Nitrogen Bonded To Oxygen Atom (including Nitrogen Containing Salts) Patents (Class 526/311)
-
Patent number: 6649722Abstract: This invention is directed to ophthalmic materials and ophthalmic lenses that are a co-polymerization product of a (a) hydrophilic monomer with (b) a tris(siloxy)silyl group-containing monomer, (c) a wide variety of hydrophobic monomers (both aliphatic and aromatic) and usually a (d) polyfluorinated monomer, as well as optional monomers or monomer mixtures that can include a cationic monomer, a non-aromatic hydrophobic monomer and a poly(dimethylsiloxy)silyl group-containing monomer. A contact lens prepared from such a co-polymer exhibits enhanced water content, while maintaining exceptional oxygen permeability, thereby providing a lens that can be worn comfortably for prolonged periods of time. A process for the preparation of such lenses is also disclosed.Type: GrantFiled: December 6, 2000Date of Patent: November 18, 2003Assignee: Novartis AGInventors: Howard S. Rosenzweig, Michael H. Quinn, Robert Tucker, Greg Carlson, Gerardo J. Ocampo
-
Patent number: 6649718Abstract: A surface active agent composition is prepared including: a polymerizable monomer surface active agent and a polymerizable dimer surface active agent represented by the following chemical formula. In the following chemical formula, R1s each are independently an alkyl group having 8 to 30 carbon atoms, R2s each are independently hydrogen or a methyl group, As each are independently an alkylene group having 2 to 4 carbon atoms or a substituted alkylene group, and ns each are independently an integer from 0 to 200. The surface active agent composition is capable of providing for an emulsion exhibiting excellent mechanical stability and polymerization stability, which in turn is capable of forming a film having sufficiently high adhesion and water resistance.Type: GrantFiled: November 13, 2001Date of Patent: November 18, 2003Assignee: Dai-Ichi Kogyo Seiyaku Co., Ltd.Inventors: Toshiyuki Nishitani, Toshikazu Nabeshima, Hiroyuki Kurahashi
-
Patent number: 6630557Abstract: Compounds of general formula (I), the described methods to prepare these macromonomer compounds, and the copolymer products of these compounds with other vinyl monomers. Wherein W is a capping group; l is 0 or 1; n is 2-1000; m is 2-5; R1 is CH2═CH—CH2—, or CH2═CH—O—R8—; R2 is selected from H, CH2═CH—CH2—, and phenyl or alkyl and wherein R3-R7 is H1, C1-C4 alkyl, and quaternary salts thereof. When R7 and X— is absent, the polymer is amphiphilic. When R7 is alkyl and X— is an anion, the polymer is cationic polymer.Type: GrantFiled: March 13, 2002Date of Patent: October 7, 2003Inventors: Shiping Zhu, Youqing Shen, Robert Pelton
-
Patent number: 6599678Abstract: An organic anti-reflective polymer having the following Formula 1, its preparation method, an anti-reflective coating composition comprising the said organic anti-reflective polymer and a preparation method of an anti-reflective coating made therefrom. The anti-reflective coating comprising the disclosed polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices and improve the production yields. Further, it is also possible to control the k value and the increased hydrophobicity facilitates EBR (Edge Bead Removal).Type: GrantFiled: June 25, 2001Date of Patent: July 29, 2003Assignee: Hynix Semiconductor IncInventors: Sung-eun Hong, Min-ho Jung, Jae-chang Jung, Geun-su Lee, Ki-ho Baik
-
Patent number: 6582883Abstract: An organic anti-reflective polymer having the following Formula 1, its preparation method, an anti-reflective coating composition comprising the said organic anti-reflective polymer and a preparation method of an anti-reflective coating made therefrom. The anti-reflective coating comprising the polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices and improve the production yields. Another advantage is the ability to control the k value.Type: GrantFiled: June 25, 2001Date of Patent: June 24, 2003Assignee: Hynix Semiconductor Inc.Inventors: Sung-eun Hong, Min-ho Jung, Jae-chang Jung, Geun-su Lee, Ki-ho Baik
-
Patent number: 6579956Abstract: A method for producing a polymer by coordination polymerization, comprising the steps of (a) reacting an unsaturated polar monomer having a functional group releasing a proton or a salt of the unsaturated polar monomer, with a masking agent comprising a halogenated organometallic compound or a organoaluminum compound capable of masking the functional group to form a corresponding masked monomer; and (b) polymerizing the masked monomer either alone or in combination with another monomer in the presence of the coordination polymerization catalyst to obtain the polymer.Type: GrantFiled: June 7, 2001Date of Patent: June 17, 2003Assignees: Kabushiki Kaisha Toyota Chuo Kenkyusho, University of MassachusettsInventors: Hiromitsu Tanaka, Bruce M. Novak
