Imide Monomer Patents (Class 526/262)
  • Patent number: 10017646
    Abstract: A composition for forming silica layer includes a silicon-containing polymer and a solvent, wherein a weight average molecular weight of the silicon-containing polymer ranges from about 2,000 to about 100,000 and a branching ratio (a) of the silicon-containing polymer calculated by Equation 1 ranges from about 0.25 to about 0.50. ?=k·Ma??[Equation 1] In Equation 1, ? is an intrinsic viscosity of a silicon-containing polymer, M is an absolute molecular weight of a silicon-containing polymer, a is a branching ratio, and k is an intrinsic constant.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: July 10, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Sooyeon Sim, Jin-Hee Bae, TaekSoo Kwak, Yonggoog Kim, Jingyo Kim, Kunbae Noh, Huichan Yun, Jiho Lee, Byeong Gyu Hwang
  • Patent number: 10010857
    Abstract: The present invention provides an a polyarylene sulfide (PAS) production device provided with a supply tube for loading corrosive materials such as a strong alkali into a reaction vessel, wherein prescribed amounts of various raw materials or the like can be accurately loaded into the reaction vessel without causing decreases in production efficiency due to the replacement of the supply tube or the repair of the reaction vessel in response to the corrosion of the supply tube or the like. The present invention is a production device, and a PAS production device, in particular, provided with a reaction vessel equipped with one or a plurality of supply tubes, at least one of the supply tubes having an insert pipe, which is preferably detachable, to be inserted into an outer supply tube; and a tip opening of the insert pipe being positioned further inward than an inside wall of the reaction vessel.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: July 3, 2018
    Assignee: KUREHA CORPORATION
    Inventors: Masanori Kobayashi, Tetsuya Morikawa, Kiyotaka Tadano, Yoshihiro Ichinose, Koichi Suzuki
  • Patent number: 9580528
    Abstract: A method for preparing a tetrapolymer includes preparing a suspension including an aromatic vinyl-based monomer, an unsaturated nitrile-based monomer, an N-substituted maleimide-based monomer, an ?-alkyl styrene-based monomer, and an inorganic dispersing agent, and polymerizing the suspension. The method for preparing a tetrapolymer can be useful in lowering a reaction temperature using suspension polymerization, and reducing a reaction time, thereby maximizing productivity. A tetrapolymer prepared by the method is also provided.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: February 28, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jae Won Heo, Joo Hyun Jang, Bo Eun Kim, Kwang Soo Park, Natarajan Senthilkumar, Young Sub Jin
  • Patent number: 9556326
    Abstract: A compound of the formula (I) wherein m and n are independently of one another a number from 1 to 50; the ratio of m/n is 1:10 to 10:1, the recurring units X can have the same definition or different definitions, the recurring units Y can have the same definition or different definitions and the recurring units X and Y can have a random, alternating or block distribution; the recurring unit X is a group of the formula (I-a) and the recurring unit Y is a group of the formula (I-b) the radicals R1 independently of one another are C1-C12alkyl or C3-C12cycloalkyl; the radicals R2 and R4 are independently of one another C12-C30alkyl; the radicals R3 are independently of one another hydrogen, C1-C12alkyl or C3-C12cycloalkyl.
    Type: Grant
    Filed: October 17, 2011
    Date of Patent: January 31, 2017
    Assignee: BASF SE
    Inventors: Edoardo Menozzi, Kai-Uwe Schoning
  • Patent number: 9494712
    Abstract: Provided are a resin composition for an optical film including an alkyl(meth)acrylate unit, a benzyl(meth)acrylate unit, a (meth)acrylic acid unit, and a unit expressed by Chemical Formula I, an optical film, a polarizing plate, and an image display device using the resin composition.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: November 15, 2016
    Assignee: LG Chem, Ltd.
