Abstract: The present invention provides pressure-sensitive adhesives having a refractive index of at least 1.48. The pressure-sensitive adhesives comprise at least one monomer containing a substituted or an unsubstituted aromatic moiety.

Abstract: Disclosed is a copolymer comprising a polyethylene segment which is a main chain; a reactive silicon-containing group which is a side group of the polyethylene segment; and a polycondensation segment bonded to the polyethylene segment, which is a part of the main chain together with the polyethylene segment or a side chain with respect to the polyethylene segment. There are provided a condensation polymer having many reactive silicon-containing groups with respect to one molecule and an organic-inorganic hybrid polymeric material having superior properties such as strength, heat resistance, weather resistance and chemical resistance by using the polymer.

Abstract: Covalently-bound, hydrophilic copolymer coatings for implants are disclosed. The copolymer coatings comprise a hydrophobic aryl acrylic monomer, a hydrophilic monomer selected from the group consisting of hydroxyalkyl (meth)acrylates, n-vinyl pyrrolidone and acrylamides, and a (meth)acrylamide reactive plasticizer.

Abstract: The present invention provides, as a resin bead which can be developed for use completely different from the use of conventional polystyrene resin beads, a porous resin bead made from a styrene-hydroxystyrene-divinylbenzene copolymer, which contain a hydroxyl group in an amount of 10–1000 ?mol/g, and further, a production method of a porous resin bead made from a styrene-hydroxystyrene-divinylbenzene copolymer, which contains suspension copolymerization of a styrene monomer, an acyloxystyrene monomer and a divinylbenzene monomer using an organic solvent (containing at least hydrocarbon and alcohol) and water, followed by hydrolysis reaction.

Abstract: A high molecular weight, water-soluble polymer comprising pendant salicylic acid groups and having a weight average molecular weight of at least about 2,000,000 daltons and use of the polymer for clarifying red mud-containing liquors generated in the Bayer process for the recovery of alumina from bauxite.

Abstract: A production method of a porous resin or an intermediate therefor, which comprises a step of producing a styrene-acyloxystyrene-divinylbenzene copolymer comprising suspension copolymerization of a styrene monomer, an acyloxystyrene monomer and a divinylbenzene monomer using an organic solvent and water, and a step of converting the styrene-acyloxystyrene-divinylbenzene copolymer to a styrene-hydroxystyrene-divinylbenzene copolymer, wherein a chain transfer agent is added to the suspension copolymerization system.

Abstract: Novel azo-based reactive yellow dyes and a process for manufacturing and using ocular devices having blue light absorption properties. Intraocular lenses so produced block blue light from reaching the retina of an eye implanted with the IOL. By blocking blue light from reaching the retina, the IOL thereby prevents potential damage to the retina.

Abstract: The invention provides ion exchange and electrochemical methods and devices employing anion exchange polymers produced by substantially simultaneous quaternization and polymerization reactions. Anion selective polymers are produced in accordance with the invention by combining, an ethylenic tertiary amine monomer, an alkylating agent having a boiling point temperature of at least about 100° C., and a cross-linking agent in the presence of a polymerizing agent for a time and at a temperature sufficient to form the polymer. The alkylating agent and the cross-linking agent may be the same compound, a cross-linking alkylating agent. The polymers may be produced in the presence of solvents and/or in the presence of diluting monomers which are incorporated into the polymers.

Abstract: The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

Abstract: The present invention provides a compound represented by formula (1) defined in the specification and a liquid crystal composition comprising the compound. The invention further provides a polymer obtained by polymerization of compound or composition above, and further the present invention provides a film, an optical anisotropic material, A ¼ or ½ wavelength functional plate, an optical compensation element, an optical element and a liquid crystal display element employing the polymer.

Abstract: A process for producing silicone-containing prepolymers capable of absorbing blue light for use in the production of relatively high refractive index polymeric compositions is described herein. Polymeric compositions so produced are useful in the production of ophthalmic devices such as for example intraocular lenses and corneal inlays.

