3-membered Heterocyclic Ring Contains At Least One Oxygen Atom Patents (Class 526/273)
  • Patent number: 8039544
    Abstract: A composition includes a first cylcoolefin substituted with at least one epoxy group and an aromatic amine. The composition is capable of bonding to a filler having a corresponding binding site. The composition is compatible with a metathesis catalyst capable of catalyzing a ring-opening metathesis polymerization reaction when contacted with the first cycloolefin. An associated method is also provided.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: October 18, 2011
    Assignee: General Electric Company
    Inventors: Xiaolan Wei, Wendy Wen-Ling Lin
  • Patent number: 8039543
    Abstract: A composition includes a first cylcoolefin substituted with at least one epoxy group and an aromatic amine. The composition is capable of bonding to a filler having a corresponding binding site. The composition is compatible with a metathesis catalyst capable of catalyzing a ring-opening metathesis polymerization reaction when contacted with the first cycloolefin. An associated method is also provided.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: October 18, 2011
    Assignee: General Electric Company
    Inventors: Xiaolan Wei, Wendy Wen-Ling Lin, Warren Rosal Ronk
  • Publication number: 20110250415
    Abstract: An ultraviolet (UV) curable resin composition is provided which includes 25 to 45 parts by weight of a modified epoxy acrylate oligomer; and 10 to 25 parts by weight of a urethane acrylate oligomer. Further provided is a metal sheet that is transparent and corrosion resistant, impact resistant, scratch resistant, adhesive, anti-corrosive, and bendable (workable) by forming a coating film on the surface of a metal material such as a steel material, specifically a steel sheet, using the UV curable resin composition mentioned above.
    Type: Application
    Filed: November 12, 2009
    Publication date: October 13, 2011
    Applicants: NOROO HOLDINGS CO., LTD., POSCO
    Inventors: Jin Tae Kim, Sang Gon Kim, Jae Ryung Lee, Jung Su Kim, Moon Jae Kwon, Chang Se Byeon
  • Publication number: 20110245443
    Abstract: Disclosed is a method for producing a norbornene monomer composition, a norbornene polymer produced using the norbornene monomer composition, an optical film including the norbornene polymer, and a method for producing the norbornene polymer. The method includes reacting a reaction solution that contains cyclopentadiene, dicyclopentadiene, or a mixture of cyclopentadiene and dicyclopentadiene, an acetate compound, and a solvent so that a content of an exo isomer is 50 mol % or more. Variables such as a reaction temperature, a reaction time, a molar ratio between reactants, and addition of a solvent are controlled so that the exo isomer is contained in content of 50 mol % or more. Accordingly, it is possible to industrially produce an acetate norbornene addition polymer by using the acetate norbornene monomer composition containing the exo isomer in content of 50 mol % or more.
    Type: Application
    Filed: April 6, 2011
    Publication date: October 6, 2011
    Inventors: Dai-Seung CHOI, Hye-Young Jung, Sung-Don Hong, Jung-Min Lee, Hee-Jean Lee, Sung-Ho Chun
  • Publication number: 20110240330
    Abstract: The present invention relates to an alkyl (meth)acrylate and unsaturated epoxide crosslinked ethylene polymer. The invention also relates to a semiconducting composition including a conducting compound and an alkyl(meth)acrylate and unsaturated epoxide crosslinked ethylene polymer, to a method for making the same, and to the use thereof in electric cables.
    Type: Application
    Filed: October 8, 2009
    Publication date: October 6, 2011
    Applicant: Arkema France
    Inventors: Laurent Gervat, Gwenvael Le Seac'h
  • Publication number: 20110243873
    Abstract: A polymer includes (a) one or more first monomeric units, each independently comprising at least one bicycloheptyl-polyether, bicycloheptenyl-polyether or branched (C5-C50)alkyl-polyether group per monomeric unit, wherein the bicycloheptyl-polyether or bicycloheptenyl-polyether group may optionally be substituted on one or more ring carbon atoms by one or two (C1-C6)alkyl groups per carbon atom, and (b) one or more second monomeric units, each independently comprising at least one pendant linear or branched (C5-C50)alkyl-polyether group per monomeric unit, provided that the first and second monomeric units cannot both comprise a branched (C5-C50)alkyl-polyether group and is useful as a component in liquid compositions, such as aqueous latex coating compositions, personal care compositions, home care compositions, and institutional or industrial care compositions.
