Abstract: A copolymer includes a repeating unit of Formula (I) and a repeating unit of Formula (II), a composition includes the copolymer, and an optical film has a layer formed of the composition, in the Formulae (I) and (II), R1 and R2 represent a hydrogen atom or an alkyl group, L3 and L1 represent a divalent linking group, L2 represents a single bond or a divalent linking group, and L4 represents a single bond or a divalent linking group, L4 does not represent a linking group including —O(C?O)—NH—, X represents a perfluoropolyether group, an alkyl group having a branched structure in which hydrogen is all substituted into fluorine, an alkenyl group, or an alkynyl group, and Y represents a crosslinking group.

Abstract: A surface-treating agent including at least one perfluoro(poly)ether group containing silane compound of any of the formulae (A1), (A2), (B1), (B2), (C1) and (C2): wherein, each of symbols is as defined in the specification, and wherein a proportion of the perfluoro(poly)ether group containing silane compound having a molecular weight of 3,000 or less in the perfluoro(poly)ether group containing silane compounds of any of the above general formulae is 9 mol % or less.

Abstract: The present invention provides compound of formulae (A1), (A2), (B1), (B2), (C1) and (C2) which can form a layer having water-repellency, oil-repellency and antifouling property as well as high friction durability: wherein each symbols are as defined in the specification.

Abstract: Low molecular weight polytetrafluoroethylene powder having a complex viscosity of 1×102 to 7×105 Pa·s at 380° C., containing 5 or less carboxyl groups at ends of the molecule chain per 106 carbon atoms in the main chain, and being substantially free from C8-C14 perfluorocarboxylic acids and salts thereof. Also disclosed is a method for producing low molecular weight polytetrafluoroethylene.

Abstract: To provide a novel fluorinated aromatic compound having at least two carbon-carbon unsaturated bonds, a method for its production, a curable material comprising the fluorinated aromatic compound, a cured product thereof, and an optical member. The fluorinated aromatic compound is represented by formula (A), wherein n is an integer of 0 to 6, a is an integer of 0 to 5, b is an integer of 0 to 4, c is an integer of 0 to 4, a+c+n is 2 to 6, a+b is 2 to 9, Z is a single bond, —O—, —S—, —CO—, —C(CH3)2—, —C(CF3)2—, —SO—, or —SO2—, Rf1 is a C1-8 fluoroalkyl group, Y1 and Y2 are each independently a group represented by formula (1) (s is 0 or 1, and R1, R2, R3, and R4 are each independently a hydrogen atom or a fluorine atom), and F in the aromatic ring indicates that hydrogen atoms in the aromatic ring are all substituted by fluorine atoms.

Abstract: A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C1 to C12 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A3-X1-(A4-X2)a-(A5)b-, * represents a binding site to an oxygen atom, A2, A3, A4 and A5 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, W1 represents a C5 to C18 divalent alicyclic hydrocarbon group, a represents 0 or 1, and b represents 0 or 1.

Abstract: The invention provides a fluoro-containing ether monomer for fabricating contact lenses represented by following formula (I): In formula (I), R10 is fluoroalkyl group (CxFyHz, wherein x is an integer of 2-20, y to is an integer of 5-30, and y+z=2x+1), R11 is oxygen, nitrogen or sulfur; R12 is C1-C3 alkylene; n is an integer of 3-40.

Abstract: A compound represented by the following formula (a): CH2?CR1—CONJ-CGR2—(CH2)n—COO-Q1-Rf1??(a) is provided. This compound is capable of forming a polymer having an oil repellency equivalent to polymers containing a polyfluoroalkyl group containing at least 8 carbon atoms, although the polyfluoroalkyl group contains up to 6 carbon atoms. In the formula, R1 is hydrogen atom or methyl group, R2 is hydrogen atom or a group represented by —(CH2)m—COO-Q2-Rf2 (r), n and m are independently an integer of 0 to 4, Rf1 and Rf2 are independently a polyfluoroalkyl group or a polyfluoroether group containing 1 to 6 carbon atoms, Q1 and Q2 are independently single bond or a divalent linkage group, J is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms, and G is hydrogen atom or an alkyl group containing 1 to 3 carbon atoms.