    Inventors: Jae-Bum Seo, Chang-Hun Han, Dae-Woo Lee, Jung-Tae Park, Eun-Jung Choi, Byoung-Il Kang, Joon-Sik Kim, Su-Kyung Kim, Da-Eun Sung, Nam-Jeong Lee, Beom-Suk Kim, Yu-Taek Sung
  • Patent number: 9458313
    Abstract: Disclosed are a heat-resistant SAN resin, a method of preparing the same, and a heat-resistant ABS resin composition comprising the same. More particularly, a heat-resistant SAN resin comprising 60 to 75 wt % of ?-methylstyrene, 25 to 35 wt % of a vinyl cyan compound, and 0 to 10 wt % of an aromatic vinyl compound (except for ?-methylstyrene), the heat-resistant SAN resin having a degree of branching of 0.40 to 0.60, a molecular weight of 90,000 to 150,000 g/mol, and a glass transition temperature (Tg) of 124 to 140° C., a method of preparing the same, and a heat-resistant ABS resin composition comprising the same are disclosed.
    Type: Grant
    Filed: February 27, 2014
    Date of Patent: October 4, 2016
    Assignee: LG CHEM, LTD.
    Inventors: Jae Bum Seo, Chang Hun Han, Dae Woo Lee, Jung Tae Park, Eun Jung Choi, Byoung Il Kang, Da Eun Sung, Gyu Sun Kim
  • Patent number: 9428646
    Abstract: A halogen-free resin composition includes (A) 100 parts by weight of polyphenylene oxide resin; (B) 10 to 50 parts by weight of maleimide resin; (C) 5 to 100 parts by weight of polybutadiene copolymer; (D) 5 to 30 parts by weight of cyanate ester resin; and (E) 15 to 150 parts by weight of phosphazene. The halogen-free resin composition is characterized by specific ingredients and proportions thereof to achieve circuit board laminate properties, such as a high glass transition temperature, low coefficient of thermal expansion, low dielectric properties, heat resistance, flame retardation, and being halogen-free, and thus is applicable to the manufacturing of a prepreg or resin film, thereby being applicable to the manufacturing of metal laminates and printed circuit boards.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: August 30, 2016
    Assignee: ELITE MATERIAL CO., LTD.
    Inventor: Chen-Yu Hsieh
  • Patent number: 9428667
    Abstract: A member for vehicle according to the present invention includes a resinous substrate, and a protective film being formed on a surface of the resinous substrate partially at least. The protective film is made by curing a curing-type coating-agent composition containing: Component (A) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; Component (B) (e.g., an isocyanuric ring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; Component (C) (e.g., a reaction product) between a colloidal silica and an alkoxysilane compound having a maleimide group) in amount of from 1 to 35 parts by mass; a radical-polymerization initiator serving as Component (D) in an amount of from 0.
    Type: Grant
    Filed: August 27, 2012
    Date of Patent: August 30, 2016
    Assignee: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Hiroaki Takashima, Kyoko Kumagai, Hidetaka Hayashi, Tetsuya Mitsuoka, Naoharu Ueda, Hisashi Muramatsu, Kazumasa Inata, Takeshi Fujita, Yasuyuki Sanai, Eiichi Okazaki, Satoshi Yoneda
  • Patent number: 9388280
    Abstract: The use of Michael addition curing chemistries in compositions comprising sulfur-containing polymers such as polythioethers and polysulfides useful in aerospace sealant applications are disclosed. Sulfur-containing adducts comprising terminal Michael acceptor groups are also disclosed.
    Type: Grant
    Filed: August 19, 2014
    Date of Patent: July 12, 2016
    Assignee: PRC-Desoto International, Inc.
    Inventors: Lawrence G. Anderson, Juexiao Cai, Marfi Ito, Raquel Keledjian, Renhe Lin
  • Patent number: 9296842
    Abstract: A copolymer obtained by polymerizing two or more types of monomers, wherein among fractions obtained by dividing an eluate showing peaks relative to the copolymer, in an elution curve obtained by gel permeation chromatography (GPC), into eight fractions in order of fractionation, such that each fraction has the same volume, a difference between a monomer composition ratio of a copolymer contained in a first eluted fraction and a monomer composition ratio of all copolymers is ?3 mol % to +3 mol % in any of the constitutional units derived from the respective monomers.
