Abstract: A polymer composed overall of from 50 to 99.98 % by weight of C1-C12 alkyl (meth)acrylate a), from 0.02 to 10 % by weight of a vinylaromatic compound b), from 0 to 10 % by weight of an ethylenically unsaturated acid or of an ehtylenically unsaturated acid anhydride c),  and from 0 to 40% by weight of further monomers d), the percentages by weight being based on the polymer and the polymer being obtainable by polymerizing the monomers a) to d) in at least two stages which differ in their content of vinylaromatic compounds in such a way that the content of vinylaromatic compounds in the vinylaromatics-rich stage is at least 5 times as great as in the low-vinylaromatics stage.

Abstract: The present invention relates to a polymer produced by polymerizing a vinyl aromatic monomer in the presence of a small amount of furfuryl (alkyl)acrylate.

Abstract: A curable resin composition containing (A) an aromatic diallyl compound, (B) an acid derivative or an aliphatic group-containing compound having at least 4 (meth)acryl groups in one molecule, (C) divinylbenzene, and (D) a polythiol compound having at least two mercapto groups in one molecule provides an optical material having a desirable refractive index, Abbe number and transparency, and excellent heat resistance.

Abstract: The present invention provides a polymer that can be used as an anti-refelctive coating (ARC) polymer, an ARC composition comprising the same, methods for producing the same, and methods for using the same. The polymer of the present invention is particularly useful in a submicrolithographic process, for example, using KrF (248 nm), ArF (193 nm), or F2 (157 nm) laser as a light source. The polymer of the present invention comprises a chromophore that is capable of absorbing light at the wavelengths used in a submicrolithographic process. Thus, the ARC of the present invention significantly reduces or prevents back reflection of light and the problem of the CD alteration caused by the diffracted and/or reflected light. The ARC of the present invention also significantly reduces or eliminates the standing wave effect and reflective notching.

Abstract: Polymers are disclosed having the following formula 1 or 2: Polymers of the present invention can be used as an ARC material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain a chromophore substituent that exhibits sufficient absorbance at the wavelengths useful for the submicrolithography process. The ARC prevents back reflection of light from lower layers and the alteration of the CD by diffracted and reflected light from the lower layers. The ARC also eliminates standing waves and reflective notching due to the optical properties of lower layers on the wafer and to changes in the thickness of the photosensitive film applied thereon, thereby resulting in the stable formation of ultrafine patterns suitable for 64M, 256M, 1 G, 4 G and 16 G DRAMs and a great improvement in the production yield.

Abstract: Copolymers useful in radiation-sensitive layers of printing plates have the units A, B and C wherein unit A is present in an amount of 5 to a maximum of 50 mol % and R1 and R4 are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20-70 mol % and R2, R6 and R7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10-50 mol % and R3 and R5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C.

Abstract: A (meth)acrylate terpolymer comprising 1-30% of total terpolymer weight epoxy-functional (meth)acrylate monomer units, 1-98% of total terpolymer weight tackifier (meth)acrylate monomer units, and 1-98% of total terpolymer weight compatibilizing (meth)acrylate monomer units, wherein the compatibilizing (meth)acrylate monomer unit is a (meth)acrylic ester derived from an aromatic alcohol containing 6-14 carbon atoms. Also provided are self-fixturing adhesive compositions comprising the acrylate terpolymer of the present invention and methods of their use.

Abstract: Photoresist monomers, photoresist polymers prepared therefrom, and photoresist compositions using the polymer are disclosed. The photoresist polymers include photoresist monomers containing fluorine-substituted benzylcarboxylate group represented by Formula 1. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. As the composition has low light absorbance at 193 nm and 157 nm wavelength, it is suitable for a process using ultraviolet light source such as VUV (157 nm).

Abstract: A biaxially oriented polyester film with a substantially non-crosslinked polymeric coating consisting essentially of a styrene/acrylate copolymer emulsion, wherein the coating is highly thermally stable with a primary onset temperature of greater than about 350° C., having a glass transition temperature between about 0° C. and about 50° C., having a rapid solubility in a low molecular weight organic solvent, and having a surface energy of greater than about 35 dyne/cm and less than about 40 dyne/cm.

