From S-containing Monomer Patents (Class 526/286)
  • Patent number: 11345773
    Abstract: A water extractable ophthalmic device is disclosed which is a polymerization product of a monomeric mixture comprising: (a) one or more cyclic lactams; (b) one or more non-bulky organosilicon-containing monomers; (c) one or more bulky siloxane monomers; and (d) a crosslinking agent mixture comprising (i) one or more first crosslinking agents containing at least two ethylenically unsaturated reactive end groups, wherein the at least two ethylenically unsaturated reactive end groups are (meth)acrylate-containing reactive end groups and (ii) one or more second crosslinking agents containing at least two ethylenically unsaturated reactive end groups wherein at least one of the ethylenically unsaturated reactive end groups is a non-(meth)acrylate reactive end group. The water extractable ophthalmic device has an equilibrium water content of at least about 50 wt. %, a contact angle of less than about 50°, and an oxygen permeability of at least about 60 Barrers.
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: May 31, 2022
    Assignee: Bausch & Lomb Incorporated
    Inventors: Ivan M. Nuñez, Lynn Coullard, Analuz Mark, Andrew J. Hoteling, Joseph W. Hoff
  • Patent number: 11326008
    Abstract: The present invention relates to a process for producing a stable fluorinated latex by emulsion polymerization in the absence of fluorinated surfactant, stabilized by an amphiphilic block copolymer formed in situ. The invention also concerns the aqueous dispersion comprising the fluorinated polymer chains and the amphiphilic block copolymers, obtained by this process.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: May 10, 2022
    Assignee: Arkema France
    Inventors: Samuel Devisme, Andrew Kahn, Mathieu Fuentes-Exposito, Timothy McKenna, Franck D'Agosto, Muriel Lansalot, Anthony Bonnet
  • Patent number: 10907001
    Abstract: Polymers having mechanical properties approaching or exceeding commercial elastomers and engineering thermoplastics, but improved biostability, are described herein. In one embodiment, the polymers have a hard segment containing one or more disulfoxide or disulfone moieties and a soft segment connected to the hard segment to form an elastomeric polymer. The polymer is resistant to oxidation and/or hydrolytic degradation, particularly in vivo, which allows for the use of these materials in implants/devices which are implanted for an extended period of time. The ratio or percentage by weight of soft segment to hard segment can be varied based on the physical and mechanical properties of the desired device.
    Type: Grant
    Filed: September 19, 2016
    Date of Patent: February 2, 2021
    Assignees: The Arizona Board of Regents on Behlaf of the University of Arizona
    Inventors: Arthur J. Coury, Marvin J. Slepian
  • Patent number: 10286106
    Abstract: A shape memory polymer (SMP) intraocular lens may have a refractive index above 1.45, a Tg between 10° C. and 60° C., inclusive, de minimis or an absence of glistening, and substantially 100% transmissivity of light in the visible spectrum. The intraocular lens is then rolled at a temperature above Tg of the SMP material. The intraocular device is radially compressed within a die to a diameter of less than or equal to 1.8 mm while maintaining the temperature above Tg. The compressed intraocular lens device may be inserted through an incision less than 2 mm wide in a cornea or sclera or other anatomical structure. The lens can be inserted into the capsular bag, the ciliary sulcus, or other cavity through the incision. The SMP can substantially achieve refractive index values of greater than or equal to 1.45.
    Type: Grant
    Filed: May 17, 2016
    Date of Patent: May 14, 2019
    Assignee: The Regents of the University of Colorado
    Inventors: Malik Y. Kahook, Naresh Mandava, Robin Shandas, Bryan Rech
  • Patent number: 10253125
    Abstract: There is provided a polymerizable liquid crystal composition that enables a film formed through application of the composition and exposure thereof to heat or active energy rays to have an excellent molecular alignment and reduced haze. There is also provided an optically anisotropic body that is produced by using such a polymerizable liquid crystal composition and that has a good transparency. In particular, the present invention provides a polymerizable liquid crystal composition containing a polymerizable haze-reducing agent and a polymerizable liquid crystal compound. Furthermore, the present invention also provides an optically anisotropic body produced by using the polymerizable liquid crystal composition of the present invention.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: April 9, 2019
    Assignee: DIC CORPORATION
    Inventors: Kouichi Endo, Mika Yamamoto, Kazuaki Hatsusaka
  • Patent number: 9403925
    Abstract: Provided are: a curable composition from which a cured article having excellent molding processability and high heat resistance as well as such a high Tg that it can be used as a molding resin for a SiC power semiconductor can be obtained; and a cured article thereof. The curable composition comprises: 100 parts by mass of a compound having at least two partial structures represented by the following Formula (1) in the molecule as a component (A); 0.5 to 3 parts by mass of a thermal radical generator as a component (B); and 0 to 50 parts by mass of other radical-reactive compound as a component (C): (wherein, ring A represents a benzene ring or a cyclohexyl ring; R1 represents an alkylene group having 1 to 6 carbon atoms; R2 represents an alkyl group having 1 to 4 carbon atoms; a represents a number of 0 or 1; b represents an integer of 0 to 3; and c represents a number of 1 or 2).
