Contains Atoms Other Than Carbon And Hydrogen Patents (Class 526/309)
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Patent number: 12140867Abstract: A resist composition including a base material component (A) whose solubility in a developing solution is changed due to an action of an acid, in which the base material component (A) contains a polymer compound (A1) having a constitutional unit (a1) represented by Formula (a1-1). In the formula, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Vax1 represents a single bond or a divalent linking group, na0 represents an integer of 0 to 2, and R01 represents a methyl group or an ethyl group.Type: GrantFiled: September 5, 2019Date of Patent: November 12, 2024Assignee: TOKYO OHKA KOGYO CO., LTD.Inventor: Tsuyoshi Nakamura
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Patent number: 12038689Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (1), and a compound that generates an acid upon irradiation with actinic rays or radiation.Type: GrantFiled: March 25, 2021Date of Patent: July 16, 2024Assignee: FUJIFILM CorporationInventors: Akihiro Kaneko, Kazunari Yagi, Takashi Kawashima, Akiyoshi Goto
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Patent number: 11961738Abstract: In a method of forming a pattern, a first pattern is formed over an underlying layer, the first pattern including main patterns and a lateral protrusion having a thickness of less than 25% of a thickness of the main patterns, a hard mask layer is formed over the first pattern, a planarization operation is performed to expose the first pattern without exposing the lateral protrusion, a hard mask pattern is formed by removing the first pattern while the lateral protrusion being covered by the hard mask layer, and the underlying layer is patterned using the hard mask pattern as an etching mask.Type: GrantFiled: February 12, 2021Date of Patent: April 16, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chin-Ta Chen, Hua-Tai Lin, Han-Wei Wu, Jiann-Yuan Huang
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Patent number: 11623996Abstract: The invention relates to a material for use as construction material for energy-pulse-induced transfer printing, which contains (a) at least one polymerizable binder, (b) at least one volume expansion component, (c) at least one initiator for the polymerization and (d) preferably at least one energy transformation component. The invention furthermore relates to a process for producing three-dimensional objects using the material.Type: GrantFiled: October 21, 2019Date of Patent: April 11, 2023Assignees: Ivoclar Vivadent AG, IO Tech Group Ltd.Inventors: Lorenz Josef Bonderer, Jürgen Lauberscheimer, Wolfgang Wachter, Michael Zenou
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Patent number: 11130867Abstract: Curable compositions comprising 1,1-di-activated vinyl compounds are provided herein. Also provided are coatings formed from 1,1-di-activated vinyl compounds. Also provided are processes for coating substrates and articles. Curable compositions including 1,1-di-activated vinyl compounds that function as crosslinking agents are described.Type: GrantFiled: July 26, 2017Date of Patent: September 28, 2021Assignee: PPG Industries Ohio, Inc.Inventors: Scott J. Moravek, Adam B. Powell, Lawrence G. Anderson, Scott W. Sisco, Davina J. Schwartzmiller, Aditya Gottumukkala
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Patent number: 10196481Abstract: Functionalized compounds including residues of one or more 1,1-disubstituted alkene compounds. Preferably the functionalized compound includes the residue of two or more 1,1-disubstituted alkene compounds, which are spaced apart. The functionalized compound may be produced by a transesterification reaction. The functionalized compounds may be employed in a polymerizable composition and may be used to prepare new polymers, (for example by reacting the alkene group).Type: GrantFiled: May 11, 2017Date of Patent: February 5, 2019Assignee: Sirrus, Inc.Inventors: Aniruddha Palsule, Jeffrey M. Sullivan, Kshitij K. Parab, Ami Doshi, Alexander R. Holzer, Matthew Reilman