Abstract: Polymers are disclosed having the following formula 1 or 2: Polymers of the present invention can be used as an ARC material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain a chromophore substituent that exhibits sufficient absorbance at the wavelengths useful for the submicrolithography process. The ARC prevents back reflection of light from lower layers and the alteration of the CD by diffracted and reflected light from the lower layers. The ARC also eliminates standing waves and reflective notching due to the optical properties of lower layers on the wafer and to changes in the thickness of the photosensitive film applied thereon, thereby resulting in the stable formation of ultrafine patterns suitable for 64 M, 256 M, 1 G, 4 G and 16 G DRAMs and a great improvement in the production yield.

Abstract: The present invention relates generally to compositions prepared by polymerizing vinyl neo C9-C13 carboxylic acid esters. Such compositions include latex compositions that are formed by polymerizing vinyl neo C9-C13 carboxylic acid esters with ethylenically unsaturated comonomers such as acrylic acid esters and vinyl acetate. The polymer compositions of the present invention are particularly suitable for use in applications such as architectural (both interior and exterior), direct-to-metal and marine coatings and transportation maintenance applications.

Abstract: The invention provides compositions for producing lenses by casting. The compositions are useful in producing ophthalmic lens by casting of a surface or layer onto a preform.

Abstract: A high refractive index, foldable polymer suitable for use in ophthalmic devices, such as intraocular lenses, is provided. The polymer may be produced from a polymerization reaction of first, second and third monomeric components and a crosslinking agent. The first monomeric component includes an aryl acrylate or an aryl methacrylate. The second monomeric component, which is not an acrylate, includes a monomer having an aromatic ring with a substituent having at least one site of ethylenic unsaturation. The third monomeric component includes a high water content hydrogel-forming monomer. The resulting high refractive index copolymer is durable enough to be cut and polished when dry, and becomes soft and foldable when hydrated.

Abstract: Copolymers of ethylene and alpha olefins that have been formed by a polymerization reaction in the presence of a single site catalyst, such as a metallocene, are used as a film or as a layer in multiple layer films, including molecularly oriented and irradiated heat shrinkable films. Novel blends of the copolymers with other polymeric materials are disclosed and used as a film or a layer in a film particularly in molecularly oriented and heat shrinkable films. Bags made from the multiple layer films are especially useful for shrink packaging primal cuts of meat. Processes for the formation of flexible films and packages made therefrom are also disclosed.

Abstract: This invention relates to a polymer capable of forming an ultra-fine pattern with excellent rectangular shape in a silylated surface resolution process using a chemically amplified type resist composition as single layer or the most upper layer among multiple layers and to a resist composition using the polymer. The said polymer and resist composition are useful in a silylated surface resolution process, and by conducting the silylated surface resolution process using the said resist composition, contrast of silylation becomes higher and it becomes possible to obtain ultra-fine pattern regardless of the kind of exposure energy.

Abstract: A dendritic or hyperbranched polymer having a weight average molecular weight of 500-10,000,000 is prepared by polymerizing a hydroxystyrene derivative, adding a branching monomer midway in the polymerization step to introduce branch chains, and repeating the polymerizing and branching steps. The polymer is advantageously used as the base resin of resist material because the size of the polymer can be reduced while maintaining strength.

Abstract: The invention provides ion exchange and electrochemical methods and devices employing anion exchange polymers produced by substantially simultaneous quaternization and polymerization reactions. Anion selective polymers are produced in accordance with the invention by combining, an ethylenic tertiary amine monomer, an alkylating agent having a boiling point temperature of at least about 100° C., and a cross-linking agent in the presence of a polymerizing agent for a time and at a temperature sufficient to form the polymer. The alkylating agent and the cross-linking agent may be the same compound, a cross-linking alkylating agent. The polymers may be produced in the presence of solvents and/or in the presence of diluting monomers which are incorporated into the polymers.

Abstract: The present invention provides an anti-reflective coating polymer, an anti-reflective coating (ARC) composition comprising the same, methods for producing the same, and methods for using the same. The anti-reflective coating polymer of the present invention are particularly useful in a submicrolithographic process, for example, using ArF (193 nm) laser as a light source. The ARC of the present invention significantly reduces or prevents back reflection of light and the problem of the CD alteration caused by the diffracted and/or reflected light. The ARC of the present invention also significantly reduces or eliminates the standing wave effect and reflective notching. Thus, the use of ARC of the present invention results in formation of a stable ultrafine pattern that is suitable in manufacturing of 1G, and 4G DRAM semiconductor devices. Moreover, the ARC of the present invention significantly improves the production yield of such semiconductor devices.

