From Fluorine Containing Monomer Patents (Class 526/242)
  • Patent number: 10302293
    Abstract: A light source device includes a LED package, a container where the LED package is arranged and that is filled with nitrogen gas, and a fluorine-based coating film applied on a surface of the LED package and covering a light exit surface of the LED package. The LED package includes a LED element, a base board on which the LED element is mounted, a peripheral wall portion surrounding the LED element and extending from the base board, sealing resin disposed in an inner space within the peripheral wall portion such that the LED element is sealed with the sealing resin, and the light exit surface that is a surface of the sealing resin surrounded by the peripheral wall portion. Light from the LED element is exited outside the sealing resin through the light exit surface.
    Type: Grant
    Filed: October 4, 2016
    Date of Patent: May 28, 2019
    Assignee: SCHNEIDER ELECTRIC JAPAN HOLDINGS LTD.
    Inventors: Yuji Ganaha, Daisuke Nishimatsu
  • Patent number: 10253128
    Abstract: A crosslinking agent includes a compound represented by the following formula (1). In the formula (1), R1, R2, and R3 are independently a fluorine atom, an alkyl group, a fluoroalkyl group, or a substituted or unsubstituted aryl group, a plurality of R1 are identical or different, a plurality of R2 are identical or different, a plurality of R3 are identical or different, provided that at least one of R1, R2, and R3 is a fluorine atom or a fluorine atom-containing group, m is an integer of from 2 to 6, l is an integer of from 0 to 2, and each hydrogen on the benzene ring(s) is optionally substituted with a substituent.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: April 9, 2019
    Assignee: NICHIAS CORPORATION
    Inventors: Tomoya Shimizu, Ayumi Maezawa, Yuriko Sekimoto, Naoya Kuzawa
  • Patent number: 10160777
    Abstract: The invention relates to alkenyl(perfluoroalkyl)phosphinic acids, to the preparation and intermediates thereof, to the use thereof as monomers for the preparation of oligomers and/or polymers, to the corresponding oligomers/polymers, to the corresponding support materials comprising the oligomers/polymers, and to the use thereof as ion exchangers, as catalysts or extraction medium and corresponding salts thereof.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: December 25, 2018
    Assignee: Merck Patent GmbH
    Inventors: Nikolai (Mykola) Ignatyev, Michael Schulte, Karsten Koppe, Vural Bilir, Walter Frank
  • Patent number: 10114155
    Abstract: An optical filter and an imaging device comprising the optical filter are provided. The optical filet comprises: a binder resin; a light absorption containing at least two kinds of light absorbents dispersed in the binder resin; and a near-infrared reflection layer. Further, the light absorbents comprise a first light absorbent having maximum absorption in a wavelength range of 680 to 700 nm and a second light absorbent having maximum absorption in a wavelength range of 700 to 750 nm, a wavelength at which the near-infrared reflection layer has a transmittance of 50% with regard to light incident in a direction perpendicular to the optical filter is in a range of 680 to 730 nm, and the optical filter satisfies [Equation 1] ?E*?1.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: October 30, 2018
    Inventor: Woo Joo Lah
  • Patent number: 10087321
    Abstract: A fluorinated resin composition includes a copolymer (A); and a copolymer (B). A mass ratio (A/B) of the copolymer (A) to the copolymer (B) is from 60/40 to 99/1, and a volume flow rate is from 0.5 to 100 mm3/sec. The copolymer (A) comprises: units derived from a monomer (a) which is tetrafluoroethylene; units derived from a monomer (b) which is at least one member selected from ethylene, hexafluoropropylene and a perfluoro(alkyl vinyl ether). The copolymer (A) has carbonyl groups. The copolymer (B) comprises: units derived from the monomer (a); units derived from the monomer (b); and units derived from the monomer (c) having two or more polymerizable carbon-carbon double bonds. A content of the units derived from the monomer (c) is from 0.1 to 2 mol % based on total units in the copolymer (B).
