Aromatic Patents (Class 526/293)
-
Patent number: 4921923Abstract: Oligomeric condensation products of certain diketones and phenols can be end-capped with a vinylbenzyl moiety and certain other moieties, especially alkyl groups, to afford thermosetting resins particularly valuable in making laminated circuit boards. Resins prepared by the reaction of 1 molar proportion of diacetylbenzene with from 3.5 to 4.0 molar proportions of phenol and end-capped with from 50 to 100% vinylbenzyl groups with the remainder being alkyls of 1 through 11 carbon atoms are particularly useful.Type: GrantFiled: November 18, 1988Date of Patent: May 1, 1990Assignee: Allied Signal Inc.Inventors: Joseph J. Zupancic, Jean M. J. Frechet, Andrew M. Zweig, Jeffrey P. Conrad
-
Patent number: 4857621Abstract: A mixture having emulsifying and emulsion stabilizing properties resulting from the polymerization of (1) a water soluble vinyl monomer selected from the group consisting of acrylamide and methacrylamide, (2) a water insoluble vinyl monomer having an alkyl chain containing about 6 to 30 carbon atoms selected from the group consisting of alkyl acrylate esters, alkyl methacrylate esters, N-alkyl acrylamides, N-alkyl methacrylamides and vinyl esters, and (3) a polymerizable vinyl monomer containing a basic group or salt thereof selected from the group consisting of ##STR1## where X is --O-- or ##STR2## A.sup.- is an inorganic anion,R" is a divalent saturated organic group containing one to six carbon atoms, andR'" is hydrogen or an alkyl group containing one to six carbon atoms.Type: GrantFiled: February 1, 1988Date of Patent: August 15, 1989Assignee: The Standard Oil CompanyInventor: Lawrence E. Ball
-
Patent number: 4795692Abstract: Radiation-sensitive interpolymers comprising 10-90 mole % of a polymerized maleimide monomer are useful as resists having high sensitivity to E-beams or X-rays.Type: GrantFiled: February 2, 1987Date of Patent: January 3, 1989Assignee: Eastman Kodak CompanyInventors: Charles C. Anderson, Kristine M. Kolterman, Sam R. Turner
-
Patent number: 4791183Abstract: Disclosed herein is a new monomer as represented by the following formula (1): ##STR1## wherein R.sub.1 is hydrogen or a C.sub.1-10 hydrocarbon group, particularly a hydrogen atom, a methyl group or an ethyl group; and X.sub.1 and X.sub.2 are halogen atoms, particularly bromine atoms.This new monomer is produced by reacting divinylbenzene or a substituted product thereof with a halogenating agent in which halogen molecules are inactivated, or halogen molecule under specific reaction conditions.Also disclosed herein is a linear or crosslinked polymer produced from the monomer, as well as method of producing such polymers. The polymers are very useful in the preparation of functional polymers such as those having a chelating ability.Type: GrantFiled: October 30, 1986Date of Patent: December 13, 1988Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventor: Takafumi Yamamizu
-
Patent number: 4774316Abstract: The polyfunctional vinylbenzyl ethers of polyhydric halogenated phenolic compounds are prepared and can be copolymerized with polycyanate ester compounds to provide copolymers having dielectric constants below 3 and a V-O rating in a UL-94 test.Type: GrantFiled: August 15, 1986Date of Patent: September 27, 1988Assignee: The Dow Chemical CompanyInventors: James P. Godschalx, Edmund P. Woo, Patricia A. Schrader, Peter D. Aldrich
-
Patent number: 4769404Abstract: A method of lyophilizing reagent-coated latex particles which results in a product easily reconstituted without agglutination, retains activity, and remains stable and active at storage at 4.degree. C.Type: GrantFiled: June 11, 1987Date of Patent: September 6, 1988Assignee: Technicon Instruments CorporationInventors: Anthony M. Spadaro, Thomas J. McLoughlin, Phillip V. Engler
-
Patent number: 4758644Abstract: A bromostyrene composition having overcome the unstability of bromostyrenes and being stable at the time of its storage and transportation is provided, which composition comprises 100 parts by weight of a styrene substituted with one, two or three bromine atoms on the benzene nucleus thereof or a mixture of the foregoing, 20 to 3,000 parts by weight of an aromatic vinyl compound such as styrene and 0.001 to 0.05 part by weight of a polymerization inhibitor.Type: GrantFiled: December 18, 1986Date of Patent: July 19, 1988Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Mune Iwamoto, Norifumi Ito, Kazuo Sugazaki, Tetsuyuki Matsubara, Toshihiko Ando
