Polymer Derived From Alcohol Monomer Patents (Class 525/328.8)
  • Patent number: 10550072
    Abstract: The present invention relates to the discovery of new class of hydrolysable amino acid derivatives and absorbable polyester amides, polyamides, polyepoxides, polyureas and polyurethanes prepared therefrom. The resultant absorbable polymers are useful for drug delivery, tissue engineering, tissue adhesives, adhesion prevention, bone wax formulations, medical device coatings, stents, stent coatings, highly porous foams, reticulated foams, wound care, cardiovascular applications, orthopedic devices, surface modifying agents and other implantable medical devices. In addition, these absorbable polymers should have a controlled degradation profile.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: February 4, 2020
    Assignee: Bezwada Biomedical, LLC
    Inventor: Rao S Bezwada
  • Patent number: 10281819
    Abstract: A photoresist includes a polymer backbone, an acid labile group (ALG) chemically bonded to the polymer backbone, a photo-acid generator (PAG), a solvent, and a silicon-containing unit that is chemically bonded to the ALG. A method of using the photoresist composition includes forming a layer of the photoresist over a substrate, performing an exposing process to the photoresist layer; and developing the photoresist layer, thereby forming a patterned photoresist layer. The patterned photoresist layer includes the silicon-containing unit.
    Type: Grant
    Filed: December 11, 2017
    Date of Patent: May 7, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Li-Yen Lin, Ching-Yu Chang
  • Patent number: 9481751
    Abstract: A curable resin including a repeating unit of hydroxystyrene substituted with an alkoxymethyl group, the repeating unit represented by the following general formula (1): where Ra represents a hydrogen atom or a methyl group; Rb represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; m is 1 to 3; and n is 1 to 3.
    Type: Grant
    Filed: June 19, 2015
    Date of Patent: November 1, 2016
    Assignee: GUNEI CHEMICAL INDUSTRY CO., LTD.
    Inventors: Youhei Umino, Satoru Kitano, Yukio Abe
  • Patent number: 9434609
    Abstract: A pattern-forming method in which processibility of a silicon-containing film in etching with a fluorine gas and resistance against etching with an oxygen gas can be together improved in a multilayer resist process to form a finer pattern. Provided is a pattern-forming method that includes the steps of (1) providing a silicon-containing film on the upper face side of a substrate to be processed using a polysiloxane composition; (2) forming a resist pattern on the silicon-containing film; (3) dry-etching the silicon-containing film using the resist pattern as a mask to form a silicon-containing pattern; and (4) dry-etching the substrate to be processed using the silicon-containing pattern as a mask to form a pattern, in which the polysiloxane composition includes (A) a polysiloxane containing a fluorine atom, and (B) a crosslinking accelerator.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: September 6, 2016
    Assignee: JSR Corporation
    Inventors: Satoshi Dei, Takashi Mori, Kazunori Takanashi
  • Patent number: 9400430
    Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.
    Type: Grant
    Filed: May 9, 2014
    Date of Patent: July 26, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Tomotaka Tsuchimura, Hiroo Takizawa
  • Publication number: 20150134048
    Abstract: The present invention is directed to polymeric materials comprising biodegradable, dioxanone-based copolymers and implantable devices (e.g., drug-delivery stents) formed of such materials. The polymeric materials can also contain at least one additional biocompatible moiety, at least one non-fouling moiety, at least one biobeneficial material, at least one bioactive agent, or a combination thereof. The polymeric materials are designed to improve the mechanical, physical and biological properties of implantable devices formed thereof.
    Type: Application
    Filed: January 22, 2015
    Publication date: May 14, 2015
    Inventor: Ni Ding
  • Patent number: 9023950
    Abstract: The present invention provides a styrene-based star polymer with narrow dispersion and suitable as a resist material, etc. A star polymer of the present invention is represented by the formula A[C(Y)Xm]n (wherein A represents a polyvalent aliphatic hydrocarbon group with 4-15 carbons, C represents a carbon atom, X represents a styrene-based polymer chain, Y represents a hydroxy group or an oxo group, m represents an integer of 1 or 2, and n represents any integer from 2 to 5, with the proviso that if Y is a hydroxy group, m is 2, and if Y is an oxo group, m is 1). The star polymer can be produced by reacting a styrene-based polymer having an anionic end, and an aliphatic carboxylic acid ester represented by A(COOR)n (wherein R represents an alkyl group having 1-8 carbons, and A and n are as defined for the above formula).
