Alcohol Derived Portion Of Ester Contains Ether Group Patents (Class 526/246)
  • Patent number: 10087128
    Abstract: To provide a novel fluorinated aromatic compound having at least two carbon-carbon unsaturated bonds, a method for its production, a curable material comprising the fluorinated aromatic compound, a cured product thereof, and an optical member. The fluorinated aromatic compound is represented by formula (A), wherein n is an integer of 0 to 6, a is an integer of 0 to 5, b is an integer of 0 to 4, c is an integer of 0 to 4, a+c+n is 2 to 6, a+b is 2 to 9, Z is a single bond, —O—, —S—, —CO—, —C(CH3)2—, —C(CF3)2—, —SO—, or —SO2—, Rf1 is a C1-8 fluoroalkyl group, Y1 and Y2 are each independently a group represented by formula (1) (s is 0 or 1, and R1, R2, R3, and R4 are each independently a hydrogen atom or a fluorine atom), and F in the aromatic ring indicates that hydrogen atoms in the aromatic ring are all substituted by fluorine atoms.
    Type: Grant
    Filed: January 27, 2016
    Date of Patent: October 2, 2018
    Assignee: AGC Inc.
    Inventors: Hiromasa Yamamoto, Akinobu Kunimoto, Norihide Sugiyama
  • Patent number: 9869930
    Abstract: A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C1 to C12 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A3-X1-(A4-X2)a-(A5)b-, * represents a binding site to an oxygen atom, A2, A3, A4 and A5 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, W1 represents a C5 to C18 divalent alicyclic hydrocarbon group, a represents 0 or 1, and b represents 0 or 1.
    Type: Grant
    Filed: November 10, 2015
    Date of Patent: January 16, 2018
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Yuichi Mukai, Koji Ichikawa
  • Patent number: 9221939
    Abstract: The invention provides a fluoro-containing ether monomer for fabricating contact lenses represented by following formula (I): In formula (I), R10 is fluoroalkyl group (CxFyHz, wherein x is an integer of 2-20, y to is an integer of 5-30, and y+z=2x+1), R11 is oxygen, nitrogen or sulfur; R12 is C1-C3 alkylene; n is an integer of 3-40.
    Type: Grant
    Filed: June 14, 2013
    Date of Patent: December 29, 2015
    Assignee: BenQ Materials Corporation
    Inventor: Fan-Dan Jan
  • Patent number: 9000110
    Abstract: A compound represented by the following formula (a): CH2?CR1—CONJ-CGR2—(CH2)n—COO-Q1-Rf1??(a) is provided. This compound is capable of forming a polymer having an oil repellency equivalent to polymers containing a polyfluoroalkyl group containing at least 8 carbon atoms, although the polyfluoroalkyl group contains up to 6 carbon atoms. In the formula, R1 is hydrogen atom or methyl group, R2 is hydrogen atom or a group represented by —(CH2)m—COO-Q2-Rf2 (r), n and m are independently an integer of 0 to 4, Rf1 and Rf2 are independently a polyfluoroalkyl group or a polyfluoroether group containing 1 to 6 carbon atoms, Q1 and Q2 are independently single bond or a divalent linkage group, J is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms, and G is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: April 7, 2015
    Assignee: AGC Seimi Chemical Co., Ltd.
    Inventors: Fusae Ishiwata, Ryo Hirabayashi, Hirotaka Shimizu
  • Publication number: 20140371410
    Abstract: The invention provides a fluoro-containing ether monomer for fabricating contact lenses represented by following formula (I): In formula (I), R10 is fluoroalkyl group (CxFyHz, wherein x is an integer of 2-20, y to is an integer of 5-30, and y+z=2x+1), R11 is oxygen, nitrogen or sulfur; R12 is C1-C3 alkylene; n is an integer of 3-40.
    Type: Application
    Filed: June 14, 2013
    Publication date: December 18, 2014
    Inventor: Fan-Dan JAN
  • Patent number: 8901264
    Abstract: To provide a copolymer which can impart sufficient dynamic water repellency, after air-drying water repellency and friction durability to a surface of an article, and which has low impact on the environment, a method for producing the same, a water repellent composition and an article excellent in dynamic water repellency, after air-drying water repellency and friction durability.
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: December 2, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazunori Sugiyama, Toyomichi Shimada, Nobuyuki Otozawa, Yuuichi Oomori, Minako Shimada
  • Patent number: 8829087
    Abstract: Embodiments in accordance with the present invention provide polymers for forming layers/films useful in the manufacture of a variety of types of optoelectronic displays. Such embodiments also provide compositions of such polymers for forming such layers/films where the formed layers/films have high transparency over the visible light spectrum.
