Oxygen Atom Is Part Of An Ether Group Patents (Class 525/312)
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Patent number: 9447212Abstract: The production method for a vinyl ether polymer of the present technology comprises the step of subjecting a vinyl ether monomer to radical polymerization in a mixed solvent to form a vinyl ether polymer. The mixed solvent is a mixed solvent in which the mass ratio of isopropyl alcohol to dimethylformamide is from 93:7 to 75:25, or a mixed solvent in which the mass ratio of isopropyl alcohol to water is from 50:50 to 5:95, and a mass ratio of the vinyl ether monomer to the mixed solvent is from 3:100 to 45:100.Type: GrantFiled: March 7, 2014Date of Patent: September 20, 2016Assignee: The Yokohama Rubber Co., LTD.Inventor: Takahiro Okamatsu
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Patent number: 8835526Abstract: The present invention provides optic portions, intraocular lenses, and polymers for use in manufacturing optic portions and intraocular lenses. The optic portions include a polymer that comprises (a) one or more alkoxyalkyl methacrylate monomers and/or one or more alkoxyalkyl acrylate monomers that are incorporated in the polymer; (b) one or more hydroxyalkyl methacrylate monomers and/or one or more hydroxyalkyl acrylate monomers that are incorporated in the polymer; and (c) optionally, one or more crosslinking agents that are incorporated in the polymer.Type: GrantFiled: November 19, 2012Date of Patent: September 16, 2014Assignee: Benz Research and Development CorporationInventors: Patrick H. Benz, Jose A. Ors
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Patent number: 8728157Abstract: Disclosed are soft, high refractive index, acrylic device materials. The materials contain a hydrophilic side-chain macromer for glistening resistance.Type: GrantFiled: August 17, 2011Date of Patent: May 20, 2014Assignee: Novartis AGInventor: Douglas C. Schlueter
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Patent number: 8541508Abstract: According to the present invention, a novel epoxy group-containing copolymer, including a production process thereof, and an epoxy (meth)acrylate copolymer starting from the epoxy group-containing copolymer, including a production process thereof are provided. The epoxy group-containing copolymer of the present invention contains a specific epoxy group-containing repeating unit and an olefin-based repeating unit. A novel epoxy (meth)acrylate copolymer of the present invention is produced by reacting the epoxy group-containing copolymer with (meth)acrylic acid.Type: GrantFiled: August 7, 2009Date of Patent: September 24, 2013Assignee: Showa Denko K.K.Inventors: Hiroshi Uchida, Kazuhiko Ooga, Toshio Fujita, Masanao Hara
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Patent number: 8513355Abstract: Disclosed is a graft copolymer highly improving the adhesion resistance and impact strength, a method of preparing the same, and PVC composition containing the same, wherein the graft copolymer comprises i) 55 to 85 wt % of a conjugated diene-based rubber core; and ii) 15 to 45 wt % of a graft shell surrounding the rubber core, and formed by comprising a (meth)acrylate-based monomer, and at least one selected from the group consisting of a vinyl-based monomer having a polyalkylene oxide group represented by the following Formula 1; in which the graft copolymer includes 0.1 to 5 wt % of the vinyl-based monomer having the polyalkylene oxide group represented by the following Formula 1: wherein R is independently hydrogen, or C1 to C4 alkyl group, and n is independently 3 to 14.Type: GrantFiled: August 27, 2010Date of Patent: August 20, 2013Assignee: LG Chem, Ltd.Inventors: Yoon Ho Kim, Geon Soo Kim, Yeon Hwa Wi, Ki Hyun Yoo, Chan Hong Lee
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Patent number: 8492483Abstract: To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.Type: GrantFiled: June 19, 2008Date of Patent: July 23, 2013Assignee: Maruzen Petrochemical Co., Ltd.Inventors: Norihiro Yoshida, Hijiri Aoki, Takahito Mita, Ami Yamaguchi, Kazuhiko Haba, Goro Sawada
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Patent number: 8470510Abstract: A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.Type: GrantFiled: June 1, 2009Date of Patent: June 25, 2013Assignee: Daicel Chemical Industries, Ltd.Inventors: Arimichi Okumura, Keizo Inoue, Kazuki Okamoto
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Patent number: 8436103Abstract: The present invention provides a novel narrow distribution dendrimer-like star polymer having a controlled molecular structure, and a method capable of easily producing the star polymer. Disclosed is a polymer comprising a core portion and an arm portion, wherein the arm portion includes a first generation composed of a polymer chain and a second generation composed of a polymer chain formed at the outer shell of the first generation, the number of arms of the second generation is larger than the number of arms of the first generation, the first generation composed of the polymer chain is a polymer chain derived from a monomer having a polymerizable double bond, and the ratio of the weight average molecular weight (Mw) to the number average molecular weight (Mn), (Mw/Mn), of the star polymer is within a range from 1.001 to 2.50.Type: GrantFiled: September 7, 2006Date of Patent: May 7, 2013Assignee: Nippon Soda Co., Ltd.Inventor: Takeshi Niitani
