Imide Monomer Patents (Class 526/262)
  • Publication number: 20100060834
    Abstract: The present invention relates to a novel polyimide copolymer, a method of preparing the polyimide copolymer, a liquid crystal aligning layer including the polyimide copolymer, a method of producing the liquid crystal aligning layer, and a liquid crystal display including the liquid crystal aligning layer. The liquid crystal aligning layer that includes the polyimide copolymer according to the present invention is advantageous in that when ultraviolet rays are radiated on movable chains of the polyamic acid copolymer to perform alignment before a polyimide copolymer is imidized and heat treatment is then performed to conduct imidization, thermal stability is excellent, residual images are not formed, and alignment of liquid crystals is excellent.
    Type: Application
    Filed: January 7, 2008
    Publication date: March 11, 2010
    Inventors: Xing-Zhong Fang, Kyung-Jun Kim, Byung-Hyun Lee, Jung-Ho Jo, Dong-Hyun Oh, Wan-Hee Goh, Sang-Kook Kim, Hye-Ran Seong, Hye-Won Jeong, Yun-Jeong Lee
  • Publication number: 20100063184
    Abstract: The present invention is based on the discovery that certain electron poor olefins combined with nucleophiles and a base catalyst are useful as adhesive compositions for the electronic packaging industry. In particular, the adhesive formulations set forth herein are useful as low temperature curing formulations with high adhesion to a variety of substrates. Invention formulations typically cure at about 80° C. and have a potlife of about 24 hours. The formulations cure by the well-known Michael addition reaction.
    Type: Application
    Filed: April 14, 2008
    Publication date: March 11, 2010
    Applicant: DESIGNER MOLECULES, INC.
    Inventor: Stephen M. Dershem
  • Patent number: 7671154
    Abstract: Crosslinked polymeric materials are described that contain pendant amine capture groups. The amine capture groups include N-sulfonyldicarboximide groups that can react with amine-containing materials by a ring opening reaction. Reaction mixtures used to prepare the crosslinked polymeric materials, articles containing the crosslinked polymeric materials, methods of making articles, and methods of immobilizing an amine-containing material are also described.
    Type: Grant
    Filed: April 30, 2009
    Date of Patent: March 2, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: George G. I. Moore, Rahul R. Shah, Karl E. Benson, Charles M. Leir
  • Publication number: 20100036065
    Abstract: Disclosed are a maleimide-?-alkylstyrene-based, heat-resistant bulk tetrapolymer and a preparation process thereof. More specifically, disclosed are a bulk tetrapolymer, comprising 5-60 wt % of an N-substituted maleimide monomer, 10-70 wt % of an ?-alkylstyrene monomer, 5-50 wt % of an unsaturated nitrile monomer and 3-50 wt % of an aromatic vinyl monomer, as well as a continuous bulk polymerization process for preparing the same. The disclosed bulk tetrapolymer has a weight-average molecular weight (Mw) of 70,000-300,000 and a glass transition temperature of 150-200° C., shows excellent high-temperature thermal stability and heat resistance and a remarkably low melt viscosity, and thus is excellent not only in processability, but also in productivity, processability, moldability and blendability, when it is blended with other resins. Also, the continuous bulk polymerization process is equipped with a devolatilizer and enables the bulk tetrapolymer to be produced at low cost and high efficiency.
    Type: Application
    Filed: December 2, 2006
    Publication date: February 11, 2010
    Applicant: Korea Kumbo Petrochemical Co., Ltd.
    Inventors: Dong Cheol Sohn, Sup Joo Lee, Byung Yoon Ahn
  • Patent number: 7655155
    Abstract: A liquid crystal thermoset (LCT) monomer or oligomer having both ends capped with maleimide having at least one methyl group, represented by Formula 1: wherein R1 and R2 are each independently CH3 or H, and at least one of R1 and R2 is a methyl group, and Ar1 is a divalent organic group containing one or more structural units selected from the group consisting of ester, amide, ester amide, ester imide and ether imide units, and Ar1 has a molecular weight not greater than 5,000.
    Type: Grant
    Filed: July 15, 2008
    Date of Patent: February 2, 2010
    Assignees: Samsung Electronics Co., Ltd., Samsung Electro-Mechanics Co., Ltd., Samsung Fine Chemicals Co., Ltd.