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: October 2, 2018
    Assignee: AGC Inc.
    Inventors: Tatsuya Terada, Takashi Sato
  • Patent number: 9714360
    Abstract: Provided is a powder coating composition, whereby a cured film excellent in water resistance, chemical resistance and weather resistance, can be formed by single coating operation, wherein a fluorinated resin layer and a polyester layer are layer-separated in the process of melting and curing the powder coating composition. A powder coating composition comprising a fluorinated resin (A), a polyester polymer (B), a curing agent (C) and an ultraviolet absorber (D), wherein the polyester polymer (B) is a polyester polymer comprising units derived from a C8-15 aromatic polybasic carboxylic acid compound and units derived from a C2-10 a polyhydric alcohol compound.
    Type: Grant
    Filed: November 18, 2014
    Date of Patent: July 25, 2017
    Assignee: Asahi Glass Company, Limited
    Inventors: Shun Saito, Kouji Uchida
  • Patent number: 9518151
    Abstract: The present invention belongs to the field of preparation of high performance polymers, and specifically relates to a low dielectric constant polymer containing dinaphthyl and hexafluorocyclobutyl ether units, and preparation method and use thereof. The polymer is prepared as follows: under the effect of an alkali, 1-naphthol bromotetrafluoroethane ether is prepared from 1-naphthol and tetrafluorodibromoethane in an organic solvent, and then reduced by a zinc powder so as to obtain 1-naphthol trifluorovinyl ether. 1-naphthol trifluorovinyl ether is treated at a high temperature to obtain a bisnaphthol hexafluorocyclobutyl ether monomer. The monomer is subjected to oxidative coupling in the presence of ferric trichloride so as to obtain a thermal polymer containing dinaphthyl and hexafluorocyclobutyl structural units with a good film-forming property, and in a nitrogen atmosphere, the temperature for 5% weight loss (Td5%) of the obtained film is 437° C., and the carbon residue yield at 1000° C. is 54.24%.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: December 13, 2016
    Assignee: Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences
    Inventors: Qiang Fang, Chao Yuan, Kaikai Jin, Yingchun Liu, Shen Diao, Kai Li
  • Patent number: 9452960
    Abstract: Described herein is a composition comprising a partially fluorinated compound selected from the group consisting of: (a) I(CF2)xCH2CF2I; (b) ICF2CH2(CF2)xCH2CF2I; (c) I(CF2)yCH?CF2; (d) CF2?CH(CF2)yCH2CF2I; and (e) CF2?CH(CF2)yCH?CF2 wherein x is an odd integer selected from 3 to 11, and y is an integer greater than 2, along with methods of making and polymerizing such compounds.
    Type: Grant
    Filed: November 27, 2013
    Date of Patent: September 27, 2016
    Assignee: 3M Innovative Properties Company
    Inventors: Miguel A. Guerra, Tatsuo Fukushi, Kenneth D. Wilson
  • Patent number: 9266988
    Abstract: A fumaric acid diester based resin containing a dipropyl fumarate residue unit and a fumaric acid diester residue unit having a C1 or C2 alkyl group, wherein in a retardation film composed of the resin, when a refractive index in the fast axis direction within the film plane is designated as nx, a refractive index in the film in-plane direction orthogonal thereto is designated as ny, and a refractive index in the thickness direction of the film is designated as nz, the respective refractive indices are satisfied with a relationship of (nx?ny<nz) and a relationship between a film thickness and an out-of-plane retardation measured at a wavelength of 550 nm and expressed by the specific equation is 4.5 nm/film thickness (?m) or more in terms of an absolute value.
