Benzoyl Peroxide Patents (Class 526/232.1)
  • Publication number: 20140296461
    Abstract: An aromatic vinyl copolymer can exhibit excellent heat resistance and/or transparency and is a copolymer of a monomer mixture, which includes: an exo-methylene butyrolactone compound represented by Formula 1; an aromatic vinyl compound; and a vinyl cyanide compound. wherein R1 and R2 are each independently hydrogen, C1 to C12 alkyl, or C6 to C12 aryl.
    Type: Application
    Filed: March 24, 2014
    Publication date: October 2, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Beom Jun JOO, Sun Dae KIM
  • Publication number: 20130331501
    Abstract: Embodiments of the present disclosure illustrate systems and methods for the separation of carbon nanotubes (CNTs) in solution and continuously fabrication of functionalized carbon nanotubes (CNTs). In certain embodiments, the CNTs are isolated by sonication and chemical modification of the CNTs using functionalization reactions, including thermo-initiated or sono-initiated free radical polymerization and esterification. Beneficially, sonication facilitates mechanical separation of the CNTs, while the chemical modification of the CNTs results in more favorable interactions between the CNTs and their surrounding media which enables the separated CNTs to remain isolated. Embodiments of the isolated CNTs may also be employed into coating systems.
    Type: Application
    Filed: August 14, 2013
    Publication date: December 12, 2013
    Applicant: Cal Poly Corporation
    Inventors: Phillip J. Costanzo, Keith Vorst, Greg William Curtzwiler
  • Patent number: 8389645
    Abstract: The invention relates to solid polyester granules of the type used as matting agents in paints. In particular, the invention relates to a new redox initiating system for use in a suspension polymerization process that is used to manufacture the solid polyester granules, to a process for the preparation of the solid polyester granules, and to paint compositions containing the solid polyester granules.
    Type: Grant
    Filed: January 27, 2005
    Date of Patent: March 5, 2013
    Assignee: Duluxgroup (Australia) Pty Ltd.
    Inventors: Christopher Henry Such, Barbara Aurelia Czapski, Karen Lai-On Seligman, Deepak Ajinkya, Algirdas Kazimieras Serelis
  • Patent number: 8357483
    Abstract: The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: January 22, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Han-Soo Kim, Min-Young Lim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim, Kwang-Han Park
  • Publication number: 20120296038
    Abstract: An anchoring adhesive includes effective amounts of an isocyanurate compound and a vinyl ester compound that react and cure to form a composition having high compressive strength, high tensile strength and low shrinkage. The anchoring adhesive can be used to firmly bond anchor pins to boreholes in concrete, steel, wood, and other substrates.
    Type: Application
    Filed: May 18, 2011
    Publication date: November 22, 2012
    Applicant: Illinois Tool Works Inc.
    Inventor: ANDREW J. ROURKE
  • Patent number: 8227559
    Abstract: The invention relates to a process for the preparation of a copolymer by free radical mass polymerization of a maleic acid monoester derivative with vinyl ester in the presence of an acid having a pKa of less than 1.8. The copolymer is suitable as a dispersant for hydraulic binders.
    Type: Grant
    Filed: January 12, 2009
    Date of Patent: July 24, 2012
    Assignee: Construction Research & Technology GmbH
    Inventors: Jochen Mezger, Alexander Kraus, Harald Grassl, Kerstin Becher
  • Publication number: 20120142875
    Abstract: Disclosed are a maleimide-a-alkylstyrene-based, heat-resistant bulk tetrapolymer and a preparation process thereof. More specifically, disclosed are a bulk tetrapolymer, comprising 5-60 wt % of an N-substituted maleimide monomer, 10-70 wt % of an a-alkylstyrene monomer, 5-50 wt % of an unsaturated nitrile monomer and 3-50 wt % of an aromatic vinyl monomer, as well as a continuous bulk polymerization process for preparing the same. The disclosed bulk tetrapolymer has a weight-average molecular weight (Mw) of 70,000-300,000 and a glass transition temperature of 150-200 DEG C., shows excellent high-temperature thermal stability and heat resistance and a remarkably low melt viscosity, and thus is excellent not only in processability, but also in productivity, processability, moldability and blendability, when it is blended with other resins. Also, the continuous bulk polymerization process is equipped with a devolatilizer and enables the bulk tetrapolymer to be produced at low cost and high efficiency.
