Abstract: To provide a novel fluoroadamantane derivative, a novel polymerizable fluoroadamantane derivative and a novel fluoropolymer, and processes for production thereof. To provide the following compound (3), the following compound (4), a polymer obtained by polymerizing the compound (4) and processes for production thereof: provided that Q represents —CHF— or —CF2— (provided that six Qs may be the same or different), Z represents —H, —F or —CH2OH (provided that three Zs may be the same or different), W represents —H or a C1-10 hydrocarbon group, R represents —H, —F, —CH3 or —CF3, and J represents —H, —F, —CHWOH or —CHWOCOCR?CH2 (provided that three Js may be the same or different).

Abstract: The present invention provides; a polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist; a positive resist composition using the same; a patterning process; and a novel polymerizable compound to obtain a polymer like this. The present invention was accomplished by a polymer whose hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.

Abstract: A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below: wherein R1 is a C1-C20 hydrocarbon group or a C1-C20 hetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.

Abstract: A composition comprising (A) at least one fluorinated vinylcyclopropane according to Formula (I) wherein R1 is H or —CO—O—(CH2CH2)p—R7; R2 is H or forms together with R6 a —CH2—C(R9)(R10)—CH2— residue; R3 is H; R4 is H or forms together with R5—CH2—C(R9)(R10)—CH2— residue; R5 is H, —CO—O—R8, —CO—O—(CH2CH2)p—R7 or forms together with R4—CH2—C(R9)(R10)—CH2— residue; R6 is H, —CO—O—R8, —CO—O—(CH2CH2)p—R7 or forms together with R2 a —CH2—C(R9)(R10)—CH2— residue; R7 is perfluorinated C2-C20 aliphatic or alicyclic group; R8 is H, phenyl, benzyl, or a linear or branched C1-C12 aliphatic or alicyclic group; R9 is a H, benzoyl, acetyl or a C1-C5-alkyl group; R10H or a —CO—O—R8; p is 1, 2, 3, or 4, provided that the compound of Formula (I) comprises at least one —CO—O—(CH2CH2)p—R7 residue; (B) at least one non-fluorinated vinylcyclopropane derivative; (C) a bisphenol-A-ether di(meth)acrylate according to Formula (II) wherein R18 is H or CH3, R19 is CH3 or CF3, Y is a C2-C5-alkylen residue which can be substitu

Abstract: Bicyclic cyclopropane derivatives of the general Formula (I) in which n+m is 0 to 8; r is 1 to 4; R1 is absent or is a C1-C20 alkylene radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, a bicyclic C4-C12 radical, a C6-C14 arylene or C7-C20 alkylenearylene radical; R2 is for r=1 a C1-C20 alkyl radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, a bicyclic C4-C12 radical, a C6-C14 aryl or a C7-C20 alkylaryl radical; is for r>1 an r-times substituted aliphatic C1 to C20 radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, an aromatic C6-C14 radical or aliphatic-aromatic C7-C20 radical; X is absent or is —CO—O—, —CO—NH— or —O—CO—NH—, and Y is CH2, O or S which is suitable in particular for the preparation of dental materials.

Abstract: Ion exchange resins are described that are hydrophilic, crosslinked (meth)acrylic copolymers. The ion exchange resins are macroporous, have a surface area of at least 50 m2/g, and an average particle size of at least 20 micrometers. Additionally, chromatographic columns containing the ion exchange resins, composite materials containing the ion exchange resin, filtration elements containing the ion exchange resin, methods of preparing the ion exchange resins, and methods of separating or purifying negatively or positively charged materials with the ion exchange resins are described.

Abstract: A process for producing a polymer, characterized by comprising the following step (A) and step (B). (A) A step in which a polymer having repeating units represented by the general formula (1): —Ar1— (wherein Ar1 represents an arylene, divalent heterocyclic, or divalent aromatic amine group having at least one C—H bond on the aromatic ring) is used as a raw material and one or more of the C—H bond(s) on the aromatic ring are converted to thereby produce a polymer having repeating units which have one or more characteristic groups X and are represented by the general formula (2): (wherein X represents a characteristic group; Ar2 represents an arylene group, heterocyclic group, or aromatic amine group which each has a valence of n+2 and in each of which n of the C—H bonds on the aromatic ring of Ar1 have been converted into a C—X bond; and n is an integer of 1-4) (hereinafter, this polymer is referred to as polymer having the characteristic group (X)).