Abstract: A preferred embodiment of the invention provides a composition and method of treating dental metal. The composition includes a polymerizable aryl compound having at least one carboxylic acid group and at least one polymerizable group, and a polymerizable compound having at least one polymerizable group and at least one phosphorous containing group. A preferred composition includes at least 50 percent by weight of a volatile organic solvent, at least 15 percent by weight of one or more polymerizable acrylate compounds and an effective amount of a photoinitiator. At least a portion of the polymerizable compounds are multifunctional polymerizable compounds having at least three acrylate moieties. The polymerizable compounds are substantially soluble in the solvent. The composition is adapted to form a polymeric material which is adapted to adhere to metal and ceramics and to dentin. Compositions of the invention have superior adhesion to dental metals and tooth without separately acid etching dentin or enamel.

Abstract: Polymers are disclosed having the following formula 1 or 2: Polymers of the present invention can be used as an ARC material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain a chromophore substituent that exhibits sufficient absorbance at the wavelengths useful for the submicrolithography process. The ARC prevents back reflection of light from lower layers and the alteration of the CD by diffracted and reflected light from the lower layers. The ARC also eliminates standing waves and reflective notching due to the optical properties of lower layers on the wafer and to changes in the thickness of the photosensitive film applied thereon, thereby resulting in the stable formation of ultrafine patterns suitable for 64M, 256M, 1G, 4G and 16G DRAMs and a great improvement in the production yield.

Abstract: This invention is directed to a cationic terpolymer comprising (a) a first monomer unit selected from acrylamide and methacrylamide; (b) a second monomer unit selected from dimethylaminoethyl acrylate methyl chloride quaternary salt, 3-(acrylamido)propyltrimethylammonium chloride, 3-(methacrylamido)propyltrimethylammonium chloride, dimethylaminoethyl methacrylate methyl chloride quaternary salt, dimethylaminoethyl acrylate dimethylsulfate quaternary salt, dimethylaminoethyl methacrylate dimethylsulfate quaternary salt, diethylaminoethyl acrylate methyl chloride quaternary salt and diethylaminoethyl acrylate dimethylsulfate quaternary salt; and (c) a third monomer unit selected from benzyl methacrylate, 2,2,2-trifluoroethyl acrylate, acrylamide diacetone, N-phenylacrylamide, 2,2,3,3-tetrafluoropropyl acrylate and poly(propylene glycol)methacrylate. The terpolymer is useful for dewatering a variety of sludges.

Abstract: Polymers are provided having the following formula I, II or III: Polymers of the present invention can be used to provide an anti-reflective coating (ARC) material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain chromophore substituents which exhibit sufficient absorbance at wavelengths useful for such submicrolithography process. The ARC prevents back reflection from the surface of or lower layers in the semiconductor devices and solves the problem of the CD being altered by the diffracted and reflected light from such lower layers. The ARC also eliminates the standing waves and reflective notching due to the optical properties of lower layers on the wafer, and due to the changes in the thickness of the photosensitive film applied thereon. This results in the formation of stable ultrafine patterns suitable for 64M, 256M, 1 G, 4 G and 16 G DRAM semiconductor devices and a great improvement in the production yield.

Abstract: A thermoplastic molding composition is disclosed containing polycarbonate resin and a copolymer of methyl methacrylate conforming structurally to: wherein x and y are integers calculated to result in a content of PMMA in the copolymer in the range of 80 to 90 mole %, and where R1 denotes —CH3, R2 denotes —C6H5 and R3 is a C1-C2-alkyl group. The composition is characterized in its transparence.

Abstract: High refractive index copolymers suitable for use in ophthalmic devices are disclosed. The copolymers comprise a) two or more monomers of the structure: wherein: X is H or CH3; m is 0-10; Y is nothing, O, S, or NR wherein R is H, CH3, CnH2n+1(n=1-10), iso-OC3H7, C6H5, or CH2C6H5; Ar is any aromatic ring which can be unsubstituted or substituted with H, CH3, C2H5, n-C3H7, iso-C3H7, OCH3, C6H11, Cl, Br, C6H5, or CH2C6H5; a crosslinking monomer having a plurality of polymerizable ethylenically unsaturated groups, and b) a total of about 5 mole % or less of one or more monomers of the structure: wherein: X is H or CH3; W is —CH3 or (CH2═C(—X)—C(═O)—); and n is such that the weight average molecular weight is approximately 600-1000 if W is —CH3 and approximately 400-1000 if W is (CH2═C(—X)—C(═O)—).