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Patent number: 8344042Abstract: The invention provides for a biodegradable synthetic bone composition comprising a biodegradable hydrogel polymer scaffold comprising a plurality of hydrolytically unstable linkages, and an inorganic component; such as a biodegradable poly(hydroxyethylmethacrylate)/hydroxyapatite (pHEMA/HA) hydrogel composite possessing mineral content approximately that of human bone.Type: GrantFiled: December 8, 2009Date of Patent: January 1, 2013Assignee: The Regents of the University of CaliforniaInventors: Gao Liu, Dacheng Zhao, Eduardo Saiz, Antoni P. Tomsia
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Patent number: 8338550Abstract: A ring-opening metathesis polymerization (ROMP) reaction is disclosed in which a cyclic alkene compound is subjected to ROMP using a ruthenium ROMP catalyst having heterocyclic ligands in the presence of a compound from which such ligands may be derived. The process includes the step of adding sufficient of an acyclic alkene having a carbon-carbon double bond capable of reacting with the catalytic metal moieties attached to the living end of each of the polymer chains generated in the ROMP reaction to end cap the polymer chains and to generate a olefin metathesis catalyst. The process includes reiterating the polymerization steps by adding further amounts of a cyclic alkene compound. The catalyst may be generated in situ from a precursor compound by the addition of a compound from which heterocyclic ligands may be derived by interaction with the precursor compound.Type: GrantFiled: July 20, 2011Date of Patent: December 25, 2012Assignee: Henkel AG & Co. KGaAInventors: Ezat Khosravi, Alan M. Kenwright, Zhanru Yu, David M. Haigh, Lois Hobson
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Patent number: 8318832Abstract: The present invention provides optic portions, intraocular lenses, and polymers for use in manufacturing optic portions and intraocular lenses. The optic portions include a polymer that comprises (a) one or more alkoxyalkyl methacrylate monomers and/or one or more alkoxyalkyl acrylate monomers that are incorporated in the polymer; (b) one or more hydroxyalkyl methacrylate monomers and/or one or more hydroxyalkyl acrylate monomers that are incorporated in the polymer; and (c) optionally, one or more crosslinking agents that are incorporated in the polymer.Type: GrantFiled: May 23, 2008Date of Patent: November 27, 2012Assignee: Benz Research and Development CorporationInventors: Patrick H. Benz, Jose A. Ors
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Patent number: 8241829Abstract: To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.Type: GrantFiled: March 8, 2005Date of Patent: August 14, 2012Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Hikaru Momose, Atsushi Ootake, Tadashi Nakamura, Akifumi Ueda
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Publication number: 20120077934Abstract: A method of synthesizing a functionalized polymer represented by the structural formula (I) comprising a step of reacting a polymer represented by structural formula (II) with a compound Nu1-M to nucleophilically substitute moiety X1 with moiety Nu1. Values and preferred values of the variables in formulas (I) and (II) are defined herein.Type: ApplicationFiled: March 23, 2010Publication date: March 29, 2012Inventors: Rudolf Faust, Ranjan Tripathy, Umaprasana Ojha
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Publication number: 20120022219Abstract: Provided is a vinyl ether-based star polymer which has an arm including a vinyl ether polymer and an arm including an oxystyrene polymer. Also provided is a process for producing the star polymer, which can be continuously carried out in a series of steps. Said vinyl ether-based star polymer and process for producing the same are such that the polymer includes a core and polymer-chain arm portions extending from the core, in which an arm portion including vinyl ether repeating units and an arm portion including oxystyrene repeating units are provided.Type: ApplicationFiled: January 8, 2010Publication date: January 26, 2012Applicant: MARUZEN PETROCHEMICAL CO., LTDInventor: Norihiro Yoshida
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Publication number: 20110311784Abstract: An adhesive composition comprising an amount of an adhesive, and an amount of an additive which is selected from the group of homopolymers of acrylic acid, copolymers of acrylic acid, and polyacrylates, polyurethanes, cellulose thickening agent, natural or synthetic gum, natural or synthetic resin, silica or an inorganic minerals having a layered structure.Type: ApplicationFiled: August 5, 2011Publication date: December 22, 2011Applicant: CORRUTECHInventors: Philippe CEULEMANS, Olivier Ceulemans