    Type: Application
    Filed: February 14, 2011
    Publication date: October 6, 2011
    Applicant: RHODIA OPERATIONS
    Inventors: Lawrence Hough, Wojciech Bzducha, Pascal Herve, Pierre Hennaux, Andrew Douglass, Monique Adamy, Inigo Gonzalez
  • Publication number: 20110226164
    Abstract: The invention is direct to ethoxylated/propoxylated fatty alcohol (meth)acrylates according to general formula (I) , R2O(CH2CH2O)p1(CH(CH3)CH2O)q(CH2CH2O)p2(O=)C-CR1=CH2 (I) in which R1 stands for hydrogen or a methyl group, R2 represents an alkyl or alkenyl radical having 12 to 22 carbon atoms, p1 and p2 independently stand for 0 or integers of 1 to 50, and q for an integer of from 1 to 50. The compounds of formula (I) are useful as defoamers for concrete and/or cement compositions.
    Type: Application
    Filed: December 11, 2008
    Publication date: September 22, 2011
    Applicant: COGNIS IP MANAGEMENT GMBH
    Inventors: Florence Andrioletti, Stéphanie Merlet, Jéréemie Lapere, Maria Da Silva Marques, Benoit Abribat, William LaMarca
  • Publication number: 20110230058
    Abstract: There is provided underlayer films of high-energy radiation resists that are applied onto semiconductor substrates in a lithography process for producing semiconductor devices and that are used to prevent reflection, static electrification, and development defects and to suppress outgassing during the exposure of resist layers with high-energy radiation. A composition for forming an underlayer film of a high-energy radiation resist, the composition comprising a film component having an aromatic ring structure or a hetero ring structure. The film component having an aromatic ring structure or a hetero ring structure is contained preferably in a film at a proportion of 5 to 85% by mass. The film component may be a compound having an aromatic ring structure or a hetero ring structure, and the compound may be a polymer or a polymer precursor including a specific repeating unit. The aromatic ring may be a benzene ring or fused benzene ring, and the hetero ring structure may be triazinetrione ring.
    Type: Application
    Filed: November 19, 2009
    Publication date: September 22, 2011
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Rikimaru Sakamoto, Bangching Ho, Takafumi Endo
  • Publication number: 20110207206
    Abstract: A composite including a cross-linked interpenetrating network of an organic polymer including an alcohol adduct of, for example, a glycidyl ether substituted acrylate or epoxy substituted acrylate; and a sol-gel polymer. The composite having a low or no-shrinkage characteristic, and a method for making and using the composite, as defined herein.
    Type: Application
    Filed: May 25, 2010
    Publication date: August 25, 2011
    Inventor: Nikita Sergeevich Shelekhov
  • Publication number: 20110207331
    Abstract: There is provided a resist underlayer film forming composition for lithography, which in order to prevent a resist pattern from collapsing after development in accordance with the miniaturization of the resist pattern, is applied to multilayer film process by a thin film resist, has a lower dry etching rate than resists and semiconductor substrates, and has a satisfactory etching resistance relative to a substrate to be processed in the processing of the substrate. A resist underlayer film forming composition used in lithography process by a multiplayer film, comprises a polymer containing a unit structure having an aromatic fused ring, a unit structure having a protected carboxyl group or a unit structure having an oxy ring. A method of forming a pattern by use of the resist underlayer film forming composition. A method of manufacturing a semiconductor device by utilizing the method of forming a pattern.
    Type: Application
    Filed: April 26, 2011
    Publication date: August 25, 2011
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takahiro Sakaguchi, Tomoyuki Enomoto, Tetsuya Shinjo
  • Patent number: 8003079
    Abstract: Nanoparticles having an average particle size of less than 2000 nm, wherein said nanoparticles comprise a polymer having pendant cleavable iodine substituted groups are provided. Processes for preparing the nanoparticles and their use as a contrast agent for X-ray imaging are also described.
    Type: Grant
    Filed: April 4, 2006
    Date of Patent: August 23, 2011
    Assignee: Bar-Ilan University
    Inventors: Shlomo Margel, Anna Galperin
  • Publication number: 20110201728
    Abstract: The present invention relates to copolymers obtainable by free-radical polymerization of i) 10% to 90% by weight, based on the total weight of components i to iv, of at least one monomer selected from the group consisting of a C8-C30 alkyl (meth)acrylate, C8-C30 vinyl ester, C8-C30 vinyl ether, C8-C30 olefin, and triglyceride of unsaturated C8-C30 carboxylic acids; ii) 0.
