Contains Atoms Other Than Carbon And Hydrogen Patents (Class 526/309)
  • Patent number: 10196481
    Abstract: Functionalized compounds including residues of one or more 1,1-disubstituted alkene compounds. Preferably the functionalized compound includes the residue of two or more 1,1-disubstituted alkene compounds, which are spaced apart. The functionalized compound may be produced by a transesterification reaction. The functionalized compounds may be employed in a polymerizable composition and may be used to prepare new polymers, (for example by reacting the alkene group).
    Type: Grant
    Filed: May 11, 2017
    Date of Patent: February 5, 2019
    Assignee: Sirrus, Inc.
    Inventors: Aniruddha Palsule, Jeffrey M. Sullivan, Kshitij K. Parab, Ami Doshi, Alexander R. Holzer, Matthew Reilman
  • Patent number: 10087283
    Abstract: Disclosed are compositions comprising polyester macromers containing in one or more chains the residue of one or more diols and one or more diesters wherein the residue of the one or more diols and the one or more diesters alternate along the chain and a portion of the diesters are 1,1-diester-1-alkenes, and optionally one or more dihydrocarbyl dicarboxylates, and at least one terminal end comprises the residue of one of the 1,1-diester-1 alkenes and wherein one or more terminal ends may comprise the residue of one or more diols. The chains may contain the residue of the one or more diols and one or more diesters comprising one or more diesters 1,1-diester-1 alkenes and optionally one or more dihydrocarbyl dicarboxylates randomly disposed along the chains. Disclosed are methods of preparing the polyester macromers and incorporating them in a variety of polyester containing compositions such as coatings and films.
    Type: Grant
    Filed: March 29, 2017
    Date of Patent: October 2, 2018
    Assignee: SIRRUS, INC.
    Inventors: Aniruddha Palsule, Jeffrey M. Sullivan, Kshitij K. Parab, Elliott King, William Barrett
  • Patent number: 9932680
    Abstract: Electropolymerizable systems are disclosed. The electropolymerizable systems include an electropolymerizable composition including one or more 1,1-disubstituted alkene compounds and one or more conductive synergists.
    Type: Grant
    Filed: March 29, 2017
    Date of Patent: April 3, 2018
    Assignee: Sirrus, Inc.
    Inventors: Peter Rulon Stevenson, Jeffrey M. Sullivan
  • Patent number: 9745413
    Abstract: Disclosed are compositions comprising polyester macromers containing in one or more chains the residue of one or more diols and one or more diesters wherein the residue of the one or more diols and the one or more diesters alternate along the chain and a portion of the diesters are 1,1-diester-1-alkenes, and optionally one or more dihydrocarbyl dicarboxylates, and at least one terminal end comprises the residue of one of the 1,1-diester-1 alkenes and wherein one or more terminal ends may comprise the residue of one or more diols. The chains may contain the residue of the one or more diols and one or more diesters comprising one or more diesters 1,1-diester-1 alkenes and optionally one or more dihydrocarbyl dicarboxylates randomly disposed along the chains. Disclosed are methods of preparing the polyester macromers and incorporating them in a variety of polyester containing compositions such as coatings and films.
    Type: Grant
    Filed: February 20, 2017
    Date of Patent: August 29, 2017
    Assignee: SIRRUS, INC.
    Inventors: Aniruddha Palsule, Jeffrey M. Sullivan, Kshitij K. Parab, Elliott King, William Barrett
  • Patent number: 9617377
    Abstract: Disclosed are compositions comprising polyester macromers containing in one or more chains the residue of one or more diols and one or more diesters wherein the residue of the one or more diols and the one or more diesters alternate along the chain and a portion of the diesters are 1,1-diester-1-alkenes, and optionally one or more dihydrocarbyl dicarboxylates, and at least one terminal end comprises the residue of one of the 1,1-diester-1 alkenes and wherein one or more terminal ends may comprise the residue of one or more diols. The chains may contain the residue of the one or more diols and one or more diesters comprising one or more diesters 1,1-diester-1 alkenes and optionally one or more dihydrocarbyl dicarboxylates randomly disposed along the chains. Disclosed are methods of preparing the polyester macromers and incorporating them in a variety of polyester containing compositions such as coatings and films.