    Type: Grant
    Filed: June 24, 2011
    Date of Patent: February 23, 2016
    Assignee: TOSOH CORPORATION
    Inventors: Kenichi Makita, Shinji Shimosato, Shinsuke Toyomasu, Tohru Doi
  • Patent number: 9206552
    Abstract: A core/shell particle is provided, comprising: a water-absorbent, dye-fixing polymeric core, comprising: (a) a multivalent cation and a polymerization product of a monoethylenically unsaturated carbonyl-group containing monomer; (b) a nitrogen-containing polymer; or (c) a combination of (a) and (b); and a water-insoluble, porous polymeric shell, surrounding all or a portion of said core. A paper sizing or coating composition which incorporates the core/shell particles is provided. Recording sheets which include the composition, methods of making the composition and recording sheets, and methods for making an image are provided.
    Type: Grant
    Filed: February 17, 2012
    Date of Patent: December 8, 2015
    Assignee: INTERNATIONAL PAPER COMPANY
    Inventors: Michael F. Koenig, Timothy J. Bradford
  • Publication number: 20150147698
    Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20150147696
    Abstract: Provided is a method for producing a polymer compound that has very low contents of impurities such as metal components and exhibits excellent storage stability. The production method gives such a polymer compound. The polymer compound is incorporated into a photoresist resin composition. The method for producing a polymer compound includes the step of filtering a resin solution containing a polymer compound through a filter. The filter is approximately devoid of strongly acidic cation-exchange groups and develops a positive zeta potential. The polymer compound includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) includes at least one monomer units represented by Formulae (a1) to (a3). The monomer unit (b) contains a group capable of releasing a moiety thereof by the action of an acid to develop solubility in an alkali.
    Type: Application
    Filed: July 26, 2013
    Publication date: May 28, 2015
    Applicant: DAICEL CORPORATION
    Inventors: Akira Eguchi, Masamichi Nishimura
  • Patent number: 9040596
    Abstract: An ion conducting membrane for fuel cells involves coupling a compound having a sulfonic acid group with a polymeric backbone. Each of the compounds having a sulfonic acid group and the polymeric backbone are first functionalized with a halogen.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: May 26, 2015
    Assignee: GM Global Technology Operations LLC
    Inventors: Timothy J. Fuller, Lijun Zou, Michael R. Schoeneweiss
  • Publication number: 20150132688
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Application
    Filed: January 26, 2015
    Publication date: May 14, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Natsumi YOKOKAWA, Shuji HIRANO, Hiroo TAKIZAWA, Wataru NIHASHI
  • Patent number: 9023962
    Abstract: A process of synthesizing poly(2,3,3,3-tetrafluoropropene), comprising reacting 2,3,3,3-tetrafluoropropene monomers in a reaction medium in the presence of an initiator, wherein the initiator is added to the reaction medium in multiple portions at different times during the process.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: May 5, 2015
    Assignee: Honeywell International Inc.
    Inventors: Changqing Lu, Andrew J. Poss, Rajiv R. Singh, David Nalewajek, Cheryl Cantlon
  • Patent number: 9018306
    Abstract: There is provided a curable fluorine-containing polymer composition which is rapidly cured at relatively low temperature by hydrosilylation reaction to form a coating film having not only high hardness and flexibility but also water- and oil-repellency, thereby giving stain-proofing effect for a long period of time, especially maintaining property of removing and wiping-off stain.
    Type: Grant
    Filed: June 9, 2008
    Date of Patent: April 28, 2015
    Assignees: Dow Corning Corporation, Daikin Industries, Ltd.
    Inventors: Masayuki Hayashi, Eiji Kitaura, Peter Cheshire Hupfield, Katsuhiko Imoto, Masaru Nagato
  • Patent number: 9000110
    Abstract: A compound represented by the following formula (a): CH2?CR1—CONJ-CGR2—(CH2)n—COO-Q1-Rf1??(a) is provided. This compound is capable of forming a polymer having an oil repellency equivalent to polymers containing a polyfluoroalkyl group containing at least 8 carbon atoms, although the polyfluoroalkyl group contains up to 6 carbon atoms. In the formula, R1 is hydrogen atom or methyl group, R2 is hydrogen atom or a group represented by —(CH2)m—COO-Q2-Rf2 (r), n and m are independently an integer of 0 to 4, Rf1 and Rf2 are independently a polyfluoroalkyl group or a polyfluoroether group containing 1 to 6 carbon atoms, Q1 and Q2 are independently single bond or a divalent linkage group, J is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms, and G is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: April 7, 2015
    Assignee: AGC Seimi Chemical Co., Ltd.
