Abstract: A resin composition includes a resin A, a resin C, and a solvent. The resin A includes a sulfonic-acid-group-containing structural unit in an amount exceeding 5 mol % with respect to total structural units included in the resin A. The resin A has a content of a fluorine atom of 30 mass % or less with respect to a total mass of the resin A. The resin C includes a fluorine atom in a larger content per unit mass than the content of a fluorine atom per unit mass in the resin A. A content of the resin A in the resin composition is lower than a content of the resin C in the resin composition in terms of mass.

Abstract: This invention relates to a composition for a photo-alignment layer which can exhibit superior thermal stability, alignability, and alignment rate, and can also suppress generation of an afterimage and further improve a voltage holding ratio when applied to a liquid crystal cell, and to a photo-alignment layer and a liquid crystal alignment layer using the same. The composition for a photo-alignment layer includes a cyclic olefin-based photo-alignment polymer and a polyamic acid ester-based photo-alignment additive.

Abstract: A cured film is formed by using a curable composition comprising a liquid repellent polymer having units (u1) based on a liquid repellent compound represented by the following formula (m1): wherein Cf is a C1-20 fluoroalkyl group or a C1-20 fluoroalkyl group having an etheric oxygen atom between carbon atoms, each of R1 and R2 which are independent of each other, is a hydrogen atom, a C1-6 alkyl group or a phenyl group, X is an oxygen atom, a sulfur atom, a nitrogen atom or NH, n in an integer of from 0 to 4, m is 1 when X is an oxygen atom, a sulfur atom or NH, or 2 when X is a nitrogen atom, Z is R4R5C?CR3—CO—, and each of R3, R4 and R5 which are independent of one another, is a hydrogen atom or a methyl group.

Abstract: The present invention provides methylene beta-ketoester monomers, methods for producing the same, and compositions and products formed therefrom. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester is reacted with a source of formaldehyde in a modified Knoevenagel reaction optionally in the presence of an acidic or basic catalyst, and optionally in the presence of an acidic or non-acidic solvent, to form reaction complex. The reaction complex may be an oligomeric complex. The reaction complex is subjected to further processing, which may be vaporization by contact with an energy transfer means in order to isolate the beta-ketoester monomer. The present invention further compositions and products formed from methylene beta-ketoester monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).

Abstract: The present invention provides methylene beta-diketone monomers, methods for producing the same, and compositions and products formed therefrom. In the method for producing the methylene beta-diketones of the invention, a beta-diketone is reacted with a source of formaldehyde in a modified Knoevenagel reaction optionally in the presence of an acidic or basic catalyst, and optionally in the presence of an acidic or non-acidic solvent, to form reaction complex. The reaction complex may be an oligomeric complex. The reaction complex is subjected to further processing, which may be vaporization by contact with an energy transfer means in order to isolate the beta-diketone monomer. The present invention further compositions and products formed from methylene beta-diketone monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).

Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising ?-diketone, ?-ester-ketone, ?-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).

Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).

Abstract: Disclosed herein is a method of manufacturing self assembled structures that have lamellae or cylinders whose longitudinal axis is parallel or perpendicular to a surface upon which the self assembled structure is disposed. The method comprises disposing a random copolymer on the substrate to form a surface modification layer and disposing a block copolymer on the surface modification layer. The block copolymer is then subjected to etching.

Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.

Abstract: Photopolymers are provided with composites and electronic devices including such photopolymers. Specifically, organic thin film transistors comprising a semiconductor layer, a polymeric layer in contact with the semiconductor layer, a gate electrode, a source electrode and a drain electrode are disclosed, wherein the semiconductor layer comprises an organic semiconductor compound, and the polymeric layer comprises a photocrosslinked product of a photopolymer.

Abstract: A composition comprises a distribution of telomers of ethylene and at least one fluoroalkyl or perfluoroalkyl halide, the telomers comprising at least one polymethylene segment (—(CH2)n—) and at least one halomethyl group (—CXH2) and optionally comprising at least one non-fluorine heteroatom, and the halogen being selected from iodine and bromine; wherein the distribution has a number average ratio of methylene moieties of the polymethylene segment to the halomethyl groups of at least about 15.