    Type: Grant
    Filed: August 11, 2016
    Date of Patent: April 11, 2017
    Inventors: Aniruddha Palsule, Jeffrey M. Sullivan, Kshitij K. Parab, Elliott King, William Barrett
  • Patent number: 9617354
    Abstract: Electropolymerizable compositions are disclosed. Certain electropolymerizable compositions include one or more 1,1-disubstituted alkene compounds and one or more conductive synergists. Other certain electropolymerizable compositions include one or more 1,1-disubstituted alkene compounds and one or more acid stabilizers and one or more free radical stabilizers.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: April 11, 2017
    Assignee: Sirrus, Inc.
    Inventors: Peter Rulon Stevenson, Jeffrey M. Sullivan
  • Publication number: 20150132688
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Application
    Filed: January 26, 2015
    Publication date: May 14, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Natsumi YOKOKAWA, Shuji HIRANO, Hiroo TAKIZAWA, Wataru NIHASHI
  • Patent number: 9029489
    Abstract: The invention provides intermediates of the formula: as well as a method of their preparation by reacting a thiol having at least two hydroxyl groups with a mono-unsaturated organic compound in the presence of a base catalyst. A polymerizable urethane acrylate oligomer or urethane methacrylate oligomer is formed by reacting a polyisocyanate with the intermediate. The polymerizable urethane acrylate oligomer or urethane methacrylate is blended with a polymerization initiator to form a composition which is useful in such applications as adhesives.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: May 12, 2015
    Assignee: Dymax Oligomers and Coatings LLC
    Inventors: James H. Aerykssen, Ahmet Nebioglu, Richard D. Zopf, Igor V. Khudyakov
  • Publication number: 20150064626
    Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Application
    Filed: July 14, 2014
    Publication date: March 5, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa
  • Publication number: 20150044457
    Abstract: Disclosed is an adhesive composition comprising a low Tg (meth)acrylate copolymer component, a high Tg (meth)acrylate copolymer component, and a hydrogenated hydrocarbon tackifier. This disclosure provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles that are particularly useful in the bonding of low surface energy (LSE) substrates.
    Type: Application
    Filed: November 12, 2012
    Publication date: February 12, 2015
    Inventors: Zhong Chen, Kelly S. Anderson, Jingjing Ma, Emilie L. Rexeisen
  • Patent number: 8926872
    Abstract: The present invention relates to an acrylic copolymer resin containing: 1) an alkyl (meth)acrylate-based monomer; 2) a (meth)acrylate-based monomer containing an aliphatic ring and/or an aromatic ring; and 3) at least an imide-based monomer or a styrene-based monomer, to a resin composition containing said acrylic copolymer resin and a resin containing an aromatic ring and/or an aliphatic ring in the main chain thereof, to an optical film comprising said resin composition, and to a liquid crystal display device comprising said optical film. The optical film according to the present invention has excellent heat resistance, optical transparency, etc.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: January 6, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Su-Kyung Kim, Byoung-Il Kang, Dae-Woo Lee, Byoung-Kue Chun, Chang-Hun Han, Da-Eun Sung
  • Publication number: 20140370429
    Abstract: The instant disclosure describes methacrylate coated carrier resins with hydrophobic substituents for charge control and improved RH sensitivity.
    Type: Application
    Filed: June 14, 2013
    Publication date: December 18, 2014
    Inventors: Richard PN Veregin, Qingbin Li, Andriy Kovalenko, Sergey Gusarov, Daryl W. Vanbesien, Michael S. Hawkins
  • Publication number: 20140346399
    Abstract: A liquid crystal composition and a liquid crystal display device which includes the composition are provided. The liquid crystal composition contains a specific compound having a polymerizable group as a first component, and may contain a specific compound having a large negative dielectric anisotropy and a low minimum temperature as a second component, or a specific compound having a small viscosity or a large maximum temperature as a third component. The liquid crystal composition satisfies at least one of the following characteristics: a high maximum temperature of a nematic phase, a low minimum temperature of the nematic phase, a small viscosity, a suitable optical anisotropy, a large negative dielectric anisotropy, a large specific resistance, a high stability to ultraviolet light and a high stability to heat. Alternatively, a liquid crystal composition having a suitable balance regarding at least two of the aforementioned characteristics is also provided.
