With Additional Monomer Patents (Class 526/328.5)
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Patent number: 7875359Abstract: A self-stabilizing dispersion composition having a copolymer having at least one polymerizable acid-containing moiety, wherein the at least one acid-containing moiety is at least partially neutralized before or during polymerization, and at least one hydrophobic moiety. A process for producing such compositions is also provided, as well as a process for encapsulating water-insoluble actives in such copolymers.Type: GrantFiled: January 13, 2005Date of Patent: January 25, 2011Assignee: Akzo Nobel N.V.Inventors: Klein A. Rodrigues, Darin K. Griffith
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Patent number: 7858672Abstract: Disclosed are soft, high refractive index, methacrylic device materials. The materials contain an ethoxylate monomer to reduce glistenings and a long-chain alkyl methacrylate monomer for softening.Type: GrantFiled: October 1, 2008Date of Patent: December 28, 2010Assignee: Alcon, Inc.Inventor: Walter R. Laredo
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Patent number: 7858076Abstract: Copolymers which contain tert-butyl (meth)acrylate, at least one ?,?-ethylenically unsaturated amido-containing compound and acrylic acid incorporated in the form of polymerized units, cosmetic and pharmaceutical compositions which contain at least one such copolymer and the use of these copolymers are described.Type: GrantFiled: December 8, 2004Date of Patent: December 28, 2010Assignee: BASF SEInventors: Son Nguyen-Kim, Claudia Wood
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Patent number: 7855252Abstract: A polymeric composition including a mono-functional, low molecular weight, low epoxy content end-cap which includes the polymerization product of at least one epoxy-functional monomer and at least one styrenic and/or (meth)acrylic monomer, with a polyfunctional chain extender; and at least one condensation polymer.Type: GrantFiled: June 16, 2008Date of Patent: December 21, 2010Assignee: BASF CorporationInventors: Abiodun E. Awojulu, Roelof van der Meer, Marco A. Villalobos
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Patent number: 7846988Abstract: An ink, method of inkjet printing the ink and game ball utilizing the ink are disclosed. The ink preferably comprises a diacrylate oligomer. The ink more preferably comprises an acrylate monomer in an amount ranging from 15 to 40 parts of a solid component of the ink, a diacrylate oligomer in an amount of 20 to 40 parts of a solid component of the ink, a pigment in an amount of 5 to 15 parts of a solid component, and a thinning agent.Type: GrantFiled: July 1, 2010Date of Patent: December 7, 2010Assignee: Callaway Golf CompanyInventors: Gary Matroni, Thomas J. Kennedy, III, Michael J. Tzivanis
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Patent number: 7829070Abstract: Ampholytic copolymers which contain a molar excess of anionogenic and/or anionic groups, polyelectrolyte complexes which contain such an ampholytic copolymer, cosmetic and pharmaceutical compositions which contain at least one such copolymer or polyelectrolyte complex and the use of these copolymers and polyelectrolyte complexes are described.Type: GrantFiled: December 8, 2004Date of Patent: November 9, 2010Assignee: BASF SEInventors: Son Nguyen-Kim, Klemens Mathauer, Claudia Wood, Gerd Schuh, Darshan Patwardhan
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Patent number: 7820950Abstract: The invention relates to a pressure-sensitive supporting material, which can be (intrinsically) heated by an inner heat source, and to the use thereof. The heatable supporting material is characterized in that the supporting material comprises a pressure-sensitive adhesive layer inside of which heat is generated. The pressure-sensitive adhesive layer is a pressure-sensitive adhesive compound, which can be heated by electric current, induction, a chemical reaction or by a physical phase transition. The heatable supporting material has a high heating capacity and is suited for producing pressure-sensitive tapes for adhering heatable mirrors.Type: GrantFiled: February 18, 2004Date of Patent: October 26, 2010Assignee: tesa SEInventors: Klaus Keite-Telgenbüscher, Stephan Zöllner, Marco Kupsky, German Patino, Olaf Gōrbig