    Inventors: Myung Sup Jung, Chung Kun Cho, Yong Ho Ahn, Seo Won Jang, Jin Hae Chang, Mahn Jong Kim, Chung Won Park
  • Publication number: 20100010182
    Abstract: An adhesive composition is disclosed which includes a polymer prepared by copolymerizing a monomer containing a polymerizable group, the polymer including a low-molecular-weight component having a molecular weight equivalent to 1% or less of the weight-average molecular weight of the polymer, the low-molecular-weight component is contained in a range of not less than 0 weight % to less than 0.3 weight % of the total weight of the polymer. This allows provision of an adhesive composition having great adhesive strength in a high-temperature environment, especially at temperatures from 140° C. to 200° C., as well as high heat resistance and favorable crack resistance.
    Type: Application
    Filed: July 7, 2009
    Publication date: January 14, 2010
    Inventors: Motoki Takahashi, Hirofumi Imai, Takahiro Asai, Koichi Misumi, Toshiyuki Ogata
  • Publication number: 20090275718
    Abstract: The present invention relates to a transparent resin composition which comprises (a) a (meth)acrylate based unit comprising one or more (meth)acrylate based derivatives; (b) an aromatic based unit having a chain having the hydroxy group containing portion and an aromatic moiety and (c) a styrene-based unit comprising one or more styrene-based derivatives, and an optical film that is formed by using the same.
    Type: Application
    Filed: May 4, 2009
    Publication date: November 5, 2009
    Applicant: LG Chem, Ltd.
    Inventors: Jun-Geun Um, Min-Hee Lee, Nam-Jeong Lee, Jong-Hun Lee, Dong-Ryul Kim, Sae-Han Cho
  • Publication number: 20090234087
    Abstract: An adhesive composition of the present invention includes a polymer as a main component. The polymer is produced by copolymerization of a monomer composition which includes chain-structured alkyl (meth)acrylate and a monomer containing a maleimide group. This makes it possible to provide an adhesive composition used for forming an adhesive layer in which adhesive strength is kept in a high temperature environment. That is, it becomes possible to provide an adhesive composition that allows forming an adhesive layer which has high adhesive strength in a high temperature environment (particularly at 200° C. to 250° C.).
    Type: Application
    Filed: January 29, 2009
    Publication date: September 17, 2009
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takahiro Asai, Koichi Misumi, Toshiyuki Ogata, Motoki Takahashi, Hirofumi Imai
  • Publication number: 20090221777
    Abstract: Disclosed is a photosensitive resin composition comprising (A) a polyimide resin, (B) a photo-acid generator, and (C) a crosslinking agent having an alkoxyalkylated amino group.
    Type: Application
    Filed: April 19, 2007
    Publication date: September 3, 2009
    Applicant: JSR CORPORATION
    Inventors: Takashi Chiba, Akio Saito, Shigehito Asano
  • Publication number: 20090215996
    Abstract: Crosslinked polymeric materials are described that contain pendant amine capture groups. The amine capture groups include N-sulfonyldicarboximide groups that can react with amine-containing materials by a ring opening reaction. Reaction mixtures used to prepare the crosslinked polymeric materials, articles containing the crosslinked polymeric materials, methods of making articles, and methods of immobilizing an amine-containing material are also described.
    Type: Application
    Filed: April 30, 2009
    Publication date: August 27, 2009
    Inventors: George G.I. Moore, Rahul R. Shah, Karl E. Benson, Charles M. Leir
  • Publication number: 20090185988
    Abstract: UV-absorbing polymers and copolymers suitable for Composition into sunscreens for the protection of human skin. The UV-absorbing chromophoric monomers chosen are simple and easily synthesized. With the correct choice of chromophoric monomer or mixture of monomers, protection against UV-A radiation or against both UV-A and UV-B radiation can be achieved. With the correct choice of comonomer, copolymers produced as aqueous latex emulsions or as Polyethylene Glycol solutions can also be achieved.