    Type: Application
    Filed: October 1, 2012
    Publication date: November 27, 2014
    Inventors: Yukihiro Fujita, Yoshimasa Furusato, Maiko Matsukuma
  • Publication number: 20140329980
    Abstract: The present invention provides multifunctional monomers, including, but not limited to include multifunctional methylene malonate and methylene beta-ketoester monomers; methods for producing the same; and compositions and products formed therefrom. The multifunctional monomers of the invention may be produced by transesterification or by direct synthesis from monofunctional methylene malonate monomers or methylene beta-ketoester monomers. The present invention further compositions and products formed from methylene beta-ketoester monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).
    Type: Application
    Filed: October 18, 2012
    Publication date: November 6, 2014
    Inventors: Bernard M. Malofsky, Adam G. Malofsky, Tanmoy Dey, Larry Hines, Matthew M. Ellison
  • Publication number: 20140316093
    Abstract: Provided is a polymer from which an encapsulant excellent in weather resistance and processability can be obtained when being used for an encapsulant for a solar cell. The polymer that has a main chain comprising repeating units represented by formula (1) and repeating units represented by formula (2) and satisfies requirements (a1), (a2), and (a3), (a1): the ratio of the number of the repeating units represented by formula (2) to the total number of the carbon atoms that constitute the main chain of the polymer is from 3.8% to 7.5%; (a2): the ratio X represented by formula (3) is from 82% to 100%; X=100×A/B??(3) (a3): the polymer has a melting point of 42° C. to 90° C. as measured with a differential scanning calorimeter.
    Type: Application
    Filed: November 14, 2012
    Publication date: October 23, 2014
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Hiroaki Yoda
  • Publication number: 20140309395
    Abstract: Disclosed is an optical film comprising a resin material containing a copolymer of 20 to 90% by weight of methyl methacrylate, 10 to 70% by weight of tert-butylcyclohexyl methacrylate represented by formula (I): and 0 to 20% by weight of a monomer other than methyl methacrylate and tert-butylcyclohexyl methacrylate, the optical film having been produced by drawing an undrawn film formed by melt-extruding the resin material by a factor of 1.4 to 6.0 in terms of area ratio.
    Type: Application
    Filed: September 25, 2012
    Publication date: October 16, 2014
    Inventors: Yasuhiro Koike, Akihiro Tagaya, Akira Matsuo, Sayako Uchizawa, Yasuo Matsumura
  • Patent number: 8859099
    Abstract: A laminate having excellent weatherability and abrasion resistance as well as adhesion. The laminate comprises a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: October 14, 2014
    Assignee: Teijin Chemicals, Ltd.
    Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
  • Publication number: 20140296444
    Abstract: Monomers, polymers and copolymers are provided that incorporate at least one naturally occurring phenolic compound, such as a plant phenol.
    Type: Application
    Filed: March 11, 2014
    Publication date: October 2, 2014
    Applicant: NDSU RESEARCH FOUNDATION
    Inventors: BRET JA CHISHOLM, SAMIM ALAM, MUKUND SIBI, SELVAKUMAR SERMADURAI
  • Publication number: 20140288230
    Abstract: The present invention provides methylene beta-ketoester monomers, methods for producing the same, and compositions and products formed therefrom. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester is reacted with a source of formaldehyde in a modified Knoevenagel reaction optionally in the presence of an acidic or basic catalyst, and optionally in the presence of an acidic or non-acidic solvent, to form reaction complex. The reaction complex may be an oligomeric complex. The reaction complex is subjected to further processing, which may be vaporization by contact with an energy transfer means in order to isolate the beta-ketoester monomer. The present invention further compositions and products formed from methylene beta-ketoester monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).
    Type: Application
    Filed: October 18, 2012
    Publication date: September 25, 2014
    Inventors: Bernard M. Malofsky, Adam G. Malofsky, Tanmoy Dey
  • Publication number: 20140253847
    Abstract: There is provided an optical film including an acrylic resin, wherein a tensile elastic modulus in a machine direction, which are abbreviated as EMD, and a tensile elastic modulus in a direction perpendicular to the machine direction, which is abbreviated as ETD, satisfy the relationship of Equation (1): EMD/ETD<0.8??Equation (1).