    Type: Grant
    Filed: April 18, 2011
    Date of Patent: May 5, 2015
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Akihiro Shirai, Takeshi Niitani
  • Publication number: 20150118623
    Abstract: A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a halogen atom; R2 and R3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.
    Type: Application
    Filed: December 30, 2014
    Publication date: April 30, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Takuya TSURUTA, Tomotaka TSUCHIMURA, Kaoru IWATO
  • Patent number: 9018312
    Abstract: A thermoplastic resin composition with improved impact resistance can include (A) about 30 to about 99 parts by weight of an epoxy group-containing styrenic polymer comprising (A1) about 5 to about 100% by weight of an epoxy group-containing vinyl copolymer containing about 0.001 to about 5.0 mol % of an epoxy compound; and (A2) about 0 to about 95% by weight of a rubber modified styrenic copolymer resin; (B) about 1 to about 70 parts by weight of a polyester resin; (C) about 0.001 to about 10 parts by weight of a silicone oil, per 100 parts by weight of a base resin comprising (A) and (B); (D) about 3 to about 20 parts by weight of a bromine-containing flame retardant, per 100 parts by weight of a base resin comprising (A) and (B); and (E) about 0.1 to about 6 parts by weight of a flame retardant aid, per 100 parts by weight of a base resin comprising (A) and (B).
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: April 28, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Se Bum Son, Sung Hee Ahn, In Hwan Oh, Sung Duk Hwang
  • Publication number: 20150099851
    Abstract: The present invention is directed to resins made from cashew nutshell liquid and vinyl hydrocarbons and processes for manufacturing the resins. These resins exhibit lower viscosity than the phenol-based homologs. They also exhibit good compatibility with a wide range of solvents, mineral and natural oils, epoxy curing agents, liquid epoxy resins, and polymers, which make them suitable additives as non-reactive diluents for solvent-free coating formulations; tackifiers for structural adhesive, pressure sensitive and hot-melt adhesives; stabilizers for lubricants, fuel and polymer formulations; plasticizers for thermoplastic polymers and processing aid for rubber compounding and stabilizers for respective rubber artifacts. These resins are also valuable precursors for the manufacture of epoxy resins and polyols for coating, adhesive and composite formulations exhibiting ameliorated performance in water repellency, anti-corrosion, and fast hardness development during cure.
    Type: Application
    Filed: October 8, 2014
    Publication date: April 9, 2015
    Inventors: Mauricio Pinto, Hong Xu, Anbazhagan Natesh, Junhong Wei
  • Publication number: 20150011699
    Abstract: Organic polymeric bi-metallic alkoxide or aryloxide composites are used as dielectric materials in various devices with improved properties such as improved mobility. These composites comprise a poly(meth)acrylate or polyester having metal coordination sites, and the same or different bi-metallic alkoxide or aryloxide molecules that are coordinated with the organic polymer. The bi-metallic alkoxide or aryloxide molecules can be represented by Structure (I) shown herein. Such composites are generally soluble at room temperature in various organic solvents and be provided in homogeneous organic solvent solutions that can be suitably applied to a substrate to form dielectric materials.
    Type: Application
    Filed: September 24, 2014
    Publication date: January 8, 2015
    Inventors: Deepak Shukla, Dianne Marie Meyer, Mark R. Mis, Matthew Dirmyer
  • Publication number: 20140378926
    Abstract: To provide an absorber that has a high absorption speed, is unlikely to cause a liquid to remain on a skin-contacting surface, has excellent dry feeling, and is unlikely to cause excreted body fluid to return, and a water-absorbent resin powder that can be suitably used in the absorber. A water-absorbent resin powder of the present invention is characterized by meeting the following requirements (a) to (d): (a) a bulk density: 0.45 g/ml to 0.62 g/ml; (b) an absorption speed by a vortex method: 20 seconds to 50 seconds; (c) a liquid-passing speed under load: 10 seconds or less; and (d) a moisture absorption blocking ratio: 5% or less. An absorber of the present invention uses the water-absorbent resin powder of the present invention. An absorbent article of the present invention includes the absorber of the present invention.
    Type: Application
    Filed: December 20, 2012
    Publication date: December 25, 2014
    Applicant: LIVEDO CORPORATION
    Inventors: Yoshihisa Ota, Motoko Nishida, Masatoshi Ikeuchi
  • Publication number: 20140363690
    Abstract: Disclosed are polymer-based dielectric compositions (e.g., formulations) and materials (e.g. films) and associated devices. The polymers generally include photocrosslinkable pendant groups; for example, the polymers can include one or more coumarin-containing pendant groups.