Abstract: An organic polyisocyanate with at least one unsaturated functional group is capable of copolymerizing when exposed to actinic radiation. The polyisocyanate comprises structural units with the formula (1): wherein: X is an electron-attracting group; R1, and R2 are hydrogen atoms, a saturated or unsaturated aliphatic or cycloaliphatic radical, or an aromatic or araliphatic radical; and n is an integer from 0 to 5. A process for producing this polyisocyanate is also disclosed.

Abstract: The invention relates to copolymers made from monoethylenically unsaturated monomers with acid groups and a further hydrophobic monomer component for the prevention of inorganic and organic deposits in water supply systems. The invention further relates to a method for production of the above.

Abstract: The present invention provides a novel polymer having oxocarbon groups which is particularly useful in battery and fuel cell applications.

Abstract: The present invention provides a novel polymer composed of polyarylene in the main chain and having oxocarbon groups which is particularly useful in battery and fuel cell applications.

Abstract: Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 ?/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip. Also disclosed is a method of forming a pattern in the material layer of the coated substrate.

Abstract: A process for preparing a pressure-sensitive polyacrylate adhesive, characterized in that a polyacrylate composition including the atomic sequence C—S—C is admixed with at least one metal compound of type (L)yM where M=metal atom or metal ion L=counterion or ligand y=0 to 6.

Abstract: A polymer including a monomer represented by the following Formula and a photoresist composition including the same are disclosed. The polymer and photoresist composition can improve the resolution and the process margin due to the low activation energy of the deprotection reaction of the alcohol ester group including saturated cyclic hydrocarbyl group, and also can produce fine photoresist patterns because they have a stable PEB(Post Exposure Baking) temperature sensitivity, and further, can improve the focus depth margin and the line edge roughness of the resist layer. In the above Formula, R* is a hydrogen or methyl group, R1 is saturated hydrocarbyl group of 1 to 5 carbon atoms, R is mono-cyclic or multi-cyclic homo or hetero saturated hydrocarbyl group of 3 to 50 carbon atoms, and n is an integer of at least 2.

Abstract: In a process for producing a functionalized polyalkenamer, at least one monomer comprising a monocyclic olefin having at least one pendant alkyl group bonded thereto, wherein the pendant alkyl group has at least two carbon atoms and is substituted with a polar moiety spaced by at least one carbon atom from the monocyclic olefin, is contacted with a polymerization catalyst under conditions effective to effect ring opening polymerization of the monocyclic olefin and produce the functionalized polyalkenamer.

Abstract: It is intended to in a liquid-immersion exposure process, simultaneously prevent any degeneration, represented by bridge, etc., of resist film during the liquid-immersion exposure using water and other various liquid-immersion exposure liquids and any degeneration of liquid-immersion exposure liquids per se, and to without increasing of the number of treatment steps, realize enhancing of the post-exposure storage stability of resist film, and to enable forming of a resist pattern of high resolution through liquid-immersion exposure.

Abstract: A method of applying coating composition is described in which the coating composition comprises a multi-stage emulsion polymer that is both radiation curable, removable and includes chemically reactive functional groups in the coating that react with one or more conventional chemical stripping agents, effecting the removal of the coating from a substrate. The UV curable and removable composition is included within one or more layers applied on top of a substrate or on top of a base coat that itself is disposed on top of a substrate.

Abstract: The invention is based on the discovery that certain well-defined compounds derived from pentacyclopentadecane dimethanol are useful components in adhesive formulations. In particular, the invention compounds described herein provide high Tg values and low shrinkage. Compounds of the invention are useful as adhesives for use in the semiconductor packaging industry.

Abstract: A substituted (meth)acrylic copolymer leveling agent is useful in producing a ferroelectric polymer film that is especially suitable for use in a data processing device. Also disclosed is a a casting composition which includes the leveling agent, a film stack, and a data processing device comprising a ferroelectric film produced using the leveling agent.