    Type: Grant
    Filed: December 9, 2011
    Date of Patent: September 9, 2014
    Assignees: Promerus, LLC, Sumitomo Bakelite Co., Ltd.
    Inventors: Osamu Onishi, Larry F. Rhodes, Nobuo Tagashira
  • Publication number: 20140242521
    Abstract: A copolymer includes the polymerized product of a comonomer and a monomer having the formula (I): wherein c is 0, 1, 2, 3, 4, or 5; Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently an unsubstituted or substituted C1-10 linear or branched alkyl group, an unsubstituted or substituted C3-10 cycloalkyl group, an unsubstituted or substituted C3-10 alkenylalkyl group, or an unsubstituted or substituted C3-10 alkynylalkyl group; wherein Rx and Ry together optionally form a ring; and Rz is a C6-20 aryl group substituted with an acetal-containing group or a ketal-containing group, or a C3-C20 heteroaryl group substituted with an acetal-containing group or a ketal-containing group, wherein the C6-20 aryl group or the C3-C20 heteroaryl group can, optionally, be further substituted. Also described are a photoresist including the copolymer, a coated substrate having a layer of the photoresist, and a method of forming an electronic device utilizing the photoresist.
    Type: Application
    Filed: February 21, 2014
    Publication date: August 28, 2014
    Inventors: Owendi Ongayi, James W. Thackeray, James F. Cameron
  • Patent number: 8765357
    Abstract: The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, A2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A1 represents a group represented by the formula (a-g1): A10-X10sA11-??(a-g1) wherein A10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A11 represents a C1-C5 aliphatic hydrocarbon group, X10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and a photoresist composition comprising the resin and an acid generator.
    Type: Grant
    Filed: April 16, 2012
    Date of Patent: July 1, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Tatsuro Masuyama, Koji Ichikawa
  • Publication number: 20140179888
    Abstract: The present invention relates to a method of removing and preventing water and condensate blocks in wells by contacting a subterranean formation with a composition comprising a low molecular weight fluorinated copolymer having perfluoro alkyl moieties which are no longer than C6. A fluorinated copolymer of low molecular weight of about 50,000 g/mol and a method of preparing the same are also disclosed.
    Type: Application
    Filed: February 26, 2014
    Publication date: June 26, 2014
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Cheryl Lynn Iaconelli, Gerald Oronde Brown, Christopher James Martin, Erick J. Acosta
  • Publication number: 20140125938
    Abstract: The present invention relates to polymerizable compounds, liquid-crystalline media containing the compounds, in particular liquid crystal (LC) media and LC displays having a polymer-stabilized blue phase, and also LC media for LC displays of the PS or PSA type (“polymer-sustained” or “polymer-sustained alignment”).
    Type: Application
    Filed: May 15, 2012
    Publication date: May 8, 2014
    Applicant: MERCK PATENT GMBH
    Inventors: Michael Wittek, Norihiko Tanaka, Andreas Taugerbeck
  • Patent number: 8637601
    Abstract: There is provided a fluorine-containing polymer having an ionic group which has a heteroaromatic ring and is useful as a material comprising various heteroaromatic ring compounds having a stable fluorine-containing heteroaromatic ring, and further fluorine-containing polymer having a heteroaromatic ring which is useful as a starting material of the above-mentioned polymer or a curing agent. Also, there is provided a fluorine-containing polymer having a heteroaromatic ring such as imidazole in its side chain, a polymer salt thereof, and a polymer composition comprising such a polymer and a polymer salt and a nano filler.
    Type: Grant
    Filed: July 3, 2012
    Date of Patent: January 28, 2014
    Assignee: Daikin Industries, Ltd.
    Inventors: Yuzo Komatsu, Haruhiko Mohri, Hirokazu Aoyama
  • Patent number: 8629089
    Abstract: Method comprising contacting a hydrocarbon-bearing formation with a composition comprising solvent and a fluoropolyether compound, wherein the fluoropolyether compound comprises at least one first divalent unit represented by formula: Each Rf is independently selected from the group consisting of Rfa—(O)t—CHL?-(CF2)n—; [Rfa—(O)t—C(L)H—CF2)—O]m—W—; Rfb—O—(CF2)p-; F(CkF2k)—(O—CkF2K(p—O—CF2—; and CF3—O—(CF2)3—OCF(CF3)—CF2)z—O-L1-. Treated hydrocarbon-bearing formations are also disclosed.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: January 14, 2014
    Assignee: 3M Innovative Properties Company
    Inventor: Rudolf J. Dams
  • Patent number: 8628855
    Abstract: Presently described are articles, such as optical displays and protective films, comprising a (e.g. light transmissive) substrate having a surface layer comprising the reaction product of a mixture comprising a non-fluorinated binder precursor (e.g. of a hardcoat composition) and at least one polymerizable perfluoropolyether polymer. The resulting cured surface layer can advantageously exhibit low lint attraction in combination with low surface energy. Also described are one-step and two-step methods of synthesizing perfluoropolyether polymers having polymerizable ethylenically unsaturated groups.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: January 14, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Encai Hao, Zai-Ming Qiu, Yu Yang, Thomas P. Klun
  • Patent number: 8609745
    Abstract: The invention provide a new lens curing method for making hydrogel contact lenses. The new lens curing method is based on actinically-induced step-growth polymerization. The invention also provides hydrogel contact lenses prepared from the method of the invention and fluid compositions for making hydrogel contact lenses based on the new lens curing method. In addition, the invention provide prepolymers capable of undergoing actinically-induced step-growth polymerization to form hydrogel contact lenses.