    Type: Application
    Filed: August 25, 2014
    Publication date: December 11, 2014
    Applicants: BASF SE, POLYERA CORPORATION
    Inventors: Jordan QUINN, He Yan, Yan Zheng, Christopher Newman, Silke Annika Koehler, Antonio Facchetti, Thomas Breiner
  • Patent number: 8889765
    Abstract: The invention relates to a process for producing a water-absorbing material by coating water-absorbing polymer particles with a film-forming polyurethane and silica, heat treating the coated particles and coating the heat-treated particles with pyrogenic hydrophilic silica. The invention further relates to the water-absorbing material obtainable according to the process of the invention. The water-absorbing material has improved wicking ability (FHA) and core shell saline flow conductivity (CS-SFC).
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: November 18, 2014
    Assignee: BASF SE
    Inventors: Yvonne Hagen, Klaus Dieter Hörner, Axel Meyer, Robin McKiernan, Carolyn A. Spitzmueller
  • Publication number: 20140272692
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive or radiation-sensitive composition, a pattern forming method containing steps of exposing and developing the resist film, a manufacturing method of an electronic device, containing the pattern forming method, and an electronic device manufactured by the specific manufacturing method of an electronic device.
    Type: Application
    Filed: May 29, 2014
    Publication date: September 18, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Natsumi YOKOKAWA, Takeshi KAWABATA, Hiroo TAKIZAWA, Hideaki TSUBAKI, Shuji HIRANO
  • Patent number: 8785553
    Abstract: An aspect of the description is directed to hydrolysable silane graft propylene-?-olefin copolymers useful for moisture curable sealants, the copolymers comprising a propylene-?-olefin copolymer component comprising propylene-derived units and from 5 to 35 wt %, by weight of the propylene-?-olefin copolymer, of ethylene-derived units or a C4 to C10 ?-olefin-derived unit, and having, in one embodiment, the following features: a density of from 0.850 to 0.920 g/cm3; a MWD of from 1.5 to 20; an Hf of less than or equal to 75 J/g; a Tm of from 25 to 105° C.; and a triad tacticity by 13C NMR of 75% or greater; and a hydrolysable silane component. The graft copolymer can be combined with oil and/or a thermoplastic to form a graft copolymer composition capable of being cross-linked by exposure to moisture.
    Type: Grant
    Filed: December 4, 2007
    Date of Patent: July 22, 2014
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Trazollah Ouhadi, Jean-Roch H. Schauder
  • Publication number: 20140186415
    Abstract: A polymer composition including a polymer having a hydroxyl group and a histidine or a histidine derivative grafted to the polymer having a hydroxyl group. A polymer material is also provided, including a polymer composition which includes a polymer having a hydroxyl group, and a histidine or a histidine derivative grafted to the polymer having a hydroxyl group.
    Type: Application
    Filed: December 18, 2013
    Publication date: July 3, 2014
    Applicant: Industrial Technology Research Institute
    Inventors: Ting-Yu SHIH, Tse-Min TENG, Chia-Chun WANG, Yu-Hua CHEN, Jui-Hsiang CHEN, Mei-Ju YANG, Shu-Fang CHIANG, Yen-Chun CHEN, Chia-Ni CHANG
  • Patent number: 8759465
    Abstract: A class of bioinspired, cross linking polymers, created by working catechol functionalities into the backbone of a bulk polymer, is disclosed. Varied cross linking groups may be incorporated into different polymer backbones, and subsequently reacted with an array of reagents. An adhesive composition comprising a copolymer, the copolymer comprising pendant dihydroxyphenyl groups; and a crosslinking agent selected from the group consisting of, for example, oxidants, enzymes, metals, and light. A method of preparing an adhesive composition comprising copolymerizing a first monomer comprising pendant dihydroxy-protected dihydroxyphenyl groups; deprotecting the dihydroxy-protected dihydroxyphenyl groups; crosslinking the dihydroxyphenyl groups with a crosslinking agent.
    Type: Grant
    Filed: April 21, 2008
    Date of Patent: June 24, 2014
    Assignee: Purdue Research Foundation
    Inventors: Jonathan James Wilker, Glenn Westwood, Trinity Noel Horton
  • Publication number: 20140155308
    Abstract: Provided herein are copolymers of a polyaminopolymer and polyanhydride, wherein the polyaminopolymer comprises a polyaminopolyolefin; and methods of their preparation.
