From Sulfide-containing Monomer Patents (Class 526/289)
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Patent number: 11332563Abstract: Copolymers and compositions containing copolymers having advantageous viscosity, friction reduction, dissolution, pH-stability, and temperature-stability are provided. These copolymers can be used as rheology modifiers for oil field applications.Type: GrantFiled: July 26, 2019Date of Patent: May 17, 2022Assignee: Ecolab USA Inc.Inventors: Paul Joseph Zinn, En-Wei Lin, Heinrich Enoch Bode, Mario Roberto Rojas, Christopher Steven Popeney, Pious Kurian
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Patent number: 10927208Abstract: A functional polymer of styrene derivative a copolymer of a monomer A having the structure represented by the formula (I) and a comonomer. The functional polymer of styrene derivative of the present invention can be easily further chemically modified. Meanwhile, basic properties of the functional polymer, such as glass transition temperature, viscoelasticity and the like, can be easily adjusted by adjusting the amount of the styrene derivative added.Type: GrantFiled: March 17, 2017Date of Patent: February 23, 2021Assignee: ZHEJIANG ZHONGLI SYNTHETIC MATERIAL TECHNOLOGY CO., LTD.Inventors: Bingyong Han, Jian Chen, Jianmin Lu, Minglu Huang, Aimin Zhang, Dakui Chen
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Patent number: 10038216Abstract: Syntheses of graft copolymers based on PEO and fluorinated functional groups are described. Grafting of fluorinated groups reduces the Tm of PEO and also increases the miscibility of PEO with ionic liquids, so that addition of ionic liquids improves ionic conductivity even at room temperature. The disclosed copolymers containing fluorinated functionality have superior safety and are more flame retardant as compared to traditional electrolytes. Such copolymers can be used as either solid or gel electrolytes in Li batteries.Type: GrantFiled: May 25, 2016Date of Patent: July 31, 2018Assignee: Seeo, Inc.Inventors: Kulandaivelu Sivanandan, Jonathan C. Pistorino, Hany Basam Eitouni
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Patent number: 9005874Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic caType: GrantFiled: April 18, 2012Date of Patent: April 14, 2015Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
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Publication number: 20150014894Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.Type: ApplicationFiled: October 2, 2014Publication date: January 15, 2015Applicant: FUJIFILM CORPORATIONInventors: Kunihiko KODAMA, Kyouhei SAKITA, Hiroyuki YONEZAWA
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Publication number: 20140306157Abstract: Subject It is to provide a polymerizable compound having a high polymerization reactivity, a high conversion yield and a high solubility in a liquid crystal composition, a polymerizable composition including the compound, a liquid crystal composite prepared from the composition and a liquid crystal display device containing this composite. Means for Solving the Subject A compound represented by formula (1). In this formula, for example, P1 and P2 are —SCO—CH?CH2; Sp1 and Sp2 are a single bond; ring A1, ring A2, ring A3 and ring A4 are 1,4-phenylene; Z1, Z2 and Z3 are a single bond; and a is 1, and b and c is 0.Type: ApplicationFiled: April 2, 2014Publication date: October 16, 2014Applicants: JNC PETROCHEMICAL CORPORATION, JNC CORPORATIONInventors: Yasuyuki GOTOH, Masakazu YANO
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Patent number: 8859698Abstract: A sulfur-containing macromolecule and a method of preparing the sulfur-containing macromolecule comprising a polymerization step are provided, where the sulfur-containing macromolecule contains internal units of formula (I) and the polymerization step is formula (II) wherein n is greater than 1, said precursor comprises alkyne having one or more acetylene groups and thiol having one or more thiol groups; and R is remainder of said thiol excluding said thiol groups, R? is remainder of said alkyne excluding said acetylene groups, and R and R? are selected from organic or organometallic groups.Type: GrantFiled: August 6, 2010Date of Patent: October 14, 2014Assignee: The Hong Kong University of Science and TechnologyInventors: Benzhong Tang, Ka Wai Jim, Anjun Qin, Wing Yip Lam, Jianzhao Liu
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Publication number: 20140296366Abstract: Graft polymerization is fullfiled on a functionalized substrate. The functionalized substrate is prepared from a disulfide bond-containing feedstock and has been prepared for polymerization through the introduction of one or more polyfunctional monomers containing a disulfide bond breaking material functional group.Type: ApplicationFiled: August 31, 2012Publication date: October 2, 2014Applicant: ASPEN RESEARCH CORPORATIONInventors: John A. Spevacek, Roger Pearson, Kenneth W. Richards, Kenneth D. Zigrino