Abstract: The invention provides a fluoro-containing ether monomer for fabricating contact lenses represented by following formula (I): In formula (I), R10 is fluoroalkyl group (CxFyHz, wherein x is an integer of 2-20, y to is an integer of 5-30, and y+z=2x+1), R11 is oxygen, nitrogen or sulfur; R12 is C1-C3 alkylene; n is an integer of 3-40.

Abstract: To provide a copolymer which can impart sufficient dynamic water repellency, after air-drying water repellency and friction durability to a surface of an article, and which has low impact on the environment, a method for producing the same, a water repellent composition and an article excellent in dynamic water repellency, after air-drying water repellency and friction durability.

Abstract: Embodiments in accordance with the present invention provide polymers for forming layers/films useful in the manufacture of a variety of types of optoelectronic displays. Such embodiments also provide compositions of such polymers for forming such layers/films where the formed layers/films have high transparency over the visible light spectrum.

Abstract: A copolymer includes the polymerized product of a comonomer and a monomer having the formula (I): wherein c is 0, 1, 2, 3, 4, or 5; Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently an unsubstituted or substituted C1-10 linear or branched alkyl group, an unsubstituted or substituted C3-10 cycloalkyl group, an unsubstituted or substituted C3-10 alkenylalkyl group, or an unsubstituted or substituted C3-10 alkynylalkyl group; wherein Rx and Ry together optionally form a ring; and Rz is a C6-20 aryl group substituted with an acetal-containing group or a ketal-containing group, or a C3-C20 heteroaryl group substituted with an acetal-containing group or a ketal-containing group, wherein the C6-20 aryl group or the C3-C20 heteroaryl group can, optionally, be further substituted. Also described are a photoresist including the copolymer, a coated substrate having a layer of the photoresist, and a method of forming an electronic device utilizing the photoresist.

Abstract: The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, A2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A1 represents a group represented by the formula (a-g1): A10-X10sA11-??(a-g1) wherein A10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A11 represents a C1-C5 aliphatic hydrocarbon group, X10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and a photoresist composition comprising the resin and an acid generator.

Abstract: The present invention relates to a method of removing and preventing water and condensate blocks in wells by contacting a subterranean formation with a composition comprising a low molecular weight fluorinated copolymer having perfluoro alkyl moieties which are no longer than C6. A fluorinated copolymer of low molecular weight of about 50,000 g/mol and a method of preparing the same are also disclosed.

Abstract: The present invention relates to polymerizable compounds, liquid-crystalline media containing the compounds, in particular liquid crystal (LC) media and LC displays having a polymer-stabilized blue phase, and also LC media for LC displays of the PS or PSA type (“polymer-sustained” or “polymer-sustained alignment”).

Abstract: There is provided a fluorine-containing polymer having an ionic group which has a heteroaromatic ring and is useful as a material comprising various heteroaromatic ring compounds having a stable fluorine-containing heteroaromatic ring, and further fluorine-containing polymer having a heteroaromatic ring which is useful as a starting material of the above-mentioned polymer or a curing agent. Also, there is provided a fluorine-containing polymer having a heteroaromatic ring such as imidazole in its side chain, a polymer salt thereof, and a polymer composition comprising such a polymer and a polymer salt and a nano filler.

Abstract: Method comprising contacting a hydrocarbon-bearing formation with a composition comprising solvent and a fluoropolyether compound, wherein the fluoropolyether compound comprises at least one first divalent unit represented by formula: Each Rf is independently selected from the group consisting of Rfa—(O)t—CHL?-(CF2)n—; [Rfa—(O)t—C(L)H—CF2)—O]m—W—; Rfb—O—(CF2)p-; F(CkF2k)—(O—CkF2K(p—O—CF2—; and CF3—O—(CF2)3—OCF(CF3)—CF2)z—O-L1-. Treated hydrocarbon-bearing formations are also disclosed.

Abstract: Presently described are articles, such as optical displays and protective films, comprising a (e.g. light transmissive) substrate having a surface layer comprising the reaction product of a mixture comprising a non-fluorinated binder precursor (e.g. of a hardcoat composition) and at least one polymerizable perfluoropolyether polymer. The resulting cured surface layer can advantageously exhibit low lint attraction in combination with low surface energy. Also described are one-step and two-step methods of synthesizing perfluoropolyether polymers having polymerizable ethylenically unsaturated groups.