    Type: Application
    Filed: November 30, 2012
    Publication date: June 5, 2014
    Applicant: CHEVRON ORONITE COMPANY LLC
    Inventors: Young Chang, Casey Stokes, David Morgan
  • Publication number: 20140099495
    Abstract: An adhesive film includes a cured product of a (meth)acrylic copolymer and has a refractive index from about 1.5 to about 1.6. An adhesive composition for preparing the adhesive film includes a (meth)acrylic copolymer of a monomer mixture. A display member includes the adhesive film coated on one or more surfaces of an optical film.
    Type: Application
    Filed: October 10, 2013
    Publication date: April 10, 2014
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ki Yong Kim, Ik Hwan Cho, Lee June Kim, Chan Woo Kim, In Cheon Han
  • Publication number: 20140099572
    Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below.
    Type: Application
    Filed: December 12, 2013
    Publication date: April 10, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Takeshi INASAKI, Takeshi KAWABATA, Tomotaka TSUCHIMURA
  • Patent number: 8609781
    Abstract: The present invention relates to a mixture including at least O,O-tert-butyl-O-(2-ethylhexyl) monoperoxycarbonate and at least O,O-tert-amyl-O-2-ethylhexyl monoperoxycarbonate, where the O,O-tert-amyl-O-2-ethylhexyl monoperoxycarbonate is present in the mixture in an amount of from 0.001% to 45% by weight relative to the total weight of the mixture. The invention also relates to a crosslinkable composition that includes such a peroxide mixture and an elastomer; and to uses of the crosslinkable composition and mixture.
    Type: Grant
    Filed: July 16, 2009
    Date of Patent: December 17, 2013
    Assignee: Arkema France
    Inventor: Laurent Keromnes
  • Patent number: 8604130
    Abstract: An adhesive composition includes a (meth)acrylic copolymer, the (meth)acrylic copolymer containing about 92 to about 99.7 parts by weight of a moiety derived from a (meth)acrylic acid ester monomer, and about 0.3 to about 8 parts by weight of at least one of a moiety derived from a carboxyl group-containing monomer and a moiety derived from a hydroxyl group-containing (meth)acrylic acid monomer, the (meth)acrylic copolymer having a weight average molecular weight of about 500,000 g/mol to about 2,000,000 g/mol, a carbodiimide curing agent, and an oligomeric silane coupling agent.
    Type: Grant
    Filed: July 5, 2011
    Date of Patent: December 10, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Hiroshi Ogawa, Tatsuhiro Suwa, Cheong Hun Song
  • Patent number: 8586681
    Abstract: The invention provides methods for making copolymers and multi-arm block copolymers useful as drug delivery vehicles. The multi-arm block copolymers comprise a central core molecule, such as a residue of a polyol, and at least three copolymer arms covalently attached to the central core molecule, each copolymer arm comprising an inner hydrophobic polymer segment covalently attached to the central core molecule and an outer hydrophilic polymer segment covalently attached to the hydrophobic polymer segment, wherein the central core molecule and the hydrophobic polymer segment define a hydrophobic core region. The solubility of hydrophobic biologically active agents can be improved by entrapment within the hydrophobic core region of the block copolymer. The invention further includes pharmaceutical compositions including such block copolymers, pharmaceutical compositions, and methods of using the block copolymers as drug delivery vehicles.
    Type: Grant
    Filed: November 19, 2012
    Date of Patent: November 19, 2013
    Assignee: Nektar Therapeutics
    Inventor: Xuan Zhao
  • Patent number: 8580898
    Abstract: The present invention relates to a copolymer polyester resin and a molded product using the same, and more specifically to a copolymer polyester resin that contains 10˜80 mol % of 1,4-cyclohexane dimethanol, 0.1˜50 mol % of a diol compound expressed as HO—(CH2)a—CO—(CH2)b—OH (where a and b are integers in the range 1˜5), and ethylene glycol or other diols so that the sum of its entire diol composition is 100 mol % based on dicarboxylic acid. The copolymer polyester resin of the present invention enables reduction of cycle time, improvement of product processability and prevention of PET bottle deformation during mold processing with a heat-shrinking label by complementing low temperature shrinkage, maintaining a high shrinkage rate, and reducing shrinkage stress.