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Patent number: 8791219Abstract: The present inventions are directed to novel medical adhesives and their use, for example, in biomedical applications. These compositions and applications allow for improved adhesion with and between mammalian tissues.Type: GrantFiled: March 1, 2013Date of Patent: July 29, 2014Assignees: California Institute of Technology, The Regents Of The University Of CaliforniaInventors: Robert H. Grubbs, Hoyong Chung, Michael Richard Harrison
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Publication number: 20140187715Abstract: Provided are: a curable composition from which a cured article having excellent molding processability and high heat resistance as well as such a high Tg that it can be used as a molding resin for a SiC power semiconductor can be obtained; and a cured article thereof. The curable composition comprises: 100 parts by mass of a compound having at least two partial structures represented by the following Formula (1) in the molecule as a component (A); 0.5 to 3 parts by mass of a thermal radical generator as a component (B); and 0 to 50 parts by mass of other radical-reactive compound as a component (C): (wherein, ring A represents a benzene ring or a cyclohexyl ring; R1 represents an alkylene group having 1 to 6 carbon atoms; R2 represents an alkyl group having 1 to 4 carbon atoms; a represents a number of 0 or 1; b represents an integer of 0 to 3; and c represents a number of 1 or 2).Type: ApplicationFiled: August 24, 2012Publication date: July 3, 2014Applicant: ADEKA CORPORATIONInventors: Kenichiro Hiwatari, Atsuo Tomita, Tomoaki Saiki, Kiyoshi Murata
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Patent number: 8735522Abstract: The present invention provides a Scandium catalyst that can be used in water or water-soluble organic solvent with no leaching of Scandium. Provided is a gold-polymer nanostructure-immobilized Scandium catalyst, which is formed by preparing, in liquid phase, a mixture comprising gold clusters with from 1 to 50 nm of diameter, disulfide monomer, sulfonic acid salt of disulfide and Lewis acid metal compound represented by ScY3, wherein Y is OSO2CF3 etc., and polymerizing the mixture in the presence of a radical polymerization initiator, wherein the disulfide monomer is represented by the formula below: CH2?CH—R1—S—S—R1—CH?CH2 wherein R1 represents a divalent hydrocarbon, which may contain an ether bond, and the sulfonic acid salt of disulfide is represented by the formula below: MO3S—R2—S—S—R2—SO3M wherein R2 represents a divalent hydrocarbon, which may contain an ether bond, and M represents an alkali metal.Type: GrantFiled: February 16, 2011Date of Patent: May 27, 2014Assignee: Japan Science and Technology AgencyInventors: Shu Kobayashi, Hiroyuki Miyamura
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Patent number: 8679636Abstract: Presently described is a composition comprising at least one first divalent unit comprising a pendant perfluoropolyether or perfluoroalkyl group; at least one second divalent unit comprising a pendant phosphorus-containing acid group; and at least one third unit comprising a terminal or pendant alkoxy silane group. Also described is a coating comprising the composition described herein dissolved or dispersed in a solvent and a method of providing a coated article or surface. Such method is particularly useful for providing corrosion protection to a metallic surface.Type: GrantFiled: October 20, 2011Date of Patent: March 25, 2014Assignee: 3M Innovative Properties CompanyInventors: Suresh Iyer, David A. Hesselroth, Richard M. Flynn, Karl J. Manske
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Publication number: 20130324684Abstract: The present invention provides a diacetylene derivative represented by the following formula (A) which exhibits liquid crystallinity by itself and has a large refractive index anisotropy or does not exhibit liquid crystallinity by itself but exhibits a large refractive index anisotropy when added to a liquid crystalline compound: R1-Sp1-(Ar1)p-(Ar3)q-(Phe)r-C?C—C?C-(Phe)r-(Ar4)q-(Ar2)p-Sp2-R2??(A) (wherein R1 and R2 are a hydrogen, halogen, cyano, isothiocyanate, alkyl, alkenyl, alkynyl or reactive group, SP1 and SP2 are each a spacer group, Ar1 and Ar2 are each a non-substituted or substituted aromatic carbocyclic or heterocyclic group, Ar3 and Ar4 are each a non-substituted or substituted heterocyclic group, Phe is a non-substituted or substituted 1,4-phenylene group, and p, q and r are each 0 or 1.Type: ApplicationFiled: January 31, 2012Publication date: December 5, 2013Applicants: JX NIPPON OIL & ENERGY CORPORATION, TOKYO INSTITUTE OF TECHNOLOGYInventors: Yuki Arajawa, Gen-Ichi Konishi, Shunpei Nakajima, Sungmin Kang, Junji Watanabe, Takuya Matsumoto, Suzushi Nishimura, Takehiro Toyooka