    Inventors: Fusae Ishiwata, Ryo Hirabayashi, Hirotaka Shimizu
  • Patent number: 8992733
    Abstract: Disclosed is a water and oil resistant agent comprising a fluorine-containing copolymer obtained by copolymerizing a (meth)acrylate monomer having a polyfluoroalkyl group having 1 to 6 carbon atoms, the agent being able to afford a superior water and oil resistance to a paper. The invention also discloses a composition comprising the water and oil resistant agent, a process for treating a paper thereby and a treated paper thereby.
    Type: Grant
    Filed: February 14, 2011
    Date of Patent: March 31, 2015
    Assignee: Daikin Industries, Ltd.
    Inventors: Tetsuya Uehara, Kensuke Mohara, Eiji Masuda, Kayo Kusumi, Michio Matsuda
  • Patent number: 8969437
    Abstract: The invention provides a compound which is useful in production of a fluoropolymer and easy to be removed from the produced fluoropolymer, a method of producing the compound, and a method of producing a fluoropolymer using the compound. The invention provides a compound which is represented by Rf1—CH2O—CF2—CHF—Rf2—X, wherein Rf1 represents a fluoroalkyl group containing 1 to 5 carbon atoms, Rf2 represents a fluoroalkylene group containing 1 to 3 carbon atoms, X represents —COOM or —SO3M, and M represents one of H, K, Na, and NH4.
    Type: Grant
    Filed: January 18, 2013
    Date of Patent: March 3, 2015
    Assignee: Daikin Industries, Ltd.
    Inventors: Nobuhiko Tsuda, Akinari Sugiyama
  • Patent number: 8969500
    Abstract: The present disclosure describes fluoropolymers having long chain branches and methods of making these fluoropolymers. These fluoropolymers may have improved melt processing properties. Shaped articles containing these fluoropolymers are also provided.
    Type: Grant
    Filed: April 24, 2008
    Date of Patent: March 3, 2015
    Assignee: 3M Innovative Properties Company
    Inventors: Klaus Hintzer, Harald Kaspar
  • Patent number: 8956640
    Abstract: A block copolymer comprising a methoxyethyl methacrylate (MOEMA) midblock is provided for forming a coating a medical device for controlled release of a bioactive agent.
    Type: Grant
    Filed: June 29, 2006
    Date of Patent: February 17, 2015
    Assignee: Advanced Cardiovascular Systems, Inc.
    Inventor: Thierry Glauser
  • Patent number: 8945712
    Abstract: A polymeric or oligomeric composition comprising at least one first divalent unit represented by formula: and at least one of a second divalent unit comprising a pendant phosphonate group —P(O)(OY)2 or a monovalent unit comprising a thioether linkage and a terminal Z group, wherein each Z group is independently —P(O)(OY)2 or —O—P(O)(OY)2. Rf is a perfluoropolyether group. Q is a bond, —C(O)—N(R1)—, or —C(O)—O—. R?, R??, R and R1 are each independently hydrogen and alkyl having from 1 to 4 carbon atoms. X is alkylene, arylalkylene, and alkylarylene, wherein alkylene, arylalkylene, and alkylarylene are each optionally interrupted by at least one ether linkage. Y is hydrogen, alkyl, trialkylsilyl, and a counter cation. Methods of treating a surface using these compositions and articles with a surface in contact with these compositions are provided. Methods of making these compositions are also provided.