    Type: Grant
    Filed: November 20, 2009
    Date of Patent: November 12, 2013
    Assignee: SK Chemicals Co., Ltd.
    Inventors: Myoung Ruoul Lee, Jong Ryang Kim
  • Publication number: 20130253136
    Abstract: Spherical biodegradable particles have improved flexibility, cause less aggregation among particles, and have improved particle shape-recovering ability after passing through a catheter or the like. The biodegradable particles include a synthetic polymer chemically cross-linked to a polyvalent carboxylic acid, the biodegradable particles having a water content of 20 to 90% in a water-saturated state.
    Type: Application
    Filed: December 9, 2011
    Publication date: September 26, 2013
    Applicant: TORAY Industries ,Inc.
    Inventors: Kazuhiro Tanahashi, Megumi Nakanishi, Yasufumi Yamamura, Masaki Fujita
  • Publication number: 20130251636
    Abstract: Intended is to provide an MRI contrast agent that tends not to be phagocytized by reticuloendothelial cells and that has improved dispersion stability. The present invention is an MRI contrast agent containing composite particles, wherein the composite particles are those with polymer graft chains bound to surfaces of microparticles at a very high density sufficient to allow steric repulsion to occur between the graft chains, the micoparticles are inorganic microparticles that exhibit superparamagnetism, and the polymer graft chains have a number average molecular weight (Mn) of at least 30,000. Preferably, the MRI contrast agent is for tumor diagnosis.
    Type: Application
    Filed: September 29, 2011
    Publication date: September 26, 2013
    Applicants: KYOTO UNIVERSITY, KANEKA CORPORATION
    Inventors: Yoshiyuki Tago, Shinichi Yoshida, Kohji Ohno, Yoshinobu Tsujii, Yasuhiko Tabata
  • Publication number: 20130197628
    Abstract: Copolymer-modified nanoparticles produced by a process in which nanoparticles are ablated by laser radiation from a surface of a substrate in a liquid include an amphiphilic copolymer.
    Type: Application
    Filed: April 19, 2011
    Publication date: August 1, 2013
    Applicants: AESCULAP AG, Max Planck Gesellschaft zur Foerderung der Wissenschaften e.V., LASER ZENTRUM HANNOVER E.V.
    Inventors: Stephan Barcikowski, Christin Menneking, Markus Klapper, Klaus Müllen, Michael Hoffmann, Simon Stelzig, Dennis Langanke, Helmut Goldmann
  • Publication number: 20130168609
    Abstract: Matrix materials, such as sol-gels and polymers derivatives to contain a redox active material can be used to form electrodes and probes suitable for use in pH meters and other analyte sensing devices.
    Type: Application
    Filed: July 26, 2011
    Publication date: July 4, 2013
    Applicant: SENOVA SYSTEMS, INC.
    Inventors: Eric Lee, Mark Micklatcher
  • Patent number: 8470510
    Abstract: A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.
    Type: Grant
    Filed: June 1, 2009
    Date of Patent: June 25, 2013
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Arimichi Okumura, Keizo Inoue, Kazuki Okamoto
  • Publication number: 20130145945
    Abstract: Disclosed is a resin composition for laser engraving, comprising (Component A) an oligomer or polymer having a (meth)acryloyloxy group in the molecule, (Component B) an ethylenically unsaturated compound, (Component C) a compound having in the molecule at least one type selected from the group consisting of a mercapto group, a primary amino group, and a secondary amino group and at least one type of hydrolyzable silyl group and/or silanol group, and (Component D) a thermopolymerization initiator.
    Type: Application
    Filed: December 6, 2012
    Publication date: June 13, 2013
    Applicant: FUJIFILM CORPORATION
    Inventor: FUJIFILM CORPORATION
  • Patent number: 8420871
    Abstract: Process for producing a chlorohydrin by reaction between a multihydroxylated-aliphatic hydrocarbon, an ester of a multihydroxylated-aliphatic hydrocarbon, or a mixture thereof, and a chlorinating agent, according to which the multihydroxylated-aliphatic hydrocarbon, the ester of a multihydroxylated-aliphatic hydrocarbon, or the mixture thereof used contains at least one solid or dissolved metal salt, the process comprising a separation operation to remove at least part of the metal salt.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: April 16, 2013
    Assignee: Solvay (Societe Anonyme)
    Inventors: Patrick Gilbeau, Ivan De Andolenko, Philippe Krafft, Freddy Gielen
  • Publication number: 20130052567
    Abstract: A resist pattern forming method includes: in the following order, (1) a step of forming a film on a substrate by using a negative resist composition capable of undergoing negative conversion by a crosslinking reaction; (2) a step of exposing the film; and (4) a step of performing development by using an alkali developer after the exposing, wherein the negative resist composition contains (A) a polymer compound having a repeating unit represented by the following formula (I) as defined in the specification, a thickness of the film formed in the step (1) is from 15 to 40 nm, and an alkali component concentration in the alkali developer is from 0.5 to 1.1 mass %.
