Nitrogen-containing Reactant Contains An Amine Group Patents (Class 528/229)
  • Patent number: 6500904
    Abstract: A method for the synthesis of high molecular weight poly(imide)s comprising coupling poly(imide) precursors having complementary functional groups and a weight average molecular weight of less than about 50,000 Daltons to form high molecular weight poly (imides)s having a weight average molecular weight greater than 50,000 Daltons.
    Type: Grant
    Filed: November 2, 2001
    Date of Patent: December 31, 2002
    Assignee: General Electric Company
    Inventor: Robert F. Hayes
  • Publication number: 20020198358
    Abstract: The present invention provides a polymer in which coumarin, a photo-reactive molecule, is grafted onto a polyimide for preparing liquid crystal alignment layer which has a superior alignment property and an excellent thermal stability in photo-alignment, a process for preparing the said grafted polymer, a process for preparing liquid crystal alignment layer by employing the said grafted polymer, and a liquid crystal alignment layer prepared by the process. The polymer of the invention is prepared by mixing a coumarin compound with a polyimide, dissolving the mixture in an organic solvent, adding a catalyst, and stirring under an environment of N2 gas. The polymer of the invention is superior in terms of the thermal stability, which makes possible its universal application for the development of a novel liquid crystal display(LCD).
    Type: Application
    Filed: March 8, 2002
    Publication date: December 26, 2002
    Inventors: Jung-Ki Park, Shi-joon Sung, Jong-Woo Lee
  • Patent number: 6498226
    Abstract: This invention provides cycloaliphatic polyimide having the following formula (I): wherein 1 and n are integers from 4 to 7; m is an integer from 0 to 2; p is an integer from 1 to 8; polycyclic aliphatic compound R reprents C1-8 cycloalkyl, cycloalkenyl, cycloalkynyl, norbornenyl, decalinyl, adamantanyl, or cubanyl. That cycloaliphatic polyimide can be a through transparent film, their thermal stability is over 430° C. and dielectric constant is about 2.7.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: December 24, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Shu-Chen Lin, Wen-Ling Lui, Chih-Hsiang Lin, Wei-Ling Lin, Woan-Shiow Tzeng
  • Patent number: 6498224
    Abstract: A new method for the synthesis of poly(etherimide)s comprises transimidation of bis(imide) (IV) in the presence of a substituted phthalic anhydride or 4-substituted tetrahydrophthalic anhydride to yield dianhydride (V) which may then be reacted with a diamine to produce poly(etherimide)s. By-product substituted N-alkylphthalimide or 4-substituted N-alkyltetrahydrophthalic anhydride may be recycled or converted to 4-substituted N-alkylphthalimide for use in the formation bisimide (IV), obviating the need for a nitration step.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: December 24, 2002
    Assignee: General Electric Company
    Inventors: Roy Ray Odle, Thomas Link Guggenheim, William James Swatos, Michael J. Vollmer
  • Publication number: 20020188090
    Abstract: Disclosed are a polyamic acid having repeating units represented by the formula (1): 1
    Type: Application
    Filed: March 20, 2002
    Publication date: December 12, 2002
    Inventors: Wataru Yamashita, Katsuji Watanabe, Hideaki Oikawa, Hisato Ito
  • Patent number: 6489431
    Abstract: A polyimide precursor having a repeating unit represented by the following general formula (1), wherein R1 contains a bivalent organic group constituting a diamine having a hexafluoropropylidene group in its molecule represented by the following general formula (2), and the reduced viscosity is from 0.05 to 5.0 dl/g (in N-methylpyrrolidone at a temperature of 30° C., concentration: 0.5 g/dl), and a polyimide obtained by imidizing said precursor: (wherein R1 is a bivalent organic group constituting a diamine, A is a hydrogen atom, a linear alkyl group including a methyl group, or a trifluoromethyl group, and n is the number of a substituent on an aromatic ring and an integer of from 1 to 4).
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: December 3, 2002
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kazuhisa Ishii, Takayasu Nihira, Hiroyoshi Fukuro
  • Patent number: 6489436
    Abstract: Novel polyimide copolymer, which is a copolymer of isopropylidene-bis-(4-phenyleneoxy-4-phthalic acid)dianhydride and 6-amino-2-(p-aminophenyl)benzimidazole or a copolymer of two kinds of tetracarboxylic acid dianhydrides consisting of isopropylidene-bis-(4-phenyleneoxy-4-phthalic acid)dianhydride and 3,3′,4,4′-benxophenonetetracarboxylic acid dianhydride and 6-amino-2-(p-aminophenyl)benzimidazole, can form a metal laminate by direct lamination with metallic foils. The metal laminate can fully satisfy the peel strength.
