Abstract: The present invention is to provide a method for providing a low-molecular radical which comprises releasing a radical having a lower molecular weight from a super-stable perfluoroalkyl-based radical followed by generating the above super-stable perfluoroalkyl-based radical.
November 12, 2002
June 19, 2003
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
Abstract: This invention relates to a process for the free-radical polymerization of monomers in gas phase or suspension processes using a supported, polymerization-initiating system comprising
a) one or more polymerization-initiating components which initiate and start free-radical polymerization,
b) a support, onto which said polymerization-initiating component is applied, and
c) optionally, one or more modifiers which have an influence upon reaction kinetics and/or product properties.
February 3, 1999
Date of Patent:
May 14, 2002
Michael Dauben, Martin Hoch, Christiane Oppenheimer-Stix, Peter Schertl