-
Patent number: 6559261Abstract: A method for producing a polymeric material, said method comprising subjecting a starting material which includes two multiple bonds which are activated so that they will take part in a polymerisation reaction and wherein the multiple bonds are sufficiently close togeter to ensure that cyclopolymerisation will preferentially occur; to suitable conditions under which said polymerisation reaction will occur, provided that the starting marerial is other than triallyamine hydrochloride. The method can be used to produce polymers for various processes including adhesives, network polymers, liquid crystal polymers etc.Type: GrantFiled: January 17, 2001Date of Patent: May 6, 2003Assignee: QinetiQ LimitedInventors: Paul E Milne, Keith M Blackwood
-
Patent number: 6548613Abstract: The present invention provides a polymer that can be used as an anti-refelctive coating (ARC) polymer, an ARC composition comprising the same, methods for producing the same, and methods for using the same. The polymer of the present invention is particularly useful in a submicrolithographic process, for example, using KrF (248 nm), ArF (193 nm), or F2 (157 nm) laser as a light source. The polymer of the present invention comprises a chromophore that is capable of absorbing light at the wavelengths used in a submicrolithographic process. Thus, the ARC of the present invention significantly reduces or prevents back reflection of light and the problem of the CD alteration caused by the diffracted and/or reflected light. The ARC of the present invention also significantly reduces or eliminates the standing wave effect and reflective notching.Type: GrantFiled: December 22, 2000Date of Patent: April 15, 2003Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Min-Ho Jung, Sung-Eun Hong, Jae-Chang Jung, Geun-Su Lee, Ki-Ho Baik
-
Patent number: 6538090Abstract: Polymers are disclosed having the following formula 1 or 2: Polymers of the present invention can be used as an ARC material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain a chromophore substituent that exhibits sufficient absorbance at the wavelengths useful for the submicrolithography process. The ARC prevents back reflection of light from lower layers and the alteration of the CD by diffracted and reflected light from the lower layers. The ARC also eliminates standing waves and reflective notching due to the optical properties of lower layers on the wafer and to changes in the thickness of the photosensitive film applied thereon, thereby resulting in the stable formation of ultrafine patterns suitable for 64M, 256M, 1 G, 4 G and 16 G DRAMs and a great improvement in the production yield.Type: GrantFiled: March 11, 2002Date of Patent: March 25, 2003Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Min-Ho Jung, Sung-Eun Hong, Ki-Ho Baik
-
Patent number: 6489423Abstract: Polymers are disclosed having the following formula 1 or 2: Polymers of the present invention can be used as an ARC material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain a chromophore substituent that exhibits sufficient absorbance at the wavelengths useful for the submicrolithography process. The ARC prevents back reflection of light from lower layers and the alteration of the CD by diffracted and reflected light from the lower layers. The ARC also eliminates standing waves and reflective notching due to the optical properties of lower layers on the wafer and to changes in the thickness of the photosensitive film applied thereon, thereby resulting in the stable formation of ultrafine patterns suitable for 64 M, 256 M, 1 G, 4 G and 16 G DRAMs and a great improvement in the production yield.Type: GrantFiled: March 11, 2002Date of Patent: December 3, 2002Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Min-ho Jung, Sung-eun Hong, Ki-ho Baik
-
Patent number: 6486283Abstract: An organic anti-reflective polymer having the following Formula 1, its preparation method, an anti-reflective coating composition comprising the said organic anti-reflective polymer and a preparation method of an anti-reflective coating made therefrom. The anti-reflective coating comprising the polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices, improves production yields and enables control of the k value. Further, it is also possible to prevent undercutting due to an unbalanced acidity after finishing the coating.Type: GrantFiled: June 25, 2001Date of Patent: November 26, 2002Assignee: Hynix Semiconductor Inc.Inventors: Sung-eun Hong, Min-ho Jung, Jae-chang Jung, Geun-su Lee, Ki-ho Baik
-