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: December 17, 2013
    Assignee: Novartis AG
    Inventors: Arturo Norberto Medina, Dawn Alison Smith, Robert Scott
  • Patent number: 8557939
    Abstract: To provide an antifouling composition which is a fluorine-type antifouling composition using a short chain perfluoroalkyl group and which is excellent in antifouling properties and water/oil repellency and presents good durability against washing. An antifouling composition comprising a fluorocopolymer which comprises from 30 to 65 mass % of polymerized units (a) having a C1-6 perfluoroalkyl group, from 1 to 67 mass % of polymerized units (b1) having —(C2H4O)— and from 3 to 34 mass % of polymerized units (b2) having —(C4H8O)—, wherein the content of —(C2H4O)— is from 20 to 65 mass %, and the content of —(C4H8O)— is from 2 to 13 mass %.
    Type: Grant
    Filed: November 20, 2009
    Date of Patent: October 15, 2013
    Assignee: Asahi Glass Company, Limited
    Inventors: Hiroyuki Hara, Shuichiro Sugimoto, Takao Hirono, Takashige Maekawa
  • Patent number: 8558024
    Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(M)COO(CH2)nPhXPhZCrF2r+1??(I) (in the formula (I), M is a hydrogen atom, a methyl group or a halogen atom, n is an integer of from 0 to 2, Ph is a phenylene group, X is CH2O or OCH2, Z is a single bond, a C1-4 alkylene group containing an etheric oxygen atom, or COO(CH2)m (wherein m is an integer of from 1 to 4), and r is an integer of from 1 to 6).
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: October 15, 2013
    Assignee: Asahi Glass Company, Limited
    Inventor: Taiki Hoshino
  • Patent number: 8530598
    Abstract: A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.
    Type: Grant
    Filed: January 12, 2012
    Date of Patent: September 10, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Masaru Takeshita, Yasuhiro Yoshii
  • Publication number: 20130210957
    Abstract: Disclosed is an activation energy ray-curable resin composition comprising 70 to 95 parts by mass of a multifunctional monomer (A) which has a surface free energy of 37 mJ/m2 or more when cured and 5 to 30 parts by mass of a fluorine (meth)acrylate (B) which is compatible with the multifunctional monomer (A) (a total content of all monomers in the composition shall be 100 parts by mass), wherein the multifunctional monomer (A) has three or more radical polymerizable functional groups in a molecule and a value of a molecular weight thereof divided by the number of the radical polymerizable functional group (molecular weight/number of radical polymerizable functional group) is 110 to 200, and wherein the fluorine (meth)acrylate (B) has one or more radical polymerizable functional groups in a molecule.
    Type: Application
    Filed: April 4, 2011
    Publication date: August 15, 2013
    Applicant: Mitsubishi Rayon Co., Ltd
    Inventors: Tsuyoshi Takihara, Hiroshi Onomoto, Eiko Okamoto
  • Publication number: 20130172476
    Abstract: Provided is a fluorine-based surfactant including a copolymer synthesized by copolymerizing, as essential monomers, a polymerizable monomer (A) having a poly(perfluoroalkylene ether) chain and polymerizable unsaturated groups at both ends of the chain and a polymerizable monomer (B) having an oxyalkylene group and a polymerizable unsaturated group. The fluorine-based surfactant cannot structurally generate PFOS or PFOA, which tend to accumulate in the environment and living bodies; even when the fluorine-based surfactant has lower fluorine content than surfactants having a fluoroalkyl group having 8 or more carbon atoms, the fluorine-based surfactant has a higher capability of decreasing surface tension than the surfactants. Accordingly, the fluorine-based surfactant can be suitably used as a leveling agent for a coating composition, a resist composition, or the like.