    Type: Application
    Filed: October 2, 2009
    Publication date: August 18, 2011
    Applicant: BASF SE
    Inventors: Motonori Yamamoto, Ulrike Licht, Dietrich Scherzer
  • Publication number: 20110189487
    Abstract: As associative thickener obtainable by free radical polymerization, the preparation thereof and the use thereof in paper coating slips are described. The associative thickener is formed from (a) acid monomers selected from ethylenically unsaturated C3- to C8-carboxylic acids, (b) associative monomers of the general formula H2C?CR1—COO(EO)n—(PO)m—R2, in which R1 is hydrogen or methyl, n is a number of at least two, m is a number from zero to 50, EO is an ethylene oxide group, PO is a propylene oxide group and R2 is a C8-C30-alkyl group or a C8-C30-alkaryl group, and (c) nonionic, copolymerizable monomers differing from a) and b), the reaction product having been reacted, after the polymerization, with initiators forming nonionic radicals.
    Type: Application
    Filed: February 1, 2011
    Publication date: August 4, 2011
    Applicant: BASF SE
    Inventors: Philipp ZACHARIAS, Hermann Seyffer, Ilshat Gubaydullin, Harutyun Hanciogullari, Marc Bothe
  • Publication number: 20110190422
    Abstract: The invention relates to a process for the preparation of copolymer in a continuous mode of operation in a polymerization apparatus, comprising a polymerization reactor having feed lines and an outflow, free radical polymerization initiator, an acid monomer and polyether macromonomer being passed as monomeric starting materials into the polymerization reactor through the feed lines, initiator, monomeric starting materials and copolymer-containing reaction composition thermostated at ?20 to +120° C.
    Type: Application
    Filed: January 12, 2009
    Publication date: August 4, 2011
    Inventors: Christian Schwede, Timo Mangel, Gerhard Alberecht, Volker Herzog, Klaus Arlt
  • Publication number: 20110166308
    Abstract: The present invention provides polymers resulting from polymerization of at least one reactive vinyl monomer moiety and a multifunctional N-vinylformamide crosslinking moiety; polymers resulting from polymerization of at least one reactive vinyl monomer moiety and a hybrid N-vinylformamide crosslinking moiety having at least one N-vinylformamide functionality and at least one other reactive vinyl functionality; polymers resulting from polymerization of at least one hybrid reactive N-vinylformamide monomer moiety having one N-vinylformamide functionality and at least one other reactive non-vinyl functionality and a multifunctional N-vinylformamide crosslinking moiety; and polymers resulting from polymerization of at least one hybrid reactive N-vinylformamide monomer moiety having one N-vinylformamide functionality and at least one other reactive non-vinyl functionality and a hybrid N-vinylformamide crosslinking moiety having at least one N-vinylformamide functionality and at least one other reactive vinyl func
    Type: Application
    Filed: January 5, 2011
    Publication date: July 7, 2011
    Inventors: Osama M. Musa, Ilya Makarovsky, Lei Cuiyue
  • Publication number: 20110165425
    Abstract: The present invention provides: an interlayer film for laminated glass having high adhesiveness to components for laminated glass such as a PET film and having high transparency; and a laminated glass comprising the interlayer film for laminated glass. An interlayer film 2 for laminated glass comprises a resin including an ethylene structural unit, a (meth)acrylate ester structural unit, and a structural unit having a glycidyl group. A laminated glass 1 comprises: a first and a second component 3, 4 for laminated glass; and an interlayer film 2 for laminated glass interposed between the first and the second component 3, 4 for laminated glass.
    Type: Application
    Filed: February 3, 2010
    Publication date: July 7, 2011
    Inventors: Takahiro Futamura, Izumi Oomoto
  • Patent number: 7968650
    Abstract: The present invention relates to compositions comprising a polymeric substrate comprising at least one volume excluding polymer. In one embodiment, the present invention provides polymeric articles that are capable of acting as osmotic drivers. The articles are capable of maintaining a desired water balance by moving water in or out of a substrate to maintain cation concentration equilibrium between the substrate and its environment.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: June 28, 2011
    Assignee: Johnson & Johnson Vision Care, Inc.
    Inventors: Brian J. Tighe, Muriel Nasso, Beverley Benning, Frank F. Molock, Jr.
  • Patent number: 7959989
    Abstract: The present invention relates to a novel cyclic olefin compound, a polymer including the cyclic olefin compound, a liquid crystal alignment film including the polymer, and a liquid crystal display device including the liquid crystal alignment film. Since the polymer includes the cyclic olefin compound as a main chain, the thermal stability is excellent and the photoreactive speed is high. Accordingly, the production time can be reduced, the production cost can be reduced, and the anchoring force of the liquid crystal can be increased because the alignment property is stabilized due to the curing.