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Patent number: 7816471Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: December 23, 2009Date of Patent: October 19, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20100261831Abstract: A thermoplastic copolymer prepared from acrylonitrile and para-alpha-dimethylstyrene via bulk or solution polymerization has an improved heat distortion temperature and can be used together with graft copolymers and further components for the preparation of thermoplastic moldings.Type: ApplicationFiled: November 11, 2008Publication date: October 14, 2010Applicant: BASF SEInventors: Gerrit Luinstra, Florian Becker, Matthias Müller, Dirk Meckelnburg, Jens Assmann
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Patent number: 7803877Abstract: The present invention relates to novel block polymers comprising at least one first block and at least one second block that are incompatible with each other, have different glass transition temperatures (Tg), and are linked together via an intermediate segment comprising at least one constituent monomer of the at least one first block and at least one constituent monomer of the at least one second block. The block polymer has a polydispersity index I of greater than 2. The invention also relates to cosmetic compositions comprising the block polymers and processes for their use.Type: GrantFiled: September 26, 2003Date of Patent: September 28, 2010Assignee: L'Oreal S.A.Inventors: Bertrand Lion, Nathalie Martin, Béatrice Toumi
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Publication number: 20100240831Abstract: Disclosed herein is a branched (meth)acrylate copolymer prepared by polymerizing a monomer mixture comprising (A) about 20 to about 99.999% by weight of a (meth)acrylate monomer having a refractive index higher than methyl methacrylate; (B) about 0 to about 79.999% by weight of a mono-functional unsaturated monomer; and (C) about 0.001 to about 10% by weight of a crosslinking monomer. The copolymer has a refractive index of about 1.495 to about 1.590.Type: ApplicationFiled: June 2, 2010Publication date: September 23, 2010Applicant: Cheil Industries Inc.Inventors: Il Jin KIM, Kee Hae KWON
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Patent number: 7799845Abstract: Disclosed are soft, high refractive index, acrylic device materials. The materials comprise di-block or tri-block macromers containing a hydrophilic block in the polymer backbone. The materials have improved glistening resistance.Type: GrantFiled: October 3, 2008Date of Patent: September 21, 2010Assignee: Alcon, Inc.Inventor: Douglas C. Schlueter
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Publication number: 20100227995Abstract: The invention relates to a method for the production of vinyl acetate-vinyl ester copolymers having a low content of high-boiling vinyl esters by the radically initiated polymerization of 4.9 to 95 wt.-% vinyl acetate, 4.9 to 95 wt.-% of one or more high-boiling vinyl esters, and optionally 0.1 to 40 wt.-% of one or more ethylenically unsaturated auxiliary monomers, characterized in that additionally 0.1 to 40 wt.-% of vinyl acetate is added at a conversion rate of the polymerization of 65 to 99.9%, wherein the amounts given in wt.-% each refer to the total weight of the monomers, and add up to 100 wt.-%.Type: ApplicationFiled: September 9, 2008Publication date: September 9, 2010Applicant: Wacker Chemie AGInventor: Thomas Kohler
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Patent number: 7790824Abstract: High refractive index copolymers suitable for use in ophthalmic devices are disclosed. The copolymers comprise two or more aryl hydrophobic monomers and a non-polymerizable propylene oxide-ethylene oxide-propylene oxide block copolymer surfactant having a molecular weight of approximately 3600 and approximately 40% ethylene oxide units by weight. The copolymers have a reduced tendency to form glistenings when stored in water at physiological temperatures compared to similar copolymers lacking the non-polymerizable surfactant.Type: GrantFiled: July 24, 2008Date of Patent: September 7, 2010Assignee: Alcon, Inc.Inventor: Charles Freeman
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Patent number: 7790825Abstract: High refractive index copolymers suitable for use in ophthalmic devices are disclosed. The copolymers comprise a single aryl hydrophobic monomer as a device forming monomer. In addition, the copolymers comprise a non-polymerizable block copolymer surfactant. The copolymers have a reduced tendency to form glistenings when stored in water at physiological temperatures.Type: GrantFiled: May 5, 2009Date of Patent: September 7, 2010Assignee: Alcon, Inc.Inventors: Chance Lehman, Charles Freeman