    Type: Application
    Filed: December 7, 2011
    Publication date: June 7, 2012
    Inventors: Dong Cheol Sohn, Sup Joo Lee, Byung Yoon Ahn
  • Publication number: 20120010352
    Abstract: Aqueous suspension comprising 35-45 wt % of solid diacyl peroxide particles having a d50 in the range 1-10 microns, 0.05-1 wt % of a dispersant, and not more than 1 wt % of an organic solvent. This concentrated peroxide suspension comprises only a minor amount of dispersant, has a low volatile organic content and is nonetheless stable for months and low in viscosity.
    Type: Application
    Filed: March 31, 2010
    Publication date: January 12, 2012
    Applicant: AKZO NOBEL CHEMICALS INTERNATIONAL B.V.
    Inventor: Boen Ho O
  • Publication number: 20110319580
    Abstract: The invention provides intermediates of the formula: as well as a method of their preparation by reacting a thiol having at least two hydroxyl groups with a mono-unsaturated organic compound in the presence of a base catalyst. A polymerizable urethane acrylate oligomer or urethane methacrylate oligomer is formed by reacting a polyisocyanate with the intermediate. The polymerizable urethane acrylate oligomer or urethane methacrylate is blended with a polymerization initiator to form a composition which is useful in such applications as adhesives.
    Type: Application
    Filed: June 28, 2010
    Publication date: December 29, 2011
    Inventors: JAMES H. AERYKSSEN, Ahmet Nebioglu, Richard D. Zopf, Igor V. Khudyakov
  • Patent number: 8067514
    Abstract: An anisotropic conductive film is provided which can provide high bonding strength and good conduction reliability when anisotropic conductive bonding is made under the compression bonding conditions of a compression bonding temperature of at most 130° C. for a compression bonding time of at most 3 seconds. The anisotropic conductive film contains a polymerizable acrylic compound, a film-forming rein, conductive particles, and a polymerization initiator. The polymerization initiator contains two types of organic peroxides that do not produce oxygen gas resulting from the decomposition thereof and have different one-minute half-life temperatures. Of the two types of organic peroxides, one organic peroxide that has a higher one-minute half-life temperature produces benzoic acid or a derivative thereof when it decomposes.
    Type: Grant
    Filed: January 17, 2008
    Date of Patent: November 29, 2011
    Assignees: Sony Corporation, Sony Chemical & Information Device Corporation
    Inventors: Kouichi Miyauchi, Yasushi Akutsu, Yasunobu Yamada
  • Patent number: 7985819
    Abstract: The present invention discloses styrene-maleic anhydride copolymers preparations using solventless techniques. The solventless method resulted in reduced amounts of residues, such as unreacted styrene and/or maleic anhydride monomers, which makes the copolymers particularly suitable for bioapplications.
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: July 26, 2011
    Assignee: Exotech Bio Solutions Ltd.
    Inventors: Mircea Dan Bucevschi, Monica Colt
  • Patent number: 7829636
    Abstract: The embodiments herein relate to a method of synthesizing new improved reactive terpolymer, S-MMA-X (styrene/modified maleic anhydride/X) wherein X is any type of polymers. The method involves synthesizing styrene-modified maleic anhydride complex (SMMA) with the ability to react with all kinds of polymers to produce new reactive terpolymer with formation of nano particles inside them. The nanoparticle formations improve the physio-chemical, thermal and mechanical properties of the newly formed reactive terpolymer when compared to natural rubber, their derivatives, EPDM or other known polymer etc. Depending on the property of the end product polymers produced by the invention, the end use can be varied. In one embodiment, the polymer X is natural rubber (NR) and the end product terpolymer is used as bitumen modifier. In another embodiment, the polymer X is ethylene-propylene diene monomer (EPDM) and the end product terpolymer behaves like a smart particle and absorbs oil and water contaminants.