    Type: Grant
    Filed: August 24, 2012
    Date of Patent: August 2, 2016
    Assignee: ADEKA CORPORATION
    Inventors: Kenichiro Hiwatari, Atsuo Tomita, Tomoaki Saiki, Kiyoshi Murata
  • Patent number: 9023581
    Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: May 5, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd
    Inventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
  • Patent number: 8993701
    Abstract: The invention relates to a copolymer of (a) 5 to 40% by weight of isoprenol, (b) 5 to 93% by weight of at least one monoethylenically unsaturated C3 to C8 monocarboxylic acid, an anhydride or salt of same, (c) 2 to 90% by weight of one or more sulfonic acid group-comprising monomers.
    Type: Grant
    Filed: July 10, 2012
    Date of Patent: March 31, 2015
    Assignee: BASF SE
    Inventors: Torben Gädt, Jürgen Detering, Stephan Nied
  • Patent number: 8945712
    Abstract: A polymeric or oligomeric composition comprising at least one first divalent unit represented by formula: and at least one of a second divalent unit comprising a pendant phosphonate group —P(O)(OY)2 or a monovalent unit comprising a thioether linkage and a terminal Z group, wherein each Z group is independently —P(O)(OY)2 or —O—P(O)(OY)2. Rf is a perfluoropolyether group. Q is a bond, —C(O)—N(R1)—, or —C(O)—O—. R?, R??, R and R1 are each independently hydrogen and alkyl having from 1 to 4 carbon atoms. X is alkylene, arylalkylene, and alkylarylene, wherein alkylene, arylalkylene, and alkylarylene are each optionally interrupted by at least one ether linkage. Y is hydrogen, alkyl, trialkylsilyl, and a counter cation. Methods of treating a surface using these compositions and articles with a surface in contact with these compositions are provided. Methods of making these compositions are also provided.
    Type: Grant
    Filed: June 5, 2008
    Date of Patent: February 3, 2015
    Assignee: 3M Innovative Properties Company
    Inventors: Rudolf J. Dams, Steven J. Martin, Mark J. Pellerite, Chetan P. Jariwala, Gregory D. Clark, Jason T. Petrin
  • Patent number: 8871884
    Abstract: The inventions disclosed, described, and/or claimed herein relate to copolymers comprising copolymers comprising electron accepting A subunits that comprise thiazolothiazole, benzobisthiazole, or benzobisoxazoles rings, and electron donating subunits that comprise certain heterocyclic groups. The copolymers are useful for manufacturing organic electronic devices, including transistors and solar cells. The invention also relates to certain synthetic precursors of the copolymers. Methods for making the copolymers and the derivative electronic devices are also described.
    Type: Grant
    Filed: October 26, 2010
    Date of Patent: October 28, 2014
    Assignee: University of Washington
    Inventors: Samson A. Jenekhe, Selvam Subramaniyan, Eilaf Ahmed, Hao Xin, Felix Sunjoo Kim
  • Publication number: 20140235794
    Abstract: The present invention provides a polymer composition capable of providing fibers with an enough penetration speed and enough water retention, while maintaining a favorable hue of the fibers, when used as a fiber crosslinking agent. The present invention also provides a fiber crosslinking agent and crosslinked fibers using the polymer composition. The present invention further provides a polymer composition that enhances the absorption properties of fibers and is especially useful for applications which strongly require the absorption properties, and a fiber crosslinking agent and crosslinked fibers using the polymer composition. The present invention is a polymer composition containing a poly(meth)acrylic acid polymer; and a bisulfite (salt)-added (meth)acrylic acid (salt) or a hypophosphorous acid (salt).