    Type: Grant
    Filed: June 5, 2008
    Date of Patent: February 3, 2015
    Assignee: 3M Innovative Properties Company
    Inventors: Rudolf J. Dams, Steven J. Martin, Mark J. Pellerite, Chetan P. Jariwala, Gregory D. Clark, Jason T. Petrin
  • Patent number: 8927666
    Abstract: The present invention relates to the polymerization and copolymerization of monomers in the presence of fluorinated propylene solvents. More particularly, the present invention relates to the use of polymerization mediums suitable to polymerize one or more monomers to form polymers and/or copolymers, with a tetrafluoropolypropylene being used as a solvent or diluent for the one or more monomers.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: January 6, 2015
    Assignee: Honeywell International Inc.
    Inventors: Raymond H. Thomas, Hang T. Pham, Rajiv R. Singh
  • Patent number: 8901264
    Abstract: To provide a copolymer which can impart sufficient dynamic water repellency, after air-drying water repellency and friction durability to a surface of an article, and which has low impact on the environment, a method for producing the same, a water repellent composition and an article excellent in dynamic water repellency, after air-drying water repellency and friction durability.
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: December 2, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazunori Sugiyama, Toyomichi Shimada, Nobuyuki Otozawa, Yuuichi Oomori, Minako Shimada
  • Patent number: 8889796
    Abstract: There is provided a perfluoroelastomer composition having a low glass transition temperature and excellent cold resistance and heat resistance and comprising a perfluoroelastomer comprising a tetrafluoroethylene unit (a), a perfluoro vinyl ether unit (b) and a cure site unit (c) having nitrile group, carboxyl group and/or alkoxycarbonyl group as a cure site, wherein the perfluoro vinyl ether unit (b) is contained in an amount of 8 to 23% by mole in the perfluoroelastomer.
    Type: Grant
    Filed: October 2, 2009
    Date of Patent: November 18, 2014
    Assignee: Daikin Industries, Ltd.
    Inventors: Junpei Terada, Tatsuya Morikawa, Daisuke Ota, Meiten Koh
  • Patent number: 8877870
    Abstract: A fluorinated elastic copolymer which has iodine atoms, bromine atoms, or both iodine and bromine atoms, at its molecular terminals and which includes repeating units (a) based on tetrafluoroethylene, repeating units (b) based on a fluorinated monomer having one polymerizable unsaturated bond (provided that tetrafluoroethylene is excluded), and repeating units (c) based on a fluorinated monomer having at least two polymerizable unsaturated bonds, wherein the ratio (molar ratio) of the repeating units (a) to the repeating units (b) is (a)/(b)=40/60 to 90/10, and the proportion of the repeating units (c) based on the total amount of the repeating units (a) and the repeating units (b) is from 0.01 to 1 mol %.
    Type: Grant
    Filed: July 15, 2011
    Date of Patent: November 4, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Hiroshi Funaki, Kunio Watanabe, Keigo Matsuura, Ng Soon Yeng
  • Patent number: 8871881
    Abstract: The invention at hand concerns hydrophobic polymer surfaces, in particular superhydrophobic polymer surfaces, comprising at least one homo- or copolymer, which comprises at least one side chain with at least one fluoro-substituted aryl group. Furthermore, the invention at hand concerns a method for the production of polymer surfaces of this type, their use and polymers of the general formula I: wherein n is an integer between 10 and 4,500, preferably between 20 and 2,200 and particularly preferably between 100 and 670.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: October 28, 2014
    Assignee: Philipps-Universität Marburg
    Inventors: Andreas Greiner, Seema Agarwal, Michael Bognitzki, Sven Horst
  • Patent number: 8871882
    Abstract: A method for the preparation of a fluoropolymer by means of emulsion polymerization of a reaction mixture in an aqueous medium is disclosed wherein the reaction mixture includes a fluoromonomer having the structure of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring; b) an emulsion stabilizer combination comprising: i) an anionic surfactant; and, ii) a cationic surfactant or a non-ionic surfactant; and, c) a free-radical initiator.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: October 28, 2014
    Assignee: Akron Polymer Systems, Inc.