Abstract: An acrylic rubber, comprising an alkoxyalkyl(meth)acrylate monomer unit in an amount of 70.1 to 99.8 wt %, a methacrylonitrile monomer unit in an amount of 0.1 to 9.9 wt % and a butenedionic acid monoester monomer unit in an amount of 0.1 to 20 wt %; and a cross-linkable acrylic rubber composition made by containing the acrylic rubber and a cross-linking agent. According to the invention, it is possible to provide a cross-linkable acrylic rubber composition having excellent scorch stability and an acrylic rubber cross-linked product, which can be obtained by cross-linking the cross-linkable acrylic rubber composition, having excellent heat resistance, cold resistance and fuel oil resistance.

Abstract: Aqueous coating compositions containing (1) a first polymer containing reactive functional groups with a selected level of carboxylic acid functionality and (2) a polyfunctional crosslinker agent containing functional groups that are reactive with appropriate functional groups of the first polymer, are disclosed. The two-component polymer compositions provide a combination of durability and ready removability of the final coating after curing. Two-component polymer compositions based on the first polymer containing hydroxyl functionality in addition to carboxylic acid functionality and use of a polyisocyanate as the polyfunctional crosslinker agent are especially useful as floor polish compositions.

Abstract: Azidoaryl-substituted cyclooctene monomers and synthesized and used in the preparation of various copolymers. Among these copolymers are those prepared from ring-opening metathesis polymerization of cyclooctene, polyethylene glycol-substituted cyclooctene, and azidoaryl-substituted cyclooctene. These copolymers are useful in the formation of crosslinked films that reduce fouling of water purification membranes.

Abstract: This invention relates to a silicone resin composition which exhibits high heat resistance, high transparency and high dimensional stability and thus can be suitably used for optical applications such as a lens, an optical disc, an optical fiber, a substrate for a plat panel display, a window material for an automobile, and the like.

Abstract: A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.

Abstract: A method of preparing a latex that includes pigments copolymerized with a crystalline polymer includes: dispersing a pigment and a dispersing agent in water having an ultra-high purity to obtain a pigment dispersion; dissolving a crystalline monomer in a basic monomer mixture to obtain an organic phase; dissolving while heating the dispersing agent in water having an ultra-high purity, and then mixing the solution with the pigment dispersion to obtain an aqueous phase; mixing and agitating the organic phase and the aqueous phase to obtain a homogenized solution; agitating and heating the homogenized solution; adding a polymerization initiator to the homogenized solution to be reacted; and cooling the reaction solution to room temperature.

Abstract: A polymer consisting mainly of structural units represented by the general formula (1), wherein the total molar amount of terminal aldehyde groups and acetal groups is 0.6 mol % or smaller based on the total molar amount of the structural units represented by the general formula (1). —[—(—CHR1—)n—CX1R2—CX2R3-]— (1) (In the formula, n is an integer of 2 to 10; X1 and X2 each represents —H, —OH, or a functional group capable of being converted into —OH, provided that at least one of X1 and X2 is hydroxy or a functional group capable of being converted into hydroxy; and R1, R2, and R3 each represents —H or C1-5 alkyl, aryl, aralkyl, or heteroaryl and the two or more R1's may be different).

Abstract: A polymer, which contains a structural unit having a carboxyl group represented by the following formula (1) at a side chain of the structural unit, wherein node position is formed, when the polymer is dissolved in an alkali aqueous solution having a pH of 10 or more and kept at 25° C. for 60 days: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an (n+1)-valent organic linking group containing an ester group represented by —O(C?O)—; A represents an oxygen atom or NR3—; R3 represents a hydrogen atom, or an monovalent hydrocarbon group having from 1 to 10 carbon atoms; and n indicates an integer of from 1 to 5.

Abstract: The interlayer insulating film of this invention is composed of a polymer in which a first monomer having four substituted acetylenyl groups and polymerizable in the three-dimensional direction and a second monomer having two substituted cyclopentanonyl groups and polymerizable in the two-dimensional direction are three-dimensionally polymerized.