Abstract: Disclosed herein is a method to produce a semi-crystalline fluoro-polymer film. A semi-crystalline fluoro-polymer material is used. The material is compressed to produce the film. During compression, the material is maintained at a temperature below the melting point of the material. The compression step can be cycled to allow cooling of the material between compression stages. Alternative methods are provided for compressing the material with a co-extrusion substrate, extruding the material and utilizing mandrel expansion for the material.

Abstract: Disclosed therein is a novel cyclic olefin compound having a photoreactive group and a novel photoreactive polymer. The cyclic olefin compound is applicable to various photoreactions, such as of liquid crystal alignment films and can be preferably used as a precursor of different organic compounds or polymers.

Abstract: A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent chain-like hydrocarbon group or alicyclic hydrocarbon group.

Abstract: The present invention relates to a specific photoreactive polymer that shows excellent alignment stability and thermal stability together with excellent liquid crystal alignment, thereby being desirably used in an alignment film of a liquid crystal display device, a compound having a photoreactive functional group that is used as a monomer for the preparation of the photoreactive polymer, and an alignment film.

Abstract: Photopolymer-based dielectric materials are provided with methods for preparing the same. Composites and electronic devices including such dielectric materials also are provided.

Abstract: The present invention provides a fluorinated polymer excellent in the crosslinking reactivity, crosslinked rubber physical properties and chemical resistance, and its crosslinked rubber. A fluorinated polymer comprising repeating units (a) based on at least one monomer selected from the group consisting of ethylenic unsaturated compounds each having a hydroxyphenyl group, repeating units (b) based on at least one fluoromonomer selected from the group consisting of tetrafluoroethylene, hexafluoropropylene, vinylidene fluoride, 3,3,3-trifluoropropene, 1,3,3,3-tetrafluoropropene, 1,1,2-trifluoroethylene, vinyl fluoride, 1,2-difluoroethylene and CF2?CF—O—Rf (wherein Rf is a C1-8 saturated perfluoroalkyl group or a perfluoro(alkoxyalkyl) group) and, if necessary, repeating units (c) based on at least one hydrocarbon monomer selected from the group consisting of ethylene, propylene and CH2?CH—O—R1.

Abstract: To provide a method for producing a melt-processable fluororesin, which is capable of increasing the molecular weight of the fluororesin and preventing coloration of the fluororesin, by using a specific fluorinated emulsifier other than ammonium perfluorooctanoate. A method for producing a melt-processable fluororesin which is characterized in that a fluorinated monomer is emulsion-polymerized in an aqueous medium containing a fluorinated emulsifier of a formula (I) XCF2CF2(O)mCF2CF2OCF2COOA wherein X is a hydrogen atom or a fluorine atom, A is a hydrogen atom, an alkali metal or NH4, and m is an integer of 0 or 1.

Abstract: The present invention relates to, for example, a fluorine-containing cyclic compound represented by the following general formula (1). In the general formula (1), R1a is a C1-C25 cyclic alkyl group, cyclic alkenyl group or cyclic alkynyl group; each of R2 and R3 is independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group; and each of R1a, R2 and R3 may contain fluorine atom, oxygen atom, sulfur atom, nitrogen atom or an atomic group containing a carbon-carbon double bond.

Abstract: Disclosed herein are polymer compounds, a method for preparing thereof. More specifically, provided are polymer compounds with well-connected, narrow size distribution free-volume element and a method for preparing the polymer compounds by thermal rearrangement for aromatic polyimides containing ortho-positioned functional groups in the solid state.