    Type: Grant
    Filed: August 27, 2007
    Date of Patent: November 9, 2010
    Inventors: Sara Shaghaghi, Reza Shaghaghi
  • Publication number: 20100174040
    Abstract: The present invention relates to a method of producing polymers by free-radical polymerization in solution, wherein the polymerization initiator used is an ethanol-soluble initiator, and the solution polymerization is carried out in an alcoholic solvent which comprises 5 to 50% by weight of water.
    Type: Application
    Filed: March 23, 2007
    Publication date: July 8, 2010
    Applicant: BASF SE
    Inventors: Son Nguyen Kim, Matthias Laubender, Marianna Pierobon, Gabi Winter
  • Publication number: 20100168355
    Abstract: An acrylic copolymer with high heat-resistance is provided. The acrylic copolymer includes repeat units of a monomer of Formula (1) and repeat units of a methacrylic monomer derivative: wherein x is 1-3 and y is 0-3. The acrylic copolymer possesses high heat-resistance and low water absorptivity. The invention also provides a method for preparing the acrylic copolymer.
    Type: Application
    Filed: June 15, 2009
    Publication date: July 1, 2010
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuo-Chen Shih, Mao-Lin Hsueh, Yi-Zhen Chen
  • Patent number: 7691953
    Abstract: A method is disclosed for producing polyvinyl chloride which includes mixing a vinyl chloride solution with an initiator solution in at least one high shear mixing device comprising at least one rotor/stator set producing a rotor tip speed of at least 5.1 m/sec (1000 ft/min), to form a polymerization mixture; and allowing the mixture to polymerize by free radical polymerization to form polyvinyl chloride. The polymerization mixture may be subjected to free radical polymerization conditions comprising a temperature in the range of about 20° C. to about 230° C. In some embodiments, the high shear mixing device produces a shear rate of at least 20,000 s?1. A system for carrying out the method is also disclosed.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: April 6, 2010
    Assignee: H R D Corporation
    Inventors: Abbas Hassan, Ebrahim Bagherzadeh, Rayford G. Anthony, Gregory Borsinger, Aziz Hassan
  • Publication number: 20100081089
    Abstract: The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
    Type: Application
    Filed: April 11, 2008
    Publication date: April 1, 2010
    Inventors: Han-Soo Kim, Min-Young Lim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim, Kwang-Han Park
  • Publication number: 20090318649
    Abstract: The present invention discloses styrene-maleic anhydride copolymers preparations using solventless techniques. The solventless method resulted in reduced amounts of residues, such as unreacted styrene and/or maleic anhydride monomers, which makes the copolymers particularly suitable for bioapplications.
    Type: Application
    Filed: March 26, 2009
    Publication date: December 24, 2009
    Inventors: Mircea Dan Bucevschi, Monica Colt
  • Patent number: 7572868
    Abstract: The present invention relates to a polymerizable composition comprising a) at least one ethylenically unsaturated monomer and b) at least one hydroxylamine of high molecular weight, preferably a long chain alkyl substituted hydroxylamine. Further aspects of the present invention are a process for polymerizing ethylenically unsaturated monomers, and the use of high molecular weight hydroxylamines for controlled polymerization.
    Type: Grant
    Filed: August 18, 2004
    Date of Patent: August 11, 2009
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Hendrik Wermter, Dirk Simon, Rudolf Pfaendner
  • Publication number: 20090156734
    Abstract: The invention relates generally to solid polyester granules of the type used as matting agents in paints. In particular, the invention relates to a new redox initiating system for use in a suspension polymerisation process used to manufacture the solid polyester granules, to a process for the preparation of the solid polyester granules, and to paint compositions comprising solid polyester granules.