Abstract: Liquid crystalline (meth)acrylates of the invention include at least three rigid rod-like moieties. One of these moieties is comprised between the (meth)acrylate rests and further two moieties are bonded as side chains. The liquid crystalline (meth)acrylates polymerizable using redox initiators and/or photo initiators. The (meth)acrylates of the invention polymerize quantitative and with very low volume shrinkage of less than 2.5 percent.

Abstract: A polymerizable composition comprising an effective amount of at least one tetrafunctional acrylate monomer. In one embodiment of the invention, a polymerizable composition is a compound comprising of at least 50 percent by weight of at least one tetrafunctional acrylate monomer, from 5 to 20 percent by weight of at least one modified bisphenol A epoxy diacrylate monomer, from 0 to 25 percent by weight of at least one acrylate monomer selected from aliphatic difunctional and polyfunctional acrylates, from 0 to 3 percent by weight of at least one UV absorber, and a source of free radicals. The lens-forming material resulted from the polymerizable composition is introduced to a lens mold with a mold cavity having a configuration conforming to the optical lens to be molded. A radiation energy source is used to cure the lens-forming material in the filled mold. The radiation energy source comprises a U-shaped UV light.

Abstract: The invention is concerned with novel cross-linkable, photoactive polymer materials with 3-aryl-acrylic acid esters and amides as well as their use as orienting layers for liquid crystals and for the production of non-structured or structured optical elements and multi-layer systems.

Abstract: Disclosed is a process for producing thermally stabilized styrenic polymers and products produced thereby wherein a pre-formed styrenic polymer is functionalized with a bifunctional Friedel-Crafts-type alkylation or acylation agent to yield a functionalized styrenic polymer. The functionalized polymer is admixed with a Friedel-Crafts-type catalyst, preferably a phosphate ester, and optionally a base, such that the functionalized polymer will experience inter- and intramolecular cross-linking reactions at elevated temperatures, thereby stabilizing the polymer from further thermal degradation.

Abstract: The objects of the present invention are: a self-light-stabilized photochromic thermoplastic or thermoreticulated polymer carrying non-cyclic tertiary amide-functionalized pendant groups; its preparation method; photochromic articles constituted, wholly or in part of such a polymer. Said polymer is obtained advantageously by radical co-polymerization of a composition containing an effective amount of at least one monomer of the formula: in which: R1 is hydrogen or a methyl group; n is 2 or 3; R2 and R3 are identical or different and represent independently a methyl or ethyl group; and are advantageously identical; said monomer providing said photostabilizing non-cyclic tertiary amine-functionalized pendant groups.

Abstract: A resist composition containing a polymer of t-butyl cinnamate, a photacid generator, and a solvent. Optionally, the resist composition may include a basic compound. The polymer of t-butyl cinnamate has the monomeric units: wherein a=0.3 to 0.9, b=0.1 to 0.7, and c=0 to 0.3; R1=H, methyl, or CH2OR4; R4=H or C1-C4 alkyl group; R2=H, methyl, CH2OR4, CH2CN, or CH2X; X=Cl, I, Br, F, or CH2COOR5; R5=C1-C4 alkyl group; and R3=isobomyl, cyclohexyl methyl, cyclohexyl ethyl, benzyl, or phenethyl.

Abstract: Polymers are provided having the following formulas I and II: Polymers of the present invention can be used to provide an anti-reflective coating (ARC) material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain chromophore substituents which exhibit sufficient absorbance at wavelengths useful for such submicrolithography process. The ARC prevents back reflection from the surface of or lower layers in the semiconductor devices and solves the problem of the CD being altered by the diffracted and reflected light from such lower layers.

Abstract: The present invention relates to block copolymer dispersants comprising a hydrophobic block and a hydrophilic block having at least one polymerized monomer including a primary amine functionality. The inventive block copolymer dispersant is used to make aqueous dispersants such as inks that have enhanced paper binding characteristics.

Abstract: A (meth)acrylate terpolymer is provided comprising 1-30% of total terpolymer weight epoxy-functional (meth)acrylate monomer units, 1-98% of total terpolymer weight tackifier (meth)acrylate monomer units, and 1-98% of total terpolymer weight compatibilizing (meth)acrylate monomer units, wherein said compatibilizing (meth)acrylate monomer unit is a (meth)acrylic ester derived from an aromatic alcohol containing 6-14 carbon atoms. Also provided are self-fixturing adhesive compositions comprising the acrylate terpolymer of the present invention and methods of their use.