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Publication number: 20130310531Abstract: Disclosed are terminal-modified difunctional sulfur-containing polymers that are the reaction products of a sulfur-containing diol, an aldehyde or a ketone, and a compound containing a functional group. Compositions comprising the terminal-modified difunctional sulfur-containing polymers useful as sealants are also disclosed.Type: ApplicationFiled: July 25, 2013Publication date: November 21, 2013Applicant: PRC-DeSoto International, Inc.Inventors: Stephen J. Hobbs, Gregory J. McCollum, Lawrence G. Anderson, Renhe Lin
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Publication number: 20130189519Abstract: A multi-arm, star-shaped polymer composition can be configured for drug delivery and imaging applications in vivo. The star polymer architecture can be synthesized using living radical polymerization techniques, including reversible addition-fragmentation chain transfer and macromolecular design via the interchange of xanthates with a broad range of reaction conditions and functional groups. The star-shaped polymeric carriers can be tailored for preferential delivery of chemotherapeutics into the tumor-draining lymphatics via subcutaneous, peritumoral or intratumoral injections. The carriers can be loaded with the chemotherapeutic agents from about 10% to about 25% w/w. In addition, the carriers can be loaded with imaging agents from about 5% to about 10% w/w. The molecular weights of the polymeric carriers can be about 40 kDa to about 130 kDa. The chemotherapeutics can be cisplatin, geldanamycin or nitric oxide-donating prodrugs. The imaging agent can be a near-infrared dye, such as IR820.Type: ApplicationFiled: January 18, 2013Publication date: July 25, 2013Applicant: UNIVERSITY OF KANSASInventor: UNIVERSITY OF KANSAS
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Publication number: 20130177980Abstract: Provided herein is a synthetic polymer-based hydrogel for the self-renewal and expansion of human stem cells such as embryonic stem cells (ESCs) and induced pluripotent stem cells (iPSCs). Also provided are methods of making and using the same.Type: ApplicationFiled: December 6, 2012Publication date: July 11, 2013Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Shyni Varghese, Chien-Wen Chang, Yongsung Hwang
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Publication number: 20130082220Abstract: Provided is a polymerizable composition including (meth)acrylate monomers having at least two sulfide (—S—) linkages in the monomer. The polymerizable compositions include a first (meth)acrylate monomer represented by the following Formula (I), where L1 is selected from a multivalent optionally substituted hydrocarbyl group optionally interrupted with at least one of —C(O)—, —S—, —O— and combinations thereof, and a divalent linking group represented by the following Formula (A). In Formula (A), Y is O or S. Also in Formula (I), L2 is independently for each n a divalent optionally substituted hydrocarbyl group optionally interrupted with at least one of —O— and —S—, R1 is independently selected for each n from hydrogen and methyl, and n is from 2 to 6. The polymerizable compositions also may include a polymerization moderator. Also provided are polymerizates including photochromic articles and optical elements prepared from such polymerizable compositions.Type: ApplicationFiled: September 6, 2012Publication date: April 4, 2013Applicant: PPG INDUSTRIES OHIO, INC.Inventors: Robert D. Herold, Nina V. Bojkova, Marvin J. Graham, Charles R. Hickenboth, Gregory J. McCollum, William H. Retsch, JR., Hongying Zhou
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Publication number: 20130059999Abstract: The present invention provides a Scandium catalyst that can be used in water or water-soluble organic solvent with no leaching of Scandium. Provided is a gold-polymer nanostructure-immobilized Scandium catalyst, which is formed by preparing, in liquid phase, a mixture comprising gold clusters with from 1 to 50 nm of diameter, disulfide monomer, sulfonic acid salt of disulfide and Lewis acid metal compound represented by ScY3, wherein Y is OSO2CF3 etc., and polymerizing the mixture in the presence of a radical polymerization initiator, wherein the disulfide monomer is represented by the formula below: CH2?CH—R1—S—S—R1—CH?CH2 wherein R1 represents a divalent hydrocarbon, which may contain an ether bond, and the sulfonic acid salt of disulfide is represented by the formula below: MO3S—R2—S—S—R2—SO3M wherein R2 represents a divalent hydrocarbon, which may contain an ether bond, and M represents an alkali metal.Type: ApplicationFiled: February 16, 2011Publication date: March 7, 2013Applicant: Japan Science and Technology AgencyInventors: Shu Kobayashi, Hiroyuki Miyamura