    Type: Application
    Filed: August 30, 2012
    Publication date: August 21, 2014
    Applicant: NIPPON SHOKUBAI CO., LTD.
    Inventor: Shigeru Yamaguchi
  • Patent number: 8778595
    Abstract: A resist composition containing a base component (A) which generates acid upon exposure, and exhibits changed solubility in a developing solution under the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below and a structural unit (a6) that generates acid upon exposure. In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R1 represents a sulfur atom or an oxygen atom, R2 represents a single bond or a divalent linking group, and Y represents a hydrocarbon group in which a carbon atom or a hydrogen atom may be substituted with a substituent.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: July 15, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daichi Takaki, Daiju Shiono, Yoshiyuki Utsumi, Jun Iwashita
  • Patent number: 8772425
    Abstract: The present invention provides pressure-sensitive adhesives having a refractive index of at least 1.50. The pressure-sensitive adhesives comprise at least one monomer containing a substituted or an unsubstituted biphenyl group.
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: July 8, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Michael D. Determan, Albert I. Evaraerts, Cheryl L. Moore, David B. Olson
  • Publication number: 20140187715
    Abstract: Provided are: a curable composition from which a cured article having excellent molding processability and high heat resistance as well as such a high Tg that it can be used as a molding resin for a SiC power semiconductor can be obtained; and a cured article thereof. The curable composition comprises: 100 parts by mass of a compound having at least two partial structures represented by the following Formula (1) in the molecule as a component (A); 0.5 to 3 parts by mass of a thermal radical generator as a component (B); and 0 to 50 parts by mass of other radical-reactive compound as a component (C): (wherein, ring A represents a benzene ring or a cyclohexyl ring; R1 represents an alkylene group having 1 to 6 carbon atoms; R2 represents an alkyl group having 1 to 4 carbon atoms; a represents a number of 0 or 1; b represents an integer of 0 to 3; and c represents a number of 1 or 2).
    Type: Application
    Filed: August 24, 2012
    Publication date: July 3, 2014
    Applicant: ADEKA CORPORATION
    Inventors: Kenichiro Hiwatari, Atsuo Tomita, Tomoaki Saiki, Kiyoshi Murata
  • Patent number: 8754151
    Abstract: The present invention relates to aqueous multistage polymer dispersions obtainable by free-radically initiated aqueous emulsion polymerization, having a soft phase and a hard phase, and a hard-to-soft stage ratio of 25% to 95% by weight to 75% to 5% by weight, the glass transition temperature (Tg) of the soft phase, as first stage, being ?30 to 0° C. and that of the hard phase, as second stage, being 20 to 60° C., comprising at least one monomer of the general formula I in which the variables have the following definitions: n=0 to 2, R1, R2, R3=independently of one another hydrogen or methyl group, X=O or NH, Y=H, alkali metal or NH4, to processes for preparing these aqueous polymer dispersions, and to the use thereof as binders in coatings, and also to coatings comprising the polymer dispersion of the invention.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: June 17, 2014
    Assignee: BASF SE
    Inventors: Sebastian Roller, Ekkehard Jahns, Hans-Juergen Denu
  • Patent number: 8729203
    Abstract: The present invention provides a monomer for a polymerizable composition, a polymerizable composition containing the monomers, a polymer formed from the polymerizable composition, and ophthalmic lens blanks and ophthalmic lenses formed from the polymer. The monomer is a compound having the formula (I) or (Ia).
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: May 20, 2014
    Inventors: Timothy Charles Higgs, Richard Alexander Young
  • Patent number: 8703875
    Abstract: The invention relates to novel crosslinkable copolymers which are obtainable by (a) copolymerizing at least two different hydrophilic monomers selected from the group consisting of N,N-dimethyl acrylamide (DMA), 2-hydroxyethyl acrylate (HEA), glycidyl methacrylate (GMA), N-vinylpyrrolidone (NVP), acrylic acid (AA) and a C1-C4-alkoxy polyethylene glycol(meth)acrylate having a weight average molecular weight of from 200 to 1500, and at least one crosslinker comprising two or more ethylenically unsaturated double bonds in the presence of a chain transfer agent having a functional group; and (b) reacting one or more functional groups of the resulting copolymer with an organic compound having an ethylenically unsaturated group.