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Patent number: 10087283Abstract: Disclosed are compositions comprising polyester macromers containing in one or more chains the residue of one or more diols and one or more diesters wherein the residue of the one or more diols and the one or more diesters alternate along the chain and a portion of the diesters are 1,1-diester-1-alkenes, and optionally one or more dihydrocarbyl dicarboxylates, and at least one terminal end comprises the residue of one of the 1,1-diester-1 alkenes and wherein one or more terminal ends may comprise the residue of one or more diols. The chains may contain the residue of the one or more diols and one or more diesters comprising one or more diesters 1,1-diester-1 alkenes and optionally one or more dihydrocarbyl dicarboxylates randomly disposed along the chains. Disclosed are methods of preparing the polyester macromers and incorporating them in a variety of polyester containing compositions such as coatings and films.Type: GrantFiled: March 29, 2017Date of Patent: October 2, 2018Assignee: SIRRUS, INC.Inventors: Aniruddha Palsule, Jeffrey M. Sullivan, Kshitij K. Parab, Elliott King, William Barrett
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Patent number: 9932680Abstract: Electropolymerizable systems are disclosed. The electropolymerizable systems include an electropolymerizable composition including one or more 1,1-disubstituted alkene compounds and one or more conductive synergists.Type: GrantFiled: March 29, 2017Date of Patent: April 3, 2018Assignee: Sirrus, Inc.Inventors: Peter Rulon Stevenson, Jeffrey M. Sullivan
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Patent number: 9745413Abstract: Disclosed are compositions comprising polyester macromers containing in one or more chains the residue of one or more diols and one or more diesters wherein the residue of the one or more diols and the one or more diesters alternate along the chain and a portion of the diesters are 1,1-diester-1-alkenes, and optionally one or more dihydrocarbyl dicarboxylates, and at least one terminal end comprises the residue of one of the 1,1-diester-1 alkenes and wherein one or more terminal ends may comprise the residue of one or more diols. The chains may contain the residue of the one or more diols and one or more diesters comprising one or more diesters 1,1-diester-1 alkenes and optionally one or more dihydrocarbyl dicarboxylates randomly disposed along the chains. Disclosed are methods of preparing the polyester macromers and incorporating them in a variety of polyester containing compositions such as coatings and films.Type: GrantFiled: February 20, 2017Date of Patent: August 29, 2017Assignee: SIRRUS, INC.Inventors: Aniruddha Palsule, Jeffrey M. Sullivan, Kshitij K. Parab, Elliott King, William Barrett
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Patent number: 9617377Abstract: Disclosed are compositions comprising polyester macromers containing in one or more chains the residue of one or more diols and one or more diesters wherein the residue of the one or more diols and the one or more diesters alternate along the chain and a portion of the diesters are 1,1-diester-1-alkenes, and optionally one or more dihydrocarbyl dicarboxylates, and at least one terminal end comprises the residue of one of the 1,1-diester-1 alkenes and wherein one or more terminal ends may comprise the residue of one or more diols. The chains may contain the residue of the one or more diols and one or more diesters comprising one or more diesters 1,1-diester-1 alkenes and optionally one or more dihydrocarbyl dicarboxylates randomly disposed along the chains. Disclosed are methods of preparing the polyester macromers and incorporating them in a variety of polyester containing compositions such as coatings and films.Type: GrantFiled: August 11, 2016Date of Patent: April 11, 2017Inventors: Aniruddha Palsule, Jeffrey M. Sullivan, Kshitij K. Parab, Elliott King, William Barrett
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Patent number: 9617354Abstract: Electropolymerizable compositions are disclosed. Certain electropolymerizable compositions include one or more 1,1-disubstituted alkene compounds and one or more conductive synergists. Other certain electropolymerizable compositions include one or more 1,1-disubstituted alkene compounds and one or more acid stabilizers and one or more free radical stabilizers.Type: GrantFiled: November 23, 2015Date of Patent: April 11, 2017Assignee: Sirrus, Inc.Inventors: Peter Rulon Stevenson, Jeffrey M. Sullivan
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Publication number: 20150132688Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.Type: ApplicationFiled: January 26, 2015Publication date: May 14, 2015Applicant: FUJIFILM CorporationInventors: Natsumi YOKOKAWA, Shuji HIRANO, Hiroo TAKIZAWA, Wataru NIHASHI