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Patent number: 8367872Abstract: To obtain a close-contact multi-layer type diffractive optical element having a homogeneous high-refractive-index and low-dispersion resin layer, an acrylate-terminated oligomer, obtained by allowing excess bifunctional acrylate to react with bifunctional thiol, is used as a resin precursor for the high-refractive-index and low-dispersion resin layer.Type: GrantFiled: December 20, 2005Date of Patent: February 5, 2013Assignee: Nikon CorporationInventors: Akiko Miyakawa, Masayuki Shijo
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Patent number: 8344082Abstract: The present invention relates to new molecularly imprinted polymers which are suitable for the selective recognition of glutathione GSH and/or of an analog thereof, and in particular which are of use for the treatment of media comprising in particular a mixture of glutathione GSH, and/or of an analog thereof, with GSH adducts.Type: GrantFiled: October 8, 2008Date of Patent: January 1, 2013Assignee: PolyintellInventors: Celine Perollier, Sami Bayoudh
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Publication number: 20120295228Abstract: Dental compositions and disulfide monomers are described. The disulfide monomer comprise a disulfide backbone group wherein each of the sulfur atoms are bonded to an ethylenically unsaturated group via a divalent linking group and the linking group comprises at least one heteroatom; and at least one other monomer ethylenically unsaturated monomer.Type: ApplicationFiled: May 18, 2011Publication date: November 22, 2012Inventors: Ahmed S. Abuelyaman, Joel D. Oxman, Yizhong Wang, Christopher N. Bowman, Hee Young Park, Christopher J. Kloxin
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Publication number: 20120270155Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic caType: ApplicationFiled: April 18, 2012Publication date: October 25, 2012Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
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Patent number: 8278387Abstract: The invention provides a resin composition for laser engraving, containing at least (A) a polymerizable compound having two or more ethylenic unsaturated bonds, a carbon-sulfur bond being contained at the site where two among the two or more ethylenic unsaturated bonds are connected and (B) a binder polymer. The invention further provides an image forming material containing the resin composition, a relief printing plate precursor having a relief forming layer which contains the resin composition, a relief printing plate precursor having a relief forming layer which contains a product formed by subjecting the resin composition to cross-linking, a method for manufacturing a relief printing plate including subjecting the relief printing plate precursor having the relief forming layer which contains the resin composition to cross-linking, and a relief printing plate manufactured by the manufacturing method.Type: GrantFiled: March 16, 2009Date of Patent: October 2, 2012Assignee: FUJIFILM CorporationInventors: Takashi Kawashima, Atsushi Sugasaki, Kenta Yoshida
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Patent number: 8273837Abstract: A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition.Type: GrantFiled: December 13, 2006Date of Patent: September 25, 2012Assignee: JSR CorporationInventors: Tomoki Nagai, Takuma Ebata, Nobuji Matsumura
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Publication number: 20120148958Abstract: A sulfur-containing macromolecule and a method of preparing the sulfur-containing macromolecule comprising a polymerization step are provided, where the sulfur-containing macromolecule contains internal units of formula (I) and the polymerization step is formula (II) wherein n is greater than 1, said precursor comprises alkyne having one or more acetylene groups and thiol having one or more thiol groups; and R is remainder of said thiol excluding said thiol groups, R? is remainder of said alkyne excluding said acetylene groups, and R and R? are selected from organic or organometallic groups.Type: ApplicationFiled: August 6, 2010Publication date: June 14, 2012Applicant: THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGYInventors: Benzhong Tang, Ka wai Jim, Anjun Qin, Wing Yip Lam, Jianzhao Liu