-
Patent number: 4757129Abstract: (Allylic carbonate)-functional compounds containing three phenylene groups are useful for forming polymers.Type: GrantFiled: August 25, 1986Date of Patent: July 12, 1988Assignee: PPG Industries, Inc.Inventor: Stephanie J. Oates
-
Patent number: 4755573Abstract: Flame retardant poly(alkenyl aromatic) oligomers and lower molecular weight polymers having bromine substituents on the aromatic nucleus are prepared by cationic polymerization from the corresponding brominated monomers, for example, bromostyrene, in an organic solvent, using a Lewis acid catalyst and an aromatic chain transfer agent. The lower molecular weights enable greater tolerance with other thermoplastic polymers, and as a result compatible flame retardant blends with good ductile impact properties are possible.Type: GrantFiled: November 15, 1985Date of Patent: July 5, 1988Assignee: General Electric CompanyInventor: David F. Aycock
-
Patent number: 4737559Abstract: A pressure-sensitive adhesive is provided which is a copolymer of an acrylate monomer which contributes to the visco-elastic properties of the copolymer and a copolymerizable mono-ethylenically unsaturated aromatic ketone comonomer free of ortho-aromatic hydroxyl groups by means of which the copolymer can be crosslinked upon exposure to ultraviolet radiation such that the amount of crosslinking comonomer and the degree of polymerization of the copolymer are controlled to obtain a creep compliance value of at least about 1.2.times.10.sup.-5 cm.sup.2 /dyne, the adhesive exhibits an enhanced level of initial adhesion when applied to skin but resists objectionable adhesion build-up over time. A preferred crosslinking ethylenically unsaturated hydroxyl-free aromatic ketone comonomer is p-acryloxybenzophenone.Type: GrantFiled: May 19, 1986Date of Patent: April 12, 1988Assignee: Minnesota Mining and Manufacturing Co.Inventors: James N. Kellen, Charles W. Taylor
-
Patent number: 4728708Abstract: Thermoset polymers of styrene terminated tetrakis phenols may be prepared from resins which possess the generic formula ##STR1## in which R is selected from the group consisting of alkyl, cycloalkyl, alkaryl and substituted alkaryl radicals and X is independently selected from the group consisting of hydrogen and halogen atoms. These polymers will be utilized as a component in laminates on circuit boards which are employed in relatively complicated pieces of electronic equipment.Type: GrantFiled: December 29, 1986Date of Patent: March 1, 1988Assignee: Allied CorporationInventors: Joseph J. Zupancic, Andrew M. Zweig, James A. Wrezel
-
Patent number: 4705836Abstract: Composites comprising(A) general formula (I), compound of ##STR1## [in the formula, R.sub.1 indicates either hydrogen or methyl group and R.sub.2 indicates hydrogen, alkyl radical with carbon number 1-5 to be possibly substituted with halogen, alkyleneoxide group with carbon number 2-4 to be possibly substituted with halogen or --(CH.sub.2 CH.sub.2 O)nH group (n=integral number of 1-4) to be possibly substituted with either halogen or methyl group],(B) vinyl compounds and/or silane compounds, and optionally(C) free radical developing agent and/or light sensitizer have not only an excellent adhesiveness but anti-irritation and anti-harmfulness against tissue, pulp and the like, for teeth and dentin.Type: GrantFiled: November 1, 1985Date of Patent: November 10, 1987Assignee: Nippon Shiken Dental Co., Ltd.Inventors: Masasuke Ohtsuka, Yoshinori Harada, Shigeo Tokita, Hideyo Maniwa
-
Patent number: 4678850Abstract: Poly(halogenated styrene) compositions having a molecular weight range of from about 1.times.10.sup.5 to 1.times.10.sup.6 and a dispersivity of from about 1.5 to about 2.5 useful as negative resists.Type: GrantFiled: October 19, 1984Date of Patent: July 7, 1987Assignee: International Business Machines Corp.Inventors: Michael Hatzakis, John J. Liutkus, Jurij R. Paraszcszak, Jane M. Shaw
-
Patent number: 4647639Abstract: A monomeric mixture for a cured polymeric material used as organic glass includes an aromatic di(meth)allyl carbonate (I), an aliphatic di(meth)allyl carbonate (II) and di(meth)allyl carbonate (III) having aromatic and aliphatic moieties. The amount of the di(meth)allyl carbonate of formula (III) is 0.1 to 10 parts by weight per 10 parts by weight of the aliphatic di(meth)allyl carbonate of formula (II). The monomeric mixture retains its uniform state without phase separation during long-term storage and gives a cured polymeric material having excellent transparency.Type: GrantFiled: January 3, 1986Date of Patent: March 3, 1987Assignee: Tokuyama Soda Kabushiki KaishaInventors: Yasuji Kida, Kaoru Miura, Ikumi Kawaguchi