    Type: Application
    Filed: January 17, 2008
    Publication date: July 23, 2009
    Applicant: Eastman Chemical Company
    Inventors: Robert Joseph Maleski, Ramesh Chand Munjal, Max Allen Weaver, Jean Carroll Fleischer, Michael Gale Ramsey, Greg Alan King, Edward Enns McEntire
  • Patent number: 7544755
    Abstract: Crosslinked polymeric materials are described that contain pendant amine capture groups. The amine capture groups include N-sulfonyldicarboximide groups that can react with amine-containing materials by a ring opening reaction. Reaction mixtures used to prepare the crosslinked polymeric materials, articles containing the crosslinked polymeric materials, methods of making articles, and methods of immobilizing an amine-containing material are also described.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: June 9, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: George G. I. Moore, Rahul R. Shah, Karl E. Benson, Charles M. Leir
  • Patent number: 7537839
    Abstract: The present invention generally relates to anaerobically curable compositions of: (a) a cyanate ester compound having the structure of formula I: R1O—C?N)m??(I) ?wherein m is from 2 to 5 and R1 is an aromatic nucleus-containing residue; (b) a (meth)acrylate monomer; and (c) an anaerobic cure inducing composition comprising peroxide and saccharin, wherein said composition is free of added metallic catalyst.
    Type: Grant
    Filed: April 2, 2007
    Date of Patent: May 26, 2009
    Assignee: Henkel Corporation
    Inventors: Shabbir Attarwala, Qinyan Zhu, Susan Lamtruong Levandoski
  • Patent number: 7534549
    Abstract: A photoresist polymer comprising a fluorine component, a photoresist composition containing the photoresist polymer and an organic solvent to reduce surface tension, and a method for manufacturing a semiconductor device using the same by forming a photoresist film uniformly on the whole surface of an underlying layer pattern to allow a subsequent ion-implanting process to be performed stably.
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: May 19, 2009
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jae Chang Jung
  • Patent number: 7534548
    Abstract: A polymer for immersion lithography comprising a repeating unit represented by Formula 1 and a photoresist composition containing the same. A photoresist film formed by the photoresist composition of the invention is highly resistant to dissolution, a photoacid generator in an aqueous solution for immersion lithography, thereby preventing contamination of an exposure lens and deformation of the photoresist pattern by exposure.
    Type: Grant
    Filed: December 15, 2005
    Date of Patent: May 19, 2009
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jae Chang Jung, Cheol Kyu Bok, Chang Moon Lim, Seung Chan Moon
  • Publication number: 20090076233
    Abstract: A novel hybrid polymer has a structure in which a polyolefin segment and a polar polymer segment are connected not via a bonding group containing a heteroatom. A method of the invention produces the hybrid polymer with industrial advantages. The hybrid polymer includes a polyolefin segment (A) and a polar polymer segment (B), the polar polymer segment being obtained by radical polymerization of a radically polymerizable monomer.
    Type: Application
    Filed: February 21, 2006
    Publication date: March 19, 2009
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Hideyuki Kaneko, Shinichi Kojoh, Nobuo Kawahara, Shingo Matsuo, Tomoaki Matsugi, Norio Kashiwa
  • Patent number: 7504195
    Abstract: A photosensitive polymer which can form a fine circuit pattern by exacting with extreme UV and deep UV, and can improve a line width stability of a pattern by significantly reducing line edge roughness after developing, and a photoresist composition including the same are disclosed. The photosensitive polymer for extreme UV and deep UV includes a repeating unit represented by the following Formula 1, in Formula 1, R1 and R1? are independently a hydrogen atom, methyl group, or trifluoromethyl group, and R2 is wherein Ra and Rb are independently alkyl group of 1 to 10 carbon atoms, aryl group of 6 to 10 carbon atoms, or arylalkyl group of 7 to 12 carbon atoms, and can be connected together to form ring, and a and b are mol % of each repeating unit with respect to the total repeating unit constituting the photosensitive polymer, and are 1 to 99 mol % and 1 to 99 mol % respectively.
    Type: Grant
    Filed: August 9, 2007
    Date of Patent: March 17, 2009
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Deog-Bae Kim, Jae-Hyun Kim
  • Publication number: 20090068380
    Abstract: The present invention provides uniaxially stretched polymer films that have a refractive index profile suitable for use as negative A-plates or biaxial birefringent plates in a liquid crystal display (LCD) device. These wave plates can be used to compensate for the phase retardations existing in various modes of LCDs including TN (twisted nematic), VA (vertically aligned), IPS (in-plane switching), and OCB (optically compensated bend), and therefore improving the viewing quality of the displays.