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Patent number: 7781496Abstract: An intraocular lens comprising a polymer that is prepared from a monomer mixture comprising a monomer of formula G-D-Ar??(I) wherein Ar is a C6-C24 aromatic group having a hydrophilic substituent, D is a divalent linking group, and G is a reactive functional group selected from the group consisting of acryloyl, acryloyloxy, methacryloyl, methacryloyloxy and mercapto. The polymer has an equilibrium water content of greater than 4.5 percent by weight.Type: GrantFiled: November 19, 2008Date of Patent: August 24, 2010Assignee: Bausch & Lomb IncorporatedInventors: Joseph C. Salamone, Jay F. Kunzler, Richard M. Ozark
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Publication number: 20100200185Abstract: To provide a papermaking internal sizing agent capable of efficiently imparting sizing performance even in neutral papermaking which uses calcium carbonate as filler, and uses no aluminum sulfate or uses a small amount of aluminum sulfate, and also provide a paper or a paperboard obtained by using the papermaking internal sizing agent. The papermaking internal sizing agent comprises as an effective ingredient an amphoteric copolymer having hydrophobic groups and cationic groups, at least a part of the cationic groups being quaternized. Preferably, the amphoteric copolymer is obtained by polymerizing monomer ingredients that it essentially contain a hydrophobic monomer (A), a cationic monomer (B), and an anionic monomer (C) and that an anion equivalent of the monomer (C) is 0.1 to 90% of a cation equivalent of the monomer (B), in which a rate of quaternizing of the cationic groups is not less than 40% by mole. The paper or the paperboard contains the above papermaking internal sizing agent.Type: ApplicationFiled: March 6, 2008Publication date: August 12, 2010Inventors: Kazunari Sakai, Takahiro Fujiwara, Kazushige Inaoka
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Publication number: 20100197850Abstract: Disclosed herein is a methacrylic copolymer which is a polymer of a monomer mixture comprising about 20 to about 99.9% by weight of a C6-20 aromatic methacrylate, an aliphatic methacrylate, or a combination thereof, and about 0.1 to about 80% by weight of a mono-functional unsaturated monomer. The methacrylic copolymer can have a high refractive index of about 1.495 to about 1.59, and thus when it is blended with polycarbonate resin, it is possible to obtain a methacrylic resin composition having improved compatibility without any other compatibilizer.Type: ApplicationFiled: April 12, 2010Publication date: August 5, 2010Applicant: CHEIL INDUSTRIES INC.Inventors: Il Jin KIM, Kee Hae KWON, Hyung Rang MOON
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Patent number: 7754832Abstract: A method of preparing a polymer having a tapered block copolymer structure. The method comprises polymerizing a first olefin monomer and a different second olefin monomer in the presence of a catalyst supporting living or quasi-living polymerization. In certain embodiments, the catalyst comprises two neutral metal complexes. In preferred embodiments, a tapered block copolymer structure is formed by adding one monomer in a single batch at the start of the polymerization reaction, and adding a second monomer throughout the course of the reaction. The present invention also provides polymers having one or more tapered block copolymer sections, and compositions based on these polymers.Type: GrantFiled: August 19, 2005Date of Patent: July 13, 2010Assignee: The Regents of the University of CaliforniaInventors: Guillermo C. Bazan, Steve Diamanti, Edward J. Kramer, Vikram Khanna, Glenn H. Frederickson, Atsushi Hotta
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Publication number: 20100174025Abstract: A thermoplastic molding composition is proposed, comprising a graft copolymer A and a thermoplastic copolymer B in the following proportions by weight: A: from 10 to 80% by weight of the graft copolymer A composed of a1: from 30 to 90% by weight, based on the graft copolymer A, of a graft base a1 obtainable via the reaction of a11: from 50 to 98.99% by weight, based on the graft base a1, of a C1-C10-alkyl ester of acrylic acid, a12: from 1 to 49.99% by weight, based on the graft base a1, of a copolymerizable linear, branched or cyclic olefin having from 2 to 12 carbon atoms, and a13: from 0.Type: ApplicationFiled: January 18, 2007Publication date: July 8, 2010Applicant: BASF SEInventors: Michael Ishaque, Rajan Venkatesh, Maarten Staal