-
Patent number: 4625005Abstract: A multi-component copolymer rubber consisting essentially of (A) 20 to 69.5% by weight of a cyano-substituted alkyl (meth)acrylate, (B) 30 to 79.5% by weight of an alkyl acrylate, (C) 0.5 to 10% by weight of a crosslinkable monomer and (D) 0 to 10% by weight of other ethylenically unsaturated monomer copolymerizable with (A), (B) and (C), excels in heat resistance, ozone resistance, sour gasoline resistance and sour gasohol resistance. These properties of said multi-component copolymer rubber can further be improved by incorporating into the copolymer rubber a crosslinking agent, a metal salt, a vinylidene fluoride polymer, a vinyl chloride resin or other multi-component copolymer rubber.Type: GrantFiled: March 26, 1985Date of Patent: November 25, 1986Assignee: Japan Synthetic Rubber Co., Ltd.Inventors: Toshio Miyabayashi, Nobuyuki Sakabe, Yoshiyuki Udagawa, Hiroji Enyo, Yasuhiko Takemura
-
Patent number: 4623609Abstract: An ionizing radiation sensitive resist consisting essentially of a polymer having a recurring unit represented by the following formula: ##STR1## wherein X is a hydrogen atom, a methyl group, or a halogen atom and R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5, which may be identical or different, are hydrogen atoms, halogen atoms, alkyl groups having 1 to 3 carbon atoms, alkoxy groups having 1 to 3 carbon atoms, haloalkyl groups having 1 to 3 carbon atoms or haloalkoxy groups having 1 to 3 carbon atoms, at least a part of the X groups present in said polymer being a halogen atom, at least a part of the Y.sup.1 and Y.sup.2 group present in said polymer being a halogen atom, and at least a part of the R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 groups present in said polymer being a haloalkyl or haloalkoxy group having 1 to 3 carbon atoms. Said ionizing radiation sensitive resist is suitable as a negative type resist.Type: GrantFiled: May 20, 1985Date of Patent: November 18, 1986Assignee: Japan Synthetic Rubber Co., Ltd.Inventors: Yoshiyuki Harita, Yoichi Kamoshida, Masashige Takatori, Kunihiro Harada
-
Patent number: 4614703Abstract: A novel class of copolymeric negative photoresists is provided whose sensitivity is based upon the presence of .alpha.-chloro ketone moieties. The general structure for the monomers from which the copolymers can be formed is: ##STR1## where R is a substituent selected from 1 to 6 carbon alkyl and halogen substitutes alkyl, phenyl, and halogen substituted phenyl and napthyl and the comonomers are comonomers selected from the group consisting of 1-4 carbon alkyl acrylates and methacrylates, styrene vinyl toluene and vinyl acetate and may include additionally other comonomers that are compatible and have the polymerizable >C.dbd.C< group. The copolymers form crosslinked networks and provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm.Type: GrantFiled: October 31, 1984Date of Patent: September 30, 1986Assignee: Allied CorporationInventor: James E. Guillet
-
Patent number: 4602075Abstract: A monomeric mixture for a cured polymeric material used as organic glass includes an aromatic di(meth)allyl carbonate (I), an aliphatic di(meth)allyl carbonate (II) and di(meth)allyl carbonate (III) having aromatic and aliphatic moieties. The amount of the di(meth)allyl carbonate of formula (III) is 0.1 to 10 parts by weight per 10 parts by weight of the aliphatic di(meth)allyl carbonate of formula (II). The monomeric mixture retains its uniform state without phase separation during long-term storage and gives a cured polymeric material having excellent transparency.Type: GrantFiled: November 13, 1984Date of Patent: July 22, 1986Assignee: Tokuyama Soda Kabushiki KaishaInventors: Yasuji Kida, Kaoru Miura, Ikumi Kawaguchi
-
Patent number: 4600760Abstract: Thermosettable compositions comprising an alkenyl phenyl cyanate and at least one of an aromatic polycyanate, a polymaleimide or a polymerizable ethylenically unsaturated aromatic monomer are disclosed.Type: GrantFiled: April 11, 1985Date of Patent: July 15, 1986Assignee: The Dow Chemical CompanyInventor: Robert E. Hefner, Jr.