    Inventors: Xiaoliang Zheng, Dong Zhang, Jiaokai Jing, Ted Calvin Germroth, Frank W. Harris, Thauming Kuo, Bin Wang, Douglas Stephens McWilliams
  • Publication number: 20140314826
    Abstract: The invention provides a method for inhibiting bacterial attachment to a surface, the method comprising forming the surface from a polymer, or applying a polymer to the surface, wherein the polymer is a homopolymer formed from a (meth) acrylate or (meth) acrylamide monomer or a copolymer formed from one or more (meth) acrylate or (meth) acrylamide monomers, wherein the (meth) acrylate or (meth) acrylamide monomers are of formula (I) or (II): [H2C?CR?—C(?O)—O—]nR??(I) [H2C?CR?—C(?O)—NH—]nR??(II) wherein n is 1, 2 or 3, R? is independently H or CH3, R is an organic group having a total of from 2 to 24 carbon atoms, wherein the organic group includes an aliphatic or aromatic hydrocarbon moiety and wherein the organic group does not include any hydroxyl groups.
    Type: Application
    Filed: May 4, 2012
    Publication date: October 23, 2014
    Applicants: MASSACHUSETTS INSTITUTE OF TECHNOLOGY, THE UNIVERSITY OF NOTTINGHAM
    Inventors: Paul Williams, Morgan Russell Alexander, Martyn Christopher Davies, Robert Langer, Daniel Griffith Anderson
  • Patent number: 8829130
    Abstract: A resin composition including an aromatic polyether ketone resin (I), and a fluororesin (II), the fluororesin (II) being a copolymer of tetrafluoroethylene and a perfluoroethylenic unsaturated compound represented by the following formula (I): CF2?CF—Rf1??(1) wherein Rf1 represents —CF3 or—ORf2, and Rf2 represents a C1 to C5 perfluoroalkyl group; the composition containing the aromatic polyether ketone resin (I) and the fluororesin (II) at a mass ratio (I):(II) of 95:5 to 50:50; the fluororesin (II) being dispersed as particles in the aromatic polyether ketone resin (I) and having an average dispersed particle size of 3.0 ?m or smaller.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: September 9, 2014
    Assignees: Tsinghua University, Daikin Industries, Ltd.
    Inventors: Xuming Xie, Haruhisa Masuda
  • Patent number: 8822588
    Abstract: A fluorine-containing polymer has a repeating unit of the general formula (2) and is produced by homopolymerization or copolymerization with another polymerizable double bond-containing monomer. In general formula (2), W represents a linking group; R1 each independently represents a perfluoroalkyl group; Q represents a unit structure formed by cleavage of a double bond of a polymerizable double bond-containing group; and M+ represents a hydrogen cation, a metal ion or a quaternary ammonium ion.
    Type: Grant
    Filed: June 10, 2009
    Date of Patent: September 2, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Yoshiharu Terui, Haruhiko Komoriya, Susumu Inoue, Takashi Kume
  • Publication number: 20140242519
    Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are a monovalent hydrocarbon group, R4 to R9 are hydrogen or a monovalent hydrocarbon group, R10 is a monovalent hydrocarbon group or fluorinated hydrocarbon group, A1 is a divalent hydrocarbon group, k1 is 0 or 1, and n1A is 0, 1 or 2. A resist composition comprising the polymer displays a high dissolution contrast during organic solvent development.
    Type: Application
    Filed: February 3, 2014
    Publication date: August 28, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama
  • Patent number: 8815490
    Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: August 26, 2014
    Assignee: JSR Corporation
    Inventors: Yasuhiko Matsuda, Tomohisa Fujisawa, Yukari Hama, Takanori Kawakami
  • Publication number: 20140212813
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Application
    Filed: April 2, 2014
    Publication date: July 31, 2014
    Applicant: JSR CORPORATION
    Inventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
  • Publication number: 20140212810
    Abstract: A polymer comprising recurring units (a) of styrene having an HFA group and an ester group adjacent thereto and recurring units (b) having a hydroxyl group is used as base resin to formulate a negative resist composition. The negative resist composition has a high dissolution contrast in alkaline developer, high sensitivity, high resolution, good pattern profile after exposure, and a suppressed acid diffusion rate.