Abstract: The present invention provides a resin-based dental restorative that exhibits low volumetric shrinkage, high filler loading and the high strength required for load bearing restorations, yet maintains a glossy appearance, even after substantial wear. To this end, a dispersant is mixed with a methacrylate resin and a structural filler having a mean particle size between about 0.05 &mgr;m and about 0.50 &mgr;m. The composite is useful in stress bearing restorations and in cosmetic restorations. The structural filler used is typically ground to a mean particle size of less than 0.5 &mgr;m and also includes a microfill having a mean particle size less than 0.05 &mgr;m to improve handling and mechanical characteristics. The preferred dental composites maintain their surface finish even after substantial use and also have the strength properties of hybrid composite resins.

Abstract: A dental cement composition is disclosed, comprising a liquid material and a powder material, wherein said liquid material comprises 4-methacryloxyethyl trimellitic acid and water, said powder material comprising a powdered fluoroalumino silicate glass or a powdered metal oxide containing zinc oxide as the major component, the dental cement composition of the invention has a superior adhesive strength and adhesive durability to the tooth structure and superior in mechanical strengths, particularly in bending strength, without using dental adhesives requiring the surface treatment or priming.

Abstract: Radiation-curable compositions are disclosed which, after cure, are substantially non-yellowing. The compositions are particularly tailored for coating and bundling of optical fibers. A first preferred composition is based on a polyether-type of oligomer diluted with reactive diluents. Isocyanurate structures are included in the composition to raise Tg. A second preferred composition is based on fatty oil comprising (meth)acrylate groups and bisphenol A derivatives comprising (meth)acrylate groups. Photoinitiators can be included to increase cure speed. The formulations do not include material amounts of ingredients which tend to cause yellowing or, in theory, extended conjugation in the cured compositions.

Abstract: A method is provided for producing hyperbranched polymers comprising heating a polymerizable reaction charge comprising (a) a monomer mixture comprising 50-99.1% by weight of at least one monoethylenically unsaturated monomer and 0.1-50% by weight of one or more multiethylenically unsaturated monomers and (b) if at least one ethylenically unsaturated monomer of the monomer mixture is not a thermally initiating monomer, a free radical polymerization initiator, to a temperature in the range from about 250° C. to about 400° C. in a continuous reactor which allows mixing of the reactor contents for a residence time of from about 2 minutes to about 60 minutes, provided that if the total amount of multiethylenically unsaturated monomer is less than 3% by weight of the monomer mixture than at least one of said one or more multiethylenically unsaturated monomers must be tri- or greater ethylenically unsaturated. The hyperbranched polymers prepared by this process are also described.

Abstract: Anionic polymerization is used for the preparation of reaction mixtures comprising homopolymers, copolymers or block copolymers, and of homopolymers, copolymers and block copolymers which comprise acrylates or methacrylates or acrylates and methacrylates, wherein olefinically unsaturated compounds which are not acrylate or methacrylate derivatives are employed as solvent or as solvent component.

Abstract: A photoresist composition which is particularly useful as a chemical amplification type photoresist is provided, wherein the photoresist composition contains a resin having a structural unit represented by the following formula (I): wherein R1, R2 ad R3 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R4 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxy group having 1 to 4 carbon atoms and R5 represents a hydrogen atom, alkyl group or aryl group, or R4 and R5 join together to form a ring, which may be heterocyclic; and R6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a hydroxyl group.

Abstract: A (meth)acrylate terpolymer is provided comprising 1-30% of total terpolymer weight epoxy-functional (meth)acrylate monomer units, 1-98% of total terpolymer weight tackifier (meth)acrylate monomer units, and 1-98% of total terpolymer weight compatibilizing (meth)acrylate monomer units, wherein said compatibilizing (meth)acrylate monomer unit is a (meth)acrylic ester derived from an aromatic alcohol containing 6-14 carbon atoms. Also provided are self-fixturing adhesive compositions comprising the acrylate terpolymer of the present invention and methods of their use.