    Type: Application
    Filed: January 27, 2005
    Publication date: June 18, 2009
    Applicant: Orica Australia Pty Ltd.
    Inventors: Christopher Henry Such, Barbara Aurelia Czapski, Karen Lai-On Seligman, Deepak Ajinkya, Algirdas Kazimieras Serelis
  • Publication number: 20090149615
    Abstract: An alcohol-soluble resin and a method for preparing the same, in which the content of vinyl acetate monomer in polymeric raw material is 50% to 90%. In addition, acrylic ester monomer and other reactive functional group-containing compounds have been mixed in the raw material to ensure the performance of resin for special requirements in application. Also provided are products produced by using the resin, such as alcohol-soluble ink, composite adhesive, lustering oil for printing, glazing lacquer for woodware, superficial decorating coatings for plastic materials, safeguard coatings of metal surface and hair colorant, as well as preparation methods.
    Type: Application
    Filed: January 6, 2006
    Publication date: June 11, 2009
    Inventors: Mingguo Zou, Wenjun Zou, Wenjun Zhong, Guangming Li
  • Publication number: 20090088533
    Abstract: Monomers corresponding to the formula Z2C?CWX(CY2)nCN, in which X represents an atom of oxygen or another atom, Z and Y represent an atom of hydrogen or fluorine, W represents an atom of hydrogen or fluorine or a CF3 group and n is a natural integer between 0 and 10 inclusively. Because of the novel methods of copolymerization and crosslinking, these monomers make it possible to produce fluorosulphonated nitrile elastomers having very low glass transition temperatures (Tg).
    Type: Application
    Filed: October 20, 2008
    Publication date: April 2, 2009
    Applicant: HYDRO-QUEBEC
    Inventors: Bruno Michel Ameduri, Abdellatif Manseri, Mario Boucher
  • Publication number: 20090039018
    Abstract: Compositions comprising a cross-linked isocyanurate homopolymer or other cross-linked triazine homopolymers in the form of a microbead that is porous or non-porous; methods of making; and methods of using the compositions are disclosed.
    Type: Application
    Filed: August 8, 2008
    Publication date: February 12, 2009
    Inventors: Howard C. Jordi, Mark A. Jordi
  • Publication number: 20080281058
    Abstract: A process for producing a polymer latex includes a step of mixing at least one kind of polymerizable monomer with water and a polymerization initiator to perform a polymerization, wherein the at least one kind of polymerizable monomer includes an acrylonitrile in an amount of 50 mass % or more based on a total amount of the at least one kind of polymerizable monomer.
    Type: Application
    Filed: December 19, 2007
    Publication date: November 13, 2008
    Applicant: FUJIFILM CORPORATION
    Inventor: Katsumi Araki
  • Publication number: 20080274442
    Abstract: One-component heat-curable sealant composition for the protection of exposed dental surfaces, comprising (a) a polymerisable monomer and/or oligomer which has at least two polymerizable double bonds per molecule, and (b) an initiator system comprising benzoylperoxide in an amount of at least 2 wt.-% based on the total composition.
    Type: Application
    Filed: June 30, 2008
    Publication date: November 6, 2008
    Inventors: Joachim E. Klee, Andreas Facher, Christoph Weber, Rolf Mulhaupt, Martin Schmider
  • Publication number: 20080139765
    Abstract: The present invention relates generally to improvements of wear resistant cosmetic compositions. Specifically, this invention relates to a cosmetic composition containing particular copolymers with glass transition temperatures greater than 70° Celsius that demonstrate enhanced wear in combination with a smooth, non-tacky feel. Since most carrier solvents formulated into cosmetics are weak solvents with high boiling points and slow evaporation rates the applied films remain wet and tacky resulting in poor cosmetic performance. The polymers of the present invention overcomes this deficiency due to the high Tg associate with the polymer which yields an apparent faster dry time in the applied coating thus improving the cosmetic's film integrity.