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Patent number: 9029489Abstract: The invention provides intermediates of the formula: as well as a method of their preparation by reacting a thiol having at least two hydroxyl groups with a mono-unsaturated organic compound in the presence of a base catalyst. A polymerizable urethane acrylate oligomer or urethane methacrylate oligomer is formed by reacting a polyisocyanate with the intermediate. The polymerizable urethane acrylate oligomer or urethane methacrylate is blended with a polymerization initiator to form a composition which is useful in such applications as adhesives.Type: GrantFiled: June 28, 2010Date of Patent: May 12, 2015Assignee: Dymax Oligomers and Coatings LLCInventors: James H. Aerykssen, Ahmet Nebioglu, Richard D. Zopf, Igor V. Khudyakov
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Publication number: 20150064626Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.Type: ApplicationFiled: July 14, 2014Publication date: March 5, 2015Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Koji Hasegawa
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Publication number: 20150044457Abstract: Disclosed is an adhesive composition comprising a low Tg (meth)acrylate copolymer component, a high Tg (meth)acrylate copolymer component, and a hydrogenated hydrocarbon tackifier. This disclosure provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles that are particularly useful in the bonding of low surface energy (LSE) substrates.Type: ApplicationFiled: November 12, 2012Publication date: February 12, 2015Inventors: Zhong Chen, Kelly S. Anderson, Jingjing Ma, Emilie L. Rexeisen
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Patent number: 8926872Abstract: The present invention relates to an acrylic copolymer resin containing: 1) an alkyl (meth)acrylate-based monomer; 2) a (meth)acrylate-based monomer containing an aliphatic ring and/or an aromatic ring; and 3) at least an imide-based monomer or a styrene-based monomer, to a resin composition containing said acrylic copolymer resin and a resin containing an aromatic ring and/or an aliphatic ring in the main chain thereof, to an optical film comprising said resin composition, and to a liquid crystal display device comprising said optical film. The optical film according to the present invention has excellent heat resistance, optical transparency, etc.Type: GrantFiled: September 20, 2013Date of Patent: January 6, 2015Assignee: LG Chem, Ltd.Inventors: Su-Kyung Kim, Byoung-Il Kang, Dae-Woo Lee, Byoung-Kue Chun, Chang-Hun Han, Da-Eun Sung
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Publication number: 20140370429Abstract: The instant disclosure describes methacrylate coated carrier resins with hydrophobic substituents for charge control and improved RH sensitivity.Type: ApplicationFiled: June 14, 2013Publication date: December 18, 2014Inventors: Richard PN Veregin, Qingbin Li, Andriy Kovalenko, Sergey Gusarov, Daryl W. Vanbesien, Michael S. Hawkins
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Publication number: 20140346399Abstract: A liquid crystal composition and a liquid crystal display device which includes the composition are provided. The liquid crystal composition contains a specific compound having a polymerizable group as a first component, and may contain a specific compound having a large negative dielectric anisotropy and a low minimum temperature as a second component, or a specific compound having a small viscosity or a large maximum temperature as a third component. The liquid crystal composition satisfies at least one of the following characteristics: a high maximum temperature of a nematic phase, a low minimum temperature of the nematic phase, a small viscosity, a suitable optical anisotropy, a large negative dielectric anisotropy, a large specific resistance, a high stability to ultraviolet light and a high stability to heat. Alternatively, a liquid crystal composition having a suitable balance regarding at least two of the aforementioned characteristics is also provided.Type: ApplicationFiled: October 1, 2012Publication date: November 27, 2014Inventors: Yukihiro Fujita, Yoshimasa Furusato, Maiko Matsukuma
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Publication number: 20140329980Abstract: The present invention provides multifunctional monomers, including, but not limited to include multifunctional methylene malonate and methylene beta-ketoester monomers; methods for producing the same; and compositions and products formed therefrom. The multifunctional monomers of the invention may be produced by transesterification or by direct synthesis from monofunctional methylene malonate monomers or methylene beta-ketoester monomers. The present invention further compositions and products formed from methylene beta-ketoester monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).Type: ApplicationFiled: October 18, 2012Publication date: November 6, 2014Inventors: Bernard M. Malofsky, Adam G. Malofsky, Tanmoy Dey, Larry Hines, Matthew M. Ellison