    Type: Application
    Filed: June 28, 2011
    Publication date: July 4, 2013
    Applicant: DIC Corporation
    Inventors: Shin Sasamoto, Hideya Suzuki
  • Patent number: 8476385
    Abstract: A composition including at least one first divalent unit represented by formula: Each Rf is independently selected from the group consisting of Rfa—(O)t—CHF—(CF2)n—; [Rfa—(O)t—C(L)H—CF2—O]m—W—; Rfb-O—(CF2)p-; F(CkF2k)—(O—CkF2k)P—O—CF2—; and CF3—O—(CF2)3—(OCF(CF3)—CF2)Z—O-L1-. Each Q is independently selected from the group consisting of a bond, —C(O)—N(R1)—, and —C(O)—O—. Each X is independently selected from the group consisting of alkylene and arylalkylene, wherein alkylene and arylalkylene are each optionally interrupted by at least one ether linkage and optionally terminated by —N(R1)—C(O)— or —O—C(O)—. R and R1 are each independently selected from the group consisting of hydrogen and alkyl having from 1 to 4 carbon atoms. Rfa represents a partially or fully fluorinated alkyl group having from 1 to 10 carbon atoms and optionally interrupted with at least one oxygen atom. Rfb is selected from the group consisting of CF3CFH— and F(CjF2j)-.
    Type: Grant
    Filed: June 6, 2008
    Date of Patent: July 2, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Rudolf J. Dams, Miguel A. Guerra, Klaus Hintzer, Michael Jürgens, Harald Kaspar, Kai H. Lochhaas, Andreas R. Maurer, Zai-Ming Qiu, Werner Schwertfeger, Michael S. Terrazas, Tilman C. Zipplies
  • Publication number: 20130150544
    Abstract: The invention relates to novel copolymers and to an associated preparation method, comprising recurrent units bearing a pendant chain of the polyoxyalkylene type.
    Type: Application
    Filed: July 19, 2011
    Publication date: June 13, 2013
    Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
    Inventors: Herve Galiano, Bruno Ameduri, Jérôme Vergnaud
  • Publication number: 20130123382
    Abstract: To provide a curable composition which is sufficiently cured even without a heating step at high temperature and from which a low dielectric constant cured film excellent in the solvent resistance is obtained. A curable composition comprising a fluorinated polyarylene prepolymer (A) having a crosslinkable functional group, a compound (B) having a number average molecular weight of from 140 to 5,000, having at least two crosslinkable functional groups and having no fluorine atoms, a copolymer (C) having the following units (c1) and (c2) and a radical polymerization initiator (D): unit (c1): a unit having a fluoroalkyl group having at most 20 carbon atoms, which may have an etheric oxygen atom between carbon atoms, and having no crosslinkable functional group; unit (c2): a unit having a crosslinkable functional group.
    Type: Application
    Filed: December 21, 2012
    Publication date: May 16, 2013
    Applicant: Asahi Glass Company, Limited
    Inventor: Asahi Glass Company, Limited
  • Patent number: 8329822
    Abstract: A polymer composition comprising A) a first polymer comprising (a) hydrophobized nanoparticle; (b) C1 to C18, straight, branched, or cyclic alkyl(meth)acrylate; (c) N-methylol(meth)acrylamide or a monomer of formula (I) R—(OCH2CH2)a—O—C(O)—C(R1)?CH2??(I) ?wherein R is hydrogen, C1-C4 alkyl, or —C(O)—C(R1)?CH2, and R1 is H or —CH3; said first polymer in contact with B) a second polymer comprising (d) a fluorinated monomer of formula (II) Rf1-L-X—C(O)—C(R)?CH2??(II) ?wherein Rf1 is a monovalent, partially or fully fluorinated, linear or branched, alkyl radical having 2 to about 100 carbon atoms; optionally interrupted by 1 to about 50 oxygen atoms; wherein the ratio of carbon atoms to oxygen atoms is at least 2:1 and no oxygen atoms are bonded to each other; L is a bond or a linear or branched divalent linking group having 1 to about 20 carbon atoms, said linking group optionally interrupted by 1 to about 4 hetero-radicals selected from the group consisting of —O—, —NR6—, —S—, —SO—, —SO2—, and —N(R6)
    Type: Grant
    Filed: November 9, 2009
    Date of Patent: December 11, 2012
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Gerald Oronde Brown, Victoria A. Helinski
  • Patent number: 8314037
    Abstract: A fluoropolymer composition comprising monomers copolymerized in the following percentages by weight: (a) from about 20% to about 95% of a fluoroalkyl monomer, or mixture of monomers, (b) from about 5% to about 80% of at least one of: (i) an alkyl (meth)acrylate monomer having a linear, branched or cyclic alkyl group of from about 6 to about 18 carbons; or (ii) one or more ionizable water solvatable monomers; and (c) from about 0.05% to about 2% non-fluorinated polymerizable nanoparticles.