    Type: Grant
    Filed: August 15, 2013
    Date of Patent: March 29, 2016
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Atsushi Yasuda, Tomoya Oshikiri, Daisuke Matsumoto, Keisuke Katou, Shinichi Maeda
  • Patent number: 9085719
    Abstract: The present invention is directed to a reversibly adhesive thermal interface material for electronic components and methods of making and using the same. More particularly, embodiments of the invention provide thermal interface materials that include a hydrolytically-stable, thermally-reversible adhesive, and a thermally conductive and electrically non-conductive filler, where the thermal interface material is characterized by a thermal conductivity of 0.2 W/m-K or more and an electrical resistivity of 9×1011 ohm-cm or more. The thermally reversible adhesive comprises a functionalized aminopropyl methylsiloxane-dimethylsiloxane copolymer containing a plurality of dienophile functional groups bonded through an imide linkage, preferably maleimide groups, and a crosslinking agent containing a plurality of diene functional group, preferably furan groups. The reactive groups undergo a Diels Alder crosslinking reaction.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: July 21, 2015
    Assignee: International Business Machines Corporation
    Inventors: Dylan J. Boday, Joseph Kuczynski, Robert E. Meyer, III
  • Patent number: 9062145
    Abstract: A curable resin composition containing a specific vinyl compound obtained by vinylation of a terminal of a bifunctional phenylene ether oligomer having a polyphenylene ether structure in a molecule and a specific bismaleimide compound having at least two maleimide groups in a molecule, a curable film comprising the above composition, a cured product obtained by curing the above composition, and a film obtained by curing the curable film. The above resin composition is excellent in curability even in the presence of oxygen, is curable at a low temperature and is capable of giving a cured product having a low dielectric constant, a low dielectric loss tangent, high heat resistance, excellent mechanical properties, excellent chemical resistance and excellent flame retardancy.
    Type: Grant
    Filed: May 22, 2008
    Date of Patent: June 23, 2015
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Daisuke Ohno, Kenji Ishii
  • Patent number: 9012595
    Abstract: The present invention provides polyimide applied to the buffer coating of semiconductors and a photosensitive resin composition including the same. The polyimide is a polyimide polymer represented by Chemical Formula 1 below. Further, the present invention provides a photosensitive resin composition, including 1) BDA-series soluble polyimide having an i-ray permeability of 70% or more; 2) a polyamic acid having elongation of 40% or more; 3) a novolak resin, and 4) diazonaphthoquinone-series photosensitive substance and having a high resolution, high sensitivity, an excellent film characteristic, and mechanical physical properties which are the requirements of semiconductor buffer coating.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: April 21, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Sang Woo Kim, Chanhyo Park, Kyungjun Kim, Hyeran Seong, Sejin Shin, Hye Won Jeong, Jung Ho Jo
  • Patent number: 9012583
    Abstract: The present invention provides a flow improver for oils and fats, by which a sufficient improvement in the flowability of oils and fats can be achieved, when oils and fats are used as fuels. This flow improver for oils and fats comprises a polymer including constitutional units (I), (II), and (III), and having a weight-average molecular weight in the range of 5,000 to 100,000. The molar fraction a of the constitutional unit (I) is in the range of 0.4 to 0.8, the molar fraction b of the constitutional unit (II) is in the range of 0.1 to 0.3, and the molar fraction c of the constitutional unit (III) is in the range of 0.1 to 0.3.
    Type: Grant
    Filed: February 2, 2011
    Date of Patent: April 21, 2015
    Assignee: NOF Corporation
    Inventors: Fumitaka Yoshikawa, Hideki Kawamoto, Keiji Hirao
  • Patent number: 8993699
    Abstract: There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.
    Type: Grant
    Filed: June 21, 2010
    Date of Patent: March 31, 2015
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Takahiro Kishioka, Takahiro Sakaguchi
  • Publication number: 20150087555
    Abstract: The invention provides a method for immobilization of biological molecules such as nucleic acids, peptides and proteins onto the surface of a glass or plastic solid support.