    Type: Grant
    Filed: March 6, 2008
    Date of Patent: June 14, 2011
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung-Ho Chun, Hee-Jin Lee, Dmitry Kravchuk, Kyung-Jun Kim, Sang-Kook Kim, Sung-Joon Oh, Hye-Ran Seong, Byung-Hyun Lee, Hye-Won Jeong, Jung-Ho Jo, Yun-Jeong Lee, Dong-Hyun Oh
  • Publication number: 20110130526
    Abstract: The present invention provides a copolymer that includes at least one alkene monomer, at least one acrylate monomer and at least one the unsaturated acid anhydridge monomer, and a method of preparing the same.
    Type: Application
    Filed: December 30, 2010
    Publication date: June 2, 2011
    Inventors: Byoung-Ho JEON, Yoo-Young JUNG, Ki-Su RO, Kyung-Seop NOH, Bae-Kun SHIN
  • Publication number: 20110117332
    Abstract: Disclosed are an acrylate resin included in a chemically amplified photoresist composition for forming a thick film, a chemically amplified photoresist composition including the same, and a photoresist pattern fabricated therefrom. The photoresist composition including the acrylate resin can achieve an improvement of sensitivity without damaging major characteristics such as compatibility (dispersion stability), spreading characteristics, developing characteristics, and resolution. In addition, a thick resist pattern can be formed with such a composition, and the pattern can have excellent sensitivity, developing characteristics, pattern characteristics, crack resistance, and plating resistance.
    Type: Application
    Filed: November 4, 2010
    Publication date: May 19, 2011
    Applicant: LG CHEM. LTD.
    Inventors: Hye Ran SEONG, Kyoung Ho AHN, Yu Na KIM, Kyung Jun KIM
  • Patent number: 7935771
    Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: May 3, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuki Fukui, Akiko Tominaga, Takashi Kenmoku, Masato Minami, Tetsuya Yano, Takeshi Ikeda, Atsushi Tani, Norikazu Fujimoto
  • Publication number: 20110086937
    Abstract: Disclosed is a sealant composition for liquid crystal display device, the sealant composition including a monomer as expressed in Chemical Formula 1 below wherein X is O, S, or NH, R1 is H or CH3, and R2 is an alkyl group or an aryl group of C2-30.
    Type: Application
    Filed: May 27, 2010
    Publication date: April 14, 2011
    Inventors: Ki In SON, Joo Hyun Park, Gyu Won Cho
  • Publication number: 20110071266
    Abstract: A curable organopolysiloxane composition comprising an organopolysiloxane containing alkenyl groups and phenyl groups, an organohydrogenpolysiloxane, a copolymer of a vinyl monomer and a vinyl monomer with hydrosilyl groups, and a platinum catalyst; a curing process that consists of two or more stages of thermal curing; an optical semiconductor device that has a light-transmitting portion made from a cured body of the aforementioned composition; and an adhesion promoter that consists of a copolymer of a vinyl monomer and a vinyl monomer with hydrosilyl groups.
    Type: Application
    Filed: September 22, 2010
    Publication date: March 24, 2011
    Applicant: DOW CORNING TORAY CO., LTD.
    Inventors: Yoshitsugu Morita, Tomoko Kato, Hiroshi Ueki
  • Publication number: 20110065836
    Abstract: The present invention relates to new associative monomers, terminated by a hydrophobic chain with a base of polycosanols, which can be bio-resourced raw materials, and notably of octacosanol. It also concerns the HASE-type associative copolymers manufactured from these monomers, from (meth)acrylic acid and from an ester of one of these acids. The invention also concerns the use of these copolymers as thickening agents for water-based formulations.
    Type: Application
    Filed: July 27, 2010
    Publication date: March 17, 2011
    Applicant: COATEX S.A.S.
    Inventors: Jean-Marc Suau, Denis Ruhlmann
  • Publication number: 20110051059
    Abstract: An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a —COO— group.
    Type: Application
    Filed: March 12, 2010
    Publication date: March 3, 2011
    Inventors: Hoon Kang, Jae-Sung Kim, Yang-Ho Jung, Jin-Ho Ju, Doo-Hee Jung, Jung-In Park, Shi-Yul Kim
  • Publication number: 20110045287
    Abstract: Disclosed is a sealing resin sheet for allowing a resin layer in a softened state to adhere to and seal a material to be sealed, wherein the resin layer comprises an adhesive resin.
