From Cycloaliphatic Monomer Patents (Class 526/308)
  • Patent number: 7501222
    Abstract: A polymer including a monomer represented by the following Formula and a photoresist composition including the same are disclosed. The polymer and photoresist composition can improve the resolution and the process margin due to the low activation energy of the deprotection reaction of the alcohol ester group including saturated cyclic hydrocarbyl group, and also can produce fine photoresist patterns because they have a stable PEB(Post Exposure Baking) temperature sensitivity, and further, can improve the focus depth margin and the line edge roughness of the resist layer. In the above Formula, R* is a hydrogen or methyl group, R1 is saturated hydrocarbyl group of 1 to 5 carbon atoms, R is mono-cyclic or multi-cyclic homo or hetero saturated hydrocarbyl group of 3 to 50 carbon atoms, and n is an integer of at least 2.
    Type: Grant
    Filed: June 21, 2006
    Date of Patent: March 10, 2009
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Jung-Youl Lee, Jae-Woo Lee, Jae-Hyun Kim
  • Publication number: 20090061117
    Abstract: It is an object of the present invention to provide a sealant for a One prop Fill process which hardly causes a peeling phenomenon between the sealant and a substrate in production of liquid crystal display device since the sealant has excellent adhesion to the substrate, and which is most suitable for producing a liquid crystal display device having low color irregularity in liquid crystal display since the sealant does not cause liquid crystal contamination, and relates to a sealant for a One prop Fill process, in which in production of liquid crystal display device by a One prop Fill process, even a portion where light may be not directly irradiated can be adequately cured, a liquid crystal is not deteriorated by ultraviolet light to be irradiated in curing the sealant, and high display quality and high reliability of the liquid crystal display device can be realized, a vertically conducting material, and a liquid crystal display device obtained by using these.
    Type: Application
    Filed: May 8, 2006
    Publication date: March 5, 2009
    Inventors: Yuichi Oyama, Hideyasu Nakajima, Takashi Watanabe, Takuya Yamamoto, Mitsuru Tanikawa
  • Publication number: 20090035546
    Abstract: The present invention relates to polyethylene films, and to processes for making films. In particular the invention relates to solid state stretched films that may be monoaxially or biaxially oriented. The processes can tolerate high draw ratios and lower extrusion pressures and amperes while producing films having high tensile strength and modulus as well as low shrinkage. The polyethylene used to make the films has a density of from 0.940 to less than 0.960, a molecular weight distribution of greater than 10, a melt flow index ranging from 0.30 dg.min to 1.00 dg/min and a weight average molecular weight of 300,000 or less.
    Type: Application
    Filed: July 30, 2007
    Publication date: February 5, 2009
    Applicant: FINA TECHNOLOGY, INC.
    Inventor: Michael McLeod
  • Publication number: 20080299503
    Abstract: The formation of high-resolution resist patterns by liquid immersion lithography with various fluids is enabled by protecting a resist film from deterioration (such as bridging) during the immersion exposure in a fluid (such as water) and the fluid from deterioration and improving the stability of a resist film in the storage after exposure without increase in the number of treatment steps. A material for forming resist protection films which comprises an alkali-soluble polymer for forming a protective overcoat for a resist film, characterized in that the contact angle of the polymer to water is 90° or above. The polymer is preferably an acrylic polymer which comprises as the essential components constituent units derived from (meth) acrylic acid and constituent units derived from a specific acrylic ester.
    Type: Application
    Filed: December 22, 2005
    Publication date: December 4, 2008
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Keita Ishiduka, Kotaro Endo
  • Patent number: 7452950
    Abstract: Photochromic monomers and methods for preparing these photochromic monomers, photochromic polymers based on these photochromic monomers and methods for preparing these photochromic polymers, as well as the use of these photochromic polymers in a polymer binder as a two-photon recording medium for an optical 3D memory and photoswitches of optical signals are disclosed. The materials exhibit thermally irreversible photochromic transformations and other properties enabling the use of the photochromic polymers in an optical two-photon read/write memory.
    Type: Grant
    Filed: September 26, 2005
    Date of Patent: November 18, 2008
    Assignees: Samsung Electronics Co., Ltd., Photochemistry Center of Russian Academy of Sciences
    Inventors: Alexandr Alexandrovich Dunaev, Mikhail Vladimisovich Alfimov, Valery Alexandrovich Barachevsky, Valery Alexandrovidh Vasnev, Igor Victorovich Zavarzin, Sergey Nikolaevich Ivanov, Mukhammed Lastanbievich Keshtov, Ajexel Ivanovich Kovalev, Mikhall Mikhallovich Krayushkin, Yury Alexandrovich Pyankov, Alexandr Lyovich Rusanov, Yury Petrovich Strokach, Vladimir Nikolaevich Yarovenko
  • Patent number: 7439315
    Abstract: A copolymer film having a decreased dielectric constant which is produced by supplying at least two organic monomers as raw materials, forming a film of a copolymer comprising a backbone based on said at least two monomers on a surface of a substrate, and heating the copolymer film at a temperature higher than a temperature at which the copolymer film is formed.