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Patent number: 7750061Abstract: An ink, method of inkjet printing the ink and game ball utilizing the ink are disclosed. The ink preferably comprises a diacrylate oligomer. The ink more preferably comprises an acrylate monomer in an amount ranging from 15 to 40 parts of a solid component of the ink, a diacrylate oligomer in an amount of 20 to 40 parts of a solid component of the ink, a pigment in an amount of 5 to 15 parts of a solid component, and a thinning agent.Type: GrantFiled: August 24, 2009Date of Patent: July 6, 2010Assignee: Callaway Golf CompanyInventors: Gary Matroni, Thomas J. Kennedy, III, Michael J. Tzivanis
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Publication number: 20100168363Abstract: The low birefringent material of the present invention is, for example, an acrylic copolymer including a lactone ring structure which can provide a positive retardation and a structural unit which can provide a negative retardation, the acrylic copolymer satisfying following conditions that: (A) the copolymer has a glass transition temperature (Tg) of 100° C. or higher; (B) a film comprising the copolymer has a total light transmittance of 85% or higher; and (C) a retardation per 100 ?m of thickness in an in-plane direction of the film is 10 nm or lower, and a difference between a retardation per 100 ?m of thickness in an in-plane direction of the film after the film is drawn by 1.5 times and a retardation per 100 ?m of thickness in an in-plane direction of the film before the film is drawn is 20 nm or lower.Type: ApplicationFiled: August 2, 2006Publication date: July 1, 2010Inventors: Ken-ichi Ueda, Hiroko Izumi, Yoshitomo Nakata, Nobuhiro Maeda
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Patent number: 7745555Abstract: The present invention relates to novel materials particularly useful for ophthalmic applications and methods for making and using the same. More particularly, the present invention relates to relatively soft, optically transparent, foldable, high refractive index materials particularly suited for use in the production of intraocular lenses, contact lenses, and other ocular implants and to methods for manufacturing and using the same.Type: GrantFiled: November 19, 2007Date of Patent: June 29, 2010Assignee: Key Medical Technologies, Inc.Inventors: Khalid Mentak, Anthony Keslinke, Kevin Phan
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Patent number: 7745098Abstract: A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0).Type: GrantFiled: August 26, 2008Date of Patent: June 29, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Dazai, Takayoshi Mori, Hiroaki Shimizu, Kyoko Ohshita, Komei Hirahara
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Patent number: 7737237Abstract: The present invention concerns a controlled structure copolymer comprising at least two different parts, a first part A, amphoteric or zwitterionic, including anionic or potentially anionic units, and cationic or potentially cationic units, or zwitterionic units, and another part B, non amphoteric or zwitterionic. Said copolymer further exhibits a high potential for adaptation, through variation in its composition, in order to improve or modify the properties of compositions in which it is introduced.Type: GrantFiled: October 31, 2003Date of Patent: June 15, 2010Assignee: Phodia ChimieInventor: Mathias Destarac
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Patent number: 7736548Abstract: A non-linear optical device comprising a polymer configured to provide a grating holding ratio of 20% or higher after about four minutes, wherein the polymer comprises a first repeating unit comprising a first moiety having formula (M-1) and a second repeating unit comprising a second moiety having formula (M-2), as defined herein.Type: GrantFiled: July 23, 2007Date of Patent: June 15, 2010Assignee: Nitto Denko CorporationInventors: Michiharu Yamamoto, Peng Wang
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Publication number: 20100144931Abstract: The invention relates to a process for production of methacrylic acid, to a process for production of methyl methacrylate comprising the process steps a) providing a feed composition comprising at least one C4 feed compound selected from isobutylene and tertiary butanol; b) providing methanol; c) subjecting the at least one C4 feed compound and the methanol to a first catalytic reaction zone to obtain a reaction phase comprising methyl tertiary butyl ether; d) separating at least a first part of methanol from the reaction phase to obtain a first methanol phase and a reaction phase depleted in methanol; e) subjecting at least one of the reaction phase and the reaction phase depleted in methanol to a second catalytic reaction zone to obtain a splitting phase comprising isobutylene and methanol; f) optionally separating at least a first part of isobutylene from the second reaction phase to obtain a first isobutylene phase and a splitting phase depleted in isobutylene; g) optionally subjecting the first isobutyleType: ApplicationFiled: February 25, 2008Publication date: June 10, 2010Applicant: Evonik Roehm GmbHInventor: Torsten Balduf