Abstract: Cinnamate-containing photopolymers for use in liquid crystal display are provided. The photopolymers can be homopolymers or copolymers, and have improved thermostability and photoelectric characteristics. The photopolymers contain a substituted benzene ring and have a weight average molecular weight of from about 1000 to about 100,000. Methods for forming LCD cells using the cinnamate-containing homopolymers and copolymers are also provided.

Abstract: Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.

Abstract: The present invention provides a dental composite which has the high strength required for load bearing restorations, yet maintains a glossy appearance, even after substantial wear. Through the use of particles having a mean particle size between about 0.05 .mu.m and about 0.50 .mu.m, the composite is useful in stress bearing restorations and in cosmetic restorations. The structural filler used is typically ground to a mean particle size of less than 0.5 .mu.m and also includes a microfill having a mean particle size less than 0.05 .mu.m to improve handling and mechanical characteristics. The preferred dental composites maintain their surface finish even after substantial use and also have the strength properties of hybrid composite resins. The structural filler is ground, typically by agitator milling, to the preferred particle size.

Abstract: The novel polyfunctional peroxides are compounds represented by the following general formula (1):R.sup.1 -CX.sub.3 ( 1)wherein R.sup.1 represents a linear alkyl group having 1 to 3 carbon atoms; and X represents a group: ##STR1## (wherein R.sup.2 represents a linear or branched alkyl group having 1 to 5 carbon atoms). Such polyfunctional peroxides include 1,1,1-tris(t-butylperoxycarbonyloxymethyl)propane and the like. The polymerization initiators for vinyl monomers comprise such polyfunctional peroxides. In the process for polymerizing vinyl monomers, a vinyl monomer is polymerized employing such polyfunctional peroxide at 60 to 160.degree. C.

Abstract: The invention is concerned with novel cross-linkable, photoactive polymer materials with 3-aryl-acrylic acid esters and amides as well as their use as orienting layers for liquid crystals and for the production of non-structured or structured optical elements and multi-layer systems.

Abstract: The invention provides an optical method which permits, with the aid of 6 simple measurements, a conclusion regarding the suitability of antennas (groups which can absorb electromagnetic radiation) for incorporation into photoaddressable polymers.

Abstract: A liquid crystalline compound, a polymeric product formed by polymerization of the liquid crystalline compound, a dental composition including the liquid crystalline compound and method of using the dental composition. Polymerization of the liquid crystalline compound results in an low volume percent shrinkage and a high conversion to polymer. The composition of the invention is useful for dental adhesive, primer, cement, pit and fissure sealant and restorative.

Abstract: Compounds containing two cyclic hydrocarbon moieties which are substituted to provide crosslinking functionality and which are linked to each other by secondary or tertiary oxycarbonyl containing moiety are basis for compositions which are cured to provide cured thermosets for encapsulation and underfill for electronic components that are thermally decomposable to allow repair, replacement, recovery or recycling of operative electronic components from assemblies that are inoperative.

Abstract: A positive chemical amplified photoresist composition having as a matrix resin a polymer having the repeating unit of Formula (I) and a photoacid generator. The polymer ranges, in polystyrene-reduced weight average molecular weight, from about 2,000 to 1,000,000. The photoresist composition is possible to develop in alkali and shows excellent sensitivity, resolution and transmissivity to deep uv light in addition to being superior in storage preservativity. The repeating unit of Formula (I) is: ##STR1## wherein, R.sub.2, R.sub.2 and R.sub.3 are independently represented by a hydrogen atom or a methyl group; R.sub.4 is a hydrogen atom, an alkyl group or an alkoxy group; R.sub.5 is functions as an acid-labile protective group and is selected from a t-butyl group, a tetrahydropyranyl group or an alkoxymethylene group; j is an integer of 1-8; k is an integer of 0-8; and 1, m and n each represent a mole ratio, satisfying the condition of l+m+n=1 where 0<1<0.4.

Abstract: The invention is concerned with linear and cyclic polymers or oligomers having a photoreactive ethene group. The polymers are of the formula ##STR1## wherein M.sub.a, M.sub.b, M.sub.c are monomer units for homo- or copolymers;x, y, z are mole fractions of the copolymers, whereby in each case 0<x.ltoreq.1; 0.ltoreq.y.ltoreq.1 and 0.ltoreq.z<1;S.sub.a, S.sub.b are spacer units;Z.sub.a, Z.sub.b are molecular units which can undergo photochemical isomerization/dimerization;n is a magnitude of 4-100 000 andm is 0 or 1,The compounds are used as an orienting layer for liquid cyrstals.