Patent number: 6451947Abstract: A high energy density capacitor comprising an organic polymeric dielectric material having a dielectric constant of at least about 7; wherein the organic polymeric dielectric material comprises polymerized alkyl (alpha-substituted)acrylate monomers having at least one dipole group; wherein when the monomers are polymerized, the dipole group is attached to the main polymeric chain through a heteroatom-containing linking group.Type: GrantFiled: July 18, 2000Date of Patent: September 17, 2002Assignee: Medtronic, Inc.Inventors: Michael E. Benz, Edward DiDomenico, Randall V. Sparer
-
Patent number: 6423799Abstract: Disclosed is an extremely rapidly photo-addressable storage media from inherently slow photo-addressable polymers by irradiating a substrate over a large area with a light source suitable for conventional inscription so that an optical anisotropy, i.e. a double refraction with a preferential direction in the plane of the substrate occurs. If the substrates so prepared are briefly intensively irradiated, the pattern is inscribed extremely rapidly and permanently. The invention also relates to novel side-chain polymers in which high optical anisotropy can be generated by irradiation. This optical anisotropy is very heat stable.Type: GrantFiled: November 17, 1998Date of Patent: July 23, 2002Assignee: Bayer AGInventors: Horst Berneth, Uwe Claussen, Serguei Kostromine, Ralf Neigl, Hans-Joachim Vedder
-
Patent number: 6391984Abstract: A staged method of forming vinyl (e.g.Type: GrantFiled: March 22, 1999Date of Patent: May 21, 2002Assignee: Solutia Inc.Inventors: Marilyn Grolitzer, Jun Lu, Ming Zhao
-
Patent number: 6388039Abstract: Polymers are disclosed having the following formula 1 or 2: Polymers of the present invention can be used as an ARC material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain a chromophore substituent that exhibits sufficient absorbance at the wavelengths useful for the submicrolithography process. The ARC prevents back reflection of light from lower layers and the alteration of the CD by diffracted and reflected light from the lower layers. The ARC also eliminates standing waves and reflective notching due to the optical properties of lower layers on the wafer and to changes in the thickness of the photosensitive film applied thereon, thereby resulting in the stable formation of ultrafine patterns suitable for 64M, 256M, 1G, 4G and 16G DRAMs and a great improvement in the production yield.Type: GrantFiled: June 22, 2000Date of Patent: May 14, 2002Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Min-Ho Jung, Sung-Eun Hong, Ki-Ho Baik
-
Publication number: 20010053804Abstract: A multipurpose cement dispersing, shrinkage compensating and anticorrosive polymer and an admixture comprising said polymer, which improve the workability and the early strength development of fresh concrete, are described.Type: ApplicationFiled: March 22, 2001Publication date: December 20, 2001Inventors: Jurg Widmer, Ueli Sulser, Ulf Velten, Irene Schober, Theodor A. Burge
-
Patent number: 6310159Abstract: The present invention refers to a paper surface sizing composition comprising a copolymer having: a) structural units derived from ethylenically unsaturated hydrocarbons; structural units derived from monomers selected from esters of ethylenically unsaturated mono-carboxylic acids, half-esters of ethylenically unsaturated dicarboxylic acids, allylethers and vinylethers and mixtures thereof; optionally c) structural units derived from ethylenically unsaturated monomers selected from monocarboxylic acids as well as salts and amides thereof, dicarboxylic acids as well as salts, amides and half-amides thereof, and cyclic anhydrides and imides of dicarboxylic acids and mixtures thereof; and optionally d) structural units derived from alkyl or amino-substituted alkyl acrylates or methacrylates with the proviso, that if no structural units c) are present, the structural units b) are derived from monomers selected from half esters of ethylenically unsaturated dicarboxylic acids.Type: GrantFiled: January 19, 1999Date of Patent: October 30, 2001Assignee: The Dow Chemical CompanyInventors: Jürgen Eiffler, Roger Carlsson, Jürgen Hermanns, Stephen Oliver
-
Patent number: 6184324Abstract: A high energy density capacitor comprising an organic polymeric dielectric material having a dielectric constant of at least about 7; wherein the organic polymeric dielectric material comprises polymerized alkyl (alpha-substituted)acrylate monomers having at least one dipole group; wherein when the monomers are polymerized, the dipole group is attached to the main polymeric chain through a heteroatom-containing linking group.Type: GrantFiled: December 18, 1997Date of Patent: February 6, 2001Assignee: Medtronic, Inc.Inventors: Michael E. Benz, Edward DiDomenico, Randall V. Sparer
-