    Type: Application
    Filed: December 23, 2013
    Publication date: July 31, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Daisuke Domon
  • Patent number: 8765355
    Abstract: A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.
    Type: Grant
    Filed: April 27, 2012
    Date of Patent: July 1, 2014
    Assignee: JSR Corporation
    Inventors: Takakazu Kimoto, Mitsuo Sato, Yusuke Asano, Tomohiro Kakizawa
  • Publication number: 20140161993
    Abstract: Disclosed therein are an acrylate compound having a photoreactive group, a photoreactive acrylate polymer, and a photo-alignment layer comprising the same that not only have excellences in alignment properties and alignment rate and readiness for change in the alignment direction based on the polarization direction of radiation but also exhibit a high solubility to organic solvents and good workability.
    Type: Application
    Filed: November 29, 2013
    Publication date: June 12, 2014
    Applicant: LG CHEM, LTD.
    Inventors: Dong-Woo Yoo, Sung-Ho Chun, Dai-Seung Choi
  • Patent number: 8748549
    Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer and a fluorinated copolymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(M)COO(CH2)nPhCOO(CH2)mCrF2r+1??(I) (in the formula (I), M is a hydrogen atom, a methyl group or a halogen atom, n is an integer of from 0 to 2, Ph is a phenylene group, m is an integer of from 1 to 4, and r is an integer of from 1 to 6).
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: June 10, 2014
    Assignee: Asahi Glass Company, Limited
    Inventor: Taiki Hoshino
  • Patent number: 8741409
    Abstract: Blended release materials including a blend of a fluoro-functional silicone release polymer and a fluoropolymer are described. Exemplary fluoropolymers include fluoroolefin-based polymers and linear fluoropolymers including linear fluoroacryaltes. Articles including such release materials such as release liners, and adhesive articles, including silicone adhesive articles, are also described.
    Type: Grant
    Filed: September 25, 2013
    Date of Patent: June 3, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Jayshree Seth, Zai-Ming Qiu, Marie A. Boulos, Michael A. Semonick, Ramesh C. Kumar
  • Patent number: 8735520
    Abstract: A process for producing vinyl fluoride polymer comprising polymerizing vinyl fluoride in an aqueous polymerization medium containing initiator and halogen-free surfactant with a critical micelle concentration of less than about 0.05 weight percent at 25° C. The halogen-free surfactant is present in the aqueous polymerization medium in an amount less than about 0.1 weight percent based on the weight of the aqueous polymerization medium. The aqueous polymerization medium is essentially free of halogen-containing surfactant. An aqueous dispersion comprising vinyl fluoride polymer particles present in a range of from about 5 to about 40 weight percent based on the weight of the aqueous phase, wherein said vinyl fluoride polymer particles have a Dv(50) of less than about 20 microns, and halogen-free surfactant, wherein said halogen-free surfactant is present in said aqueous dispersion in an amount less than 0.1 weight percent based on the weight of the aqueous phase.
    Type: Grant
    Filed: October 19, 2011
    Date of Patent: May 27, 2014
    Assignee: E.I. du Pont de Nemours and Company
    Inventor: Ronald Earl Uschold
  • Publication number: 20140141343
    Abstract: A polymeric compound having a backbone structure including an addition product of a (meth)acrylate compound and a nucleophile of a cobalt porphyrin complex including a tetraphenylporphyrin derivative represented by Formula 1 coordinated to a cobalt metal, wherein substituents R1 to R4 are as described in the specification, an oxygen permeable membrane including the polymeric compound, and an electrochemical device including the oxygen permeable membrane.