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Publication number: 20110269870Abstract: The present invention provides a polymerizable adhesive composition comprising: (i) at least one cyanoacrylate monomer; and (ii) at least one polymerizable compound containing (a) one or more polymerizable carbon-carbon double bonds and (b) one or more biodegradable (BDG) chains. Further are provided the copolymerization product of this composition, and uses thereof in biomedical applications.Type: ApplicationFiled: September 6, 2009Publication date: November 3, 2011Inventors: Daniel Cohn, Peter Siman
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Patent number: 7799884Abstract: UV curable compositions, polymeric photoinitiators and precursors therefor are described.Type: GrantFiled: November 30, 2006Date of Patent: September 21, 2010Assignee: Henkel AG & Co. KGaAInventors: Donald E. Herr, Ziyi Hu, Charles W. Paul, Robert W. R. Humphreys
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Patent number: 7781550Abstract: Disclosed are compositions comprising: at least one monomer of the formula: where SiR?RR? is SiCl3, Si(alkyl)Cl2, Si(alkyl)(O-alkyl)2, or Si(O-alkyl)3; n and y are each 0 or an integer from 1 to 10; and at least one particle comprising silica, alumina, zirconia, or mixtures thereof.Type: GrantFiled: December 14, 2005Date of Patent: August 24, 2010Assignee: E. I. du Pont de Nemours and CompanyInventors: Che-Hsiung Hsu, Nora Sabina Radu, Mark Andrew Harmer
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Patent number: 7732546Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain hydrophilic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. The polymeric compositions comprise polymerizable hydrophilic siloxanyl monomers.Type: GrantFiled: September 3, 2008Date of Patent: June 8, 2010Assignee: Bausch & Lomb IncorporatedInventors: Joseph C. Salamone, Jay F. Kunzler
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Publication number: 20090318652Abstract: A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition.Type: ApplicationFiled: December 13, 2006Publication date: December 24, 2009Applicant: JSR CORPORATIONInventors: Tomoki Nagai, Takuma Ebata, Nobuji Matsumura
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Publication number: 20090062475Abstract: In a process for producing a functionalized polyalkenamer, at least one monomer comprising a monocyclic olefin having at least one pendant alkyl group bonded thereto, wherein the pendant alkyl group has at least two carbon atoms and is substituted with a polar moiety spaced by at least one carbon atom from the monocyclic olefin, is contacted with a polymerization catalyst under conditions effective to effect ring opening polymerization of the monocyclic olefin and produce the functionalized polyalkenamer.Type: ApplicationFiled: September 2, 2008Publication date: March 5, 2009Inventors: Lisa Saunders Baugh, Enock Berluche, Karla Schall Colle
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Publication number: 20090042140Abstract: A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer for crosslinking is useful in an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.Type: ApplicationFiled: June 5, 2008Publication date: February 12, 2009Applicant: HYNIX SEMICONDUCTOR INC.Inventor: Jae Chang Jung
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Patent number: 7473737Abstract: The present invention relates to mixtures for preparing transparent plastics, encompassing a) compounds of the formula (I) and (II) where each R1, independently of the others, is hydrogen or a methyl radical, each R2, independently of the others, is a linear or branched, aliphatic or cycloaliphatic radical, or a substituted or unsubstituted aromatic or heteroaromatic radical, and each of m and n, independently of the other, is a whole number greater than or equal to 0, where m+n>0, and b) at least one monomer (A) capable of free-radical polymerization with a molar mass of at least 150 g/mol, which contains at least two terminal olefinic groups, where at least two of the olefinic groups of the monomer (A) have, in the ?- and/or ?-position with respect to the olefinic group, atoms which differ in nature and/or number, in the radical which connects the at least two olefinic groups.Type: GrantFiled: July 10, 2004Date of Patent: January 6, 2009Assignee: Roehm GmbH & Co. KGInventors: Bardo Schmitt, Patrik Hartmann
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Publication number: 20080311065Abstract: The present invention relates to macromonomer compounds possessing antioxidant properties, antioxidant polymers comprising the antioxidant macromonomers as a recurring unit, and methods of inhibiting oxidation in a substance comprising contacting the substance with the antioxidant polymers. In one embodiment, substantially all of the recurring macromonomeric units of the antioxidant polymers comprise an antioxidant moiety. In another embodiment, all of the recurring macromonomer units of the antioxidant polymers comprise an antioxidant moiety. The method of the present invention, yields antioxidant polymers with substantially all of the recurring units comprising an antioxidant moiety. These antioxidant polymers have greater bulk antioxidative properties than previously known.Type: ApplicationFiled: May 28, 2008Publication date: December 18, 2008Inventor: Ashok L. Cholli