Patent number: 6177485Abstract: The properties of ink-jet inks containing a colorant (pigment, macromolecular chromophore, or dye) are improved by adding thereto an additive, specifically, one or more polymers derived from unsaturated surfactants. The unsaturated surfactant(s) has at least one carbon-carbon double bond (C═C). The polymer may be simply an polymer of the unsaturated surfactant. Alternatively, the polymer may be co-polymerized with one or more vinyl monomers or one or more polymers based on the vinyl monomers may be mixed with the unsaturated surfactant polymer. The vinyl monomer(s) or polymer(s) are used to adjust or “tweak” the properties of the resultant polymer. For example, the more hydrophobic the polymer or the higher its molecular weight, then the greater the water-fastness afforded the ink-jet ink. The polymeric additive of the invention improves bleed control, water-fastness, and smear-fastness of ink-jet inks, particularly thermal ink-jet inks.Type: GrantFiled: February 17, 1999Date of Patent: January 23, 2001Assignee: Hewlett-Packard CompanyInventors: John R Moffatt, Joseph W Tsang
-
Patent number: 6143849Abstract: Multifunctional chelating groups are covalently bound to acrylate or methylate monomers. These monomers are polymerized. The resulting polymers are highly substituted with chelating groups and are useful for removing metals from fluids such as liquid hydrocarbons. An example of a polymer according to this invention has the following structure: ##STR1## wherein Q is a saturated or unsaturated aliphatic group having 1 to about 200 carbon atoms and is typically an unsubstituted unbranched alkylene, a substituted unbranched alkylene, a substituted branched alkylene, or an unsubstituted branched alkylene, and is an integer having a value of at least 1.Type: GrantFiled: November 27, 1996Date of Patent: November 7, 2000Assignee: The United States of America as represented by the Secretary of the NavyInventors: Dhananjay B. Puranik, Eddie L. Chang
-
Patent number: 5962520Abstract: A hydrolytically unstable, biocompatible polymer capable of carrying and releasing a pharmaceutical compound when introduced into physiological media. In a preferred embodiment, the polymer contains ester linkages that are susceptible to hydrolytic degradation. A monomeric unit of the polymer can also be used as a hydrolytically unstable linking agent for quickening the degradation of polymers, particularly cross-linked polymers.Type: GrantFiled: April 2, 1998Date of Patent: October 5, 1999Assignee: The University of AkronInventors: Daniel J. Smith, Weisun Rao
-
Patent number: 5889131Abstract: A side-chain type second-order nonlinear optical polymer compound having a repeating unit as represented in general structure (I), --(--MO--).sub.m --(--ITCN--NLO--).sub.n --, wherein the sum of m and n is from 5 to 10000 and m and n satisfy m/(m+n)=from 0.05 to 0.95; ITCN--NLO is ##STR1## X is not present, or represents alkylene having from 1 to 6 carbon atoms or aromatic hydrocarbon having from 6 to 12 carbon atoms; Y is a bonding group selected from the group consisting from ether, ester, amide, alkylamino having from 1 to 5 carbon atoms, carbamate and sulfone; NLO is a general second-order nonlinear optical chemical group in which a conjugated aromatic ring can be unsubstituted or substituted by an electron-donor and/or electron-acceptor; and MO is any polymerizable monomer copolymerizable with ITCN--NLO, and a nonlinear optical material prepared with the same arc disclosed.Type: GrantFiled: November 17, 1997Date of Patent: March 30, 1999Assignee: Korea Institute of Science and TechnologyInventors: Nak Joong Kim, Dong Hoon Choi, Sang Yup Song
-
Patent number: 5847022Abstract: The present invention provides a radiation curable resin composition and method of production therefor; the present composition has wide applications as an ink, coating or the like, is dilutable in water or an organic solvent, and forms a coating which has excellent hardening characteristics and adherence to a substrate, as well as superior resistance to heat, chemicals and boiling, this resin composition may be redissolved with water or an organic solvent prior to hardening; which have a number average weight of 500 to 50,000, characterized in that the aprotic ammonium salt represented by general formula 1 is contained in the resin in the amount of 0.1 to 4.0 mol/kg.Type: GrantFiled: March 21, 1996Date of Patent: December 8, 1998Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Yozo Yamashina, Eiju Ichinose, Yoichi Abe, Hidenobu Ishikawa
-
Patent number: 5696223Abstract: Oxime ethers of the general formula I ##STR1## where the variables have the following meanings: R.sup.1, R.sup.2 independently of one another hydrogen, C.sub.1 -C.sub.20 -alkyl, C.sub.4 -C.sub.10 -cycloalkyl, C.sub.6 -C.sub.10 -aryl or together a bridge of 3-14 carbon atoms,R.sup.3 hydrogen, C.sub.1 -C.sub.6 -alkyl or phenyl which is unsubstituted or carries inert substituents,n an integer from 1 to 100,A C.sub.2 -C.sub.10 -alkylene groups which are unsubstituted or carry inert substituents,a process for the preparation thereof and the use thereof as copolymerizable monomers are described.Type: GrantFiled: November 28, 1995Date of Patent: December 9, 1997Assignee: BASF AktiengesellschaftInventors: Michael Karcher, Marc Heider, Thomas Ruhl, Jochem Henkelmann