    Type: Application
    Filed: August 7, 2014
    Publication date: March 26, 2015
    Inventor: Marcella CHIARI
  • Publication number: 20150084031
    Abstract: A polymerizable monomer represented by the following formula (1) wherein at least one of Ar1 to Ar3 is substituted by a group represented by the following formula (2) and which is substituted by one or more groups comprising a polymerizable functional group. Ar1 to Ar3 are a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms, Ar6 is a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms and Ar4 and Ar5 are a substituted or unsubstituted arylene group having 6 to 40 ring carbon atoms.
    Type: Application
    Filed: December 2, 2014
    Publication date: March 26, 2015
    Inventors: Mitsuru EIDA, Nobohiro YABUNOUCHI, Yumiko MIZUKI, Masami WATANABE, Akinori YOMOGITA
  • Patent number: 8986833
    Abstract: Disclosed are enamel varnish compositions for an enamel wire and an enamel wire using the same. The present invention relates to enamel varnish compositions for an enamel wire in which a polymeric resin component is included in an organic solvent, wherein the polymeric resin component includes a first polyamideimide resin; and a second resin having polyamideimide in which a triazine ring is introduced into a major chain. The enamel wire, in which such a coating pigment composition is applied to the innermost layer, has the increased adhesivity of the insulated coating layer to the conducting wire, as well as the excellent physical properties such as the wear resistance and flexibility, etc.
    Type: Grant
    Filed: May 27, 2005
    Date of Patent: March 24, 2015
    Assignee: LS Cable Ltd.
    Inventor: Joon-Hee Lee
  • Publication number: 20150079507
    Abstract: Disclosed herein are various amine treated maleic anhydride containing polymers and compositions thereof, which are useful for forming self-imageable films. In some embodiments, such polymers encompass norbornene-type repeating units containing pendent silyl groups and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units are either ring-opened or have been transformed into maleimide repeat units. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
    Type: Application
    Filed: September 5, 2014
    Publication date: March 19, 2015
    Applicant: PROMERUS, LLC
    Inventors: Pramod KANDANARACHCHI, Larry F. RHODES
  • Publication number: 20150079506
    Abstract: Disclosed herein are various amine treated maleic anhydride containing polymers and compositions thereof, which are useful for forming self-imageable films. In some embodiments, such polymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units are either ring-opened or have been transformed into maleimide repeat units. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
    Type: Application
    Filed: September 5, 2014
    Publication date: March 19, 2015
    Applicants: SUMITOMO BAKELITE CO., LTD, PROMERUS, LLC
    Inventors: PRAMOD KANDANARACHCHI, LARRY F. RHODES, OSAMU ONISHI
  • Publication number: 20150062499
    Abstract: The liquid crystal display of the present invention includes: a liquid crystal panel including vertical alignment liquid crystals encapsulated between a first substrate and a second substrate; a first compensation layer stacked on one side of the first layer; a first polarizing layer stacked on one side of the first compensation layer; a second compensation layer stacked on one side of the second substrate; and a second polarizing layer stacked on one side of the second compensation layer, wherein the first compensation layer is comprised of a polyimide copolymer, and the polyimide copolymer is a copolymer of a monomer mixture comprising maleimide compounds and aromatic vinyl compounds. The liquid crystal display provides significantly improved lateral viewing angle.
    Type: Application
    Filed: August 28, 2012
    Publication date: March 5, 2015
    Inventors: Moon Yeon Lee, Kyu Yeol In, Woo Jung Kim, Jae Hyun Kim, Kyoung Ah Oh
  • Patent number: 8926872
    Abstract: The present invention relates to an acrylic copolymer resin containing: 1) an alkyl (meth)acrylate-based monomer; 2) a (meth)acrylate-based monomer containing an aliphatic ring and/or an aromatic ring; and 3) at least an imide-based monomer or a styrene-based monomer, to a resin composition containing said acrylic copolymer resin and a resin containing an aromatic ring and/or an aliphatic ring in the main chain thereof, to an optical film comprising said resin composition, and to a liquid crystal display device comprising said optical film. The optical film according to the present invention has excellent heat resistance, optical transparency, etc.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: January 6, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Su-Kyung Kim, Byoung-Il Kang, Dae-Woo Lee, Byoung-Kue Chun, Chang-Hun Han, Da-Eun Sung
  • Publication number: 20140357823
    Abstract: The present invention relates to polymers, especially polymers useful as hydrogels, and to use of hydrogels for repair or restoration of tissue. In particular, the polymers and hydrogels of the present invention can be used for the repair or restoration of cartilage, especially articular cartilage. The polymers comprise at least a monomer for binding water, a monomer for imparting mechanical properties and a monomer for binding to an extracellular protein. The hydrogels comprise a polymer comprising at least a monomer for binding water and a monomer for binding to an extracellular protein. Crosslinking polymers by binding of said extra-cellular matrix protein forms hydrogels.