Abstract: The invention provide a new lens curing method for making hydrogel contact lenses. The new lens curing method is based on actinically-induced step-growth polymerization. The invention also provides hydrogel contact lenses prepared from the method of the invention and fluid compositions for making hydrogel contact lenses based on the new lens curing method. In addition, the invention provide prepolymers capable of undergoing actinically-induced step-growth polymerization to form hydrogel contact lenses.

Abstract: To provide an antifouling composition which is a fluorine-type antifouling composition using a short chain perfluoroalkyl group and which is excellent in antifouling properties and water/oil repellency and presents good durability against washing. An antifouling composition comprising a fluorocopolymer which comprises from 30 to 65 mass % of polymerized units (a) having a C1-6 perfluoroalkyl group, from 1 to 67 mass % of polymerized units (b1) having —(C2H4O)— and from 3 to 34 mass % of polymerized units (b2) having —(C4H8O)—, wherein the content of —(C2H4O)— is from 20 to 65 mass %, and the content of —(C4H8O)— is from 2 to 13 mass %.

Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(M)COO(CH2)nPhXPhZCrF2r+1??(I) (in the formula (I), M is a hydrogen atom, a methyl group or a halogen atom, n is an integer of from 0 to 2, Ph is a phenylene group, X is CH2O or OCH2, Z is a single bond, a C1-4 alkylene group containing an etheric oxygen atom, or COO(CH2)m (wherein m is an integer of from 1 to 4), and r is an integer of from 1 to 6).

Abstract: A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

Abstract: Disclosed is an activation energy ray-curable resin composition comprising 70 to 95 parts by mass of a multifunctional monomer (A) which has a surface free energy of 37 mJ/m2 or more when cured and 5 to 30 parts by mass of a fluorine (meth)acrylate (B) which is compatible with the multifunctional monomer (A) (a total content of all monomers in the composition shall be 100 parts by mass), wherein the multifunctional monomer (A) has three or more radical polymerizable functional groups in a molecule and a value of a molecular weight thereof divided by the number of the radical polymerizable functional group (molecular weight/number of radical polymerizable functional group) is 110 to 200, and wherein the fluorine (meth)acrylate (B) has one or more radical polymerizable functional groups in a molecule.

Abstract: Provided is a fluorine-based surfactant including a copolymer synthesized by copolymerizing, as essential monomers, a polymerizable monomer (A) having a poly(perfluoroalkylene ether) chain and polymerizable unsaturated groups at both ends of the chain and a polymerizable monomer (B) having an oxyalkylene group and a polymerizable unsaturated group. The fluorine-based surfactant cannot structurally generate PFOS or PFOA, which tend to accumulate in the environment and living bodies; even when the fluorine-based surfactant has lower fluorine content than surfactants having a fluoroalkyl group having 8 or more carbon atoms, the fluorine-based surfactant has a higher capability of decreasing surface tension than the surfactants. Accordingly, the fluorine-based surfactant can be suitably used as a leveling agent for a coating composition, a resist composition, or the like.

Abstract: A composition including at least one first divalent unit represented by formula: Each Rf is independently selected from the group consisting of Rfa—(O)t—CHF—(CF2)n—; [Rfa—(O)t—C(L)H—CF2—O]m—W—; Rfb-O—(CF2)p-; F(CkF2k)—(O—CkF2k)P—O—CF2—; and CF3—O—(CF2)3—(OCF(CF3)—CF2)Z—O-L1-. Each Q is independently selected from the group consisting of a bond, —C(O)—N(R1)—, and —C(O)—O—. Each X is independently selected from the group consisting of alkylene and arylalkylene, wherein alkylene and arylalkylene are each optionally interrupted by at least one ether linkage and optionally terminated by —N(R1)—C(O)— or —O—C(O)—. R and R1 are each independently selected from the group consisting of hydrogen and alkyl having from 1 to 4 carbon atoms. Rfa represents a partially or fully fluorinated alkyl group having from 1 to 10 carbon atoms and optionally interrupted with at least one oxygen atom. Rfb is selected from the group consisting of CF3CFH— and F(CjF2j)-.