Abstract: A coating composition is described comprising a multi-stage emulsion polymer that is both radiation curable, removable and includes chemically reactive functional groups in the coating that react with one or more conventional chemical stripping agents, effecting the removal of the coating from a substrate. The UV curable and removable composition is included within one or more layers applied on top of a substrate or on top of a base coat that itself is disposed on top of a substrate.

Abstract: There is provided a fluorine-containing copolymer having an aliphatic monocyclic structure in the polymer trunk chain which has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (Ma): -(M1)-(M2a)-(N)—??(Ma) in which the structural unit M1 is a structural unit derived from an ethylenic monomer having 2 or 3 carbon atoms and at least one fluorine atom, the structural unit M2a is at least one structural unit which introduces an aliphatic monocyclic structure in the polymer trunk chain and is represented by the formula (a): wherein R1 is at least one hydrocarbon group selected from the group consisting of a divalent hydrocarbon group having 1 to 8 carbon atoms and constituting a ring which may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group and a divalent hydrocarbon group having ether bond which has the sum of carbon atoms and oxygen atoms of 2 to 8, constitutes a ring and may be further substituted with a hydrocarbon group o

Abstract: The present invention relates to block copolymers for applications in medicine and biotechnology and synthesis thereof. Block copolymers comprise polyvalent N-Acetyl Glucosamine (NAG) which bind more efficiently to lysozyme than NAG itself. The effective inhibition is possible even at very low ligand concentrations than reported earlier. The block copolymers could be used for prevention and treatment of bacterial and viral infections. Moreover these polymers can be stimuli sensitive and be used for the recovery of biomolecules. The methodology of preparation of block copolymers reported here can be extended to other polymers and ligands such as sialic acid and used for preventing influenza and/or rotavirus infections. It also provides a method for preparation of block copolymers wherein polymers comprising sequences of specific ligands are essential.

Abstract: The present invention provides a processing aid for thermoplastic resin having a weight average molecular weight of 10,000 to 300,000, which is obtained by polymerizing an alkyl (meth)acrylate, or an alkyl (meth)acrylate and another vinyl monomer copolymerizable therewith, in the presence of a mercaptan having an alkyl ester group with C4-20 alkyl group as a chain transfer agent, and/or an organic peroxide having a tertiary-butyl peroxy group as a polymerization initiator.

Abstract: Ion exchange resins are described that are hydrophilic, crosslinked (meth)acrylic copolymers. The ion exchange resins are macroporous, have a surface area of at least 50 m2/g, and an average particle size of at least 20 micrometers. Additionally, chromatographic columns containing the ion exchange resins, composite materials containing the ion exchange resin, filtration elements containing the ion exchange resin, methods of preparing the ion exchange resins, and methods of separating or purifying negatively or positively charged materials with the ion exchange resins are described.

Abstract: Embodiments in accordance with the present invention encompass photo-imageable compositions that include polymers of acrylate-type monomers and norbornene-type monomers. In some embodiments a catalyst system comprising a cationic or a neutral Pd(II) dimer component having the formula (Allyl)Pd(P(R21)3) or (L?)[(L)Pd(R)(X)]2, respectively is employed to effect polymerization. In other embodiments a free radical or living free radical catalyst is employed to effect polymerization. At least one of the acrylate-type monomers and norbornene-type monomers of the polymer embodiments of the present invention encompass an acid labile moiety. Some polymer embodiments of the present invention include more than one type of acrylate-type monomer and norbornene-type monomer. Embodiments of the present invention include forming a patterned layer on a substrate and some embodiments include transferring the patterned structure to a material layer first formed on the substrate.

Abstract: This invention relates to the reversible protection of hydroxy-silane functional groups by acid cleavable protecting groups. The development of reversible protecting groups greatly enhances the current utility of silanes while introducing further novel applications. For instance, reversibly protected silanes are of particular value in applications where room temperature cure and/or adhesion is of value, such as coatings, high resolution imaging, caulks, adhesives, sealents, gaskets, and silicones. Reversibly protected silanes can also be beneficially used in reticulating agents, and in sizing agents, tires, and release coatings. The incorporation of reversibly protected silanes into coating resins is of particular value. The reversibly protected silane can be incorporated into the coating resin by polymerizing a monomer containing the reversibly protected silane into the resin or by post-addition into the coating formulation.