    Type: Application
    Filed: March 7, 2014
    Publication date: September 11, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Ryuji SANETO, Shusuke ARITA, Hiromichi FURUKAWA
  • Patent number: 8829068
    Abstract: The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: September 9, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Sunhwa Kim, Ho Chan Ji, Dongchang Choi, Han Soo Kim, Yoon Hee Heo, Changho Cho, Won Jin Chung
  • Patent number: 8809446
    Abstract: Substituted 3-oxopentanoates are disclosed that correspond to the following formula 1: in which R is hydrogen, or a methyl group; X is a straight-chain, branched, or cyclic alkyl or alkyl ether group having from 1 to 15 carbon atoms or aromatic group having from 6 to 15 carbon atoms; and Y1 and Y2 are independently hydrogen or an alkyl having 1 to 2 carbon atoms. Also disclosed are emulsion polymers, suspension polymers, and solution polymers that comprise residues from the substituted 3-oxopentanoate monomers, and that may also include one or more additional ethylenically unsaturated monomers. Also disclosed are coating compositions that include a latex emulsion polymer and the substituted 3-oxopentanoate monomer of formula 1 provided as a coalescent.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: August 19, 2014
    Assignee: Eastman Chemical Company
    Inventors: John Thorton Maddox, Robert Lee Eagan
  • Patent number: 8809447
    Abstract: Acetoacetate-functional monomers are disclosed that correspond to the following formula 1: in which R is hydrogen, or a methylgroup; X is a branched alkyl or a branched cyclic alkyl having from 5 to 8 carbon atoms; and Y1 and Y2 are independently hydrogen or methyl. Also disclosed are emulsion, suspension, and solution polymers comprising residues from the acetoacetate-functional monomer of formula 1 and one or more additional ethylenically unsaturated monomers. Self-curing coating compositions are likewise disclosed that comprise the acetoacetate-functional monomer of formula 1, and optionally one or more additional ethylenically unsaturated monomers. Latex formulations are also disclosed that comprise a polymer having residues from the acetoacetate-functional monomer of formula 1 dispersed in an evaporable aqueous carrier.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: August 19, 2014
    Assignee: Eastman Chemical Company
    Inventors: John Thorton Maddox, Stacey James Marsh
  • Patent number: 8802784
    Abstract: Disclosed herein are copolymers comprising functional groups attached to the backbone of the polymer and methods of making these polymers.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: August 12, 2014
    Inventor: Joseph W. Bruno
  • Publication number: 20140212813
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Application
    Filed: April 2, 2014
    Publication date: July 31, 2014
    Applicant: JSR CORPORATION
    Inventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
  • Patent number: 8765891
    Abstract: It is an object of the present invention to provide a laminate having excellent weatherability and abrasion resistance as well as adhesion. The present invention relates to a laminate comprising a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: July 1, 2014
    Assignee: Teijin Chemicals, Ltd.
    Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
  • Publication number: 20140154616
    Abstract: Disclosed is a coloring composition with satisfactory heat resistance, no discoloration, excellent developability, and no development residues on a substrate and pixels of other colors, providing, a coloring composition for a color filter including (A) a polymer having a dye skeleton and (B) an organic solvent, wherein the content of an unreacted monomer component having the dye skeleton which is capable of forming (A) the polymer having the dye skeleton is less than or equal to 1 mass % with regard to (A) the polymer having the dye skeleton.
    Type: Application
    Filed: February 10, 2014
    Publication date: June 5, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Yuzo NAGATA, Hiroaki IDEI, Atsuyasu NOZAKI, Kenta USHIJIMA, Yushi KANEKO, Yousuke MURAKAMI
  • Patent number: 8735045
    Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.
    Type: Grant
    Filed: October 25, 2010
    Date of Patent: May 27, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tomoyuki Hirano, Daiju Shiono, Daichi Takaki
  • Publication number: 20140045123
    Abstract: A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.
    Type: Application
    Filed: August 1, 2013
    Publication date: February 13, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa
  • Publication number: 20140044961
    Abstract: A pressure-sensitive adhesive capable of forming a pressure-sensitive adhesive layer with high transparency and low sebum-induced swelling rate is provided, which includes a (meth)acryl-based polymer obtained by polymerization of a monomer component containing 40 to 82% by weight of an alkyl(meth)acrylate having an alkyl group of 4 to 18 carbon atoms at the ester end and 18 to 35% by weight of a hydroxyl group-containing monomer.