Abstract: The invention relates to novel copolymers and to an associated preparation method, comprising recurrent units bearing a pendant chain of the polyoxyalkylene type.

Abstract: To provide a curable composition which is sufficiently cured even without a heating step at high temperature and from which a low dielectric constant cured film excellent in the solvent resistance is obtained. A curable composition comprising a fluorinated polyarylene prepolymer (A) having a crosslinkable functional group, a compound (B) having a number average molecular weight of from 140 to 5,000, having at least two crosslinkable functional groups and having no fluorine atoms, a copolymer (C) having the following units (c1) and (c2) and a radical polymerization initiator (D): unit (c1): a unit having a fluoroalkyl group having at most 20 carbon atoms, which may have an etheric oxygen atom between carbon atoms, and having no crosslinkable functional group; unit (c2): a unit having a crosslinkable functional group.

Abstract: A polymer composition comprising A) a first polymer comprising (a) hydrophobized nanoparticle; (b) C1 to C18, straight, branched, or cyclic alkyl(meth)acrylate; (c) N-methylol(meth)acrylamide or a monomer of formula (I) R—(OCH2CH2)a—O—C(O)—C(R1)?CH2??(I) ?wherein R is hydrogen, C1-C4 alkyl, or —C(O)—C(R1)?CH2, and R1 is H or —CH3; said first polymer in contact with B) a second polymer comprising (d) a fluorinated monomer of formula (II) Rf1-L-X—C(O)—C(R)?CH2??(II) ?wherein Rf1 is a monovalent, partially or fully fluorinated, linear or branched, alkyl radical having 2 to about 100 carbon atoms; optionally interrupted by 1 to about 50 oxygen atoms; wherein the ratio of carbon atoms to oxygen atoms is at least 2:1 and no oxygen atoms are bonded to each other; L is a bond or a linear or branched divalent linking group having 1 to about 20 carbon atoms, said linking group optionally interrupted by 1 to about 4 hetero-radicals selected from the group consisting of —O—, —NR6—, —S—, —SO—, —SO2—, and —N(R6)

Abstract: A fluoropolymer composition comprising monomers copolymerized in the following percentages by weight: (a) from about 20% to about 95% of a fluoroalkyl monomer, or mixture of monomers, (b) from about 5% to about 80% of at least one of: (i) an alkyl (meth)acrylate monomer having a linear, branched or cyclic alkyl group of from about 6 to about 18 carbons; or (ii) one or more ionizable water solvatable monomers; and (c) from about 0.05% to about 2% non-fluorinated polymerizable nanoparticles.

Abstract: A resist lower layer film composition, wherein an etching speed is fast, thus an etching time period can be shortened to minimize a film thickness loss of a resist pattern and a deformation of the pattern during etching, therefore, a pattern can be transferred with high accuracy and an excellent pattern can be formed on a substrate is provided. The resist lower layer film composition comprising at least a polymer having a repeating unit represented by the following general formula (1).

Abstract: There is provided a fluorine-containing polymer having an ionic group which has a heteroaromatic ring and is useful as a material comprising various heteroaromatic ring compounds having a stable fluorine-containing heteroaromatic ring, and further a fluorine-containing polymer having a heteroaromatic ring which is useful as a starting material of the above-mentioned polymer or a curing agent. Also, there is provided a fluorine-containing polymer having a heteroaromatic ring such as imidazole in its side chain, a polymer salt thereof, and a polymer composition comprising such a polymer and a polymer salt and a nano filler.

Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(M)COO(CH2)nPhXPhZCrF2r+1??(I) (in the formula (I), M is a hydrogen atom, a methyl group or a halogen atom, n is an integer of from 0 to 2, Ph is a phenylene group, X is CH2O or OCH2, Z is a single bond, a C1-4 alkylene group containing an etheric oxygen atom, or COO(CH2)m (wherein m is an integer of from 1 to 4), and r is an integer of from 1 to 6).

Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(CH3)COO(CH2)nPhXCrF2r+i??(I) (in the formula (I), n is an integer of from 0 to 2, Ph is a phenylene group, X is a single bond or a C1-4 alkylene group containing an etheric oxygen atom, and r is an integer of from 2 to 6).