    Type: Application
    Filed: August 22, 2008
    Publication date: March 12, 2009
    Inventors: Xiaoliang Joe Zheng, Frank W. Harris, Ted Calvin Germroth, Jiaokai Alexander Jing, Dong Zhang, Thauming Kuo, Brian Michael King
  • Publication number: 20090068418
    Abstract: A display panel has a resin substrate and a printed layer formed on at least a part of the resin substrate through inkjet printing. The printed layer is formed from cured products of UV-curable inks each containing UV-curable monomers which are polymerized and cured by UV irradiation, and the printed layer has at least two such cured products having different pencil hardness values.
    Type: Application
    Filed: August 28, 2008
    Publication date: March 12, 2009
    Applicants: DENSO CORPORATION, Toyo Ink Mfg. Co., Ltd.
    Inventors: Teruhiko Iwase, Takashi Aoki, Osamu Ina, Yasuo Yoshihiro, Yukitoshi Takahashi, Shinichi Sato
  • Patent number: 7479514
    Abstract: An adhesion promoting composition includes a polymer, such as an acrylic copolymer, having acetoacetoxy functionality and adhesion-promoting functionality and a metal alkoxide, chelate, and/or alkoxide chelate. The composition is applied in a first layer over a metal substrate or a coated substrate, then coated with a desired refinish coating composition.
    Type: Grant
    Filed: March 23, 2005
    Date of Patent: January 20, 2009
    Assignee: BASF Corporation
    Inventor: Anthony Tye
  • Publication number: 20090017004
    Abstract: The present invention provides polymeric delivery systems including an aromatic allyllic acyl group. Methods of making the polymeric delivery systems and methods of treating mammals using the same are also disclosed.
    Type: Application
    Filed: July 11, 2008
    Publication date: January 15, 2009
    Applicant: ENZON PHARMACEUTICALS, INC.
    Inventor: Hong ZHAO
  • Publication number: 20080300350
    Abstract: A curable resin composition containing a specific vinyl compound obtained by vinylation of a terminal of a bifunctional phenylene ether oligomer having a polyphenylene ether structure in a molecule and a specific bismaleimide compound having at least two maleimide groups in a molecule, a curable film comprising the above composition, a cured product obtained by curing the above composition, and a film obtained by curing the curable film. The above resin composition is excellent in curability even in the presence of oxygen, is curable at a low temperature and is capable of giving a cured product having a low dielectric constant, a low dielectric loss tangent, high heat resistance, excellent mechanical properties, excellent chemical resistance and excellent flame retardancy.
    Type: Application
    Filed: May 22, 2008
    Publication date: December 4, 2008
    Inventors: Daisuke Ohno, Kenji Ishii
  • Patent number: 7423102
    Abstract: The present invention provides a star polymer which comprises a central core and three or more branches bonded to the central core, and has a weight average molecular weight of from 1,000 to 100,000, wherein at least one of the branches containing at least one repeating unit selected from the group consisting of the following repeating units (1), (2), (3), (4) and (9); and a process for producing the star polymer. The present invention also provides a chemically amplified positive resist composition comprising the star polymer and an acid generator.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: September 9, 2008
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Youngjoon Lee, Yasuhiro Watanabe, Takayuki Miyagawa
  • Publication number: 20080191173
    Abstract: The invention is based on the discovery that certain polyester compounds bearing free-radical curable moieties are useful as b-stageable adhesives for the microelectonic packaging industry.
    Type: Application
    Filed: October 17, 2007
    Publication date: August 14, 2008
    Inventors: Stephen M. Dershem, Farhad G. Mizori
  • Publication number: 20080153925
    Abstract: Solubilizers prepared by polymerizing: (i) at least one first monomer of the general formula (I): wherein R1 and R2 each independently represent H or CH3, R3 represents a C6-C10-aryl or C7-C12-aralkyl which may be unsubstituted or substituted with one or more C1-C9-alkyl and/or C1-C5-alkoxy substituents, and n represents an integer from 0 to 100; and (ii) at least one second monomer selected from the group consisting of N-vinylamides, N-vinyllactams, N-vinylimines, N-vinylamines having 2 to 15 carbon atoms, and mixtures thereof; and methods of solubilizing active ingredients by combining them with such a solubilizer.
    Type: Application
    Filed: August 3, 2005
    Publication date: June 26, 2008
    Applicant: BASF Aktiengesellschaft
    Inventors: Marianna Pierobon, Nathalie Bouillo, Ronald Frans Maria Lange, Kathrin Meyer, Karl Kolter
  • Publication number: 20080132665
    Abstract: Soluble polymers and methods for the preparation thereof, wherein the polymers of the present invention have pendant acylsulfonamide amine-reactive groups that can be used for the capture of amine containing materials.