    Type: Grant
    Filed: July 22, 2005
    Date of Patent: October 21, 2008
    Assignee: NEC Corporation
    Inventors: Nobutaka Kunimi, Jun Kawahara, Akinori Nakano, Keizo Kinoshita
  • Publication number: 20080214756
    Abstract: A copolymer containing units represented by the defined formula (1) and cyclic olefin units; and a process for producing the copolymer, which comprises the step of copolymerizing a compound represented by the defined formula (3) with a cyclic olefin, the units represented by the formula (1) being polymerized units of the compound represented by the formula (3) such as isopropylidene diallylmalonate.
    Type: Application
    Filed: February 23, 2008
    Publication date: September 4, 2008
    Applicants: Sumitomo Chemical Company, Limited, Tokyo Institute of Technology
    Inventors: Kohtaro Osakada, Daisuke Takeuchi, Sehoon Park, Makoto Uemura, Masayuki Fujita
  • Publication number: 20080214754
    Abstract: A polymer containing units represented by the defined formula (1); and a process for producing the polymer, which comprises the step of polymerizing a compound represented by the defined formula (3), the units represented by the formula (1) being polymerized units of the compound represented by the formula (3) such as 5,5-diallylbarbituric acid.
    Type: Application
    Filed: December 18, 2007
    Publication date: September 4, 2008
    Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Kohtaro OSAKADA, Daisuke TAKEUCHI, Sehoon PARK, Makoto UEMURA, Masayuki FUJITA
  • Publication number: 20080214755
    Abstract: A copolymer containing units represented by the defined formula (1) and olefin units; and a process for producing the copolymer, which comprises the step of copolymerizing a compound represented by the defined formula (3) with an olefin, the units represented by the formula (1) being polymerized units of the compound represented by the formula (3) such as 5,5-diallyl-2,2-dimethyl-1,3-dioxane.
    Type: Application
    Filed: February 23, 2008
    Publication date: September 4, 2008
    Applicants: Sumitomo Chemical Company, Limited, Tokyo Institute of Technology
    Inventors: Kohtaro Osakada, Daisuke Takeuchi, Sehoon Park, Makoto Uemura
  • Publication number: 20080207862
    Abstract: A thin film formed from at least one polycyclic alicyclic compound selected from among compounds of the following formulas (1), (2) and (3) as a precursor.
    Type: Application
    Filed: February 21, 2008
    Publication date: August 28, 2008
    Applicant: Idemitsu Kosan Co., Ltd.
    Inventors: Hirotoshi Ishii, Tatsuru Shirafuji, Shizuo Fujita, Kunihide Tachibana
  • Patent number: 7393907
    Abstract: The present invention is a polar group-containing olefin copolymer having excellent adhesion properties to metals or polar resins and excellent compatibility therewith. A process for preparing the copolymer, a thermoplastic resin composition containing the copolymer, and uses thereof are also described. The polar group-containing olefin copolymer comprises a constituent unit derived from an ?-olefin of 2 to 20 carbon atoms, and a constituent unit derived from a straight-chain, branched or cyclic polar group-containing monomer having at the end a polar group such as a hydroxyl group or an epoxy group and/or a constituent unit derived from a macromonomer having at the end a polymer segment obtained by anionic polymerization, ring-opening polymerization or polycondensation.
    Type: Grant
    Filed: November 17, 2003
    Date of Patent: July 1, 2008
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Junichi Imuta, Norio Kashiwa, Seiji Ota, Satoru Moriya, Tadahito Nobori, Kazumi Mizutani
  • Patent number: 7385017
    Abstract: This invention relates to a silicone resin composition which exhibits high heat resistance, high transparency and high dimensional stability and thus can be suitably used for optical applications such as a lens, an optical disc, an optical fiber, a substrate for a plat panel display, a window material for an automobile, and the like.
    Type: Grant
    Filed: March 22, 2004
    Date of Patent: June 10, 2008
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Takashi Saito, Masayoshi Isozaki, Hideki Andoh
  • Patent number: 7381782
    Abstract: The present invention provides a polymerizable composition and a resin formed object capable of providing a crosslinked cycloolefin resin formed object and a crosslinked cycloolefin resin composite excellent in heat resistance, more specifically, a polymerizable composition comprising a cycloolefin mixture containing 0.1 to 50 % by mole of a cycloolefin having, as a substituent group, a monovalent group including an aliphatic carbon-carbon unsaturated bond, a metathesis polymerization catalyst, and a radical generating agent; and formed objects produced by using a polymerizable composition described above which preferably further comprises a chain transfer agent and making the cycloolefin mixture undergo at least ring-opening polymenzation.