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Publication number: 20110301256Abstract: A polyol composition comprising a polyol (a) and resin fine particles (b) dispersed in the polyol (a), and a method for producing the polyol composition are provided, wherein the resin fine particles (b) are particles such that an arithmetic standard deviation by volume of a particle size distribution of the particles, derived from respective values in 85 divisions of a range of 0.020 to 2000 ?m determined by a laser diffraction/scattering particle size distribution analyzer, is not more than 0.6. A resin fine particle-dispersed polyol composition that, even if the resin particles dispersed in the polyol have a small particle diameter, allows the production of a polyurethane resin having an excellent mechanical strength such as elongation at break, and a method for producing the same, are provided.Type: ApplicationFiled: August 16, 2011Publication date: December 8, 2011Applicant: SANYO CHEMICAL INDUSTRIES, LTD.Inventors: Shigekuni NAKADA, Hiroyuki WATANABE, Takayuki TSUJI, Hiroki MORI
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Patent number: 8048967Abstract: A method for preparing nylon microspheres is provided, said method comprising steps (1), (2) and (3) or steps (1?), (2) and (3) as follows: (1) a radically polymerizable monomer is dispersed in a molten lactam monomer, and a free radical initiator is added, so that radical polymerization of the radically polymerizable monomer is carried out, to give a mixture of a free radical polymer and the lactam monomer; or (1?) a mixture of a free radical polymer and a molten lactam monomer is provided; and (2) an initiator and an activator, used for anionic ring-opening polymerization of the lactam monomer, are added to the mixture obtained in step (1) wherein the remaining radically polymerizable monomer and water are removed, or to the mixture obtained in step (1?), so that the anionic ring-opening polymerization of the lactam is carried out to give a polymer alloy of the free radical polymer/polyamide; and (3) the free radical polymer in the polymer alloy obtained in step (2) is removed by dissolution, giving nylon mType: GrantFiled: November 12, 2008Date of Patent: November 1, 2011Assignee: Shanghai Genius Advanced Material (Group) Company, Ltd.Inventors: Aihua Pei, Tingxiu Xie, Guisheng Yang
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Patent number: 7825188Abstract: The present invention provides curatives for thermosetting adhesive compositions, methods of preparation and uses thereof. In particular, the present invention relates to elastomeric epoxy curative compounds that can be used in thermosetting compounds, methods for preparing the curative compounds and epoxy compositions containing the curative compounds.Type: GrantFiled: December 19, 2007Date of Patent: November 2, 2010Assignee: Designer Molecules, Inc.Inventor: Stephen M Dershem
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Publication number: 20100108357Abstract: The present invention relates to a crosslinkable polymer composition comprising an unsaturated polyolefin having a total amount of carbon-carbon double bonds/1000 carbon atoms of at least 0.38, and at least one crosslinking agent being a carbon-carbon initiator that is free of peroxide groups and capable of thermally decomposing into carbon-based free radicals by breaking at least one carbon-carbon single bond, such as 3,4-dimethyl-3,4-diphenylhexane.Type: ApplicationFiled: December 19, 2007Publication date: May 6, 2010Applicant: BOREALIS TECHNOLOGY OYInventors: Annika Smedberg, Bill Gustafsson
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Publication number: 20090306302Abstract: Process of free-radical polymerization in aqueous dispersion for the preparation of polymers, employing (A) at least one ethylenically unsaturated monomer, one of which is employed as the principal monomer and is selected from styrene and its derivatives, acrylic acid and its derivatives, methacrylic acid and its derivatives, dienes, vinyl esters, vinyl ethers, vinylic pyridine derivatives, vinylsulphonic acid and its derivatives, vinylphosphonic acid and its derivatives, and N-vinyl monomers, (B) at least one free-radical initiator selected from diazo compounds, peroxides and dialkyldiphenylalkanes, (C) molecular iodine, and (D) at least one oxidizing agent whose solubility in water is at least 10 g/l, of which at least one may be the one (B); said process comprising the steps whereby (1) at least one fraction of each of compounds (A), (B), (C) and (D) is introduced into a reactor, and (2) the contents of the reactor are reacted while introducing into the reactor the remainder, where appropriate, of each ofType: ApplicationFiled: July 4, 2007Publication date: December 10, 2009Inventors: Patrick Lacroix-Desmazes, Jeff Tonnar