    Type: Application
    Filed: May 31, 2007
    Publication date: June 12, 2008
    Inventors: Michael Spiegel, John Imperante, Anthony J. O' Lenick
  • Patent number: 7135534
    Abstract: A novel polymer support for solid phase peptide synthesis comprising polystyrene backbone and propoxylate function of hexanedioldiacrylate crosslinks having optimum hydrophilic/hydrophobic balance and a process of preparation thereof.
    Type: Grant
    Filed: July 24, 2003
    Date of Patent: November 14, 2006
    Assignees: Rajiv Gandhi Centre for Biotechnology, The Secretary, Department of Biotechnology
    Inventors: Gopalakrishnapillai Sankaramangalam Vinod Kumar, Kesavakurup Kumar Santhosh
  • Patent number: 7132485
    Abstract: The invention relates to a suspension polymerization process for the preparation of styrene-containing (co)polymers, wherein the process comprises the steps of continuously or semi-continuously dosing an initiator to the reaction mixture, said initiator having a specified half-life at the temperature of the reaction mixture to which it is dosed. The invention further relates to styrene based (co)polymer obtainable by said process, and to the use of said styrene (co)polymer in a shaping process.
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: November 7, 2006
    Assignee: Akzo Nobel N.V.
    Inventors: Hendrikus Gerardus Boevenbrink, Frans Johannes Hoogesteger
  • Patent number: 7087689
    Abstract: A method of homogeneously polymerizing styrene comprising admixing an ethylenically unsaturated monomer and an initiation system that is soluble in the monomer. This system includes a metal; a peroxide, hydroperoxide or mixture thereof; and a reductant. Under appropriate reaction conditions, the cyclic oxidation and reduction of the metal produces free radicals which initiate homogeneous polymerization of the ethylenically unsaturated monomer. The invention beneficially enables relatively low temperature processing with inexpensive initiation.
    Type: Grant
    Filed: April 27, 2005
    Date of Patent: August 8, 2006
    Assignee: Fina Technology, Inc.
    Inventors: Jay Reimers, Jose M. Sosa
  • Patent number: 7077964
    Abstract: The present invention relates to a process for preparing novel, monodisperse ion exchangers having chelating functional groups, and their use for adsorbing metal compounds, in particular, heavy metal compounds and noble metal compounds, and also for extracting alkaline-earth metals from saline solutions from alkali metal chloride electrolysis.
    Type: Grant
    Filed: October 17, 2003
    Date of Patent: July 18, 2006
    Assignee: Bayer Aktiengesellschaft
    Inventors: Reinhold Klipper, Werner Strüver, Ulrich Schnegg, Bruno Hees, Bernhard Lehmann, Holger Lütjens
  • Patent number: 7033706
    Abstract: Polymer solid electrolytes with good film strength, high ionic conductivity and excellent processability are provided, comprising a resin composition for polymer solid electrolytes containing 0.5–5.0% by weight of a curable resin having a specific structure (A), a plasticizer and (B) an electrolyte (C).
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: April 25, 2006
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Satoshi Mori, Minoru Yokoshima
  • Patent number: 6995221
    Abstract: A process for producing organic peroxide initiators useful in the polymerization of ethylenically unsaturated monomers. The process for making the organic peroxides includes forming an aqueous emulsion of the organic peroxide. The organic peroxide is dispersed as small droplets of from 1 to 10 microns in size in the aqueous emulsion. The organic peroxide may be added to a polymerization reactor containing an ethylenically unsaturated monomer. The organic peroxide functions as a free radical initiator to polymerize the monomer. The organic peroxide may be substantially free of organic solvents and plasticizers. The resulting polymers are of high quality.
    Type: Grant
    Filed: May 6, 2003
    Date of Patent: February 7, 2006
    Assignee: Oxy Vinyls, L.P.