Abstract: To provide a novel fluoroadamantane derivative, a novel polymerizable fluoroadamantane derivative and a novel fluoropolymer, and processes for production thereof. To provide the following compound (3), the following compound (4), a polymer obtained by polymerizing the compound (4) and processes for production thereof: provided that Q represents —CHF— or —CF2— (provided that six Qs may be the same or different), Z represents —H, —F or —CH2OH (provided that three Zs may be the same or different), W represents —H or a C1-10 hydrocarbon group, R represents —H, —F, —CH3 or —CF3, and J represents —H, —F, —CHWOH or —CHWOCOCR?CH2 (provided that three Js may be the same or different).

Abstract: In one embodiment, a copolymer comprises a sulfonatable segment covalently linked to an un-sulfonatable segment through an organic linking group. The sulfonatable group segment may be sulfonated through direction sulfonation or sulfonation through a spacer molecule. In another embodiment, a copolymer comprises a sulfonated segment and an unsulfonated segment. A membrane electrode assembly and a fuel cell may be produced using the copolymer.

Abstract: A process for preparing a halogenated polymer in a medium comprising liquid or supercritical carbon dioxide, comprising a step involving the radical polymerization of at least one halogenated monomer and at least one step involving cross-flow filtration; and a cross-flow filtration device.

Abstract: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Abstract: Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R1 is H or monovalent C1-C20 hydrocarbon group, R2 is H, F, methyl or trifluoromethyl, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, or R3 and R4 may form an aliphatic hydrocarbon ring, and A is a divalent C1-C6 hydrocarbon group.

Abstract: Provided are surface modified contact lenses formed from one or more fumaric- or itaconic-containing prepolymers having polymerizable functionality that is complimentary to polymerizable hydrophilic polymers.

Abstract: The present invention provides a fluoropolymer capable of giving fluorine-containing molded materials and laminates excellent in moldability, productivity, interlaminar bonding and stress cracking resistance, in particular stress cracking resistance upon contacting with various liquid chemicals, without impairing such characteristics intrinsic in fluororesins as chemical resistance, solvent resistance, weathering resistance, antifouling properties, liquid chemical impermeability and nonstickiness. The present invention provides a fluoropolymer which is an oligomer-containing or oligomer-free fluoropolymer, wherein said oligomer has a molecular weight not higher than 10,000 and amounts to not more than 0.05% by mass relative to the fluoropolymer.

Abstract: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Abstract: Provided is a liquid-crystalline, polymerizable vinyl ketone compound of formula (1): Preferably, R1 is hydrogen, halogen, —CN, —CF3, —CF2H, —CFH2, —OCF3, —OCF2H, or alkyl, alkoxy, alkoxyalkyl or alkenyl having from 1 to 10 carbon atoms; R2, R3 and R5 are hydrogen; A1 to A4 are independently 1,4-cyclohexylene, 1,4-cyclohexenylene or 1,4-phenylene where any hydrogen may be substituted with halogen; Z1 to Z3 are independently a single bond, —(CH2)2—, —CH?CH—, —CF?CF—, —OCF2— or —CF2O—; Z4 is a single bond, —(CH2)3— or —(CH2)4—; m, n and q are independently 0, 1 or 2. The uppermost temperature of the liquid crystalline phase of the compound is high, and the compound has good compatibility with other compounds and has the necessary characteristics such as optical anisotropy.

Abstract: Disclosed are a copolymer of a perfluoropolyether derivative and a photosensitive polymer, a composition for forming banks comprising the copolymer, and a method for forming banks using the composition. Also disclosed is an organic thin film transistor including the composition and an electronic device including the organic thin film transistor. The use of the copolymer may enable the formation of banks by a solution coating process. Because an organic thin film transistor including banks formed by the method may be fabricated without any degradation in the characteristics of the organic thin film transistor, improved electronic properties may be exhibited.

Abstract: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Abstract: There is provided an optical material obtained from an organic composition which is suitable for an optical material in optical communication and comprises a fluorine-containing polymer having functional group and a rare earth metal ion, in which the fluorine-containing polymer having functional group has at least one ketone structure in its side chain and a maximum absorption coefficient of not more than 1 cm?1 in each wavelength range of from 1,290 to 1,320 nm, from 1,530 to 1,570 nm and from 600 to 900 nm and the rare earth metal ion is at least one selected from the group consisting of erbium (Er) ion, thulium (Tm) ion, praseodymium (Pr) ion, holmium (Ho) ion, neodymium (Nd) ion, europium (Eu) ion, dysprosium (Dy) ion, samarium (Sm) ion and cerium (Ce) ion.