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Publication number: 20090281232Abstract: To provide (i) a water-absorbing agent, having a water-absorbent resin as a main component, whose absorbency is high and liquid permeability is enhanced and (ii) a production method thereof. The water-absorbing agent of the present invention includes a water-absorbent resin obtained by polymerizing an unsaturated monomer having a carboxyl group and included in an aqueous monomer solution in the presence of at least a non high molecular compound having four or more functional groups each capable of forming a covalent bond with a carboxyl group.Type: ApplicationFiled: September 25, 2006Publication date: November 12, 2009Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Hiroyuki Ikeuchi, Shigeru Sakamoto, Sayaka Machida
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Patent number: 7439302Abstract: A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubstituted naphthalene or naphthol moiety, including mixtures thereof. Examples of the polymer of this invention include: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. The organic moiety mentioned above may be a substituted or unsubstituted hydrocarbon selected from the group consisting of a linear or branched alkyl, halogenated linear or branched alkyl, aryl, halogenated aryl, cyclic alkyl, and halogenated cyclic alkyl, and any combination thereof.Type: GrantFiled: August 2, 2005Date of Patent: October 21, 2008Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Sean D. Burns, Mahmoud Khojasteh
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Patent number: 7435782Abstract: An ABA tri-block copolymer represented by the following formula (1) [in the formula (1), n and m are each independently an integer of 30 to 1,000]. The copolymer is a so-called ABA tri-block copolymer between 8-vinyloxytricyclo [5.2.1.02.6] decane and n-butyl vinyl ether, has rubber elasticity at normal temperature, and has a property of thermoplastic elastomer which has not been possessed by conventional vinyl ether copolymers.Type: GrantFiled: May 2, 2007Date of Patent: October 14, 2008Assignee: Maruzen Petrochemical Co., Ltd.Inventors: Tamotsu Hashimoto, Takeshi Namikoshi, Michio Urushisaki
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Patent number: 7423092Abstract: The present invention relates to radiation-curable compositions useful as ink vehicles or inks, in particular UV-curable inks, such as UV-litho inks, comprising a (meth)acrylated styrene allyl alcohol copolymer obtained from the (meth)acrylation of a styrene allyl alcohol (SAA) copolymer with (meth)acrylic acid and/or one or more alkyl(meth)acrylates, and at least one alkoxylated acrylated monomer.Type: GrantFiled: August 26, 2004Date of Patent: September 9, 2008Assignee: Cytec Surface Specialties, SAInventors: Isabelle Fallais, Luc Lindekens, Paul Gevaert
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Patent number: 7396882Abstract: Styrene-free unsaturated polyester resin compositions are provided which have low volatile organic compounds and hazardous air pollutants emissions when these resin compositions are used in open molding applications. A process for the manufacture of these resin compositions is provided.Type: GrantFiled: May 19, 2003Date of Patent: July 8, 2008Assignee: AOC, LLCInventors: John C. Hewitt, John E. McAlvin, Paul Taylor Hutson, Amber E. Craig, Marjorie Krantz, Derek K. Rivers
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Patent number: 7300977Abstract: This method for preparing an acrylic-modified chlorinated polyolefin resin comprises graft-copolymerizing an acid-modified chlorinated polyolefin resin with a monomer mixture containing a (meth)acrylate ester monomer having one hydroxyl group and another vinyl monomer in the presence of a cyclic ether compound. Also, the cyclic ether compound may be added in an amount of 1 to 100 parts by weight based on 100 parts by weight of the acid-modified chlorinated ployolefin resin, and the cyclic ether compound may be dioxane and/or 1,3-dioxolane.Type: GrantFiled: February 17, 2004Date of Patent: November 27, 2007Assignee: Fujikura Kasei Co., Ltd.Inventors: Mitsuo Najima, Takashi Isogai
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Patent number: 7226979Abstract: Novel copolymers, including block copolymers, which comprise: (a) a plurality of constitutional units that correspond to one or more olefin monomer species and (b) a plurality of constitutional units that correspond to one or more protected or unprotected hydroxystyrene monomer species.Type: GrantFiled: February 11, 2004Date of Patent: June 5, 2007Assignee: University of Massachusetts LowellInventors: Rudolf Faust, Laszlo Sipos
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Patent number: 7205361Abstract: A particulate hydrophobic polymer produced by reacting (A) a particulate crosslinked polymer having a hydroxyl group with (B) a crosslinkable epoxy compound, hydrolyzing the epoxy bonds, and then reacting the obtained compound having a hydroxyl group with (C) an epoxy compound having from 6 to 40 carbon atoms in total, a production process therefor, a column for reversed-phase liquid chromatography, and an analysis method using the column. By using the particulate hydrophobic polymer of the present invention having a remarkably high acid/alkali resistance, a sharp chromatogram for polycyclic aromatic compounds is obtainable with the swelling and shrinkage of the particulate polymer itself reduced and without reducing the column efficiency among various solvents even when the eluent in the column is variously exchanged.Type: GrantFiled: September 27, 2002Date of Patent: April 17, 2007Assignee: Showa Denko K.K.Inventors: Keisuke Mano, Kuniaki Shimbo