    Inventors: Ross J. Cozens, Qi Wang, M. Frederick V. Glock, Jr., Daniel A. Zust
  • Patent number: 6960638
    Abstract: The invention relates to polymer beads having a high content of diacyl peroxides. A prolongation of the pot life in reaction resins based on high-boiling methacrylate esters is achieved due to this high content of peroxides.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: November 1, 2005
    Assignee: Roehm GmbH & Co. KG
    Inventors: Peter Quis, Heike Heeb, Helmut Schwind, Harald Draeger
  • Patent number: 6811960
    Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions. In particular, photoresist monomers of the present invention comprise a moiety of Formula 4: where R1, R2, R3 and R4 are those defined herein. Photoresist polymers of the present invention have a relatively high etching resistance, and therefore are useful in a thin resist process and a bilayer photoresist process. Moreover, photoresist polymers of the present invention have a high contrast ratio between an exposed region and a non-exposed region.
    Type: Grant
    Filed: May 12, 2003
    Date of Patent: November 2, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Patent number: 6806025
    Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions containing the same. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness to a wafer, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. In addition, the photoresist composition has low light absorbance at 157 nm wavelength, and thus is suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) in fabricating a minute circuit for a high integration semiconductor device. wherein, X1, X2, Y1, Y2, Y3, Y4, Y5, Y6, Y7, Y8, l and m are as defined in the specification of the invention.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: October 19, 2004
    Assignee: Hynix Semiconductor Inc.
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin
  • Patent number: 6794110
    Abstract: A polymer blend is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the polymer blend is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including wavelengths of 157 nm, 193 nm and 248 nm, and has improved sensitivity and resolution. Processes for preparing and using the polymer blend are also provided, as are lithographic photoresist compositions that contain the polymer blend.
    Type: Grant
    Filed: March 4, 2002
    Date of Patent: September 21, 2004
    Assignee: International Business Machines Corporation
    Inventors: Gregory Breyta, Hiroshi Ito, Hoa D. Truong
  • Patent number: 6740718
    Abstract: The invention relates to a method of forming carbon monoxide-containing polymers from multi-component syngas feeds and at least one vinyl comonomer. Feeds useful in the practice of the invention comprise ethylene in an amount ranging from about 5 to about 40 mole %, carbon monoxide is an amount ranging from about 1 to about 40 mole %, hydrogen in an amount ranging from about 4 to about 55 mole %, carbon dioxide in an amount ranging from about 3 to about 10 mole %, and methane in an amount ranging from about 4 to about 85 mole %. The feed may also include acetylene in an amount ranging up to about 10 mole %. The feed may contain at least one free radical-polymerizable vinyl comonomer, or a cofeed containing such a comonomer can be used.
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: May 25, 2004
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Abhimanyu O. Patil, Donald N. Schulz, Raymond A. Cook, Michael G. Matturro
  • Publication number: 20040082744
    Abstract: The present invention relates to a process for preparing novel, monodisperse ion exchangers having chelating functional groups, and their use for adsorbing metal compounds, in particular, heavy metal compounds and noble metal compounds, and also for extracting alkaline-earth metals from saline solutions from alkali metal chloride electrolysis.
    Type: Application
    Filed: October 17, 2003
    Publication date: April 29, 2004
    Inventors: Reinhold Klipper, Werner Struver, Ulrich Schnegg, Bruno Hees, Bernhard Lehmann, Holger Lutjens
  • Patent number: 6727335
    Abstract: The invention relates to polymeric phosphinic acids and their salts of the formula (I) in which X is hydrogen or a 1/m metal of valency m, R1 and R2 are identical or different and are hydrogen, a carboxyl group, a carboxylic acid derivative, an unsubstituted or substituted alkyl group having 1 to 10 carbon atoms, phenyl, benzyl or alkyl-substituted aromatics, R3 and R4 are identical or different and are hydrogen or a vinyl group of the formula (VI) —CR1═CHR2  (VI) in which R1 and R2 have the abovementioned meaning, and {overscore (u)} is the average number of monomer units. The invention also relates to a process for the preparation of the abovementioned compounds and their use.