Abstract: A syndiotactic styrenic polymer having a narrow molecular weight distribution which is a (co)polymer comprising at least one structural unit represented by the following Formula (1): wherein C1 of a phenyl group thereof has a tacticity of 30% or more in terms of a racemic pentad determined by 13C-NMR, and Ra and m are as defined in the specification. The disclosure is also directed to a block copolymer comprising the above polymer as one segment, to a block graft polymer prepared by modifying one block of the above polymer with a nitrogen-containing aromatic polymer, and to a process for preparing a syndiotactic styrenic polymer in which a styrenic monomer is polymerized in the presence of a catalyst comprising a reaction product of a transition metal compound and at least one co-catalyst selected from organic aluminunoxy compounds.

Abstract: The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.

Abstract: An objective of the invention is to provide a rubber composition which has satisfactory processability and dimension stability, and the like, gives a vulcanized rubber exhibiting excellent wearing resistance and tensile strength, and the like, and thus is useful in a belt, a hose and a tire and the like, as well as a crosslinked rubber particle for obtaining such rubber composition. A rubber composition of the invention comprises [1] a crosslinked rubber particle comprising as repeating units (a) 30 to 94.89% by weight of a conjugated diene unit, (b) 5 to 69.89% by weight of an aromatic vinyl unit, (c) 0.01 to 10% by weight of a monomer unit having at least two polymerizable unsaturated group, (d) one polymerizable unsaturated group and an amino group, a hydroxyl group and an epoxy group and (e) 0.

Abstract: Superabsorbent polymer materials are provided including absorbent polymers having a fast vortex time, desirably about 10 seconds or less, and a stiffness index of at least about 0.7, as determined by test procedures described herein. The absorbent polymers can be modified to obtain a faster vortex time by a method including providing an absorbent polymer having a first vortex time, absorbing water with the absorbent polymer, freeze-drying the swollen absorbent polymer to remove at least a portion of the absorbed water, and obtaining a modified absorbent polymer having a second vortex time. The ratio of the first vortex time to the second vortex time is at least about 5, and desirably the modified absorbent polymer has a stiffness index of at least about 0.7.

Abstract: Fibers comprising a propylene homopolymer or a copolymer of propylene and at least one of ethylene and one or more unsaturated comonomers exhibit desirable properties. The homopolymers are characterized as having 13C NMR peaks corresponding to a regio-error at about 14.6 and about 15.7 ppm, the peaks of about equal intensity. The copolymers are characterized as (A) comprising at least about 60 weight percent (wt %) of units derived from propylene, and (B) having at least one of the following properties: (i) 13C NMR peaks corresponding to a regio-error at about 14.6 and about 15.7 ppm, the peaks of about equal intensity, (ii) a B-value greater than about 1.4 when the comonomer content of the copolymer is at least about 3 wt %, (iii) a skewness index, Six, greater than about ?1.

Abstract: Optically transparent, relatively high refractive index polymeric compositions and ophthalmic devices such as intraocular lenses, contact lenses and corneal inlays made therefrom are described herein. The preferred polymeric compositions are produced through the polymerization of one or more aromatic-based silyl monomers or the copolymerization of one or more aromatic-based silyl monomers with one or more aromatic or non-aromatic non-siloxy-based monomers, hydrophobic monomers or hydrophilic monomers.

Abstract: Disclosed are soft, high refractive index device materials having improved strength. The materials contain microphase-separated aliphatic and aromatic domains.

Abstract: This invention provides a high-molecular-weight, sterically regulated methacrylic polymer having high stereoregularity, a narrow distribution of molecular weights, and a high molecular weight, comprising methacrylates as units containing triphenyl amino groups etc. in side chains. The sterically regulated methacrylic polymer comprises 50 to 100 mol-% unit based on methacrylate (1) having a tertiary amino group bound to at least two aromatic rings in a side chain, wherein the number-average molecular weight (Mn) is 5000 to 2000000, the poly dispersity coefficient (Mw/Mn) is 1 to 1.5, and the syndiotacticity of the methacrylic polymer is 70% or more in 2-units expression (%rr).