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Publication number: 20080186653Abstract: Disclosed is a polymeric surfactant for high dielectric polymer composites, a method of preparing the same, and a high dielectric polymer composite including the same. The polymeric surfactant for high dielectric polymer composites, which includes a head portion having high affinity for a conductive material and a tail portion having high affinity for a polymer resin, forms a passivation layer surrounding the conductive material in the high dielectric polymer composite including the polymeric surfactant, thus ensuring and controlling a high dielectric constant.Type: ApplicationFiled: December 20, 2007Publication date: August 7, 2008Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Eun Sung LEE, Sang Mock LEE, Young Hun BYUN, Jin Young BAE
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Publication number: 20080182934Abstract: The present invention is drawn to an aqueous emulsion composition. The composition includes an aqueous phase and a hydrophobic phase dispersed in the aqueous phase, which includes a plurality of hydrophobic monomers. The monomers are acid-functionalized and hydrophobic, with less than 10% solubility in water. In one aspect, the monomers can be aromatic. Such monomers can be polymerized with other monomers to form latex particulates. A latex can include latex particulates dispersed in an aqueous fluid medium. In one embodiment, latex particulates can include from about 0.1 wt % to about 25 wt % of polymerized hydrophobic acid-functionalized monomer, and at least one other polymerized film-forming monomer. The latex can be formulated as an ink-jet ink.Type: ApplicationFiled: January 30, 2007Publication date: July 31, 2008Inventors: Sivapackia Ganapathiappan, Zhang-Lin Zhou
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Publication number: 20080146759Abstract: The present invention provides a polythiocarbonate resin containing a repeating unit represented by the following general formula (1), having high transparency, refractive index, and Abbe number and excellent heat resistance and impact resistance, and an optical material using the polythiocarbonate resin. Further, the present invention provides a sulfur-containing compound having an Abbe number of 40 or more, a high refractive index, a high Abbe number, excellent transparency, excellent heat resistance, and the like, obtained by reacting a dithiol compound represented by the following general formula (II) and a diene compound represented by the following general formula (III), and thus containing a repeating unit formed of a structural unit derived from a residue of the dithiol compound and a structural unit derived from a residue of the diene compound.Type: ApplicationFiled: April 15, 2005Publication date: June 19, 2008Inventors: Yoriyuki Takashima, Hiroyuki Tamura, Takaaki Hikosaka, Masaaki Takehana
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Publication number: 20080139771Abstract: The present invention relates to thio(meth)acrylates, obtainable via reaction of compounds of the formula (I) and (II) where each R1, independently of the others, is hydrogen or a methyl radical, each R2, independently of the others is a linear or branched, aliphatic or cycloaliphatic radical, or a substituted or unsubstituted aromatic or heteroaromatic radical, and each of m and n, independently of the others, is whole number greater than or equal to 0, where m+n>0, with thiol compounds which encompass at least two thiol groups.Type: ApplicationFiled: December 3, 2005Publication date: June 12, 2008Applicant: Roehm GmbHInventors: Bardo Schmitt, Joachim Knebel, Patrik Hartmann
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Publication number: 20080107903Abstract: To obtain a close-contact multi-layer type diffractive optical element having a homogeneous high-refractive-index and low-dispersion resin layer, an acrylate-terminated oligomer, obtained by allowing excess bifunctional acrylate to react with bifunctional thiol, is used as a resin precursor for the high-refractive-index and low-dispersion resin layer.Type: ApplicationFiled: December 20, 2005Publication date: May 8, 2008Inventors: Akiko Miyakawa, Masayuki Shijo