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Patent number: 7160951Abstract: The invention relates to peroxide compositions comprising a reactive diluent for the peroxide, wherein the diluent is either a component containing one or more vinyl ether group(s) and having a monomeric structure according to formula 1, (A—CH?CH—O)n—R, or is a suitable resinous compound comprising, in a covalently built-in manner, a component containing one or more vinyl ether group(s). In the formula A represents hydrogen or an alkyl group with 1–3 C atoms, and individual A groups may be different R either represents an aliphatic group, optionally branched, with 1–20 C atoms, etc. ?or represents a polyethylene or polypropylene glycol with 2 to 120 glycol units, etc. and n is 1, 2, 3 or 4.Type: GrantFiled: December 19, 2001Date of Patent: January 9, 2007Assignees: DSM IP Assets B.V., Hilti AktiengesellschaftInventors: Jan H Udding, Agnes E Wolters, Heinz Wilhelm, Armin Pfeil, Thomas Bürgel, Lutz Sager
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Patent number: 7067590Abstract: The present invention relates to a stimuli-responsive composition that comprises a polymer, a solvent and a substance having a predetermined function. One embodiment of the present invention is a composition comprising a block polymer, a solvent and a substance having a predetermined function. The present invention also relates to an ink composition containing the composition, an image-forming method and an image-forming apparatus using the composition, and a recording medium applying the composition. Further, the present invention relates to an ABC type block polymer compound wherein the polymer is an ABC type triblock polymer, and wherein at least one of the blocks in the triblock polymer changes in nature from solvophilic to solvophobic or from solvophobic to solvophilic in response to stimuli, and more preferably, the A component, then the B component, and finally the C component respond to the stimuli.Type: GrantFiled: August 6, 2002Date of Patent: June 27, 2006Assignee: Canon Kabushiki KaishaInventors: Koichi Sato, Ikuo Nakazawa, Sakae Suda, Masayuki Ikegami, Sadahito Aoshima, Shinji Sugihara
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Patent number: 6992140Abstract: The present invention provides a curable unsaturated resin composition, which has less odor characteristics and high safety and is also superior in thin film coating characteristics in a coating film. The curable unsaturated resin composition contains a polymerizable unsaturated resin (A) having two or more polymerizable unsaturated double bonds in a molecule, a hydroxyalkyl (meth)acrylate (B), and an unsaturated compound (C) having one or more cyclohexene rings and two or more allyl ether groups in a molecule, which is liquid at normal temperature.Type: GrantFiled: May 17, 2002Date of Patent: January 31, 2006Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Makoto Kosono, Katsuhiro Doi, Koji Kirisawa, Youko Kawasaki
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Patent number: 6984701Abstract: This invention relates to polymeric dispersants useful in ink jet ink compositions. The graft polymers comprise monomers having electron rich functional groups, which exhibit favorable interactions with the surface of pigment particles thereby better stabilizing the pigment dispersion within the aqueous ink composition. The graft polymers also comprise hydrophobic monomers having the ability to form hydrogen bonding. The polymers of the present invention provide a dispersant that increases the smear resistance of pigmented inks, especially when used on photo or gelatin paper. The graft polymers also provide excellent chroma for printing. The present invention also relates to aqueous ink compositions which include those polymeric dispersants.Type: GrantFiled: November 26, 2002Date of Patent: January 10, 2006Assignee: Lexmark International, Inc.Inventors: Paul Sacoto, Jing X. Sun, Naiyu Sun
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Patent number: 6861484Abstract: The invention is directed to amphipathic polymeric particles that serve as both the dispersant and the binder in water based inks, ink compositions containing these particles, and methods for making the particles. The polymeric particles contain both hydrophilic and hydrophobic moieties with a pre-determined structure, and have an average diameter of 50 to 500 nm. The amphipathic polymeric particles may be prepared by a side-chain conversion method or a polymerization process involving an ATRP step, with or without a cross-linking agent. This invention improves the stability of polymer and inks by both ionic and steric stabilization of the suspended polymer particles.Type: GrantFiled: October 30, 2003Date of Patent: March 1, 2005Assignee: Hewlett-Packard Development Company, L.P.Inventor: Sivapackia Ganapathiappan