-
Patent number: 4596756Abstract: A photographic element having at least one layer containing a copolymer mordant having the repeating unit represented by the following general formula (I) ##STR1## wherein A represents a monomer unit (copolymer component) derived from a copolymerizable monomer having at least two ethylenically unsaturated groups; B represents a monomer unit (copolymer unit) derived from a copolymerizable ethylenically unsaturated monomer represented by the following general formula (II) ##STR2## wherein R.sub.5 represents a hydrogen atom or an alkyl group; L represents an alkylene group or an arylene group; and m is 0 or 1; D represents a monomer unit (copolymer component) derived from a copolymerizable ethylenically unsaturated monomer other than the monomer units shown by A and B and the monomer unit having component ratio z; R.sub.1 represents a hydrogen atom or a lower alkyl group; R.sub.2, R.sub.3 and R.sub.4, which may be the same or different, each represents an alkyl group or an aralkyl group, and at least two of R.Type: GrantFiled: May 29, 1984Date of Patent: June 24, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Junichi Yamanouchi, Yukio Sudo
-
Patent number: 4594309Abstract: Photoresist materials that are sensitive in suitable range including the 200 nm to 300 nm ultraviolet radiation range are provided which permit relatively higher resolution and thus a higher information density in microcircuits. The positive photoresist materials are copolymers of(a) monomers selected from those of 1,4-disubstituted-2-butene-1,4-diones of the general structures of ##STR1## wherein R.sub.1, R.sub.2 are the same or different and are substituent selected from the group of 1 to 6 carbon atom alkyl and halogen substitutes alkyl radicals methoxy and ethoxy radicals, aryl, halogen substituted aryl, alkyl substituted aryl, alkoxy substituted aryl, nitro substituted aryl, cyano substituted aryl and amino substituted aryl radicals, and benzyl, naphthyl and anthryl radicals with(b) at least one vinylidene monomer of the general formula ##STR2## where R.sub.3 represents hydrogen, halogen or an alkyl group, and R.sub.Type: GrantFiled: October 31, 1984Date of Patent: June 10, 1986Assignee: Allied CorporationInventor: James E. Guillet
-
Patent number: 4593080Abstract: According to the present invention, an improved method for providing acrylic copolymer resins is provided in which the polymerization solvent comprises a blend of methyl isobutyl ketone and certain alkyl-substituted benzene solvents. The monomers comprise hydroxy-substituted alkyl (meth)acrylate monomers and non-hydroxy substituted alkyl (meth)acrylate monomers, and the process provides an improved method for forming low molecular weight acrylic resins useful as components in acrylic coatings. The polymerization solvent can remain in the resin to become a solvent employed in the higher solids coating containing the thus-formed acrylic resins and provides improved electrical resistivity, improved solvency and decreased surface tensions over prior art polymerization solvents.Type: GrantFiled: October 24, 1984Date of Patent: June 3, 1986Assignee: Exxon Research & Engineering Co.Inventors: Constantine J. Bouboulis, Irving Kuntz
-
Patent number: 4581425Abstract: Thermosettable compositions comprising an alkenyl phenyl cyanate and at least one of an aromatic polycyanate, a polymaleimide or a polymerizable ethylenically unsaturated aromatic monomer are disclosed.Type: GrantFiled: April 11, 1985Date of Patent: April 8, 1986Assignee: The Dow Chemical CompanyInventor: Robert E. Hefner, Jr.
-
Patent number: 4571418Abstract: The char residue formation of molded compositions, upon combustion, is improved by incorporating into the moldable composition a char-forming polymer containing recurring units of at least one monomer capable of undergoing tautomerization, at least one monomer capable of undergoing a nucleophilic substitution reaction by said monomer capable of undergoing tautomerization and, optionally, at least one additional copolymerizable monomer.Type: GrantFiled: March 12, 1984Date of Patent: February 18, 1986Assignee: Atlantic Richfield CompanyInventor: Usama E. Younes
-
Patent number: 4544723Abstract: Polymers having excellent adherence to film supports such as cellulose acetate are disclosed. The polymers comprise random recurring units having the structure--A).sub.w, --B).sub.x, --C).sub.y and --D).sub.zwherein;A represents polymerized vinyl acetate;B represents a polymerized acrylate or methacrylate monomer capable of copolymerization with vinyl acetate;C represents a polymerized monomer selected from the group consisting of methacrylic acid, itaconic acid and vinylbenzoic acid;D represents a polymerized cationically charged copolymerizable monomer;w represents from 20 to 85 weight percent;x represents from 5 to 65 weight percent;y represents from 5 to 50 weight percent and;z represents from 2 to 10 weight percent.Type: GrantFiled: October 31, 1983Date of Patent: October 1, 1985Assignee: Eastman Kodak CompanyInventors: Donald A. Upson, David J. Steklenski
-