    Type: Grant
    Filed: August 13, 2004
    Date of Patent: June 3, 2008
    Assignee: Zeon Corporation
    Inventors: Tomoo Sugawara, Hirotoshi Tanimoto
  • Patent number: 7344820
    Abstract: The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: March 18, 2008
    Assignee: DongJin Semichem Co., Ltd.
    Inventors: Eun-Kyung Son, Jae-Hyun Kang, Deog-Bae Kim, Jae-Hyun Kim
  • Patent number: 7312292
    Abstract: A polymer comprising polycyclic repeating units having recurring ion conducting groups and optional crosslinkable groups is disclosed. The present invention provides the capability of tailoring polymers to impart unique properties to membranes fabricated from the polymers. Membranes comprising the polymers and methods for preparing the membranes and their use in ion conducting membranes, particularly in fuel cells, are also provided.
    Type: Grant
    Filed: June 4, 2004
    Date of Patent: December 25, 2007
    Assignee: Promerus LLC
    Inventors: Ravi Ravikiran, Xiaoming Wu, Larry F. Rhodes, Robert A. Shick, Hiroko Nakano, Hirotaka Nonaka, Huabin Wang, Saikumar Jayaraman, Robert John Duff, John-Henry Lipian
  • Patent number: 7297751
    Abstract: The invention relates to photochromic monomers based on benzothiophenes and a method for preparing them, and to photochromic polymers-polyazomethines that are reversibly photocontrollable due to the introduction of photochromic fragments from the class of dihetarylethenes into their structure. The invention provides photochromic photocontrollable polymers for the creation of new information technologies.
    Type: Grant
    Filed: October 27, 2005
    Date of Patent: November 20, 2007
    Assignees: Samsung Electronics Co., Ltd., Photochemistry Center of Russian Academy of Sciences
    Inventors: Mikhail Vladimirovich Alfimov, Valery Alexandrovich Barachevsky, Valery Alexandrovich Vasnev, Alexander Alexandrovich Dunaev, Igor Viktorovich Zavarzin, Sergei Nikolaevich Ivanov, Muhammed Lastanbievich Keshtov, Mikhail Mikhailovich Krayushkin, Yury Aleksandrovich Pyankov, Stanislav Leonidovich Semenov, Yury Petrovich Strokach, Vladimir Nikolaevich Yarovenko
  • Patent number: 7291686
    Abstract: Process for the preparation of a polymeric network, in which (i) one or more polymers are made available which can be crosslinked with one another intramolecularly or intermolecularly or intra- and intermolecularly by covalent or non-covalent bonding, (ii) the conformation of at least one of the polymers is adapted to at least one template compound with obtainment of at least one preferred conformation of the at least one polymer, (iii) at least one of the preferred conformations obtained according to (ii) is fixed by crosslinkage.
    Type: Grant
    Filed: November 26, 1999
    Date of Patent: November 6, 2007
    Assignee: Dr. Gottschall Instruction Gesellschaft fur Technische Chromatographie mbH
    Inventor: Klaus Gottschall
  • Patent number: 7276568
    Abstract: A copolymer of a strait chain ?-olefin and a vinyl compound (I) represented by the general formula CH2?CH—R, wherein R is a hydrocarbon group, the steric parameter Es of the substituent R is ?1.64 or less and the steric parameter B1 of the substituent R is 1.53 or more, an adhesive containing the same as an effective ingredient, and an laminate containing the adhesive.
    Type: Grant
    Filed: July 18, 2006
    Date of Patent: October 2, 2007
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuo Oi, Akihiro Kondo, Toshiki Mori
  • Patent number: 7273915
    Abstract: A crosslinkable resin composition is provided which can be a forming material having excellent adhesion to metals and excellent heat resistance. The crosslinkable resin composition comprises; a cycloolefin resin (A) obtained through metathesis polymerization of a cycloolefin monomer in the presence of a compound having two or more vinyl groups in the molecule, and a radical generating agent (B). A crosslinked resin molded product is obtained by crosslinking such a crosslinkable resin composition through heating.
    Type: Grant
    Filed: August 13, 2004
    Date of Patent: September 25, 2007
    Assignee: Zeon Corporation
    Inventor: Tomoo Sugawara
  • Patent number: 7262250
    Abstract: The present invention relates to the prevention of scorching before crosslinking of a thermoplastic and/or elastomeric composition with peroxides or azo compounds. This is achieved by using a family of specific nitroxides as additive.