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Patent number: 6855780Abstract: This invention provides a production method of a vinyl polymer having a functional group at a molecular chain terminus which comprises adding a compound (I) having a functional group and an internal alkenyl group or conjugated polyene compound (II) in the living radical polymerization of a radical-polymerizable vinyl monomer. The present invention relates to a vinyl polymer having a functional group at a molecular terminus, a production method of the same and a curable composition containing said polymer.Type: GrantFiled: January 28, 2000Date of Patent: February 15, 2005Assignee: Kaneka CorporationInventors: Yoshiki Nakagawa, Kenichi Kitano, Nao Fujita
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Patent number: 6855775Abstract: A composition comprises an oxetane oligomer or polymer or copolymer block wherein each repeat group has at least one ether side chain which is terminated by a fluorinated aliphatic group and optionally with the proviso that at least two different repeat units of the oligomer or polymer or copolymer have different Rf groups. The oxetane block is connected to a hydrocarbon polymer block derived from a mono or polyhydroxyl initiator. The terminal fluorinated alkyl groups impart good stain resistance to the oligomer or polymer or copolymer. In another embodiment, a fluorinated aliphatic or alkyl alcohol is reacted with an amino dicarboxylic acid with the reaction product thereof being subsequently grafted to a maleated polyolefin or a maleated polymer derived from a vinyl substituted aromatic monomer. The fluorinated alcohol also imparts good stain resistance to the grafted copolymer. Both compounds can be utilized as an additive in polymers as for example various polyolefins.Type: GrantFiled: December 13, 2001Date of Patent: February 15, 2005Assignee: OMNOVA Solutions Inc.Inventors: Robert E. Medsker, Richard R. Thomas, Charles M. Kausch, Raymond J. Weinert
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Patent number: 6828379Abstract: The invention relates to curable resin compositions based on an unsaturated prepolymer, a vinyl ether monomer that can be cross-linked with it and one or more other monomers for use as structural resins. The resin composition is cured with the aid of a radical-forming system that is unstable in the temperature range of −20° C. to +110° C., and contains an unsaturated prepolymer having an acid number of less than 10 mg of KOH per g and a vinyl ether monomer according to formula (I) or (II): A—CH═CH—O—R (I) or (A—CH═CH—O)n—R′ (II) with A, R, R′ and n having the described meanings. The invention also relates to a process for the preparation of such resin compositions and uses thereof.Type: GrantFiled: December 19, 2001Date of Patent: December 7, 2004Assignee: DSM IP Assets B.V.Inventors: Jan H. Udding, Agnes E. Wolters
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Patent number: 6765065Abstract: There is provided a process for producing a modified polymer rubber having modified both ends, which comprises the steps of: (1) reacting a compound represented by the following formula (1) with an organic alkali metal compound to produce a chemical species, (2) polymerizing a conjugated diene monomer or a combination of a conjugated diene monomer with an aromatic vinyl monomer in the presence of the chemical species to produce an active polymer having an alkali metal at an end thereof, and (3) reacting the active polymer with a functional group-carrying modifying agent in a hydrocarbon solvent to produce the modified polymer rubber having modified both ends.Type: GrantFiled: October 10, 2002Date of Patent: July 20, 2004Assignee: Sumitomo Chemical Company, LimitedInventors: Mayumi Oshima, Seiichi Mabe, Katsunari Inagaki
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Patent number: 6706391Abstract: An anisotropically electroconductive film, which has a high reliability in its capacity for conducting electricity and also a good adhesion under such an adhesive condition that the film is heated at a temperature of 130° C. or less for a short period of time, has a layer of an adhesive within which electroconductive particles are distributed. The adhesive is composed of a thermosetting resin composition including a base resin, a reactive compound, an organic peroxide and a reaction accelerating compound, and also the electroconductive particles incorporated into the thermosetting resin composition. The base resin is a polyacetalized resin which is obtained by acetalizing a polyvinyl alcohol. The reactive compound is at least one selected from a group consisting of acryloxy group-bearing compounds, methacryloxy group-bearing compounds and epoxy group-bearing compounds. The reaction accelerating compound is a compound which has a radically reactive group and alkali-reactive group as its end groups.Type: GrantFiled: July 26, 2001Date of Patent: March 16, 2004Assignee: Bridgestone CorporationInventors: Ryo Sakurai, Hidetoshi Hiraoka, Tokuo Okada, Teruo Miura, Yasuhiro Morimura
