Wavelength Of 200 Nanometers Or Less Patents (Class 522/914)
  • Patent number: 7767727
    Abstract: An autoxidisable architectural coating composition suitable for application to surfaces found in and around buildings at ambient temperatures and in natural daylight wherein surface autoxidation of the composition is promoted by a combination of low concentrations of metal ions (especially manganese or vanadium) and 2,2-dimethoxy-1,2-diphenylethan-1-one as photoinitiator. The composition avoids the need to use more than trace amounts cobalt ions which are rumoured to be carcinogenic yet achieves adequately fast rates of autoxidation. Preferably the use of cobalt is avoided altogether. The use of the low concentrations of the other metal ions reduces discoloration of the compositions often to levels below what is achieved using conventional cobalt promoters. Also a modification in which surface autoxidation is promoted by a combination of 2,2-dimethoxy-1,2-diphenylethan-1-one and trace amounts of cobalt ions in the absence of other surface autoxidation promoting metal ions.
    Type: Grant
    Filed: June 11, 2006
    Date of Patent: August 3, 2010
    Assignee: Imperial Chemical Industries PLC
    Inventor: Philip Louis Taylor
  • Patent number: 7166413
    Abstract: By using a branched long chained chain scission polymer as a photoresist for EUV and 157 nanometer applications, a relatively higher molecular weight polymer with good mechanical properties may be achieved. In addition, by using chain scission technology, line edge roughness and resolution may be improved at the same time.
    Type: Grant
    Filed: October 12, 2004
    Date of Patent: January 23, 2007
    Assignee: Intel Corporation
    Inventors: Heidi B. Cao, Robert P. Meagley
  • Patent number: 6746722
    Abstract: A fluorine-containing phenylmaleimide derivative having a specific structure. A polymer obtained by polymerizing monomers containing the derivative. A polymer containing a specific structural unit and having a weight-average molecular weight of 2,000 to 200,000. A chemically amplified resist composition containing the polymer and a photo acid generator, wherein the proportion of the polymer relative to the total of the polymer and the photo acid generator is 70 to 99.8% by mass. A method for pattern formation, which comprises coating the above composition on a to-be-processed substrate, exposing with a light of 180 nm or less wavelength, and conducting baking and development.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: June 8, 2004
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 5288376
    Abstract: A perfluorooligoether iodide is prepared by exposing a perfluoropolyether carboxylic iodide to UV light.
    Type: Grant
    Filed: February 16, 1993
    Date of Patent: February 22, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayuki Oyama, Noriyuki Koike, Toshio Takago
  • Patent number: 4923780
    Abstract: This invention relates to a process for preparing a reverse image using a pigmented peel-apart element containing a photoinhibitor. More particularly this invention relates to a process for preparing a negative or reverse surprint proof using peel-apart photosensitive elements comprising a strippable cover sheet; a photoadherent layer containing a colorant and a photoinhibitor compound; a tacky, essentially nonphotosensitive contiguous layer; and a support.
    Type: Grant
    Filed: December 12, 1988
    Date of Patent: May 8, 1990
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Harvey W. Taylor, Jr.
  • Patent number: 4781942
    Abstract: A process for forming on the surface of a substrate a layer of a siloxane polymer by exposing the substrate to a first vapor phase monomer precursor having the formula SiR.sub.x H.sub.4-x where x is 1 to 4 and R is alkyl or phenyl, and a second vapor phase oxygen-containing precursor in the presence of radiation of a predetermined wavelength to bring about the reaction to form the siloxane polymer which deposits on the surface of substrate. The monomer precursor may comprise a mixture, such as SiRH.sub.3 and SiR.sub.2 H.sub.2 with each other or with SiR.sub.3 H. By varying the composition of such mixtures, the composition of the siloxane polymer may be chosen to provide predetermined properties, and, further, may be varied throughout the thickness of the deposited layer.
    Type: Grant
    Filed: December 19, 1985
    Date of Patent: November 1, 1988
    Assignee: Hughes Aircraft Company
    Inventors: Richard N. Leyden, James T. Hall
  • Patent number: 4593050
    Abstract: Fluorinated polymer surfaces are provided by a process in which ultraviolet radiation is used to assist the surface fluorination reaction.
    Type: Grant
    Filed: July 25, 1983
    Date of Patent: June 3, 1986
    Assignee: Massachusetts Institute of Technology
    Inventors: Robert E. Cohen, George C. Corbin, Raymond F. Baddour