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Patent number: 7728091Abstract: Methods for polymerization of phosphaalkenes using initiators are provided. Also provided are polymers and co-polymers in which the polymer backbone contains tracts of carbon and phosphorous atoms in approximately equimolar amounts. C—P bonds in the polymers of this invention may be predominantly in a head-to-tail arrangement or mixed arrangements. Co-polymers may comprise polyolefin monomer units.Type: GrantFiled: December 16, 2003Date of Patent: June 1, 2010Assignee: The University of British ColumbiaInventors: Derek Gates, Chi-Wing Tsang, Mandy Yam
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Patent number: 7714090Abstract: A (meth)acrylate copolymer obtained by copolymerization of a monomer mixture containing a monomer (A) of the general formula (I), wherein R1 is a hydrogen atom or methyl, R2 is a linear or branched alkylene group having 1 to 8 carbon atoms and Y is a single bond or an oxygen atom, a monomer (B) copolymerizable with the monomer (A) and a crosslinking monomer (C).Type: GrantFiled: March 1, 2006Date of Patent: May 11, 2010Assignee: Hoya CorporationInventors: Hidetoshi Iwamoto, Yoko Katsuki
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Patent number: 7714038Abstract: Polyolefin waxes bearing (meth)acrylate groups, process for preparing them and their use.Type: GrantFiled: March 2, 2006Date of Patent: May 11, 2010Assignee: BASF AktiengesellschaftInventors: Dietmar Haering, Bernhard Hauer, Thomas Pfeiffer, Andreas Fechtenkoetter, Harald Larbig, Erich Beck
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Patent number: 7709052Abstract: Alkyldiketene-containing aqueous polymer dispersions which are obtainable by miniemulsion polymerization of hydrophobic monoethylenically unsaturated monomers in the presence of alkyldiketenes, processes for the preparation of such polymer dispersions and the use of the thus obtainable dispersions as sizes for paper or as water repellents for leather, natural and/or manmade fibers and textiles.Type: GrantFiled: October 9, 2003Date of Patent: May 4, 2010Assignee: BASF AktiengesellschaftInventors: Rainer Dyllick-Brenzinger, Roland Ettl, Franca Tiarks, Ulrich Riebeling
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Patent number: 7700261Abstract: A positive photosensitive composition comprises: (A) a compound that generates an acid upon irradiation with actinic ray or radiation; and (B) a resin that increases its solubility in an alkali developer by action of an acid, wherein the resin (B) has a repeating unit that has an acid-decomposable group and is represented by formula (I): wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom; Ry1 and Ry2 each independently represents an alkyl group or a cycloalkyl group; Rx represents an alkyl group having 2 or more carbon atoms, or a cycloalkyl group; and Z represents an alkylene group.Type: GrantFiled: March 26, 2008Date of Patent: April 20, 2010Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Kaoru Iwato, Hideaki Tsubaki, Norihiko Taguchi
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Patent number: 7687222Abstract: Novel polymerizable ester compounds having formulae (1) to (4) undergo no acid-induced decomposition by ?-elimination wherein A1 is a polymerizable functional group having a carbon-carbon double bond, R1 is H or —C—(R5)3, R2 and R3 are alkyl, R4 is H or alkyl, R5 is a monovalent hydrocarbon group, X is alkylene, Y is methylene, ethylene or isopropylidene, Z is alkylene, and n=1 or 2. Resist compositions comprising polymers derived from the ester compounds have excellent sensitivity and resolution and lend themselves to micropatterning lithography.Type: GrantFiled: July 5, 2007Date of Patent: March 30, 2010Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Seiichiro Tachibana, Masaki Ohashi