    Type: Application
    Filed: August 8, 2013
    Publication date: February 13, 2014
    Applicant: NITTO DENKO CORPORATION
    Inventors: Yoshihito TAKAMI, Hirofumi KATAMI, Hiroaki KISHIOKA
  • Patent number: 8637624
    Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.
    Type: Grant
    Filed: July 6, 2013
    Date of Patent: January 28, 2014
    Assignee: Rhodia Operations
    Inventors: Hui Shirley Yang, Derek Pakenham, Herve Adam, Pierre Hennaux
  • Publication number: 20130345383
    Abstract: Branched and hyperbranched oligomers and polymers that contain a cashew nutshell oil or liquid component are provided. The novel oligomers and polymers are suitable for use as an oil, lubricant, coating, adhesive, resin or composite.
    Type: Application
    Filed: January 6, 2012
    Publication date: December 26, 2013
    Applicant: NDSU RESEARCH FOUNDATION
    Inventors: Zhigang Chen, Ren Liu
  • Publication number: 20130338302
    Abstract: To provide an inkjet ink polymer capable of providing an inkjet ink capable of forming a printed product having excellent weather resistance, print density (coloring properties), and fixability (abrasion properties) with good productivity and providing a pigment dispersion having excellent dispersibility with good productivity. An inkjet ink copolymer contains 10 to 99% by weight of a cyclohexyl methacrylate unit and 1 to 90% by weight of an acrylic acid unit. The purpose is achieved by an inkjet ink pigment dispersion containing the inkjet ink copolymer and a pigment.
    Type: Application
    Filed: February 28, 2012
    Publication date: December 19, 2013
    Applicant: SANYO COLOR WORKS, LTD.
    Inventors: Minoru Yoshida, Atsushi Ishikawa, Yoshiya Kobayashi, Kazuki Sase, Eiji Morimoto
  • Patent number: 8603728
    Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising ?-diketone, ?-ester-ketone, ?-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).
    Type: Grant
    Filed: May 29, 2012
    Date of Patent: December 10, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gregory P. Prokopowicz, Gerhard Polhers, Mingqi Li, Chunyi Wu, Cong Liu, Cheng-bai Xu
  • Publication number: 20130309411
    Abstract: The present invention provides a birefringent lens material for a stereoscopic image display, the birefringent lens material containing two or more liquid crystal compounds each having at least one polymerizable functional group, a birefringent lens for a stereoscopic image display, the birefringent lens being formed by using the lens material, and a method for producing a birefringent lens for a stereoscopic image display using the lens material. The birefringent lens material for a stereoscopic image display and the birefringent lens for a stereoscopic image display of the present invention are good in terms of optical characteristics, durability, and productivity, in particular, productivity. The method for producing a birefringent lens for a stereoscopic image display of the present invention has good productivity.
    Type: Application
    Filed: December 20, 2011
    Publication date: November 21, 2013
    Applicant: DIC CORPORATION
    Inventors: Yasuhiro Kuwana, Hiroshi Hasebe
  • Publication number: 20130296516
    Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.
    Type: Application
    Filed: July 6, 2013
    Publication date: November 7, 2013
    Inventors: Hui Shirley YANG, Derek PAKENHAM, Herve ADAM, Pierre HENNAUX
  • Publication number: 20130288180
    Abstract: A polymer for use in resist compositions is obtained from a monomer having formula (1) wherein R1 is methyl, ethyl, propyl, vinyl or ethynyl, the circle designates C3-C12 cycloalkyl, a combination wherein R1 is ethyl and the circle is cyclohexyl being excluded, R2 is H or C1-C4 alkyl, and m is 1 to 4.
    Type: Application
    Filed: April 3, 2013
    Publication date: October 31, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa
  • Publication number: 20130289211
    Abstract: The invention discloses a cross-linked polymer particle for an epoxy resin, an epoxy resin composition containing the cross-linked polymer particle, the epoxy resin and a curing agent, and an epoxy cured material having qualities of colorless transparency and crack resistance as a result of curing the resin composition. The cross-linked polymer particle for the epoxy resin contains a (meth)acrylate monomer unit and a crosslinking monomer unit, wherein a volume average primary particle diameter is 0.5 to 10 ?m, and a glass transition temperature of the monomer components excluding the crosslinking monomer is 30° C. or more by FOX formula calculation, and the refractivity at 23° C. is 1.490 to 1.510.