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: December 3, 2002
    Assignee: Nippon Mektron, Limited
    Inventors: Jenq-Tain Lin, Hiroyuki Sekine, Alexandre L'vovich Rusanov, Lyubov Borisovna Elchina, Calina Valentinovna Kazakova, Yakov Semionovich Vygodskii
  • Patent number: 6486292
    Abstract: The present invention provides an optical polyimide compound defined by the following formula in an optical high polymer material: wherein X is Cl, Br, oxo-halide, or fully halogenated alkyl; A is a divalent aromatic or halogenated aromatic moiety; and Z is a tetravalent moiety which may be a partly or fully fluorinated aromatic ring, a partly or fully chlorinated aromatic ring, a partly or fully fluorinated cycloaliphatic group, a partly or fully chlorinated aliphatic group, or combinations thereof connected via hetero atoms.
    Type: Grant
    Filed: March 7, 2001
    Date of Patent: November 26, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyung-Hee You, Kwan-Soo Han, Tae-Hyung Rhee, Eun-Ji Kim, Jung-Hee Kim, Woo-Hyeuk Jang
  • Patent number: 6479615
    Abstract: The polyamic acid of the invention can be obtained by the reaction of an acid anhydride component comprising pyromellitic anhydride and 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane with 2,2′-di-substituted-4,4′-diaminobiphenyls as a first aromatic diamine and any aromatic diamine component, as a second aromatic diamine, of 2,2-bis(4-aminophenoxyphenyl)propanes, 1,1-bis(4-(4-aminophenoxy)-3-t-butyl-6-methylphenyl)butane, 2,2-bis(3-amino-4-methylphenyl)hexafluoropropane and &agr;,&agr;′-bis(4-aminophenyl)diisopropylbenzenes in an organic solvent. The polyimide resin of the invention can be obtained by heating such a polyamic acid solution. In the production of a circuit board, by using a photosensitive polyamic acid having a sensitizer incorporated in such a polyamic acid solution, a patterned polyimide resin layer can be provided as an insulation layer on a metal foil.
    Type: Grant
    Filed: December 11, 2000
    Date of Patent: November 12, 2002
    Assignee: Nitto Denko Corporation
    Inventors: Takahiro Fukuoka, Amane Mochizuki, Naoki Kurata, Naotaka Kinjo, Toshihiko Omote
  • Patent number: 6476182
    Abstract: Random, melt-processible copolyimides are disclosed herein. These copolyimides are semicrystalline and exhibit recoverable (semi)crystallinity from their melts. Associated processes, which entail either solution polymerization or melt polymerization, for producing and fabricating these copolyimides into useful articles having a predetermined shape are also disclosed.
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: November 5, 2002
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Brian C Auman, William R Corcoran, Jr., John D Summers
  • Patent number: 6476177
    Abstract: Random, melt-processible copolyimides are disclosed herein. These copolyimides are semicrystalline and exhibit recoverable (semi)crystallinity from their melts. Associated processes, which entail either solution polymerization or melt polymerization, for producing and fabricating these copolyimides into useful articles having a predetermined shape are also disclosed.
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: November 5, 2002
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Brian C. Auman, William R Corcoran, Jr., John R Dodd, Mark A Guidry, John D. Summers
  • Publication number: 20020160299
    Abstract: The present invention includes a two-layer imageable element, including: a substrate, a top layer including a first thermally imageable composition including (a) a first thermally sensitive supramolecular polymer or (b) a thermally imageable composition free of the first thermally sensitive supramolecular polymer; and disposed between the substrate and the top layer, a bottom layer including a second thermally imageable composition, which includes a second thermally sensitive supramolecular polymer. The present invention also includes a method of producing the imaged element.
    Type: Application
    Filed: December 28, 2001
    Publication date: October 31, 2002
    Applicant: Kodak Polychrome Graphics, L.L.C.