    Type: Grant
    Filed: November 11, 2008
    Date of Patent: November 20, 2012
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Gerald Oronde Brown, Peter Michael Murphy, Ying Wang
  • Patent number: 8288072
    Abstract: A resist lower layer film composition, wherein an etching speed is fast, thus an etching time period can be shortened to minimize a film thickness loss of a resist pattern and a deformation of the pattern during etching, therefore, a pattern can be transferred with high accuracy and an excellent pattern can be formed on a substrate is provided. The resist lower layer film composition comprising at least a polymer having a repeating unit represented by the following general formula (1).
    Type: Grant
    Filed: February 26, 2008
    Date of Patent: October 16, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Kazumi Noda, Seiichiro Tachibana, Takeshi Kinsho, Tsutomu Ogihara
  • Patent number: 8236887
    Abstract: There is provided a fluorine-containing polymer having an ionic group which has a heteroaromatic ring and is useful as a material comprising various heteroaromatic ring compounds having a stable fluorine-containing heteroaromatic ring, and further a fluorine-containing polymer having a heteroaromatic ring which is useful as a starting material of the above-mentioned polymer or a curing agent. Also, there is provided a fluorine-containing polymer having a heteroaromatic ring such as imidazole in its side chain, a polymer salt thereof, and a polymer composition comprising such a polymer and a polymer salt and a nano filler.
    Type: Grant
    Filed: February 5, 2007
    Date of Patent: August 7, 2012
    Assignee: Daikin Industries, Ltd.
    Inventors: Yuzo Komatsu, Haruhiko Mohri, Hirokazu Aoyama
  • Publication number: 20120190809
    Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(M)COO(CH2)nPhXPhZCrF2r+1??(I) (in the formula (I), M is a hydrogen atom, a methyl group or a halogen atom, n is an integer of from 0 to 2, Ph is a phenylene group, X is CH2O or OCH2, Z is a single bond, a C1-4 alkylene group containing an etheric oxygen atom, or COO(CH2)m (wherein m is an integer of from 1 to 4), and r is an integer of from 1 to 6).
    Type: Application
    Filed: March 30, 2012
    Publication date: July 26, 2012
    Applicant: Asahi Glass Company, Limited
    Inventor: Taiki HOSHINO
  • Publication number: 20120165487
    Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(CH3)COO(CH2)nPhXCrF2r+i??(I) (in the formula (I), n is an integer of from 0 to 2, Ph is a phenylene group, X is a single bond or a C1-4 alkylene group containing an etheric oxygen atom, and r is an integer of from 2 to 6).
    Type: Application
    Filed: March 5, 2012
    Publication date: June 28, 2012
    Applicant: Asahi Glass Company, Limited
    Inventor: Taiki HOSHINO
  • Publication number: 20120156515
    Abstract: A stain resistant, oil and water repellent copolymer comprising a copolymer prepared from fluorinated (meth)acrylate and amine salts of (meth)acrylic acid, and a method of providing stain resistance, oil and water repellency to substrates and a treated substrate.
    Type: Application
    Filed: November 21, 2011
    Publication date: June 21, 2012
    Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
    Inventors: Siddhartha Shenoy, Joel M. Pollino, Anilkumar Raghavanpillai, Brad M. Rosen, John Russell Crompton, JR.
  • Publication number: 20120154811
    Abstract: Presently described are coating compositions comprising a polymerizable resin composition and a non-ionic unpolymerizable surfactant. In some embodiments, the coating comprises greater than 10 wt-% of non-ionic unpolymerizable surfactant. In other embodiments, the coating composition comprises an an additive comprising a silicone group or a fluorinated group and a hydrophobic group. Also described are articles comprising the cured coating compositions. In one embodiment, an article is described comprising a cured coating wherein the cured coating exhibits a property of an initially visible simulated fingerprint reducing in visibility in 1-20 minutes. Also described is a method of determining the fingerprint visibility of a coating composition and a polyacylate composition useful as an additive. In another embodiment a coated surface is described comprising a polymeric organic material comprising a plurality of pores wherein a portion of the pores are interconnected and comprise a lipophilic liquid.