    Type: Application
    Filed: January 10, 2012
    Publication date: October 31, 2013
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Hiroyuki Nishii, Toshihiro Kasai
  • Patent number: 8568624
    Abstract: The present invention relates to an acrylic copolymer resin containing: 1) an alklyl (meth)acrylate-based monomer; 2) a (meth)acrylate-based monomer containing an aliphatic ring and/or an aromatic ring; and 3) at least an imide-based monomer or a styrene-based monomer, to a resin composition containing said acrylic copolymer resin and a resin containing an aromatic ring and/or an aliphatic ring in the main chain thereof, to an optical film comprising said resin composition, and to a liquid crystal display device comprising said optical film. The optical film according to the present invention has excellent heat resistance, optical transparency, etc.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: October 29, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Su-Kyung Kim, Byoung-Il Kang, Dae-Woo Lee, Byoung-Kue Chun, Chang-Hun Han, Da-Eun Sung
  • Patent number: 8557501
    Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
    Type: Grant
    Filed: March 21, 2012
    Date of Patent: October 15, 2013
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Libor Vyklicky, Pushkara Rao Varanasi
  • Patent number: 8519073
    Abstract: A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure.
    Type: Grant
    Filed: October 15, 2007
    Date of Patent: August 27, 2013
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix Corporation
    Inventors: Yoshiyuki Utsumi, Hiroaki Shimizu, Kyoko Ohshita, Toshiharu Shimamaki, Kenshin Niwa, Seihin Shu
  • Publication number: 20130216951
    Abstract: A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.
    Type: Application
    Filed: March 29, 2013
    Publication date: August 22, 2013
    Applicant: JSR CORPORATION
    Inventor: JSR Corporation
  • Patent number: 8501033
    Abstract: The invention relates to a liquid radiation curable resin capable of curing into a solid upon irradiation comprising: (A) from about 0 to about 12 wt % of a cycloaliphatic epoxide having a linking ester group; (B) from about 30 to about 65 wt % of one or more epoxy functional components other than A; (C) from about 10 to about 30 wt % of one or more oxetanes; (D) from, about 1 to about 10 wt % of one or more polyols; (E) from about 2 to about 20 wt % of one or more radically curable (meth)acrylate components; (F) from about 2 to about 12 wt % of one or more impact modifiers; (G) from about 0.1 to about 8 wt % of one or more free radical photoinitiators; and (H) from about 0.1 to about 8 wt % of one or more cationic photoinitiators; wherein the liquid radiation curable resin has a viscosity at 30° C. of from about 600 cps to about 1300 cps.
    Type: Grant
    Filed: March 12, 2010
    Date of Patent: August 6, 2013
    Assignee: DSM IP Assets B.V.
    Inventors: John Southwell, Brett A. Register, Satyendra Kumar Sarmah, Paulus Antonius Maria Steeman, Beert Jacobus Keestra, Marcus Matheus Driessen
  • Publication number: 20130177848
    Abstract: A polymer containing a repeating unit represented by the following general formula (1) and a repeating unit having an acid-releasable group.
    Type: Application
    Filed: September 9, 2011
    Publication date: July 11, 2013
    Applicant: CENTRAL GLASS COMPANY LIMITED
    Inventors: Yusuke Kanto, Shinichi Sumida, Kazuhiko Maeda
  • Patent number: 8461252
    Abstract: The instant disclosure describes methods for preparing latex resins for coated carriers using surfactant partitioning, which resins exhibit both lower ? potential and greater latex stability, while not adversely affecting particle size, toner charge or other metrics.
    Type: Grant
    Filed: November 12, 2011
    Date of Patent: June 11, 2013
    Assignee: Xerox Corporation
    Inventors: Daryl W Vanbesien, Michael Steven Hawkins, Corey Tracy, Richard P N Veregin, Karen A Moffat, Paul Joseph Gerroir, Thomas E Enright, Valerie Farrugia
  • Patent number: 8455598
    Abstract: In a process for producing a functionalized polyalkenamer, at least one monomer comprising a monocyclic olefin having at least one pendant alkyl group bonded thereto, wherein the pendant alkyl group has at least two carbon atoms and is substituted with a polar moiety spaced by at least one carbon atom from the monocyclic olefin, is contacted with a polymerization catalyst under conditions effective to effect ring opening polymerization of the monocyclic olefin and produce the functionalized polyalkenamer.