    Inventors: Yasuhiro Asawa, Yasuhiro Ishizuka, Eiji Hayakawa, S. Peter Pappas
  • Publication number: 20020156231
    Abstract: An electronically active film comprising a compound of the formula: 1
    Type: Application
    Filed: April 20, 2001
    Publication date: October 24, 2002
    Inventors: Geoffrey A. Lindsay, Richard A. Hollins, John D. Stenger-Smith, Peter Zarras
  • Patent number: 6469126
    Abstract: Random, melt-processible copolyimides are disclosed herein. These copolyimides are semicrystalline and exhibit recoverable (semi)crystallinity from their melts. Associated processes, which entail either solution polymerization or melt polymerization, for producing and fabricating these copolyimides into useful articles having a predetermined shape are also disclosed.
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: October 22, 2002
    Assignee: E. I. du Pont de Nmeours and Company
    Inventors: Brian C. Auman, William R. Corcoran, Jr., John D. Summers
  • Publication number: 20020150833
    Abstract: The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer.
    Type: Application
    Filed: December 29, 2000
    Publication date: October 17, 2002
    Applicant: KODAK POLYCHROME GRAPHICS, L.L.C.
    Inventors: S. Peter Pappas, Alan Monk, Shashkant Saraiya, Jianbing Huang
  • Patent number: 6451955
    Abstract: A method of making a solution of a polyimide from a diamine monomer and a dianhydride monomer is disclosed. A solution or slurry of one of the monomers in a solvent that boils at a temperature between about 80° C. and about 160° C. is prepared. The solution or slurry is heated to a temperature between about 80° C. and about 160° C. and the other monomer is slowly added to the solution or slurry. Polyamic acid that is formed quickly imidizes to form the polyimide.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: September 17, 2002
    Assignee: Sumitomo Bakelite Company Limited
    Inventors: Michael C. Hausladen, Jin-O Choi
  • Patent number: 6451956
    Abstract: In a photoconductive element comprising a conductive support, e.g., an electrically conductive film, drum or belt on which a negatively chargeable photoconductive layer is formed, an electrical barrier layer is formed between the support and the photoconductive layer. The barrier layer provides a high energy barrier to the injection of positive charges but transports electrons under an applied electric field. The barrier layer of the invention transports charge by electronic rather than ionic mechanisms and, therefore, is not substantially affected by humidity changes. The barrier layer comprises a polyester-co-imide, polyesterionomer-co-imide or polyamide-co-imide having covalently bonded as repeating units in the polymer chain, aromatic tetracarboxylbisimide groups of the formula: wherein Ar1 and Ar2 represent, respectively, tetravalent and trivalent aromatic groups of 6 to 20 carbon atoms.
    Type: Grant
    Filed: June 8, 2001
    Date of Patent: September 17, 2002
    Assignee: Nex Press Solutions LLC
    Inventors: Louis J. Sorriero, Marie B. O'Regan, Michel F. Molaire
  • Publication number: 20020120095
    Abstract: The object of the present invention is to provide a method capable of producing polyimide resins having excellent heat resistance, which can utilize inexpensive monomers and does not use solvents. The method comprises mixing, in the absence of a solvent, a diamine and at least one tetracarboxylic acid component selected from the group consisting of a tetracarboxylic acid, a tetracarboxylic acid monoanhydride and a tetracarboxylic acid dianhydride capable of forming two imide rings upon cyclization, and then heat-treating the mixture.
    Type: Application
    Filed: February 14, 2000
    Publication date: August 29, 2002
    Inventors: Yoshiyuki Yamamori, Hiroyuki Yasuda
  • Patent number: 6441124
    Abstract: There are disclosed polymeric or oligomeric product obtainable from the reaction of an anthraquinone with an aromatic diamine, characterised in that the anthraquinone is substituted or is not substituted and in that the diamine is a diamino anthracene which is substituted or is not substituted. The anthraquinone may be of the general formula (I): where, R may be the same as or different to R′, and may be a hydrogen atom (when R=R′=H, the compound is anthraquinone), or CH3, CH3CH2—, —OCH3, —OCH2CH3, —CH2OCH3, —CH2OCH2CH2OCH3, methoxyethoxyethoxymethyl, aryloxymethyl, phenyl, Cl, Br, CN or NO2, —CH2COOR or CH2NHCOR″ (where R″ is C1-C6 alkyl or a phenyl or biphenyl group).