    Type: Application
    Filed: January 3, 2008
    Publication date: June 5, 2008
    Inventors: Karl E. Benson, G. Marco Bommarito, Albert I. Everaerts, Brinda B. Lakshmi, Charles M. Leir, George G.I. Moora, Lang N. Nguyen, Rahul Shah, Peter A. Stark
  • Patent number: 7375163
    Abstract: Described are polymers and cement admixtures which reduce drop in fluidity with time. Said admixture comprises at least one polymer of the present invention and at least one polymer A. The polymer of the present invention comprises side chains of which at least 10 weight-% can be cleaved in alkaline medium. The polymer of the present invention is an acrylic polymer which comprises side chains connected to the backbone by ester linkages. These side chains may be alkyl, hydroxy alkyl, cycloalkyl or polyoxyalkylene groups. Polymer A is a cement dispersing agent. The combination of polymer A with the polymer of the present invention in a weight ratio of 0.1:10-10:1, and preferably 1:10-10:1 reduces the drop in fluidity with time of cementitious compositions.
    Type: Grant
    Filed: January 11, 2006
    Date of Patent: May 20, 2008
    Assignee: Sika Technology AG
    Inventors: Irene Schober, Theodor A. Bürge, Ulf Velten, Jürg Widmer, Christian M. Bürge, Urs Mäder
  • Patent number: 7335373
    Abstract: N-halamine compounds which contain hindered amine and amide functional groups. Compounds include wherein X, X?, and X? independently are H, Cl, or Br, wherein no more than two of X, X?, and X? are H and wherein R, R?, and R? are independently alkyl groups containing 1 to 4 carbon atoms or hydrogen, and X and X? are independently H, Cl, or Br. Compositions comprising the compounds are also described. The compounds and/or compositions can be used, for example, for the purpose of constructing biocidal coatings and materials. The biocidal activity can inactivate pathogenic microorganisms such as bacteria, fungi, and yeasts, as well as, virus particles.
    Type: Grant
    Filed: November 17, 2004
    Date of Patent: February 26, 2008
    Assignee: Auburn University
    Inventors: Shelby D. Worley, Yongjun Chen, Jie Liang, Rong Wu, Kevin Barnes, Royall M. Broughton, Unchin Cho, Jaewoong Lee
  • Publication number: 20080033129
    Abstract: Cross-linked ampholytic polymers that may be used as rheological modifiers, and/or absorbent gelling materials are disclosed. The polymers may be storage stable in aqueous compositions comprising soluble salt, and/or an oxidizer, such as hydrogen peroxide.
    Type: Application
    Filed: August 1, 2007
    Publication date: February 7, 2008
    Inventors: Lee Arnold Schechtman, Joseph Jay Kemper, Giovanni Carlucci
  • Publication number: 20080017308
    Abstract: The invention provides derivatives of poly(styrene-co-allylalcohol). These materials are useful as thermosetting monomers that can be incorporated into adhesive compositions. In some embodiments, the adhesive compositions are useful in the microelectronic packaging industry.
    Type: Application
    Filed: July 24, 2007
    Publication date: January 24, 2008
    Inventor: Stephen M. Dershem
  • Patent number: 7312534
    Abstract: The present invention relates to interlayer dielectric materials and pre-applied die attach adhesives, more specifically pre-applied die attach adhesives (such as wafer and other substrate-applied die attach adhesives), methods of applying the interlayer dielectric materials onto substrates to prepare low K dielectric semiconductor chips, methods of applying the pre-applied die attach adhesives onto wafer and other substrate surfaces, and assemblies prepared therewith for connecting microelectronic circuitry.
    Type: Grant
    Filed: June 17, 2003
    Date of Patent: December 25, 2007
    Assignee: Henkel Corporation
    Inventors: Benedicto delos Santos, James T. Huneke, Puwei Liu, Kang Yang, Qing Ji
  • Patent number: 7309724
    Abstract: In accordance with the present invention, there are provided novel thermosetting resin compositions which do not require solvent to provide a system having suitable viscosity for convenient handling. Invention compositions have the benefit of undergoing rapid cure. The resulting thermosets are stable to elevated temperatures, are highly flexible, have low moisture uptake and are consequently useful in a variety of applications, e.g., in adhesive applications since they display good adhesion to both the substrate and the device attached thereto.