    Type: Application
    Filed: March 27, 2009
    Publication date: February 24, 2011
    Inventors: Masahiko Kawashima, Masaaki Kanao, Yutaka Matsuki, Daisuke Masaki, Toshihiro Koyano
  • Patent number: 7892388
    Abstract: Disclosed is a photocurable resin composition which is highly sensitive to ultraviolet light or visible light having a long wavelength, in particular a photocurable resin composition which is useful as a sealing agent. Specifically disclosed is a photocurable resin composition containing a component (a) which is composed of an anthraquinone derivative represented by the formula (I) below, and a component (b) which is composed of a compound having a (meth)acryloyl group in the molecule. The photocurable resin composition is characterized in that a part or the entire of the component (b) further contains an oxiranyl group in the molecule, and the component (a) content is 0.01-10% by mass relative to the component (b) content. [chemical formula 1] (I) (In the formula (I), X represents a phenyl group, an alkyl group having 1-8 carbon atoms, an alcoholic form of the phenyl group or the alkyl group, or a derivative of the alcoholic form.
    Type: Grant
    Filed: December 25, 2006
    Date of Patent: February 22, 2011
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Fumito Takeuchi, Yasushi Mizuta
  • Patent number: 7887916
    Abstract: An adhesive film comprising a cycloalkanediol modified copolymerized polyester resin film and a thermosetting vinyl ester resin composition layer which is hardened at room temperature on said polyester resin film.
    Type: Grant
    Filed: August 18, 2009
    Date of Patent: February 15, 2011
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventor: Manabu Kaneko
  • Publication number: 20110033650
    Abstract: An ultraviolet-curable composition of the present invention includes epoxy(meth)acrylate, urethane(meth)acrylate, and a silicone compound represented by formula (1): (CH3)3Si—O—X—O—Si(CH3)3 ??(1) wherein X represents a group having a structure in which n structural units represented by formula (2): wherein R1 represents an alkylene group of 1 to 18 carbon atoms, and a divalent group connected with one, or two or more groups selected from divalent groups having a structure in which plural alkylene groups of 2 to 18 carbon atoms are connected through an ether bond, R1 may be bonded directly to Si or bonded through an oxygen atom to Si, and R2 represents a hydrogen atom or a methyl group, and m structural unit represented by formula (3): are connected in a random or blocked shape, provided that n is an integer within a range from 1 to 15 and n/m is within a range from 1/5 to 1/20.
    Type: Application
    Filed: June 25, 2008
    Publication date: February 10, 2011
    Applicant: DIC CORPORATION
    Inventors: Takashi Kitsunai, Daisuke Ito
  • Publication number: 20110027702
    Abstract: A hardcoat composition comprises (a) one or more epoxy silane compounds, (b) one or more epoxy-functionalized perfluoropolyether acrylate oligomers, and (c) photoacid generator.
    Type: Application
    Filed: March 11, 2009
    Publication date: February 3, 2011
    Inventors: Zai-Ming Qiu, John C. Hulteen, Douglas C. Fall
  • Patent number: 7879961
    Abstract: Disclosed herein is a resin composition for an organic insulating layer, a method of manufacturing the same, and a display panel including an insulating layer formed using the resin composition. The resin composition for an organic insulating layer is produced by polymerizing about 5 to about 35 wt % of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture of the unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride, about 5 to about 40 wt % of a styrene compound, about 5 to about 40 wt % of an epoxy compound, about 0.1 to about 10 wt % of an isobornyl compound, and about 20 to about 40 wt % of a dicyclopentadiene compound, based on the total weight of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, styrene compound, isobornyl compound, and dicyclopentadiene compound.
    Type: Grant
    Filed: February 2, 2007
    Date of Patent: February 1, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-Ki Lee, Byung-Uk Kim, Hyoc-Min Youn
  • Publication number: 20100323141
    Abstract: To provide an acrylic rubber composition having an excellent heat resistance, especially an excellent balance between the residual ratio of the tensile strength and the residual ratio of the elongation after heat aging, when formed into a vulcanized product, and a hose article, a sealing article and a rubber vibration insulator using the acrylic rubber composition. An acrylic rubber composition containing an acrylic rubber obtainable by copolymerizing 100 parts by mass of an alkyl acrylate with from 10 to 100 parts by mass of an alkyl methacrylate and from 0.5 to 4 parts by mass of a crosslinkable monomer. Here, the alkyl methacrylate is preferably at least one compound selected from the group consisting of methyl methacrylate, ethyl methacrylate and n-butyl methacrylate, and the alkyl acrylate is preferably at least one compound selected from the group consisting of methyl acrylate, ethyl acrylate and n-butyl acrylate.
    Type: Application
    Filed: February 4, 2009
    Publication date: December 23, 2010
    Applicant: DENKI KAGAKU KOGYO KABUSHIKI KAISHA
    Inventors: Takashi Kawasaki, Kazuhiro Kobayashi, Tsutomu Kobari, Daisuke Shimiya, Shogo Hagiwara
  • Patent number: 7855252
    Abstract: A polymeric composition including a mono-functional, low molecular weight, low epoxy content end-cap which includes the polymerization product of at least one epoxy-functional monomer and at least one styrenic and/or (meth)acrylic monomer, with a polyfunctional chain extender; and at least one condensation polymer.