Abstract: There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): and the formula (14): respectively, wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, Cl or CF3; Rf1 and Rf2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist.

Abstract: There can be obtained a suitable optical material which has a stable structure with a rare earth metal ion while maintaining transparency in a region of from visible light to near infrared light. The optical material is obtained by curing a fluorine-containing resin composition comprising (I) a fluorine-containing prepolymer and (II) a compound containing a rare earth metal ion and/or a rare earth metal element, wherein the fluorine-containing prepolymer (I) is a curable fluorine-containing polymer which: (1) is a non-crystalline polymer having a fluorine content of not less than 25% by weight and (2) has a cure site in a side chain of the polymer and/or at an end of a trunk chain of the polymer.

Abstract: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: There is disclosed a fluorine-containing polymerizable cyclic olefin compound that has one or more partial structures represented by the following general formula (1) or (2).

Abstract: New precursors and processes are disclosed for making fluorinated, low dielectric constant ? thin films that have higher dimensional stability and are more rigid than fluorinated poly (para-xylylenes). The fluorinated, low dielectric constant thin films can be prepared from reactions of an ethylenic-containing precursor with benzocyclobutane-, biphenyl- and/or dieneone-containing precursors. The fluorinated, low dielectric constant thin films are useful for fabrications of future <0.13 ?m integrated circuits (ICs). Using fluorinated, low-dielectric constant thin films prepared according to this invention, the integrity of the dielectric, copper (Cu) and barrier metals, such as Ta, can be kept intact; therefore improving the reliability of the IC.

Abstract: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: A photosensitive polymer including fluorine, a resist composition containing the same and a patterning method for IC fabrication using the resist composition are provided. The photosensitive polymer having at least one selected from the group consisting of fluorine-substituted or unsubstituted alkyl ester, tetrahydropyranyl ester, tetrahydrofuranyl ester, nitrile, amide, carbonyl and hexafluoro alkyl having a hydrophilic group, and a trifluorovinyl derivative monomer as a repeating unit and having a weight average molecular weight of about 3,000 to about 100,000. The photosensitive polymer exhibits high transmittance for a light source of F2 (157 nm), high dry etching resistance, and has characteristics suitable to realize an unitrafine pattern size.

Abstract: New precursors and processes are disclosed for making fluorinated, low dielectric constant ∈ thin films that have higher dimensional stability and are more rigid than fluorinated poly (para-xylylenes). The fluorinated, low dielectric constant thin films can be prepared from reactions of an ethylenic-containing precursor with benzocyclobutane-, biphenyl- and/or dieneone-containing precursors. The fluorinated, low dielectric constant thin films are useful for fabrications of future <0.13 &mgr;m integrated circuits (ICs). Using fluorinated, low-dielectric constant thin films prepared according to this invention, the integrity of the dielectric, copper (Cu) and barrier metals, such as Ta, can be kept intact; therefore improving the reliability of the IC.

Abstract: A fluoropolymer is described which is a polymer reaction product of a fluoropolymer comprising a polymer reaction product of a) at least one first alkylene co-monomer containing at least one fluorine atom; b) optionally at least one monomer selected from 1) at least one second alkylene containing at least one fluorine atom; 2) at least one alkyl alkenyl ether containing at least one fluorine atom; 3) at least one aliphatic or cyclic ketone containing at least one fluorinated alpha-alpha position; or 4) non-fluorinated alkene, alkyl alkenyl ether, or alkenyl ester; and c) at least one sterically hindered alkenyl or alkenyl ether organo silane co-monomer with or without at least one fluorine substituent. The fluoropolymer can be subsequently cross-linked or further reacted. Methods of making the fluoropolymer are further disclosed as well as applications of the fluoropolymers.