Abstract: The present invention relates compositions containing acetoacetylated polyvinyl polymers obtained from polyvinyl polymers, such as polyvinyl butyrals. These coating compositions are especially suitable for use as wash primers in automotive OEM and refinish coating applications.

Abstract: In accordance with the present invention, there are provided novel heterobifunctional monomers and users for the same. Invention compounds have many of the properties required by the microelectronics industry, such as, for example, hydrophobicity, high Tg values, low dielectric constant, ionic purity, low coefficient of thermal expansion (CTE), and the like. These properties result in a thermoset that is particularly well suited to high performance applications where typical operating temperatures are often significantly higher than those at which prior art materials were suitable. Invention compounds are particularly ideal for use in the manufacture of electronic components, such as, for example, printed circuit boards, and the like.

Abstract: The present invention relates compositions containing acetoacetylated polyvinyl polymers obtained from polyvinyl polymers, such as polyvinyl butyrals. These coating compositions are especially suitable for use as wash primers in automotive OEM and refinish coating applications.

Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R?)zM(L?)x(L?)y]b[WCA]d wherein [(R?)zM(L?)x(L?)y] is a cation complex where M represents a Group 10 transition metal; R? represents an anionic hydrocarbyl containing ligand; L? represents a Group 15 neutral electron donor ligand; L? represents a labile neutral electron donor ligand; x is 1 or 2; and y is 0, 1, 2, or 3; and z is 0 or 1, wherein the sum of x, y, and z is 4; and [WCA] represents a weakly coordinating counteranion complex; and b and d are numbers representing the number of times the cation complex and weakly coordinating counteranion complex are taken to balance the electronic charge on the overall catalyst complex.

Abstract: This invention relates to a process for polymerizing polar substituted norbornenes and/or cycloalkenes, optionally, in the presence of another unsaturated compound. The method is characterized in that the polymerization is carried out in the presence of one or more tungsten carbine complexes.

Abstract: Aqueous coating compositions containing (1) a first polymer containing reactive functional groups with a selected level of carboxylic acid functionality and (2) a polyfunctional crosslinker agent containing functional groups that are reactive with appropriate functional groups of the first polymer, are disclosed. The two-component polymer compositions provide a combination of durability and ready removability of the final coating after curing. Two-component polymer compositions based on the first polymer containing hydroxyl functionality in addition to carboxylic acid functionality and use of a polyisocyanate as the polyfunctional crosslinker agent are especially useful as floor polish compositions.

Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions containing the same. The photoresist polymers include a repeating unit comprising the photoresist monomer of Formula 1 as a comonomer and the photoresist compositions containing the same have excellent etching resistance, heat resistance and adhesiveness to a wafer, and are developable in aqueous tetramethylammonium hydroxide (TMAH) solutions. In addition, the photoresist compositions have a low light absorbance at 157 nm wavelength, and thus are suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) in fabricating a minute circuit for a high integration semiconductor device. wherein Y1, Y2, Y3, Y4, Y5, Y6, Z1, Z2 and m are defined in the specification.

Abstract: A cyclic conjugated diene copolymer comprising a main chain comprised of (A) cyclic conjugated diene monomer units, (B) monomer units obtained from vinyl aromatic monomers each having a hydrogen atom at the &agr;-position thereof, and optionally (C) monomer units obtained from commoners which are other than the monomers used for obtaining the monomer units A and B and which are copolymerizable with at least one of the monomers used for obtaining the monomer units A and B, wherein all monomer units A and the monomer units B together form one or more polymer chains each having an A/B random sequence, wherein the one or more polymer chains each having an A/B random sequence contain at least one polymer chain having a number average molecular weight of from 20,000 to 500,000 and contain no polymer chain having a number average molecular weight of more than 500,000. A process for producing the above-mentioned cyclic conjugated diene copolymer by living anionic polymerization.