    Type: Application
    Filed: July 30, 2012
    Publication date: February 28, 2013
    Applicant: FUJIFILM CORPORATION
    Inventor: Toru TSUCHIHASHI
  • Patent number: 8383749
    Abstract: The invention relates to a pigment preparation containing (i) at least one organic and/or inorganic pigment, (ii) a dispersant that can be obtained by the polmerization of monomers [A], [B], [C] and [D], where [A] is a monomer of formula (I) wherein A is C2-C4 alkylene and B is a C2-C4 alkylene different from A, and R is hydrogen or methyl, [B] is a monomer of formula (II) wherein D is C3 alkylene, R is hydrogen or methyl, and o is a number between 2 and 500, [C] is an ethylenically unsaturated monomer containing an aromatic group; and [D] is an ethylenically unsaturated monomer containing an alkyl radical.
    Type: Grant
    Filed: July 17, 2009
    Date of Patent: February 26, 2013
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Bjoern Fechner, Carsten Schaefer, Alexander Woerndle, Dietmar Beck
  • Publication number: 20130029255
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1).
    Type: Application
    Filed: July 26, 2012
    Publication date: January 31, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeshi INASAKI, Tomotaka TSUCHIMURA
  • Publication number: 20130030127
    Abstract: The present invention provides a styrene-based star polymer with narrow dispersion and suitable as a resist material, etc. A star polymer of the present invention is represented by the formula A[C(Y)Xm]n (wherein A represents a polyvalent aliphatic hydrocarbon group with 4-15 carbons, C represents a carbon atom, X represents a styrene-based polymer chain, Y represents a hydroxy group or an oxo group, m represents an integer of 1 or 2, and n represents any integer from 2 to 5, with the proviso that if Y is a hydroxy group, m is 2, and if Y is an oxo group, m is 1). The star polymer can be produced by reacting a styrene-based polymer having an anionic end, and an aliphatic carboxylic acid ester represented by A(COOR)n (wherein R represents an alkyl group having 1-8 carbons, and A and n are as defined for the above formula).
    Type: Application
    Filed: April 18, 2011
    Publication date: January 31, 2013
    Applicant: NIPPON SODA CO., LTD.
    Inventors: Akihiro Shirai, Takeshi Niitani
  • Publication number: 20130015909
    Abstract: The present invention relates to an adhesive composition for a touch panel, to an adhesive film, and to a touch panel. The adhesive composition according to the present invention provides an adhesive for a touch panel that has superior chemical resistance, superior durability under high-temperature or high-humidity conditions, and superior wettability or adhesion to a variety of adherends. In addition, the adhesive composition according to the present invention provides an adhesive which maintains superior resistant performance of a conductive layer and effectively prevents the corrosion of electrodes or the like when applied to a touch panel.
    Type: Application
    Filed: April 5, 2011
    Publication date: January 17, 2013
    Applicant: LG HAUSYS, LTD.
    Inventors: Jang-Soon Kim, Min-Seok Song, Eok-Hyung Lee, Hak-Rhim Han, Won-Gu Choi, Yong-Hoon Lee
  • Patent number: 8349981
    Abstract: The invention relates to anionically modified copolymers that can be obtained by the polymerization of monomers (A), (B), (C) and (D) in order to obtain non-ionic copolymers comprising reactive terminal OH groups, and subsequent reaction of the terminal OH groups to form anionic end groups, where A) is a monomer of formula (I) wherein A is C2-C4 alkylene and B is a C2-C4 alkylene different from A, and R is hydrogen or methyl; (B) is a monomer of formula (II) wherein D is C3 alkylene, R is hydrogen or methyl, and o is a number between 2 and 500; (C) is an ethylenically unsaturated monomer containing an aromatic group; and (D) is an ethylenically unsaturated monomer containing an alkyl radical.