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Patent number: 7683147Abstract: Olefins are polymerized by novel transition metal complexes of selected iminocarboxylate and iminoamido ligands, sometimes in the presence of cocatalysts such as alkylaluminum compounds or neutral Lewis acids. Olefins which may be (co)polymerized include ethylene, ?-olefins, and olefins containing polar groups such as olefinic esters for example acrylate esters. Also described are certain “Zwitterionic” transition metal complexes as polymerization catalysts for making polar copolymers. The resulting polymers are useful as thermoplastics and elastomers.Type: GrantFiled: October 17, 2002Date of Patent: March 23, 2010Assignee: E. I. du Pont de Nemours and CompanyInventors: Lin Wang, Lynda K. Johnson, Alex S. Ionkin
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Publication number: 20100048802Abstract: A myo-inositol derivative: R1, R2, R3 and R4 are identical, being selected from PO3H2, PO3Na2, PO3K2, PO3Li2, PO3Ca, PO3Mg, PO3(NH4), PO3(RNH3)2, PO3(R2NH2)2, PO3(R4N)2, PO(OR)2, H, COZ and BHPP, where R is benzyl or alkyl of 1 to 6 carbon atoms and Z is an alkyl or arylalky group providing a cleavable protecting group; R5 of H, benzyl, 4-methoxybenzyl, COZ, PO3H2, PO3Na2, PO3K2, PO3Li2, PO3Ca, PO3Mg, PO3(NH4)2, PO3(RNH3)2, PO3(R2NH2)2, PO3(R4N)2, PO(OR)2, and BHPP, where R is benzyl or alkyl of 1 to 6 carbon atoms and Z is an alkyl or arylalky group providing a cleavable protecting group; X is one of CH2, CH2CH2O, and CH2CH2CH2O; n is an integer from 1 to 8; L1 is a single bond or CH2; L2 is one of a single bond, CONH, CH2CONH, CH2CH2CONH, CH2CH2NHCO, CH2CH2NHCONH, CH2CH2NHCSNH, CH2CH2NHSO2, CH2CH2CH2NHCO, CH2CH2CH2NHCONH, CH2CH2CH2NHCSNH, CH2CH2CH2NHSO2, NHCO, NHCONH, NHCSNH, OCONH, CH2, CH2CH2, CH2CH2O, CH2CH2S, CH2CH2NH, CH2CH2CH2, CH2CH2CH2O, CH2CH2CH2S, CH2CH2CH2NH, and NH—SO2; and R6 is a UV-visible chType: ApplicationFiled: November 4, 2008Publication date: February 25, 2010Inventors: Bryan V. Hunt, Kyle J. Lindstrom, Judith M. Invie, David B. Olson, Anthony M. Renstrom
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Patent number: 7666967Abstract: A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1 is F or C1-C6 fluoroalkyl, R2 is H or C1-C8 alkyl, R3 is O or C1-C6 alkylene, R4 and R5 each are H or C1-C10 alkyl or fluoroalkyl, and R6 is H or an acid labile group. The resist composition, when processed by ArF lithography, has advantages including improved resolution, transparency, minimal line edge roughness, and etch resistance. The resist composition exhibits better performance when processed by ArF immersion lithography with liquid interposed between a projection lens and a wafer.Type: GrantFiled: November 30, 2006Date of Patent: February 23, 2010Assignees: Shin-Etsu Chemical Co., Ltd., Panasonic Corporation, Central Glass Co., Ltd.Inventors: Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Kazuhiko Maeda, Haruhiko Komoriya, Michitaka Ootani
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Patent number: 7662897Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: January 20, 2006Date of Patent: February 16, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Patent number: 7662898Abstract: A biocompatible material having excellent biocompatibility such as small interaction with a component of a living body such as a protein or blood cell. A biocompatible material comprising a polymer obtained by polymerizing a monomer composition comprising an amino acid-type betaine monomer represented by the formula (I): wherein R1 is a hydrogen atom or a methyl group; R2 is an alkylene group having 1 to 6 carbon atoms; each of R3 and R4 is independently an alkyl group having 1 to 4 carbon atoms; R5 is an alkylene group having 1 to 4 carbon atoms; and Z is an oxygen atom or an —NH group; and a polymerizable monomer represented by the formula (II): wherein R1 is as defined above; and R6 is a monovalent organic group, in a weight ratio, i.e. amino acid-type betaine monomer/polymerizable monomer, of from 1/99 to 100/1. The biocompatible material can be suitably used, for example, in food, a food additive, a medicament, a quasi-drug, a medical device, cosmetics, a toiletry article, or the like.Type: GrantFiled: May 18, 2005Date of Patent: February 16, 2010Assignee: Osaka Organic Chemical Ind., Ltd.Inventors: Hiromi Kitano, Makoto Genmei, Yoshiyuki Saruwatari, Takahiro Mukaiyama