Abstract: Solid rigid acrylic copolymer materials, useful for forming ophthalmic devices, are processed into the shape of an ophthalmic device, such as an intraocular lens and are then processed into a foldable form. The acrylic copolymer material has polymer units derived from an ?,?-ethylenically unsaturated carboxylic acid monomer, such as, (meth)acrylic acid, 1-butenoic acid, and the like, and an aryl(meth)acrylate monomer, such as, phenyl(meth)acrylate, 2-ethyloxy(meth)acrylate, and the like. The processing into a foldable shape may be accomplished by contacting the rigid material, having a Tg of 25° C. or higher, with an alcohol, preferably in the presence of acid catalyst, to lower the Tg to 20° C. or less.

Abstract: Optically transparent, relatively high refractive index polymeric compositions and ophthalmic devices such as intraocular lenses, contact lenses and corneal inlays made therefrom are described herein. The preferred polymeric compositions are produced through the polymerization of one or more aromatic-based silyl monomers or the copolymerization of one or more aromatic-based silyl monomers with one or more aromatic or non-aromatic non-siloxy-based monomers, hydrophobic monomers or hydrophilic monomers.

Abstract: New photoactive polymers, their use as liquid crystal (LC) orientation layers and their use in the construction of unstructured and structured optical and electro-optical elements and multi-layer systems. The new photoactive polymers are crosslinkable polymers that can be readily cross linked over a relatively short irradiation time.

Abstract: An at least two-component mortar composition is described, which can be cured by thermal initiation and contains at least one polymerizable monomer and/or at least one curable resin, at least one polymerization initiator for the polymerizable monomer and/or the curable resin and optionally at least one filler, wherein, as polymerization initiator, at least one organically substituted ammonium salt is contained as constituent of a mortar component and at least one inorganic persulfate is contained as constituent of a further mortar component, and which, after the mortar components are mixed in situ, results in an organically substituted ammonium persulfate, the nature and amount of organically substituted ammonium salt and inorganic persulfate as well as of polymerizable monomer or curable resin being selected so that a mortar composition results, which can be polymerized by free radical polymerization due to the action of heat, as well as a method for fastening tie rods, reinforcing steel for concrete or the

Abstract: Disclosed are soft, high refractive index, acrylic device materials having improved strength. The materials contain cross-linked acrylate or methacrylate microspheres.

Abstract: A composition for an anti-reflective coating or a radiation absorbing coating which can form an anti-reflective coating or a radiation absorbing coating having high absorption to exposed radiation in the range of 100 to 450 nm, no diffusion of photo-generated acid to anti-reflective coating and so on, no intermixing of resist and anti-reflective coating layer, good shelf-life stability, and good step coverage and novel compounds and polymers being preferably used in the composition are disclosed. The composition contains an acrylic or methacrylic compound or polymer with an isocyanate or thioisocyanate group bonded through an alkylene group to a side chain thereof or with an amino or hydroxyl group-containing organic chromophore which absorbs radiation in the range of 100 to 450 nm wavelength and is bonded, for example, through an alkylene group to the isocyanate or thioisocyanate group. Resist patters with high resolution are formed on a substrate.

Abstract: Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer.

Abstract: There is a need for polymers that offer a high level of heat and ultraviolet light resistance. It is particularly critical for polymers that are utilized in making skin compounds for automotive instrument and door panels to display excellent heat and ultraviolet light resistance. Polymer blends having such characteristics can be made by blending certain rubbery polymers with halogen containing polymers, such as polyvinyl chloride (PVC). There is currently a demand for halogen-free polymers having such characteristics. This invention discloses a rubbery polymer that can be blended with polyolefins, such as polyethylene or polypropylene, to make leathery compositions having good heat and ultraviolet light resistance. The rubbery polymer of this invention is comprised of repeat units which are comprised of (a) butyl acrylate, (b) an alkoxyalkylene acrylate, (c) styrene, (d) a half ester maleate soap, and (e) a crosslinking agent.