    Type: Grant
    Filed: April 17, 2003
    Date of Patent: April 27, 2004
    Assignee: Clariant GmbH
    Inventors: Martin Sicken, Norbert Weferling, Hans-Peter Schmitz
  • Patent number: 6720129
    Abstract: Photoresist polymers, and photoresist compositions using the polymer are disclosed. More specifically, photoresist polymers containing maleimide represented by Formula 1. Photoresist compositions including the photoresist polymers have excellent etching resistance, heat resistance and adhesiveness, and development ability in aqueous tetramethylammonium hydroxide (TMAH) solution. As the compositions have low light absorbance at 193 nm and 157 nm wavelength, they are suitable for a process using ultraviolet light source such as VUV (157 nm). wherein, 1, R1, R2, R3, R, R′, R″, R″′, X, a and b are defined in the specification.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: April 13, 2004
    Assignee: Hynix Semiconductor Inc
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin
  • Patent number: 6664330
    Abstract: An emulsion of a monomer having a radical polymerizable unsaturated bond, which is obtained by emulsifying the monomer in the presence of an emulsifier, and a mixed solution of a specific non-radical polymerizable organosilicon compound and a polymerization initiator, which is soluble in the non-radical polymerizable organosilicon compound, are added to an aqueous medium, followed by emulsion polymerization, hydrolysis, and condensation, to produce a waterborne resin emulsion and a waterborne coating which can form a coating film having superior durability such as water resistance, weathering resistance, or the like.
    Type: Grant
    Filed: October 9, 2001
    Date of Patent: December 16, 2003
    Assignee: Dainippon and Chemicals, Inc.
    Inventors: Masahito Furo, Shin′ichi Kuwamura
  • Patent number: 6653047
    Abstract: Photoresist monomers, photoresist polymers prepared therefrom, and photoresist compositions using the polymers are disclosed. More specifically, photoresist polymers comprising a photoresist monomer containing fluorine-substituted benzylcarboxylate represented by Formula 1, and a composition comprising the polymer are disclosed. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and can be developed in aqueous tetramethylammonium hydroxide (TMAH) solution. And, the present photoresist composition is suitable to form a fine pattern using deep ultraviolet light source such as VUV (157 nm), since the composition has low light absorbance at 193 nm and 157 nm wavelength. wherein, X1, X2, R1, l and m are defined in the specification.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: November 25, 2003
    Assignee: Hynix Semiconductor Inc
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin
  • Patent number: 6649663
    Abstract: The present invention relates to a process for preparing novel, monodisperse ion exchangers having chelating functional groups, and their use for adsorbing metal compounds, in particular, heavy metal compounds and noble metal compounds, and also for extracting alkaline-earth metals from saline solutions from alkali metal chloride electrolysis.
    Type: Grant
    Filed: August 21, 2000
    Date of Patent: November 18, 2003
    Assignee: Bayer Aktiengesellschaft
    Inventors: Reinhold Klipper, Werner Strüver, Ulrich Schnegg, Bruno Hees, Bernhard Lehmann, Holger Lütjens
  • Publication number: 20030207205
    Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions.
    Type: Application
    Filed: May 12, 2003
    Publication date: November 6, 2003
    Applicant: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Patent number: 6627383
    Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions using the same. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. In addition, the photoresist composition has low light absorbance at the wavelength of 193 nm, 157 nm and 13 nm, and thus is suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) and EUV (13 nm) in fabricating a minute circuit for a high integration semiconductor device. wherein, R1, R2, R3, Y, W, m and n are as defined in the specification.
    Type: Grant
    Filed: October 9, 2001
    Date of Patent: September 30, 2003
    Assignee: Hynix Semiconductor Inc
    Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Publication number: 20030181615
    Abstract: Compounds corresponding to formula (I)
    Type: Application
    Filed: March 6, 2003
    Publication date: September 25, 2003
    Inventors: Bruno Michel Ameduri, Michel armand, Mario Boucher, Abdellatif Manseri
  • Patent number: 6566473
    Abstract: A non-aqueous, heterogeneous polymerization process comprises heating a reaction mixture of about 5-70%, preferably 10-50%, by weight, of a vinyl amide monomer in an oil as solvent, and a water-soluble cosolvent, and a free radical initiator, optionally in the presence of a crosslinking agent and/or a surfactant, wherein the oil solvent is present in an amount sufficient to keep the resultant polymer in a stirrable state throughout the polymerization. The polymer reaction product is capable of forming a uniform emulsion or gel upon addition of water thereto.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: May 20, 2003
    Assignee: ISP Investments Inc.