    Type: Grant
    Filed: April 29, 2005
    Date of Patent: August 28, 2007
    Assignee: Arkema France
    Inventors: Fabien Debaud, Alfredo Defrancisci, Olivier Guerret, Jacques Kervennal
  • Patent number: 7232874
    Abstract: The interlayer insulating film of this invention is composed of a polymer in which a first monomer having four substituted acetylenyl groups and polymerizable in the three-dimensional direction and a second monomer having two substituted cyclopentanonyl groups and polymerizable in the two-dimensional direction are three-dimensionally polymerized.
    Type: Grant
    Filed: July 21, 2003
    Date of Patent: June 19, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Nobuo Aoi
  • Patent number: 7230059
    Abstract: A process for producing an olefin-based copolymer, which comprises copolymerizing at least one olefin selected from the group consisting of ethylene and straight chain ?-olefins, and a vinyl compound (I) and a polyene (II) described below: Vinyl compound (I); a vinyl compound represented by the general formula CH2?CH—R, wherein the substituent R is a saturated hydrocarbon group and steric parameters Es and B1 of the substituent R are respectively ?1.64 or less and 1.53 or more; and Polyene (II); a compound having two or more of ethylene bonds and at least one combination of two ethylene bonds in which those are bonded to each other through at least three carbon atoms.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: June 12, 2007
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuo Oi, Hitoshi Tsukui
  • Patent number: 7214751
    Abstract: The invention relates to a method of preparing a composition of living polymers comprising a non-photoinitiated radical polymerization step using a composition consisting of: at least one ethylenically unsaturated monomer, preferably a methacrylic monomer, at least one disulphide compound having formula (II), i.e. Z1—C(?S)—S—S—C(?S)—Z2; and at least one thermally-activate free radical source which is different from the formula (II) compound.
    Type: Grant
    Filed: August 14, 2002
    Date of Patent: May 8, 2007
    Assignee: Rhodia Chimie
    Inventor: Jean-Marie Catala
  • Patent number: 7196143
    Abstract: Provided are a high melting point copolymer prepared by heat-polymerizing cyclopentadiene and/or dicyclopentadiene and a vinyl-substituted aromatic compound, wherein a use amount of a solvent in heat polymerization is 0.1 time or more and less than 0.5 time based on the mass of the whole monomers, and the copolymer has a softening point falling in a range of 100 to 135° C., and a hydrogenated copolymer obtained by hydrogenating the above high melting point copolymer. The hydrogenated copolymer of the present invention is suitably used as an adhesion-providing resin having a high softening point for a hot melt adhesive.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: March 27, 2007
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventor: Toyozo Fujioka
  • Patent number: 7193003
    Abstract: A copolymer of a strait chain ?-olefin and a vinyl compound (I) represented by the general formula CH2?CH—R, wherein R is a hydrocarbon group, the steric parameter Es of the substituent R is ?1.64 or less and the steric parameter B1 of the substituent R is 1.53 or more, an adhesive containing the same as an effective ingredient, and an laminate containing the adhesive.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: March 20, 2007
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuo Oi, Akihiro Kondo, Toshiki Mori
  • Patent number: 7173096
    Abstract: Chemically crosslinked polycyclooctene having excellent shape recovery properties and a method for its synthesis via ring-opening methathesis polymerization of cyclooctene using the dihydroimidazolylidene-modified Grubbs catalyst are disclosed. The polycyclooctene products, following curing with dicumyl peroxide can be shaped, the shape memorized, a new shape imparted with the original shape being recoverable by suitable temperature adjustment. The dependence of shape memory characteristics on degree of crosslinking was established. In addition to polycyclooctene, blends thereof with other materials such as SBR, EVA, polyurethane rubbers, and inorganic fillers can be utilized to provide chemically crosslinked products having excellent and tailored shape memory properties.
    Type: Grant
    Filed: October 10, 2003
    Date of Patent: February 6, 2007
    Assignee: University of Connecticut
    Inventors: Patrick T. Mather, Changdeng Liu, Seung B. Chun, E. Bryan Coughlin
  • Patent number: 7153918
    Abstract: Disclosed are random copolymers derived from ethylene and at least two different alkyl acrylate comonomers, with or without an acid cure site-containing comonomer. In particular, disclosed are copolymers derived from copolymerization of (a) from 10 to 50 weight % of ethylene; (b) from 5 to 55 weight % of a first alkyl acrylate; (b) from 15 to 80 weight % of a second alkyl acrylate; and (d) from 0 to 7 weight % of a monoalkyl ester of 1,4-butene-dioic acid. Such copolymers exhibit lower glass transition temperatures (Tg) relative to previous ethylene copolymers comprising a single alkyl acrylate comonomer and maintain the good heat and fluid resistance when employed to produce cured elastomeric compositions as well as the improved low temperature properties. This invention also provides compounded compositions comprising these copolymers, and cured compositions (i.e.