Abstract: A stain resistant, oil and water repellent copolymer comprising a copolymer prepared from fluorinated (meth)acrylate and amine salts of (meth)acrylic acid, and a method of providing stain resistance, oil and water repellency to substrates and a treated substrate.

Abstract: Presently described are coating compositions comprising a polymerizable resin composition and a non-ionic unpolymerizable surfactant. In some embodiments, the coating comprises greater than 10 wt-% of non-ionic unpolymerizable surfactant. In other embodiments, the coating composition comprises an an additive comprising a silicone group or a fluorinated group and a hydrophobic group. Also described are articles comprising the cured coating compositions. In one embodiment, an article is described comprising a cured coating wherein the cured coating exhibits a property of an initially visible simulated fingerprint reducing in visibility in 1-20 minutes. Also described is a method of determining the fingerprint visibility of a coating composition and a polyacylate composition useful as an additive. In another embodiment a coated surface is described comprising a polymeric organic material comprising a plurality of pores wherein a portion of the pores are interconnected and comprise a lipophilic liquid.

Abstract: A fluorocopolymer capable of exhibiting excellent water and oil resistance even with its perfluoroalkyl group being a short chain, and a water and oil proofing composition containing it, are provided. A water and oil proofing composition containing a fluorocopolymer (A) comprising from 40 to 98 mass % of polymerized units (a?) having a C1-6 perfluoroalkyl group, from 1 to 50 mass % of polymerized units (b?) having an alkylene oxide and from 1 to 10 mass % of polymerized units (c?) based on a monomer represented by CH2?C(COOH)-Q-COOH (wherein Q is a C1-4 alkylene group, etc.).

Abstract: The invention relates to compounds represented by Formula (1): wherein Ra is independently halogen, cyano, —CF3, —CF2H, —CFH2, —OCF3, —OCF2H, —N?C?O, —N?C?S or alkyl having a carbon number of approximately 1 to approximately 20; in the alkyl, optional —CH2— may be substituted with —O—, —S—, —SO2—, —CO—, —COO—, —OCO—, —CH?CH—, —CF?CF— or —C?C—, and optional hydrogen may be substituted with halogen; Rb is fluorine or —CF3; A is independently 1,4-cyclohexylene, 1,4-cyclohexenylene, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl or bicyclo[2.2.

Abstract: A water/oil repellent composition which imparts sufficient dynamic water repellency and post-air-drying water repellency to a surface of an article and has a low environmental impact; a method for producing the composition; and a method of treating an article. The water/oil repellent composition contains: a copolymer which has a mass average molecular weight of at least 40,000 and includes structural units based on monomer (a), monomer (b), and monomer (c); and a medium. Monomer (a) is a compound represented by (Z—Y)nX, wherein Z is a C1-6 polyfluoroalkyl group, Y is a bivalent organic group, n is 1 or 2, and X is a polymerizable unsaturated group. Monomer (b) is an olefin, a homopolymer of which has a glass transition temperature of at most 50° C. Monomer (c) is a (meth)acrylate having no polyfluoroalkyl group and having a C12-30 alkyl group.

Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.

Abstract: Disclosed therein are a cyclic olefin compound, a photoreactive polymer, and an alignment layer comprising the photoreactive polymer, where the cyclic olefin compound can be used to provide the photoreactive polymer having not only excellences in liquid crystal alignment and alignment rate but also readiness for change in the alignment direction depending on the polarization direction.

Abstract: The present invention relates to a method of removing and preventing water and condensate blocks in wells by contacting a subterranean formation with a composition comprising a low molecular weight fluorinated copolymer having perfluoro alkyl moieties which are no longer than C6. A fluorinated copolymer of low molecular weight of about 50,000 g/mol and a method of preparing the same are also disclosed.

Abstract: A crosslinkable fluorine-containing compound, which is an adduct compound having a crosslinkable group, wherein the adduct compound is an adduct of a fluorine-containing compound having, per molecule, 2 or more terminal fluorine-containing vinyl groups each directly bonded to an oxygen atom, and a compound having 2 or more groups represented by —XH, where X represents an oxygen atom or a sulfur atom.

Abstract: A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.