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Patent number: 7655743Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: June 26, 2008Date of Patent: February 2, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20100022733Abstract: The present invention provides a copolymer for syrup, characterized by being formed from (A) 1 to 60 mass % of at least one (meth)acrylate compound selected from among a (meth)acrylate-modified silicone oil, an alkyl (meth)acrylate, a monoalkylene glycol (meth)acrylate, and a polyalkylene glycol (meth)acrylate, and (B) 99 to 40 mass % of a (meth)acrylate compound having a C?6 alicyclic hydrocarbon group bonded thereto via an ester bond; a (meth)acrylate composition containing a (meth)acrylate monomer and 1 to 60 mass % of the (meth)acrylate copolymer for syrup; and a cured product of the composition. The (meth)acrylate copolymer for syrup of the present invention has excellent solubility, particularly in a (meth)acrylate compound having an alicyclic ester substituent, and a (meth)acrylate resin composition containing the copolymer provides a stable cured product having high transparency and high resistance to UW rays and heat.Type: ApplicationFiled: November 19, 2007Publication date: January 28, 2010Applicant: IDEMITSU KOSAN CO., LTD.Inventors: Tsuyoshi Ota, Shinichi Yukimasa, Yutaka Obata, Tomoaki Takebe
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Patent number: 7652076Abstract: Disclosed are soft, high refractive index device materials having improved strength. The materials contain a monofunctional or difunctional, acrylate or methacrylate terminated aromatic functional methacrylic or acrylic macromer.Type: GrantFiled: June 12, 2006Date of Patent: January 26, 2010Assignee: Alcon, Inc.Inventors: Douglas C. Schlueter, Mutlu Karakelle
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Patent number: 7649047Abstract: Disclosed are multi-purpose alkali-swellable and alkali soluble associative polymers, which are the polymerization product of a monomer mixture comprising: (a) at least one acidic vinyl monomer; (b) at least one nonionic vinyl monomer; (c) a first associative monomer having a first hydrophobic end group; (d) a monomer selected from the group consisting of a second associative monomer having a second hydrophobic end, a semihydrophobic monomer and a combination thereof; and, optionally, (e) one or more crosslinking monomers or chain transfer agents. When monomer (d) is an associative monomer, the first and second hydrophobic end groups of monomers (c) and (d) have significantly different hydrophobic and/or steric character from one another. The multi-purpose associative polymers surprisingly provide desirable rheological and aesthetic properties in aqueous media.Type: GrantFiled: October 22, 2007Date of Patent: January 19, 2010Assignee: Lubrizol Advanced Materials, Inc.Inventors: Krishnan Tamareselvy, Thomas A. Barker, Pravinchandra K. Shah, Kittie L. Ramey
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Publication number: 20100004416Abstract: The invention provides an infiltrant for dental application that comprises crosslinking monomers. In accordance with the invention the infiltrant has a penetration coefficient PC>50 cm/s, and the crosslinking monomers, based on the total mass of monomers, comprise at least 5% by weight of crosslinking monomers having at least three polymerizable groups and not more than 95% by weight of crosslinking monomers having two polymerizable groups.Type: ApplicationFiled: July 1, 2009Publication date: January 7, 2010Applicant: ERNST MUHLBAUER GMBH & CO. KGInventors: Stephan Neffgen, Swen Neander
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Patent number: 7638388Abstract: In a method of forming a pattern and a method of manufacturing a capacitor using the same, a conductive layer is formed on a mold layer having an opening. A first buffer layer pattern including a polymer having a repeating unit of anthracene-methyl methacrylate and a repeating unit of alkoxyl-vinyl benzene is formed on the conductive layer in the opening. The first buffer layer pattern is baked to cross-link the polymers and form a second buffer layer pattern that is insoluble in a developing solution. The conductive layer on a top portion of the mold layer is selectively removed by using the second buffer layer pattern as an etching mask. Accordingly, a conductive pattern for a semiconductor device is formed. The method of forming a pattern may simplify manufacturing processes for a capacitor and a semiconductor device, and may improve their efficiencies.Type: GrantFiled: November 27, 2007Date of Patent: December 29, 2009Assignee: Samsung Electronics Co., Ltd.Inventors: Kyoung-Min Kim, Jae-Ho Kim, Young-Ho Kim, Boo-Deuk Kim, Seok Han