-
Patent number: 5693744Abstract: An amorphous polyamide represented by the formula(2) ##STR1## in which each R is at least one alkylene radical having 1 to 10 carbon atoms, R' is an electron acceptor group represented by the formula(3), ##STR2## wherein Y is --C.tbd.N, --NO.sub.2, --SO.sub.2 --R(R.dbd.C.sub.n H.sub.2n+1, n=1 to 20 alkyl derivatives), ##STR3## R" is at least one aliphatic or aromatic divalent group having 2 to 20 carbon atoms, and n is an integer of more than 3, having second order nonlinear optical property, and a method for preparing the polymer by the polycondensation of dicarboxylic acid derivative, having second order nonlinear optical property in its side chain, with diamine are disclosed.Type: GrantFiled: June 21, 1995Date of Patent: December 2, 1997Assignee: Korea Research Institute of Chemical TechnologyInventors: Kil Yeong Choi, Moon Young Jin, Young Wun Kim
-
Patent number: 5688906Abstract: A method for forming a polyamic acid having nonlinear optical (NLO) or pre-NLO side chains, which method includes the steps of:(1) providing a bis-(aromatic dicarboxylic acid anhydride) containing at least one NLO or pre-NLO side chain having the structure represented by:D-R-Awherein D, R and A form a delocalized resonance configuration in which R is a pi-conjugated non-centrosymmetric moiety, A is hydrogen or an electron withdrawing moiety and D is an electron donating moiety covalently linked to the bis-(aromatic dicarboxylic acid anhydride); and(2) reacting the bis-(aromatic dicarboxylic acid anhydride) with an aromatic diamine to form a polyamic acid having NLO or pre-NLO side chains. Methods for preparing polyamic acids having NLO or pre-NLO side chains by reacting aromatic diamines having NLO or pre-NLO side chains with bis-(aromatic dicarboxylic acid anhydrides) are also disclosed. Methods of forming the polyamic acids into polyimides having NLO side chains are also included.Type: GrantFiled: August 7, 1995Date of Patent: November 18, 1997Assignee: Enichem S.p.A.Inventors: Kwan-Yue Alex Jen, Kevin Joel Drost
-
Patent number: 5663262Abstract: The present invention relates to compounds containing an oxamic acid group, which show high reactivity and have stability for water and are used as paints, adhesives, and plastic materials etc. in the form of a reaction material or a resin. Since into these compounds an oxamic acid group is introduced in a part of the molecule and the oxamic acid group is an ionic functional group, the compounds show superior solubility and dispersing character in water and also, since the oxamic acid group is a group of a disappearing type with heating, the compounds do not remain, after hardening, in the hardened product. Accordingly, the hardened products obtained from these compounds are superior in water-resistant and anticorrosion properties and in durability.Type: GrantFiled: November 8, 1989Date of Patent: September 2, 1997Assignee: Nippon Paint Co., Ltd.Inventors: Shinsuke Shirakawa, Kazunori Kanda, Mitsuo Yamada, Kei Aoki, Satoshi Urano, Nobuaki Tomita
-
Patent number: 5641846Abstract: Side-group polymers whose permanently shape-anisotropic side groups carry lateral substituents are particularly suitable, owing to their excellent properties, for optical components which can be employed, in particular, in optical data storage and transfer.Type: GrantFiled: September 22, 1995Date of Patent: June 24, 1997Assignee: Bayer AktiengesellschaftInventors: Thomas Bieringer, Uwe Gessner, Dietrich Haarer, Joachim Rubner, Roland Wuttke, Uwe Claussen, Ralf Ruhmann, Horst Berneth, Sergei Kostromin, Ralf Neigl
-
Patent number: 5635576Abstract: The invention relates to a crosslinkable material containing a polymer onto which chromophores are laterally grafted, characterized in that each chromophore is within a polymer unit which corresponds to the following formula (I): ##STR1## in which: X represents a part of the polymer chain,A is a group --NO.sub.2, --CN, --C(CN).dbd.C(CN).sub.2 or --SO.sub.2 R.sub.4, R.sub.4 being a C.sub.1 to C.sub.6 alkyl,D is a nitrogen, sulphur or oxygen atom,R.sub.1 is a hydrogen atom or a C.sub.1 to C.sub.6 alkyl if D is a nitrogen atom, or nothing if D is a sulphur or oxygen atom,R.sub.2 is a C.sub.1 to C.sub.6 aliphatic alkyl group,and E is a group chosen from --OH, --O--CO--(CH.sub.2).sub.n --COOH, --O--W, --O--CO--R.sub.3 O--W and --O--R.sub.3 --O--W, n being an integer between 2 and 6, W being a photodimerizable group and R.sub.3 being a C.sub.1 to C.sub.6 alkyl,and the said material additionally containing complementary anchoring functional groups capable of attaching themselves to E during the crosslinking.Type: GrantFiled: September 13, 1995Date of Patent: June 3, 1997Assignee: France TelecomInventors: Franck Foll, Dominique Bosc, Alain Rousseau, Bernard Boutevin