    Type: Application
    Filed: November 30, 2011
    Publication date: June 21, 2012
    Inventors: Richard J. Pokorny, Thomas P. Klun, Christopher B. Walker, JR., David B. Olson, Joan M. Noyola, Michelle L. Toy, Evan L. Schwartz
  • Patent number: 8193276
    Abstract: A fluorocopolymer capable of exhibiting excellent water and oil resistance even with its perfluoroalkyl group being a short chain, and a water and oil proofing composition containing it, are provided. A water and oil proofing composition containing a fluorocopolymer (A) comprising from 40 to 98 mass % of polymerized units (a?) having a C1-6 perfluoroalkyl group, from 1 to 50 mass % of polymerized units (b?) having an alkylene oxide and from 1 to 10 mass % of polymerized units (c?) based on a monomer represented by CH2?C(COOH)-Q-COOH (wherein Q is a C1-4 alkylene group, etc.).
    Type: Grant
    Filed: January 28, 2010
    Date of Patent: June 5, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Shuichiro Sugimoto, Takao Hirono, Eiji Morimoto
  • Patent number: 8168734
    Abstract: The invention relates to compounds represented by Formula (1): wherein Ra is independently halogen, cyano, —CF3, —CF2H, —CFH2, —OCF3, —OCF2H, —N?C?O, —N?C?S or alkyl having a carbon number of approximately 1 to approximately 20; in the alkyl, optional —CH2— may be substituted with —O—, —S—, —SO2—, —CO—, —COO—, —OCO—, —CH?CH—, —CF?CF— or —C?C—, and optional hydrogen may be substituted with halogen; Rb is fluorine or —CF3; A is independently 1,4-cyclohexylene, 1,4-cyclohexenylene, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl or bicyclo[2.2.
    Type: Grant
    Filed: February 23, 2011
    Date of Patent: May 1, 2012
    Assignees: JNC Corporation, Chisso Petrochemical Corporation
    Inventor: Takashi Kato
  • Publication number: 20120097882
    Abstract: A water/oil repellent composition which imparts sufficient dynamic water repellency and post-air-drying water repellency to a surface of an article and has a low environmental impact; a method for producing the composition; and a method of treating an article. The water/oil repellent composition contains: a copolymer which has a mass average molecular weight of at least 40,000 and includes structural units based on monomer (a), monomer (b), and monomer (c); and a medium. Monomer (a) is a compound represented by (Z—Y)nX, wherein Z is a C1-6 polyfluoroalkyl group, Y is a bivalent organic group, n is 1 or 2, and X is a polymerizable unsaturated group. Monomer (b) is an olefin, a homopolymer of which has a glass transition temperature of at most 50° C. Monomer (c) is a (meth)acrylate having no polyfluoroalkyl group and having a C12-30 alkyl group.
    Type: Application
    Filed: December 5, 2011
    Publication date: April 26, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Nobuyuki OTOZAWA, Kazunori SUGIYAMA, Minako SHIMADA, Yuuichi OOMORI
  • Publication number: 20120094236
    Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
    Type: Application
    Filed: December 23, 2011
    Publication date: April 19, 2012
    Inventors: Daiju SHIONO, Tomoyuki Hirano, Sanae Furuya, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa, Hideto Nito, Tsuyoshi Nakamura
  • Publication number: 20120076954
    Abstract: Disclosed therein are a cyclic olefin compound, a photoreactive polymer, and an alignment layer comprising the photoreactive polymer, where the cyclic olefin compound can be used to provide the photoreactive polymer having not only excellences in liquid crystal alignment and alignment rate but also readiness for change in the alignment direction depending on the polarization direction.
    Type: Application
    Filed: September 23, 2011
    Publication date: March 29, 2012
    Applicant: LG CHEM, LTD.
    Inventors: Dong-Woo YOO, Sung-Ho Chun, Dai-Seung Choi, Sung-Kyoung Lee
  • Publication number: 20120071372
    Abstract: The present invention relates to a method of removing and preventing water and condensate blocks in wells by contacting a subterranean formation with a composition comprising a low molecular weight fluorinated copolymer having perfluoro alkyl moieties which are no longer than C6. A fluorinated copolymer of low molecular weight of about 50,000 g/mol and a method of preparing the same are also disclosed.
    Type: Application
    Filed: March 18, 2011
    Publication date: March 22, 2012
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventors: CHERYL LYNN IACONELLI, GERALD ORONDE BROWN, CHRISTOPHER JAMES MARTIN, Erick J. Acosta
  • Patent number: 8119765
    Abstract: A crosslinkable fluorine-containing compound, which is an adduct compound having a crosslinkable group, wherein the adduct compound is an adduct of a fluorine-containing compound having, per molecule, 2 or more terminal fluorine-containing vinyl groups each directly bonded to an oxygen atom, and a compound having 2 or more groups represented by —XH, where X represents an oxygen atom or a sulfur atom.