    Type: Grant
    Filed: June 2, 2000
    Date of Patent: August 27, 2002
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Poopathy Kathirgamanathan, Subramaniam Ganeshamurugan
  • Patent number: 6441127
    Abstract: An alignment treating agent for a liquid crystal cell, which comprises a polyimide resin of the formula (I): wherein R1 is a tetravalent organic group constituting a tetracarboxylic acid or its derivative, R2 is a bivalent organic group constituting a diamine, and m is a positive integer, provided that at least 10 mol % of R2 is a bivalent organic group selected from the group consisting of: wherein X is H, OH, an alkyl group, an alkoxy group, a carboxyl group, an acyl group or a halogen atom, said polyimide resin being made insoluble in an organic solvent by coating a precursor solution of said polyimide resin on a substrate, followed by heating.
    Type: Grant
    Filed: January 19, 1994
    Date of Patent: August 27, 2002
    Assignee: Nissan Chemical Industries Ltd.
    Inventors: Kiyoshi Sawahata, Toyohiko Abe, Yoshihiro Tsuruoka, Hiroyoshi Fukuro
  • Publication number: 20020103327
    Abstract: Polymer electrolytes and process for their preparation
    Type: Application
    Filed: September 18, 1997
    Publication date: August 1, 2002
    Inventors: JOACHIM CLAUB, GREGOR DECKERS, ARNOLD SCHNELLER, HELMUT WITTELER
  • Publication number: 20020099166
    Abstract: An acid dianhydride, together with a diamine, is heated in an organic polar solvent in the presence of &ggr;-caprolactone or &bgr;-butyrolactone as an acid catalyst to prepare a polyimide having an average molecular weight of 10,000 to 300,000. This production process can realize the production of a polyimide which is soluble in a solvent and has high processability and stability.
    Type: Application
    Filed: January 23, 2002
    Publication date: July 25, 2002
    Applicant: HITACHI CABLE,LTD.
    Inventors: Katsumoto Hosokawa, Yuuki Honda, Seiji Kamimura, Yoshiyuki Ando, Kenji Asano
  • Patent number: 6417321
    Abstract: A thermally cured polyimide is provided, and in particular a crosslinked polyimide, comprising a fluorenyl diamine and comprising an aromatic ring having at least one C1-C10 branched or unbranched alkyl substituent, where the alkyl substituent includes a benzylic hydrogen. The present invention provides a crosslinked polyimide made by a process comprising the step of crosslinking a polyimide comprising diamines comprising pendent fluorenyl groups and comprising aromatic rings having at least one C1-C10 branched or unbranched alkyl substituent, the alkyl substituent including a benzylic hydrogen, by raising the temperature of said polyimide above its glass transition temperature.
    Type: Grant
    Filed: August 21, 2000
    Date of Patent: July 9, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Kazuhiko Minami, Hiroshi Ayukawa, Toshihiro Suwa, Mitsuaki Kobayashi, Bert T. Chien, Stephen A. Ezzell
  • Patent number: 6410682
    Abstract: A gas generating material (16) comprises a polymeric amine. The polymeric amine has a polymer backbone that includes units of wherein R is a nitrogen containing organic radical of a nitrogen containing organic fuel that includes a primary amino group.
    Type: Grant
    Filed: January 3, 2001
    Date of Patent: June 25, 2002
    Assignee: TRW Inc.
    Inventor: Harold R. Blomquist
  • Patent number: 6399742
    Abstract: This invention concerns low viscosity aldimine and ketimine reactive diluents having multi-imine functionality, which are useful in automotive refinish coating compositions, including a process for making them and the coatings that contain them.
    Type: Grant
    Filed: June 18, 1999
    Date of Patent: June 4, 2002
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Marko Strukelj
  • Patent number: 6395399
    Abstract: A flexible printed substrate is constituted of metallic foil and provided thereon a polyimide layer which is produced by forming a film of a polyamic acid varnish on the metallic foil, followed by imidating. The polyimide layer has a linear expansion coefficient of 10×10−6 to 30×10−6 (1/K) and a softening point not more than the imidation temperature.
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: May 28, 2002
    Assignee: Sony Chemicals Corp.
    Inventors: Noriaki Kudo, Minoru Nagashima
  • Patent number: 6392004
    Abstract: An element of a gigahertz electronic device is provided comprising a polyimide selected to have an imide equivalent weight of 375 or greater. The polyimide preferably has a dielectric loss at 12.8 GHz of 0.009 or less and a Tg of 260° C. or greater. Such elements include circuit substrates and antennas.