-
Patent number: 5633225Abstract: The present invention relates to a dye transfer inhibiting detergent composition comprisinga) 0.0001% to 10% by weight of a dye transfer inhibitor having a ratio of amine to amine N-oxide of from about 2:3 to about 1:1,000,000 selected from the group consisting of poly(2-vinylpyridine-N-oxide), poly-2-(dimethylamino)-ethylmethacrylate-N-oxide and poly-1-vinylimidazole-N-oxide; andb) a detersive effective amount of a surfactant; andc) a detersive effective amount of a builder.Type: GrantFiled: January 25, 1996Date of Patent: May 27, 1997Assignee: The Procter & Gamble CompanyInventors: Abdennaceur Fredj, James P. Johnston, Christiaan A. J. Thoen, Finlay MacCorquodale, Alfred Busch, Frederick E. Hardy, Alan D. Willey
-
Patent number: 5612388Abstract: A polyfunctional cationic monomer produced by reacting a tertiary amine having a polymerizable vinyl group with a compound having two or more oxirane groups. The polyfunctional cationic monomer of the present invention shows a very high curing rate and a high reaction suitability as a radiation cure coating to be applied onto the surface of a molded article made of plastics, wood, metals, etc. or the surface of a sheet such as a paper, a film, a metal plate, a knitted web, etc.Type: GrantFiled: September 15, 1995Date of Patent: March 18, 1997Assignee: Nitto Chemical Industry Co., Ltd.Inventors: Tadashi Irizawa, Masahiko Morooka, Masahiko Miyanoki
-
Patent number: 5610249Abstract: The present invention provides a process for producing a styrene or styrene derivative polymer of narrow molecular weight distribution, which comprises (co)polymerizing a styrene or styrene derivative monomer using, as the catalyst system, a mixture of a free radical compound, a radical polymerization initiator and a phosphorus compound. With the present process, the polymerization speed is very high and a monodisperse polymer of narrow molecular weight distribution can be obtained easily.Type: GrantFiled: January 24, 1996Date of Patent: March 11, 1997Assignee: Kansai Paint Co., Ltd.Inventor: Tetsuo Ogawa
-
Patent number: 5539074Abstract: The invention is concerned with linear and cyclic polymers or oligomers having a photoreactive ethene group. The polymers are of the formula ##STR1## wherein M.sub.a, M.sub.b, M.sub.c are monomer units for homo- or copolymers;x, y, z are mole fractions of the copolymers, whereby in each case 0<x.ltoreq.1; 0.ltoreq.y.ltoreq.1 and 0.ltoreq.z<1;S.sub.a, S.sub.b are spacer units;Z.sub.a, Z.sub.b are molecule units which can undergo photochemical isomerization/dimerization;n is a magnitude of 4-100 000 andm is 0 or 1,The compounds are used as an orientating layer for liquid crystals.Type: GrantFiled: February 4, 1994Date of Patent: July 23, 1996Assignee: Hoffmann-La Roche Inc.Inventors: Rolf-Peter Herr, Stephen Kelly, Martin Schadt, Klaus Schmitt, Andreas Schuster
-
Patent number: 5514762Abstract: Copolymerizable oxime ethers of the general formula ##STR1## where A is a divalent linking member, R.sup.1 and R.sup.2 independently of one another are each C.sub.1 -C.sub.10 -alkyl, C.sub.1 -C.sub.10 -alkoxy, C.sub.5 -C.sub.10 -cycloalkyl or C.sub.5 -C.sub.10 -aryl, each of which may furthermore contain 1-3 nonadjacent nitrogen, oxygen or sulfur atoms as heteroatoms in the carbon chain or in the carbon ring and may be substituted by from one to three C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -alkoxy groups, R.sup.1 or R.sup.2 may be hydrogen or R.sup.1 and R.sup.2 together form a bridge of 3 to 14 carbon atoms, where some of the carbon atoms may furthermore be part of an aromatic ring, Z is an n-valent organic radical which contains a copolymerizable ethylenically unsaturated group and n is an integer of from 1 to 3.Type: GrantFiled: October 17, 1994Date of Patent: May 7, 1996Assignee: BASF AktiengesellschaftInventors: Kaspar Bott, Gerhard Bauer, Karl Haeberle
-
Patent number: 5512644Abstract: There is disclosed an ampholytic polymer capable of absorbing aqueous electrolyte solutions, which is obtainable by polymerization of a monomer mixture including (A) at least 10 mol % of an ampholytic vinyl monomer, with the proviso that when the monomer (A) has no self-crosslinkability, the amount of monomer (A) is in the range of 10 to 99.995 mol %. The monomer mixture may further include (B) 90 mol % or less of a non-ampholytic vinyl monomer and (C) 1 mol % or less of a crosslinkable monomer, with the proviso that the total amount of monomers (A), (B) and (C) is 100 mol % and when the monomer (A) has no self-crosslinkability, the amount of monomer (C) is in the range of 0.005 to 1 mol %.Type: GrantFiled: September 8, 1994Date of Patent: April 30, 1996Assignee: Toyo Boseki Kabushiki KaishaInventors: Kuniyoshi Ogura, Kouji Sasaki