    Type: Grant
    Filed: June 10, 2004
    Date of Patent: December 18, 2007
    Assignee: Henkel Corporation
    Inventors: Stephen M. Dershem, Dennis B. Patterson, Jose A. Osuna, Jr.
  • Patent number: 7300990
    Abstract: Polymers may be made from zwitterionic monomers having controlled architectures and molecular weights, using living polymerisations such as group or atom transfer radical polymerisation. For instance polymers may be formed by atom transfer radical polymerisation using a copper chloride catalyst, a ligand which is water soluble, and a water soluble tertiary alkyl halide initiator to form homopolymers having controlled polydispersities of less than 1.5 and block copolymers with other hydrophilic or hydrophobic monomers. One suitable zwitterionic monomer is 2-methacryloyloxy-2?-trimethylammoniumethyl phosphate inner salt. The block copolymers may spontaneously form micelles, believed to have zwitterionic, for instance phosphorylcholine, groups at the external surface, which may be useful as drug delivery systems with improved biocompatibility.
    Type: Grant
    Filed: January 3, 2005
    Date of Patent: November 27, 2007
    Assignee: Biocompatibles UK Limited
    Inventors: Andrew Lennard Lewis, Sean Leo Willis, Steven Peter Armes, Emma Janice Lobb, Yinghua Ma
  • Patent number: 7276195
    Abstract: Shape memory polymers prepared by copolymerizing two monomers, which each separately produce polymers characterized by different glass transition temperatures in the presence of a multi-functional monomer whereby the copolymer formed is cross-linked during the polymerization to form a thermoset network. The transition temperature of the final polymers is adjusted by the ratio of the monomers selected, to from about 150° C. to about 270° C., while the degree of crosslinking controls the rubbery modulus plateau. The shape memory polymers can be processed as castable formulations in the form of bulk articles, coatings and films. The invention also relates to the articles of manufacture thereof and methods of the preparation and use thereof.
    Type: Grant
    Filed: July 26, 2006
    Date of Patent: October 2, 2007
    Assignee: Cornerstone Research Group
    Inventor: Tat Hung Tong
  • Patent number: 7271227
    Abstract: The present invention generally relates to curable compositions free of metallic catalysts. The inventive compositions are capable of curing when applied to a metal substrate. The inventive compositions provide improved thermal performance and enhanced cure strength on oily metal surfaces.
    Type: Grant
    Filed: April 20, 2004
    Date of Patent: September 18, 2007
    Assignee: Henkel Corporation
    Inventors: Shabbir Attarwala, Qinyan Zhu, Susan Lamtruong Levandoski
  • Patent number: 7268188
    Abstract: A crosslinkable second-order nonlinear optical polymer having one or more polarizable chromophore moieties, one or more diene moieties, and one or more dienophile or dienophile precursor moieties, wherein the diene and dienophile moieties are reactive to form 4+2 cycloaddition products; a crosslinked second-order nonlinear optical polymer having aligned, polarizable chromophore moieties and one or more 4+2 cycloaddition moieties, wherein the 4+2 cycloaddition moieties are reversibly, thermally reactive to provide diene moieties and dienophile moieties; lattices and devices that include the crosslinkable second-order nonlinear optical polymer; lattices and devices that include the crosslinked second-order nonlinear optical polymer; and methods for making the crosslinked second-order nonlinear optical polymer.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: September 11, 2007
    Assignee: University of Washington
    Inventors: Kwan-Yue Jen, Larry R. Dalton, Jingdong Luo, Marnie A. Haller
  • Patent number: 7186496
    Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of the bottom film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
    Type: Grant
    Filed: October 12, 2004
    Date of Patent: March 6, 2007
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jae Chang Jung, Keun Kyu Kong, Young-Sik Kim
  • Patent number: 7166661
    Abstract: An organic-inorganic composite material is formed by polycondensating a metal alkoxide through hydrolysis until the unreacted metal alkoxide is reduced to 3 vol. % or less, and mixing it with an organic polymer. The composite material has a light transmittance of at least 90% per 10 ?m material thickness for light of 600 to 1000 nm. The metal element content of the composite material is preferably 0.1 to 46 wt. %, more preferably 5 to 37 wt. %. By laminating layers of such organic-inorganic composite materials having respective different compositions, the resulting laminate has a concentration gradient wherein the metal element content increases or decreases monotonously, or increases and decreases in succession, from one side to the other side of the laminate. The resulting refractive index varies opposite the metal element content. The material can be used for an optical waveguide or a light transmission structure.