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Publication number: 20140316093Abstract: Provided is a polymer from which an encapsulant excellent in weather resistance and processability can be obtained when being used for an encapsulant for a solar cell. The polymer that has a main chain comprising repeating units represented by formula (1) and repeating units represented by formula (2) and satisfies requirements (a1), (a2), and (a3), (a1): the ratio of the number of the repeating units represented by formula (2) to the total number of the carbon atoms that constitute the main chain of the polymer is from 3.8% to 7.5%; (a2): the ratio X represented by formula (3) is from 82% to 100%; X=100×A/B??(3) (a3): the polymer has a melting point of 42° C. to 90° C. as measured with a differential scanning calorimeter.Type: ApplicationFiled: November 14, 2012Publication date: October 23, 2014Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventor: Hiroaki Yoda
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Publication number: 20140309395Abstract: Disclosed is an optical film comprising a resin material containing a copolymer of 20 to 90% by weight of methyl methacrylate, 10 to 70% by weight of tert-butylcyclohexyl methacrylate represented by formula (I): and 0 to 20% by weight of a monomer other than methyl methacrylate and tert-butylcyclohexyl methacrylate, the optical film having been produced by drawing an undrawn film formed by melt-extruding the resin material by a factor of 1.4 to 6.0 in terms of area ratio.Type: ApplicationFiled: September 25, 2012Publication date: October 16, 2014Inventors: Yasuhiro Koike, Akihiro Tagaya, Akira Matsuo, Sayako Uchizawa, Yasuo Matsumura
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Patent number: 8859099Abstract: A laminate having excellent weatherability and abrasion resistance as well as adhesion. The laminate comprises a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.Type: GrantFiled: February 8, 2013Date of Patent: October 14, 2014Assignee: Teijin Chemicals, Ltd.Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
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Publication number: 20140296444Abstract: Monomers, polymers and copolymers are provided that incorporate at least one naturally occurring phenolic compound, such as a plant phenol.Type: ApplicationFiled: March 11, 2014Publication date: October 2, 2014Applicant: NDSU RESEARCH FOUNDATIONInventors: BRET JA CHISHOLM, SAMIM ALAM, MUKUND SIBI, SELVAKUMAR SERMADURAI
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Publication number: 20140288230Abstract: The present invention provides methylene beta-ketoester monomers, methods for producing the same, and compositions and products formed therefrom. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester is reacted with a source of formaldehyde in a modified Knoevenagel reaction optionally in the presence of an acidic or basic catalyst, and optionally in the presence of an acidic or non-acidic solvent, to form reaction complex. The reaction complex may be an oligomeric complex. The reaction complex is subjected to further processing, which may be vaporization by contact with an energy transfer means in order to isolate the beta-ketoester monomer. The present invention further compositions and products formed from methylene beta-ketoester monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).Type: ApplicationFiled: October 18, 2012Publication date: September 25, 2014Inventors: Bernard M. Malofsky, Adam G. Malofsky, Tanmoy Dey
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Publication number: 20140253847Abstract: There is provided an optical film including an acrylic resin, wherein a tensile elastic modulus in a machine direction, which are abbreviated as EMD, and a tensile elastic modulus in a direction perpendicular to the machine direction, which is abbreviated as ETD, satisfy the relationship of Equation (1): EMD/ETD<0.8??Equation (1).Type: ApplicationFiled: March 7, 2014Publication date: September 11, 2014Applicant: FUJIFILM CORPORATIONInventors: Ryuji SANETO, Shusuke ARITA, Hiromichi FURUKAWA
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Patent number: 8829068Abstract: The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.Type: GrantFiled: April 20, 2012Date of Patent: September 9, 2014Assignee: LG Chem, Ltd.Inventors: Sunhwa Kim, Ho Chan Ji, Dongchang Choi, Han Soo Kim, Yoon Hee Heo, Changho Cho, Won Jin Chung