-
Patent number: 5504162Abstract: Salts of copolymers of ethylenically unsaturated carboxylic acids and ethylenically unsaturated fatty acid derivatives.Type: GrantFiled: January 4, 1994Date of Patent: April 2, 1996Assignee: Hoechst AktiengesellschaftInventors: Herbert Friedrich, Bernhard Mees, Richard Gruber
-
Patent number: 5498477Abstract: Electroactive polymers are provided which contain alternating phenyl rings and nitrogen atoms, and which contain both quinoid mer units and benzenoid mer units. The polymers are formed by poly(condensation) of N-phenylhydroxylamine or derivatives thereof under anhydrous conditions in the presence of a Lewis acid catalyst. Methods for producing films, fibers and shaped articles of the polymers are provided as well.Type: GrantFiled: January 31, 1994Date of Patent: March 12, 1996Assignee: Neste OyInventor: Floyd Klavetter
-
Patent number: 5468789Abstract: A method is provided for making curable silicon containing acrylate silicone hardcoat compositions which employ an anaerobic gelation inhibitor such as galvinoxyl. Devolatilizing of an aqueous/organic solvent mixture from the silicon containing acrylate hardcoat formulation is conducted in an inert atmosphere. Acrylate hardcoat compositions imparting improved weathering resistance to thermoplastic substrates also are provided.Type: GrantFiled: September 12, 1994Date of Patent: November 21, 1995Assignee: General Electric CompanyInventors: Larry N. Lewis, George F. Medford, Arnold Factor
-
Patent number: 5464558Abstract: Carboxylic polymers useful in detergent compositions contain keto structural units incorporated into the polymer backbone. The units may be introduced by means of the compound 2,2'-diphenyl-4-methylene-1,3-dioxolane. The polymers show better biodegradability than the acrylic and acrylic/maleic polymers commonly used in detergent compositions, while the detergency building (calcium binding) is comparable or better.Type: GrantFiled: January 4, 1995Date of Patent: November 7, 1995Assignee: Lever Brothers Company, Division of Conopco, Inc.Inventors: Stephen G. Hales, Ezat Khoshdel, Robert Polywka
-
Patent number: 5459216Abstract: Copolymerizable oxime ethers of the general formula ##STR1## where A is a divalent link, R.sup.1 may be hydrogen or C.sub.1 -C.sub.4 -alkyl and R.sup.2 and R.sup.3 independently of one another are each hydrogen or C.sub.1 -C.sub.10 -alkyl, C.sub.1 -C.sub.10 -alkoxy, C.sub.5 -C.sub.10 -cycloalkyl or C.sub.5 -C.sub.10 -aryl, each of which may furthermore contain 1-3 nonadjacent nitrogen, oxygen or sulfur atoms as hetero atoms in the carbon chain or in the carbon ring and may be substituted by C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -alkoxy groups, R.sup.2 or R.sup.3 may each be hydrogen or R.sup.2 and R.sup.3 together form a bridge of 3 to 14 carbon atoms, where some of the carbon atoms may also be part of an aromatic ring.Type: GrantFiled: December 9, 1994Date of Patent: October 17, 1995Assignee: BASF AktiengesellschaftInventors: Kaspar Bott, Norbert Goetz, Gerhard Bauer, Oral Aydin
-
Patent number: 5449725Abstract: This invention presents a series of polyfunctional polymers useful as deinking agents. The polymers, which generally have molecular weights in the 2,000-100,000 range, can be used to effectively separate and remove ink in a variety of deinking processes, including flotation, wash, and mechanical, resulting in fibers of superior brightness.Type: GrantFiled: November 27, 1991Date of Patent: September 12, 1995Assignee: Huntsman CorporationInventors: Ratana Kanluen, Brigitte H. Licht
-
Patent number: 5439997Abstract: Carboxylic polymers useful in detergent compositions contain keto structural units incorporated into the polymer backbone. The units may be introduced by means of the compound 2,2'-diphenyl-4-methylene-1,3-dioxolane. The polymers show better biodegradability than the acrylic and acrylic/maleic polymers commonly used in detergent compositions, while the detergency building (calcium binding) is comparable or better.Type: GrantFiled: April 7, 1993Date of Patent: August 8, 1995Assignee: Lever Brothers Company, Division of Conopco, Inc.Inventors: Stephen G. Hales, Ezat Khoshdel, Robert Polywka
-
Patent number: 5405919Abstract: A polymeric composition capable of releasing nitric oxide including a polymer and a nitric oxide-releasing N.sub.2 O.sub.2.sup.- functional group bound to the polymer; pharmaceutical compositions including the polymeric composition; and methods for treating biological disorders in which dosage with nitric oxide is beneficial. The compositions can be used as and/or incorporated into implants, injectables, condoms, prosthesis coatings, patches, and the like for use in a wide variety of medical applications.Type: GrantFiled: August 24, 1992Date of Patent: April 11, 1995Assignee: The United States of America as represented by the Secretary of Health and Human ServicesInventors: Larry K. Keefer, Joseph A. Hrabie