    Type: Grant
    Filed: July 15, 2004
    Date of Patent: December 26, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Yun-Tai Wu, Mark Aaron Stewart, David John Mitchell, Edward McBride
  • Patent number: 7148303
    Abstract: The present invention relates to an elastomeric polymer having repeating units derived from at least one isomonoolefin monomer, at least one multiolefin monomer, at least one diisoalkenylbenzene monomer, and optionally further copolymerizable monomers, wherein the polymer has a Mooney viscosity (ML 1+8@125° C. according to ASTM D1646) of less than 40 units and a Shore A hardness higher than 65 points @ 23° C. (according to ASTM D2240) as well as a curable composition containing the elastomeric polymer and a shaped article manufactured from the curable composition.
    Type: Grant
    Filed: February 16, 2005
    Date of Patent: December 12, 2006
    Assignee: Lanxess Inc.
    Inventors: Adam Gronowski, Akhtar Osman
  • Patent number: 7125943
    Abstract: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1–25 or (b) an aromatic hydrocarbon group, each of the hydrogen group and the aromatic hydrocarbon group independently optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1–5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is present in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
    Type: Grant
    Filed: August 6, 2003
    Date of Patent: October 24, 2006
    Assignee: Central Glass Company, Limited
    Inventors: Shinichi Sumida, Haruhiko Komoriya, Kazuhiko Maeda
  • Patent number: 7105617
    Abstract: This invention relates to the synthesis of Mqn-containing monomeric compounds, comprising a polymerizable moiety, an Mqn-moiety, and an optional chemical spacer therebetween, wherein q, in each instance, comprises an 8-hydroxyquinoline residue, M is a metal such as Mg, Zn, Al, Ga, or In, and n is 2 or 3 as the valence of the metal requires. For example, the polymerization of Znq2- or Alq3-containing monomers, in the presence or absence of a co-monomer, provided a Znq2- or Alq3-containing polymer, which retained the optical properties of Znq2 or Alq3 in solution, respectively. The Mqn-containing polymers may be used in, among other things, the fabrication of light-emitting diodes (LEDs).
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: September 12, 2006
    Assignee: Georgia Tech Research Corporation
    Inventors: Marcus Weck, Amy Meyers
  • Patent number: 7105269
    Abstract: 1. A copolymer having recurring units of the following formulas (1), (2), and (3), wherein R1, R4, R5, and R6 are a hydrogen atom or a methyl group, R2, R3, and R7 represent a monovalent organic group, k is 1 or 2, 1 is 0–4, n is 1–3, m is 0–3, R8 is a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more R8 groups being the same or different, q is 1–3, and p is 0–3, the copolymer having a GPC average molecular weight of 3,000–100,000. The composition is useful as a polymer component for a radiation-sensitive resin composition suitable as a chemically-amplified resist.
    Type: Grant
    Filed: December 18, 2002
    Date of Patent: September 12, 2006
    Assignee: JSR Corporation
    Inventors: Tomoki Nagai, Daisuke Shimizu, Tsutomu Shimokawa, Fumihisa Miyajima, Masaaki Miyaji
  • Patent number: 7087691
    Abstract: Embodiments in accordance with the present invention encompass photo-imageable compositions that include polymers of acrylate-type monomers and norbornene-type monomers. In some embodiments a catalyst system comprising a cationic or a neutral Pd(II) dimer component having the formula (Allyl)Pd(P(R21)3) or (L?)[(L)Pd(R)(X)]2, respectively is employed to effect polymerization. In other embodiments a free radical or living free radical catalyst is employed to effect polymerization. At least one of the acrylate-type monomers and norbornene-type monomers of the polymer embodiments of the present invention encompass an acid labile moiety. Some polymer embodiments of the present invention include more than one type of acrylate-type monomer and norbornene-type monomer. Embodiments of the present invention include forming a patterned layer on a substrate and some embodiments include transferring the patterned structure to a material layer first formed on the substrate.
    Type: Grant
    Filed: July 7, 2003
    Date of Patent: August 8, 2006
    Assignees: Promerus LLC, Penn State Research Foundation
    Inventors: Larry F. Rhodes, Larry Seger, Ayusman Sen, April Hennis Marchetti
  • Patent number: 7037974
    Abstract: A poly(?-olefin) copolymer obtained from the polymerization of at least one ?-olefin having from 2 to about 20 carbon atoms and at least one bulky olefin, the process comprising polymerizing the monomers in the presence of hydrogen and a catalytically effective amount of a catalyst comprising the product obtained by combining a metallocene procatalyst with a cocatalyst; lubricant compositions comprising such poly(?-olefin) copolymer; and a method for improving the viscosity index of a lubricant composition using such poly(?-olefin) copolymer.