Abstract: Novel cross linked polymer films prepared from poly4-[(4-cardanylazo]benzoic acid and poly4-[(4-acryloylcardanylazo]benzoic acid are disclosed. The invention also relates to novel monomers 4-[(4-cardanylazo] benzoic acid and 4-[(4-acryloylcardanylazo] benzoic acid and polymers thereof as well processes for the preparation thereof.

Abstract: Optically transparent, relatively high refractive index polymeric compositions and ophthalmic devices such as intraocular lenses, contact lenses and corneal inlays made therefrom are described herein. The preferred polymeric compositions are produced through the polymerization of one or more aromatic-based silyl monomers or the copolymerization of one or more aromatic-based silyl monomers with one or more aromatic or non-aromatic non-siloxy-based monomers, hydrophobic monomers or hydrophilic monomers.

Abstract: The present invention relates to a thermoplastic styrenic resin composition comprises a styrenic copolymer comprising 15-100 parts by weight of a unit derived from a styrenic monomer (i-1), 0-45 parts by weight of a unit derived from a vinyl cyanide monomer (i-2), 0-40 parts by weight of a unit derived from a copolymerizable vinyl monomer (i-3) other than the above monomers, and 0.0005-1.0 parts by weight of a unit derived from a polyfunctional maleimide monomer, all based on 100 parts by weight of the total amount of (i-1) to (i-3). The thermoplastic styrenic resin composition manufactured in the present invention is excellent in processability. The rubber modified thermoplastic styrenic resin composition of the present invention gives a good heat stability, impact strength, fluidity and other mechanical properties. In addition, it also gives a uniform wall thickness, and the gloss on the surface of injected products after painting process is excellent.

Abstract: A shape memory polymer which is a reaction product of styrene, a vinyl compound, a multifunctional crosslinking agent and an initiator. The shape memory polymer has particular application as a contact lens mold.

Abstract: A radiation absorbing polymer having chemically bonded thereto a radiation absorbing dye, which has high absorption at a predetermined wavelength radiation, which shows good adhesion to a substrate and good thin film-forming, which has no dependence upon resists, which is soluble in a solvent for photoresists but becomes insoluble after being baked; a composition for radiation absorbing coating containing this polymer, and a radiation absorbing coating such as an anti-reflective coating formed from this composition are disclosed. The radiation absorbing polymer comprises a copolymer containing at least both a recurring unit composed of a monomer containing a keto group and a divalent group (preferably a methylene group) in its side chain and a recurring unit composed of a monomer containing an organic chromophore bonded directly or through a linkage group to the main chain. This radiation absorbing polymer is dissolved in a solvent such as alcohol, aromatic hydrocarbon, ketone, ester, etc.

Abstract: The present invention provides pressure-sensitive adhesives having a refractive index of at least 1.48. The pressure-sensitive adhesives comprise at least one monomer containing a substituted or an unsubstituted aromatic moiety.

Abstract: A pressure sensitive adhesive based on block copolymers, said block copolymers having at least one unit composed of three successive polymer blocks comprising alternating polymer blocks P(A) and P(B), wherein P(A) has a softening temperature of from −80° C. to 0° C., and is comprised of at least one acrylic or methacrylic acid derivative of the general formula CH2═CH(RI)(COORII)  (I)  and at least one acrylated monomer of the general formula CH2═CH(RIII)(COORIV)  (II), and P(B) represents a homopolymer or copolymer block having a softening temperature of from 20° C. to 175° C., and the polymer blocks P(A) and P(B) are not homogeneously miscible with each other.