-
Patent number: 5384378Abstract: Copolymers with non-linear optical properties, which contain or are composed of repeating units of the formula (I) ##STR1## where D is an electron donor,A is an electron acceptor,R.sup.1, R.sup.2, R.sup.3 and R.sup.4 can be the same as or different from one another, and are each H, alkyl, cycloalkyl, or R.sup.3 and R.sup.4 are each CN, NO.sub.2 or CHO, or R.sup.1 forms with R.sup.2, or R.sub.3 forms with R.sup.4, a fused-on ring,X is CH and/or N,m is an integer from 2 to 11, andR is hydrogen or methyl,and repeating units of at least one of the formulae (II), (III) and (IV) ##STR2## are suitable for the production of optical components.Type: GrantFiled: September 21, 1993Date of Patent: January 24, 1995Assignee: BASF AktiengesellschaftInventors: Karl-Heinz Etzbach, Stefan Beckmann, Oskar Nuyken, Peter Strohriegl, Harry Mueller
-
Patent number: 5359008Abstract: The present invention provides a second-order nonlinear optical polymer including a polymer backbone and side groups bonded to the polymer backbone, wherein the side groups include one or more of a first nonlinear optical group represented by the following formula (C-1) and one or more of a second nonlinear optical group represented by the following formula (C-2) or (C-2)': ##STR1## wherein .pi..sub.1 to .pi..sub.n, .pi.'.sub.1, .pi.'.sub.2, and .pi.".sub.1 each represent independently a .pi.-conjugated cyclic compound group; X.sub.1 to X.sub.n-1, X'.sub.1, Y.sub.1 to Y.sub.n-1, and Y'.sub.1 each represent independently CH, N, or N.fwdarw.O; A.sub.1, A.sub.2, and A.sub.3 each represent independently an electron attracting group; D.sub.1, D.sub.2, and D.sub.3 each represent independently an electron donating group; and n represents an integer of 3 or greater.Type: GrantFiled: May 17, 1993Date of Patent: October 25, 1994Assignee: Nippon Telegraph and Telephone CorporationInventors: Michiyuki Amano, Makoto Hikita, Satoru Tomaru, Toshikuni Kaino, Yoshito Shuto
-
Patent number: 5312897Abstract: Electroactive polymers are provided which contain alternating phenyl rings and nitrogen atoms, and which contain both quinoid mer units and benzenoid mer units. The polymers are formed by poly(condensation) of N-phenylhydroxylamine or derivatives thereof under anhydrous conditions in the presence of a Lewis acid catalyst. Methods for producing films, fibers and shaped articles of the polymers are provided as well.Type: GrantFiled: August 11, 1992Date of Patent: May 17, 1994Assignee: Neste OyInventor: Floyd Klavetter
-
Patent number: 5310837Abstract: The invention relates to liquid crystalline polymers which form exclusively nematic liquid crystalline phases. The liquid crystalline polymers are comprised of units of at least trinuclear liquid crystalline azo dye monomers M with lateral asymmetry.Type: GrantFiled: October 23, 1992Date of Patent: May 10, 1994Assignee: Roehm GmbH Chemische FabrikInventor: Michael May
-
Patent number: 5304619Abstract: A polar group-containing ethylene polymer or copolymer having improved insulating properties, or a composition thereof is characterized in that said polar group-containing ethylene polymer or copolymer contains 20 to 8000 ppm of a polar group having a dipole moment of more than 0.8 debye. The polymer can be used in a power cable as insulation.Type: GrantFiled: June 4, 1991Date of Patent: April 19, 1994Assignee: Nippon Petrochemicals Co., Ltd.Inventors: Junichi Yokoyama, Hideo Kawabata, Masaaki Ikeda, Katsufumi Suga, Masayoshi Kariya
-
Patent number: 5273863Abstract: Homopolymers and copolymers with an acrylic backbone chain having pendant side-chains containing a nitrone functional group undergo change in refractive index upon exposure to actinic radiation. Waveguides are "written" in films containing such polymers by exposing predetermined areas to sufficient actinic radiation to change the refractive index.Type: GrantFiled: September 14, 1992Date of Patent: December 28, 1993Assignee: AlliedSignal Inc.Inventors: Keith A. Horn, Christine L. Lau
-
Patent number: RE36625Abstract: The invention is concerned with linear and cyclic polymers or oligomers having a photoreactive ethene group. The polymers are of the formula ##STR1## wherein M.sub.a, M.sub.b, M.sub.c are monomer units for homo- or copolymers;x, y, z are mole fractions of the copolymers, whereby in each case 0<x.ltoreq.1; 0.ltoreq.y.ltoreq.1 and 0.ltoreq.z<1;S.sub.a, S.sub.b are spacer units;Z.sub.a, Z.sub.b are molecular units which can undergo photochemical isomerization/dimerization;n is a magnitude of 4-100 000 andm is 0 or 1,The compounds are used as an orienting layer for liquid cyrstals.Type: GrantFiled: July 21, 1998Date of Patent: March 21, 2000Assignee: Rolic AGInventors: Rolf-Peter Herr, Stephen Kelly, Martin Schadt, Klauss Schmitt, Andreas Schuster