    Type: Application
    Filed: December 19, 2012
    Publication date: December 4, 2014
    Inventors: Fariba Dehghani, Anthony Steven Weiss, Hua Wei, Suzanne Marie Mithieux, Ali Fathi
  • Patent number: 8877884
    Abstract: An adhesive composition is disclosed which includes a polymer prepared by copolymerizing a monomer containing a polymerizable group, the polymer including a low-molecular-weight component having a molecular weight equivalent to 1% or less of the weight-average molecular weight of the polymer, the low-molecular-weight component is contained in a range of not less than 0 weight % to less than 0.3 weight % of the total weight of the polymer. This allows provision of an adhesive composition having great adhesive strength in a high-temperature environment, especially at temperatures from 140° C. to 200° C., as well as high heat resistance and favorable crack resistance.
    Type: Grant
    Filed: July 7, 2009
    Date of Patent: November 4, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Motoki Takahashi, Hirofumi Imai, Takahiro Asai, Koichi Misumi, Toshiyuki Ogata
  • Publication number: 20140322545
    Abstract: A disclosure provides a resin composition, a prepreg, and a substrate employing the same. According to an embodiment of the disclosure, the resin composition includes a polyphenylene ether compound, and a bismaleimide. The prepreg includes a cured product of the resin composition. The substrate includes a product fabricated by the resin composition or the prepreg.
    Type: Application
    Filed: April 30, 2014
    Publication date: October 30, 2014
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wei-Ta YANG, Li-Chun LIANG, I-Hong LIN, Chung-Cheng LIN
  • Patent number: 8853312
    Abstract: A quick curing resin composition, which can be used in conventionally used ovens, and a semiconductor device, which is excellent in reliability such as solder crack resistance or the like when the resin composition, is used as a die attach material for semiconductor. The resin composition has a sufficient low stress property, good adhesion and excellent bleeding property. The resin composition includes a filler (A), compound (B) having the structure represented by the formula (1) and a functional group represented by the formula (2) and a thermal radical initiator (C), and substantially not containing a photo polymerization initiator.
    Type: Grant
    Filed: December 17, 2012
    Date of Patent: October 7, 2014
    Assignee: Sumitomo Bakelite Co., Ltd
    Inventors: Hikaru Okubo, Nobuki Tanaka, Itaru Watanabe
  • Patent number: 8829068
    Abstract: The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: September 9, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Sunhwa Kim, Ho Chan Ji, Dongchang Choi, Han Soo Kim, Yoon Hee Heo, Changho Cho, Won Jin Chung
  • Patent number: 8822614
    Abstract: The present invention provides an acrylic thermoplastic resin containing 50 to 95% by mass of a repeating unit (X) derived from a methacrylate monomer represented by the following formula (1), 0.1 to 20% by mass of a repeating unit (Y1) derived from an N-substituted maleimide monomer (a) represented by the following formula (2), and 0.1 to 49.9% by mass of a repeating unit (Y2) derived from an N-substituted maleimide monomer (b) represented by the following formula (3), regarding the total amount of the repeating unit (X), the repeating unit (Y1), and the repeating unit (Y2) as 100% by mass: The absolute value of a photoelastic coefficient (C) of the acrylic thermoplastic resin is not greater than 3.0×10?12 Pa?1. The halogen atom content is less than 0.47% by mass with reference to the mass of the acrylic thermoplastic resin.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: September 2, 2014
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Masami Yonemura, Mayuko Kimura
  • Publication number: 20140221574
    Abstract: Provided is a liquid crystal alignment layer of which a constituent member is a polymer represented by the general formula (I).