    Type: Grant
    Filed: July 17, 2009
    Date of Patent: January 8, 2013
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Bjoern Fechner, Carsten Schaefer, Alexander Woerndle
  • Patent number: 8344071
    Abstract: Disclosed is a two-pack fluorine coating composition which comprises a combination of: a base component comprising a fluorinated copolymer having a hydroxyl group which can be dissolved in a low-polar weak solvent even at a low temperature and; a curing agent comprising a polyisocyanate compound.
    Type: Grant
    Filed: October 15, 2007
    Date of Patent: January 1, 2013
    Assignees: Asahi Kasei Chemicals Corporation, Asahi Glass Company, Limited
    Inventors: Shinichiro Watanabe, Isao Kimura
  • Patent number: 8338545
    Abstract: The invention provides methods for making copolymers and multi-arm block copolymers useful as drug delivery vehicles. The multi-arm block copolymers comprise a central core molecule, such as a residue of a polyol, and at least three copolymer arms covalently attached to the central core molecule, each copolymer arm comprising an inner hydrophobic polymer segment covalently attached to the central core molecule and an outer hydrophilic polymer segment covalently attached to the hydrophobic polymer segment, wherein the central core molecule and the hydrophobic polymer segment define a hydrophobic core region. The solubility of hydrophobic biologically active agents can be improved by entrapment within the hydrophobic core region of the block copolymer. The invention further includes pharmaceutical compositions including such block copolymers, pharmaceutical compositions, and methods of using the block copolymers as drug delivery vehicles.
    Type: Grant
    Filed: November 2, 2011
    Date of Patent: December 25, 2012
    Assignee: Nektar Therapeutics
    Inventor: Xuan Zhao
  • Patent number: 8329818
    Abstract: Provided is a modified ethylene-vinyl alcohol copolymer (C) having an ethylen content of 5 to 55 mol %, which contains a specific structural unit (I) in an amount of 0.3 to 40 mol % and may be obtained by reacting an ethylene-vinyl alcohol copolymer (A) with a monofunctional epoxy compound (B) having a molecular weight of not more than 500. This can be produced by a method for producing the modified ethylene-vinyl alcohol copolymer (C) which comprises melting and kneading an ethylene-vinyl alcohol copolymer (A) with a monofunctional epoxy compound (B) in an extruder. The modified ethylene-vinyl alcohol copolymer (C) is superior to a unmodified ethylene-vinyl alcohol copolymer (A) in transparency, stretchability, flexibility and flexing resistance due to the specific structural unit (I) incorporated therein, and thus, can be used as a barrier material in various applications requiring the above performance capabilities.
    Type: Grant
    Filed: May 10, 2010
    Date of Patent: December 11, 2012
    Assignee: Kuraray Co., Ltd.
    Inventors: Kaoru Ikeda, Shinji Tai, Kouta Isoyama, Tomoyuki Watanabe
  • Publication number: 20120301817
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.
    Type: Application
    Filed: January 27, 2011
    Publication date: November 29, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeshi Inasaki, Takayuki Ito, Tomotaka Tsuchimura, Tadateru Yatsuo, Koutarou Takahashi
  • Patent number: 8318865
    Abstract: The present invention is a method of manufacturing an eye lens material having a process in which a phosphorylcholine group-containing chemical compound represented by the following formula (1) is reacted and covalently bonded to the surface of an eye lens material having hydroxyl groups wherein the chemical compound represented by the following formula (2) is reacted and covalently bonded through ester-bonding to the eye lens material in an organic solvent. The object of the present invention is to provide an eye lens material that prevents protein adsorption and a method of manufacturing thereof.
    Type: Grant
    Filed: May 18, 2005
    Date of Patent: November 27, 2012
    Assignees: Shiseido Company, Ltd., Kazuhiko Ishihara
    Inventors: Yukimitsu Suda, Kazuyuki Miyazawa, Kazuhiko Ishihara
  • Publication number: 20120238703
    Abstract: A thermosetting composition comprising (1) a resinous binder having hydroxyl groups and carboxylic ester groups, and (2) phosphotungstic acid.
    Type: Application
    Filed: March 15, 2011
    Publication date: September 20, 2012
    Applicant: PPG Industries Ohio, Inc.