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Patent number: 7279539Abstract: A polymer, which contains a structural unit having a carboxyl group represented by the following formula (1) at a side chain of the structural unit, wherein node position is formed, when the polymer is dissolved in an alkali aqueous solution having a pH of 10 or more and kept at 25° C. for 60 days: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an (n+1)-valent organic linking group containing an ester group represented by —O(C?O)—; A represents an oxygen atom or NR3—; R3 represents a hydrogen atom, or an monovalent hydrocarbon group having from 1 to 10 carbon atoms; and n indicates an integer of from 1 to 5.Type: GrantFiled: June 29, 2006Date of Patent: October 9, 2007Assignee: Fujifilm CorporationInventors: Atsushi Sugasaki, Kazuto Kunita
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Patent number: 7144954Abstract: The present invention relates to mixtures containing A) compounds of the formula (I) and (II) where R1 is independently at each instance hydrogen or a methyl radical, R2 is independently at each instance a linear or branched, aliphatic or cycloaliphatic radical or a substituted or unsubstituted aromatic or heteroaromatic radical and m and n are each independently an integer of not less than 0 subject to the proviso that m+n>0, and B) at least one ethylenically unsaturated monomer (A) which is different from the compounds of the formula (I) and (II). The present invention further relates to processes for polymerizing these mixtures, the highly transparent polymers thus obtainable and to their use.Type: GrantFiled: September 13, 2003Date of Patent: December 5, 2006Assignee: Röhm GmbH & Co. KGInventors: Bardo Schmitt, Wolfgang Klesse, Volker Kerscher, Patrik Hartmann
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Patent number: 7006344Abstract: The present invention provides a bis(4-mercaptophenyl) sulfide derivative represented by general formula 1. This derivative is a monomer that can form a dielectric film suitable for an electronic component. The present invention further provides a method for producing this derivative and an electronic component having high characteristics under excellent humidity and high temperature.Type: GrantFiled: July 23, 2001Date of Patent: February 28, 2006Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Noriyasu Echigo, Kazuyoshi Honda, Yoshiaki Kai, Masaru Odagiri, Hisaaki Tachihara, Hideki Matsuda, Jun Katsube, Kazuo Iwaoka, Takanori Sugimoto, Nobuki Sunagare
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Publication number: 20040131849Abstract: A polymerizable resin material for making a plastic lens includes bisphenol A ethoxylate (1 to 4) dimethacrylate and benzylmethacrylate, and, optionally, one or more stabilizing monomers, preferably selected from trimethylolpropane trimethacrylate, isobornyl methacrylate, ethoxylate nonyl phenol acrylate, ethyoxylate nonyl phenol, and/or 2-phenoxyethyl methacrylate esters. The polymerizable resin material is cured when exposed to heat or visible and/or UV light for a period of about two minutes or less.Type: ApplicationFiled: December 19, 2000Publication date: July 8, 2004Inventor: Duane L. Wires
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Patent number: 6699953Abstract: The present invention provides a material for optical lenses which not only sufficiently has properties such as impact resistance and dye-affinity essential for the optical lenses but also simultaneously attains a high refractive index, a high Abbe's number and a low specific gravity, and which is photopolymerizable. The present invention further provides a lens made of a synthetic resin which is a copolymer obtained by copolymerizing a composition comprising 20 to 80% by weight of bis-2-methacryloylthioethyl sulfide represented by the following structural formula (1), 5 to 50% by weight of a bifunctional or multifunctional thiol and 0 to 75% by weight of a monomer copolymerizable with these compounds, and which has a refractive index of 1.58 or more, an Abbe's number of 35 or more and a specific gravity of 1.35 or less: CH2═C(CH3)COSCH2CH2SCH2CH2SCOC(CH3)═CH2 Structural formula (1).Type: GrantFiled: November 26, 2002Date of Patent: March 2, 2004Assignee: Seed Co., Ltd.Inventors: Tatsuya Oshikiri, Yasushi Oyaizu, Kenji Uno
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Patent number: 6653425Abstract: The invention is directed to the preparation of vinyl sulfide compounds of general formula —(—R1—S—R4C═CR5—R3—S—)n—(—R2—S—R4C═CR5—R3—S—)m, where m and n are integers in the range of 1-1000, are formed by the addition of a dithiol compound of general formula HS—R1—SH to an acetylenic compound of general formula HC≡C—R3—S—R2≡S—R3—C—CH2. These vinyl sulfide compounds can be homopolymerized or copolymerized with second monomers, oligomers or polymers that are capable of reacting with their carbon-carbon double bond. The vinyl sulfide compounds have a high refractive index (1.60 or higher at 632 nm) and can be used to make optical telecommunication elements and devices. They are soluble in selected solvents and such solutions can be applied to substrates by various methods such as spin coating, dipping, spraying and other methods known in the art.Type: GrantFiled: November 27, 2002Date of Patent: November 25, 2003Assignee: Corning IncorporatedInventors: Eyerce L. Armstrong-Poston, Paul J. Shustack, Jianguo Wang