    Type: Application
    Filed: June 27, 2012
    Publication date: August 7, 2014
    Applicant: DIC CORPORATION
    Inventors: Martin Schadt, Vladimir Grigorievich Chigrinov, Hoi-Sing Kwok, Sayaka Nose, Masayuki Iwakubo, Masanao Hayashi, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu
  • Patent number: 8796404
    Abstract: A polymer for an optical film including: a repeating unit A including a repeating unit represented by the following Chemical Formula 1; and a repeating unit B derived from a monomer including an unsaturated bond copolymerizable with the repeating unit A: wherein, in Chemical Formula 1, the variables R1 to R9 are defined herein.
    Type: Grant
    Filed: July 10, 2012
    Date of Patent: August 5, 2014
    Assignees: Samsung Electronics Co., Ltd., Cheil Industries, Inc.
    Inventors: Hyung Jun Kim, Myung-Sup Jung, Won Cheol Jung, Jong-Hoon Won, Kyu Yeol In
  • Publication number: 20140212812
    Abstract: The present application relates to a fluorine-based resin having a novel structure and a photosensitive resin composition including the same. The photosensitive resin composition including the fluorine-based resin according to an exemplary embodiment of the present application has excellent photosensitivity and developability and can increase a contact angle of a coating film to prevent a water stain. Accordingly, the photosensitive resin composition including the fluorine-based resin according to the exemplary embodiment of the present application may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.
    Type: Application
    Filed: May 31, 2012
    Publication date: July 31, 2014
    Applicant: LG CHEM, LTD.
    Inventors: Minjung Kim, Han Soo Kim, Kyung Soo Choi
  • Patent number: 8791219
    Abstract: The present inventions are directed to novel medical adhesives and their use, for example, in biomedical applications. These compositions and applications allow for improved adhesion with and between mammalian tissues.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: July 29, 2014
    Assignees: California Institute of Technology, The Regents Of The University Of California
    Inventors: Robert H. Grubbs, Hoyong Chung, Michael Richard Harrison
  • Publication number: 20140187729
    Abstract: The present invention provides a composition which does not cause the problem of use at high temperature in the mounting process of electronic device. The present invention relates to an underfill sealant composition comprising (a) a (meth)acrylic compound and (c) an isocyanuric acid having an allyl group.
    Type: Application
    Filed: March 7, 2014
    Publication date: July 3, 2014
    Applicant: HENKEL AG & CO. KGAA
    Inventors: Yusuke Horiguchi, Mieko Sano, Kenichiro Sato
  • Publication number: 20140175348
    Abstract: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton].
    Type: Application
    Filed: February 28, 2014
    Publication date: June 26, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Hidenori TAKAHASHI, Shuichiro OSADA
  • Patent number: 8754172
    Abstract: An adhesive composition includes an acrylic copolymer having at least one alkyl group, at least one hydroxyl group, and at least one furyl based group; and a curing agent.
    Type: Grant
    Filed: February 15, 2011
    Date of Patent: June 17, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Kyoung Jin Ha, Irina Nam, Lee Jun Kim, Kil Sung Lee, Eun Hwan Jeong, Woo Jin Jeong
  • Patent number: 8754179
    Abstract: The present discovery uses monomers which contain reversible photo-crosslinkable groups in addition to primary polymerizable groups. The mechanical properties of these materials and the reversibility of the photo-activated shape memory effect demonstrate the effectiveness of using photo-irradiation to effect change in modulus and shape memory effect. In the preferred embodiment the reaction mixture includes a photo-reactive monomer comprising a photo reactive group and a polymerizable group; a second monomer, which is more preferably a mixture of monomers, which are acrylate based; a multi-functional crosslinking agent, preferably 1,6 hexanediol diacrylate (HDODA); an initiator, preferably a free radical initiator; and a fifth, optional, component which is a modifying polymer. The mixture of the second monomer, crosslinking agent, and initiator comprise the base polymer matrix into which the photo-reactive monomer is incorporated.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: June 17, 2014
    Assignee: Cornerstone Research Group, Inc.