    Type: Grant
    Filed: February 27, 2013
    Date of Patent: April 22, 2014
    Assignee: Novartis AG
    Inventors: Frank Chang, Norberto Arturo Medina
  • Patent number: 8703383
    Abstract: A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: April 22, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Emad Aqad, Su Jin Kang, Owendi Ongayi
  • Patent number: 8679636
    Abstract: Presently described is a composition comprising at least one first divalent unit comprising a pendant perfluoropolyether or perfluoroalkyl group; at least one second divalent unit comprising a pendant phosphorus-containing acid group; and at least one third unit comprising a terminal or pendant alkoxy silane group. Also described is a coating comprising the composition described herein dissolved or dispersed in a solvent and a method of providing a coated article or surface. Such method is particularly useful for providing corrosion protection to a metallic surface.
    Type: Grant
    Filed: October 20, 2011
    Date of Patent: March 25, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Suresh Iyer, David A. Hesselroth, Richard M. Flynn, Karl J. Manske
  • Patent number: 8663660
    Abstract: Polymerized micelles comprising polymerized amphiphilic molecules obtained starting from amphiphilic molecules having one or two lipid chains each comprising one or two polymerizable moieties and linked to a polar head.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: March 4, 2014
    Assignees: Les Laboratories Servier, Commissariat a l'Energie Atomique
    Inventors: Julien Ogier, Eric Doris, François Lefoulon, Thomas Arnauld
  • Publication number: 20140039081
    Abstract: A process For the production of a thermoplastic polymer including carbon and sulphur in an atomic ration of C:S of at least 4 and at most 36 using thiol-ene addition polymerization, preferably with feedstocks obtained from renewable resources such as fatty acids from vegetable origin. The product is preferably aliphatic, meaning that at most 70% of the protons are present as aromatic hydrogen atoms and, if oxygen atoms are present in ester functions, the atomic ratio of the oxygen atoms present in ester functions relative to the number of sulphur atoms in the polymer is less than 1.0. The polymer may be used to produce a shaped article.
    Type: Application
    Filed: April 13, 2012
    Publication date: February 6, 2014
    Applicant: UNIVERSITEIT GENT
    Inventors: Otto Van Den Berg, Filip Du Prez, Sam Verbrugghe
  • Patent number: 8632945
    Abstract: A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a repeating unit represented by a formula (I), a repeating unit represented by a formula (II), or a both thereof. Each of R1 to R3 independently represents a hydroxyl group, or the like. At least one of R1 represents a group having two or more heteroatoms. l is an integer from 1 to 5. Each of m and n is independently an integer from 0 to 5. Each of R7 and R11 independently represents a hydrogen atom, or the like. Each of R8 to R10 independently represents a hydrogen atom, or the like. A represents —O—, or the like. D represents a substituted or unsubstituted methylene group, or the like.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: January 21, 2014
    Assignee: JSR Corporation
    Inventor: Ken Maruyama
  • Patent number: 8580482
    Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: November 12, 2013
    Assignee: JSR Corporation
    Inventors: Takashi Chiba, Toru Kimura, Tomohiro Utaka, Hiroki Nakagawa, Hirokazu Sakakibara, Hiroshi Dougauchi
  • Patent number: 8557474
    Abstract: A fluorosulfonyl group-containing monomer having a high polymerization reactivity and plural fluorosulfonyl groups, a fluorosulfonyl group-containing polymer and a sulfonic acid group-containing polymer, obtained by using the monomer.
    Type: Grant
    Filed: November 29, 2010
    Date of Patent: October 15, 2013
    Assignee: Asahi Glass Company, Limited
    Inventors: Atsushi Watakabe, Hiromasa Yamamoto, Masao Iwaya, Susumu Saito
  • Patent number: 8541526
    Abstract: Disclosed herein are photopolymerizable compositions and formulations that comprise photochromic dyes, photochromic blue light blocking dyes, permanent dyes, permanent blue blocking dyes, and/or their combinations. In some variations, these formulations are suited for example, for sandwiching between lens blanks to form semi-finished lens assemblies to form a tinted lens useful in sunglasses. The formulations are also suitable for correcting optical aberrations, and may provide a photochromic effect when exposed to sunlight.