    Type: Grant
    Filed: April 9, 2008
    Date of Patent: February 21, 2012
    Assignee: Fujifilm Corporation
    Inventor: Takayuki Ito
  • Publication number: 20110250539
    Abstract: A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
    Type: Application
    Filed: April 6, 2011
    Publication date: October 13, 2011
    Inventors: Masayoshi SAGEHASHI, Koji Hasegawa, Takeshi Sasami
  • Patent number: 7994228
    Abstract: Provided is a novel ion-pair charge-transfer complex polymer suitable for use as a photo-functional material which shows extremely fast photoresponses in the wide wavelength range from visible to near infrared regions, and thermally stable, wherein the acceptor is a substituted bipyridinium cation expressed by the formula (I) below. In the formula, X represents a group bonded at the 4- or 2-position relative to the nitrogen atoms of the bipyridinium group and selected from the group consisting of phenyl, biphenyl, thienyl, bithienyl, terthienyl, furyl, fluorenyl, pyrenyl, perylenyl, and vinyl groups, or X may not be present so that the pyridinium groups are directly connected; and Z represents a polymer preferably from the ring-opening polymerization of an oxazoline derivative (e.g. one substituted with phenyl group). The anion as the donor is selected, for example, from chloride, bromide, iodide, tetraphenylborate or derivatives thereof.
    Type: Grant
    Filed: September 14, 2007
    Date of Patent: August 9, 2011
    Assignee: Kyushu University, National University Corporation
    Inventor: Toshihiko Nagamura
  • Patent number: 7989567
    Abstract: To provide a method for producing a water/oil repellent composition which can impart water/oil repellency to a surface of an article and has excellent durability (wash durability and heavy-rain durability) and an article which has water/oil repellency and is less susceptible to deterioration of water/oil repellency when it is washed or in heavy rain. A method for producing a water/oil repellent composition which comprises polymerizing a monomer component comprising the following monomer (a) in coexistence with the following compound (x) in a medium in the presence of a surfactant and a polymerization initiator: monomer (a) is a compound of the formula (Z—Y)nX wherein Z is a C1-20 polyfluoroalkyl group or the like, Y is a bivalent organic group or a single bond, n is 1 or 2, and X is a polymerizable unsaturated group; and the compound (x) is a compound having at least two groups of —(CH2)a—CHR1—(CH2)b—SH, wherein R1 is a methyl group or an ethyl group, a is an integer of from 0 to 2, and b is 0 or 1.
    Type: Grant
    Filed: January 6, 2010
    Date of Patent: August 2, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazunori Sugiyama, Yuuichi Oomori, Minako Shimada
  • Publication number: 20110151378
    Abstract: A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit.
    Type: Application
    Filed: November 19, 2010
    Publication date: June 23, 2011
    Applicant: JSR Corporation
    Inventors: Nobuji MATSUMURA, Akimasa Soyano, Yuusuke Asano, Takehiko Naruoka, Hirokazu Sakakibara, Makoto Shimizu, Yukio Nishimura
  • Patent number: 7947791
    Abstract: The present invention provides a fluorinated polymer excellent in the crosslinking reactivity, crosslinked rubber physical properties and chemical resistance, and its crosslinked rubber. A fluorinated polymer comprising repeating units (a) based on at least one monomer selected from the group consisting of ethylenic unsaturated compounds each having a hydroxyphenyl group, repeating units (b) based on at least one fluoromonomer selected from the group consisting of tetrafluoroethylene, hexafluoropropylene, vinylidene fluoride, 3,3,3-trifluoropropene, 1,3,3,3-tetrafluoropropene, 1,1,2-trifluoroethylene, vinyl fluoride, 1,2-difluoroethylene and CF2?CF—O—Rf (wherein Rf is a C1-8 saturated perfluoroalkyl group or a perfluoro(alkoxyalkyl) group) and, if necessary, repeating units (c) based on at least one hydrocarbon monomer selected from the group consisting of ethylene, propylene and CH2?CH—O—R1.
    Type: Grant
    Filed: March 19, 2009
    Date of Patent: May 24, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Jumpei Nomura, Toshikazu Yoneda, Mitsuru Seki, Hiroki Kamiya, Hiroshi Funaki, Takehiro Kose
  • Patent number: 7858288
    Abstract: A fluorine-containing polymeric compound obtained by polymerizing only polymerizable monomers represented by general formula (c1-0) shown below: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an aliphatic hydrocarbon group substituted with fluorine atoms, or a group in which a plurality of aliphatic hydrocarbon groups which may be substituted with fluorine atoms are bonded through a linking group containing a hetero atom, with the proviso that at least one of the plurality of aliphatic hydrocarbon groups which may be substituted with fluorine atoms is an aliphatic hydrocarbon group substituted with fluorine atoms.