Abstract: Provided is a novel ion-pair charge-transfer complex polymer suitable for use as a photo-functional material which shows extremely fast photoresponses in the wide wavelength range from visible to near infrared regions, and thermally stable, wherein the acceptor is a substituted bipyridinium cation expressed by the formula (I) below. In the formula, X represents a group bonded at the 4- or 2-position relative to the nitrogen atoms of the bipyridinium group and selected from the group consisting of phenyl, biphenyl, thienyl, bithienyl, terthienyl, furyl, fluorenyl, pyrenyl, perylenyl, and vinyl groups, or X may not be present so that the pyridinium groups are directly connected; and Z represents a polymer preferably from the ring-opening polymerization of an oxazoline derivative (e.g. one substituted with phenyl group). The anion as the donor is selected, for example, from chloride, bromide, iodide, tetraphenylborate or derivatives thereof.

Abstract: To provide a method for producing a water/oil repellent composition which can impart water/oil repellency to a surface of an article and has excellent durability (wash durability and heavy-rain durability) and an article which has water/oil repellency and is less susceptible to deterioration of water/oil repellency when it is washed or in heavy rain. A method for producing a water/oil repellent composition which comprises polymerizing a monomer component comprising the following monomer (a) in coexistence with the following compound (x) in a medium in the presence of a surfactant and a polymerization initiator: monomer (a) is a compound of the formula (Z—Y)nX wherein Z is a C1-20 polyfluoroalkyl group or the like, Y is a bivalent organic group or a single bond, n is 1 or 2, and X is a polymerizable unsaturated group; and the compound (x) is a compound having at least two groups of —(CH2)a—CHR1—(CH2)b—SH, wherein R1 is a methyl group or an ethyl group, a is an integer of from 0 to 2, and b is 0 or 1.

Abstract: A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit.

Abstract: The present invention provides a fluorinated polymer excellent in the crosslinking reactivity, crosslinked rubber physical properties and chemical resistance, and its crosslinked rubber. A fluorinated polymer comprising repeating units (a) based on at least one monomer selected from the group consisting of ethylenic unsaturated compounds each having a hydroxyphenyl group, repeating units (b) based on at least one fluoromonomer selected from the group consisting of tetrafluoroethylene, hexafluoropropylene, vinylidene fluoride, 3,3,3-trifluoropropene, 1,3,3,3-tetrafluoropropene, 1,1,2-trifluoroethylene, vinyl fluoride, 1,2-difluoroethylene and CF2?CF—O—Rf (wherein Rf is a C1-8 saturated perfluoroalkyl group or a perfluoro(alkoxyalkyl) group) and, if necessary, repeating units (c) based on at least one hydrocarbon monomer selected from the group consisting of ethylene, propylene and CH2?CH—O—R1.

Abstract: A fluorine-containing polymeric compound obtained by polymerizing only polymerizable monomers represented by general formula (c1-0) shown below: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an aliphatic hydrocarbon group substituted with fluorine atoms, or a group in which a plurality of aliphatic hydrocarbon groups which may be substituted with fluorine atoms are bonded through a linking group containing a hetero atom, with the proviso that at least one of the plurality of aliphatic hydrocarbon groups which may be substituted with fluorine atoms is an aliphatic hydrocarbon group substituted with fluorine atoms.

Abstract: Presently described are articles, such as optical displays and protective films, comprising a (e.g. light transmissive) substrate having a surface layer comprising the reaction product of a mixture comprising a non-fluorinated binder precursor (e.g. of a hardcoat composition) and at least one polymerizable perfluoropolyether polymer. The resulting cured surface layer can advantageously exhibit low lint attraction in combination with low surface energy. Also described are one-step and two-step methods of synthesizing perfluoropolyether polymers having polymerizable ethylenically unsaturated groups.

Abstract: Polymers comprising a first methacrylate monomer having a pendent spacer between the polymer backbone and an acid-liable acetal group, a second methacrylate monomer having a pendent group including a fluorinated alkyl group and a third methacrylate monomer having a pendent hydrocarbon group. Photoresist formulations include the polymers, a photoacid generator and a casting solvent. Methods of patterning photoresist films formed from the photoresist formulations are characterized by post-exposure bakes at temperatures of about 60° C. or less.