Abstract: Ruthenium and osmium carbene compounds that are stable in the presence of a variety of functional groups and can be used to catalyze olefin metathesis reactions on unstrained cyclic and acyclic olefins are disclosed. Also disclosed are methods of making the carbene compounds. The carbene compounds are of the formula where M is Os or Ru; R1 is hydrogen; R is selected from the group consisting of hydrogen, substituted or unsubstituted alkyl, and substituted or unsubstituted aryl; X and X1 are independently selected from any anionic ligand; and L and L1 are independently selected from any neutral electron donor. The ruthenium and osmium carbene compounds of the present invention may be synthesized using diazo compounds, by neutral electron donor ligand exchange, by cross metathesis, using acetylene, using cumulated olefins, and in a one-pot method using diazo compounds and neutral electron donors.

Abstract: An insulating material comprising a cycloolefin polymer, specifically, an interlayer insulating material for a high-density assembly board having interlayer-connecting via holes at most 200 &mgr;m in diameter, comprising a cycloolefin polymer containing at least 50 mol % of a repeating unit derived from a cycloolefin monomer; a dry film formed from a curable resin composition comprising a polymer having a number average molecular weight within a range of 1,000 to 1,000,000 as measured by gel permeation chromatography, and a hardener; and a resin-attached metal foil obtained by forming a film of a cycloolefin polymer on one side of a metal foil. Laminates, multi-layer laminates and build-up multi-layer laminates making use of these materials, and production processes thereof.

Abstract: To provide a liquid crystal display unit without occurrence of abnormal orientation of liquid crystal molecules and deterioration of the image quality and a method for manufacturing the same. Above and below a TFT, light shielding films are disposed and further the ruggedness generated by stacking a plurality of light shielding films is smoothed using a transparent resin not absorbing light with a wavelength of not smaller than 300 nm. As this transparent resin, acrylic resins are used. As a result, according to the present invention, no abnormal orientation of liquid crystal molecules occurs and a problem of reverse twist, reverse tilt or the like is less probable to take place. Since the smoothening film absorbs no light of not smaller than 300 nm, neither denaturalization nor coloration nor bubbles occur in the smoothening film even under irradiating environments of intense light of a projector or the like.

Abstract: A process for preparing polyacrylates, characterized in that the monomer mixture for preparing the polyacrylates is composed of at least 70% by weight of at least one acrylic monomer of the general formula where R1 is H or CH3 and R2 is H or an alkyl chain having 1-20 carbon atoms, the monomers are polymerized in the presence of at least one free-radical initiator by free-radical polymerization with at least one thioester as polymerization regulator, the average molecular weight of the polyacrylates is in the range from 250,000 g/mol to 1,000,000 g/mol, and the molecular weight distribution of the polyacrylates, Mw/Mn, is <4.

Abstract: A negative-chargeability control resin containing a specific vinyl copolymer imparts stable chargeability to toner. The vinyl copolymer is obtainable by copolymerizing a monomer composition which contains at least i) a vinyl monomer (A) as exemplified by N-acryloylmorpholine, N-isopropylacrylamide, N-methylmethacrylamide, N-butoxymethylacrylamide or N-t-butylacrylamide, or a vinyl monomer (B) as exemplified by vinyl butyrate, vinyl 2-ethylhexanoate, vinyl benzoate, vinyl monochloroacetate pivarate, and ii) a vinyl monomer (C) having as a functional group a carboxyl group or a carboxyl group made into salt structure.

Abstract: An insulating material comprising a cycloolefin polymer, specifically, an interlayer insulating material for a high-density assembly board having interlayer-connecting via holes at most 200 &mgr;m in diameter, comprising a cycloolefin polymer containing at least 50 mol % of a repeating unit derived from a cycloolefin monomer; a dry film formed from a curable resin composition comprising a polymer having a number average molecular weight within a range of 1,000 to 1,000,000 as measured by gel permeation chromatography, and a hardener; and a resin-attached metal foil obtained by forming a film of a cycloolefin polymer on one side of a metal foil. Laminates, multi-layer laminates and build-up multi-layer laminates making use of these materials, and production processes thereof.

Abstract: Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be effectively imaged with sub-200 nm radiation such as 193 nm radiation.