    Type: Grant
    Filed: August 21, 2000
    Date of Patent: May 21, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Bert T. Chien, Stephen A. Ezzell
  • Publication number: 20020052464
    Abstract: A process for production of polyimide powder, which comprises reacting a biphenyltetracarboxlic dianhydride and an aromatic diamine in an amide-based solvent optionally containing a water-soluble ketone, in the presence of an imidazole at 1-100 equivalent percent based on the carboxylic acid content of the polyimide precursor, separating and collecting the produced polyimide precursor powder from a water-soluble ketone solvent containing 3-30 wt % of an amide-based solvent, and heating the polyimide precursor powder to an imidation rate of 90% or greater, as well as polyimide powder obtained thereby, molded bodies of the polyimide powder, and a process for production of the molded bodies.
    Type: Application
    Filed: October 29, 2001
    Publication date: May 2, 2002
    Applicant: Ube Industries, Ltd.
    Inventors: Hiroaki Yamaguchi, Fumio Aoki
  • Publication number: 20020052463
    Abstract: A process for production of polyimide powder, which comprises reacting an aromatic diamine with a partial ester of a biphenyltetracarboxylic dianhydride, which is a partial ester of a biphenyltetracarboxylic dianhydride with a primary alcohol of 1-5 carbon atoms of which at least 30 mole percent is a 2,3,3′,4′-biphenyltetracarboxylic acid component, in the presence of the primary alcohol, separating out and collecting the resulting solid polyimide precursor and heating for dehydrating ring closure, polyimide powder obtained thereby, molded bodies of the polyimide powder, and a process for production of the molded bodies.
    Type: Application
    Filed: October 29, 2001
    Publication date: May 2, 2002
    Applicant: Ube Industries, Ltd.
    Inventors: Hiroaki Yamaguchi, Fumio Aoki
  • Publication number: 20020048726
    Abstract: A polyimide precursor having repeating units of the formula: 1
    Type: Application
    Filed: September 19, 2001
    Publication date: April 25, 2002
    Applicant: Hitachi Chemical Company, Ltd.
    Inventors: Haruhiko Kikkawa, Fumio Kataoka, Issei Takemoto, Jun Tanaka, Keiko Isoda, Shunichiro Uchimura, Makoto Kaji, Minoru Sugiura
  • Publication number: 20020037991
    Abstract: A 6,6′-dialkyl-3,3′,4,4′-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to 1-line, developed and heated to form a polyimide relief pattern.
    Type: Application
    Filed: August 30, 2001
    Publication date: March 28, 2002
    Applicant: Hitachi Chemical DuPont MicroSystems Ltd.
    Inventors: Noriyoshi Arai, Makoto Kaji, Akihiro Sasaki, Toshiki Hagiwara
  • Patent number: 6359107
    Abstract: A composition of and method for making high performance imide resins that are processable by resin transfer molding (RTM) and resin infusion (RI) techniques were developed. Materials with a combination of properties, making them particularly useful for the fabrication of composite parts via RTM and/or RI processes, were prepared, characterized and fabricated into moldings and carbon fiber reinforced composites and their mechanical properties were determined. These materials are particularly useful for the fabrication of structural composite components for aerospace applications. The method for making high performance resins for RTM and RI processes is a multi-faceted approach. It involves the preparation of a mixture of products from a combination of aromatic diamines and aromatic dianhydrides at relatively low calculated molecular weights (i.e. high stoichiometric offsets) and endcapping with latent reactive groups.
    Type: Grant
    Filed: May 18, 2000
    Date of Patent: March 19, 2002
    Assignee: The United States of America as represented by the Administrator, National Aeronautics and Space Administration
    Inventors: John W. Connell, Joseph G. Smith, Paul M. Hergenrother
  • Patent number: 6355357
    Abstract: A flexible printed board, in which a polyimide resulting from the imidation of a polyamic acid obtained by the addition polymerization of diamines and acid dianhydrides is formed as an insulating layer on a metal foil, is characterized in that the diamines include specific imidazolyl-diaminoazines represented by the formula 1; (where A is an imidazolyl group; R1 is an alkylene group; m is 0 or 1; R2 is an alkyl group; n is 0, 1, or 2; R3 and R4 are alkylene groups; p and q are each 0 or 1; and B is an azine residue, diazine residue, or triazine residue).
    Type: Grant
    Filed: December 8, 1999
    Date of Patent: March 12, 2002
    Assignee: Sony Chemicals Corp.