    Type: Grant
    Filed: February 4, 2004
    Date of Patent: May 2, 2006
    Assignee: Uniroyal Chemical Company, Inc.
    Inventors: Anthony DiMaio, Thomas P. Matan
  • Patent number: 7022789
    Abstract: The present invention relates to telechelic polymers having crosslinkable end groups of the formula and methods for preparing the same wherein n is an integer; is an alkadienyl group; Y is an alkyl group; and Z is crosslinkable end group. In general, the inventive synthesis involves reacting a functionalized chain transfer agent having crosslinkable ends with a cycloalkene in the presence of a ruthenium or osmium catalyst of the formula wherein: M is ruthenium or osmium; X and X1 are independently any anionic ligand; L and L1 are any neutral electron donor ligand; R and R1 are each hydrogen or a substituted or unsubstituted substituent wherein the substituent is selected from the group consisting of C1–C20 alkyl, C2–C20 alkenyl, C2–C20 alkynyl, aryl, C1–C20 carboxylate, C1–C20 alkoxy, C1–C20 alkenyloxy, C2–C20 alkynyloxy, aryloxy, C2–C20 alkoxycarbonyl, C1–C20 alkylthio, C1–C20 alkylsulfonyl and C1–C20 alkylsulfinyl.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: April 4, 2006
    Assignee: California Institute of Technology
    Inventors: Bob R. Maughon, Takeharu Morita, Robert H. Grubbs
  • Patent number: 6995228
    Abstract: A cyclic conjugated diene copolymer comprising a main chain comprised of (A) cyclic conjugated diene monomer units, (B) monomer units obtained from vinyl aromatic monomers each having a hydrogen atom at the ?-position thereof, and optionally (C) monomer units obtained from commoners which are other than the monomers used for obtaining the monomer units A and B and which are copolymerizable with at least one of the monomers used for obtaining the monomer units A and B, wherein all monomer units A and the monomer units B together form one or more polymer chains each having an A/B random sequence, wherein the one or more polymer chains each having an A/B random sequence contain at least one polymer chain having a number average molecular weight of from 20,000 to 500,000 and contain no polymer chain having a number average molecular weight of more than 500,000. A process for producing the above-mentioned cyclic conjugated diene copolymer by living anionic polymerization.
    Type: Grant
    Filed: August 16, 2002
    Date of Patent: February 7, 2006
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Junichi Shishido, Kenichi Sanechika
  • Patent number: 6987156
    Abstract: A film and method for fastening cargo during transportation wherein the film has a percentage strain change 100 hours after applying a load of 3.5 MPa at a temperature of 23° C. of not more than 2.0%, and a percentage strain change 100 hours after applying a load of 0.5 MPa at a temperature of 55° C. of not more than 2.5%. Moreover, it is preferable for the elastic modulus at a temperature of 23° C. to be not more than 60 MPa, and the elastic modulus at a temperature of 55° C. to be not more than 20 MPa. Such a film can be formed from substantially random interpolymer(s) each comprising 1 to 99 mol % of polymer units derived from an aromatic vinyl or vinylidene monomer and/or a hindered aliphatic or cycloaliphatic vinyl or vinylidene monomer, and 1 to 99 mol % of polymer units derived from at least one ?-olefin having 2 to 20 carbon atoms.
    Type: Grant
    Filed: June 24, 2003
    Date of Patent: January 17, 2006
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masashi Arimoto, Tomohiko Kimura, Saburou Takeyama
  • Patent number: 6984704
    Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2-Q-CR3?CHR4??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.
    Type: Grant
    Filed: February 17, 2005
    Date of Patent: January 10, 2006
    Assignee: Asahi Glass Company, Limited
    Inventors: Shun-ichi Kodama, Isamu Kaneko, Osamu Yokokoji, Shinji Okada, Yoko Takebe, Yasuhide Kawaguchi
  • Patent number: 6965003
    Abstract: A block copolymer comprising a polymer block [A] and a polymer block [B]. The polymer block [A] contains mainly a repeating unit having an alicyclic structure, and the polymer block [B] contains the repeating unit having an alicyclic structure and a repeating unit derived from a diene based monomer and/or a vinyl based monomer. In any block, the carbon-carbon unsaturated bonds are hydrogenated. The block copolymer is molded into optical disks, optical waveguides, films, sheets, containers, and optical lenses.
    Type: Grant
    Filed: August 6, 2001
    Date of Patent: November 15, 2005
    Assignee: Zeon Corporation
    Inventors: Atsushi Sone, Tsutomu Nagamune, Masakazu Hashimoto, Toru Murata
  • Patent number: 6946523
    Abstract: In accordance with the present invention, there are provided novel heterobifunctional monomers and users for the same. Invention compounds have many of the properties required by the microelectronics industry, such as, for example, hydrophobicity, high Tg values, low dielectric constant, ionic purity, low coefficient of thermal expansion (CTE), and the like. These properties result in a thermoset that is particularly well suited to high performance applications where typical operating temperatures are often significantly higher than those at which prior art materials were suitable. Invention compounds are particularly ideal for use in the manufacture of electronic components, such as, for example, printed circuit boards, and the like.