    Inventors: Tat Hung Tong, Emily Snyder
  • Patent number: 8754178
    Abstract: A resin composition of the present invention includes a maleimide derivative (A) represented by a general formula (1) and a bis-maleimide compound (B) represented by a general formula (2). In the general formula (1), R1 represents a straight chain or branched alkylene group having 1 or more carbon atoms, R2 represents a straight chain or branched alkyl group having 5 or more carbon atoms, and the sum of carbon atoms of R1 and R2 is 10 or less. In the general formula (2), X1 represents —O—, —COO—, or —OCOO—, R3 represents a straight chain or branched alkylene group having 1 to 5 carbon atoms, R4 represents a straight chain or branched alkylene group having 3 to 6 carbon atoms, and m is an integer of 1 or more and 50 or less.
    Type: Grant
    Filed: September 7, 2011
    Date of Patent: June 17, 2014
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Takashi Kawana, Naoya Kanamori, Ryuichi Murayama
  • Publication number: 20140163175
    Abstract: Conventional cross-linked cyclic olefin polymers do not have a sufficiently low linear expansion coefficient. A compound having a structure represented by the following formula (a).
    Type: Application
    Filed: July 25, 2012
    Publication date: June 12, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Seiji Okada, Ryo Ogawa
  • Publication number: 20140154428
    Abstract: Provided is a liquid crystal alignment layer of which a constituent member is a compound represented by the general formula (I).
    Type: Application
    Filed: June 26, 2012
    Publication date: June 5, 2014
    Applicant: DIC CORPORATION
    Inventors: Martin Schadt, Sayaka Nose, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu
  • Patent number: 8734939
    Abstract: The invention relates to a thermally reversible hot melt adhesive that is isocyanate-free, moisture independent, crosslinkable and thermally reversible. The thermally reversible hot melt adhesive may be repeatedly heated and cooled without negatively affecting the performance of the adhesive. The thermally reversible composition may also be used as a primer layer. The thermally reversible hot melt adhesive and primer are particularly well suited for end use applications such as packaging, graphic arts, construction, footwear, textiles, general assembly, automotive and consumer goods.
    Type: Grant
    Filed: December 12, 2011
    Date of Patent: May 27, 2014
    Assignee: Henkel US IP LLC
    Inventors: Donald Herr, Laxmisha M. Sridhar, Andrew Slark
  • Publication number: 20140121345
    Abstract: Provided is a liquid crystal alignment layer of which a constituent member is a compound represented by the general formula (I).
    Type: Application
    Filed: May 31, 2012
    Publication date: May 1, 2014
    Applicant: DIC CORPORATION
    Inventors: Martin Schadt, Sayaka Nose, Masayuki Iwakubo, Masanao Hayashi, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu
  • Publication number: 20140087293
    Abstract: Various cycloolefinic/maleic anhydride polymers containing maleimide pendant groups and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such polymers encompass norbornene-type repeating units containing maleimide groups and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
    Type: Application
    Filed: September 24, 2013
    Publication date: March 27, 2014
    Applicant: Promerus, LLC
    Inventors: Pramod Kandanarachchi, Larry F. Rhodes
  • Patent number: 8674043
    Abstract: There is provided a photosensitive resin composition having desired properties. A photosensitive resin composition comprising: a component (A) that is a copolymer including a structural unit of Formula (1) and at least one structural unit of Formula (2), and a component (B) that is a photosensitizer: (where two Xs are independently a hydrogen atom, a C1-5 alkyl group, a C5-6 cycloalkyl group, a phenyl group, or a benzyl group and Y is a hydrogen atom, a C1-5 alkyl group, a C5-6 cycloalkyl group, a phenyl group, or a benzyl group provided that each of a part or all of the hydrogen atoms in the alkyl group, the cycloalkyl group, the phenyl group, and the benzyl group is optionally substituted with a halogen atom, a carboxy group, a hydroxy group, an amino group, or a nitro group).
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: March 18, 2014
    Assignee: Nissan Chemical Industries, Ltd.