Abstract: The present invention provides a protolytically leaving group-containing copolymer having improved characteristics such as increased solubility in alkaline aqueous solution in the presence of a proton, thus finding application with advantage in various uses, and a process for producing the copolymer. A protolytically leaving group-containing copolymer represented by the following general formula (1): in the formula, R1, R2 and R3 are the same or different and each represents a protolytically leaving group and a, b and c represent the amounts of existence (mole %) of repeating units (A), (B) and (C), respectively, in the copolymer, which comprises the repeating unit (A) as well as the repeating unit (B) and/or the repeating unit (C) and has a weight average molecular weight of 2000˜30000, said a, b and c satisfying the condition that a is 5 to 30 mole % and (b+c) is 70 to 95 mole %.

Abstract: The present invention relates to a method for improving the processability of butyl polymers by increasing the amount of repeating units derived from at least one multiolefin monomer in the polymer chain to more that 2.0 mol %. In particular, the present invention relates to a method of reducing the cold flow by increasing the amount of repeating units derived from at least one multiolefin monomer in the polymer chain to more that 2.0 mol %.

Abstract: A multifunctional polymer comprising a polymeric chain having chromophore groups and cross-linking sites is suitable as a resist material and especially as the underlayer for bilayer and top surface imaging strategies. The multifunctional polymer can function as an antireflective coating, planarizing layer or etch resistant hard mask.

Abstract: Optically transparent, high refractive index hydrogels and intraocular lenses fabricated therefrom. The preferred hydrogels have a refractive index of 1.45 or above and a water content of approximately 5 to 30 percent by weight.

Abstract: The present invention provides pressure-sensitive adhesives having a refractive index of at least 1.48. The pressure-sensitive adhesives comprise at least one monomer containing a substituted or an unsubstituted aromatic moiety.

Abstract: Polymer for antifouling coatings which comprises units corresponding to the following monomers: A) 5 to 100 mol. % of one or more compounds of general formula (I) in which R=H or CH3; X=O or S; R1=Ph(R2)m, —C(H)3−(p+q)(CO—R)3p(COOR3)q, —(CH2)n−(CO)t—COOR3 or optionally substituted thiadiazolyl and thiazolylsulfamyl groups; Ph=phenyl; m=1-3; p=0-3; q=0-3; p+q=1-3; s=0 or 1; t=0 or 1; R2=each independently selected from halogen, —C(O)H, —COOR3, —CH2—COOR3, —O—R3 , —NH COOR3, —NH—CO—R3 and —NH2; R3=II or optionally halogen substituted alkyl, aryl, cycloalkyl, aralkyl groups with 1-10 C atoms; and B) 0 to 95 mol. % of one or more other ethylenically unsaturated compound.

Abstract: There is provided a process for preparing a polymer compound for a resist, which can improve the performance, such as the heat resistance, sensitivity and resolution of the resist, without causing film loss of the resist, line width reduction of the resist or deterioration of the dry etching resistance of the polymer. This process comprises dissolving a styrene-based monomer containing at least a 4-acetoxystyrene monomer, and a dimethyl-2,2′-azobiscarboxylate ester in a solvent, thereby to polymerize the styrene-based monomer; adding an alkali catalyst to the resulting polymer solution, thereby to hydrolyze the polymer solution; and washing the resulting polymer compound with water.

Abstract: A biaxially oriented polyester film with a substantially non-crosslinked polymeric coating containing styrene and acrylate, wherein the coating is highly thermally stable with a primary onset temperature of greater than about 350C, having a glass transition temperature between about 0C and about 50C, having a solubility in a low molecular weight organic solvent, and having a surface energy of greater than about 35 dyne/cm and less than about 40 dyne/cm.