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Patent number: 6657007Abstract: Clearcoat coating composition for automotive exterior coatings with improved intercoat adhesion to a subsequently applied coating layer and improved flexibility contains (a) a first vinyl copolymer prepared from a monomer mixture including no more than about 35% by weight of nonfunctional monomers that has carbamate functionality and hydroxyl functionality, at least part of the hydroxyl functionality being on monomer units including an optionally branched alkyl group having at least about six carbon atoms; (b) a second vinyl copolymer having hydroxyl functionality, preferably primary hydroxyl functionality; and (c) a curing agent component that includes at least an aminoplast curing agent and optionally a polyisocyanate curing agent. The polyisocyanate curing agent is preferably blocked with a blocking agent that volatilizes during the cure reaction, regenerating a reactive isocyanate group.Type: GrantFiled: December 14, 2001Date of Patent: December 2, 2003Assignee: BASF CorporationInventors: John A. Gilbert, Donald H. Campbell, Vincent Cook
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Patent number: 6576722Abstract: The present invention is directed to a method for producing a copolymer and a copolymer product of the method. The copolymer is prepared by a controlled radical polymerization process, typically an atom transfer radical polymerization process, in which polymerizable alkene monomers are polymerized in the presence of a halogenated polyolefin macroinitiator. The copolymer product of this process is useful in a film-forming composition that adheres strongly to polyolefinic substrates and to which non-polyolefinic film-forming compositions strongly adhere. The copolymer can be applied to a substrate in an adhesion-promoting layer or can be incorporated into a film-forming composition, such as a primer, that contains additional resinous compounds.Type: GrantFiled: December 13, 2000Date of Patent: June 10, 2003Assignee: PPG Industries Ohio, Inc.Inventors: Simion Coca, Brian K. Rearick, James B. O'Dwyer
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Patent number: 6559233Abstract: A subject of the present invention is an aqueous composition combining at least one block copolymer (A) comprising, in the pH and temperature conditions of the composition, at least two polyionic blocks of the same charge and at least one non-charged block, with at least one ionic or polyionic (B) type with an opposite charge to that of the said polyionic blocks, in the pH conditions of the composition; type (B) being chosen from among ions carrying at least two charges, surfactants carrying at least one charge, oligomers and/or polymers carrying at least two charges and/or mineral particles carrying at least two charges; the block copolymer (A) content being such that the viscosity of the composition is at least greater than three times that of an aqueous solution of block copolymer (A) and to that of an aqueous solution of type (B), in the same temperature, pH and concentration conditions. The present composition, before its use or during its use, is in the form of a gel.Type: GrantFiled: July 13, 2001Date of Patent: May 6, 2003Assignee: Rhodia ChimieInventors: Bruno Bavouzet, Mathias Destarac, Pascal Herve, Daniel Taton
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Publication number: 20030023000Abstract: A subject of the present invention is an aqueous composition combining at least one block copolymer (A) comprising, in the pH and temperature conditions of the composition, at least two polyionic blocks of the same charge and at least one non-charged block, with at least one ionic or polyionic (B) type with an opposite charge to that of the said polyionic blocks, in the pH conditions of the composition; type (B) being chosen from among ions carrying at least two charges, surfactants carrying at least one charge, oligomers and/or polymers carrying at least two charges and/or mineral particles carrying at least two charges; the block copolymer (A) content being such that the viscosity of the composition is at least greater than three times that of an aqueous solution of block copolymer (A) and to that of an aqueous solution of type (B), in the same temperature, pH and concentration conditions.Type: ApplicationFiled: July 13, 2001Publication date: January 30, 2003Inventors: Bruno Bavouzet, Mathias Destarac, Pascal Herve, Daniel Taton
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Publication number: 20020173593Abstract: The invention relates to curable resin compositions based on an unsaturated prepolymer, a vinyl ether monomer that can be cross-linked with it and one or more other monomers for use as structural resins. The resin composition is cured with the aid of a radical-forming system that is unstable in the temperature range of −20° C. to +110° C.Type: ApplicationFiled: December 19, 2001Publication date: November 21, 2002Inventors: Jan H. Udding, Agnes E. Wolters