    Type: Grant
    Filed: July 6, 2011
    Date of Patent: September 24, 2013
    Assignee: Essilor International (Compagnie Generale d'Optique)
    Inventors: Jagdish M. Jethmalani, Gomaa Abdelsadek, Erdem Cetin, Shawn McCarty, Junhao Ge
  • Patent number: 8529789
    Abstract: A photochromic cured product exhibiting favorable photochromic properties such as a high color density and a large fading rate, and excellent base member properties such as a high hardness, a high heat resistance and a high impact resistance. A curable composition contains a polymerizable monomer which exhibits the L-scale Rockwell hardness of not larger than 40, a bifunctional polymerizable monomer which exhibits the L-scale Rockwell hardness of not smaller than 60, a polyfunctional polymerizable monomer which exhibits the L-scale Rockwell hardness of not smaller than 60, and a photochromic compound.
    Type: Grant
    Filed: July 1, 2005
    Date of Patent: September 10, 2013
    Assignee: Tokuyama Corporation
    Inventors: Junji Momoda, Takayoshi Kawasaki, Toshiaki Ohtani
  • Patent number: 8501890
    Abstract: This invention relates to polymerizable ultraviolet light absorbers and yellow colorants and their use in ophthalmic lenses. In particular, this invention relates to polymerizable ultraviolet light absorbing methane compounds and yellow compounds of the methine and anthraquinone classes that block ultraviolet light and/or violet-blue light transmission through ophthalmic lenses.
    Type: Grant
    Filed: September 18, 2012
    Date of Patent: August 6, 2013
    Assignee: Abbott Medical Optics Inc.
    Inventors: Jason Clay Pearson, Max Allen Weaver, Jean Carroll Fleischer, Gregory Allan King
  • Patent number: 8497315
    Abstract: The present invention pertains to a process for the preparation of aqueous dispersions which are stabilized with a water-insoluble stabilizing colloid, characterized in that a) in a first step a water-insoluble stabilizing colloid is prepared, with this being prepared, based on the amount of monomer used for the preparation of the stabilizing colloid, by means of radical polymerization, followed by b) the addition of at least one further olefinically unsaturated monomer and at least one initiator, in which process by means of radical polymerization of the further olefinically unsaturated monomer an aqueous dispersion is obtained, on which c) optionally a residual monomer reduction is performed, with this being carried out by means of polymerization of residual monomers and/or by means of physical removal of the residual monomers and optionally further volatile organic components by means of the introduction of vapor and/or gas.
    Type: Grant
    Filed: November 15, 2007
    Date of Patent: July 30, 2013
    Assignee: Akzo Nobel N.V.
    Inventors: Hongli Willimann, Jakob Wolfisberg, Ulf Kehrer
  • Patent number: 8481663
    Abstract: Disclosed is a copolymer suitable for use as a resist for atomic force microscope (AFM) lithography or e-beam lithography. The copolymer contains fluoroalkylsulfonium salts as photoacid generators. The copolymer has high solubility in organic solvents and high coating ability. In addition, the copolymer can be patterned with high sensitivity and resolution by lithography. Further disclosed is a method of preparation for the copolymer.
    Type: Grant
    Filed: February 11, 2009
    Date of Patent: July 9, 2013
    Assignee: IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
    Inventors: Haiwon Lee, Meehye Jeong, Ashok D. Sagar
  • Patent number: 8455565
    Abstract: Dental compositions and disulfide monomers are described. The disulfide monomer comprise a disulfide backbone group wherein each of the sulfur atoms are bonded to an ethylenically unsaturated group via a divalent linking group and the linking group comprises at least one heteroatom; and at least one other monomer ethylenically unsaturated monomer.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: June 4, 2013
    Assignees: 3M Innovative Properties Company, The Regents of the University of Colorado
    Inventors: Ahmed S. Abuelyaman, Joel D. Oxman, Yizhong Wang, Christopher N. Bowman, Hee Young Park, Christopher J. Kloxin
  • Patent number: 8455598
    Abstract: In a process for producing a functionalized polyalkenamer, at least one monomer comprising a monocyclic olefin having at least one pendant alkyl group bonded thereto, wherein the pendant alkyl group has at least two carbon atoms and is substituted with a polar moiety spaced by at least one carbon atom from the monocyclic olefin, is contacted with a polymerization catalyst under conditions effective to effect ring opening polymerization of the monocyclic olefin and produce the functionalized polyalkenamer.