    Inventors: Ken W. Niederst, Gregory J. McCollum, Michael A. Zalich, Venkateshwarlu Kalsani
  • Patent number: 8236873
    Abstract: An eye lens material preventing protein adsorption is manufactured by reacting in a reaction medium of either water, an organic solvent, or a water/organic solvent mixture an eye lens material having OH groups with a phosphorylcholine group-containing compound of formula (1), thereby forming an acetal bond according to formula (2) which covalently bonds the phosphorylcholine group-containing compound to a surface of the eye lens material.
    Type: Grant
    Filed: May 18, 2005
    Date of Patent: August 7, 2012
    Assignee: Shiseido Co., Ltd.
    Inventors: Yukimitsu Suda, Kazuyuki Miyazawa, Kazuhiko Ishihara
  • Patent number: 8227555
    Abstract: The present invention is directed to conjugates of hydrolytically stabilized maleimide-functionalized water soluble polymers and to methods for making and utilizing such polymers and their precursors.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: July 24, 2012
    Assignee: Nektar Therapeutics
    Inventors: Antoni Kozlowski, Remy F. Gross, III, Samuel P. McManus
  • Patent number: 8181658
    Abstract: The present invention provides a plastic hairclip features in enabling to open and close by plastic resilience intrinsically. The plastic hairclip comprises a mount retainer, a lever retainer with a pair of releasing tabs, a hinged pivotal root and a pair of open-able jaws, which functions to accommodate, hold and release a hair bundle by intrinsic plastic resilience thereof. The plastic hairclip is made of a polymerized plastic mixture by 55% of 1,4-cyclohexanedimethanol (CHDM), 30% of ethylene glycol (EG), 10% of phosphotungstic acid (PTA), 1% of optical brightener and 4% of polypropylene (PP) or butadiene-styrene copolymers sold under the trademark, K-Resin with 5% tolerance for each individual component respectively. Thereby, the plastic hairclip product features in good malleability, re-plasticization ability and tenacity as well as good artistic effect in shining brightness and eco-friendly effect.
    Type: Grant
    Filed: June 24, 2009
    Date of Patent: May 22, 2012
    Inventor: Shih-Ling Hsu
  • Publication number: 20120101459
    Abstract: Absorbent structures comprising vacuum-treated (optionally coated) post-crosslinked water-absorbing polymeric particles, obtainable by vacuum-treating and optionally plasma-treating post-crosslinked water-absorbent polymeric particles (that may optionally be coated), the resulting vacuum-treated post-crosslinked water-absorbing polymeric particles having an improved absorption, whilst having good gel bed permeability.
    Type: Application
    Filed: October 20, 2011
    Publication date: April 26, 2012
    Applicant: The Procter & Gamble Company
    Inventors: Axel Meyer, Michaela Monika Czupik, Robin Lynn McKiernan, Thomas Daniel, Yvonne Hagen, Ulrich Riegel, Dieter Hermeling, Stefan Bruhns
  • Publication number: 20120076953
    Abstract: Disclosed therein is a novel cyclic olefin compound having a photoreactive group and a novel photoreactive polymer. The cyclic olefin compound is applicable to various photoreactions, such as of liquid crystal alignment films and can be preferably used as a precursor of different organic compounds or polymers.
    Type: Application
    Filed: September 21, 2011
    Publication date: March 29, 2012
    Inventors: Dai-Seung CHO, Sung-Ho Chun, Young-Chul Won, Dong-Woo Yoo
  • Publication number: 20120035316
    Abstract: Process for preparing a macromonomer using free radical-initiated aqueous emulsion polymerisation in a polymerisation reactor of at least one olefinically unsaturated monomer, which process employs a hydrophobic Co chelate complex as a CTA, a stabilising substance(s) for the emulsion polymerisation process and a monomer feed stage MF; wherein an aqueous pre-emulsified mixture A, comprising at least part of the Co chelate(s) employed, at least part of the stabilising substance(s) employed, and (i) a non-polymerisable organic solvent(s) and/or (ii) a polymerisable monomer(s) in unpolymerised or at least partially polymerised form, is contacted in the reactor with monomer(s) of feed stage MF at the beginning of and/or during the course of feed stage MF; and wherein in mixture A the weight ratio of (i) and/or (ii) to the stabilising substance(s) is in the range of from 10/1 to 1/10.
    Type: Application
    Filed: October 18, 2011
    Publication date: February 9, 2012
    Applicant: DSM IP Assets B.V.
    Inventors: Saskia Carolien VAN DER SLOT, Tijs Nabuurs, Alfred Jean Paul BÜCKMANN, Gerardus Cornelis Overbeek