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Patent number: 8809447Abstract: Acetoacetate-functional monomers are disclosed that correspond to the following formula 1: in which R is hydrogen, or a methylgroup; X is a branched alkyl or a branched cyclic alkyl having from 5 to 8 carbon atoms; and Y1 and Y2 are independently hydrogen or methyl. Also disclosed are emulsion, suspension, and solution polymers comprising residues from the acetoacetate-functional monomer of formula 1 and one or more additional ethylenically unsaturated monomers. Self-curing coating compositions are likewise disclosed that comprise the acetoacetate-functional monomer of formula 1, and optionally one or more additional ethylenically unsaturated monomers. Latex formulations are also disclosed that comprise a polymer having residues from the acetoacetate-functional monomer of formula 1 dispersed in an evaporable aqueous carrier.Type: GrantFiled: December 15, 2010Date of Patent: August 19, 2014Assignee: Eastman Chemical CompanyInventors: John Thorton Maddox, Stacey James Marsh
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Patent number: 8809446Abstract: Substituted 3-oxopentanoates are disclosed that correspond to the following formula 1: in which R is hydrogen, or a methyl group; X is a straight-chain, branched, or cyclic alkyl or alkyl ether group having from 1 to 15 carbon atoms or aromatic group having from 6 to 15 carbon atoms; and Y1 and Y2 are independently hydrogen or an alkyl having 1 to 2 carbon atoms. Also disclosed are emulsion polymers, suspension polymers, and solution polymers that comprise residues from the substituted 3-oxopentanoate monomers, and that may also include one or more additional ethylenically unsaturated monomers. Also disclosed are coating compositions that include a latex emulsion polymer and the substituted 3-oxopentanoate monomer of formula 1 provided as a coalescent.Type: GrantFiled: December 15, 2010Date of Patent: August 19, 2014Assignee: Eastman Chemical CompanyInventors: John Thorton Maddox, Robert Lee Eagan
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Patent number: 8802784Abstract: Disclosed herein are copolymers comprising functional groups attached to the backbone of the polymer and methods of making these polymers.Type: GrantFiled: December 19, 2008Date of Patent: August 12, 2014Inventor: Joseph W. Bruno
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Publication number: 20140212813Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.Type: ApplicationFiled: April 2, 2014Publication date: July 31, 2014Applicant: JSR CORPORATIONInventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
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Patent number: 8765891Abstract: It is an object of the present invention to provide a laminate having excellent weatherability and abrasion resistance as well as adhesion. The present invention relates to a laminate comprising a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.Type: GrantFiled: February 8, 2013Date of Patent: July 1, 2014Assignee: Teijin Chemicals, Ltd.Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
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Publication number: 20140154616Abstract: Disclosed is a coloring composition with satisfactory heat resistance, no discoloration, excellent developability, and no development residues on a substrate and pixels of other colors, providing, a coloring composition for a color filter including (A) a polymer having a dye skeleton and (B) an organic solvent, wherein the content of an unreacted monomer component having the dye skeleton which is capable of forming (A) the polymer having the dye skeleton is less than or equal to 1 mass % with regard to (A) the polymer having the dye skeleton.Type: ApplicationFiled: February 10, 2014Publication date: June 5, 2014Applicant: FUJIFILM CorporationInventors: Yuzo NAGATA, Hiroaki IDEI, Atsuyasu NOZAKI, Kenta USHIJIMA, Yushi KANEKO, Yousuke MURAKAMI
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Patent number: 8735045Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.Type: GrantFiled: October 25, 2010Date of Patent: May 27, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Daiju Shiono, Daichi Takaki
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Publication number: 20140045123Abstract: A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.Type: ApplicationFiled: August 1, 2013Publication date: February 13, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa
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Publication number: 20140044961Abstract: A pressure-sensitive adhesive capable of forming a pressure-sensitive adhesive layer with high transparency and low sebum-induced swelling rate is provided, which includes a (meth)acryl-based polymer obtained by polymerization of a monomer component containing 40 to 82% by weight of an alkyl(meth)acrylate having an alkyl group of 4 to 18 carbon atoms at the ester end and 18 to 35% by weight of a hydroxyl group-containing monomer.Type: ApplicationFiled: August 8, 2013Publication date: February 13, 2014Applicant: NITTO DENKO CORPORATIONInventors: Yoshihito TAKAMI, Hirofumi KATAMI, Hiroaki KISHIOKA
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Patent number: 8637624Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.Type: GrantFiled: July 6, 2013Date of Patent: January 28, 2014Assignee: Rhodia OperationsInventors: Hui Shirley Yang, Derek Pakenham, Herve Adam, Pierre Hennaux
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Publication number: 20130345383Abstract: Branched and hyperbranched oligomers and polymers that contain a cashew nutshell oil or liquid component are provided. The novel oligomers and polymers are suitable for use as an oil, lubricant, coating, adhesive, resin or composite.Type: ApplicationFiled: January 6, 2012Publication date: December 26, 2013Applicant: NDSU RESEARCH FOUNDATIONInventors: Zhigang Chen, Ren Liu
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Publication number: 20130338302Abstract: To provide an inkjet ink polymer capable of providing an inkjet ink capable of forming a printed product having excellent weather resistance, print density (coloring properties), and fixability (abrasion properties) with good productivity and providing a pigment dispersion having excellent dispersibility with good productivity. An inkjet ink copolymer contains 10 to 99% by weight of a cyclohexyl methacrylate unit and 1 to 90% by weight of an acrylic acid unit. The purpose is achieved by an inkjet ink pigment dispersion containing the inkjet ink copolymer and a pigment.Type: ApplicationFiled: February 28, 2012Publication date: December 19, 2013Applicant: SANYO COLOR WORKS, LTD.Inventors: Minoru Yoshida, Atsushi Ishikawa, Yoshiya Kobayashi, Kazuki Sase, Eiji Morimoto
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Patent number: 8603728Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising ?-diketone, ?-ester-ketone, ?-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).Type: GrantFiled: May 29, 2012Date of Patent: December 10, 2013Assignee: Rohm and Haas Electronic Materials LLCInventors: Gregory P. Prokopowicz, Gerhard Polhers, Mingqi Li, Chunyi Wu, Cong Liu, Cheng-bai Xu
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Publication number: 20130309411Abstract: The present invention provides a birefringent lens material for a stereoscopic image display, the birefringent lens material containing two or more liquid crystal compounds each having at least one polymerizable functional group, a birefringent lens for a stereoscopic image display, the birefringent lens being formed by using the lens material, and a method for producing a birefringent lens for a stereoscopic image display using the lens material. The birefringent lens material for a stereoscopic image display and the birefringent lens for a stereoscopic image display of the present invention are good in terms of optical characteristics, durability, and productivity, in particular, productivity. The method for producing a birefringent lens for a stereoscopic image display of the present invention has good productivity.Type: ApplicationFiled: December 20, 2011Publication date: November 21, 2013Applicant: DIC CORPORATIONInventors: Yasuhiro Kuwana, Hiroshi Hasebe
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Publication number: 20130296516Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.Type: ApplicationFiled: July 6, 2013Publication date: November 7, 2013Inventors: Hui Shirley YANG, Derek PAKENHAM, Herve ADAM, Pierre HENNAUX
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Publication number: 20130288180Abstract: A polymer for use in resist compositions is obtained from a monomer having formula (1) wherein R1 is methyl, ethyl, propyl, vinyl or ethynyl, the circle designates C3-C12 cycloalkyl, a combination wherein R1 is ethyl and the circle is cyclohexyl being excluded, R2 is H or C1-C4 alkyl, and m is 1 to 4.Type: ApplicationFiled: April 3, 2013Publication date: October 31, 2013Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Koji Hasegawa