Abstract: A primer composition comprising: (A) 100 parts by weight of a reactive acrylic resin comprising a main chain composed of a copolymer of two types of alkylmethacrylates having different number of carbon atoms and a side chain having a group with a hydroxyl group and at least one aromatic ring; (B) 100 to 500 parts by weight of a silane compound obtained by reaction of an aminosilane having two amino groups with dialkoxyepoxysilane and trialkoxyepoxysilane at a predetermined ratio; (C) 10 to 300 parts by weight of an epoxy resin of bisphenol A type having an epoxy equivalent of 1,000 to 2,000 g/eq.; and (D) 100 to 500 parts by weigh of carbon black is provided. The composition is excellent in storage stability and can retain excellent adhesion during the time from the coating of the primer until the coating of a sealant and further is excellent in weatherability.

Abstract: A composition for plastic lenses having a viscosity suitable for application to plastic lens materials and other optical materials and capable of giving a cured material having a relatively high refractive index and a low specific gravity, a plastic lens obtained by curing the composition, and a process for producing the plastic lens. A specific dicarboxylic acid component and a specific diol component are employed and the ratio of the components is adjusted to provide the composition for plastic lenses.

Abstract: A high refractive index, foldable polymer suitable for use in ophthalmic devices, such as intraocular lenses, is provided. The polymer may be produced from a polymerization reaction of first, second and third monomeric components and a crosslinking agent. The first monomeric component includes an aryl acrylate or an aryl methacrylate. The second monomeric component, which is not an acrylate, includes a monomer having an aromatic ring with a substituent having at least one site of ethylenic unsaturation. The third monomeric component includes a high water content hydrogel-forming monomer. The resulting high refractive index copolymer is durable enough to be cut and polished when dry, and becomes soft and foldable when hydrated.

Abstract: The present invention relates to polymers of the general formula I: in which M1, M1′, M2 denote a recurring monomer unit from the group: acrylate, methacrylate, 2-chloroacrylate, 2-phenylacrylate; w, w1, w2 are molar fractions of the comonomers with 0<w≦1, 0≦w1<1 and 0≦w2≦0.

Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions using the same. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. In addition, the photoresist composition has low light absorbance at the wavelength of 193 nm, 157 nm and 13 nm, and thus is suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) and EUV (13 nm) in fabricating a minute circuit for a high integration semiconductor device. wherein, R1, R2, R3, Y, W, m and n are as defined in the specification.

Abstract: The present invention relates to a process for the free radical initiated polymerization of unsaturated species characterized by the use of compound of Formula (I) as chain transfer agents, wherein X is selected from hydrogen; CN; optionally substituted aryl; COOH; COOR; C(O)NHR6; C(O)NR7R8; and halogen; Q is selected from COOR1; CN; and C(O)NR7R8; Y is selected from hydrogen; C1 to C6 alkyl; C1 to C6 alkyl substituted with one or more substituents selected from hydroxy, amino, C1 to C6 alkoxy, C1 to C6 alkoxycarbonyl, halogen, CN and optionally substituted aryl; C1 to C6 alkenyl; and C1 to C6 alkynyl; Z is selected from COOR2; CN; and optionally substituted aryl; R3 and R4 may be the same or different and are selected from hydrogen, C1 to C4 alkyl and halogen; or R3 and R4 together with the carbon atom to which they are attached form part of a carbocyclic or heterocyclic ring structure; R is selected from C1 to C18 alkyl; C1 to C12 alkyl substituted with one or more substituents selected from hydroxy, amino,

Abstract: A compound of Formula 10, an organic anti-reflective polymer having the structure of Formula 1 synthesized from the compound of Formula 1 and a preparation method thereof. An anti-reflective coating composition including the above organic anti-reflective polymer, as well as a preparation method of an anti-reflective coating. The anti-reflective coating comprising the disclosed polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the changes in the thickness of the photoresist, prevents back reflection and also solves the problem of CD alteration cause by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices and an increase of the production yields.

Abstract: An organic anti-reflective polymer having the following Formula 1, its preparation method, an anti-reflective coating composition comprising the said organic anti-reflective polymer and a preparation method of an anti-reflective coating made therefrom. The anti-reflective coating comprising the polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices and improve the production yields. Another advantage is the ability to control the k value.