Patent number: 4523000Abstract: Solvent-soluble copolymers having a number average molecular weight of about 1,000 to about 1,000,000 and comprising recurring units of the following formulae (I) and (II) (case A) or recurring unit of the following formulae (I), (II) and (III) (case B) or solvent-soluble graft copolymers having a number average molecular weight of about 1,500 to about 2,000,000 and comprising recurring units of the following formulae (I), (II) and/or (II'), and (IV) (case C) or recurring units of the following formulae (I), (II) and/or (II'), (III) and (IV) (case D), said recurring units being ##STR1## wherein each of R.sub.1, R.sub.2 and R.sub.3 represents independently hydrogen, a straight or branched chain alkyl group having 1 to 4 carbon atoms or a halogen; R.sub.4 represents hydrogen or a straight or branched chain alkyl group having 1 to 10 carbon atoms; R.sub.5 represents an alkyl group having 1 to 6 carbon atoms, a phenyl group or a benzyl group; R.sub.6 represents hydrogen or a methyl group; R.sub.Type: GrantFiled: October 28, 1983Date of Patent: June 11, 1985Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Koichi Hatada, Yoshio Okamoto, Tatsuki Kitayama
-
Patent number: 4501868Abstract: According to the present invention, an improved method for providing acrylic copolymer resins is provided in which the polymerization solvent comprises a blend of methyl isobutyl ketone and certain alkyl-substituted benzene solvents. The monomers comprise hydroxy-substituted alkyl (meth)acrylate monomers and non-hydroxy substituted alkyl (meth)acrylate monomers, and the process provides an improved method for forming low molecular weight acrylic resins useful as components in acrylic coatings. The polymerization solvent can remain in the resin to become a solvent employed in the higher solids coating containing the thus-formed acrylic resins and provides improved electrical resistivity, improved solvency and decreased surface tensions over prior art polymerization solvents.Type: GrantFiled: June 28, 1982Date of Patent: February 26, 1985Assignee: Exxon Research & Engineering Co.Inventors: Constantine J. Bouboulis, Irving Kuntz
-
Patent number: 4483962Abstract: Terpolymer latexes prepared by emulsion polymerization of 2,3-dichloro-1,3-butadiene and a mixture of at least two different unsaturated monomers, said unsaturated monomers being at least individually copolymerizable with 2,3-dichloro-1,3-butadiene, provide adhesive systems which afford adhesive strengths comparable to commercial solvent-based adhesives in bonding natural and synthetic elastomers to rigid and non-rigid substrates. The latexes preferably contain at least one aromatic nitroso compound.Type: GrantFiled: July 22, 1983Date of Patent: November 20, 1984Assignee: Lord CorporationInventor: John S. Sadowski
-
Patent number: 4482680Abstract: Polymeric quaternary ammonium compounds having recurring vinylbenzyl ammonium units are disclosed. The quaternary ammonium units preferably have 2 alkyl substituents of 1 to 4 carbons and 1 alkyl substituent of 4 to 12 carbons. These materials have antimicrobial properties and are particularly useful for preserving ophthalmic solutions.Type: GrantFiled: April 13, 1983Date of Patent: November 13, 1984Assignee: DynapolInventors: Bernard G. Sheldon, Robert E. Wingard, Jr., Ned M. Weinshenker, Daniel J. Dawson
-
Patent number: 4423198Abstract: The preparation of synthetic rubbers characterized by high green strength and tack in which a polymerizable unsaturated tertiary amine and a polymerizable cross linking agent in the form of an organic compound containing active halogen groups are copolymerized with the rubber forming monomers.Type: GrantFiled: September 24, 1982Date of Patent: December 27, 1983Assignee: Copolymer Rubber & Chemical CorporationInventor: Tom Tsai
-
Patent number: 4419506Abstract: A radiation sensitive polymer material having (a) one or more repeating units of the formula: ##STR1## wherein R is an alkyl group, a halogen atom, a hydrogen atom or a dimethylamino group, and (b) an addition polymerizable repeating unit derived from a compound having a CH.sub.2 .dbd.C< group in the molecule, can give a positive type resist having excellent resistance to dry etching and being highly sensitive to radiation.Type: GrantFiled: March 18, 1982Date of Patent: December 6, 1983Assignee: Hitachi, Ltd.Inventors: Kazuo Nate, Toshio Kobayashi, Tokio Isogai
-
Patent number: 4412051Abstract: Fire-resistant copolymers of bromostyrene and another monomer, preferably acrylonitrile, are made by emulsion polymerization to produce copolymers having 95 to 25 weight percent bromostyrene, the balance being the second monomer. The resulting copolymers have a high bromine content in the range 20 to 44 weight percent and may be used as such as a flame-resistant plastics material or admixed with other plastics such as the polyolefins to impart fire-resistance to the mixture. The copolymers produced exhibit good mechanical properties and fire-resistance values.Type: GrantFiled: July 21, 1981Date of Patent: October 25, 1983Assignee: Stamicarbon B.V.Inventors: Hendrikus C. J. de Man, Petrus T. J. L. Smids
-
Patent number: 4394484Abstract: Polypentabromostyrene with a bromine content of 76% to 80%, which is plastic at a temperature of 280.degree. C. and is thermally decomposed at a temperature of about 400.degree. C., can be produced by reacting pentabromophenylethyl bromide with an alkali metal hydroxide or carbonate in an alcoholic solvent and subsequently by catalytically initiating polymerization. The polypentabromostyrene is useful as a flame retardant for thermoplastic synthetic resins.Type: GrantFiled: July 7, 1981Date of Patent: July 19, 1983Assignee: Chemische Fabrik Kalk GmbHInventors: Herbert Jenkner, Robert Strang, Peter Adermann
-