    Inventors: Donald I. Prettypaul, Jenn S. Shih
  • Patent number: 6541586
    Abstract: The invention relates to a method of forming carbon monoxide-containing polymers from multi-component syngas feeds and at least one vinyl comonomer. Feeds useful in the practice of the invention comprise ethylene in an amount ranging from about 5 to about 40 mole %, carbon monoxide is an amount ranging from about 1 to about 40 mole %, hydrogen in an amount ranging from about 4 to about 55 mole %, carbon dioxide in an amount ranging from about 3 to about 10 mole %, and methane in an amount ranging from about 4 to about 85 mole %. The feed may also include acetylene in an amount ranging up to about 10 mole %. The feed may contain at least one free radical-polymerizable vinyl comonomer, or a cofeed containing such a comonomer can be used.
    Type: Grant
    Filed: January 19, 1999
    Date of Patent: April 1, 2003
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Abhimanyu O. Patil, Donald N. Schulz, Raymond A. Cook, Michael G. Matturro
  • Patent number: 6482882
    Abstract: Polymerization process of unsaturated pefluoromonomers, fluoro-containing monomers and optionally in the presence of hydrogen containing olefins, for obtaining polymers contaning hydrogen and fluorine, which utilizes a microemulsion comprising the following components: (a) water; (b) a fluoropolyoxyalkylene having hydrogen-containing end groups and/or hydrogen-containing repeating units; (c) a fluorine-free organic radicalic initiator for the polymerization of fluoro-containing monomers, soluble in component (B); (d) a fluoro-containing surfactant.
    Type: Grant
    Filed: May 24, 2000
    Date of Patent: November 19, 2002
    Assignee: Ausimont S.P.A.
    Inventors: Julio A. Abusleme, Alba Chittofrati
  • Patent number: 6479603
    Abstract: The invention provides a process for the living free radical addition polymerization of one or more ethylenically unsaturated monomers using at least one free-radical polymerization initiator and in the presence of one or more stable N-oxyl radicals, wherein at least one stable N-oxyl radical has polymerizable double bonds. The invention additionally provides polymers obtainable by this process, having a polydispersity index PDI of from 1.0 to 1.8, and provides for the use of stable N-oxyl radicals having polymerizable double bonds in the living free radical addition polymerization of one or more different ethylenically unsaturated monomers.
    Type: Grant
    Filed: June 14, 2001
    Date of Patent: November 12, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Yuliang Yang, Junpo He, Jizhuang Cao, Jingming Chen, Chengming Li
  • Patent number: 6353068
    Abstract: Polyacrylates having an average molecular weight of from about 1000 to about 10,000 and the general formula where R4 is the radical of a known chain regulator or initiator, R1 is identical or different and is an alkyl radical, preferably of 1 to 4 carbon atoms, R2 is identical or different and is a saturated or unsaturated alkyl radical of 12 to 22 carbon atoms, R3 is a hydrocarbon radical which carries at least one (meth)acryloxy group, a is from 10 to 50, b is from 3 to 20, c is from 0 to 10, and the ratio a:b+c is from 0.25 to 4 and the ratio b:c is from 1:0 to 1:0.7 as degassing agents for paints and coatings.
    Type: Grant
    Filed: September 9, 1999
    Date of Patent: March 5, 2002
    Assignee: Th. Goldschmidt AG
    Inventors: Thomas Dietz, Eberhard Esselborn, Christian Psiorz, Ute Schick, Stefan Silber, Ellen Reuter, Dirk Wolfgram