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Patent number: 6458908Abstract: A sulfur-containing unsaturated carboxylate compound comprising a sulfur-containing substituent and at least two &agr;,&bgr;-unsaturated carboxylic acid residues, which are each attached to a secondary or tertiary carbon atom via an oxygen atom; a polymerizable composition comprising the sulfur-containing unsaturated carboxylate compound; a cured product prepared by polymerizing the polymerizable composition; an optical component consisting of the cured product; and novel intermediate compounds for preparation of the above carboxylate.Type: GrantFiled: May 31, 2000Date of Patent: October 1, 2002Assignee: Mitsui Chemicals, Inc.Inventors: Masao Imai, Kenichi Sugimoto, Kenichi Fujii, Atsuo Otsuji, Tadashi Ohkuma, Masatoshi Takagi, Rihoko Suzuki, Keisuke Takuma
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Patent number: 6447708Abstract: Sulphur product, (P), process for making (P), films, molded articles made therefrom, wherein (P) is obtained by the addition reaction of at least one polythiol (I) with at least one compound of formula (II): in which R1 represents a linear or branched aliphatic residue comprising an ethylenic unsaturation double bond, it being optional for the latter to be that by which R1 is connected to the norbornene ring, it also being optional for the said ring to comprise other substituents chosen from C1-C3 alkyl groups, in proportions corresponding or substantially corresponding to one thiol group of the polythiol or polythiols (I) per mole of the compound or compounds (II), the thiol groups of the compound or compounds (I) adding predominantly to the cyclic double bond of the compound or compounds (II) and, on average, one ethylenic unsaturation of a compound (II) of the two which it carries remaining free; or sulphur product, (P′), obtained by the addition reaction of at least one polythiol (Type: GrantFiled: September 29, 2000Date of Patent: September 10, 2002Assignee: Cray Valley S.A.Inventors: Philippe Thépot, Henri Strub
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Patent number: 6444724Abstract: Composite materials particularly suitable in the dental art as a tooth filling material including a polymer matrix, a metal, metal alloy, metal oxide particulate, or combinations thereof, in the presence or absence of colloidal silica, and a coupling agent to adhere the particulate to the polymer matrix. Adhesion can also be facilitated by cleaning and/or coating the particulates prior to incorporation into the polymer matrix. One or two paste systems of the composition with suitable initiators, accelerators, etc. can be formulated.Type: GrantFiled: December 20, 1999Date of Patent: September 3, 2002Assignee: BioMat Sciences, Inc.Inventors: Ivan Stangel, Thomas Ellis, Erik Kruus, Edward Sacher, Robin Drew, Jingwei Xu
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Patent number: 6342571Abstract: Polymerizable compositions comprising: (a) a mixture of thio(meth)acrylate functional monomers comprising, (a)(i) a first thio(meth)acrylate functional monomer, e.g., bis(thiomethacrylate)-1,2-ethylene, and (a)(ii) a second thio(meth)acrylate functional monomer, which is chain extended; (b) an aromatic monomer having at least two vinyl groups, e.g., divinyl benzene; (c) a polythiol monomer having at least two thiol groups, e.g., pentaerythritol tetrakis(3-mercaptopropionate); and (d) a comonomer selected from, (d)(i) an anhydride monomer having at least one ethylenically unsaturated group, e.g., methacrylic anhydride; (d) (ii) a monomer having at least three (meth)acryloyl groups, e.g., pentaerythritol tetrakis(acrylate); and (d)(iii) mixtures of monomers (d)(i) and (d)(ii). A polymerizate of the polymerizable composition has a refractive index of at least 1.57 and an Abbe number of at least 33.Type: GrantFiled: August 20, 1999Date of Patent: January 29, 2002Assignee: PPG Industries Ohio, Inc.Inventors: Robert A. Smith, Michael O. Okoroafor, Robert D. Herold, T. Edwin Freeman
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Patent number: 6309585Abstract: A high refractive index composition comprising a core resin mixture comprising a mixture of ethoxylated bisphenol A di(meth)acrylates and/or their derivatives having variable degrees of ethoxylation to provide enhanced impact resistance and refractive index.Type: GrantFiled: April 23, 1999Date of Patent: October 30, 2001Assignee: Rodenstock North America, Inc.Inventor: Qiang Zheng