    Type: Grant
    Filed: July 1, 2003
    Date of Patent: September 20, 2005
    Assignee: Henkel Corporation
    Inventors: Stephen M. Dershem, Kevin J. Forrestal, Puwei Liu
  • Patent number: 6930157
    Abstract: A catalyst composition for preparing olefin polymers. The catalyst composition includes a metallocene compound and an activating cocatalyst. In the metallocene compound, two cyclopentadienyl groups are bridged by X (carbon, silicon, germanium or tin) in a ring structure. The bite angle ? formed by the two cyclopentadienyl rings and X is equal to or greater than 100 degrees. The obtained olefin polymer has high cycloolefin conversion and a high glass transition temperature. In addition, the catalyst composition can still maintain relatively high activity at high temperature reaction conditions.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: August 16, 2005
    Assignee: Industrial Technology Research Institute
    Inventors: Jing-Cherng Tsai, Ming-Yuan Wu, Tung-Ying Hsieh, Yuh-Yuan Wei, Chao-Ying Yu
  • Patent number: 6914112
    Abstract: An ethylene-based copolymer is useful as a modifier for resins, e.g., polypropylene, and can be used in an ethylene/?-olefin copolymer composition containing the same ethylene-based copolymer. The inventive copolymer is characterize by: (a-1) having temperature (Tm) at the maximum peak in the endothermic curve, measured by a differential scanning calorimeter (DSC), of 40 to 90° C., (a-2) containing the component soluble in decane at normal temperature at 1 to 70% b weight, and (a-3) containing the component soluble in decane at normal temperature which comprises (i) a recurring unit derived from ethylene and (ii) a recurring unit derived from an ?-olefin of 4 or more carbon atoms, and in which a content of (i) the recurring unit derived from ethylene is 50 to 75% by mole.
    Type: Grant
    Filed: May 15, 2001
    Date of Patent: July 5, 2005
    Assignee: Mitsui Chemical, Inc.
    Inventors: Ryoji Mori, Kouichi Kizu, Keiji Okada, Kazuyuki Takimoto
  • Patent number: 6914109
    Abstract: The invention relates to a process for the preparation of 15-pentadecanolide by hydrogenating 15-pentadecenolide and to its use.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: July 5, 2005
    Assignee: Symrise GmbH & Co. KG
    Inventors: Walter Kuhn, Oskar Koch, Hans-Ulrich Funk, Gerhard Senft
  • Patent number: 6911507
    Abstract: A cyclic olefin having a specific polar group is polymerized by addition polymerization in a hydrocarbon solvent, using a polymerization catalyst component containing (i) a specific transition metal compound, (ii) a Lewis acid compound and (iii) an alkyl aluminoxane, or the cyclic olefin is polymerized by addition polymerization in the hydrocarbon solvent, using the polymerization catalyst component, by further adding at least one aromatic vinyl compound and at least one cyclic nonconjugated polyene compound, or either one of them as a molecular weight modifier, thereby obtaining a cyclic olefinic addition polymer.
    Type: Grant
    Filed: January 23, 2001
    Date of Patent: June 28, 2005
    Assignee: JSR Corporation
    Inventors: Kenzo Ohkita, Noboru Oshima, Takashi Imamura, Takashi Tsubouchi
  • Patent number: 6903171
    Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R?)zM(L?)x(L?)y]b[WCA]d wherein [(R?)zM(L?)x(L?)y] is a cation complex where M represents a Group 10 transition metal; R? represents an anionic hydrocarbyl containing ligand; L? represents a Group 15 neutral electron donor ligand; L? represents a labile neutral electron donor ligand; x is 1 or 2; and y is 0, 1, 2, or 3; and z is 0 or 1, wherein the sum of x, y, and z is 4; and [WCA] represents a weakly coordinating counteranion complex; and b and d are numbers representing the number of times the cation complex and weakly coordinating counteranion complex are taken to balance the electronic charge on the overall catalyst complex.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: June 7, 2005
    Assignee: Promerus, LLC
    Inventors: Larry Funderburk Rhodes, Andrew Bell, Ramakrishna Ravikiran, John C. Fondran, Saikumar Jayaraman, Brian Leslie Goodall, Richard A. Mimna, John-Henry Lipian
  • Patent number: 6897272
    Abstract: Disclosed herein are processes for polymerizing ethylene, acyclic olefins, and/or selected cyclic olefins, and optionally selected olefinic esters or carboxylic acids, and other monomers. The polymerizations are catalyzed by selected transition metal compounds, and sometimes other co-catalysts. Since some of the polymerizations exhibit some characteristics of living polymerizations, block copolymers can be readily made. Many of the polymers produced are often novel, particularly in regard to their microstructure, which gives some of them unusual properties. Numerous novel catalysts are disclosed, as well as some novel processes for making them. The polymers made are useful as elastomers, molding resins, in adhesives, etc.