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Patent number: 6482900Abstract: A vinyl polymer having, at a molecular chain terminus, a structure represented by the general formula 1: (wherein R3 is a hydroxy, amino, epoxy, carboxylic acid, ester, ether, amide or silyl group, an alkenyl group having low polymerizability, an organic compound having 1 to 20 carbon atoms, X is a halogen atom, a nitroxide or sulfide group or a cobalt porphyrin complex).Type: GrantFiled: June 5, 2000Date of Patent: November 19, 2002Assignee: Kaneka CorporationInventors: Yoshiki Nakagawa, Kenichi Kitano, Masayuki Fujita, Nao Fujita
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Patent number: 6413306Abstract: A pigment dispersion useful for forming coating compositions containing dispersed pigment, a non-aqueous carrier liquid and an ABC-block polymer dispersant (binder); wherein the ABC block polymer has a number average molecular weight of about 5,000-20,000 and contains a polymeric A segment, a polymeric B segment and a polymeric C segment; wherein the polymeric A segment of the block polymer is of polymerized monomers selected from the following group: alkyl (meth)acrylate monomers having 1-12 carbon atoms in the alkyl group, aryl (meth)acrylate monomers, cyclo alkyl (meth)acrylate monomers or mixtures of any of the above; the polymeric B segment of the block polymer is of polymerized alkyl amino alkyl (meth)acrylate monomers having 1-4 carbon atoms in the alkyl group quaternized with an alkylating agent; and the polymeric C segment of the block polymer is of polymerized monomers of hydroxy alkyl (meth)acrylate having 1-4 carbon atoms in the alkyl group and monomers selected from the following group: alkylType: GrantFiled: October 7, 1999Date of Patent: July 2, 2002Assignee: E. I. du Pont de Nemours and CompanyInventors: Daniel C. Kraiter, Beatriz E. Rodriguez-Douglas
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Patent number: 6414101Abstract: A dendritic or hyperbranched polymer having a weight average molecular weight of 500-10,000,000 is prepared by polymerizing a hydroxystyrene derivative, adding a branching monomer midway in the polymerization step to introduce branch chains, and repeating the polymerizing and branching steps. The polymer is advantageously used as the base resin of resist material because the size of the polymer can be reduced while maintaining strength.Type: GrantFiled: March 24, 2000Date of Patent: July 2, 2002Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Osamu Watanabe, Takanobu Takeda, Jun Hatakeyama, Tomohiro Kobayashi, Toshinobu Ishihara, Jun Watanabe
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Publication number: 20020055060Abstract: The present invention includes new polymers and use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting photoresist compositions. Polymers and resists of the invention are particularly useful for imaging with short wavelength radiation, such as sub-200 nm and preferably about 157 nm. Polymers of the invention contain one or more groups alpha to an acidic site that are substituted by one or more electron-withdrawing groups.Type: ApplicationFiled: September 8, 2001Publication date: May 9, 2002Applicant: Shipley Company, L.L.C.Inventors: Gary N. Taylor, Charles R. Szmanda
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Patent number: 6380317Abstract: The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.Type: GrantFiled: October 26, 1999Date of Patent: April 30, 2002Assignee: Arch Specialty Chemicals, Inc.Inventors: Sanjay Malik, Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian E. Maxwell
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Patent number: 6372852Abstract: The present invention has an object to provide a process for producing a water-absorbing agent which is excellent in the absorption capacities under no load and under a load with good balance and can display excellent absorption properties even if the weight percentage of a water-absorbent resin (resin concentration) is high when the water-absorbent resin is used for materials such as sanitary materials. The above object can be achieved by adding a vinyl compound or both the vinyl compound and a polyhydric alcohol to a water-absorbent resin and heating the resultant mixture.Type: GrantFiled: March 23, 1999Date of Patent: April 16, 2002Assignee: Nippon Shokubai Co., LtdInventors: Kazuhisa Hitomi, Yuji Yamamoto, Shigenori Kirimura, Nobuyuki Harada
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Publication number: 20010047059Abstract: The present invention has an object to provide a process for producing a water-absorbing agent which is excellent in the absorption capacities under no load and under a load with good balance and can display excellent absorption properties even if the weight percentage of a water-absorbent resin (resin concentration) is high when the water-absorbent resin is used for materials such as sanitary materials. The above object can be achieved by adding a vinyl compound or both the vinyl compound and a polyhydric alcohol to a water-absorbent resin and heating the resultant mixture.Type: ApplicationFiled: March 23, 1999Publication date: November 29, 2001Inventors: KAZUHISA HITOMI, YUJI YAMAMOTO, SHIGENORI KIRIMURA, NOBUYUKI HARADA