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: June 4, 2013
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Lisa Saunders Baugh, Enock Berluche, Karla Schall Colle
  • Patent number: 8449954
    Abstract: The present invention relates to a specific photoreactive polymer that shows excellent alignment stability and thermal stability together with excellent liquid crystal alignment, thereby being desirably used in an alignment film of a liquid crystal display device, a compound having a photoreactive functional group that is used as a monomer for the preparation of the photoreactive polymer, and an alignment film.
    Type: Grant
    Filed: July 6, 2011
    Date of Patent: May 28, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Dai-Seung Choi, Sung-Ho Chun, Young-Chul Won, Dong-Woo Yoo
  • Publication number: 20130116396
    Abstract: The present invention relates to materials used for aligning liquid crystals of liquid crystal display elements and to a polymer for use in liquid crystal vertical alignment layer used in producing a liquid crystal vertical alignment layer. The polymer for use in a liquid crystal vertical alignment layer includes (a) a moiety that is photochemically isomerizable but not photochemically crosslinked, (b) a moiety that is photochemically crosslinkable, and (c) a moiety that stabilizes a vertical alignment. The polymer can be used to produce a vertical alignment layer that has a liquid crystal alignment property enabling control of alignment at a low UV dose and that offers a large pretilt angle and superior optical stability.
    Type: Application
    Filed: March 29, 2011
    Publication date: May 9, 2013
    Applicant: DIC CORPORATION
    Inventors: Sayaka Nose, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu, Martin Schadt, Vladimir Chigrinov, Hoi Sing Kwok
  • Publication number: 20130109825
    Abstract: A polymerizable composition containing a compound represented by the formula (I) or the formula (I?) is useful for formation of films having a high ?n with no coloration. P1 and P2 each are a polymerizable group; m1 and m2 each are an integer of from 1 to 10; A1 to A4 each are a predetermined cyclic group; R is a hydrogen atom or an alkyl; in the formula (I), Z1 is —COO—, —COO—, —OCO—CH?CH—, —NHCO— or —NR1CO—; L1 and L2 each are —O—, —S—, —COO—, —COO—, —OCO—CH?CH—, —OCOO—, —NHCO— or —NR1CO; n1 is 1 or 2; in the formula (I?), Z1 and Z2 each are —COO—, —OCO—, —NHCO— or NR1CO; L1 and L2 each are —O—, —S—, —COO—, —OCO—, —OCOO—, —NHCO— or NR1CO; n1 and n2 each are 1 or 2.
    Type: Application
    Filed: December 17, 2012
    Publication date: May 2, 2013
    Applicant: FUJIFILM CORPORATION
    Inventor: FUJIFILM Corporation
  • Patent number: 8431325
    Abstract: A compound of the present invention is represented by the formula (A); wherein R1 represents a hydrogen atom or a C1 to C6 alkyl group; Z1 represents a single bond, —CO—O—* or —CO—O—(CH2)k—CO—O—*; Z2 represents a single bond, *—O—CO—, *—CO—O—, *—O—(CH2)k—CO—, *—CO—(CH2)k—O—, *—O—(CH2)k—CO—O—, *—O—CO—(CH2)k—O— or *—O—CO—(CH2)k—O—CO—; k represents an integer of 1 to 6; * represents a binding position to W; W represents a C4 to C36 (n+1) valent alicyclic hydrocarbon group or a C6 to C18 (n+1) valent aromatic hydrocarbon group, one or more hydrogen atoms contained in the alicyclic hydrocarbon group and the aromatic hydrocarbon group may be replaced by a halogen atom, a C1 to C12 alkyl group, a C1 to C12 alkoxy group, a C2 to C4 acyl group or —OR10; R10 represents a hydrogen atom or a group represented by the formula (R2-2); R2 represents a hydrogen atom, a group represented by the formula (R2-1) or (R2-2); n represents an integer of 1 to 3; R4, R5 and R6 independently represent a C1 to C12 hydrocarbon group
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: April 30, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kazuhiko Hashimoto, Koji Ichikawa