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Publication number: 20090312460Abstract: A non-ionic polyether-polyester copolymer for extending workability to a cementitious mixture containing hydraulic cement and water, wherein the copolymer includes residues of at least the following monomers: Component A including an ethylenically unsaturated carboxylic acid ester monomer having a moiety hydrolysable in the cementitious mixture, wherein the hydrolyzed monomer residue has an active binding site for a component of the cementitious mixture; and, at least one of: Component B including an ethylenically unsaturated, carboxylic acid ester or alkenyl ether monomer having at least one C2-4 oxyalkylene side group of about 1 to 30 units; or, Component C including an ethylenically unsaturated, carboxylic acid ester or alkenyl ether monomer having at least one C2-4 oxyalkylene side group of 31 to about 350 units; wherein the molar ratio of Component A to the sum of the molar ratios of Component B and Component C is about 1:1 to about 10:1.Type: ApplicationFiled: June 3, 2009Publication date: December 17, 2009Inventors: Klaus K. Lorenz, Alexander Kraus, Thomas M. Vickers, JR., Suzanne Lianopoulos, Viswanath Mahadevan
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Patent number: 7632906Abstract: Composition comprising at least one ethylenically unsaturated monomer to which a photochemically isomerizable or dimerizable molecule is covalently bonded, and at least one ethylenically unsaturated monomer to which a sensitizer is covalently bonded, are outstandingly suitable for producing polymeric alignment layers for liquid crystals.Type: GrantFiled: July 8, 2004Date of Patent: December 15, 2009Assignee: Rolic AGInventors: Peggy Studer, Richard Stossel, Patrick Scheifele, Yonetatsu Matsumoto
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Patent number: 7629411Abstract: A process for preparing poly-C2-C4-alkylene glycol mono(meth)acrylic acid esters by reacting (meth)acrylic anhydride with a poly-C2-C4-alkylene glycol carrying at least one OH group in the presence of abase having a solubility in the poly-C2-C4-alkylene glycol of not more than 10 g/l at 90° C.Type: GrantFiled: September 2, 2005Date of Patent: December 8, 2009Assignee: BASF AktiengesellschaftInventors: Stefan Becker, Joerg Pastre, Joachim Pakusch, Thomas Goetz, Arnold Burek, Wolfgang Hansch, Stefanie Spilger
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Patent number: 7622537Abstract: Biocompatible polymers are manufactured to include an amino acid mimetic monomer and one or more hydrophobic acrylate monomers. The amino acid mimetic monomers are selected to mimic the side chain of the amino acids asparagine or glutamine. The amino acid mimetic monomer can be a methacryloyl or acryloyl derivative of 2-hydroxyacetamide, 3-hydroxypropionamide, alaninamide, lactamide, or glycinamide. These amide functional groups offer the advantage of moderate hydrophilicity with little chemical reactivity. The amino acid mimetic monomer can be copolymerized with one or more hydrophobic acrylate monomers to obtain desired coating properties.Type: GrantFiled: November 19, 2007Date of Patent: November 24, 2009Assignee: Abbott LaboratoriesInventor: Stephen Pacetti
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Patent number: 7601765Abstract: The present invention relates to processes for preparing actinic-radiation-curable and/or dual-cure poly(meth)acrylates by preparing a poly(meth)acrylate containing hydroxy-functional side chains and transesterifying or esterifying the poly(meth)acrylate containing hydroxy-functional side chains with a (meth)acrylate or (meth)acrylic acid. The present invention further relates to the actinic-radiation-curable and/or dual-cure poly(meth)acrylates themselves and to the use of the actinic-radiation-curable and/or dual-cure poly(meth)acrylates in the preparation of dispersions or as a component in coating formulations and topcoats comprising at least one actinic-radiation-curable and/or dual-cure poly(meth)acrylate.Type: GrantFiled: November 5, 2003Date of Patent: October 13, 2009Assignee: BASF Coatings AGInventors: Heinz-Peter Rink, Susanne Neumann, Uwe Meisenburg, Karl-Heinz Joost, Dietmar Häring, Bernhard Hauer
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Patent number: 7589158Abstract: The present invention relates to polymers polymerized sequentially or in stages and having varied functionality and/or monomer content as the polymerization progresses, as well as the methods for making these polymers. The polymers according to the invention can advantageously be present in aqueous emulsion or latex form and can advantageously be used in paint compositions.Type: GrantFiled: November 30, 2005Date of Patent: September 15, 2009Assignee: Columbia Insurance CompanyInventors: Yong Yang, Navin Tilara, Robert J. Sheerin, Dan Sayre