    Inventors: Satoshi Takahashi, Hidetsugu Namiki
  • Patent number: 6350817
    Abstract: Phenylethynyl containing reactive additives were prepared from aromatic diamines containing phenylethynyl groups and various ratios of phthalic anhydride and 4-phenylethynylphthalic anhydride in glacial acetic acid to form the imide in one step or in N-methyl-2-pyrrolidinone to form the amide acid intermediate. The reactive additives were mixed in various amounts (10% to 90%) with oligomers containing either terminal or pendent phenylethynyl groups (or both) to reduce the melt viscosity and thereby enhance processability. Upon thermal cure, the additives react and become chemically incorporated into the matrix and effect an increase in crosslink density relative to that of the host resin. This resultant increase in crosslink density has advantageous consequences on the cured resin properties such as higher glass transition temperature and higher modulus as compared to that of the host resin.
    Type: Grant
    Filed: April 13, 1999
    Date of Patent: February 26, 2002
    Assignee: The United States of America as represented by the United States National Aeronautics and Space Administration
    Inventors: John W. Connell, Joseph G. Smith, Jr., Paul M. Hergenrother
  • Patent number: 6350845
    Abstract: Novel polyimides substituted by a substituent having an alkyl or fluoroalkyl group and having reduced water absorption; a process for producing these novel polyimides; and novel acid dianhydrides to be used in the production thereof. A polyimide containing a structure represented by the following general formula (I): wherein X1 represents a tetravalent organic group having a substituent —R1AR2 (wherein A represents a divalent linkage group; R1 represents a single bond or a C1-3 alkylene group; and R2 represents a C1-25 alkyl group or a fluoroalkyl group); and Y represents a divalent organic group.
    Type: Grant
    Filed: June 26, 2000
    Date of Patent: February 26, 2002
    Assignee: Kaneka Corporation
    Inventors: Koji Okada, Shoji Hara, Hitoshi Nojiri
  • Patent number: 6350844
    Abstract: A polyimide film having sufficiently excellent characteristics such as a sufficiently high elastic modulus, a low water absorption, a small coefficient of moisture-absorption expansion, a small coefficient of linear expansion and a high dimensional stability; and various electric/electronic equipment bases with the use of the polyimide film. A polyimide film having a tensile elastic modulus of 700 kg/mm2 or less and a coefficient of moisture-absorption expansion of 20 ppm or less and containing a specific repeating unit as an essential repeating unit is synthesized. Then various electric/electronic equipment bases such as a laminate for flexible print connection boards are produced by using the polyimide film.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: February 26, 2002
    Assignee: Kaneka Corporation
    Inventors: Kazuhiro Ono, Kiyokazu Akahori, Hidehito Nishimura
  • Publication number: 20020007038
    Abstract: Improved anti-reflective coating compositions for use in integrated circuit manufacturing processes and methods of forming these compositions are provided. Broadly, the compositions are formed by heating a solution comprising a compound including specific compounds (e.g., alkoxy alkyl melamines, alkoxy alkyl benzoguanamines) under acidic conditions so as to polymerize the compounds and form polymers having an average molecular weight of at least about 1,000 Daltons. The monomers of the resulting polymers are joined to one another via linkage groups (e.g., —CH2—, —CH2—O—CH2—) which are bonded to nitrogen atoms on the respective monomers. The polymerized compound is mixed with a solvent and applied to a substrate surface after which it is baked to form an anti-reflective layer. The resulting layer has high k values, improved etch rates, and can be formulated for both conformal and planar applications.
    Type: Application
    Filed: May 30, 2001
    Publication date: January 17, 2002
    Inventors: Rama Puligadda, Runhui Huang
  • Patent number: 6335416
    Abstract: A polyimide film, which is produced from polyamide acid prepared through the reaction of p-phenylenebis(trimellitic acid monoester anhydride), oxydiphthalic acid dianhydride, p-phenylenediamine, and 4,4′-diaminodiphenylether in an organic solvent, and which has a high elastic modulus, a high elongation, a low coefficient of linear expansion which is not quite different from that of copper, and a low coefficient of hygroscopic expansion.