    Inventor: Takahiro Kishioka
  • Patent number: 8614270
    Abstract: A resin composition which is excellent in quick curing and can be used for curing in conventionally used ovens, and a semiconductor device which is excellent in reliability such as solder crack resistance or the like when the resin composition is used as a die attach material for semiconductor. Further preferably, a resin composition which has a sufficient low stress property, good adhesion and excellent bleeding property. A resin composition comprising a filler (A), the compound (B) comprising a structure represented by the formula (1) and a functional group represented by the formula (2) and a thermal radical initiator (C), and substantially not containing a photo polymerization initiator.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: December 24, 2013
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Hikaru Okubo, Nobuki Tanaka, Itaru Watanabe
  • Publication number: 20130285026
    Abstract: Embodiments in accordance with the present invention relate generally to the use of polycycloolefinic polymers as a structure defining material in organic electronic devices, and more specifically to separators, insulating structures or bank structures of such devices and to organic electronic devices comprising such structures, to processes for preparing such structures and to organic electronic devices encompassing such structures.
    Type: Application
    Filed: April 24, 2013
    Publication date: October 31, 2013
    Applicants: Promerus LLC, Merck Patent GmbH
    Inventors: Pawel Miskiewicz, Tomas Backlund, Philip Edward May, Toby Cull, Larry F. Rhodes, Edmund Elce, Andrew Bell
  • Patent number: 8568624
    Abstract: The present invention relates to an acrylic copolymer resin containing: 1) an alklyl (meth)acrylate-based monomer; 2) a (meth)acrylate-based monomer containing an aliphatic ring and/or an aromatic ring; and 3) at least an imide-based monomer or a styrene-based monomer, to a resin composition containing said acrylic copolymer resin and a resin containing an aromatic ring and/or an aliphatic ring in the main chain thereof, to an optical film comprising said resin composition, and to a liquid crystal display device comprising said optical film. The optical film according to the present invention has excellent heat resistance, optical transparency, etc.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: October 29, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Su-Kyung Kim, Byoung-Il Kang, Dae-Woo Lee, Byoung-Kue Chun, Chang-Hun Han, Da-Eun Sung
  • Publication number: 20130248109
    Abstract: The present inventions are directed to novel medical adhesives and their use, for example, in biomedical applications. These compositions and applications allow for improved adhesion with and between mammalian tissues.
    Type: Application
    Filed: March 1, 2013
    Publication date: September 26, 2013
    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY
    Inventors: Robert H. GRUBBS, Hoyong CHUNG, Michael RICHARD HARRISON
  • Patent number: 8536275
    Abstract: The present invention relates to acryl-based copolymers including an alkyl(meth)acrylate-based monomer; a (meth)acrylate-based monomer containing an aromatic ring; and a maleimide-based monomer, a resin composition including the same, and an optical film prepared by using the same.
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: September 17, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Byung-Il Kang, Chang-Hun Han, Dae-Woo Lee, Eun-Jung Choi
  • Patent number: 8530546
    Abstract: This invention is drawn to a curable composition that has excellent smoothness when a plastic substrate is coated therewith. Also disclosed are active energy beam curable compositions, such as actinically curable compositions, that can be cured without using a photopolymerization initiator, or with the use of a small amount thereof. This object is achieved by the presence of surface treated inorganic oxide microparticles. Such particles are obtained by reacting an alkoxysilane compound (a1) represented by the Formula (1) below and inorganic oxide microparticles (a2) in the presence of water and an organic solvent: (P—SiO3/2)1-a(P—Si(R0)O2/2)a(O1/2R3)z (1) in which P denotes a maleimide containing group, R3 denotes a hydrogen atom or a monovalent organic group, R0 denotes a monovalent organic group, a is 0 or a positive number and satisfies 0?a <1, and z is a positive number and satisfies 0.1 ?z ?2.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: September 10, 2013
    Assignee: Toagosei Co., Ltd.
    Inventors: Kazumasa Inata, Eiichi Okazaki
  • Patent number: RE45219
    Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: October 28, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung Ho Chun, Keon Woo Lee, Sung Joon Oh, Kyungjun Kim, Jungho Jo, Byung Hyun Lee, Min Young Lim, Hye Won Jeong