    Type: Grant
    Filed: June 16, 2008
    Date of Patent: December 21, 2010
    Assignee: BASF Corporation
    Inventors: Abiodun E. Awojulu, Roelof van der Meer, Marco A. Villalobos
  • Patent number: 7842750
    Abstract: The invention provides a polymer composition which contains a bound heat accumulating phase change material which is in the form of a solid or a paste. This composition is so stable and has such a solid form that it may be easily heated up to 180 (200)° C. and mechanically treated without changing the structure and the composition thereof and without losing its phase change materials. After being heated up the heat emission of this composition is steady and consequently the composition has a long radiation time. Furthermore the polymer composition is easy to produce and has due to its special properties a lot of applications.
    Type: Grant
    Filed: October 5, 2006
    Date of Patent: November 30, 2010
    Assignee: Capzo International B.V.
    Inventors: Herman Reezigt, Bartholomeus Wilhelmus Maria Rouwers, Hendrik Glastra
  • Publication number: 20100276637
    Abstract: In the present invention, provided is an organic electroluminescent element material having a high externally taking-out quantum efficiency, which is suitable for manufacturing an element exhibiting long light emission lifetime, and also provided is an organic electroluminescent element possessing the material, a method of manufacturing the organic electroluminescent element, and a display as well as an illuminating device fitted with the organic electroluminescent element.
    Type: Application
    Filed: October 31, 2008
    Publication date: November 4, 2010
    Applicant: KONICA MINOLTA HOLDINGS, INC.
    Inventors: Tatsuo Tanaka, Hiroshi Kita, Rie Katakura, Hideo Taka
  • Publication number: 20100273934
    Abstract: The invention relates to cross-linkable vinylester-copolymers obtained by means of radically initiated polymerisation of a) one or more vinyl esters and b) one or more ethylenically unsaturated, epoxy functional monomers, and by a subsequent reaction that is analogous to polymerisation of the thus obtained base polymers with one or more ethylenically unsaturated acids g), such that at least one ethylenically unsaturated, polymerizable group is introduced into each base polymer. Said invention is characterised in that the cross-linkable vinylester-copolymers have molecular weights of Mn of ?6.500 g/mol.
    Type: Application
    Filed: December 1, 2008
    Publication date: October 28, 2010
    Applicant: Wacker Chemie AG
    Inventors: Thomas Kohler, Rene Grawe
  • Publication number: 20100258245
    Abstract: Disclosed are a reactive hot melt adhesive composition having no problem in the initial adhesive strength, the adhesive strength obtained after moisture curing, stringiness and the like, and a method for producing the same. In the method, 1 to 50 parts by mass of a polymer (A), which is obtained by polymerization of a monomer composition including a vinyl monomer having a carboxyl group and a vinyl monomer having an epoxy group and has the equivalent ratio of the carboxyl group to the epoxy group in the range of 1/100 to 100/1, is mixed with 99 to 50 parts by mass in total of a polyisocyanate (B) and a polyol (C) so that the amount of the isocyanate group can become 1.1 to 10 moles relative to 1 mole of the hydroxyl group of the polyol (C), the sum of the components (A) to (C) being 100 parts by mass, and the resulting mixture is heated and mixed.
    Type: Application
    Filed: October 7, 2009
    Publication date: October 14, 2010
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Kana AKEDA, Koji TERADA
  • Publication number: 20100252156
    Abstract: A process for preparing, in one step, a diene block copolymer, of which at least one of these blocks is constituted of a polyether, the number-average molecular weight of which is approximately from 100 to 5000 g/mol, and at least one other of these blocks is constituted of a diene elastomer. The process according to the invention allows a high degree of grafting of the polyether to the polymer chains. Also disclosed is a reinforced rubber composition, especially intended for the manufacture of tires, comprising such a block copolymer which is intended to interact with the reinforcing filler. Such a rubber composition has improved hysteresis properties in the vulcanized state, while retaining satisfactory processing properties in the non-vulcanized state.
    Type: Application
    Filed: June 19, 2008
    Publication date: October 7, 2010
    Applicants: SOCIETE DE TECHNOLOGIE MICHELIN, Michelin Recherche et Technique S.A.