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: June 4, 2013
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Lisa Saunders Baugh, Enock Berluche, Karla Schall Colle
  • Patent number: 8440385
    Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A?) including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group (wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof).
    Type: Grant
    Filed: December 27, 2010
    Date of Patent: May 14, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tomoyuki Hirano, Daiju Shiono, Masatoshi Arai
  • Patent number: 8436117
    Abstract: A stimuli responsive compound includes: a unit A having bonds that function as rotation axes; a first unit B disposed at a first bonding section of the unit A; a second unit B disposed at a second bonding section of the unit A; a first unit C disposed at a third bonding section of the unit A; and a second unit C disposed at a fourth bonding section of the unit A. The first unit B bonds with the second unit B by oxidation-reduction reaction, and the first unit C and the second unit C have liquid crystallinity and include polymerizable functional groups.
    Type: Grant
    Filed: February 2, 2011
    Date of Patent: May 7, 2013
    Assignee: Seiko Epson Corporation
    Inventor: Toshihiro Otake
  • Publication number: 20130102749
    Abstract: The present invention provides a preparation method of hyperbranched polycarboxylic acid type copolymer cement dispersant, including: Monomer A, B and C undergo a free radical copolymerization in an aqueous medium. The molar ratio of Monomer A, Monomer B and Monomer C conforms to B/A-A-2-10 and C/(A+B-C)-0.02-0.08. Monomer A is expressed by General Formula (1), where, R1 is H or a methyl; X1?O, CH2O, CH2CH2O; m is an integer from 5 to 200.
    Type: Application
    Filed: December 22, 2010
    Publication date: April 25, 2013
    Applicants: JIANGSU SUBOTE NEW MATERIALS CO.; LTD, JIANGSU BOTE NEW MATERIALS CO., LTD
    Inventors: Changwen Miao, Min Qiao, Qianping Ran, Jianping Liu, Dongliang Zhou, Yong Yang, Yonglin Mao
  • Patent number: 8404783
    Abstract: The invention relates to novel crosslinkable copolymers which are obtainable by (a) copolymerizing at least two different hydrophilic monomers selected from the group consisting of N,N-dimethyl acrylamide (DMA), 2-hydroxyethyl acrylate (HEA), glycidyl methacrylate (GMA), N-vinylpyrrolidone (NVP), acrylic acid (AA) and a C1-C4-alkoxy polyethylene glycol (meth)acrylate having a weight average molecular weight of from 200 to 1500, and at least one crosslinker comprising two or more ethylenically unsaturated double bonds in the presence of a chain transfer agent having a functional group; and (b) reacting one or more functional groups of the resulting copolymer with an organic compound having an ethylenically unsaturated group.
    Type: Grant
    Filed: July 10, 2007
    Date of Patent: March 26, 2013
    Assignee: Novartis AG
    Inventors: Frank Chang, Norberto Arturo Medina
  • Patent number: 8389202
    Abstract: A polymer includes a repeating unit shown by a general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents —X1Z1X2— which is an atomic group which forms a cyclic structure including a heteroatom together with Y. Z1 represents —O—, —S—, —CO—, —COO—, —SO—, or —SO2—. Each of X1 and X2 individually represents a single bond, a methylene group, or an alkylene group having 2 to 25 carbon atoms. Each of X1 and X2 is unsubstituted or substituted with a substituent, and optionally a carbon atom included in X1 and a carbon atom included in X2 are bonded via a divalent group.
    Type: Grant
    Filed: March 22, 2012
    Date of Patent: March 5, 2013
    Assignee: JSR Corporation
    Inventors: Ken Maruyama, Toru Kimura
  • Patent number: 8378046
    Abstract: The present invention provides pressure-sensitive adhesives having a refractive index of at least 1.50. The pressure-sensitive adhesives comprise at least one monomer containing a substituted or an unsubstituted biphenyl group.
    Type: Grant
    Filed: October 29, 2009
    Date of Patent: February 19, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Michael D. Determan, Albert I. Everaerts, Cheryl L. Moore, David B. Olson
  • Patent number: 8377625
    Abstract: A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in which a hydroxyl group is protected by a group which suppresses dissolution into an alkaline developer and which dissociates in the action of an acid; a repeating unit (C) having a lactone structure; and a repeating unit (D) having a cyclic ether structure, the difference in the copolymer concentration among a plurality of containers which were filled with copolymer solution from the same manufacturing lot is not more than a certain range, or the method includes a certain production step.