Patent number: 4387204Abstract: The invention relates to a polymerizable and self-crosslinkable composition of monomers having olefinic unsaturation and, if desired, conventional additives, said composition containing(a) 1 to 99.9% by weight of at least one ethylene or propylene monomer which is substituted by polar groups or aromatic hydrocarbon groups, and(b) 99 to 0.1% by weight of an acrylate or methacrylate of monohydric or dihydric, mononuclear or binuclear phenols which are substituted by allyl, methallyl or 1-propenyl groups, or hydroxyalkyl ethers thereof. The composition of the invention can be used as a casting or impregnating resin, adhesive, lacquer and binder, and it can be cured by irradiation and/or heat.Type: GrantFiled: March 30, 1981Date of Patent: June 7, 1983Assignee: Ciba-Geigy CorporationInventors: Abdul-Cader Zahir, Sameer H. Eldin
-
Patent number: 4384095Abstract: Linear addition polymer beads having repeating units of vinylbenzyl alcohol and at least one other structure different from vinylbenzyl alcohol, wherein the vinylbenzyl alcohol units comprise at least 0.5% by weight of the linear polymer, and thermally crosslinked derivatives thereof. The beads are thermally crosslinked by heating during formation thereof or thereafter in the presence of a free radical initiator, such that alpha-hydroxy benzylic methylene or benzyloxy crosslinks are formed between aromatic rings of the vinylbenzyl alcohol units, and between the vinylbenzyl alcohol units and other active sites in the polymer. The linear addition polymers may be formed directly from vinylbenzyl alcohol monomer and at least one other monomer, or indirectly by hydrolysis of vinylbenzyl chloride during linear polymer formation therefrom. The crosslinked products are useful as adsorbents, hydrogels and as intermediates in the preparation of other adsorbents, ion exchange resins, catalysts and slow release agents.Type: GrantFiled: January 28, 1980Date of Patent: May 17, 1983Assignee: Rohm and Haas CompanyInventors: Samuel F. Reed, David L. Hundermark
-
Patent number: 4361684Abstract: In the emulsion polymerization of an .alpha.-alkylstyrene and an unsaturated nitrile copolymerizable therewith in a weight proportion of 70:30 to 80:20 in the presence of a radical initiator, an improved process wherein the monomers are introduced into the reaction system in such a manner that the concentration of the unreacted unsaturated nitrile in the reaction system is not less than 31% by weight to the entire amount of the unreacted monomers in the reaction system at the completion of the introduction of the monomers, whereby a copolymer of the .alpha.-alkylstyrene and the unsaturated nitrile having an excellent thermal resistance is produced with marked decrease in the amount of unreacted monomers.Type: GrantFiled: June 5, 1981Date of Patent: November 30, 1982Assignee: Sumitomo Naugatuck Co., Ltd.Inventors: Hiroyuki Minematsu, Kojiro Matsumoto, Tadashi Saeki, Akira Kishi
-
Patent number: 4349651Abstract: A water soluble addition copolymer is formed by reaction admixing a monomer having a pendant vinyl group attached to at least one ring structure selected from the group consisting of nitrogen containing heterocyclic ring structures and aromatic ring structures and their mixtures, and a monomer selected from the group consisting of maleic anhydride, fumaronitrile, tetracyanoethylene, maleimide and their mixtures, where such addition copolymer can be used alone, as curable an insulating coating composition, or can be added to a resin, to form a curable resinous insulating coating composition.Type: GrantFiled: August 1, 1980Date of Patent: September 14, 1982Assignee: Westinghouse Electric Corp.Inventor: James D. B. Smith
-
Patent number: 4333969Abstract: Styrenic polymer beads of a preferred size are produced from styrenic polymer beads of a smaller size by forming an aqueous suspension of the styrenic polymer beads and adding thereto, under polymerization conditions, an aqueous emulsion formed by admixing styrenic monomer and a catalyst therefor with water containing a nonionic surfactant that is an ethylene oxide condensate of an alkylphenol, which contains at least fifty moles of ethylene oxide per mole of alkylphenol. The beads of preferred size are formed without formation of fine styrenic polymer particles and without significant amounts of clusters of beads.Type: GrantFiled: December 23, 1980Date of Patent: June 8, 1982Assignee: Atlantic Richfield CompanyInventors: Harold A. Wright, Alvin R. Ingram
-
Patent number: 4333970Abstract: Coated beads which exhibit anti-lumping properties upon pre-expansion and which are useful in the formation of soft expanded articles are prepared by coating initial polystyrene beads, in suspension, with a coating composition comprising styrene and a macromonomer of styrene and isoprene or styrene and butadiene, the coating compositions added to the suspension as an aqueous emulsion containing a catalyst and a polyoxyethylene ether of nonylphenol or octylphenol as surfactant.Type: GrantFiled: December 23, 1980Date of Patent: June 8, 1982Assignee: Atlantic Richfield CompanyInventors: Elizabeth A. Blommers, David R. Warfel, Alvin R. Ingram
-
Patent number: 4327201Abstract: The method and production of macromolecular monomers from cationically polymerizable monomers and vinyl-substituted hydrocarbon halides is disclosed. These cationically polymerizable monomers may react in the presence of a catalyst with the hydrocarbon halide to produce a macromer retaining a polymerizable headgroup. This compound may be used in a variety of copolymerization processes with a variety of copolymerizable monomers to form graft copolymers.Type: GrantFiled: October 22, 1980Date of Patent: April 27, 1982Assignee: The University of AkronInventors: Joseph P. Kennedy, Kurt C. Frisch, Jr.