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Publication number: 20130289211Abstract: The invention discloses a cross-linked polymer particle for an epoxy resin, an epoxy resin composition containing the cross-linked polymer particle, the epoxy resin and a curing agent, and an epoxy cured material having qualities of colorless transparency and crack resistance as a result of curing the resin composition. The cross-linked polymer particle for the epoxy resin contains a (meth)acrylate monomer unit and a crosslinking monomer unit, wherein a volume average primary particle diameter is 0.5 to 10 ?m, and a glass transition temperature of the monomer components excluding the crosslinking monomer is 30° C. or more by FOX formula calculation, and the refractivity at 23° C. is 1.490 to 1.510.Type: ApplicationFiled: January 10, 2012Publication date: October 31, 2013Applicant: MITSUBISHI RAYON CO., LTD.Inventors: Hiroyuki Nishii, Toshihiro Kasai
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Patent number: 8568624Abstract: The present invention relates to an acrylic copolymer resin containing: 1) an alklyl (meth)acrylate-based monomer; 2) a (meth)acrylate-based monomer containing an aliphatic ring and/or an aromatic ring; and 3) at least an imide-based monomer or a styrene-based monomer, to a resin composition containing said acrylic copolymer resin and a resin containing an aromatic ring and/or an aliphatic ring in the main chain thereof, to an optical film comprising said resin composition, and to a liquid crystal display device comprising said optical film. The optical film according to the present invention has excellent heat resistance, optical transparency, etc.Type: GrantFiled: February 18, 2010Date of Patent: October 29, 2013Assignee: LG Chem, Ltd.Inventors: Su-Kyung Kim, Byoung-Il Kang, Dae-Woo Lee, Byoung-Kue Chun, Chang-Hun Han, Da-Eun Sung
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Patent number: 8557501Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.Type: GrantFiled: March 21, 2012Date of Patent: October 15, 2013Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
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Patent number: 8519073Abstract: A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure.Type: GrantFiled: October 15, 2007Date of Patent: August 27, 2013Assignees: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix CorporationInventors: Yoshiyuki Utsumi, Hiroaki Shimizu, Kyoko Ohshita, Toshiharu Shimamaki, Kenshin Niwa, Seihin Shu
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Publication number: 20130216951Abstract: A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.Type: ApplicationFiled: March 29, 2013Publication date: August 22, 2013Applicant: JSR CORPORATIONInventor: JSR Corporation
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Patent number: 8501033Abstract: The invention relates to a liquid radiation curable resin capable of curing into a solid upon irradiation comprising: (A) from about 0 to about 12 wt % of a cycloaliphatic epoxide having a linking ester group; (B) from about 30 to about 65 wt % of one or more epoxy functional components other than A; (C) from about 10 to about 30 wt % of one or more oxetanes; (D) from, about 1 to about 10 wt % of one or more polyols; (E) from about 2 to about 20 wt % of one or more radically curable (meth)acrylate components; (F) from about 2 to about 12 wt % of one or more impact modifiers; (G) from about 0.1 to about 8 wt % of one or more free radical photoinitiators; and (H) from about 0.1 to about 8 wt % of one or more cationic photoinitiators; wherein the liquid radiation curable resin has a viscosity at 30° C. of from about 600 cps to about 1300 cps.Type: GrantFiled: March 12, 2010Date of Patent: August 6, 2013Assignee: DSM IP Assets B.V.Inventors: John Southwell, Brett A. Register, Satyendra Kumar Sarmah, Paulus Antonius Maria Steeman, Beert Jacobus Keestra, Marcus Matheus Driessen
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Publication number: 20130177848Abstract: A polymer containing a repeating unit represented by the following general formula (1) and a repeating unit having an acid-releasable group.Type: ApplicationFiled: September 9, 2011Publication date: July 11, 2013Applicant: CENTRAL GLASS COMPANY LIMITEDInventors: Yusuke Kanto, Shinichi Sumida, Kazuhiko Maeda
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Patent number: 8461252Abstract: The instant disclosure describes methods for preparing latex resins for coated carriers using surfactant partitioning, which resins exhibit both lower ? potential and greater latex stability, while not adversely affecting particle size, toner charge or other metrics.Type: GrantFiled: November 12, 2011Date of Patent: June 11, 2013Assignee: Xerox CorporationInventors: Daryl W Vanbesien, Michael Steven Hawkins, Corey Tracy, Richard P N Veregin, Karen A Moffat, Paul Joseph Gerroir, Thomas E Enright, Valerie Farrugia