Date of Patent: December 29, 1987Assignee: E. I. Du Pont de Nemours and CompanyInventor: Gregory C. Weed
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Patent number: 4636532Abstract: A method for reducing the molecular weight of a polyglutarimide polymer having a molecular weight of 50,000 or higher, is disclosed. This is accomplished by the following steps:(a) dissolving the polyglutarimide polymer in a solvent which is transparent to ultraviolet radiation;(b) exposing the polyglutarimide solution to ultraviolet radiation for a sufficient time to reduce the molecular weight of the polyglutarimide; and(c) re-isolating the resin by precipitating the resin in an organic solution. A process for preparing a coatable photoresist composition wherein the molecular weight of a polyglutarimide resin may be reduced to a desired weight for a specific use is also taught.Type: GrantFiled: October 11, 1985Date of Patent: January 13, 1987Assignee: Shipley Company Inc.Inventor: Harold F. Sandford
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Patent number: 4593050Abstract: Fluorinated polymer surfaces are provided by a process in which ultraviolet radiation is used to assist the surface fluorination reaction.Type: GrantFiled: July 25, 1983Date of Patent: June 3, 1986Assignee: Massachusetts Institute of TechnologyInventors: Robert E. Cohen, George C. Corbin, Raymond F. Baddour