    Inventors: Pierre Robert, Fanny Barbotin, Jean-Michel Favrot, Philippe Chaboche
  • Publication number: 20100227993
    Abstract: An object of the present invention is to provide a resin composition having high optical transparency, and excellent heat resistance, light resistance and mechanical properties when it cures. To attain the object, a heat or photo-curable resin composition comprises: (A) a low molecular weight acrylic resin obtained by carrying out a polymerization of (a) an epoxy group-containing (meth)acrylate and (b) an unsaturated compound having one polymerizable unsaturated bond in the molecule to obtain a copolymer having a weight average molecular weight of 1,000 to 10,000, and then reacting the copolymer with (c) an unsaturated carboxyl acid; a heat or photo-polymerizable monomer having at least one heat or photo curable unsaturated double bond in the molecule; and (C) a radical polymerization initiator.
    Type: Application
    Filed: January 19, 2007
    Publication date: September 9, 2010
    Inventors: Shingo Kobayashi, Takeo Tomiyama, Akihiro Yoshida, Syouko Tanaka
  • Publication number: 20100210801
    Abstract: Disclosed is a copolymer which includes at least monomer units corresponding to a vinyl monomer A containing a blocked isocyanate group and represented by following Formula (1); and monomer units corresponding to a vinyl monomer B containing a cyclic ether group having 3 to 5 members. The copolymer may further include monomer units corresponding to (meth)acrylic alkyl esters, aromatic vinyl compounds, hydroxyl-containing monomers, and/or carboxyl-containing monomers. In the formula, R1 represents hydrogen atom or methyl group; R2 represents a bivalent saturated aliphatic hydrocarbon group having 1 to 8 carbon atoms; and R3 represents a residue of isocyanate-blocking agent R3H. This copolymer gives a cured article that excels not only in adhesion to substrates but also in resistance to chemicals, especially to alkalis.
    Type: Application
    Filed: August 21, 2008
    Publication date: August 19, 2010
    Inventors: Toshihiko Nijukken, Yasunobu Nakagawa
  • Patent number: 7771834
    Abstract: Process for production of post-crosslinkable thermoplastic resins by bulk-polymerizing a polymerizable composition (A) comprising (I) a monomer fluid containing a cyclic olefin (?) having two or more metathetical ring-opening reaction sites in the molecule in an amount 10 wt % or above based on the total amount of the monomers or a monomer fluid containing a norbornene monomer and a crosslinking agent, (II) a metathetical polymerization catalyst, and (III) a chain transfer agent; thermoplastic resins obtained by this process. These thermoplastic resins are free from odor due to residual monomers and are excellent in storage stability. Process for producing crosslinked resins and composite materials which comprises laminating the thermoplastic resin to a substrate and then crosslinking the thermoplastic resin.
    Type: Grant
    Filed: September 24, 2008
    Date of Patent: August 10, 2010
    Assignee: Zeon Corporation
    Inventor: Tomoo Sugawara
  • Patent number: 7772341
    Abstract: The present invention provided a norbornene compound with cross-linkable groups and their derivative polymers, wherein said cross-linkable groups were olefin or epoxy groups. Norbornene polymers with cross-linkable side chain and their block copolymers as well as modified derivatives were prepared via living ring-open metathesis polymerization method. The resulting polymers with excellent solubility and optic properties had narrow molecular weight distribution, well-controlled molecular weight, small refraction index and high transparency. They were also suitable for preparing hybrid materials with high thermal stability and chemical resistance.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: August 10, 2010
    Assignee: National Taiwan University of Science & Technology
    Inventors: Der-Jang Liaw, Ching-Cheng Huang, Shou-Mau Hong, Ming-Hung Huang
  • Publication number: 20100160586
    Abstract: Resins derived significantly from renewable or recyclable starting materials may be formed from the reaction product of a monomer blend that includes an ethylenically unsaturated macromonomer and at least one other ethylenically unsaturated monomer, which may be acid functional. The ethylenically unsaturated macromonomer may be derived from the reaction of an acid functional intermediate, which may be the acidolysis reaction product of an engineered polyester and an acid or anhydride functional material with an hydroxyl-functional, amine-functional, or epoxy functional reactant, optionally in the presence of a polyacid, to yield a resin intermediate, which may subsequently be reacted with an ethylenically unsaturated coupling agent to yield the macromonomer. The resins described herein are useful in generating low VOC acrylic alkyd coatings. Methods of producing water reducible resins are also described.