    Type: Grant
    Filed: April 25, 2000
    Date of Patent: January 1, 2002
    Assignee: Kaneka Corporation
    Inventors: Hitoshi Nojiri, Koichiro Tanaka
  • Patent number: 6335418
    Abstract: A primary object of the invention is to provide a production technology for functional polyamic acid microfine particles and functional polyimide microfine particles by which the particle shape, size and size distribution can be freely controlled. The invention is concerned with a process for synthesizing polyamic acid particles having functional groups at least on the surface from a tetracarboxylic anhydride and a diamine compound characterized by its comprising (a) a first step which comprises providing a tetracarboxylic anhydride and a diamine compound at least one of which has functional groups and preparing a first solution containing the tetracarboxylic anhydride and a second solution containing the diamine compound and (b) a second step which comprises mixing the first and second solutions under ultrasonic agitation to thereby precipitate polyamic acid microfine particles from the mixed solution.
    Type: Grant
    Filed: August 18, 2000
    Date of Patent: January 1, 2002
    Assignees: Osaka Prefectural Government, Sumitomo Bakelite Co., Ltd.
    Inventors: Katsuya Asao, Hitoshi Morita, Hitoshi Onishi, Masaki Kimoto, Yayoi Yoshioka, Hidenori Saito
  • Patent number: 6333391
    Abstract: A process for the preparation of an oligomeric polyimide comprises: mixing a tetracarboxylic acid, a dianhydride, a partially hydrolysed dianhydride or a mixture thereof with a diamine in a reaction medium comprising greater than 80% by weight water, and heating mixture in said reaction medium at a temperature above 100° C. for a time sufficient to form said oligomeric polyimide.
    Type: Grant
    Filed: April 21, 2000
    Date of Patent: December 25, 2001
    Assignees: Commonwealth Scientific and Industrial Research Organisation, The Boeing Company
    Inventors: Bronwyn Glenice Laycock, David Geoffrey Hawthorne, Jonathan Howard Hodgkin, Trevor Charles Morton
  • Patent number: 6333392
    Abstract: An object of the invention is to provide thermosetting amic acid microfine particles, thermosetting imide microfine particles and crosslinked imide microfine particles of controlled particle shape and size distribution. The invention provides a production technology which comprises mixing a first solution containing a tetracarboxylic anhydride and a C═C bond-containing acid anhydride with a second solution containing a diamine compound, causing precipitation of thermosetting amic acid microfine particles from the resulting mixture, and further producing thermosetting imide microfine particles and crosslinked imide microfine particles from the thermosetting amic acid microfine particles.
    Type: Grant
    Filed: May 5, 2000
    Date of Patent: December 25, 2001
    Assignees: Sumitomo Bakelite and Co. Ltd., Osaka Prefectual Government
    Inventors: Katsuya Asao, Hidenori Saito
  • Publication number: 20010051705
    Abstract: The invention relates to a fluorine-containing polybenzoxazole including a structural unit represented by the general formula (1): 1
    Type: Application
    Filed: July 16, 2001
    Publication date: December 13, 2001
    Applicant: Central Glass Company, Limited
    Inventors: Kazuhiko Maeda, Yoshihiro Moroi, Michio Ishida, Kentaro Tsutsumi
  • Patent number: 6320019
    Abstract: A method for preparing polyamic acid and polyimide of three-dimensional molecular structure such that these polymers are superior in adhesive strength and high-temperature stability while maintaining their inherent thermal resistance and mechanical properties, and thus can be effectively used as an adhesive material for high temperature adhesive tapes suitable for semiconductor assembly.
    Type: Grant
    Filed: February 25, 2000
    Date of Patent: November 20, 2001
    Assignee: Saehan Industries Incorporation
    Inventors: Kyung Rok Lee, Soon Sik Kim, Kyeong Ho Chang, Jeong Min Kweon
  • Patent number: 6320018
    Abstract: A polymer comprising monomeric units linked via 4 H-bridges and bound within said polymer via a different bond. The bond via the H-bridges is much stronger than with known supramolecular polymers.
    Type: Grant
    Filed: April 5, 1999
    Date of Patent: November 20, 2001
    Assignee: DSM N.V.
    Inventors: Rintje P. Sijbesma, Felix H. Beijer, Lucas Brunsveld, Egbert W. Meijer
  • Patent number: 6316574
    Abstract: The present invention provides a liquid crystal display element having an adequate pre-tilt angle for preventing the reverse domain, as well as excellent electrical properties by preparation of the polyamic acid composition for the liquid crystal display element which comprises a polyamic acid A that excels in electrical properties and a polyamic acid B that has side chains, mixed in the ratio A/B of 50/50 to 95/5 (by weight).