-
Patent number: 4319015Abstract: New Synthetic resins useful as inert material for separating layers in ion exchanger mixed bed filters. The new synthetic resins are copolymers of(a) substituted styrenes and/or methacrylates,(b) methacrylates of polyhydric alcohols and/or aromatic polyvinyl compounds and(c) unsaturated hydrocarbons which have at least two allyl groupings in the molecule, and/or polyvinyl ethers of polyhydric alcohols, and optionally(d) styrene.Type: GrantFiled: October 4, 1979Date of Patent: March 9, 1982Assignee: Bayer AktiengesellschaftInventors: Werner Struver, Harold Heller, Peter M. Lange
-
Patent number: 4311799Abstract: A basic copolymer whose main chain is cross-linked which comprises about 6 to about 98% by weight of recurring units of Formula (A) or (B), ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3, which may be the same or different, each represents a hydrogen atom or a hydrocarbon group selected from the group consisting of C.sub.1-20 alkyl groups, C.sub.3-10 cycloalkyl groups, C.sub.3-8 alkenyl groups, C.sub.6-15 aryl groups, C.sub.7-12 arylalkyl groups and C.sub.1-15 aminoalkyl groups; and X is an acid radical, and about 2 to about 94% by weight of cross-linked units based on the total weight of the recurring units of Formula (A) or (B) and the cross-linked units and, if desired, up to about 92% by weight of units of a monoethylenically unsaturated monomer or a conjugated monomer based on the total weight of the recurring units of Formula (A) or (B), the cross-linked units and the units of the monoethylenically unsaturated monomer or the conjugated monomer.Type: GrantFiled: July 2, 1979Date of Patent: January 19, 1982Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Tetsuya Miyake, Kunihiko Takeda, Akihiko Ikeda
-
Patent number: 4306780Abstract: The present invention relates to a copolymer for high refractive lens having a refractive index equal to or higher than 1.55, obtained by copolymerization of one or more of the first monomer component having the formula (I) ##STR1## wherein R.sub.1 signifies hydrogen atom or methyl radical, R.sub.2 signifies hydrogen atom or methyl radical, and m and n signify integers 0 to 4 in total, with one or more of the radically polymerizable second monomer component, homo-polymer of which has a refractive index equal to or higher than 1.55 and, if necessary, with the radically polymerizable third monomer component, the homo-polymer of which has a refractive index lower than 1.55 and to the lens prepared from said copolymer.Type: GrantFiled: July 13, 1979Date of Patent: December 22, 1981Assignee: Hoya Lens CorporationInventors: Niro Tarumi, Makoto Tsuchiya, Shigeo Komiya, Eiichi Masuhara
-
Patent number: 4304894Abstract: Watersoluble terpolymers based on three monomer units all of formula: ##STR1## (or possibly the 5-membered ring analogue) wherein the N-substituents are respectively (A) low-low e.g. dimethyl (B) low-medium e.g. methyloctyl and (C) low-higher e.g. methyllauryl or methylcetyl, in molecular size; B:C being usually 5:1 to 0.333:1 (perferably 2:1 to 1:1) in weight ratio, and species less than 10,000 or preferably 20,000 m.w. usually being removed, have surprisingly effective sterilizing activity e.g. against Candida while (a) not accumulating in soft contact lenses, whereby they can be used as an overnight nonirritant aqueous sterilant solution at concentrations below 0.1 weight percent e.g. 0.05 or less and (b) not penetrating skin or like membrane whereby aqueous formulations can be used as topical disinfectants without systemic side-effects.Type: GrantFiled: April 26, 1979Date of Patent: December 8, 1981Assignee: Smith & Nephew Pharmaceuticals Ltd.Inventors: John K. Andrews, John G. B. Howes, Rupert A. Selway
-
Patent number: 4268642Abstract: The terpolymers disclosed herein comprise 60-87 percent by weight butadiene, 10-30 percent styrene and 3-15 percent vinyl benzyl chloride in the polymer molecules. These are prepared by emulsion polymerization using a free radical generating initiator system. These terpolymers have excellent green strength and are useful in tire compositions.Type: GrantFiled: March 24, 1980Date of Patent: May 19, 1981Assignee: The Firestone Tire & Rubber CompanyInventors: Binnur Gunesin, Adel F. Halasa