    Type: Application
    Filed: December 18, 2009
    Publication date: June 24, 2010
    Applicant: THE SHERWIN-WILLIAMS COMPANY
    Inventors: Kimberly A. Koglin, James K. Marlow, Philip J. Ruhoff, Richard F. Tomko
  • Patent number: 7741242
    Abstract: The present invention discloses 1) a catalyst composition consisting of a crosslinked organic polymer compound and a palladium catalyst, wherein said catalyst is physically carried on said crosslinked organic polymer compound, 2) a manufacturing method of the above catalyst composition 1), characterized by homogenizing a straight chain organic polymer compound, having a crosslinkable functional group, and a palladium catalyst in a solvent dissolving said straight chain organic polymer compound, then depositing a composition thus formed and subjecting the crosslinkable functional group in said deposit to a crosslinking reaction, 3) a method for substitution reaction at an allyl position, characterized by reacting an allyl carbonate and a neucleophilic agent in the presence of the above catalyst composition 1), and 4) a method for oxidizing an alcohol, characterized by subjecting the above catalyst composition 1) to reaction with an alcohol.
    Type: Grant
    Filed: September 1, 2003
    Date of Patent: June 22, 2010
    Assignees: Wako Pure Chemical Industries, Ltd., Japan Science and Technology Corporation
    Inventors: Shu Kobayashi, Atsunori Sano, Keiji Oono
  • Patent number: 7737238
    Abstract: A resin suitable for powder coating including glycidyl acrylate or glycidyl methacrylate. The resin may also contain a high Tg and hydrophobicity monomer. Typical powder coatings made from the resin show improved powder coating handling, and particularly acid etch resistance.
    Type: Grant
    Filed: March 4, 2008
    Date of Patent: June 15, 2010
    Assignee: Anderson Development Co.
    Inventors: Szuping Lu, Rahul Holla, Benjamin Morley
  • Publication number: 20100144969
    Abstract: The present invention provides novel bimetallic complexes and methods of using the same in the isoselective polymerization of epoxides. The invention also provides methods of kinetic resolution of epoxides. The invention further provides polyethers with high enantiomeric excess that are useful in applications ranging from consumer goods to materials.
    Type: Application
    Filed: February 16, 2010
    Publication date: June 10, 2010
    Applicant: CORNELL UNIVERSITY
    Inventors: Geoffrey W. Coates, Wataru Hirahata
  • Publication number: 20100137537
    Abstract: The invention relates to a copolymer that can be obtained by the polymerisation of monomers (A), (B) and (C), (A) being a monomer of formula (I), in which A represents a C2 to C4alkene and B represents a C2 to C4alkene that is different from A, R represents hydrogen or methyl, m is a number between 1 and 500, n is a number between 1 and 500, (B) is an ethylenically unsaturated monomer containing an aromatic group and (C) is an ethylenically unsaturated monomer containing an alkyl radical. The claimed copolymers are suitable for use as dispersants for pigments.
    Type: Application
    Filed: April 29, 2008
    Publication date: June 3, 2010
    Inventors: Bjoern Fechner, Carsten Schaefer, Alexander Woerndle
  • Publication number: 20100112362
    Abstract: The invention is directed to compositions on a surface which comprise a) at least a (meth)acrylate prepolymer, b) an adhesion promoting monomer of formula (I) wherein Q, R1, R2, R4, R5, m and n are defined herein. Further the compositions may be used to improve the adhesion to surfaces, especially metallic surfaces and may include additional optional components such as adhesion promoting photoinitiators.
    Type: Application
    Filed: October 21, 2009
    Publication date: May 6, 2010
    Applicant: CIBA CORPORATION
    Inventors: Liliana Craciun, Ying Dong, Orest Polishchuk, Christopher Koenigsmann, Belinda W. Ho
  • Publication number: 20100099805
    Abstract: The present invention provides a polymerization-curable composition comprising at least one kind of a cationically polymerizable compound having in the molecule at least one cationically polymerizable functional group selected from the group consisting of an alicyclic epoxy group, a vinylether group and an oxetane group, and at least one kind of a thermally latent polymerization initiator, characterized in that the polymerization-curable composition is allowed to undergo an exothermic polymerization reaction by applying primary thermal energy to a portion of the polymerization-curable composition, and then the entire polymerization-curable composition is polymerization-cured by secondary thermal energy generated as a result of the exothermic polymerization reaction; a method for polymerization-curing thereof; and a polymerization-cured resin composition.
    Type: Application
    Filed: October 14, 2009
    Publication date: April 22, 2010
    Applicants: DENSO CORPORATION, Mitsubishi Heavy Industries, Ltd.
    Inventors: Hiroyuki Okuhira, Masashi Kitsuneduka, Akio Sugiura, Kazuo Kato, Noriya Hayashi, Hiroshi Mizuno
  • Publication number: 20100081089
    Abstract: The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
    Type: Application
    Filed: April 11, 2008
    Publication date: April 1, 2010
    Inventors: Han-Soo Kim, Min-Young Lim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim, Kwang-Han Park