    Type: Grant
    Filed: March 1, 2004
    Date of Patent: January 23, 2007
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Keiichi Kuramoto, Hiroaki Izu, Koji Yamano, Hitoshi Hirano
  • Patent number: 7157523
    Abstract: The disclosure is directed to a partially hydrogenated ring-opened polynorbornene and a process for making the same. The ring-opened polynorbornene is low in birefringence, high in wavelength dependency about birefringence and excellent in transparency and heat resistance.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: January 2, 2007
    Assignee: JSR Corporation
    Inventors: Nobuyuki Miyaki, Yoshikazu Miyamoto, Souichi Yoshida, Yuichi Hashiguchi
  • Patent number: 7144965
    Abstract: The invention is directed to polymerizable vinyl compounds having halogenated aromatic groups and to a method of synthesizing such compounds. In particular, the invention is directed to polymerizable aromatic vinyl compounds wherein, except for the vinylic hydrogen atoms, aromatic C—H bonds are replaced by C—X bonds, where X is a halogen or other selected substituent having a de minimus number, if any, of C—H bonds; for example, without limitation, highly fluorinated fluoroalkanes. In addition, the compounds of the invention have a de minimus number, if any, of N—H and O—H bonds.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: December 5, 2006
    Assignee: Corning, Incorporated
    Inventors: Olivier Arnoud, Marc Moroni, Stephane Roux
  • Patent number: 7144960
    Abstract: A crosslinkable second-order nonlinear optical polymer having one or more polarizable chromophore moieties, one or more diene moieties, and one or more dienophile or dienophile precursor moieties, wherein the diene and dienophile moieties are reactive to form 4+2 cycloaddition products; a crosslinked second-order nonlinear optical polymer having aligned, polarizable chromophore moieties and one or more 4+2 cycloaddition moieties, wherein the 4+2 cycloaddition moieties are reversibly, thermally reactive to provide diene moieties and dienophile moieties; lattices and devices that include the crosslinkable second-order nonlinear optical polymer; lattices and devices that include the crosslinked second-order nonlinear optical polymer; and methods for making the crosslinked second-order nonlinear optical polymer.
    Type: Grant
    Filed: January 15, 2004
    Date of Patent: December 5, 2006
    Assignee: University of Washington
    Inventors: Kwan-Yue Jen, Larry R. Dalton, Jingdong Luo, Marnie A. Haller
  • Patent number: 7119160
    Abstract: There are provided a polyalkenyl ether type polyurethane, which is excellent in flexibility, aor the like, and which has in the molecule, a structural unit represented by formula (XXX): (wherein n represents an integer of 2 to 1000, R1 represents substituted or unsubstituted lower alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, and R2, R3 and R4, which are the same or different, each represent a hydrogen atom, substituted or unsubstituted lower alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, and R1s, R2s, R3s, and R4s, when they are each present two or more in number, may be respectively the same or different), and the like.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: October 10, 2006
    Assignee: Kyowa Hakko Chemical Co., Ltd.
    Inventors: Sai Kodama, Shigeru Murata, Toshihiro Inayama, Tatsuo Niimi
  • Patent number: 7087677
    Abstract: This invention relates to copolymer compositions having pigment like properties, comprising a fluorescent or non-fluorescent dye attached to a polymer chain by a spacer having a chain length of C3 or longer. The invention also provides for new mono- and difunctional dye monomers comprising a polymerizable group attached to a dye moiety by a spacer of a chain length of C3 or longer. The polymer pigments provide excellent properties, especially high temperature stability and easy applicability as colorant in different standard polymers.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: August 8, 2006
    Inventors: Bansi Lal Kaul, Jean-Christophe Graciet, Mitchell A. Winnik, Frederic Tronc, Mei Li, Jianping Lu
  • Patent number: 7064168
    Abstract: AnB block copolymers, wherein n is at least two, that include A blocks with poly(vinyl pyrrolidone) units and B blocks with urethane groups, urea groups, imide groups, amide groups, ether groups, ester groups, or combinations thereof, as well as medical devices and methods.
    Type: Grant
    Filed: May 10, 2004
    Date of Patent: June 20, 2006
    Assignee: Medtronic, Inc.