-
Patent number: 4262081Abstract: Radiation sensitive negative resists with requisite stability for dry processing of integrated circuits are polymerized from aromatic moieties containing halogen atoms. Halogen-aryl bridging, generally carbonaceous, increases sensitivity to radiation. Exemplary materials, copolymers prepared from aromatic and glycidyl methacrylate (GMA) comonomers, are suitable for direct processing of large-scale integrated circuits. While electron beam patterning is contemplated both for direct processing and mask making, radiation such as X-ray and deep u.v. may be used.Type: GrantFiled: November 21, 1979Date of Patent: April 14, 1981Assignee: Bell Telephone Laboratories, IncorporatedInventors: Murrae J. S. Bowden, Eugene D. Feit, Larry F. Thompson, Cletus W. Wilkins, Jr.
-
Patent number: 4254247Abstract: An initiator for the anionic polymerization of vinyl monomers and dienic monomers comprises the product from the association of an alkali metal amide and the salt from at least one hydroxylated compound with the same alkali metal in an aprotic solvent. The hydroxylated compound is a primary, secondary, or tertiary alcohol. The hydroxylated compound may be a member selected from the group consisting of an alcohol substituted by an heterocyclic group, alcohols containing ethylenic unsaturation, alcohols substituted by an aromatic group, alicyclic alcohols, aromatic alcohols, polyhydroxy compounds, ether-alcohols, polyether-alcohols, and enols from ketones and amino acids.Type: GrantFiled: May 24, 1977Date of Patent: March 3, 1981Assignee: Societe Nationale des Poudres et ExplosifsInventors: Sylvie L. Boileau, Paul J. Caubere, Serge L. Lecolier, Serge F. Raynal
-
Patent number: 4243787Abstract: The invention relates to a process for the anionic polymerization and copolymerization of vinyl, dienic and heterocyclic monomers.According to the invention, the process consists in carrying out the reaction in the presence of an initiator consisting of a molecular combination of an alkali metal amide and the salt of the same alkali metal with at least one hydroxylic compound and in the absence of solvent. The initiator can be prepared by intimately mixing its constituents or in the presence of a solvent of low polarity which is subsequently evaporated off, or in situ in the monomer.Application to the synthesis of special or widely used polymers and copolymers.Type: GrantFiled: November 6, 1978Date of Patent: January 6, 1981Assignee: Societe Nationale des Poudres et ExplosifsInventors: Sylvie L. Boileau, Paul J. Caubere, Gilberte Ndebeka, Serge L. Lecolier, Serge F. Raynal
-
Patent number: 4243790Abstract: A novel contact lens having improved gas permeability is disclosed which is formed from copolymerizing a mixture comprising:(a) a group 1 monomer which is a styrene or substituted styrene monomer, and(b) a group 2 monomer which is a monomer of the general formula:(i) ##STR1## wherein R is hydrogen or methyl and R' is an alkyl, or a monomer of the general formula:(ii) ##STR2## wherein n is 0 or 1, R is hydrogen or methyl, and R" is hydrogen when n is 0 and hydrogen or hydroxyl when n is 1.Type: GrantFiled: June 30, 1978Date of Patent: January 6, 1981Inventor: William M. Foley, Jr.
-
Patent number: 4237257Abstract: Styrene-type monomers are polymerized, or mixtures of styrene-type monomers and other vinyl type monomers and copolymerized, at 50.degree.-120.degree. C. using 1-10 wt%, based on the weight of the monomers, of an organic peroxide polymerization initiator whose decomposition temperature at 10 hours of halflife is 40.degree. C. to 70.degree. C. whereby colorless low molecular weight styrene series polymers are obtained at a high yield, using polymerization apparatus of simple structure.Type: GrantFiled: July 7, 1978Date of Patent: December 2, 1980Assignee: Nippon Oil and Fats Co.Inventors: Yasuo Moriya, Takeshi Komai