    Type: Grant
    Filed: October 28, 2009
    Date of Patent: February 19, 2013
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Takanori Yamagishi, Ichiro Kato, Akiko Tanaka, Miyako Asano
  • Patent number: 8367872
    Abstract: To obtain a close-contact multi-layer type diffractive optical element having a homogeneous high-refractive-index and low-dispersion resin layer, an acrylate-terminated oligomer, obtained by allowing excess bifunctional acrylate to react with bifunctional thiol, is used as a resin precursor for the high-refractive-index and low-dispersion resin layer.
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: February 5, 2013
    Assignee: Nikon Corporation
    Inventors: Akiko Miyakawa, Masayuki Shijo
  • Patent number: 8361345
    Abstract: A compound represented by formula (I) is disclosed. P1 and P2 represent a polymerizable group; m1 and m2 represent an integer of from 1 to 10, “A” represents a divalent group having a 5- to 18-membered aromatic hydrocarbon ring or a 5- to 18-membered aromatic hetero ring, L3 and L4 represent a C1-10 alkyl group or a C1-10 alkoxy group, k1 and k2 represent an integer of from 0 to 4, X1, X2, X3 and X4 represent —O—, —S—, —NH—, —NR— or —SiR0R00—, n1 and n2 represent 0 or 1, provided that at least one of them is 1; and L1a, L1b, L2a and L2b represent a hydrogen atom, halogen atom, —CN, —NC, —NCO, —NCS, or —OCN, provided that those in which both of X2 and X3 represent —O—, those in which one of X2 and X3 represents —O— and another represents —NH— or —NR— are excluded only when n1 is 1, both of L1a and L1b are hydrogen atoms, n2 is 1, and both of L2a and L2b are hydrogen atoms, or only when n1 is 1, both of L1a and L1b are hydrogen atoms, and n2 is 0.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: January 29, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Masaomi Kimura, Shunya Katoh, Mitsuyoshi Ichihashi, Yasuhiro Ishiwata, Masatoshi Mizumura
  • Patent number: 8360576
    Abstract: This invention relates to polymerizable ultraviolet light absorbers and yellow colorants and their use in ophthalmic lenses. In particular, this invention relates to polymerizable ultraviolet light absorbing methine compounds and yellow compounds of the methine and anthraquinone classes that block ultraviolet light and/or violet-blue light transmission through ophthalmic lenses.
    Type: Grant
    Filed: October 23, 2008
    Date of Patent: January 29, 2013
    Assignee: Abbott Medical Optics Inc.
    Inventors: Jason Clay Pearson, Max Allen Weaver, Jean Carroll Fleischer, Gregory Allan King
  • Patent number: 8349536
    Abstract: A dithiane derivative, having a structure expressed by the following general formula 1: where R1 is —H, or —CH3, a polymer containing a monomer unit containing the dithiane derivative, a resist composition containing the polymer, and a method for manufacturing a semiconductor device using the resist composition.
    Type: Grant
    Filed: November 29, 2010
    Date of Patent: January 8, 2013
    Assignee: Fujitsu Limited
    Inventor: Koji Nozaki
  • Patent number: 8343311
    Abstract: A method for producing paper, cardboard or similar materials, comprising, separately or in a mixture, adding to a fibrous suspension: at least one main retention agent comprising a cationic (co)polymer, and at least one dual retention agent comprising a crosslinked cationic (co)polymer obtained in the form of a dispersion and placed in solution prior to its introduction into the fibrous suspension with gentle stirring. The crosslinked cationic (co)polymer having—a UL viscosity of between 1.3 and 2.7 cps, preferably between 1.5 and 2.4 cps, and—an apparent cationicity ratio of between 25 and 75%. Optionally, before or after the dual agent or the main retention agent are added, one or more tertiary retention agent(s) selected from the group comprising mineral particles and organic polymers carrying anionic charges, is added to the suspension.