    Type: Grant
    Filed: April 24, 2008
    Date of Patent: December 28, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventor: Makiko Irie
  • Publication number: 20100310875
    Abstract: Presently described are articles, such as optical displays and protective films, comprising a (e.g. light transmissive) substrate having a surface layer comprising the reaction product of a mixture comprising a non-fluorinated binder precursor (e.g. of a hardcoat composition) and at least one polymerizable perfluoropolyether polymer. The resulting cured surface layer can advantageously exhibit low lint attraction in combination with low surface energy. Also described are one-step and two-step methods of synthesizing perfluoropolyether polymers having polymerizable ethylenically unsaturated groups.
    Type: Application
    Filed: December 10, 2008
    Publication date: December 9, 2010
    Inventors: Encai Hao, Zai-Ming Qiu, Yu Yang, Thomas P. Klun
  • Publication number: 20100216071
    Abstract: Polymers comprising a first methacrylate monomer having a pendent spacer between the polymer backbone and an acid-liable acetal group, a second methacrylate monomer having a pendent group including a fluorinated alkyl group and a third methacrylate monomer having a pendent hydrocarbon group. Photoresist formulations include the polymers, a photoacid generator and a casting solvent. Methods of patterning photoresist films formed from the photoresist formulations are characterized by post-exposure bakes at temperatures of about 60° C. or less.
    Type: Application
    Filed: February 23, 2009
    Publication date: August 26, 2010
    Inventors: Dario Leonardo Goldfarb, Mahmoud Khojasteh, Pushkara R. Varanasi
  • Patent number: 7759440
    Abstract: The present invention relates to a polymerizable monomer represented by the general formula (1), wherein R1 is a hydrogen atom, a halogen atom, a hydrocarbon group or a fluorine-containing alkyl group; R2 is a straight-chain or branched alkyl group, a cyclic alkyl group, an aromatic group, or a substituent having at least two of these groups, the R2 being optionally partially fluorinated; R3 is a hydrogen atom, a hydrocarbon group that is optionally branched, a fluorine-containing alkyl group, or a cyclic group having an aromatic or alicyclic structure, the R3 optionally containing a bond of an oxygen atom or carbonyl group; and n is an integer of 1-2.
    Type: Grant
    Filed: July 13, 2006
    Date of Patent: July 20, 2010
    Assignees: Central Glass Company, Limited, F-Tech, Inc.
    Inventors: Satoru Miyazawa, Kazuhiko Maeda, Kenji Tokuhisa, Shoji Arai
  • Publication number: 20100136486
    Abstract: A protective coating composition comprising a polymer of acyl-protected hexafluoroalcohol structure as a base polymer, optionally in admixture with a second polymer containing sulfonic acid amine salt in recurring units is applied onto a resist film. The protective coating is transparent to radiation of wavelength up to 200 nm.
    Type: Application
    Filed: December 1, 2009
    Publication date: June 3, 2010
    Inventors: Yuji HARADA, Jun Hatakeyama, Koji Hasegawa
  • Patent number: 7718342
    Abstract: A polymer is provided comprising recurring units having formulas (1), (2), (3), (4), (5), and (6) in amounts of 1-60 mol % (1), 1-60 mol % (2), 1-50 mol % (3), 0-60 mol % (4), 0-30 mol % (5), and 0-30 mol % (6), and having a Mw of 3,000-30,000 and a Mw/Mn of 1.5-2.5. R1, R3, R4, R7, R9, and R11 are H or CH3, Y is methylene or O, R2 is CO2R10 when Y is methylene and R2 is H or CO2R10 when Y is O, R10 is C1-C15 alkyl which may be separated by O, R5 and R6 are H or OH, R8 is a tertiary ester type acid-labile protective group, and R12 is OH-containing fluoroalkyl. A resist composition comprising the polymer has a high resolution and is improved in line edge roughness and I/G bias.
    Type: Grant
    Filed: December 27, 2006
    Date of Patent: May 18, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kenji Funatsu, Tomohiro Kobayashi, Koji Hasegawa, Tsunehiro Nishi
  • Patent number: 7687228
    Abstract: An antireflection film composition, wherein an etching speed is fast, thus, when used as a resist lower layer, a film loss of a resist pattern and deformation of the pattern during etching can be minimized, and because of a high crosslinking density, a dense film can be formed after thermal crosslinking, thus, mixing with an upper layer resist can be prevented and the resist pattern after development is good is provided. The antireflection film composition comprising; at least a polymer having a repeating unit represented by the following general formula (I).
    Type: Grant
    Filed: February 26, 2008
    Date of Patent: March 30, 2010
    Assignee: Shin Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Kazumi Noda, Seiichiro Tachibana, Takeshi Kinsho, Tsutomu Ogihara