    Type: Grant
    Filed: August 23, 2000
    Date of Patent: May 24, 2005
    Assignee: E.I. Du Pont de Nemours and Company
    Inventors: Maurice S. Brookhart, Lynda Kaye Johnson, Samuel David Arthur, Stephan James McLain
  • Patent number: 6891007
    Abstract: This invention relates to a process for polymerizing polar substituted norbornenes and/or cycloalkenes, optionally, in the presence of another unsaturated compound. The method is characterized in that the polymerization is carried out in the presence of one or more tungsten carbine complexes.
    Type: Grant
    Filed: March 19, 2001
    Date of Patent: May 10, 2005
    Assignee: Bayer Aktiengesellschaft
    Inventors: Karl-Heinz Alexsander Ostoja Starzewski, Karin Weiss, Martin Olaf Thüring
  • Patent number: 6878501
    Abstract: Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.
    Type: Grant
    Filed: April 26, 2001
    Date of Patent: April 12, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Jun Watanabe, Yuji Harada
  • Patent number: 6867274
    Abstract: The present invention relates to telechelic polymers having crosslinkable end groups of the formula and methods for preparing the same wherein n is an integer; is an alkadienyl group; Y is an alkyl group; and Z is crosslinkable end group. In general, the inventive synthesis involves reacting a functionalized chain transfer agent having crosslinkable ends with a cycloalkene in the presence of a ruthenium or osmium catalyst of the formula wherein: M is ruthenium or osmium; X and X1 are independently any anionic ligand; L and L1 are any neutral electron donor ligand; R and R1 are each hydrogen or a substituted or unsubstituted substituent wherein the substituent is selected from the group consisting of C1-C20 alkyl, C2-C20 alkenyl, C1-C20 alkynyl, aryl, C1-C20 carboxylate, C1-C20 alkoxy, C2-C20 alkenyloxy, C2-C20 alkynyloxy, aryloxy, C2-C20 alkoxycarbonyl, C1-C20 alkylthio, C1-C20 alkylsulfonyl and C1-C20 alkylsulfinyl.
    Type: Grant
    Filed: May 21, 2002
    Date of Patent: March 15, 2005
    Assignee: California Institute of Technology
    Inventors: Bob R. Maughon, Takeharu Morita, Robert H. Grubbs
  • Patent number: 6864325
    Abstract: The invention relates to metathesis polymers wherein an aromatic group that has UV-light absorbing properties is attached with a bridge group to the polymer. Also disclosed is a polymerizable composition comprising a catalytically effective amount of a penta- or hexavalent ruthenium or osmium carbene catalyst, the process for preparing the metathesis polymer by applying the reaction conditions of Ring Opening Metathesis Polymerization (=ROMP) to the polymerizable composition; and various technical applications of the metathesis polymers.
    Type: Grant
    Filed: February 13, 2001
    Date of Patent: March 8, 2005
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Alessandro Zedda, Dario Lazzari, Massimiliano Sala, Michela Bonora, Manuele Vitali, Paul Adriaan Van Der Schaaf
  • Patent number: 6858676
    Abstract: The present invention relates to an olefin derived copolymer and a thermoplastic resin composition using the olefin derived copolymer satisfying the following (1) and (2): (1) tensile strength at break measured based on JIS K6251 is 2.0 or less MPa; and (2) tensile elongation at break EB (%) of a resin composition obtained satisfies the following relational expression (expression 1) and (expression 2), when blended with a polypropylene derived resin that has 20 degree C. xylene soluble component of not more than 20 wt %. R[3/5]?R[2/6]?0.15??(expression 1) S[2/6]??800??(expression 2) (R[3/5] and R[2/6] are obtained by the following methods: a curve is obtained by plotting tensile elongation at break EB (%) (based on JIS K6251) of resin composition taken as vertical axis, and weight part rate Pa of a content of an olefin derived copolymer contained in a resin composition taken as horizontal axis; a multiple regression curve in section regions of Pa=0.30-0.50 and Pa=0.20-0.
    Type: Grant
    Filed: July 21, 1999
    Date of Patent: February 22, 2005
    Assignee: Sumitomo Chemical Company, Ltd.
    Inventors: Hirofumi Johoji, Hidetake Hozumi, Atsuko Ogawa, Tadaaki Nishiyama