    Type: Grant
    Filed: April 10, 2009
    Date of Patent: January 1, 2013
    Assignee: S.P.C.M. SA
    Inventors: Rene Hund, Gatien Faucher
  • Patent number: 8344082
    Abstract: The present invention relates to new molecularly imprinted polymers which are suitable for the selective recognition of glutathione GSH and/or of an analog thereof, and in particular which are of use for the treatment of media comprising in particular a mixture of glutathione GSH, and/or of an analog thereof, with GSH adducts.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: January 1, 2013
    Assignee: Polyintell
    Inventors: Celine Perollier, Sami Bayoudh
  • Patent number: 8338500
    Abstract: The present invention relates a binder composition and a photosensitive composition including the binder composition. In one embodiment, a binder composition includes a copolymer of monomer M1, M2, M3, M4, an iso octyl 3-mercaptopropionate and a thermal initiator, wherein the monomer M1 can be represented by the following formula: the monomers M2, M3 and M4 can be represented by the following formula, however the monomers M2, M3 and M4 are different from each other, wherein R1, R2, R3 can be selected from the group consisting of hydrogen and alkyl group, R4 is an aromatic group, R5 can be selected from the group consisting of hydrogen, aromatic groups, alkyl groups, substituted alkyl groups and alkyl groups interrupted by an oxygen atom. The copolymer has good developing ability and a black matrices made therefrom has good mechanical properties.
    Type: Grant
    Filed: September 9, 2009
    Date of Patent: December 25, 2012
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventor: Mikyong Yoo
  • Patent number: 8338554
    Abstract: Disclosed is a novel optically stable hyperbranched polymer whose molecular terminal can be derivatized with various compounds; and a method for producing such a polymer. Specifically disclosed is a hyperbranched polymer having a structure represented by Formula (1) wherein a halogen atom is at a molecular terminal. The hyperbranched polymer can be obtained by substituting the molecular terminal dithiocarbamate group of a hyperbranched polymer having a dithiocarbamate group at a molecular terminal, which is obtained by living radical polymerization of a dithiocarbamate compound having a vinyl group structure, with a halogen atom. Also disclosed is a hyperbranched polymer wherein an amino group or an ammonium group is at a molecular terminal instead of a halogen atom.
    Type: Grant
    Filed: August 29, 2007
    Date of Patent: December 25, 2012
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kei Yasui, Masaaki Ozawa, Akihiro Tanaka, Hiroki Takemoto
  • Patent number: 8298748
    Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A?) including a polymeric compound (A1?) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2?) (wherein X? represents an anion moiety represented by one of general formulas (1) to (5)).
    Type: Grant
    Filed: May 17, 2010
    Date of Patent: October 30, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takehiro Seshimo, Yoshiyuki Utsumi, Yoshitaka Komuro, Takeyoshi Mimura, Daichi Takaki
  • Patent number: 8283102
    Abstract: Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved.
    Type: Grant
    Filed: April 2, 2009
    Date of Patent: October 9, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung Hoon Oh, Sang Jin Kim, Jin Ho Kim, Dae Hyeon Shin
  • Patent number: 8278387
    Abstract: The invention provides a resin composition for laser engraving, containing at least (A) a polymerizable compound having two or more ethylenic unsaturated bonds, a carbon-sulfur bond being contained at the site where two among the two or more ethylenic unsaturated bonds are connected and (B) a binder polymer. The invention further provides an image forming material containing the resin composition, a relief printing plate precursor having a relief forming layer which contains the resin composition, a relief printing plate precursor having a relief forming layer which contains a product formed by subjecting the resin composition to cross-linking, a method for manufacturing a relief printing plate including subjecting the relief printing plate precursor having the relief forming layer which contains the resin composition to cross-linking, and a relief printing plate manufactured by the manufacturing method.
    Type: Grant
    Filed: March 16, 2009
    Date of Patent: October 2, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Takashi Kawashima, Atsushi Sugasaki, Kenta Yoshida
  • Publication number: 20120244304
    Abstract: Farnesene interpolymer comprises units derived from a farnesene (e.g., ?-farnesene or ?-farnesene) and units derived from at least one vinyl monomer. The farnesene interpolymer can be prepared by copolymerizing the farnesene and at least one vinyl monomer in the presence of a catalyst. In some embodiments, the farnesene is prepared from a sugar by using a microorganism. In other embodiments, the at least one vinyl monomer is ethylene, an ?-olefin, or a substituted or unsubstituted vinyl halide, vinyl ether, acrylonitrile, acrylic ester, methacrylic ester, acrylamide or methacrylamide, or a combination thereof.
    Type: Application
    Filed: May 25, 2012
    Publication date: September 27, 2012
    Applicant: Amyris, Inc.
    Inventor: Derek James MCPHEE