    Inventors: Michael Eric Benz, Julie A Alkatout, SuPing Lyu
  • Patent number: 7060416
    Abstract: Alkali soluble copolymers, imageable elements useful as lithographic printing plate precursors that contain the alkali soluble copolymers, and methods for forming images using the imageable elements are disclosed.
    Type: Grant
    Filed: March 4, 2005
    Date of Patent: June 13, 2006
    Assignee: Eastman Kodak Company
    Inventors: Kevin B. Ray, Anthony Paul Kitson, John Kalamen
  • Patent number: 7037993
    Abstract: A norbornene ring-opened polymer which in the molecule has repeating units represented by the formula (1): wherein R1 represents Q, R2 represents Q or C(?O)R5, R3 represents Q or C(?O)R6, and R4 represents Q or X—C(?O)R7 (wherein Q represents hydrogen, a C1-10 hydrocarbon group, etc.; R5, R6 and R7 each represents hydroxyl, C1-10 alkoxyl, etc., provided that R6 and R7 may be bonded to each other to constitute oxygen, NH, etc.; X represents methylene, etc., provided that when R2 is Q, then R3 is C(?O)R6 and R4 is X—C(?O)R7 and that when R4 is Q, then R2 is C(?O)R5, R3 is C(?O)R6, and the configuration of R2 and R3 is trans, and m is 0 or 1), the polymer having a weight-average molecular weight as determined by gel permeation chromatography of 1,000 to 1,000,000. Also provided is a hydrogenation product of the norbornene ring-opened polymer. The norbornene ring-opened polymer and the hydrogenation product are excellent in heat resistance, electrical properties, etc.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: May 2, 2006
    Assignee: Zeon Corporation
    Inventors: Kazunori Taguchi, Seiji Okada, Yasuo Tsunogae
  • Patent number: 7030201
    Abstract: The present invention relates to bottom antireflective coating compositions and polymers useful in making such compositions.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: April 18, 2006
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Huirong Yao, Shuji Ding-Lee, Hengpeng Wu, Zhong Xiang
  • Patent number: 7009011
    Abstract: A stable free radical process for preparing a polymer having acid anhydride functionality includes heating a mixture comprised of a stable free radical agent, maleic anhydride or derivative thereof, and at least one polymerizable electron donor monomer to initiate exothermic reaction and during exotherm of the reaction, adding additional amounts of stable free radical agent to control the reaction temperature. The mixture may also include a stable free radical initiator. In the mixture, the maleic anhydride or derivative thereof preferably comprises from about 10% to about 70%, molar basis, of a total amount of the maleic anhydride or derivative thereof and the at least one polymerizable electron donor monomer. Typically, the heating is to a temperature of from about 100° C. to about 160° C., and the rate of addition of the additional amounts of stable free radical agent is adjusted to control the reaction temperature to be about 160° C. or less.
    Type: Grant
    Filed: May 31, 2005
    Date of Patent: March 7, 2006
    Assignee: Xerox Corporation
    Inventor: Barkev Keoshkerian
  • Patent number: 7001967
    Abstract: A transparent heat-resistant resin optical materials having excellent heat resistance and dynamic characteristics, having negative birefringence and exhibiting a high refractive index and a high Abbe number, especially optical compensating members such as films, sheets and retardation films for LCD display element. The transparent heat-resistant resin optical material is made of a copolymer containing a specific olefin residue unit and a specific N-phenyl-substituted maleimide residue unit and having a weight average molecular weight, as reduced into standard polystyrene, of from 5×103 to 5×106, the transparent heat-resistant resin optical material exhibiting negative birefringence; and a retardation film having a relationship of three-dimensional refractive indexes of nz?ny>nx, nz>ny?nx, or nz>nx?ny.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: February 21, 2006
    Assignee: Tosoh Corporation
    Inventors: Shinsuke Toyomasu, Yojiro Ikai
  • Patent number: RE40728
    Abstract: The invention is a curable cyclobutarene based polymer comprising acid functional pendant groups. The cured polymer displays excellent qualities of toughness, adhesion, dielectric constant, and low stress. The preferred system is soluble in an aqueous base and can be used to generate patterned films with excellent resolution without the need to handle organic developer solvents.
    Type: Grant
    Filed: March 24, 2004
    Date of Patent: June 9, 2009
    Inventors: Ying H. So, Robert A. DeVries, Mitchell G. Dibbs, Robert L. McGee, Edward O. Shaffer, II, Michael J. Radler, Richard P. DeCaire