Abstract: There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): 1

Abstract: Provided are fluorine-containing compounds, and polymers derived therefrom, for use in compositions used for treating textile substrates. Also provided are methods of making fluorine-containing compounds and polymers derived therefrom, compositions comprising the compounds and/or polymers of the present invention, methods of treating substrates, and the treated products derived therefrom.

Abstract: Highly comfortable hydrophilic contact lenses are made from a coploymer of an ethylenically unsaturated fluoro-sulfone ester, ethylenically unsaturated fluorosulfone ester monomer of acrylic or methacrylic acid having alkyl hydroxy group and N-Vinyl 2-pyrrolidinone and methods for the manufacturing thereof.

Abstract: Fine powders of modified PTFE having a “core-shell” structure; the fine powder being formed by: a “core” of tetrafluoroethylene (TFE) modified by one or more monomers selected from: a) dioxoles; b) one or more perfluorinated monomers which cyclize during the polymerization; a “shell” of TFE modified by perfluoropropene (PFP); the amount, referred to the total core+shell particle, of comonomers 1) in the “core” being in the range 0.01-0.06% by weight; the amount, referred to the total core+shell particle, of perfluoropropene 2) in the “shell” being in the range 0.002-0.06% by weight; the thermal instability index (TII) of the fine powder being equal to or lower than 5, determined according to ASTM D4895.

Abstract: A water- and oil-repellent containing a copolymer of (a) a fluoroalkyl group-containing monomer having a melting point of 60 to 80° C. in the state of a homopolymer, and (b) a hydrophilic group-containing monomer is extremely superior in soil releasability.

Abstract: A composition useful for the extraction of metals and metalloids comprises (a) carbon dioxide fluid (preferably liquid or supercritical carbon dioxide); and (b) a polymer in the carbon dioxide, the polymer having bound thereto a ligand that binds the metal or metalloid; with the ligand bound to the polymer at a plurality of locations along the chain length thereof (i.e., a plurality of ligands are bound at a plurality of locations along the chain length of the polymer). The polymer is preferably a copolymer, and the polymer is preferably a fluoropolymer such as a fluoroacrylate polymer. The extraction method comprises the steps of contacting a first composition containing a metal or metalloid to be extracted with a second composition, the second composition being as described above; and then extracting the metal or metalloid from the first composition into the second composition.

Abstract: A curable coating composition for preparing an anti-static coating contains at least one addition polymerizable ethylenically unsaturated monomer, a perfluoro ionic surfactant, and a polyethoxy or fluorinated polyethoxy auxiliary compound. The perfluoro ionic surfactant and the polyethoxy or fluorinated polyethoxy auxiliary compound are present in the composition in amounts effective to impart static-dissipative properties to polymerized coatings prepared therefrom.

Abstract: The invention relates to a curable fluorine-containing copolymer prepared by copolymerizing a monomer mixture. This monomer mixture is in an amount of 100 mol % in total and includes (a) 10-60 mol % of a first polymerizable monomer that is one of hexafluoroisobutene and hexafluoroacetone, each of which has one hexafluoroisopropylidene group; (b) 10-70 mol % of a fatty acid vinyl ester that is represented by a general formula of CH.sub.2 .dbd.CH--OC (.dbd.O) --R.sup.1 where R.sup.1 is one of an alkyl group and --(CH.sub.2).sub.m --R.sup.2 --(CH.sub.2).sub.n --H where R.sup.

Abstract: An adhesive for bonding together a first substrate made of vinylidene fluoride resin and a second substrate comprises an elastic fluorohydrocarbon resin, a polyisocyanate, and an organic solvent. This elastic fluorohydrocarbon resin is obtained by graft copolymerization of a fluorine-containing copolymer with a vinylidene fluoride monomer. This copolymer is prepared by copolymerizing at least one first fluorine-containing monomer with at least one unsaturated monomer that has peroxy bond. The adhesive itself is superior in durability, and bond strength between the first and second substrates is also superior.