    Type: Application
    Filed: December 20, 2012
    Publication date: May 22, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Niroyuki NISHIDE, Satoshi NAKAJIMA, Yuichi AIHARA
  • Patent number: 8728623
    Abstract: Articles such as optical displays and protective films, comprising a (e.g. light transmissive) substrate having a surface layer comprising the reaction product of a mixture comprising a hydrocarbon-based hardcoat composition and at least one perfluoropolyether urethane additive. The surface layer exhibits low lint attraction in combination with high contact angles. Hardcoat coating compositions comprising a perfluoropolyether urethane additive and a silicone (meth)acrylate additive are also described.
    Type: Grant
    Filed: August 19, 2008
    Date of Patent: May 20, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Richard J. Pokorny, Thomas P. Klun
  • Patent number: 8716385
    Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: May 6, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto
  • Patent number: 8710149
    Abstract: This invention pertains to a thermoplastic fluoropolymer composition comprising: at least one thermoplastic hydrogen-containing fluoropolymer [polymer (A)]; and from 0.1 to 10% by weight of (A) of at least one per(halo)fluoropolymer chosen among tetrafluoroethylene (TFE) copolymers having a dynamic viscosity at a shear rate of 1 rad sec?1 of less than 10 Pa sec at a temperature of 280° C. [polymer (B)]. The addition of a TFE copolymer [polymer (B)] of low melt viscosity advantageously enables improvement of rheological behavior of thermoplastic hydrogen-containing fluoropolymer (A), making possible processing in less severe conditions and yielding final parts with outstanding surface aspect and good homogeneity and coherency. Still objects of the invention are a process for manufacturing said thermoplastic fluoropolymer composition and the articles, such as shaped articles, films, cable sheathing, pipes, flexible pipes, hollow bodies comprising said thermoplastic fluoropolymer composition.
    Type: Grant
    Filed: April 23, 2007
    Date of Patent: April 29, 2014
    Assignee: Solvay Solexis S.p.A.
    Inventors: Julio Abusleme, Alessio Marrani
  • Patent number: 8703383
    Abstract: A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: April 22, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Emad Aqad, Su Jin Kang, Owendi Ongayi
  • Patent number: 8697903
    Abstract: A fluorinated ester monomer is provided having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are H or a monovalent hydrocarbon group, or R2 and R3 forms a hydrocarbon ring, R4 is a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: April 15, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeshi Kinsho, Yuuki Suka, Yuji Harada, Koji Hasegawa, Takeshi Sasami
  • Patent number: 8691491
    Abstract: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
    Type: Grant
    Filed: April 26, 2011
    Date of Patent: April 8, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Shinichi Sumida, Haruhiko Komoriya, Kazuhiko Maeda
  • Patent number: 8686098
    Abstract: A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.
    Type: Grant
    Filed: May 20, 2010
    Date of Patent: April 1, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Kazunori Mori, Yuji Hagiwara, Masashi Nagamori, Yoshimi Isono, Satoru Narizuka, Kazuhiko Maeda
  • Patent number: 8679636
    Abstract: Presently described is a composition comprising at least one first divalent unit comprising a pendant perfluoropolyether or perfluoroalkyl group; at least one second divalent unit comprising a pendant phosphorus-containing acid group; and at least one third unit comprising a terminal or pendant alkoxy silane group. Also described is a coating comprising the composition described herein dissolved or dispersed in a solvent and a method of providing a coated article or surface. Such method is particularly useful for providing corrosion protection to a metallic surface.
    Type: Grant
    Filed: October 20, 2011
    Date of Patent: March 25, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Suresh Iyer, David A. Hesselroth, Richard M. Flynn, Karl J. Manske
  • Publication number: 20140080064
    Abstract: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a composition comprising a copolymer comprising recurring units derived from a styrene, indene, benzofuran or benzothiophene monomer having 1,1,1,3,3,3-hexafluoro-2-propanol, and recurring units derived from a styrene, vinylnaphthalene, indene, benzofuran, benzothiophene, stilbene, styrylnaphthalene or dinaphthylethylene monomer and an ether solvent.
    Type: Application
    Filed: September 10, 2013
    Publication date: March 20, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Jun Hatakeyama