    Type: Grant
    Filed: June 19, 2000
    Date of Patent: November 13, 2001
    Assignee: Chisso Corporation
    Inventors: Satoshi Tanioka, Shizuo Murata, Itsuo Shimizu, Kazumi Ito
  • Patent number: 6316589
    Abstract: A polyimide for optical communications, which is expressed by the formula (1) where R1 and R2 are independently selected from the group consisting of CF3, CCl3, unsubstituted aromatic ring group and halogenerated aromatic ring group; R3 and R4 are independently selected from the group consisting of Cl, F, I, Br, CF3, CCl3, unsubstituted aromatic ring group and halogenated aromatic ring group; and n is an integer from 1 to 39. The polyimides have a superior heat resistance, and can avoid the increase in optical absorption loss due to a refractive index increase and deterioration of adhesive and coating properties due to weak surface tension of a polyimide film. In addition, use of the polyimides as a material for a core layer of optical waveguides can expand the selection range of material for the cladding layer of the optical waveguide.
    Type: Grant
    Filed: April 11, 2000
    Date of Patent: November 13, 2001
    Assignee: SamSung Electronics Co., Ltd
    Inventors: Kyung-Hee You, Kwan-Soo Han, Tae-Hyung Rhee
  • Patent number: 6316582
    Abstract: The present invention relates to a method of reducing the clogging of nozzles and slits and diminishing the formation of deposits in the spin bath system in the process of making viscose filamentary and film materials by using an alkoxylated polyamine surfactant having the formula: RNA&Parenopenst;CnH2nNA&Parenclosest;x−1A  (I) where R represents a hydrogen or an aliphatic group with 1-24 carbon atoms, each A represents a hydrogen, an aliphatic group with 1-24 carbon atoms, or H(OCmH2m)y-groups, where m is a number from 2-3, n is a number from 2-3, x is 4-8, with the proviso that the number of H(OCmH2m)y-groups are from 1 to x+1, and the total number of carbon atoms in the aliphatic groups is from 8 to 45. The alkoxylated polyamine surfactant has an excellent anticlogging effect, since it is a good dispersant and prevent or reduce precipitation in the spin bath. In addition it is very stable.
    Type: Grant
    Filed: June 1, 2000
    Date of Patent: November 13, 2001
    Assignee: Akzo Nobel N.V.
    Inventors: Kent Bjur, Anders Cassel, Margreth Strandberg, Ingemar Uneback
  • Publication number: 20010037010
    Abstract: The invention relates to carbodiimide-based block copolymers, a method of preparing them and also their use as hydrolysis stabilizers in ester-group-containing polymers.
    Type: Application
    Filed: March 20, 2001
    Publication date: November 1, 2001
    Inventors: Heiko Tebbe, Ludger Heiliger, Volker Muller
  • Patent number: 6307008
    Abstract: A polymide useful as an adhesive for semiconductor assemblies having excellent thermal resistance and adhesive strength at high temperatures.
    Type: Grant
    Filed: February 25, 2000
    Date of Patent: October 23, 2001
    Assignee: Saehan Industries Corporation
    Inventors: Kyung Rok Lee, Soon Sik Kim, Kyeong Ho Chang, Jeong Min Kweon
  • Patent number: 6303743
    Abstract: A polyimide for optical communications, which is expressed by the formula (1), a method of preparing the same, and a method of forming multiple polyimide films using the polyimide, wherein the formula (1) is given by X1, X2, X3, A1, A2, B1, B2, B3, D1, D2, E1, E2, Y1, Y2, Y3, Y4, Y5, Y6, Y7, and Y8, are independently selected from the group consisting of hydrogen atom, halogen atom, alkyl group, halogenated alkyl group, aryl group and halogenated aryl group; Z is a simple chemical bond or selected from the group consisting of —O—, —CO—, —SO3—, —S—, —(T)m—, —(OT)m— and —(OTO)m—, wherein T is alkylene or arylene group substituted by at least one of halogen atom and halogenated alkyl group and m is an integer from 1 to 10; and n is an integer from 1 to 39.
    Type: Grant
    Filed: November 17, 1999
    Date of Patent: October 16, 2001
    Assignee: SamSung Electronics Co., Ltd.
    Inventors: Kyung-hee You, Kwan-soo Han, Tae-hyung Rhee